TWI252137B - A dust cleaner applied to a process chamber - Google Patents

Abstract

A dust cleaner applied to a process chamber having a hot plate comprises a dust-collecting cabin, and a vacuum pipe. The dust-collecting cabin comprising a dust-collecting gap and a vent is disposed above the hot plate, and the vacuum pipe is connected with the vent. The suction force in the vacuum pipe will draw out the particles on the hot plate through the dust-collecting gap of the cabin and drain them out of the process chamber through the vent and the vacuum pipe.

Description

1252137 V. INSTRUCTION DESCRIPTION α) [Technical Field] The present invention relates to a dust removing device, and the dust removing device for cleaning the surface of the heating plate of the process reaction chamber can be automatically [prior art] in the process of liquid crystal flat panel display In the process, the process is mainly formed by a process library such as image etching to form a desired wiring circuit. After τ heavy application in the glass-based image etching technology, the main program is, first, the United States to the present & ^ exposure and development, as needed: i;; r = (: rebake) for solid baking (Post Bake), the last / knife & field of photoresist 're-circuit pattern. The engraving is required for the formation. After the photoresist is originally applied as a photoresist, the solvent in 1 is required to dry to become a curing adhesion. a thick polymer compound, so it is pre-baked to remove its film to increase the surface of the substrate.

After the photoresist development imaging, the purpose is to remove the remaining melting temperature 1 and higher, to perform solid baking, and the bonding is more tight, so that the undissolved photoresist molecules are focused, & A~ 0 nine resistance to the stability of the heat and the attachment of the underlying material '々' into a more condensed ... body structure, in order to facilitate the subsequent etching process.

1252137 V. Description of invention (2) Please refer to Figure 1A, i 曰 曰 & π 古 $ y y , , is a schematic diagram of the baking machine 1 , which is a conventional photoresist baking reaction In the chamber, the reaction chamber 1 is baked after the glass substrate is re-coated with light F and the agent: or = development image processing. r Figure 1B is a photoresist baking ΐ; the upper side has an open-cap type knot (4) and m, respectively; when it is off from 0, it is opened for the bake operation, that is, the open side of the front side is opened. 12^, from here to the glass substrate 13, into the baking structure;! The industry's progress, the surface of the heating plate will gradually leave the powder of the dirty micro-agent or the operating ring in the light, it may be Zhuangsi to maintain the heating plate Clean.曰 曰 = = = 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 ' 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多 多Draw the surface of the heating plate η or to! Wipe the cloth with alcohol to keep it clean. :, and 'As the size of the glass substrate is gradually increased, it must be increased. The height of the baking machine is also increasing. ,,,, board private

1252137

1252137 V. INSTRUCTIONS (4) 2 · When cleaning personnel, the height and angle are limited, it is easy to produce a clean dead corner, and the personnel are also one of the dust sources. These factors will make the cleaning efficiency poor and increase the dust. The chance of particles contaminating the photoresist layer causes a drop in yield. Therefore, R&D personnel engaged in this related cleaning field are not committed to solving the shortcomings of the prior art, in order to obtain clean technology that simultaneously improves efficiency and safety. SUMMARY OF THE INVENTION One object of the present invention is to provide a dust removal device for a process chamber that automatically cleans the surface of the heating plate. Another object of the present invention is to provide a dust removal device for a process chamber which improves the cleaning efficiency of the surface of the heater plate. In order to achieve the above object, the dust removing device disclosed in the present invention is suitable for a process chamber having a heating plate. It consists of a dust chamber and a negative pressure line. The dust collecting chamber is disposed above the heating plate and has at least one dust collecting port and one exhaust port. The shape of the dust collection compartment is available in a variety of shapes and sizes. Because the process chamber is maintained at a high temperature for a long time, the dust collection chamber is made of financial materials such as metals and ceramics.

1252137 V. INSTRUCTIONS (5) The negative pressure piping is connected to the exhaust port of the dust collection compartment. A guiding structure may be respectively disposed on two sides of the process reaction chamber, and the guiding structure may be a sliding handle, a guiding rod or an equivalent structure thereof, and the guiding structure is matched with the two ends of the dust collecting chamber, and by A drive unit drives the dust collection chamber to move according to a guiding path provided by the guiding structure. The dust compartment must change the working position from time to time, resulting in the negative pressure pipeline will continue to stretch and bend, so the negative pressure pipeline is made of flexible pipe to prevent the pipeline from breaking. In the process reaction operation, when the surface of the heating plate gradually adheres to the dirt particles and needs to be cleaned, the dirt generated on the surface of the heating plate is sucked by the suction force generated by the negative pressure pipe, and the dust collecting port of the dust collecting chamber is used. Inhaled, and discharged into the negative pressure pipeline from the exhaust port of the dust collection chamber, the dirty particles are transported to the outside of the process reaction chamber by the negative pressure pipeline, and the dust collection is continuously changed by the driving unit during the cleaning process. The working position of the cabin, the heating plate is completely cleaned. In order to make the advantages and spirit of the present invention further disclosed, a detailed description will be made in conjunction with the drawings. [Embodiment] Please refer to Figs. 3A and 3B, which are schematic views of the structure of the first embodiment of the present invention.

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The agent baking reaction chamber of the present embodiment: in addition to running, is disposed in the - photoresist heatable air, and the baking agent baking reaction chamber 10 has a heating plate 11 to polish the surface of the substrate. The dust removing device comprises a collecting structure 23 and a driving unit μ, which is made of a metal material, and has a dust collecting port 2 1 2 which is a slit-shaped opening d. The dust chamber 21, a negative pressure line 22, and a guide. Dust collection 2 1 is set on the heating plate 1 1 is a columnar cabin 21a, the lower port 2 11, two sides and respectively have two rows of negative pressure pipeline 22 is w^ L Ma & Sex Official' is connected to the two exhaust ports 2 1 2, providing water, shop ^ ^ ^ 0 ^ 1 π ^ and end source when cleaning. In practice, consider the photoresist baking reaction to 10 0 for a library for 4 士 ... a . ^ shell to maintain a stable state of the chamber, if the negative pressure pipeline 2 2 ”,, book sweat, two It will affect the temperature balance in the photoresist baking reaction chamber 10, so a solenoid valve (not shown) or equivalent switch can be installed in the <2> 2 2 is a normally closed state, and is only turned on during cleaning. The guiding structure 23 is a two-slot 23a, 23b disposed on the two sides of the photoresist baking reaction f, and is slidably engaged with the two ends of the dust collecting chamber. The driving unit 24 is disposed at one end of the dust collecting chamber 21, and drives the dust collecting chamber 21 to move in the direction of the guiding bow path provided by the guiding structure 23.

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5. Invention Description (7), _ In the photoresist baking operation, the heating plate 1 1 > As shown in Figure 3C, when the heating plate needs a table: it will gradually adhere to the negative pressure line 22', and the suction force generated by it will be added to the two lines of cleaning when the 'guide grain 14' is collected by the dust collection chamber 21. The venting micro gas port 212 of the port 211 sucking into the surface of the H11 is discharged into the negative pressure line 22, and is discharged from the reaction chamber 1 by the negative particles 14 of the negative: J dust chamber 21. 'is road 2 will continue to drive the dust box to change the dust collection port 2 11 position 21 and while cleaning, use the drive single to slide in the X direction in the chute 2 3 a, 2 3 b to comprehensive Clean the heating plate 11. Please refer to FIG. 4A, which is a schematic structural view of a second embodiment of the present invention. In the dust removing device of the process chamber of the present embodiment, the same elements as those of the above-described first embodiment are denoted by the same reference numerals. In this embodiment, in particular, the dust collecting chamber 21 disposed above the force c hot plate 11 is a flat box body 2 1 b having a bottom surface and a same area as the heating plate 11 and having a plurality of dust collecting ports 2 11, the two side brigade has two exhaust ports 2 1 2 respectively. Referring to FIG. 4B, when the heating plate 11 needs to be cleaned, the negative pressure pipeline 22 is turned on, and the suction particles generated by the suction heating plate 11 are sucked by the dust collection 211. And discharged into the negative pressure line 22 from the exhaust port 212 of the dust collecting chamber 21'. The dirty particles 14 are collected by the negative pressure line 22.

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Since the bottom area and the heating of the dust collecting chamber 21 do not need to move the dust collecting chamber 21, the particles of the same size of the heating plate can be sucked up to achieve the purpose of cleaning and dust removal. ^Dirty and deficient at different positions. The above description has the following advantages: 1. The use of the present invention relies on the danger of the ladder environment. 2) The photoresist baking reaction chamber of the present invention does not need to be time-consuming and wastes the cleaning process. 3. The dirty particles of the surface of the present invention are extracted from the dust collecting chamber of each position of the heating plate to be sucked. In addition, the cleaning time with the prior art can eliminate the need to affect the output. The process of the invention is opposite to the process of the vacuum cleaner, and the process of pulling the heating plate from the machine is carried out. The process chamber of the reaction chamber is cleaned and dirty, and the efficiency is higher than that of the present invention. Risk _ y <dust removal, to carry out the removal of the room, and to reduce the dust to the 'dusting operation, so there is no clear hot plate table can be sure of the dust removal device, Ming ^ no longer need b clean, can Reduce the dust to open the cover and enter the room temperature, the resistance baking device can be driven or the cleaning can be used to make the large surface dirty 4 stay plus can be omitted to clean the organic product can effectively use X3U early yuan The increase in the angle of the angle is reduced. The personnel in the hot plate table must perform special actions to reduce the reading efficiency. The heating plate is actuated, and the q hot plate is the same, which requires cleaning and cleaning.

