TWI252913B - Probe device for atomic force microscopy and method for making same - Google Patents

Abstract

A probe device for an atomic force microscopy (AFM) in accordance with the present invention includes: a base; a cantilever fixed on the base, the cantilever having at least one free end for arranging a probe thereon; carbon nanotubes arranged on the free end. The free end has a plane top surface with a hole defining therein. The carbon nanotubes extend from the hole in a direction substantially perpendicular to the top surface. A method for making the same device is also provided.

Description

1252913

V. INSTRUCTION DESCRIPTION OF THE INVENTION (1) Technical Field The present invention relates to an original early seven θ Μί·Ρτ^, a knife-heater micro-mirror (AtomicForce)

Micr〇sc〇py, hereinafter referred to as afm), 牛芬丝m*, 'ten clothes and its manufacturing method, special only, | plus/step and one using carbon nanotubes, farewell and its manufacturing method . The second atomic force microscope probe device [Prior Art] In recent years, with the high-density of devices such as the following, semi-conducting ancestors, etc.

The scope of application is expanding. 1 work 2 to determine the surface morphology of the sample AFM inter-force 盥 杂 彳 彳 q q q q q q 乍 乍 乍 乍 乍 乍 乍 乍 乍 AF AF AF AF AF AF AF AF AF AF AF AF AF AF AF AF AF AF AF AF AF AF AF Surface structure and properties. Conformity

WAFM has three imaging modes: the core part of the contact shell/, I-pin AFM. The price is blameless for non-contact birds and tapping. And explore for I!: Nano: tube has good elasticity and tipping characteristics, with its A private needle tip AFM has been reported. Announced that 戴r Dai Hongjie is equal to February 12, 2002, and the younger brother, 6, 346, 1 89, American nose, "& A method for forming a carbon nanotube tip on a cantilever of a paste probe is as follows: The method is as follows: providing a cantilever for afm; depositing a catalyst particle at the free end of the agent if (Free End); Catalytic granules; contact with a carbon-containing atmosphere at a high temperature to grow a carbon nanotube. M/?, the direct weight of the cantilever tip is used as a tip of the nano-carbon nanotubes, which is poorly oriented, and is bound to affect the whole There is a clock in afm, which provides a miscellaneous support, ^

It is necessary to use the AFM needle device and the manufacturing method of the A-oriented carbon nanotube tip.

The above L IGA process includes the steps of: forming a photoresist layer having a predetermined pattern on the plane; etching the plane to form a predetermined pattern corresponding to the photoresist layer; and removing the photoresist layer. The above-mentioned chemical vapor deposition method is used to grow the hole and the plane base.

1252913

V. INSTRUCTIONS (3) The vertical, carbon nanotube step comprises the steps of: depositing a catalyst on the plane; nanometer = contacting the catalyst at a predetermined temperature such that the person grows substantially perpendicular to the plane from the hole.米碳 ί=支二县Τ Use LI!A process to set up Naijie 槿, 涵 _ 41 '·心# Make the end of the end form a nano hole: at the end of the county m ΐ: y template effect " The chemical vapor deposition tube has good orientation, and the nanocarbon precision obtained from the plate is ensured as the AFM instrument using the probe, and the following will be further described in detail with reference to the accompanying drawings. Description. Referring to the first figure in May, the present invention provides that: - the probe holder 50 is fixed to the two-wood needle device 5, and the end of the cannula 54 is disposed at the end of the cantilever 54 and used as a needle tip: wherein the cantilever The top 56 of the end 54 is formed with a flat plead 60. In this plane 57. And the vertical is vertical. In the present embodiment, the hole diameter of the hole 58 is preferably (9) ~ 臂 The arm 5 2 can be made of tantalum nitride. Not yet. The above-mentioned AFM manufacturing method 7 provided by the present invention includes the steps of:

Page 7 1252913___ V. Description of the invention (4) End 5 4 ', the end 5 4 ' has a pointed top 5 6; (2b ) can form a plane at the top 5 6 of the end by cutting and polishing 57', (2c) using the LIGA process in the plane 5 to form a hole 58; (2d) by chemical vapor deposition, the hole 508 is grown substantially perpendicular to the plane 57' for use as Needle tip carbon nanotube 60. Referring to the third figure, the LIGA process includes the following steps: (3a) applying a photoresist layer 80 (such as polyacrylic acid vinegar, polyethylene or polycarbonate) to the surface 57, and then A photomask (illustrated) having a predetermined pattern is placed on the photoresist material layer 80 and exposed to sunlight. The Nisker's solution is a wet rot for the developer. And the material layer exhibits a predetermined pattern; u (3b) is etched by reactive ion etching to a predetermined pattern corresponding to the photoresist layer 80;] a thousand faces 57 are formed to form (removal of the photoresist by an agent such as acetone) Material layer 8. Tian is in the formation of a hole 58 in the thousand face 57. ^ Another 'using L 1 GA method for the object shovel who is 4 tweeting her from the reference to the sixth, 245, 849, the fourth process of the mechanical processing of the 479 The relevant content of the patent., 472, 459 and 6, 455, 233, please refer to the fourth figure, Li # used as the tip of the Taifeng π & e using the 虱 phase deposition method in the hole 58, growth I The procedure can be as follows: (4a) in the plane 57, sinking, or coating, etc., the catalyst is evaporated by electron beam, and the catalyst is formed to form a catalytic hole of 4 to 10 nm thick: 58' Plane 57', such that J 浔 film 82, the catalyst is selected from iron, cobalt,

Page 8 V. INSTRUCTIONS (5) Record one or more substances of their oxides. (4b) providing a carbon source gas and catalyzing it at a predetermined temperature and catalyzing such that the carbon nanotubes are substantially perpendicular to the plane 57 1 from the hole 58': a temperature of 3 00 L500T: under the air atmosphere, the catalyst film 82 Annealing is carried out to shrink into nano-sized particles (Fig. 1 and the cantilever 52 with catalyst particles are placed in the reactor (not), no); protective gas is introduced (not labeled) ) completely exhaust the air, the same furnace, heating to redundancy. , 00. 0; then pass the shielding gas and carbon source gas (not t ^), the shielding gas may be argon, nitrogen or helium, etc., the carbon source gas may be 乙^fin 70, 乙许, etc.; about 15 seconds After ~40 minutes, the height is certain to take it (9) in the hole 58 and grow out. Of course, the catalyst film 82 can also be distributed only in the hole U, and the carbon nanotubes in the middle can be limited to A. In order to use the chemical vapor deposition method for the cantilever step and the reaction conditions, reference may be made to the above-mentioned contents. , 』^哼上弟6’ 346’ 189唬Wu Guo patent

Process treatment: ΓΓ The skilled person should understand that the invention provides L: body cattle 13⁄4 h Ζ ^ end and chemical vapor deposition method to grow carbon nanotubes ^ Description of the invention, should not be used in all embodiments ; two;; with different fixed positions, the probe hangs her - step Γ will; the end. The manufacturing method 7 can further secure the transmitted probe cantilever 52' to the probe holder of the AFM. The use of L IG A process for the installation of the carbon nanotube tip A]

1252913 V. INSTRUCTIONS (6) The probe cantilever has a π-template effect of its end-of-the-hole structure and a long-nano carbon nanotube. Since the LIGA degree is easy to control, it is exemplified to ensure and improve the use of the above-described invention, and the present invention is a patent application. However, all the above-mentioned human modifications or changes in the skill of the present invention should form a nanopore structure in the package, and then use the hole to form a hole with uniform diameter and deep plate by chemical vapor deposition at the end of the cantilever process. The carbon nanotubes have good orientation and thus the precision of the AFM instrument. It is true that the invention patents have been met, and the above is only a preferred embodiment of the present invention, and it is within the scope of the following patent application, which is based on the spirit of the invention.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view showing the first embodiment of the AFM probe device of the present invention; the second drawing is a schematic flow chart of the method for manufacturing the above AF Μ probe device of the present invention; The schematic diagram of the LIG process for forming the hole 5 8 ' in the plane 5 7 '; the fourth picture is the flow chart of the chemical vapor deposition method provided by the present invention for the growth of the carbon nanotubes in the hole 5 8 '. [Explanation of component symbols] Probe device 5 Manufacturing method 7 Probe holder 50 Cantilever 52, 52 End 54, 54' Top 56, 56 Plane / 5 7, 5 7' Hole 1 58, 58 Carbon tube 60 Resistive material Layer 80 Catalyst Film 82

Claims (1)

1252913, the scope of patent application 1. An atomic force microscope probe device, comprising a needle seat; a probe tip θ and a straight line therein, the surface, the nai 2. If the application is specifically, 3. For example, Shen Jing, Specifically, an 'atomic step: a cantilever defined in the probe holder, having at least one arbitrable needle; and a carbon nanotube serving as a tip at the end of the cantilever, the top of the cantilever end of the probe is formed A square carbon tube having a hole is formed by the hole being substantially perpendicular to the plane. In the atomic force microscope probe device according to Item 1, the pore diameter of the hole is 20 to 100 nm. The atomic force microscope probe device according to Item 1, wherein the cantilever is made of tantalum nitride. A method for manufacturing a force microscope probe device, comprising the steps of: providing an atomic force microscope cantilever having at least one end to which a tip is to be provided; forming a plane on the top of the tip; forming a hole in the plane by an X-ray deep electroforming process The carbon nanotubes are grown by chemical vapor deposition in a manner that is substantially perpendicular to the plane to make a needle tip. 5. The method of manufacturing an atomic force microscope probe device according to claim 4, wherein a plane is formed at the top of the end by a cutting and grinding method. 6. The method of manufacturing an atomic force microscope probe device according to claim 4, wherein the X-ray deep electroforming molding process comprises a step Page 12 1252913 Patent Application Range: A photoresist layer having a predetermined pattern is formed on the plane; the pattern is etched to form a pre-k removed photoresist layer with a photoresist layer. 7· 利ί: Item 6: The step of the reactive ion 丄 丄 基底 基底 基底 基底 基底 丄 丄 丄 丄 丄 原子 原子 原子 原子 原子 原子 原子 原子 原子 原子 原子 原子 原子 原子 原子 原子 原子 原子The method for forming a photoresist pattern having a predetermined pattern includes the steps of: providing a photomask provided with a predetermined pattern; forming a photoresist layer on the rust plane; placing the photomask The photoresist layer is placed between the X-rays; when the process is fixed, the treatment liquid is used to cause the photoresist layer to appear as a predetermined pattern. 9::::: Atomic force microscopy method according to item 4, wherein the pore diameter of the hole is 2〇~, and is set to 10. The atomic force described in item 4 of the application specification range. Microscope / strong rice. The manufacturing method, wherein the chemical vapor deposition is used to form a hole of a carbon nanotube substantially perpendicular to the plane + ^ ^ the hole: ^ knowing that the catalyst is deposited in the plane; X 〃 Catalyst contact Providing a carbon source gas at a predetermined temperature 盥 1252913_ 6. The patent application scope allows the nanocarbon tube to grow from the hole substantially perpendicular to the plane. 11. The method of manufacturing an atomic force microscope probe device according to claim 1, wherein the catalyst is distributed only in the holes in the top. 1. The method of manufacturing an atomic force microscope probe device according to claim 10, wherein the predetermined temperature is 550 to 1 0 0 °C. The method of manufacturing an atomic force microscope probe device according to claim 10, wherein the carbon source gas is selected from the group consisting of acetylene, decane and ethylene. 1 . The method of manufacturing an atomic force microscope probe device according to claim 10, wherein the catalyst is deposited on the plane by electron beam evaporation, sputtering or coating. The method for producing an atomic force k-mirror probe device according to claim 10, wherein the catalyst is one or more selected from the group consisting of iron, Si, and Oxide. The method of manufacturing an atomic force microscope probe device according to claim 4, wherein the manufacturing method further comprises the step of cantilevering the obtained probe to the probe holder of the AFM. Page 14