1250928 九、發明說明： 【發明所屬之技術領域】 本兔明係關於一種成都握呈另1制|+丄 之成型模具及其製特別是一種抗 空氣 象造成人們從顯示哭二4:冲曰气射的現象，此-反射現 了文字Φ眼睛所翻的影像除 日挤声 w W 、入絲頁示态的光線影像，因而導致、、主 』广儿積厚度係與薄膜材料的折射率(n)及入射光波長(又象) 因此，傳統抗反射多層膜便是藉由堆疊 基材表面:使得在-定波長範園内== 睛對5二；5::^而王現抗反射的效果。從夜行昆蟲的眼 線的抗反射能力剖析其角膜上的結構，及從結構變化造 成光丰反射性的推論，在光線進入的表面上存在有次序性且微 =的結構且具有低反射率（抗反射）的特性，此種結構可稱 為次波長結構（subwavelength structure，SWS);次波長結構的 原理便是在基材表面上造成漸進式折射材料，使得一定波長範 圍内的光線互相產生完全相消性干涉而呈現抗反射的效果二 以SWS結構作為抗反射效果的專利有US6M9735、 US5689372、US5252711、US6552842、US5820957、 US5817396、US5007708、US6175442 等。其中，US6359735 是以巨結構（Macrestructure)和微結構（Micr〇structure)在 1250928 ίΐίίίί料上構成抗反射表面，此種表面結構含有巨結構作 ^表面《造效果，在巨結構上製造有序的微結構；巨 = 人做長的1卜1⑻倍，有序的微結構週期(Penod。) ，彳、於-50nm，結構珠度小於100nm，而巨結構的製作方 =機械加工或祕刻方式，微結構賴作方法包括利用干涉 3式在感光光阻上以沖壓（Stampmg)製程製作。US5〇〇7· ，以電子束（e_beam)或離子蝕刻（i〇n etching)或全 Chol〇graphy)製作矩形凹凸表面構成sw 7396則是宣稱其表面規則結構高度為 ，產生的抗反射效果在入射角0〜60。之間，轉印的方法包 2^drawmg)或愿鑄（embossmg)或壓合（kmmatlng)或 射出成形（mjectmgmoulding)或傳統的冷熱成形方法。 旦;制技術之製作結構的方法都多少的使用到曝光顯 2 =饪（lithography)，此方式的設備成本很高，而且，對於 ^產及大面積商業化應用有極大的瓶頸，若以最先進的12 製程，來看，所形成的次波長結構可能的面積為30公 二見，舁目珂市場販售之成捲式光學膜的寬度約1〇〇公分而古 性朵ϊϊΐ上的問題，本發明的主要目的在於提供一種抗反射 =先予結構之成型模具及其製作方法，採用陽極處理方式，利 用鋁材在電場作用下形成的自組裝（self assembly)的氧化鋁 體中空結構，此圓柱體中空結構可控制孔洞的大小及排 列^序，使其符合抗反射光學結構，而不使用到雷射或電子束 XI，之吁貝5又備’隶終利用此抗反射性光學結構之成型模具， 將抗反射性光學結構轉印在適當的光學元件表面，即可製作抗 反射f生光+膜，藉此大體上解決先前技術所存在之問題。 因t，為達上述目的，本發明所揭露之抗反射性光學結構 之成型杈具，其由基材與基材表面之多個圓柱體中空結構所構 1250928 彡成，且_體中空結 m、孔徑與週期比例為〇· 2Γ〇.，、8。〇〇nm、殊度為150·〜20 a 製作方法，抗反f'1'生光學結構之成型模具之 且銘材表面的平均粗^度=度，以上之紹材， 體中空結構之週期為心:—構於銘材表面，而這些圓柱 ISOnm^O/zin > 〇.^ ^ 陽極處理二形:氧3 以下步驟··先進行第-次 除，最後，難行第二娜C二|5、;^化紹膜剝 的圓柱體中空結構於銘材表切述之多個氧化紹 說明本發明轉徵與實作，兹配合圖示作最佳實施例詳細 【實施方式】 成型^反射性光學結構之 〇Zi ^iTi^ 以形成氧化銘二驟、進行第一次陽極處理， 最後，則進行第二次陽極除^f膜（步驟 學結構， ==、孔徑與週期比例為 射性光學結構之成型模具。 」衣侍此抗反 以下則藉由-實施靖本發3_提供之抗反·光學結 1250928 構之成型模具及其製作方法作詳細說日狀 本發明之實施例之“射^學: 為基 (HC104)與乙醇iCHom —使用比例為1 · 5之過氯酸 * ^ =時間為3分鐘，_材 i fir； ί： ； 組合，另外，亦可利用研磨的方式 =》从酸之群組 制基材10的表面粗糙度。式對基㈣加以研磨，來控 隨後，如第2B圖所示，ff本；,, 之基材料行第-次陽ί處理對衣而面^^造度。小於〇·— ，之草酸的陽極處理液中，並 f 3%三氧祕（叫）之處個^ 2祕娜磷酸與 將這層氧化雜20剝除（步驟3〇〇)錢J 7刀鐘的時間後， 用Q.fi耳二=^陽極處理，同樣使 特（V) 3小時後，在基材====通以電壓如伏 2結構3。，請參考第3圖所示，由心 =空結構30，其週期大小為5〇〜3〇〇酿、孔徑柱肢 洙度為150腿〜20 // m、孔徑與週期比例A ^ 一画 射性光學結狀成賴具學賴1完成抗反 本實施例中，第-次Γ紐處理與第二次陽極處理所使用的 1250928 陽極係可選自草酸、硫酸與魏之群她人。 基材10==㈣編，係由一 mm. 10 ^：：：：ί 3； 式使其氧化成氧化紹的圓柱體中空处構30 14之陽極處理方 可以^複之成型模具，係 合金材質的另—模具。 +地具’例如可複製為錄或錄 硬化（w embQSSmgH=y，^ff^施例中，利用紫外光 W膠所形成的薄膜，使UV ^ ^具壓入未硬化的 後，用UV光使UV膠硬化後拔柱體中空結構 結構的光學膜。更化傻板膜，即可製得表面具有次波長 严£口 卜’本發明之抗反射性光學結構之成型模呈還可利用哉 (ILS^ C-ec.on 接著，浐夂老望4 波長、、·σ構而具有抗反射的效果。 次波長έ士構二先興二二’其上下兩條曲線分別顯示未具 施例ί氧樹月leP〇XyreSm)與利用本實 反=比未具次波長結構之光ί 別為，二射足 具在茲ΐί3ΐίί43為圖Γ4銘所製作之奈来孔洞模 找万在』衣為基材為鎳的模具之圓柱體中空結構 10 1250928 it 6 ® ’其上下兩條赠分臟示未具次波長 :^ = I二膜(材料為環氧樹脂epoxy resin)與利用第5圖之抗 反射=光+結構模具轉印後之光學膜(材料為環氧樹脂印呵 射率/ 未具次波長結構之光學膜可以降低2〜4 及1 s ’ t ί，所提供之抗反射性光學結構之成型模具 斷·里在嫩生成一定厚度且具有 t間距及分布的均勻度都可以藉由適當的陽極處理 此外’此抗反射性光學結構之成型模具可以用來在、 ^反射的效果，例如，應用於大尺寸顯示器或其他大面； i 觀的大面麟板，因此具有低成本的i y』於夕或ht^(GaAs)等半⑽基板，則可以使用 f ΓίΓΓ2=( )把銘金屬鍍於基板i面後， 作'欠ί長再配合侧，）技術，即可製 且大之錢聽騎轉設備可依模 一大小。又计，里產设備的寬度可達2公尺以上 ^误 影、雷射或電子束刻寫的方式的設備降低數十倍以上，光顯 雖穌刺赠述之紐實施鳩露 限定本發明，任何熟習相像技藝 亚非用以 ，内’當可作些許之更動與潤飾，因此 頁視本書賴之申請翻範 顧瘦鞄 【圖式簡單說明】 I疋4馮準。 的^==^所提供之抗娜絲结構之成型模具 11 1250928 構之=====實赚刪性光學結 具的=中tZiZ施Τ'反射性光學結構之成型模 槿且ί H=彻本實_之抗反射性光學結構之成型 下的^姑_未具:域長結歡光學齡不同波長 用電ί 猶之，議模具在利 片；及 ’、、、土材為鎳的模具之圓柱體中空結構之照 具轉學結構之成型模 的反射率。 、禾/、-人波長結構之光學膜在不同波長下 【主要元件符號說明】 10 基材 2〇 氧化銘膜 30 圓柱體中空結構 步驟100 提供Γ叙^ # 面平均粗缝度係小於〇1 才’其純度必須為以上，且表 步驟200進行第一次陽搞㈣、…一 步驟300剝除氧化鉬°地以形成氧化鋁膜 步驟400 進行第二、 的圓柱體中空結構 人陽極處理’以形成複數個氧化鋁1250928 IX. Description of the invention: [Technical field to which the invention belongs] The rabbit Ming system is about a kind of molding mold which is held in Chengdu and has a system of 丄 及其 及其 及其 及其 及其 及其 及其 及其 及其 及其 及其 及其 及其 及其 及其 成型 成型 成型 成型 成型 成型 成型 成型 成型 成型 成型The phenomenon of air ejaculation, this reflection of the text Φ eyes turned over the image in addition to the daily squeaking w W , into the silk screen state of the light image, thus resulting in, the main "Growth thickness" and the refractive index of the film material (n) and the wavelength of the incident light (again) Therefore, the conventional anti-reflective multilayer film is formed by stacking the surface of the substrate: in the -determined wavelength range == the eye is 5 2; 5:: ^ and the king is anti-reflective . From the anti-reflective ability of the eyeliner of the nocturnal insects to dissect the structure on the cornea, and the inference that the light reflection is caused by the structural change, there is a sequence and micro= structure on the surface where the light enters and has low reflectance (anti-reflection The characteristic of reflection), this structure can be called subwavelength structure (SWS); the principle of sub-wavelength structure is to create a progressive refractive material on the surface of the substrate, so that the light in a certain wavelength range is completely phased with each other. The anti-reflection effect is obtained by the elimination of the interference. The patents of the SWS structure as the anti-reflection effect are US6M9735, US5689372, US5252711, US6552842, US5820957, US5817396, US5007708, US6175442 and the like. Among them, US6359735 is composed of a giant structure (Macrestructure) and a microstructure (Micr〇structure) on an anti-reflective surface on a 1250928 ίΐίίί material. This surface structure contains a giant structure for the surface effect, and is manufactured on a giant structure. Microstructure; giant = one long 1 b (8) times, ordered microstructural period (Penod.), 彳, at -50 nm, structural bead size less than 100 nm, and the fabrication of giant structures = mechanical processing or secret engraving The microstructure-based method includes the use of an interference type 3 on a photosensitive photoresist to be fabricated by a stamping process. US5〇〇7·, using electron beam (e_beam) or ion etching (i〇n etching) or full Chol〇graphy to make a rectangular concave and convex surface. Sw 7396 claims to have a surface regular structure height, resulting in anti-reflection effect. The incident angle is 0 to 60. Between, the transfer method package 2 ^ drawmg) or cast (embossmg) or press (kmmatlng) or injection molding (mjectmgmoulding) or traditional cold forming method. Once; the method of making the structure of the technology is used to the exposure 2 = lithography, the cost of the equipment is very high, and there is a great bottleneck for the production and large-scale commercial application. According to the advanced 12 process, the possible area of the sub-wavelength structure formed is 30 gongs. The volume of the roll-form optical film sold in the market is about 1 〇〇 cm and the problem of ancient ϊϊΐ ,, The main object of the present invention is to provide an