1257487 15385twf.doc/g 九、發明說明： 【發明所屬之技術領域】 本發明是有關於一種彩色遽光片的製造方法，且特別 是有關於一種可避免相鄰次晝素區域之顏料相互混色之彩 色濾光片的製程。 【先前技術】 隨著電腦、網路以及多媒體技術之效能的發展，影像 資訊已逐漸地從類比資訊轉變為數位資訊。近年來，許多 電子裝置的重量與尺寸也已經變得較輕且薄。以顯示裝置 為例，雖然傳統的陰極射線管（cathode ray tube, CRT)被 廣泛地使用，然而，其卻具有較大體積、高輻射量、重量 較重以及高耗能等缺點。因此，平面顯示器（f]at panel display，FPD)所具有的尺寸薄、重量輕、平坦晝面、無輻 射以及低耗能專優點’使其逐漸地成為顯示裝置之主流。 目前常見的平面顯示器例如包括液晶顯示器（liquid crystal display，LCD )、有機電激發光顯示器（〇rganic electro-luminescence display，OLED )或電漿顯示器（plasma display panel，PDP)，其中尤以液晶顯示器之發展最為成 熟0 習知的液晶顯示器係由一薄膜電晶體（thin fllm transistor，TFT)陣列、一彩色濾光片，以及—設置於薄膜 電晶體陣列與彩色濾光片之間的一液晶層所共同組成。一 般而a ’猎由彩色渡光片可使得液晶顯不器進行全彩化顯 示。彩色濾光片係架構於一透明玻璃基板上，其中一遮光 1257487 1 5385twf.doc/g 層與一彩色濾光層係分別配置於透明玻璃基板上，遮光層 係用以遮蔽光線，而彩色濾光層包括對應每一次畫素配置 之紅色濾光單元、綠色濾光單元以及藍色濾光單元。 近來，一種利用噴墨印刷（inkjet printing)形成彩色 /慮光層的方法被發展出來。此製造方法首先於一基板上开) 成一遮光層，以定義出多個次畫素區域。然後，進行一噴 墨印刷製程以將顏料（紅色、綠色、藍色）注人到遮光層 ，定義的次畫素區域中。繼之，進行—細烤製程 bakmg process)以將顏料固化。 …η只$叩明衣杜农忭衫色濾来 法，仍然具有一些缺點。例如，在噴墨 ^ 將 猶大於次晝素區域所具有的體:= 旦素區或之顏料便可能產生混色之問題。 U曰 <刖，先利用一電漿改質製 ㈣卿），而在遮光層上形成_ 则編 m⑽，不準確之製程她可能” ==:(，is::=w^ 題。再者，在魏改質製程情間溢流的問 係為有毒《，也會造衫全性以切（⑹ 1257487 15385twf.doc/g 此外，日本專利公開號09230127中提供一種方法， 其係先於基板上全面性地塗佈一 25%的 C8F17C2H4-Si-(〇CH3)3/曱醇溶液，（ 係為日本東芝silicon公司製造之產品，rTSL_8233」）。 然後’再利用1%之氟化酸緩衝溶液（buffer flu〇ric acid， 50%氫氟酸（HF) : 40%氟化銨（NH4F))進行一蝕刻 製程。繼之，再於次畫素區域中形成彩色濾光層。由於25% 的甲醇溶液係塗佈在全面的基板 上，所以即使在之後進行一清洗製程，次晝素區域中的基 板表面也仍然會具有疏水性，因此在相鄰次晝素區域中之 顏料仍會產生混色之問題。此外，上述全部製程的時間需 長達8小時以上，且氫氟酸之使用具有相當的危險性。 【發明内容】 有鑑於此，本發明的目的就是在提供_種製造彩色濾 光片的方法，適於避免相鄰次晝素區域之顏料的混色問題Υ 本發明提出一種製造彩色濾光片的方法。首先，提供 一基板，其中基板上係配置有一遮光層，且此遮光層係於 基板上定義出多個次畫素區域。接著，進行一模版印刷製 程，以於此遮光層上形成一疏水層。繼之，於次晝素區域^ 中形成一彩色濾、光層。 3 在本發明之一實施例中，上述之模版印刷製程的步驟 例如先提供一模版（stencil)位於基板上，其中模版覆蓋 -人畫素區域並暴露出遮光層。接著，於模版所暴露出之遮 光層上填入一液態疏水材料。繼之，對液態疏水材料進行 7 1257487 15385twf.doc/g 固化處理’以形成疏水層。之後，移除模版 在本發明之一實施例中，上述之疏水屑 虫鼠(paraffin)。 貝匕括石 、在本㈣之-實施例中，上述之製造彩色據光片的方 法在形成彩色慮光層後，更包括移除疏水層。 在本發明之一實施例中，係使用—溶液去除上述之萨 水層，此溶液例如為乙喊（ether )。 ”1" 嘴墨印刷製程 例如為一黑矩1257487 15385twf.doc/g IX. Description of the Invention: [Technical Field] The present invention relates to a method for manufacturing a color calendering sheet, and more particularly to a method for avoiding color mixing of adjacent sub-tenk regions The process of color filters. [Prior Art] With the development of the performance of computers, networks, and multimedia technologies, image information has gradually changed from analog information to digital information. In recent years, the weight and size of many electronic devices have also become lighter and thinner. Taking a display device as an example, although a conventional cathode ray tube (CRT) is widely used, it has disadvantages such as large volume, high radiation amount, heavy weight, and high energy consumption. Therefore, the flat panel display (FPD) has a thin size, light weight, flat surface, no radiation, and low power consumption, which has gradually become the mainstream of display devices. At present, a common flat panel display includes, for example, a liquid crystal display (LCD), an organic electro-luminescence display (OLED), or a plasma display panel (PDP), in particular, a liquid crystal display. The most mature development of the conventional liquid crystal display is a thin film transistor (TFT) array, a color filter, and a liquid crystal layer disposed between the thin film transistor array and the color filter Together. In general, a ‘hunting by color light-passing film allows the liquid crystal display to be fully colorized. The color filter is arranged on a transparent glass substrate, wherein a light-shielding 1257487 1 5385 twf.doc/g layer and a color filter layer are respectively disposed on the transparent glass substrate, and the light shielding layer is used for shielding light, and the color filter is used. The light layer includes a red filter unit, a green filter unit, and a blue filter unit corresponding to each pixel configuration. Recently, a method of forming a color/lighting layer by inkjet printing has been developed. The manufacturing method firstly opens a light shielding layer on a substrate to define a plurality of sub-pixel regions. Then, an ink jet printing process is performed to inject the pigment (red, green, blue) into the shading layer, the defined sub-pixel area. Following this, a bakmg process is performed to cure the pigment. ... η only $ 叩 Ming clothing Du Nong 忭 color filter method, still has some shortcomings. For example, in the case where the inkjet ^ will be larger than the body of the secondary halogen region: the pigment or the pigment may cause color mixing. U曰<刖, first use a plasma to change the system (4) Qing), and form _ on the shading layer, then edit m (10), inaccurate process she may "==: (, is::=w^. The problem of overflowing in Wei's reformation process is toxic, and it will also be made to cut ((6) 1257487 15385twf.doc/g. In addition, Japanese Patent Publication No. 09230127 provides a method that precedes A 25% C8F17C2H4-Si-(〇CH3)3/sterol solution (a product manufactured by Toshiba Silicon Co., Ltd., rTSL_8233) was applied to the substrate in a comprehensive manner. Then, 1% of the fluorinated acid was reused. A buffer solution (buffer flu〇ric acid, 50% hydrofluoric acid (HF): 40% ammonium fluoride (NH4F)) is subjected to an etching process, and then a color filter layer is formed in the sub-pixel region. The % methanol solution is applied to the entire substrate, so even if a cleaning process is performed afterwards, the surface of the substrate in the secondary halogen region will still be hydrophobic, so the pigment in the adjacent secondary halogen region will still be The problem of color mixing occurs. In addition, all the above processes take up to 8 hours or more, and hydrofluoric acid The invention has considerable dangers. SUMMARY OF THE INVENTION In view of the above, it is an object of the present invention to provide a method for manufacturing a color filter suitable for avoiding the problem of color mixing of pigments in adjacent sub-halogen regions. A method for manufacturing a color filter. First, a substrate is provided, wherein a light shielding layer is disposed on the substrate, and the light shielding layer defines a plurality of sub-pixel regions on the substrate. Then, a stencil printing process is performed to A water-repellent layer is formed on the light-shielding layer. Then, a color filter and a light layer are formed in the sub-tenk region. 3 In an embodiment of the invention, the step of the stencil printing process is provided, for example, by first providing a template. (stencil) is located on the substrate, wherein the stencil covers the human pixel region and exposes the light shielding layer. Then, a liquid hydrophobic material is filled on the light shielding layer exposed by the stencil. Then, the liquid hydrophobic material is subjected to 7 1257487 15385 twf .doc/g curing treatment to form a hydrophobic layer. Thereafter, the stencil is removed in one embodiment of the invention, the above-mentioned hydrophobic parasite (paraffin). In the embodiment of the present invention, the method for manufacturing the color light-receiving sheet further includes removing the hydrophobic layer after forming the color light-receiving layer. In one embodiment of the present invention, the solution is used to remove the above-mentioned Saskatchewan. The water layer, this solution is, for example, an ether. "1" The ink printing process is, for example, a black moment.
在本發明之一實施例中，係藉由進行— 或一微影製程而形成上述之彩色濾光層。 在本發明之一貫施例中’上述之遮光層 陣0 在本發明之-實施例中’上述之遮光層之材質包括環 氧樹酯(Epoxy resin)。 本發明提出另一種製造彩色濾光片的方法。首先，提 供一基板，其中基板上配置有一遮光層，且此遮光層係於 基板上定義出多個次畫素區域。接著，藉由噴墨印刷製程 對遮光層進行一表面矽烷化處理（surface silylated treatment)。之後，於次晝素區域中形成一彩色濾光層。 在本發明之一實施例中，上述之遮光層例如為一黑矩 陣。 在本發明之一實施例中，上述之遮光層之材質包括環 氧樹酷。 在本發明之一實施例中，上述之表面矽烷化處理包括 塗佈一石夕烧化物於遮光層之表面上，且此石夕烧化物之化學 8 1257487 15385twf.doc/g j例如是2X-Si-2Y，其中X係為鹵素，且γ為一疏水官 能基。舉例而言，矽烷化物例如包括二曱基二氣矽烷 (Dimethyldichlorosilane，DMDCS )。 在本發明之一實施例中，上述之製造彩色濾光片的方 法，在表面矽烷化處理的步驟與形成彩色濾光層的步驟之 間’更包括進行一清洗製程。 在本發明之一實施例中，上述之清洗製程包括使用一 洛液清洗遮光層。舉例而言，此溶液包括曱醇。 在本發明之一實施例中，係藉由進行一喷墨印刷製程 或一微影製程而形成上述之彩色濾光層。 本叙明因在形成彩色濾、光層之前，採用模版印刷而於 遮光層上形成疏水層或是藉由喷墨印刷製程對遮光層進行 一表面矽烷化處理，因此可徹底避免相鄰次畫素區域之顏 料產生混色之問題，進而提升製程之良率。 為讓本發明之上述和其他目的、特徵和優點能更明顯 易懂，下文特舉較佳實施例，並配合所附圖式，作詳細說 明如下。 【實施方式】 圖1A〜1G緣示為本發明一較佳實施例中一種製作彩 色濾光片之方法的製作流程剖面示意圖。 請參照圖1A，首先，提供一基板1〇〇a，其中，此基 板100a例如為一具有高透光性之玻璃基板。而基板i〇〇a 上配置有一遮光層110，且此遮光層110係於基板1〇(^上 定義出多個次畫素區域102。其中，遮光層ho例如為一 1257487 15385twf.doc/g 黑矩陣，且遮光屛lln + u 他具有良好之光;蔽性與低本=其 較佳實施例中，形成遮。在本發明之-法於基板上咖形成―的方*包括藉由旋轉塗佈 此光敏感性樹g旨層|i由f ^蝴崎（未繪示）。接著， 遮光層…俾用 =f趣以形成—糊 以增力，示色彩的^區隔所射出之不同顏色的色光， 於此遮= Γ、81、1B〜1E ’進行一模版印刷製程，以 模版15(wL^形成—疏水層120。如圖1B所緣示，一 」查奸^叹置於基板職上，其中，模版15G係覆蓋 ，旦1G2並暴露出遮光層m。繼之，如圖W所繪 ^0 = μ主刮刀160將一液態疏水性材料122填入遮光層 ^的上表面’其中，此疏水性材料例如為錢。繼之， D所繪示，此液態疏水性材料122係藉由冷卻處理 =化並進而形成疏水層12〇。之後，如圖所繪示， 攸土板100a上移除模版150，並且保持疏水層丨％芸於 遮光層110上。 ^ 接著，請參照圖1F，於次晝素區域1〇2中形成一彩色 濾光層130。如圖1F所繪示，利用一喷墨印刷製程或者是 一微影製程將顏料132注入到遮光層11〇所定義的次畫素 區域102中。注入次畫素區域1〇2的顏料例如為紅色、綠 色以及藍色顏料。並且，利用一曝光製程或是一乾燥製程 將上述之顏料132固化，進而於次畫素區域1〇2中形成彩 色濾光層130。此彩色濾光層130例如包括對應每個次書 1257487 15385twf.doc/g 素區域102排列之紅色渡光單元、綠色渡光單元以及藍色 慮光單元。 、之後，d青參照® 1G，利用—溶液移除疏水層12〇，此 溶液例如為乙醚。然後，進行-清洗製程與一熱洪烤製程。 如此-來，依據上述的製程，便可製造出如圖m所喻示 之彩色濾光片100。 ，上所述：在本發明之—較佳實施例中，係採用例如 • 石犧，其具有高疏水性以及低炼點（約為5〇。(3〜65。〇的 特性，而在遮光層11〇上形成—疏水層。值得注意的是， 由於是利用模版印刷製程形成疏水層，因此除了遮光層之 外的其他區域不會被疏水材料所覆蓋，且此種製程較習知 的方法簡單，而製作成本也較低。 /圖2A〜2D繪示為本發明另_較佳實施例中—種製作 彩色濾光片之方法的製作流程剖面示意圖。 . 如圖2A所繪示，首先，提供一基板2〇〇a，且基板2〇此 上設置有一遮光層210,其係於基板2〇加上定義出多個次 # t素區域202。其中，遮光層21〇例如為一黑矩陣，且遮 光層训之組成材質例如為環氧樹醋，或是其他具有良好 之光遮蔽性與低反射率之材質。