1252137 V. INSTRUCTIONS (9) The above is only an embodiment of the present invention, and is not intended to limit the scope of the present invention. Any modification made by those skilled in the art without departing from the spirit of the present invention The scope of the invention is therefore based on the scope of the application described below.

Page 14 1252137 Brief description of the diagram Figure 1 is a schematic diagram of the baking machine. Figure 1 B is a schematic diagram of a photoresist baking reaction chamber. Figure 2A and Figure 2B are schematic diagrams of conventional cleaning techniques. FIG. 3A and FIG. 3B are schematic diagrams showing the structure of the first embodiment of the present invention. Figure 3C is a schematic view of the cleaning process of the first embodiment of the present invention. Figure 4A is a schematic structural view of a second embodiment of the present invention. Figure 4B is a schematic view of the cleaning process of the second embodiment of the present invention.

Description of the figure: 2 1 a columnar cabin 2 1 b flat tank 21 1 dust collecting port 2 1 2 exhaust port 22 negative pressure pipe 2 3 guiding structure 2 3 a chute 2 3b sliding Slot 2 4 drive unit

1 baking machine 1 0 photoresist baking reaction chamber 1 1 heating plate 1 2 a open lid structure 1 2 b open lid structure 1 3 glass substrate 1 4 dirty particles 15 personnel 1 6 vacuum cleaner 21 dust chamber

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Claims (1)

1252137 6. Patent application scope 1. A dust removal device for a process chamber, the process chamber has a heating plate, and the dust removal device comprises: a dust collection chamber, which is disposed above the heating plate and has at least one dust collecting port and a venting port; and a negative pressure line connected to the exhaust port of the dust collecting chamber; when the dust removing device is performing cleaning, the heating is generated by the suction force generated by the negative pressure line The dirt particles adhering to the surface of the board are sucked by the dust collecting port of the dust collecting chamber, and then discharged to the outside of the process reaction chamber through the exhaust port and the negative pressure line. 2. The dust removing device of the process chamber according to claim 1, wherein the two sides of the process chamber are respectively provided with a guiding structure, and the two ends of the dust collecting chamber cooperate with the guiding structure. And driving the dust collecting chamber according to the guiding path provided by the guiding structure by using a driving unit. 3. The dust removing device of the process chamber according to claim 1, wherein the dust collecting port is a slit opening. 4. The dust removing device of the process chamber according to claim 1, wherein the dust collecting chamber is a flat body, the bottom area of which is the same as the area of the heating plate, and has a plurality of dust collecting ports. . 5. The dust removal device of the process chamber according to claim 1, wherein the negative pressure line is a flexible tube. Page 16 1252137 VI. Patent Application Range 6. The dust removal device of the process chamber according to claim 1, wherein the process reaction chamber is a photoresist baking reaction chamber. 7. The dust removing device of the process chamber according to claim 1, wherein the dust collecting chamber is made of a heat resistant material. 8. A process chamber having a dust removal function, comprising: a heating plate for heating air to perform a reaction required in the process; a dust collecting chamber disposed above the heating plate and having at least one dust collecting port An exhaust port; and a negative pressure line connected to the exhaust port of the dust collecting chamber; when the process chamber is being cleaned, the heating is generated by the suction generated by the negative pressure line The dirt particles adhering to the surface of the board are sucked by the dust collecting port of the dust collecting chamber, and are discharged to the outside of the process reaction chamber through the exhaust port and the negative pressure line. 9. The process chamber having a dust removal function according to claim 8, wherein the process chamber further comprises: a guiding structure, the two ends of the dust collecting chamber and the guiding structure cooperate with each other; The driving unit can drive the dust chamber to move according to the guiding path provided by the guiding structure. Page 17 1252137 々 申请 申请 申请 申请 申请 申请 申请 申请 申请 申请 申请 申请 申请 申请 制 制 制 制 制 制 制 制 制 制 制 制 制 制 制 制 制 。 。 。 。 。 。 。 。 。 。 。 。 11. The process chamber having a dust removal function according to claim 8, wherein the dust collection chamber is a flat tank having a bottom area equal to the area of the heating plate and having a plurality of dust collection spaces. mouth. 1 2. The process chamber having a dust removal function according to claim 8, wherein the negative pressure line is a flexible tube. 1 3 The process chamber having a dust removing function as described in claim 8 wherein the process chamber is a photoresist baking reaction chamber. The dust removing device of the process chamber according to claim 8, wherein the dust collecting chamber is made of a heat resistant material. Page 18