TWI265627B - Solid-state imaging device, production method for solid-state imaging device and camera using this - Google Patents

Solid-state imaging device, production method for solid-state imaging device and camera using this

Info

Publication number
TWI265627B
TWI265627B TW093123062A TW93123062A TWI265627B TW I265627 B TWI265627 B TW I265627B TW 093123062 A TW093123062 A TW 093123062A TW 93123062 A TW93123062 A TW 93123062A TW I265627 B TWI265627 B TW I265627B
Authority
TW
Taiwan
Prior art keywords
solid
imaging device
state imaging
light
camera
Prior art date
Application number
TW093123062A
Other languages
Chinese (zh)
Other versions
TW200529418A (en
Inventor
Takumi Yamaguchi
Shigetaka Kasuga
Takahiko Murata
Kenji Orita
Original Assignee
Matsushita Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Ind Co Ltd filed Critical Matsushita Electric Ind Co Ltd
Publication of TW200529418A publication Critical patent/TW200529418A/en
Application granted granted Critical
Publication of TWI265627B publication Critical patent/TWI265627B/en

Links

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Color Television Image Signal Generators (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Abstract

The present invention relates to a solid-state imaging device comprising a plurality of light reception means arranged two-dimensionally in a semiconductor substrate, a filtering means that transmits only lights having wavelengths to be incident to the light reception means, and a light shielding means that shields an incident light and has openings at positions respectively facing the plurality of light reception means, wherein he filtering means is disposed between the plurality of light reception means and the light shielding means, whereby color mixing caused by an oblique light is prevented.
TW093123062A 2003-08-01 2004-08-02 Solid-state imaging device, production method for solid-state imaging device and camera using this TWI265627B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003285254 2003-08-01
JP2004008419 2004-01-15
JP2004189191 2004-06-28

Publications (2)

Publication Number Publication Date
TW200529418A TW200529418A (en) 2005-09-01
TWI265627B true TWI265627B (en) 2006-11-01

Family

ID=36947571

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093123062A TWI265627B (en) 2003-08-01 2004-08-02 Solid-state imaging device, production method for solid-state imaging device and camera using this

Country Status (3)

Country Link
JP (1) JPWO2005013369A1 (en)
CN (1) CN1830087A (en)
TW (1) TWI265627B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5521312B2 (en) * 2008-10-31 2014-06-11 ソニー株式会社 SOLID-STATE IMAGING DEVICE, MANUFACTURING METHOD THEREOF, AND ELECTRONIC DEVICE
KR20140091728A (en) * 2010-01-21 2014-07-22 가부시끼가이샤 도시바 Substrate with interference filter layer and display device using same
JP5506517B2 (en) 2010-04-12 2014-05-28 キヤノン株式会社 Solid-state image sensor
WO2013164902A1 (en) * 2012-05-02 2013-11-07 パナソニック株式会社 Solid-state imaging device
JP6233188B2 (en) * 2013-12-12 2017-11-22 ソニー株式会社 Solid-state imaging device, manufacturing method thereof, and electronic device
JP2016001633A (en) * 2014-06-11 2016-01-07 ソニー株式会社 Solid state image sensor and electronic equipment
JP6910704B2 (en) 2016-12-13 2021-07-28 ソニーセミコンダクタソリューションズ株式会社 Image sensor, manufacturing method of image sensor, plasmon filter, and electronic equipment
JP6789792B2 (en) 2016-12-13 2020-11-25 ソニーセミコンダクタソリューションズ株式会社 Image sensor, electronic equipment
JP2018186151A (en) * 2017-04-25 2018-11-22 ソニーセミコンダクタソリューションズ株式会社 Imaging element and imaging device
CN110608801A (en) * 2019-10-16 2019-12-24 中国电子科技集团公司第五十八研究所 Spectrum calibration structure based on gradient optical microcavity and preparation method
CN111847375B (en) * 2020-07-02 2024-03-15 上海集成电路研发中心有限公司 Infrared detector structure and manufacturing method thereof

Also Published As

Publication number Publication date
TW200529418A (en) 2005-09-01
CN1830087A (en) 2006-09-06
JPWO2005013369A1 (en) 2006-09-28

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees