TWI266155B - Mask frame conveying device and exposure device - Google Patents
Mask frame conveying device and exposure deviceInfo
- Publication number
- TWI266155B TWI266155B TW94103599A TW94103599A TWI266155B TW I266155 B TWI266155 B TW I266155B TW 94103599 A TW94103599 A TW 94103599A TW 94103599 A TW94103599 A TW 94103599A TW I266155 B TWI266155 B TW I266155B
- Authority
- TW
- Taiwan
- Prior art keywords
- mask frame
- transfer
- frame
- frame conveying
- exposing device
- Prior art date
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
To provide a mask frame transfer unit which is feasible for efficient and quick check in maintenance and used in an exposing device. This is a mask frame transfer unit used in an exposing device for exposing a substrate to light. It has a support frame 3 to support a mask frame 4, a transfer rollers 5 provided on this support frame 3 to transfer the mask frame 4 in a predetermined direction, a guide frame 8 provided adjoining to the support frame 3 at the same transfer height by the transfer rollers 5, and a protection door 6 (mounting mechanism) to house this guide frame 8 inside the exposing device or mount it free to extend to the outside in the transfer direction.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004163687A JP4214085B2 (en) | 2004-06-01 | 2004-06-01 | Mask frame transfer apparatus and exposure apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200540575A TW200540575A (en) | 2005-12-16 |
TWI266155B true TWI266155B (en) | 2006-11-11 |
Family
ID=35498098
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW94103599A TWI266155B (en) | 2004-06-01 | 2005-02-04 | Mask frame conveying device and exposure device |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4214085B2 (en) |
CN (1) | CN100535754C (en) |
TW (1) | TWI266155B (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4764201B2 (en) * | 2006-02-21 | 2011-08-31 | 株式会社オーク製作所 | Substrate exposure apparatus and substrate exposure method |
JP4922071B2 (en) * | 2007-05-28 | 2012-04-25 | 株式会社オーク製作所 | Exposure drawing device |
US8841065B2 (en) * | 2010-02-12 | 2014-09-23 | Nikon Corporation | Manufacturing method of exposure apparatus and device manufacturing method |
CN104076613B (en) * | 2013-03-27 | 2016-12-28 | 上海微电子装备有限公司 | Step-by-step scanning photo-etching device based on circular masks and exposure method thereof |
JP6327824B2 (en) * | 2013-10-02 | 2018-05-23 | キヤノン株式会社 | Lithographic apparatus, lithography system and article manufacturing method |
JP6365105B2 (en) * | 2014-08-18 | 2018-08-01 | 岩崎電気株式会社 | Irradiation device |
CN104294216B (en) * | 2014-09-27 | 2019-05-10 | 昆山允升吉光电科技有限公司 | A kind of mask plate stereoplasm frame microscope carrier and its method of adjustment |
KR102330182B1 (en) * | 2019-12-10 | 2021-11-23 | (주) 고송이엔지 | Photomask changing structure of exposure for display panel |
KR102314093B1 (en) * | 2021-06-07 | 2021-10-18 | 주식회사 세미다린 | Wide area exposure apparatus |
-
2004
- 2004-06-01 JP JP2004163687A patent/JP4214085B2/en not_active Expired - Fee Related
-
2005
- 2005-02-04 TW TW94103599A patent/TWI266155B/en not_active IP Right Cessation
- 2005-05-31 CN CNB2005100760918A patent/CN100535754C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TW200540575A (en) | 2005-12-16 |
JP2005345638A (en) | 2005-12-15 |
CN1704849A (en) | 2005-12-07 |
JP4214085B2 (en) | 2009-01-28 |
CN100535754C (en) | 2009-09-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |