TWI266155B - Mask frame conveying device and exposure device - Google Patents

Mask frame conveying device and exposure device

Info

Publication number
TWI266155B
TWI266155B TW94103599A TW94103599A TWI266155B TW I266155 B TWI266155 B TW I266155B TW 94103599 A TW94103599 A TW 94103599A TW 94103599 A TW94103599 A TW 94103599A TW I266155 B TWI266155 B TW I266155B
Authority
TW
Taiwan
Prior art keywords
mask frame
transfer
frame
frame conveying
exposing device
Prior art date
Application number
TW94103599A
Other languages
Chinese (zh)
Other versions
TW200540575A (en
Inventor
Shinichiro Mizuguchi
Masahiko Funayama
Masaru Ise
Original Assignee
Orc Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Mfg Co Ltd filed Critical Orc Mfg Co Ltd
Publication of TW200540575A publication Critical patent/TW200540575A/en
Application granted granted Critical
Publication of TWI266155B publication Critical patent/TWI266155B/en

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

To provide a mask frame transfer unit which is feasible for efficient and quick check in maintenance and used in an exposing device. This is a mask frame transfer unit used in an exposing device for exposing a substrate to light. It has a support frame 3 to support a mask frame 4, a transfer rollers 5 provided on this support frame 3 to transfer the mask frame 4 in a predetermined direction, a guide frame 8 provided adjoining to the support frame 3 at the same transfer height by the transfer rollers 5, and a protection door 6 (mounting mechanism) to house this guide frame 8 inside the exposing device or mount it free to extend to the outside in the transfer direction.
TW94103599A 2004-06-01 2005-02-04 Mask frame conveying device and exposure device TWI266155B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004163687A JP4214085B2 (en) 2004-06-01 2004-06-01 Mask frame transfer apparatus and exposure apparatus

Publications (2)

Publication Number Publication Date
TW200540575A TW200540575A (en) 2005-12-16
TWI266155B true TWI266155B (en) 2006-11-11

Family

ID=35498098

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94103599A TWI266155B (en) 2004-06-01 2005-02-04 Mask frame conveying device and exposure device

Country Status (3)

Country Link
JP (1) JP4214085B2 (en)
CN (1) CN100535754C (en)
TW (1) TWI266155B (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4764201B2 (en) * 2006-02-21 2011-08-31 株式会社オーク製作所 Substrate exposure apparatus and substrate exposure method
JP4922071B2 (en) * 2007-05-28 2012-04-25 株式会社オーク製作所 Exposure drawing device
US8841065B2 (en) * 2010-02-12 2014-09-23 Nikon Corporation Manufacturing method of exposure apparatus and device manufacturing method
CN104076613B (en) * 2013-03-27 2016-12-28 上海微电子装备有限公司 Step-by-step scanning photo-etching device based on circular masks and exposure method thereof
JP6327824B2 (en) * 2013-10-02 2018-05-23 キヤノン株式会社 Lithographic apparatus, lithography system and article manufacturing method
JP6365105B2 (en) * 2014-08-18 2018-08-01 岩崎電気株式会社 Irradiation device
CN104294216B (en) * 2014-09-27 2019-05-10 昆山允升吉光电科技有限公司 A kind of mask plate stereoplasm frame microscope carrier and its method of adjustment
KR102330182B1 (en) * 2019-12-10 2021-11-23 (주) 고송이엔지 Photomask changing structure of exposure for display panel
KR102314093B1 (en) * 2021-06-07 2021-10-18 주식회사 세미다린 Wide area exposure apparatus

Also Published As

Publication number Publication date
TW200540575A (en) 2005-12-16
JP2005345638A (en) 2005-12-15
CN1704849A (en) 2005-12-07
JP4214085B2 (en) 2009-01-28
CN100535754C (en) 2009-09-02

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees