1269862 九、發明說明： 【發明所屬技術領域j 發明領域 本發明涉及用顯微鏡放大在基板上形成的圖形尺寸後 、檢測透明導電膜圖形的尺寸的尺寸測量裝置等檢查裝置。 c先前技術3 發明背景 基板（例如LCD(液晶）基板）的尺寸測量裝置是如下的 檢查裝置：用顯微鏡放大向在玻璃等基板(試樣)上形成的圖 10形照射照明光而得到的圖形像，對用CCD(電荷耗合器件) 攝像機拍攝該圖像而獲得的圖形像進行圖像處理，來測旦 尺寸。 向試樣照射照明光的方式，有從顯微鏡以同軸落射方 式照射並處理由其反射光獲传的圖像的反射照明方式矛 15從試樣的背面側對顯微鏡照射照明光並處理由其透射光莽 得的圖像的透射式照明方式。但是，在LCD基板的測量中 通常具備實現兩種照明方式的機構，根據被檢查對像的圖 形來區分使用。 在LCD用的基板製造過程中，測量用於生成目的圖形 20 的抗蝕劑膜圖形和生成的金屬膜、透明或半透明膜的尺寸。 這些圖形的尺寸測量是作爲現有技術以第8圖所示的 結構實現的。第8圖是表示現有測量裝置的大致結構的框圖 。1是反射照明方式的照明機構，3是投光管，2是將從照明 機構1輸出的照明導向投光管3的光纖，4是透射照明方式的 5 1269862 知明早兀，6是透射照明頭，5是將從照明單以輪出的照明 導向透射照明頭6的光纖，7是物鏡轉換器，8是物鏡，9是 試樣，ίο是鐘射自動對焦單元，m〇i2是透鏡，η是自動 調光機構，Μ是CCD攝像機，15是圖像處理單元，2〇是透 5射照明頭6内的反射鏡，21是投光管3内的半透半反鏡，a 是錯射自動對焦單元1G内的半透半反鏡，23是照明單元⑽ 燈，24是照明單元4的燈。並且，顯微鏡至少大致包括：照 明單元1、4 ’光纖2、5，投光管3，透射照明頭6，安裝在 透射照明頭6上的反射鏡2〇，物鏡轉換器7，安襞在物鏡轉 10換益7上的物鏡8，鐳射自動對焦單元1〇，半透半反鏡21、 22，透鏡11、I2，以及固定試樣9的試樣台（未圖示）。 在第8圖中，從同軸落射照明用的照明單元丨照射的光 ，通過光纖2後，經投光管3的半透半反鏡21、物鏡8照射試 樣9。並且，照明單元1内的燈23例如是鹵素燈等産生白色 15 光的燈。 從試樣9反射的光通過投光管3的半透半反鏡21、鐳射 自動對焦單元10的半透半反鏡22之後，通過透鏡11和12， 從而在CCD攝像機14的攝像面上成像。 鐳射自動對焦單元10是用於處理從試樣9反射的反射 20 光來自動進行顯微鏡對焦的機構。此外，顯微鏡和CCD攝 像機14之間設有自動調光單元13，利用該自動調光單元13 將入射到CCD攝像機14中的光量控制爲固定量。 而且，物鏡轉換器7用於切換物鏡8來改變倍率。 在利用透射照明方式進行測量的情況下，從透射照明 1269862 用的照明裝置4照射的光，通過光纖5後，經透射照明頭6的 半透半反鏡20照射試樣9。並且，照明單元4内的燈24例如 是鹵素燈等産生白色光的燈。 照射的光透射試樣9的透明或半透明部分後，入射到物 5 鏡8，與上述同樣地在CCD攝像機14上成像。 所成的像由CCD攝像機拍攝，轉換成圖像信號後，作 爲试樣9的圖像輸出到圖像信號圖像處理單元μ。 圖像信號圖像處理單元15對輪入的圖像進行圖像處理 ，測量規定圖形的尺寸。並且，照明單元丨、4、投光管3、 10鐳射自動對焦單元1〇、物鏡轉換器7以及自動調光單元13， 通過用於改變測量條件等，由圖像處理單元15控制。 在本結構中，照明單元1和4的照明燈一般使用具有如 第9圖所示的接近白&光的連續光譜且低價的函素燈。第9 圖是表示用作照明單元旧4的照明燈域24的光源所發出 15 的光的光譜一個例子的圖。 專利文獻1:曰本特開2〇〇3_2793職公報 例如在LCD用等基板中，作爲生成的圖形有透明導電 膜（透明電導膜），但是，這揭沾— 、樣的在可見光區透明的材質的圖 形中，以前是利用在透明導命腊 ^包Μ的圖形邊沿部反射的光不 入射到顯微鏡中而變暗的作用* 用來測I圖形邊沿部。此時， 如果透明導電膜厚，則圖开彡真 〇曰 口形邊沿部的對比度大，因此，可 充〃刀測置。但是，隨著最近的 化等使透明導電膜㈣，圖本降低和圖形的微細 有技術難以測量。 對比度降低，以現 20 1269862 明内 j^L 3 發明概要 本發明的目的在於解決上述問題，增加透明導電膜部 分和其他以外部分的對比度，容易地實現膜厚度小的透明 5 導電膜圖形的尺寸測量。 爲了實現上述目的，本發明第一方案的檢查裝置，用 顯微鏡放大在基板上形成的圖形的尺寸，進行尺寸測量， 其包括.燈，具有可見光以下的波長區的光譜；以及光學 濾光為，遮斷波長比可見光長的波長區的光成分。 第一方案的檢查裝置中，上述光學濾光器僅使大約 600nm以下的波長的光透射。 第一方案的檢查裝置中’上述燈在大約6〇〇nm以下的 波長下至少具有一個輝線。 15BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an inspection apparatus such as a size measuring device that detects a size of a pattern formed on a substrate by a microscope and detects a size of the transparent conductive film pattern. C. Prior Art 3 Background of the Invention The size measuring device of a substrate (for example, an LCD (Liquid Crystal) substrate) is an inspection device that magnifies a pattern obtained by irradiating illumination light to a shape of FIG. 10 formed on a substrate (sample) such as glass by a microscope. For example, a graphic image obtained by taking a picture with a CCD (Charge Consumable Device) camera is subjected to image processing to measure the denier size. The method of irradiating the sample with illumination light is a reflection illumination mode in which the image is irradiated from the microscope in a coaxial epitaxy manner and processed by the reflected light. The spear 15 irradiates the microscope with illumination light from the back side of the sample and processes the transmission light therefrom. A transmissive illumination method for a captured image. However, in the measurement of an LCD substrate, a mechanism for realizing two kinds of illumination methods is generally provided, and the use is made according to the pattern of the object to be inspected. In the substrate manufacturing process for LCD, the size of the resist film pattern for forming the target pattern 20 and the resulting metal film, transparent or translucent film are measured. The dimensional measurement of these figures is realized as the structure shown in Fig. 8 in the prior art. Fig. 8 is a block diagram showing a schematic configuration of a conventional measuring device. 1 is a lighting mechanism of a reflective illumination system, 3 is a light projecting tube, 2 is an optical fiber that guides the illumination output from the illumination mechanism 1 to the light projecting tube 3, 4 is a transmission illumination type 5 1269862, and 6 is a transmission illumination head. 5 is an optical fiber that guides the illumination from the illumination to the transmission head 6, 7 is an objective lens converter, 8 is an objective lens, 9 is a sample, ίο is a clock-shot autofocus unit, m〇i2 is a lens, η It is an automatic dimming mechanism, Μ is a CCD camera, 15 is an image processing unit, 2〇 is a mirror in the 5th illumination head 6, 21 is a semi-transparent mirror in the light pipe 3, a is a misalignment The half mirror in the autofocus unit 1G, 23 is a lighting unit (10) lamp, and 24 is a lamp of the lighting unit 4. And, the microscope at least substantially comprises: the illumination unit 1, 4' fiber 2, 5, the light pipe 3, the transmission head 6, the mirror 2 mounted on the transmission head 6, the objective lens 7, and the lens mounted on the objective lens The objective lens 8 on the switch 10, the laser autofocus unit 1 〇, the half mirrors 21, 22, the lenses 11, I2, and the sample stage (not shown) for fixing the sample 9. In Fig. 8, the light irradiated from the illumination unit 同轴 for coaxial epi-illumination passes through the optical fiber 2, and then the sample 9 is irradiated through the half mirror 21 and the objective lens 8 of the light projecting tube 3. Further, the lamp 23 in the illumination unit 1 is, for example, a lamp that generates white light 15 such as a halogen lamp. The light reflected from the sample 9 passes through the half mirror 21 of the light projecting tube 3, the half mirror 22 of the laser autofocus unit 10, passes through the lenses 11 and 12, and is imaged on the imaging surface of the CCD camera 14. . The laser autofocus unit 10 is a mechanism for automatically reflecting the focus of the microscope by processing the reflected light 20 reflected from the sample 9. Further, an automatic dimming unit 13 is provided between the microscope and the CCD camera 14, and the amount of light incident on the CCD camera 14 is controlled to a fixed amount by the automatic dimming unit 13. Moreover, the objective lens converter 7 is used to switch the objective lens 8 to change the magnification. In the case of measurement by the transmission illumination method, the light irradiated from the illumination device 4 for the transmission illumination 1269862 passes through the optical fiber 5, and then the sample 9 is irradiated through the half mirror 20 of the transmission illumination head 6. Further, the lamp 24 in the illumination unit 4 is, for example, a lamp that generates white light such as a halogen lamp. The irradiated light is transmitted through the transparent or translucent portion of the sample 9, and is incident on the mirror 8 of the object 5, and is imaged on the CCD camera 14 in the same manner as described above. The resulting image is captured by a CCD camera and converted into an image signal, and the image as the sample 9 is output to the image signal image processing unit μ. The image signal image processing unit 15 performs image processing on the wheeled image, and measures the size of the prescribed pattern. Further, the illumination unit 丨, 4, the light projecting tube 3, the 10 laser autofocus unit 1A, the objective lens converter 7, and the automatic dimming unit 13 are controlled by the image processing unit 15 by changing measurement conditions and the like. In the present configuration, the illumination lamps of the illumination units 1 and 4 generally use a low-cost element lamp having a continuous spectrum of white & light as shown in Fig. 9. Fig. 9 is a view showing an example of a spectrum of light emitted from a light source used as a light source field 24 of the illumination unit old 4. For example, in a substrate for LCD, for example, a transparent conductive film (transparent conductive film) is formed as a pattern to be formed, but this is transparent, and is transparent in the visible light region. In the pattern of the material, the light reflected by the edge portion of the pattern of the transparent guide is not darkened by entering the microscope. * It is used to measure the edge of the I pattern. At this time, if the transparent conductive film is thick, the contrast of the edge portion of the opening is large, and therefore, the boring tool can be measured. However, with the recent gradation of the transparent conductive film (four), the reduction of the pattern and the fineness of the pattern are difficult to measure. The contrast is lowered to the present invention. The object of the present invention is to solve the above problems, increase the contrast of the transparent conductive film portion and other portions, and easily realize the size of the transparent 5 conductive film pattern having a small film thickness. measuring. In order to achieve the above object, an inspection apparatus according to a first aspect of the present invention magnifies a size of a pattern formed on a substrate by a microscope, and performs dimensional measurement including a lamp having a spectrum of a wavelength region below visible light; and optical filtering, The light component of the wavelength region longer than the visible light is blocked. In the inspection apparatus of the first aspect, the optical filter transmits only light having a wavelength of about 600 nm or less. In the inspection apparatus of the first aspect, the lamp has at least one glow line at a wavelength of about 6 〇〇 nm or less. 15
20 第一方案的檢查裝置中，上述檢查裝置使用反射照明 和透射照明中的至少一種。 第-方案的檢錄置中，上述燈在大約彻nm、45〇nm 、55〇nm、580nm附近至少具有一個輝線。 第方案中的上述渡光器至少具有一個輝線。 此外本*日㈣第二方案的檢查裝置，⑽微鏡放大 在基板上形成的圖料尺寸，進行尺相量，其包括：燈 、，在規韻波長區内具有輝線；以及光Μ光ϋ，使規定 波長區的光成分通過。 第 波長區 二方案的檢查裝置中，上述光學渡光器通過的規定 ，與上述燈具_線的規定波長區至少重合。 8 1269862 第二方案的檢查裝置中，具有多個上述燈和上述光學 濾光器，根據檢查的試樣種類切換爲任一個燈或任一個光 學濾光器。 第二方案的檢查裝置中，使用反射照明和透射照明的 5 至少一種進行檢查。 圖式簡單說明 第1圖是表示本發明第一實施例的尺寸測量裝置的大 致結構的框圖。 第2圖是表示在本發明第一實施例的照明單元中使用 10 的光源所發出的光的光譜一個例子的圖。 第3圖是在本發明第一實施例的照明單元中使用的光 學濾光器的透射特性圖。 第4圖是表不試樣的透明導電膜的透射特性的一個例 子的圖。 15 第5A圖、第5B圖、第5C圖是用於說明使用本發明時的 效果一個例子的圖。 第6圖是表示本發明第二實施例的尺寸測量裝置的大 致結構的框圖。 第7圖是在本發明第二實施例的照明單元中使用的光 20 學濾光器的透射特性圖。 第8圖是表示現有的測量裝置大致結構的框圖。 第9圖是在現有的照明單元中使用的光源所發出的光 的光譜一個例子的圖。In the inspection apparatus of the first aspect, the inspection apparatus uses at least one of reflected illumination and transmissive illumination. In the recording of the first embodiment, the lamp has at least one glow line at approximately the nearest nm, 45 〇 nm, 55 〇 nm, and 580 nm. The above-mentioned pulverizer in the first embodiment has at least one glow line. In addition, in the inspection device of the second scheme of the present invention, (10) the micromirror magnifies the size of the image formed on the substrate, and performs the phasor phase amount, which includes: a lamp, having a glow line in the wavelength region of the rhyme; and a pupil of the pupil The light component of the predetermined wavelength region is passed. In the first wavelength region inspection apparatus, the specification of the passage of the optical pulverizer is at least coincident with a predetermined wavelength region of the lamp-line. 8 1269862 In the inspection apparatus of the second aspect, the plurality of lamps and the optical filter are provided, and are switched to any one of the lamps or any of the optical filters depending on the type of the sample to be inspected. In the inspection apparatus of the second aspect, at least one of the reflective illumination and the transmissive illumination is used for inspection. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a block diagram showing the schematic configuration of a dimension measuring apparatus according to a first embodiment of the present invention. Fig. 2 is a view showing an example of a spectrum of light emitted by a light source using 10 in the illumination unit of the first embodiment of the present invention. Fig. 3 is a transmission characteristic diagram of an optical filter used in the illumination unit of the first embodiment of the present invention. Fig. 4 is a view showing an example of the transmission characteristics of the transparent conductive film of the sample. 15 Fig. 5A, Fig. 5B, and Fig. 5C are diagrams for explaining an example of an effect when the present invention is used. Fig. 6 is a block diagram showing the schematic configuration of a dimension measuring apparatus according to a second embodiment of the present invention. Fig. 7 is a transmission characteristic diagram of an optical filter used in the illumination unit of the second embodiment of the present invention. Fig. 8 is a block diagram showing a schematic configuration of a conventional measuring device. Fig. 9 is a view showing an example of a spectrum of light emitted from a light source used in a conventional illumination unit.
t U 9 1269862 較佳實施例之詳細說明 本务月的爲知例利用透明導電膜的透射率在< 見光以 下的短波長區降低的特性，通過將從照明單元照射的光限 疋在透明導電膜的透射率降低的波長區，玎增加透明導電 5膜和其他以外部分的對比度來測量尺寸。 因此，本發明的實施例中，將現有的具有連續光譜的 、且麦換爲具有輝線光譜的、例如水銀氤燈或函化金屬燈， 运追加僅使從燈發出的輝線光譜内的、透明導電嫉的透射 率卜低的波長區透射的光學濾光器。 10 例如，在使用了水銀氙燈或函化金屬燈的情況下，透 月^Γ包膜的透射特性爲第4圖的曲線I時，使用其透射率降 低、具有可見到輝線的450nm附近波長的光；當透明導電膜 勺透射特丨生爲弟4圖的曲線jj的情況下，使用其透射率降低 、具有可見到輝線的550nm附近波長的光。 15 (第一實施例） 以下，利用第1圖至第5C圖說明該發明的實施例。 第1圖是表示本發明第一實施例的尺寸測量裝置的大 致結構的框圖。第2圖是表示在第一實施例的照明單元丨，及 4’中使用的燈（光源)所發出的光的光譜一個例子的圖。此外 2〇 苐3圖疋在第一實施例的照明單元1 ’及4’中使用的光學慮 光器的透射特性圖。此外，第4圖的曲線1是表示試樣9的 透明導電膜的透射特性一個例子的圖。此外，第5八圖、第 56圖、第5C圖是用於說明使用本發明時的效果的圖。 在第1圖中，對具有與現有的第8圖相同功能的構件付 10 1269862 與相同的附圖標記。另外，丨，是反射照明方式的照明單元 ，4’是透射照明方式的照明單元，23,是照明單元丨，的燈， 24’是照明單元4’的燈，16是光學濾光器，17是濾光器切換 機構。 5 照明單元丨’及4’内置例如水銀氙或鹵化金屬燈等在大 致400nm至600nm之間的波長區（例如4〇5nm、436nm、546nm 、578mn)具有輝線的燈23,和24,，在照明單元的射出部附 近配置僅使透明導電膜的透射率降低的波長區透射（例如 遮斷比450nm長的波長）的光學濾光器16。光學濾光器16安 10裝在濾光器切換機構17上，在進行由具有第4圖的曲線J那 樣的透射特性的透明導電膜形成的圖形的尺寸測量時，切 換至光學濾光器16。 k照明單元Γ或4’的燈照射的光通過光學濾光器16時 ，根據第3圖所示的光學濾光器的透射特性，僅使在比45〇nm 15波長短的波長區具有輝線的光透射。這樣，從照明單元1， 照射的光通過光纖2後，經投光管3的半透半反鏡21照射試 樣9，或者，從從照明單元4’照射的光通過光纖5後，經透 射照明頭6的反射鏡20照射試樣9。 照射的光，如果是同軸落射照明則是來自試樣9的反射 20光，或者，如果是透射照明則是來自試樣9的透射光，入射 到物鏡8中，與現有例中記載的情況相同地在CCD攝像機14 上成像。 CCD攝像機14拍攝的試樣9的圖形圖像作爲圖像信號 輸出到圖像處理單元15，圖像處理單元15根據輸入的圖像 11 1269862 化號進行圖像處理，測量圖形的尺寸。 這裏’绩射自動對焦單元10、自動調光裝置13、物鏡 轉換為7、物鏡8、半透半反鏡21、22、透鏡11、12、以及 胃像處理單％15 ’與現有例相同地動作。並且，在現有例 5的基礎上，圖像處理單元15的控制物件還有溏光器切換機 構17的控制。 以下說明該作用。 如第4圖所示，透明導電膜的透射特性在可見區顯示出 大致80%的透射特性，但在比可見區更靠近短波長一側， !〇 透射特性急劇下降。 因此’反射照明的情況下，在透明導電膜存在於反射 率π的金屬膜上時，如果從試樣9的上部只照射波長比 45〇nm短的波長區的光，雖然無透明導電膜部分(金屬膜部 分）因咼反射率使反射光量多，但在透明導電膜部分，在照 15射的光一旦入射透明導電膜後在金屬膜上反射、並再次通 過電導膜後射出的期間衰減，因此反射光量少（成爲低反射 率）。 因此，無透明導電膜部分和透明導電膜部分的明暗差 變大，可根據圖形邊緣部的明暗差檢測邊緣、進行尺寸測 20 量。 在玻璃基材上直接存在透明導電膜的情況下，玻璃基 材的反射率本身低，但按照同上述相同的原理，存在透明 導電膜的部分變得更暗，因此，可根據圖形邊緣部的明暗 差檢測出邊緣，進行尺寸測量。即，由於在透明導電膜的 12 1269862 有破璃基材，即使在玻璃基材上反射的光量哪一方都 # 目 1^1 ’同直接入射玻璃基材後反射的光量相比，由於透射 率/1 '、於100%(在可見區也是80%)，所以通過透明導電膜射 出的光量變小。 遷再者，透射照明方式的情況下，如果從試樣9的下部只 遷射照射波長比4 5 0n m短的波長區的光，由於玻璃基材部分 二有兩透射特性而明亮，但存在透明導電膜的部分因透射 ^低而交暗。因此，產生無透明導電膜部分和透明導電膜 、刀的明暗差’可根據圖形邊緣部的明暗差檢測出邊緣， 壤行尺寸測量。 們用罘圖、笫 圆比敉說明實施本發明得 到的圖像和用現有技術得到的圖像。用於取得圖像的試樣 ’使用了完全相同的試樣。 15 2〇 第5A圖是在照明單元中使用了現有的_素燈時的圖像 ^吏用相同的試樣’金屬膜上的透明導電膜、玻璃基材上 的透明導電蘭完全不產生明暗差，因此，難以檢測邊緣 來進行尺寸測量。第5B圖是照明單元中使用_化金屬燈時 的蘭像，㈣5_比，産生了金屬膜上的翻導電膜的 一差’但玻璃基材上的透料電職乎^生明户差 濟此，難以檢測出邊緣進行尺寸測量。第心是在日曰 多中使—驗且追加光學渡光“得到關.全 屬腺上的透明導電膜、坡璃基材上的透明導 苡寸=地根據圖形邊緣部的明暗差檢:出邊二= 13 1269862 第5C圖的圖像是組合了内置有鹵化金屬燈的照明單元 和具有第3圖所示透射特性的光學濾光器的一個例子，但並 不限定於此。例如，如果使用僅透射紫外線區的光學濾光 器、並在照明單元中使用水銀氙燈，則照射紫外線區的照 5 明，因此，透明導電膜的透射特性進一步降低，可得到明 暗差更明顯的圖像。 作爲光源，也考慮了用光學濾光器將具有連續光譜的 燈的光切出特定波長，但此時有光量不足的缺點，如果使 用具有輝線的燈，可有效地取出特定波長的光，可獲得檢 10 查所需的光量。 並且，在上述實施例中，在很多部分沒特意區別反射 照明和透射照明進行說明，但是，也可以同時使用反射照 明和透射照明進行檢查、或者使用任一個進行檢查。 再者，也可以利用濾光器切換機構17來切換不遮斷可 15 見光以上的長波長區的光而使用的情況和使用遮斷它的光 學濾光器的情況來使用，並進行檢查。此外，也可以具備 多個光學濾光器的遮斷波長區進行切換控制，利用波長區 的組合進行檢查。 此外，更進一步，還可以對光學濾光器的組合、和反 20 射照明與透射照明的組合進行組合使用，進行檢查。 •(第二實施例） 參照第1圖、第4圖的曲線Π、第6圖及第7圖說明本發 明的第二實施例。第4圖的曲線Π是在第二實施例使用的試 樣9’(參照第6圖）的透明導電膜的透射特性圖，第6圖是表示 14 1269862 第二實施例的尺寸測量裝置大致結構的框圖，第7圖是第二 實施例涉及的光學濾光器16，(參照第6圖）的透射特性圖。 第二實施例使用透明導電膜具有第4圖的曲線請示 透射特性的試樣9，，第一實施例採用了僅透射45〇nm以下波 5長的光的光學濾光器16，但是，除了採用僅透射具有大約 550mn以下波長的光的光濾光器16，這一點，其他是相同的 。因此，在以下的第二實施例的說明中，省略與第一實施 例相同部分的說明。 筝照第1圖，光學濾光器16,通過濾光器切換機構17，被 10配置在照明單元1 ’或4’的射出部附近。 通過這樣的結構，從照明單元丨，或4，的燈23，或24，照射 的光，在通過光學濾光器16，時，根據第7圖所示的光學濾 光器的透射特性，僅使在55〇nm波長附近的波長區具有輝線 Μ的光透射。這樣，從照明單元i，照射的光中，只有別㈣波 15 =附近的光通過光纖2後經投光管3的半透半反鏡21照射試 钦9，或者，從照明單兀4’照射的光中，只有波長附 近的光通過光纖5後、經透射照明頭6的半透半反鏡照射試 樣9,。 2〇 照射的光，若是同軸落射照明則是來自試樣9,的反射 光、若是透射照明則是來自試樣9,的透射光，入射到物鏡8 與在現有例中記載的情況相同地在CCD14上成像。 CCD攝像機14拍攝的試樣9,的圖形圖像，作爲圖像信 咸輪出給圖像處理單元15，圖像處理單元15根據輸入的圖 像信號進行圖像處理，測量圖形的尺寸。 15 1269862 這裏，鐳射自動對焦單元ίο、自動調光裝置13、物鏡 轉換器7、物鏡8、半透半反鏡21、22、透鏡11、12以及圖 象處理单元15 ’與第1圖的實施例同樣地動作。 以下說明它的作用。 5 透明導電膜的透射特性如第4圖的曲線Π所示，因此， 在透明導電膜存在於反射率高的金屬膜上的情況下，如果 從試樣9’的上部只照射55〇nm附近的波長區的光，則無透明 導電膜部分(金屬膜部分）因高反射率而使反射光量增多，但 在透明導電膜部分，在照射的光一旦入射透明導電膜後在 1〇金屬膜上反射、並再次通過電導膜射出的期間衰減，因此 反射光量少（成爲低反射率）。 因此，無透明導電膜部分和透明導電膜部分的明暗差 變大，可根據圖形邊緣部的明暗差檢測出邊緣，進行尺寸 測量。 15 在玻璃基材上直接存在透明導電膜的情況卞，玻璃基 材的反射率本身低，但根據與上述相同的原理，存在透明 導電膜的部分更加變暗，因此，可根據圖形邊緣部的明暗 差檢測出邊緣，進行尺寸測量。 再者，如果從試樣9,的下部只透射照射“此❿波長區的 20光，玻璃基材因具有高透射特性而明亮，但存在透明導電 膜的部分因透射率低而變暗。因此，産生無透明導電膜部 分和透明導電膜部分的明暗差，可根據圖形邊緣部的明暗 差檢測出邊緣，進行尺寸測量。 並且，在上述實施例中說明了在可見光以下的短波長 16 1269862 區的光源及濾光器的切換。但是，上述實施例以外，對於 在各種波長區具有輝線的光源的組合，以及使波長比可見 光短或長的波長區的光不通過的遽光器、或者在規定的波 長區使光通過的濾光器的組合，可根據電導膜的種類，切 5 換光源或濾、光器的至少一個而使用。 此外，並不限於透明導電膜，也可適用於用各種材料 、各種制法制做的膜圖形。 發明效果 根據本發明，能夠將用現有技術無法得到的透明導電 10 膜視覺化，因此，可以根據在現有技術中無法實現的透明 導電膜的圖形邊緣部的明暗差來檢測出邊緣，進行尺寸測 量。本發明在具有透明導電膜圖形的LCD基板等的基板尺 寸測量中使有效的。 L圖式簡單說明3 15 第1圖是表示本發明第一實施例的尺寸測量裝置的大 致結構的框圖。 第2圖是表示在本發明第一實施例的照明單元中使用 的光源所發出的光的光譜一個例子的圖。 第3圖是在本發明第一實施例的照明單元中使用的光 20 學濾光器的透射特性圖。 第4圖是表示試樣的透明導電膜的透射特性的一個例 子的圖。 第5A圖、第5B圖、第5C圖是用於說明使用本發明時的 效果一個例子的圖。 17 1269862 第6圖是表示本發明第二實施例的尺寸測量裝置的大 致結構的框圖。 第7圖是在本發明第二實施例的照明單元中使用的光 學濾光器的透射特性圖。 第8圖是表示現有的測量裝置大致結構的框圖。 第9圖是在現有的照明單元中使用的光源所發出的光 的光譜一個例子的圖。 【主要元件符號說明】 1，4，1’，4’...照明單元 13...自動調光機構 2,5...光纖 14...CCD攝像機 3…投光管 15.··圖像處理單元 6...透射照明頭 16，16’...光學濾光器 7...物鏡轉換器 17，17’…切換機構 8...物鏡 20...反射鏡 9,9’…試樣 21，22…半透半反鏡 10…鐳射自動對焦單元 11，12...透鏡 23,24,23，，24，...燈 18t U 9 1269862 DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT The present invention is characterized by the fact that the transmittance of the transparent conductive film is reduced in the short-wavelength region below the light, by limiting the light irradiated from the illumination unit. The wavelength region in which the transmittance of the transparent conductive film is lowered, 玎 increases the contrast of the transparent conductive film 5 and other portions to measure the size. Therefore, in the embodiment of the present invention, the existing one having a continuous spectrum and the wheat is replaced by a luminescence spectrum, such as a mercury xenon lamp or a dimming metal lamp, is added only to the spectrum of the glow line emitted from the lamp. An optical filter that transmits light in the wavelength region of the conductive germanium. 10 For example, in the case of using a mercury xenon lamp or a solid metal lamp, when the transmission characteristic of the translucent film is the curve I of Fig. 4, the transmittance is lowered, and the wavelength near the wavelength of 450 nm having visible visible rays is used. Light; when the transparent conductive film spoon is transmitted through the curve jj of the Fig. 4 map, light having a wavelength lower than 550 nm having a visible light line is used. 15 (First Embodiment) Hereinafter, an embodiment of the invention will be described using Figs. 1 to 5C. Fig. 1 is a block diagram showing the schematic configuration of a dimension measuring apparatus according to a first embodiment of the present invention. Fig. 2 is a view showing an example of a spectrum of light emitted from a lamp (light source) used in the illumination unit 第一 and 4' of the first embodiment. Further, Fig. 3 is a transmission characteristic diagram of the optical optical device used in the illumination units 1' and 4' of the first embodiment. Further, the curve 1 of Fig. 4 is a view showing an example of the transmission characteristics of the transparent conductive film of the sample 9. Further, Fig. 5, Fig. 56, and Fig. 5C are diagrams for explaining the effects when the present invention is used. In Fig. 1, members having the same functions as those of the conventional Fig. 8 are assigned the same reference numerals as 10 1269862. In addition, 丨 is a lighting unit of a reflective illumination type, 4' is a lighting unit of a transmissive illumination type, 23 is a lamp of a lighting unit ,, 24' is a lamp of the illuminating unit 4', and 16 is an optical filter, 17 It is a filter switching mechanism. 5 illuminating units 丨' and 4' are built with a lamp 23 having a ray line in a wavelength region (for example, 4〇5nm, 436nm, 546nm, 578mn) such as a mercury iridium or a halogenated metal lamp, and 24, in An optical filter 16 that transmits only a wavelength region in which the transmittance of the transparent conductive film is lowered (for example, blocks a wavelength longer than 450 nm) is disposed in the vicinity of the emitting portion of the illumination unit. The optical filter 16A is mounted on the filter switching mechanism 17, and is switched to the optical filter 16 when measuring the size of a pattern formed by a transparent conductive film having a transmission characteristic such as the curve J of FIG. . When the light irradiated by the lamp of the k illumination unit Γ or 4' passes through the optical filter 16, according to the transmission characteristics of the optical filter shown in FIG. 3, only the light region having a wavelength shorter than 45 〇nm 15 has a bright line. Light transmission. Thus, after the light irradiated from the illumination unit 1 passes through the optical fiber 2, the sample 9 is irradiated through the half mirror 21 of the light projecting tube 3, or the light irradiated from the illumination unit 4' passes through the optical fiber 5, and is transmitted. The mirror 20 of the illumination head 6 illuminates the sample 9. The irradiated light is reflected 20 light from the sample 9 in the case of coaxial epi-illumination, or transmitted light from the sample 9 in the case of transmitted illumination, and is incident on the objective lens 8, as in the case of the conventional example. The image is imaged on the CCD camera 14. The graphic image of the sample 9 taken by the CCD camera 14 is output as an image signal to the image processing unit 15, and the image processing unit 15 performs image processing based on the input image 11 1269862, and measures the size of the graphic. Here, the "synchronized autofocus unit 10, the automatic dimming device 13, the objective lens is converted to 7, the objective lens 8, the half mirrors 21, 22, the lenses 11, 12, and the stomach image processing sheet % 15' are the same as the conventional example. action. Further, on the basis of the conventional example 5, the control object of the image processing unit 15 is also controlled by the chopper switching mechanism 17. This effect will be described below. As shown in Fig. 4, the transmission characteristics of the transparent conductive film showed a transmission characteristic of approximately 80% in the visible region, but the transmission characteristics of the transparent conductive film decreased sharply on the side closer to the short wavelength than the visible region. Therefore, in the case of 'reflective illumination, when the transparent conductive film is present on the metal film having the reflectance π, if only the light of the wavelength region shorter than 45 〇 nm is irradiated from the upper portion of the sample 9, although there is no transparent conductive film portion (Metal film portion) has a large amount of reflected light due to the yttrium reflectance. However, in the transparent conductive film portion, the light emitted by the illuminating film is reflected on the metal film after being incident on the transparent conductive film, and is attenuated while being emitted again through the conductive film. Therefore, the amount of reflected light is small (becomes low reflectance). Therefore, the difference in brightness between the portion of the non-transparent conductive film and the portion of the transparent conductive film becomes large, and the edge can be detected based on the difference in brightness between the edges of the pattern, and the amount of measurement can be performed. In the case where a transparent conductive film is directly present on the glass substrate, the reflectance of the glass substrate itself is low, but according to the same principle as described above, the portion where the transparent conductive film exists becomes darker, and therefore, according to the edge portion of the pattern The difference between the light and dark is detected and the size is measured. That is, since there is a glass substrate on the transparent conductive film 12 1269862, even if the amount of light reflected on the glass substrate is one, the amount of light reflected by the direct reflection of the glass substrate is compared with the amount of light reflected by the glass substrate. /1 ', at 100% (80% in the visible region), the amount of light emitted through the transparent conductive film becomes small. In the case of transmissive illumination, if only the light in the wavelength region shorter than 750 nm is irradiated from the lower portion of the sample 9, the glass substrate portion has two transmission characteristics and is bright, but exists. The portion of the transparent conductive film is darkened due to low transmission. Therefore, the difference between the light-dark difference of the portion of the transparent conductive film and the transparent conductive film and the blade can be detected, and the edge can be detected based on the difference in brightness between the edges of the pattern. The images obtained by carrying out the invention and the images obtained by the prior art are illustrated by a stencil and a circle. The sample used to obtain the image 'has used the same sample. 15 2〇 Figure 5A is the image when the existing _-lamp is used in the lighting unit. The same sample is used. The transparent conductive film on the metal film, the transparent conductive blue on the glass substrate does not produce any light and dark. Poor, therefore, it is difficult to detect the edge for dimensional measurement. Figure 5B is the blue image when the _ chemical metal lamp is used in the lighting unit, and (4) the ratio of 5_, which produces a difference in the conductive film on the metal film, but the dielectric material on the glass substrate is poor. In this case, it is difficult to detect the edge for dimensional measurement. The first heart is to make a photo in the sundial and to add optical light to get "off. The transparent conductive film on the whole gland, the transparent guide on the glass substrate = ground according to the brightness of the edge of the figure: Outlet 2 = 13 1269862 The image in Fig. 5C is an example in which an illumination unit incorporating a halogenated metal lamp and an optical filter having a transmission characteristic shown in Fig. 3 are combined, but is not limited thereto. If an optical filter that transmits only the ultraviolet ray region is used and a mercury ray lamp is used in the illumination unit, the irradiation of the ultraviolet ray region is irradiated, so that the transmission characteristic of the transparent conductive film is further lowered, and an image with more distinct light and dark aberration can be obtained. As a light source, it is also considered that an optical filter is used to cut light of a lamp having a continuous spectrum to a specific wavelength, but at this time, there is a disadvantage that the amount of light is insufficient, and if a lamp having a bright line is used, light of a specific wavelength can be efficiently taken out, The amount of light required for the inspection can be obtained. Moreover, in the above embodiment, the reflection illumination and the transmission illumination are not specifically distinguished in many parts, but the reflection illumination can also be used at the same time. The transmitted illumination is inspected or inspected using either one. Alternatively, the filter switching mechanism 17 may be used to switch between the use of the long-wavelength region that does not block the light and the light, and the use of the interrupting device. The optical filter can be used and inspected. In addition, the blocking wavelength region of the plurality of optical filters can be switched and controlled, and the combination of the wavelength regions can be used for inspection. Further, optical can be used for the optical filter. The combination of the filter and the combination of the reverse illumination and the transillumination are used for inspection. (Second embodiment) Referring to the curves 第, 6 and 7 of Figs. 1 and 4 A second embodiment of the present invention. The curve 第 of Fig. 4 is a transmission characteristic diagram of the transparent conductive film of the sample 9' (refer to Fig. 6) used in the second embodiment, and Fig. 6 is a view showing 14 1269862 second. FIG. 7 is a block diagram showing a schematic configuration of a size measuring device according to an embodiment, and FIG. 7 is a transmission characteristic diagram of the optical filter 16 according to the second embodiment (see FIG. 6). The second embodiment uses a transparent conductive film to have a fourth. Figure song The line indicates the sample 9 of the transmission characteristic, and the first embodiment employs the optical filter 16 that transmits only light of a length of 5 以下 nm or less, but except that a light filter that transmits only light having a wavelength of about 550 nm or less is used. The optical unit 16 is the same as the other. Therefore, in the following description of the second embodiment, the description of the same portions as the first embodiment will be omitted. The first embodiment of the kit, the optical filter 16, through the filter The optical device switching mechanism 17 is disposed in the vicinity of the emitting portion of the illumination unit 1' or 4'. With such a configuration, the light irradiated from the illumination unit 丨, or 4, the lamp 23, or 24, passes through the optical filter. In the case of the optical device 16, according to the transmission characteristics of the optical filter shown in Fig. 7, only light having a ray enthalpy in a wavelength region near the wavelength of 55 〇 nm is transmitted. Thus, from the illumination unit i, the illuminating light Only the other (four) wave 15 = the nearby light passes through the optical fiber 2 and is irradiated through the half mirror 21 of the light projecting tube 3, or, in the light irradiated from the illumination unit 4', only the light near the wavelength passes. Semi-transparent mirror illumination test after transmission of the optical head 5 9,. The illuminating light is the reflected light from the sample 9 in the case of the coaxial epi-illumination, and the transmitted light from the sample 9 in the case of the transmission illumination, and is incident on the objective lens 8 in the same manner as described in the conventional example. Imaging on the CCD 14. The image image of the sample 9 taken by the CCD camera 14 is sent to the image processing unit 15 as an image signal, and the image processing unit 15 performs image processing based on the input image signal to measure the size of the image. 15 1269862 Here, the laser autofocus unit ίο, the automatic dimming device 13, the objective lens converter 7, the objective lens 8, the half mirrors 21, 22, the lenses 11, 12, and the image processing unit 15' and the implementation of Fig. 1 The example operates in the same way. The following explains its role. 5 The transmission characteristics of the transparent conductive film are as shown by the curve 第 in Fig. 4. Therefore, when the transparent conductive film is present on the metal film having a high reflectance, if only the upper portion of the sample 9' is irradiated near 55 〇 nm In the light of the wavelength region, the portion of the transparent conductive film (metal film portion) is increased in reflectance due to high reflectance, but in the portion of the transparent conductive film, once the irradiated light is incident on the transparent conductive film, it is on the metal film. The period of reflection and re-emission through the electrically conductive film is attenuated, so the amount of reflected light is small (becomes low reflectance). Therefore, the difference in brightness between the portion of the non-transparent conductive film and the portion of the transparent conductive film becomes large, and the edge can be detected based on the difference in brightness between the edges of the pattern to perform dimensional measurement. 15 When a transparent conductive film is directly present on a glass substrate, the reflectance of the glass substrate itself is low, but according to the same principle as described above, the portion where the transparent conductive film is present is further darkened, and therefore, according to the edge portion of the pattern The difference between the light and dark is detected and the size is measured. Further, if only 20 light of this ❿ wavelength region is transmitted from the lower portion of the sample 9, the glass substrate is bright due to high transmission characteristics, but the portion where the transparent conductive film is present is darkened due to low transmittance. The difference between the portion of the transparent conductive film portion and the portion of the transparent conductive film is generated, and the edge can be detected according to the difference in brightness between the edge portions of the pattern, and the size measurement is performed. Further, in the above embodiment, the short wavelength 16 1269862 region below the visible light is described. Switching between the light source and the filter. However, in addition to the above embodiments, a combination of light sources having a bright line in various wavelength regions, and a chopper that does not pass light having a wavelength shorter or longer than visible light, or The combination of the filters for passing light in a predetermined wavelength region can be used according to the type of the conductive film, and at least one of the light source or the filter or the optical device can be used. Further, it is not limited to the transparent conductive film, and can be applied to A film pattern made of various materials and various methods. According to the present invention, a transparent conductive film 10 which is not obtained by the prior art can be visualized. The edge can be detected according to the difference in brightness between the edge portions of the pattern of the transparent conductive film which is not realized in the prior art, and the size measurement can be performed. The present invention is effective in the measurement of the substrate size of an LCD substrate or the like having a transparent conductive film pattern. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a block diagram showing a schematic configuration of a size measuring apparatus according to a first embodiment of the present invention. FIG. 2 is a view showing a light source used in the lighting unit of the first embodiment of the present invention. A diagram of an example of the spectrum of light. Fig. 3 is a transmission characteristic diagram of the optical filter used in the illumination unit of the first embodiment of the present invention. Fig. 4 is a transmission characteristic of the transparent conductive film of the sample. Fig. 5A, Fig. 5B, and Fig. 5C are diagrams for explaining an example of the effect of using the present invention. 17 1269862 Fig. 6 is a view showing a size measuring apparatus according to a second embodiment of the present invention. Fig. 7 is a transmission characteristic diagram of an optical filter used in the illumination unit of the second embodiment of the present invention. Fig. 8 is a view showing a schematic configuration of a conventional measuring apparatus. Figure 9 is a diagram showing an example of the spectrum of light emitted by a light source used in a conventional illumination unit. [Main element symbol description] 1, 4, 1', 4'... illumination unit 13. .. automatic dimming mechanism 2, 5... fiber 14... CCD camera 3... light pipe 15. Image processing unit 6... transmission head 16, 16'... optical filter 7... objective lens converter 17, 17'... switching mechanism 8... objective lens 20... mirror 9, 9'... sample 21, 22... half mirror 10... laser autofocus unit 11, 12 ...lens 23,24,23,,24,...light 18