TWI263922B - A process system health index and method of using the same - Google Patents

A process system health index and method of using the same

Info

Publication number
TWI263922B
TWI263922B TW093113065A TW93113065A TWI263922B TW I263922 B TWI263922 B TW I263922B TW 093113065 A TW093113065 A TW 093113065A TW 93113065 A TW93113065 A TW 93113065A TW I263922 B TWI263922 B TW I263922B
Authority
TW
Taiwan
Prior art keywords
data
processing system
control limit
statistical quantity
same
Prior art date
Application number
TW093113065A
Other languages
English (en)
Other versions
TW200426649A (en
Inventor
Hongyu Yue
Hieu A Lam
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200426649A publication Critical patent/TW200426649A/zh
Application granted granted Critical
Publication of TWI263922B publication Critical patent/TWI263922B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • General Factory Administration (AREA)
  • Testing And Monitoring For Control Systems (AREA)
TW093113065A 2003-05-16 2004-05-10 A process system health index and method of using the same TWI263922B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US47090103P 2003-05-16 2003-05-16

Publications (2)

Publication Number Publication Date
TW200426649A TW200426649A (en) 2004-12-01
TWI263922B true TWI263922B (en) 2006-10-11

Family

ID=33476764

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093113065A TWI263922B (en) 2003-05-16 2004-05-10 A process system health index and method of using the same

Country Status (7)

Country Link
US (1) US7713760B2 (zh)
EP (1) EP1639632B1 (zh)
JP (1) JP4468366B2 (zh)
KR (1) KR100976648B1 (zh)
CN (1) CN100419983C (zh)
TW (1) TWI263922B (zh)
WO (1) WO2004105101A2 (zh)

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US8494798B2 (en) * 2008-09-02 2013-07-23 Mks Instruments, Inc. Automated model building and batch model building for a manufacturing process, process monitoring, and fault detection
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US8674844B2 (en) * 2009-03-19 2014-03-18 Applied Materials, Inc. Detecting plasma chamber malfunction
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KR101290287B1 (ko) * 2010-11-26 2013-07-26 구흥섭 대표값 산출 장치 및 방법
US9197196B2 (en) 2012-02-22 2015-11-24 Lam Research Corporation State-based adjustment of power and frequency
US10157729B2 (en) 2012-02-22 2018-12-18 Lam Research Corporation Soft pulsing
US9462672B2 (en) 2012-02-22 2016-10-04 Lam Research Corporation Adjustment of power and frequency based on three or more states
US9114666B2 (en) 2012-02-22 2015-08-25 Lam Research Corporation Methods and apparatus for controlling plasma in a plasma processing system
US10128090B2 (en) 2012-02-22 2018-11-13 Lam Research Corporation RF impedance model based fault detection
US9842725B2 (en) 2013-01-31 2017-12-12 Lam Research Corporation Using modeling to determine ion energy associated with a plasma system
US10289108B2 (en) * 2012-03-15 2019-05-14 General Electric Company Methods and apparatus for monitoring operation of a system asset
US9541471B2 (en) 2012-04-06 2017-01-10 Mks Instruments, Inc. Multivariate prediction of a batch manufacturing process
US9429939B2 (en) 2012-04-06 2016-08-30 Mks Instruments, Inc. Multivariate monitoring of a batch manufacturing process
KR20140001504A (ko) 2012-06-27 2014-01-07 엘지이노텍 주식회사 터치 패널의 전극 기판 및 그 제조 방법
US10950421B2 (en) * 2014-04-21 2021-03-16 Lam Research Corporation Using modeling for identifying a location of a fault in an RF transmission system for a plasma system
KR101522385B1 (ko) * 2014-05-02 2015-05-26 연세대학교 산학협력단 반도체 제조 공정에서의 이상 감지 방법, 장치 및 기록매체
US10838583B2 (en) 2016-05-17 2020-11-17 General Electric Company Systems and methods for prioritizing and monitoring device status in a condition monitoring software application
US10606253B2 (en) * 2017-02-08 2020-03-31 United Microelectronics Corp. Method of monitoring processing system for processing substrate
US10003018B1 (en) * 2017-05-08 2018-06-19 Tokyo Electron Limited Vertical multi-batch magnetic annealing systems for reduced footprint manufacturing environments
US10224187B1 (en) * 2018-02-06 2019-03-05 Lam Research Corporation Detecting partial unclamping of a substrate from an ESC of a substrate processing system
RU2686257C1 (ru) * 2018-04-27 2019-04-24 Ационерное общество "РОТЕК" (АО "РОТЕК") Способ и система удалённой идентификации и прогнозирования развития зарождающихся дефектов объектов
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KR102252529B1 (ko) * 2019-11-22 2021-05-17 세메스 주식회사 반도체 제조 설비 점검을 위한 기준값 결정 장치 및 방법
US11269003B2 (en) * 2020-02-11 2022-03-08 Nanya Technology Corporation System and method for monitoring semiconductor manufacturing equipment via analysis unit
US12033838B2 (en) * 2020-03-24 2024-07-09 Tokyo Electron Limited Plasma processing apparatus and wear amount measurement method
CN112326622A (zh) * 2020-05-30 2021-02-05 北京化工大学 一种基于simca-svdd的细菌拉曼光谱识别分类方法
CN113190797B (zh) * 2021-04-18 2024-07-16 南京医工交叉创新研究院有限公司 一种基于在线滚动判别特征分析的pta装置粗差判别方法
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Also Published As

Publication number Publication date
EP1639632A4 (en) 2011-03-09
WO2004105101A3 (en) 2005-01-27
WO2004105101A2 (en) 2004-12-02
KR20060009359A (ko) 2006-01-31
JP4468366B2 (ja) 2010-05-26
CN1820362A (zh) 2006-08-16
KR100976648B1 (ko) 2010-08-18
EP1639632B1 (en) 2017-06-07
CN100419983C (zh) 2008-09-17
US20040259276A1 (en) 2004-12-23
JP2007502026A (ja) 2007-02-01
EP1639632A2 (en) 2006-03-29
TW200426649A (en) 2004-12-01
US7713760B2 (en) 2010-05-11

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