然而，此遮光層2ι〇之功 效與製程皆與上述本發明之較佳實施例中相同或者類似， 在此即不再予以詳述。 ' 接著，如圖2B所繪示，藉由噴墨印刷製程對遮光層 210進行一表面矽烷化處理。此表面矽烷化處理例如是塗 佈一石夕烧化物於遮光層21〇上，其中石夕炫化物之化學式例 1257487 15385twf.doc/g 如為2X-Si-2Y，其中X係為鹵素，其例如是〔丨，而γ 一疏水官能基，其例如為CH3。在一較佳實施例中，石夕; 化物例如為含有 20%之二甲基二氯石夕元 (Dimethyldichlorosilane，DMDCS ) / 曱苯之溶液 222。圖 繪示為二曱基二氣石夕烧化物與環氧樹酯組成之遮光層之 的反應示意圖。如圖3所繪示，二曱基二氯矽烷的^In one embodiment of the invention, the color filter layer described above is formed by performing - or a lithography process. In the conventional embodiment of the present invention, the above-mentioned light shielding layer 0 is in the embodiment of the present invention. The material of the above light shielding layer includes an epoxy resin. The present invention proposes another method of manufacturing a color filter. First, a substrate is provided, wherein a light shielding layer is disposed on the substrate, and the light shielding layer defines a plurality of sub-pixel regions on the substrate. Next, the light-shielding layer is subjected to a surface silylated treatment by an inkjet printing process. Thereafter, a color filter layer is formed in the secondary halogen region. In an embodiment of the invention, the light shielding layer is, for example, a black matrix. In an embodiment of the invention, the material of the light shielding layer comprises an epoxy tree. In an embodiment of the invention, the surface crystallization treatment comprises coating a ceramsite on the surface of the light-shielding layer, and the chemistry of the shovel is 8 1257487 15385 twf.doc/gj, for example, 2X-Si- 2Y, wherein X is a halogen and γ is a hydrophobic functional group. For example, the decane compound includes, for example, Dimethyldichlorosilane (DMDCS). In one embodiment of the invention, the method of fabricating a color filter described above further includes performing a cleaning process between the step of surface crystallization and the step of forming a color filter layer. In an embodiment of the invention, the cleaning process includes cleaning the light shielding layer with a solution. For example, this solution includes sterols. In one embodiment of the invention, the color filter layer described above is formed by performing an ink jet printing process or a lithography process. The present invention can completely avoid the adjacent painting by forming a hydrophobic layer on the light shielding layer by stencil printing or by performing a surface crystallization treatment on the light shielding layer by an inkjet printing process before forming a color filter or a light layer. The pigment in the prime region produces a problem of color mixing, which in turn increases the yield of the process. The above and other objects, features and advantages of the present invention will become more <RTIgt; [Embodiment] Figs. 1A to 1G are schematic cross-sectional views showing a manufacturing process of a method for fabricating a color filter according to a preferred embodiment of the present invention. Referring to Fig. 1A, first, a substrate 1a is provided, wherein the substrate 100a is, for example, a glass substrate having high light transmittance. A light shielding layer 110 is disposed on the substrate i〇〇a, and the light shielding layer 110 is defined on the substrate 1 to define a plurality of sub-pixel regions 102. The light shielding layer ho is, for example, a 1257487 15385 twf.doc/g. a black matrix, and a light-shielding 屛lln + u which has good light; a good and a low-profile = in its preferred embodiment, a mask is formed. In the present invention, the method of forming a substrate is included by rotating Applying this light-sensitive tree g layer|i is made by f^蝴崎 (not shown). Then, the light-shielding layer is used to form a paste to increase the force, and the color is separated by ^. The color light of different colors, 遮, 81, 1B~1E ' is subjected to a stencil printing process, and the stencil 15 (wL^ is formed - the hydrophobic layer 120. As shown in Fig. 1B, one) In the substrate, the stencil 15G is covered, and 1G2 is exposed and the light shielding layer m is exposed. Then, as shown in Fig. W, the main scraper 160 fills a liquid hydrophobic material 122 into the upper surface of the light shielding layer. 'Where, the hydrophobic material is, for example, money. Then, as shown by D, the liquid hydrophobic material 122 is cooled and processed to form a thin layer. After the layer 12 is turned on, the stencil 150 is removed from the alumina board 100a, and the hydrophobic layer 保持% is placed on the light shielding layer 110. ^ Next, please refer to FIG. 1F, in the sub-small area 1〇. A color filter layer 130 is formed in 2. As shown in Fig. 1F, the pigment 132 is injected into the sub-pixel region 102 defined by the light-shielding layer 11 by an ink-jet printing process or a lithography process. The pigments of the pixel region 1〇2 are, for example, red, green, and blue pigments, and the pigment 132 is cured by an exposure process or a drying process to form color filters in the sub-pixel region 1〇2. The layer 130. The color filter layer 130 includes, for example, a red light-emitting unit, a green light-emitting unit, and a blue light-receiving unit arranged corresponding to each of the secondary books 1257487 15385 twf.doc/g area 102. 1G, using a solution to remove the hydrophobic layer 12〇, the solution is, for example, diethyl ether. Then, a cleaning process and a hot flooding process are performed. Thus, according to the above process, the figure can be produced as shown in FIG. Color filter 100. , described above In a preferred embodiment of the invention, for example, a stone is used, which has a high hydrophobicity and a low refining point (approximately 5 Å. (3 to 65. 〇 characteristics, formed on the opaque layer 11 〇) - Hydrophobic layer. It is worth noting that since the hydrophobic layer is formed by the stencil printing process, other regions than the light shielding layer are not covered by the hydrophobic material, and such a process is simpler than the conventional method, and the manufacturing cost is low. It is also lower. / Figures 2A to 2D are schematic cross-sectional views showing the manufacturing process of the method for fabricating a color filter according to another preferred embodiment of the present invention. As shown in FIG. 2A, first, a substrate 2A is provided, and a light shielding layer 210 is disposed on the substrate 2, and a plurality of secondary regions 202 are defined on the substrate 2A. The light shielding layer 21 is, for example, a black matrix, and the material of the light shielding layer is, for example, epoxy vinegar or other materials having good light shielding properties and low reflectance. However, the functions and processes of the light-shielding layer 2 are the same as or similar to those of the preferred embodiment of the present invention described above, and will not be described in detail herein. Next, as shown in Fig. 2B, the light-shielding layer 210 is subjected to a surface decaneization treatment by an inkjet printing process. The surface decaneization treatment is, for example, coating a ceramsite on the light shielding layer 21, wherein the chemical formula of the lithium compound is 1257487 15385 twf.doc/g, such as 2X-Si-2Y, wherein X is a halogen, for example, It is [丨, and γ a hydrophobic functional group, which is, for example, CH3. In a preferred embodiment, the compound is, for example, a solution 222 containing 20% dimethyldichlorosilane (DMDCS) / benzene. The figure is a schematic diagram of the reaction of a light-shielding layer composed of a dimercapto-dichaline gas-sintered alloy and an epoxy resin. As shown in Figure 3, dimercapto-dichlorodecane
子可與環氧樹酯中的-OH基反應，進而在遮光層之表面升； 成具有-〇-Si-CH3之疏水性結構。 5 繼之，請芩照圖2C，使用一清洗溶液224進行—清 洗製私。在一較佳貫施例中，此清洗溶液例如為甲醇，因 為曱醇可將二曱基二氣矽烷中未鍵結之_C1原子取代為 -CH3官能基。然後，可利用風刀（未繪示）去除清洗溶液 224。 •之後，如圖2D所繪示，進行一喷墨印刷製程或一微 影製，，而於次畫素區域2〇2中形成彩色濾光層23〇。其 如疋將包括紅色、綠色以及藍色等顏料232填入次畫素 區域202，並且利用一熱烘烤製程將上述顏料2幻固化， 進而於次晝素區域202中形成彩色濾光層23〇。 、在上述之較佳實施例中，係利用噴墨印刷方式對遮光 二進^石夕烧化處理以將遮光層改質（modified)。由於 藉由噴墨印财式可將墨水僅塗佈於遮光層上，所以次畫 素區域並不會财⑦化而改質。因此，當顏料注人到次畫 域時，顏料溢流的現象並不會發生，進而可避免相鄰 人旦素之間的混色現象。此外，使用喷墨方式亦可節省矽 12 1257487 15385twf.doc/g 烷化物之使用量。 值得一提的是，雖然上述實施例僅提出彩色濾光片的 製程，但是熟知此技藝者可知，上述之方法也可應用於有 钱叙光一極體（polymer light emitted diode, PLED )的製程 中，以對銦錫氧化物（ITO)、井區（thewell)、觸排（bank) 或是電洞注入層（hole through layer，HTL)等結構介面進 行化學性改質。The precursor may react with the -OH group in the epoxy resin to further rise on the surface of the light-shielding layer; and form a hydrophobic structure having -〇-Si-CH3. 5 Following this, please refer to Figure 2C, using a cleaning solution 224 - cleaning and manufacturing. In a preferred embodiment, the cleaning solution is, for example, methanol, because the sterol can be substituted for the unbonded _C1 atom in the dimercaptodioxane to the -CH3 functional group. The cleaning solution 224 can then be removed using an air knife (not shown). • Thereafter, as shown in Fig. 2D, an ink jet printing process or a lithography process is performed, and a color filter layer 23 is formed in the sub-pixel area 2〇2. For example, the pigment 232 including red, green, and blue is filled into the sub-pixel region 202, and the pigment 2 is cured by a thermal baking process to form a color filter layer 23 in the sub-tend region 202. Hey. In the preferred embodiment described above, the shading is modified by an ink jet printing method to modify the shading layer. Since the ink can be applied only to the light shielding layer by the ink jet printing type, the sub-picture area is not modified and modified. Therefore, when the pigment is injected into the sub-picture domain, the phenomenon of pigment overflow does not occur, thereby avoiding the color mixing phenomenon between adjacent human elements. In addition, the use of inkjet methods can also save the use of 矽 12 1257487 15385 twf.doc / g alkylate. It should be noted that although the above embodiment only proposes the process of the color filter, it is known to those skilled in the art that the above method can also be applied to the process of the polymer light emitting diode (PLED). Chemically modifying the structural interface of indium tin oxide (ITO), the well, the bank, or the hole through layer (HTL).
綜上所述，本發明之製造彩色濾光片的方法係藉由形 成疏水層或疋對遮光層之表面進行一矽烧化處理，而可以 徹底解決相鄰次晝素區域之間的混色問題。相較於習知技 術而言，本發明提供一較安全及較簡單之製程，並具有較 低之成本與較高之製程良率。 雖然本發明已以較佳實施例揭露如上，然其並非用以 限定本發明，任何熟習此技藝者，在不脫離本發明之 和範圍内，當可作些許之更動與潤飾，因此本發明之保 範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 圖1A〜1G繪示為本發明一較佳實施例中一種製作奢 色濾光片之方法的製作流程剖面示意圖。 、> "圖2A〜2D繪示為本發明另一較佳實施例中一種製 彩色濾光片之方法的製作流程剖面示意圖。 圖3繪示為二甲基二氣石夕烧化物與環氧樹醋組成 光層之間的反應示意圖。 、、、 【主要元件符號說明】 13 1257487 1 5385twf.doc/g 100 ··彩色濾光片 100a、200a :基板 102、202 :次晝素區域 110、210 :遮光層 120 :疏水層 122 :液態疏水性材料 130、230 :彩色濾光層 132、232 ·•顏料 150 :模版 160 :刮刀 222 :溶液 224 :清洗溶液In summary, the method for fabricating a color filter of the present invention can completely solve the problem of color mixing between adjacent sub-halogen regions by forming a hydrophobic layer or a crucible to heat-treat the surface of the light-shielding layer. Compared with the prior art, the present invention provides a safer and simpler process with lower cost and higher process yield. Although the present invention has been disclosed in the above preferred embodiments, it is not intended to limit the present invention, and those skilled in the art can make some modifications and retouchings without departing from the scope of the present invention. The scope of coverage is subject to the definition of the scope of the patent application attached. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1A to FIG. 1G are schematic cross-sectional views showing a manufacturing process of a method for fabricating a luxury color filter according to a preferred embodiment of the present invention. 2A to 2D are schematic cross-sectional views showing a manufacturing process of a method of manufacturing a color filter according to another preferred embodiment of the present invention. Fig. 3 is a schematic view showing the reaction between the dimethyl sillimanite and the epoxy vinegar. , , , [Description of main component symbols] 13 1257487 1 5385twf.doc/g 100 · Color filters 100a, 200a: Substrates 102, 202: Sub-alkali regions 110, 210: Light-shielding layer 120: Hydrophobic layer 122: Liquid Hydrophobic material 130, 230: color filter layer 132, 232 · • Pigment 150: stencil 160: doctor blade 222: solution 224: cleaning solution
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