TWI255324B - Processing system and method of organic exhaust - Google Patents
Processing system and method of organic exhaust Download PDFInfo
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- TWI255324B TWI255324B TW93100213A TW93100213A TWI255324B TW I255324 B TWI255324 B TW I255324B TW 93100213 A TW93100213 A TW 93100213A TW 93100213 A TW93100213 A TW 93100213A TW I255324 B TWI255324 B TW I255324B
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- exhaust gas
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- 238000000034 method Methods 0.000 title claims abstract description 27
- 238000012545 processing Methods 0.000 title claims abstract description 19
- 239000010815 organic waste Substances 0.000 claims abstract description 46
- 239000007789 gas Substances 0.000 claims description 142
- 238000006243 chemical reaction Methods 0.000 claims description 60
- 230000003647 oxidation Effects 0.000 claims description 45
- 238000007254 oxidation reaction Methods 0.000 claims description 45
- 238000012546 transfer Methods 0.000 claims description 21
- 239000012855 volatile organic compound Substances 0.000 claims description 21
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims description 20
- 238000003795 desorption Methods 0.000 claims description 19
- 238000001179 sorption measurement Methods 0.000 claims description 18
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 17
- 238000001816 cooling Methods 0.000 claims description 11
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 10
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 8
- 229910052717 sulfur Inorganic materials 0.000 claims description 8
- 239000011593 sulfur Substances 0.000 claims description 8
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 229910021529 ammonia Inorganic materials 0.000 claims description 4
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 4
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 239000001569 carbon dioxide Substances 0.000 claims description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 3
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical group O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 3
- 238000007599 discharging Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 239000002912 waste gas Substances 0.000 claims description 3
- 238000009826 distribution Methods 0.000 claims description 2
- 238000003672 processing method Methods 0.000 claims 3
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims 1
- 230000001376 precipitating effect Effects 0.000 claims 1
- 239000000047 product Substances 0.000 description 30
- 238000004519 manufacturing process Methods 0.000 description 11
- 239000004065 semiconductor Substances 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000000197 pyrolysis Methods 0.000 description 3
- 230000008929 regeneration Effects 0.000 description 3
- 238000011069 regeneration method Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000003915 air pollution Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 231100001244 hazardous air pollutant Toxicity 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 150000003384 small molecules Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002918 waste heat Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 206010061218 Inflammation Diseases 0.000 description 1
- 206010028980 Neoplasm Diseases 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000000711 cancerogenic effect Effects 0.000 description 1
- 231100000315 carcinogenic Toxicity 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000004054 inflammatory process Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 238000005200 wet scrubbing Methods 0.000 description 1
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- Treating Waste Gases (AREA)
Abstract
Description
1255324 五、發明說明（1) 【技術領域】 本發明是關於一種有機廢氣處理系統及方法，特別是 關於一種利用電漿火炬以安全處理有機廢氣，更可善用廢 熱以提供轉輪脫附再生之熱源和預熱進氣溫度的有效省能 的有機廢氣處理系統及方法。 【先前技術】 隨著台灣高科技產業的蓬勃發展，使得半導體產業成 長迅速，其中半導體產業可以包含有積體電路產業與光電 產業，對國内經濟發展具有極大的影響力，但半導體元件 製程可隨之衍生了許多廢液、廢水、廢氣等環保問題，例 如：半導體廠於黃光製程中分別有清洗、塗底、光阻覆 蓋、軟烤（Soft bake)、曝光、烘烤、顯影、硬烤等等步 驟，會使用到各式清洗液、光阻液等有機溶劑，造成揮發 性有機物 V0Cs( Volatile Organic Compounds; — 般係指 在標準狀態下，其蒸汽壓大於 0· 1 mmHg以上之有機化合 物）逸散污染，而這些VOCs絕大部份屬於有害性空氣污染 物（Hazardous Air Pollutants，HAPs)，人體長期暴露 於含高濃度VOCs的環境中，會產生中毒及致癌性腫瘤等生 理反應。除此之外，大氣中的VOCs會參與光化學反應，導 致大氣中臭氧濃度昇高及產生高氧化性污染物如PAN等。因 此，這些溢散出來的有機溶劑蒸氣，必須加以處理，不可 任其直接排放到大氣中。 而行政院環境保護署也於民國八十八年一月六日發布1255324 V. INSTRUCTION DESCRIPTION (1) [Technical Field] The present invention relates to an organic exhaust gas treatment system and method, and more particularly to a method for safely treating organic waste gas by using a plasma torch, and more preferably utilizing waste heat to provide regenerator regeneration of the rotor. An effective energy-saving organic waste gas treatment system and method for heat source and preheating intake air temperature. [Prior Art] With the rapid development of Taiwan's high-tech industry, the semiconductor industry has grown rapidly. The semiconductor industry can include the integrated circuit industry and the optoelectronic industry, which has great influence on the domestic economic development, but the semiconductor component process can be Along with the environmental problems such as waste liquid, waste water and waste gas, for example, the semiconductor factory has cleaning, coating, photoresist coating, soft bake, exposure, baking, developing and hardening in the process of yellow light. In the steps of baking and the like, organic solvents such as various cleaning liquids and photoresists are used to cause volatile organic compounds V0Cs (Volatile Organic Compounds; generally refers to organic substances whose vapor pressure is greater than 0·1 mmHg under standard conditions). Compounds) are fugitive, and most of these VOCs are Hazardous Air Pollutants (HAPs). Long-term exposure to high concentrations of VOCs can cause physiological reactions such as poisoning and carcinogenic tumors. In addition, VOCs in the atmosphere participate in photochemical reactions, resulting in elevated concentrations of ozone in the atmosphere and the production of highly oxidizing contaminants such as PAN. Therefore, these spilled organic solvent vapors must be disposed of and must not be discharged directly into the atmosphere. The Environmental Protection Agency of the Executive Yuan was also released on January 6, 1998.
第8頁 1255324 五、發明說明（2) 「半導體製造業空氣污染管制及排放標準」，依照該標準 規定，全國半導體製造業中從事積體電路晶圓製造及封 裝、磊晶、光罩製造及導線架製造等作業者，其全廠揮發 性有機物（VOCs)及硝酸、硫酸、鹽酸、磷酸、氫氟酸等 無機酸年使用量超過規定限值者，皆應納入管制，其中揮 發性有機廢氣強制要求其削減率應大於9 0 %、或總排放量小 於 0.6kg/hr〇 目前國内一般從事製造與代工的積體電路製造業中， 實際運轉的VOCs空氣污染防制設備主要有活性碳吸附塔、 轉輪濃縮焚化、冷凝回收、濕式洗滌、活性碳流體化床 等，種類可說是不勝牧舉。由於所產生的揮發性有機物通 常屬於大流量低濃度的有機物（數十ppm至一、二百 ppm)，因此各家廠商會先行將這些廢氣濃縮轉換成小流量 高濃度氣流，使後續處理系統較經濟。 前述之濃縮轉換方式多使用流體化床吸附系統，此吸 附系統是採用活性碳吸附濃縮後再脫附之方式進行，然而 因此類揮發性有機物中某些物質係屬於含硫的化合物，如 HMDS( Hexamethyldisilazane)，這是半導體廉常用之脫 水劑，應用在微影蝕刻製程中的塗底、光阻粘著步驟中。 此含硫化合物被該活性碳吸附後將無法脫附出來，使得活 性碳脫附的功能很快衰退無法使用，且也無法進行再生， 導致需要時常更換活性碳。此外，活性碳表面之有機廢氣 物質，也容易因觸媒反應作用而導致表面活性碳產生火災 之潛在危險。Page 8 1255324 V. INSTRUCTIONS (2) "Semiconductor manufacturing air pollution control and emission standards", in accordance with the standard, the national semiconductor manufacturing industry engaged in integrated circuit wafer fabrication and packaging, epitaxy, mask manufacturing and Operators such as lead frame manufacturing, whose whole plant volatile organic compounds (VOCs) and inorganic acids such as nitric acid, sulfuric acid, hydrochloric acid, phosphoric acid, hydrofluoric acid and other inorganic acids exceed the prescribed limits, should be included in the control, including volatile organic waste gases. It is mandatory that the reduction rate should be greater than 90%, or the total emissions should be less than 0.6kg/hr. Currently, the domestic VOCs air pollution control equipment is mainly active in the manufacturing and manufacturing of integrated circuit manufacturing. Carbon adsorption towers, rotary enrichment incineration, condensation recovery, wet scrubbing, activated carbon fluidized beds, etc., can be said to be invincible. Since the volatile organic compounds produced are usually high-flow and low-concentration organic matter (tens of ppm to one or two hundred ppm), each manufacturer will first convert these exhaust gas into a small-flow high-concentration gas stream, so that the subsequent processing system is more economic. The above-mentioned concentrated conversion method mostly uses a fluidized bed adsorption system, which is carried out by adsorption and concentration of activated carbon, and then desorbed. However, some substances in volatile organic compounds are sulfur-containing compounds such as HMDS ( Hexamethyldisilazane), which is a commonly used dehydrating agent for semiconductors, is used in the primer and photoresist adhesion steps in the microlithography process. Since the sulfur-containing compound is adsorbed by the activated carbon, it cannot be desorbed, so that the function of desorption of activated carbon is rapidly degraded and cannot be used, and regeneration is impossible, resulting in the need to frequently replace the activated carbon. In addition, the organic waste gas on the surface of the activated carbon is also prone to the potential hazard of surface activated carbon fire due to catalyst reaction.
第9頁 1255324 五、發明說明（3) ____ 此外’在揮發性有機物（v〇Cs)之 所传用沾士 後項處理寿王序上， 使用的方式，大多為由焚化爐以揪妗 田 方式需要彳良夫沾卜 70方式處理，然而這Page 9 1255324 V. Description of the invention (3) ____ In addition, the method used in the treatment of volatile organic compounds (v〇Cs) is mainly used in the incinerator to the field. The method needs to be handled by the method of 彳 夫 沾 ,, but this
# 大的燃料需求與能源消耗，且合產决+胃A 與Ν0Χ，安全性較低。 儿曰產生大量的C0 、縱上所述，由於在 領域中仍具有缺失，因 失而發明出本案「有機 習知技術應用在揮發性有機物處理 此發明人有鑑於上述習知技術之缺 廢氣處理系統及方法 、 【内容】 本案之主要目的在於提 法，採用電漿裂解方式將有 危害性的小分子，有效提昇 與安全性極高，此外，更透 廢熱充分有效利用。 供一種有機廢氣處理系統及方 機廢氣迅速熱解氧化成不具有 有機廢氣的處理效率且耗能低 過熱交換設備與管路設計以將 士案之另一目的在於提供一種有機廢氣處理系統及方 t ’？利用濃縮轉輪將高風量低濃度的有機廢氣加以濃 f以便於進仃處理，接著利用電衆火炬熱解氧化濃縮廢 氣、’此外更將熱解氧化產生的熱能透過熱交換做為濃縮轉 輪進订熱脫附時的熱源與預熱進氣處理的濃縮廢氣溫度， 有效節省能源。 本案之又 目的為提供一種有機廢氣處理系統，其係 適用處理一有機廢氣，其係包含··一反應腔，設有一進氣 萑路與一排氣管路；一濃縮轉輪（c〇ncentrat〇r 1255324 五、發明說明（4) rotor)，吸附濃縮該有機廢氣以產生一濃縮廢氣並透過該 進氣管路通入該反應腔中；一電漿反應器，係與該反應腔 連結，該電漿反應器在該反應腔中產生一電漿火炬，俾使 通入該反應腔之濃縮廢氣得以熱解氧化為多種高溫的氧化 產物；一熱交換設備，與該反應腔之排氣管路連結，將高 温的該等氧化產物分別與該進氣管路中的濃縮廢氣和一熱 傳導介質進行熱交換，俾使高溫之該等氧化產物得以充分 冷卻降溫，並預熱該進氣管路之濃縮廢氣以及提供該濃縮 轉輪脫附該有機廢氣為該濃縮廢氣之熱源；以及一風車， 將降溫的該等氧化產物排放至空氣中。 根據上述構想，該有機廢氣係為一揮發性有機物 (VOCs) ’且至少包含一含硫化合物，該含硫化合物則為 HMDS(Hexamethyldisilazane)，因此該氧化產物至少包 含有選自二氧化矽（SiOj 、二氧化碳（⑶》、氨 (NHa)、水（H20)其中之任意組合。 根據上述構想，該濃縮轉輪係為一蜂巢式轉輪，屬於 一多孔性’/弗石結構’該濃縮轉輪並具有一吸附區域和一脫 附區域，該吸附區域和該脫附區域在該濃縮轉輪的分配比 係為3 : 1。 以吸附濃縮該有機廢 體，透過該風車排放 管路連結至該熱交換 換，進而將該熱傳導 ’以供濃縮轉輪脫附 根據上述構想，該吸附區域係用 氣，並析出一無該有機廢氣之乾淨氣 至空氣中’且該乾淨氣體更可透過一 設備中以做為該熱傳導介質進行熱交 介質傳送至該濃縮轉輪之脫附區域中# Large fuel demand and energy consumption, and the combination of production + stomach A and Ν 0 Χ, low security. The daughter-in-law produces a large amount of C0, and the above-mentioned, because there is still a defect in the field, the invention was invented due to the loss. "Organic conventional technology is applied to the treatment of volatile organic compounds. The inventors have in view of the above-mentioned conventional technology. System and method, [Contents] The main purpose of this case is to raise the method, using plasma cracking method to make hazardous small molecules, which are highly effective and safe, and more efficient use of waste heat. The system and the exhaust gas of the machine are rapidly pyrolyzed into the treatment efficiency without organic waste gas and the energy consumption is low. The heat exchange equipment and piping design is another purpose of providing a kind of organic waste gas treatment system and the use of concentrated conversion. The wheel will concentrate the high-volume and low-concentration organic waste gas to facilitate the enthalpy treatment, and then use the electric torch to pyrolyze and oxidize the concentrated exhaust gas, and further heat the heat generated by pyrolysis and oxidation as a concentrated rotor. The heat source during desorption and the temperature of the concentrated exhaust gas treated by the preheating air intake effectively save energy. The purpose of the case is to provide An organic waste gas treatment system, which is suitable for treating an organic waste gas, comprising: a reaction chamber, an intake manifold and an exhaust line; and a concentrated runner (c〇ncentrat〇r 1255324 V. Invention (4) rotor), adsorbing and concentrating the organic waste gas to generate a concentrated exhaust gas and passing through the intake pipe into the reaction chamber; a plasma reactor is connected to the reaction chamber, and the plasma reactor is a plasma torch is generated in the reaction chamber, and the concentrated exhaust gas introduced into the reaction chamber is pyrolyzed and oxidized into a plurality of high-temperature oxidation products; a heat exchange device is connected with the exhaust pipe of the reaction chamber to high temperature The oxidation products are respectively exchanged with the concentrated exhaust gas and the heat transfer medium in the intake line, so that the oxidation products at a high temperature are sufficiently cooled and cooled, and the concentrated exhaust gas of the intake line is preheated and the The concentrated rotor desorbs the organic exhaust gas as a heat source of the concentrated exhaust gas; and a windmill discharges the cooled oxidation products into the air. According to the above concept, the organic exhaust gas is a volatile The organic matter (VOCs) 'and at least one sulfur-containing compound, the sulfur-containing compound is HMDS (Hexamethyldisilazane), so the oxidation product contains at least one selected from the group consisting of cerium oxide (SiOj, carbon dioxide ((3)), ammonia (NHa), Any combination of water (H20). According to the above concept, the condensing wheel is a honeycomb type wheel, belonging to a porous '/fustle structure', the condensing wheel has an adsorption area and a desorption area. The distribution ratio of the adsorption zone and the desorption zone in the concentration runner is 3:1. The organic waste body is adsorbed and concentrated, and is connected to the heat exchange through the windmill discharge pipe, thereby conducting the heat conduction. According to the above concept, the adsorption zone uses gas and precipitates a clean gas without the organic waste gas into the air' and the clean gas is more permeable to a device for heat exchange as the heat transfer medium. The medium is transferred to the desorption area of the concentration wheel
1255324 五、發明說明（5) 該有機廢氣為該濃縮廢氣之用。 根據上述構想，該熱交換設備至少具有一第一熱交換 器和一第二熱交換器，該第一熱交換器係與該反應腔之排 氣管路連結，用以將高溫的該等氧化產物與該進氣管路中 的濃縮廢氣進行熱交換，以預熱由該進氣管路流入該反應 腔之濃縮廢氣並冷卻該等氧化產物，而該第二熱交換器係 與該第一熱交換器連結，用以使由該第一熱交換器排出之 該等氧化產物更與該熱傳導介質進行熱交換，以將該等氧 化產物之熱量傳導至該熱傳導介質中以冷卻該等氧化產 物，並傳送該熱傳導介質供該濃縮轉輪熱脫附該有機廢氣 為該濃縮廢氣。 根據上述構想，該反應腔係包含一上反應室與一下反 應室，而該上反應室則透過該將該濃縮廢氣高溫裂解，該 下反應室則通入外界空氣以氧化為該氧化產物。 本案之又一目的為提供一種有機廢氣處理方法，其係 包含下列步驟：（a)由一濃縮轉輪吸附一有機廢氣； (b)將吸附在該濃縮轉輪中之有機廢氣脫附為一濃縮廢 氣；（c)將該濃縮廢氣通入一反應腔以一電漿火炬熱解氧 化為多種向溫的氧化產物，（d)將南溫的該等氧化產物導 入一第一熱交換器以與欲通入該反應腔的濃縮廢氣進行熱 交換以降低該等氧化產物之溫度，同時預熱該濃縮廢氣； 以及（e)導入一第二熱交換器以與一熱傳介質進行熱交換 以降低溫度，並用以做為該濃縮轉輪脫附該濃縮廢氣之熱 源，且更包含一步驟（f)將冷卻降溫後之氧化產物排放至1255324 V. Description of the invention (5) The organic waste gas is used for the concentrated exhaust gas. According to the above concept, the heat exchange apparatus has at least a first heat exchanger and a second heat exchanger, and the first heat exchanger is coupled to the exhaust line of the reaction chamber for oxidizing the high temperature. The product exchanges heat with the concentrated exhaust gas in the intake line to preheat the concentrated exhaust gas flowing into the reaction chamber from the intake line and cool the oxidation products, and the second heat exchanger is coupled to the first a heat exchanger coupled to exchange heat exchange of the oxidation products discharged from the first heat exchanger with the heat transfer medium to conduct heat of the oxidation products to the heat transfer medium to cool the oxidation products And transferring the heat transfer medium to the concentration wheel to thermally desorb the organic waste gas as the concentrated exhaust gas. According to the above concept, the reaction chamber comprises an upper reaction chamber and a lower reaction chamber, and the upper reaction chamber is subjected to pyrolysis of the concentrated exhaust gas, and the lower reaction chamber is passed through outside air to be oxidized to the oxidation product. A further object of the present invention is to provide an organic waste gas treatment method comprising the steps of: (a) adsorbing an organic waste gas from a concentration wheel; and (b) desorbing the organic waste gas adsorbed in the concentration wheel into a Concentrating the exhaust gas; (c) introducing the concentrated exhaust gas into a reaction chamber to pyrolyze and oxidize a plasma torch into a plurality of temperature-oriented oxidation products, and (d) introducing the oxidation products of the south temperature into a first heat exchanger to Performing heat exchange with the concentrated exhaust gas to be introduced into the reaction chamber to lower the temperature of the oxidation products while preheating the concentrated exhaust gas; and (e) introducing a second heat exchanger to exchange heat with a heat transfer medium Lowering the temperature and using it as a heat source for desorbing the concentrated exhaust gas, and further comprising a step (f) discharging the oxidation product after cooling and cooling to
第12頁 1255324 五、發明說明（6) 空氣中。 根據上述構想，該步驟（a)中之吸附步驟係在該吸附 區域中來進行，該步驟（a)更包含一步驟（a 〇析出一無 該有機廢氣的乾淨氣體，因此該乾淨氣體更可透過一管路 連結至該第二熱交換器中做為該熱傳導介質進行熱交換， 進而將該熱傳導介質傳送至該濃縮轉輪之脫附區域中，以 供濃縮轉輪熱脫附之用。Page 12 1255324 V. Description of invention (6) In the air. According to the above concept, the adsorption step in the step (a) is carried out in the adsorption region, and the step (a) further comprises a step (a) decanting a clean gas without the organic exhaust gas, so the clean gas is more The heat transfer medium is heat-exchanged through a pipeline to the second heat exchanger, and the heat transfer medium is transferred to the desorption region of the concentration wheel for thermal desorption of the concentration wheel.
本案之又一目的為提供一種有機廢氣處理系統，其係 適用處理一有機廢氣，其係包含一濃縮轉輪、一反應腔以 及一熱交換設備，該濃縮轉輪用以吸附該有機廢氣並脫附 為一濃縮廢氣，該反應腔用以處理該濃縮廢氣，而該熱交 換設備用以冷卻處理後之濃縮廢氣，其特徵在於該反應腔 係使用一電漿火炬以迅速熱解氧化該濃縮廢氣，並利用該 反應腔熱解氧化該濃縮廢氣時所產生之高溫，透過該熱交 換設備以預熱欲進入該反應腔處理的該濃縮廢氣，並提供 該濃縮轉輪脫附該濃縮廢氣之熱源。 本案之功效與目的，可藉由下列實施方式與圖示說 明，俾有更深入之了解。Another object of the present invention is to provide an organic waste gas treatment system, which is suitable for treating an organic waste gas, which comprises a concentration runner, a reaction chamber and a heat exchange device for adsorbing the organic waste gas and removing the organic waste gas. Attached as a concentrated exhaust gas, the reaction chamber is used to treat the concentrated exhaust gas, and the heat exchange device is used for cooling the treated concentrated exhaust gas, wherein the reaction chamber uses a plasma torch to rapidly pyrolyze the concentrated exhaust gas. And using the reaction chamber to pyrolyze and oxidize the high temperature generated by the concentrated exhaust gas, through the heat exchange device to preheat the concentrated exhaust gas to be treated in the reaction chamber, and provide a heat source for the concentrated exhaust gas to desorb the concentrated exhaust gas . The efficacy and purpose of this case can be further understood through the following implementations and illustrations.
【實施方法】 將於下文中說明本發明，請參考附圖，熟悉本技術者 須瞭解下文中的說明僅係作為例證用，而不用於限制本發 明。 以下針對本案較佳實施例的有機廢氣處理系統進行描The present invention will be described hereinafter with reference to the accompanying drawings. The following describes the organic waste gas treatment system of the preferred embodiment of the present invention.
第13頁 丄255324 五、發明說明（7) _ 述，但實際之系統配置 |描述之系統與方法，熟之方法並不必須完全符合 實際精神及範圍的情 A者當能在不脫離本發明之 1請參見第一m主做出種種變化及修改。 丨構示意圖。本案系統主==機=理系統的簡要 丨月工（包含一上反應室要匕3有一濃縮轉輪U、一反應 ,14、二熱交換器15、—一 ^反應室、一電聚反應II 縮、處理後並降溫為不；m斤”’以將有機廢氣濃 風屬1 6而排放到外界空氣=危σ性的各式小分子而透過該 先開2 w八該濃縮轉輪11 (實務上，應 處理），而以;二廢進^ 該有機廢氣A之乾淨氣體C，诱禍」私為廢矾A，並析出一無 送至嗲風戶1 μ #、 透過一乾伊氣體排放管路1 7傳 ρ =扇16而排放至外界空氣中，至於該濃縮轉輪η則 k 2 =過該排放管路17部分排氣到一熱傳導管路ΐ7ί進行 …、父換，做為熱源來脫附出一濃縮氣體β (稍後將詳細說明 其具體實施方式），該濃縮氣體隨過一進氣管路121先通 入該反應腔（1 2、1 3)中的該上反應室1 2來進行處理，而 該上反應室1 2係與該電漿反應器1 4連結，該電漿反應器1 4 則是在該上反應室1 2產生一電漿火炬1 4 1，因此當該濃縮氣 體Β傳送到該上反應室1 2内即與該電漿火炬1 41直接接觸而 迅速熱解、原子化或離子化為較小的各式裂解產物（圖中 〇. ^ ，：由姑Φ將G 庵哭 1 /1旦你田一膝齑轉 Γ圖ΦPage 13 丄 255324 V. Description of the invention (7) _ described, but the actual system configuration | description of the system and method, the method of familiarity does not have to fully comply with the actual spirit and scope of the situation A can not leave the invention 1 Please refer to the first m master to make various changes and modifications. Schematic diagram. In this case, the main system == machine = the system of the system is simple (including an upper reaction chamber, there is a concentrated revolving wheel U, a reaction, 14, two heat exchangers 15, a reaction chamber, an electropolymerization reaction) II shrinking, after treatment and cooling down to no; m kg" 'to discharge the organic exhaust gas to the outside air = 1 singular small molecules through the first open 2 w eight the concentrated revolver 11 (in practice, it should be dealt with), and the second waste into the clean gas C of the organic waste gas A, the catastrophe is privately depleted, and the precipitate is sent to the hurricane 1 μ #, through a dry gas The discharge line 17 transmits ρ = fan 16 and is discharged to the outside air, so that the concentrated reel η is k 2 = the portion of the discharge line 17 is exhausted to a heat transfer line ΐ 7ί ..., the father exchanges, as The heat source desorbs a concentrated gas β (the specific embodiment will be described in detail later), and the concentrated gas first passes through the upper reaction in the reaction chamber (1 2, 13) through an intake line 121. The chamber 12 is treated, and the upper reaction chamber 12 is connected to the plasma reactor 14 , and the plasma reactor 14 is in the upper reaction chamber 1 2 Producing a plasma torch 141, so that when the concentrated gas enthalpy is transferred into the upper reaction chamber 12, it is in direct contact with the plasma torch 141, and rapidly pyrolyzed, atomized or ionized into smaller ones. The cleavage product (in the figure 〇. ^ ,: 姑 Φ G G 庵 1 1 / 1 旦 田 田 田 一 一 Φ Φ Φ Φ
未揭示）為原料以產生該電漿火炬1 4 1，而該惰性氣體可以 1 m 1 HI 第14頁 1255324 五、發明說明（8) 是氧、氬、氣等不易與該濃縮廢氣B反應的氣體。 這些各式的裂解產物接著進入該下反應室13中，該下 反應室1 3具有多個空氣進口 （圖中未揭示）以引入外界空 氣來跟該等裂解產物進行氧化反應，目的即在於氧化該濃 縮廢氣C而產生各式對人體環境無害的氧化產物，由於大多 的有機廢氣均屬於揮發性有機物（VOCs)，而這些揮發性 有機物（VOCs)大多都是含碳、氫、氮、硫等等元素的各 式化合物’其中若以HMDS( Hexamethyldisilazane)為 例，將會產生二氧化矽（S i 〇 0 、二氧化碳（CO 2)、氨 (NH a)和水（H A)之氧化產物，其反應式如下： (CH3) aSiNHSi (CH 3) 3 + 1 2 0 2 ~> 2Si02 + NH3 + 6C02 + 8H2〇 且因該電漿火焰141所具有的高熱與氧化燃燒反應時所 產生的反應熱’這些氧化產物在該下反應室丨3產生後通常 是以相當高溫的形式存在，因此有可能會危害到生物體或 是損害到其他設備或環境，所以仍是需要使用有效的降溫 設備以將這些咼溫的氧化產物冷卻降溫至一適當的溫度後 再一併匯入該乾淨氣體排放管路1 7由該風扇丨6直接排放出 去。 因此本糸統提供了二個熱交換器1 5，透過該下反應室 1 3的一排氣管路（圖中未揭示）與該等熱交換器1 5之熱交 換管路1 5 1銜接’透過該熱交換器1 5的熱交換作用而可以有 效將該等氧化產物有效冷卻至適當溫度（約5 〇°c )，在第Not disclosed) as raw material to produce the plasma torch 141, and the inert gas can be 1 m 1 HI. Page 14 1255324 V. Description of the invention (8) is that oxygen, argon, gas, etc. are not easily reacted with the concentrated exhaust gas B. gas. These various types of cracked products then enter the lower reaction chamber 13, which has a plurality of air inlets (not shown) for introducing outside air to oxidize with the cracked products for the purpose of oxidation. The concentrated exhaust gas C produces various oxidation products that are harmless to the human environment, since most of the organic waste gases belong to volatile organic compounds (VOCs), and most of these volatile organic compounds (VOCs) are carbon, hydrogen, nitrogen, sulfur, etc. Various compounds of the same type, in which HMDS (Hexamethyldisilazane) is exemplified, an oxidation product of cerium oxide (S i 〇0 , carbon dioxide (CO 2 ), ammonia (NH a) and water (HA) will be produced, The reaction formula is as follows: (CH3) aSiNHSi (CH 3) 3 + 1 2 0 2 ~> 2Si02 + NH3 + 6C02 + 8H2 〇 and the reaction heat generated by the high heat and oxidative combustion of the plasma flame 141 'These oxidation products are usually present in relatively high temperature after the generation of the reaction chamber 3, so it may harm the organism or damage other equipment or the environment, so it is still necessary to use effective cooling. The cooling products are cooled to a suitable temperature and then discharged into the clean gas discharge line 17 and discharged directly from the fan unit 6. Therefore, the present system provides two heat exchangers. 1 5, through a discharge line (not shown) of the lower reaction chamber 13 and the heat exchange line 115 of the heat exchangers 15 are connected to 'heat exchange through the heat exchanger 15 Effectively cooling the oxidation products to a suitable temperature (about 5 〇 ° C ), in the first
1255324 五、發明說明（9) _ 一個熱交換器1 5中# JLl 1 ? 1搵觸、隹/ & 、〜…、父換管路151是先與該進氣总敗 1 2 1接觸進行熱交換， 氣s路 舶产 、隹# 、 此可將該等氧化產物的妖旦m七 熱在该進軋管路12ιφμ、曲 "、、里用來預 器15"亥熱交換管二=氣◎，接著在第二個熱交換: 支出去的熱；-個由該乾淨氣體放管路"分 iC 5 ^ ^ ^ ^熱傳導介質以將該等氧化產物&献胃# 導至垓熱傳導介皙φ ，，& & $ 〜的熱$傳 ^ 1 . L导’丨負中该熱傳導管路1 7 1同時連通至,丨兮增w 轉輪11上，因此可以似炎 】°亥漢'%1255324 V. INSTRUCTIONS (9) _ A heat exchanger 1 5 # JLl 1 1 1 touch, 隹 / &, ~..., the parent exchange line 151 is first contacted with the total intake 1 2 1 Heat exchange, gas s road production, 隹 #, this can be the oxidation of the product of the demon m seven heat in the feeding line 12ιφμ, 曲, ", used in the pre-processor 15 " Hai heat exchange tube two = gas ◎, then in the second heat exchange: the heat to be spent; - a pipe by the clean gas discharge "point iC 5 ^ ^ ^ ^ heat transfer medium to guide the oxidation products &垓 Heat conduction 皙 φ , , &&& $ 〜 heat $ pass ^ 1 . L lead '丨 negative in the heat conduction line 1 7 1 simultaneously connected to, 丨兮 increase w on the wheel 11, so it can be like inflammation 】°亥汉'%
n治卜 此了 U做為该濃縮轉輪11熱脫附該有機麻友A 縮廢氣B之熱源。前述這些高溫的氧化產二械透廢過？ :個…父換器15的熱交換作用得以充分卻降溫。以實驗數、 才所知，该等高溫氧化產物欲進行降溫冷卻前約為7⑽它， 而透Jil兩個熱交換器1 5之熱交換後，所排放出來的溫度約 為5 0°C ’因此高溫水蒸氣即成為冷卻水氣，高溫二氧化矽 固體即成為冷卻固體，最後這些氧化產物就透過一氧化產 物排放管路1 5 2匯入該乾淨氣體排放管路丨7中一起由該風扇 1 6排放出去，或是無須匯入該乾淨氣體排放管路丨7中而另 外獨立排放出（圖中未揭示）。 其中該濃縮轉輪11係為一蜂巢式轉輪，屬於一多孔性 沸石結構，而請再參見第二圖，其係為濃縮轉輪的具體結 構。該濃縮轉輪11具有一吸附區域111和一脫附區域π 2， 其中該吸附區域1 11係用以吸附濃縮該有機廢氣A (請參見 第一圖與前述說明），並過濾出無該有機廢氣的該乾淨氣Θ 體c ’透過該乾淨空氣排放管路1 7由該風扇1 6排放炱外界二 氣中。且而前面論述可知，該乾淨氣體C更可以透過該熱傳n 治卜 This U is used as the heat source for the concentrated circulator 11 to thermally desorb the organic yoke A to reduce the exhaust gas B. Are these high-temperature oxidation products produced by the above-mentioned high-temperature oxidation? : The heat exchange effect of the parental converter 15 is sufficient but the temperature is lowered. According to the number of experiments, it is known that these high-temperature oxidation products are about 7 (10) before cooling and cooling, and the temperature discharged by the two heat exchangers of Jil is about 50 ° C. Therefore, the high-temperature water vapor becomes the cooling water gas, and the high-temperature cerium oxide solid becomes the cooling solid, and finally these oxidation products are transferred into the clean gas discharge line 丨7 through the oxidation product discharge line 152, together with the fan. 1 6 is discharged, or is not required to be re-introduced into the clean gas discharge line 丨7 and separately discharged (not shown). The concentrated reel 11 is a honeycomb type revolver which belongs to a porous zeolite structure, and please refer to the second figure, which is a specific structure of the concentrated revolving wheel. The concentrating runner 11 has an adsorption zone 111 and a desorption zone π 2, wherein the adsorption zone 11 is used for adsorbing and concentrating the organic exhaust gas A (see the first figure and the foregoing description), and filtering out the organic The clean gas cylinder c' of the exhaust gas is discharged from the outside air by the fan 16 through the clean air discharge line 17. And as discussed above, the clean gas C can pass through the heat transfer.
第16頁 1255324 五、發明說明（ίο) 導管路1 7 1連結至該熱交換器1 5中進行熱交換，並可做為該 熱傳導介質進而將熱能傳送至該濃縮轉輪1 1之脫附區域11 2 中，以供濃縮轉輪1 1脫附該有機廢氣A為該濃縮廢氣B之 用。且根據實驗計算，該吸附區域1 1 1和該脫附區域11 2在 該濃縮轉輪的面積分配比可以為3 ·· 1，而濃縮比例約為1 2 倍。 因此，依據上述的實施方式，半導體製造廠商或有機 廢氣處理廠商即可依本發明所揭示的系統配置進行有機廢 氣的處理，提昇了整個系統的處理安全性、節省使用能源 以及降低運作成本，並可避免了傳統有機廢氣處理方式會 造成的設備或材料容易損壞、須常更換的可能，提昇廢氣 處理的運作效率，節省成本與時間。 綜上所述，本案確實可提供一種有機廢氣處理系統及 方法，利用濃縮轉輪吸附以脫附出濃縮的有機廢氣，並透 過電漿火炬直接高溫熱解並迅速氧化此濃縮廢氣，有效且 安全地提昇處理有機廢氣的效能。此外，更可利用電漿火 炬所產生的熱能與氧化時產生的反應熱來預熱欲進氣處理 之濃縮廢氣的溫度並提供濃縮轉輪脫附再生之熱源，有效 節省能源與降低運作成本。且本案所揭示的設備不易因有 機廢氣成分之多樣化而損耗率增高，因此適合應用在各種 有機廢氣處理之製程中，實具產業之價值，爰依法提出發 明專利申請。 以上所述係利用較佳實施例詳細說明本發明，而非限 制本發明的範圍，因此熟知此技藝的人士應能明瞭，適當Page 16 1255324 V. INSTRUCTION DESCRIPTION (ίο) The conduit 171 is coupled to the heat exchanger 15 for heat exchange and can be used as the heat transfer medium to transfer thermal energy to the condensing wheel 1 1 In the region 11 2 , the organic exhaust gas A is desorbed by the concentration reel 1 1 for the concentrated exhaust gas B. According to the experimental calculation, the area ratio of the adsorption zone 1 1 1 and the desorption zone 11 2 in the concentration wheel can be 3 ··1, and the concentration ratio is about 12 times. Therefore, according to the above embodiments, the semiconductor manufacturer or the organic waste gas treatment manufacturer can perform the organic waste gas treatment according to the system configuration disclosed by the present invention, thereby improving the processing safety of the entire system, saving energy, and reducing operating costs, and The equipment or materials caused by the traditional organic waste gas treatment method can be easily damaged, the possibility of frequent replacement, the operation efficiency of the exhaust gas treatment can be improved, and the cost and time can be saved. In summary, the present invention can provide an organic waste gas treatment system and method, which utilizes a concentrated runner to adsorb out concentrated organic waste gas, and directly pyrolyzes the high temperature pyrolysis through the plasma torch and rapidly oxidizes the concentrated exhaust gas. Safely improve the efficiency of handling organic waste gas. In addition, the heat generated by the plasma torch and the heat of reaction generated during the oxidation can be used to preheat the temperature of the concentrated exhaust gas to be ingested and provide a heat source for desorption and regeneration of the concentrated rotor, thereby saving energy and reducing operating costs. Moreover, the equipment disclosed in this case is not easy to be increased due to the diversification of organic exhaust gas components, so it is suitable for application in various organic waste gas treatment processes, and has industrial value, and issuance of patent applications for invention according to law. The above description of the present invention is intended to be illustrative of the present invention, and is not intended to limit the scope of the invention.
第17頁 1255324 五、發明說明（11) 而作些微的改變與調整，仍將不失本發明之要義所在，亦 不脫離本發明之精神和範圍，故都應視為本發明的進一步 實施狀況。謹請 貴審查委員明鑑，並祈惠准，是所至 禱。 本案得由熟習此技術之人士任施匠思而為諸般修飾， 然皆不脫本案申請專利範圍所欲保護者。Page 17 1255324 V. INSTRUCTIONS (11) While making minor changes and adjustments, without departing from the spirit and scope of the present invention, it should be considered as a further implementation of the present invention. . I would like to ask your review committee to give a clear understanding and pray for it. It is the prayer. This case can be modified by people who are familiar with this technology, but they are not protected by the scope of the patent application.
第18頁 1255324 圖式簡單說明 第一圖係為本案較佳實施例之一種有機廢氣處理系統之簡 要配置架構示意圖。 第二圖係為第一圖中濃縮轉輪的結構示意圖。 圖號說明 11濃縮轉輪 1 2上反應室 1 2 1進氣管路 1 3下反應室Page 18 1255324 BRIEF DESCRIPTION OF THE DRAWINGS The first drawing is a schematic diagram of a schematic configuration of an organic exhaust gas treatment system in accordance with a preferred embodiment of the present invention. The second figure is a schematic structural view of the concentrated reel in the first figure. Figure No. 11 Concentrated runner 1 2 Upper reaction chamber 1 2 1 Intake line 1 3 Lower reaction chamber
1 4電漿反應器 1 41電漿火炬 1 5熱交換器 1 5 1熱交換管路 1 5 2氧化產物排放管路 1 6風扇1 4 plasma reactor 1 41 plasma torch 1 5 heat exchanger 1 5 1 heat exchange line 1 5 2 oxidation product discharge line 1 6 fan
1 7乾淨氣體排放管路 1 7 1熱傳導管路 A有機廢氣 B濃縮廢氣 C乾淨氣體 1 1 1吸附區域 1 1 2脫附區域1 7 Clean gas discharge pipe 1 7 1 Heat conduction pipe A Organic waste gas B Concentrated waste gas C Clean gas 1 1 1 Adsorption area 1 1 2 Desorption area
第19頁Page 19
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