anti-reflection=pre-structured molding die and a manufacturing method thereof, which adopt an anode treatment method and utilize a self-assembled alumina body hollow structure formed by an aluminum material under an electric field. The hollow structure of the cylinder can control the size and arrangement of the holes so that they conform to the anti-reflective optical structure, without using the laser or the electron beam XI, and the yoke 5 is ready to use the anti-reflective optical structure. The molding die, which transfers the anti-reflective optical structure to the surface of an appropriate optical component, can produce an anti-reflection f-light + film, thereby substantially solving the problems of the prior art. In order to achieve the above object, the anti-reflective optical structure forming cooker disclosed in the present invention is formed by a plurality of cylindrical hollow structures 1250928 on the surface of the substrate and the substrate, and the hollow body of the body is m The ratio of the aperture to the period is 〇·2Γ〇., 8. 〇〇nm, the degree of speciality is 150·~20 a. The production method, the anti-f'1' raw optical structure of the molding die and the average roughness of the surface of the name material = degree, the above materials, the period of the hollow structure For the heart: - on the surface of the nameplate, and these cylinders ISOnm^O/zin > 〇.^ ^ Anode treatment of the shape: oxygen 3 The following steps · · first to perform the first division, and finally, difficult to the second Na C 2|5,;^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^ ^The reflective optical structure 〇Zi ^iTi^ to form the oxidation of the second step, the first anode treatment, and finally, the second anode removal method (step structure, ==, pore diameter and cycle ratio is The molding die of the optical optical structure. The following is the implementation of the present invention by the implementation of the anti-reverse optical knot 1250928 forming mold and the manufacturing method thereof. For example, "radiation": base (HC104) and ethanol iCHom - use perchloric acid in the ratio of 7.5 * ^ = time 3 minutes, _ material i fir; ί: ; combination, in addition, can also use the grinding method = "from the acid group to make the surface roughness of the substrate 10. The formula (4) is ground to control the subsequent, as in 2B, ff;;, the base material line first-time yang treatment on the clothing surface ^^ degree. Less than 〇·-, the oxalic acid in the anodizing solution, and f 3% trioxane ( Called) ^ 2 Ge Na phosphoric acid and stripped of this layer of oxidized impurities 20 (step 3 〇〇) money J 7 knife clock time, with Q.fi ear two = ^ anode treatment, the same special (V After 3 hours, the substrate ==== is connected to a voltage such as volts 2 structure 3. Please refer to Figure 3, from the heart = empty structure 30, the cycle size is 5 〇 ~ 3 brewing, aperture The column limb twist is 150 legs~20 // m, the aperture ratio and the period ratio A ^ A lithographic optical knot is formed by the reliance of the ray 1 to complete the anti-reverse embodiment, the first-time Γ processing and the second time The 1250928 anode used in the anodizing treatment may be selected from the group consisting of oxalic acid, sulfuric acid and Wei Zhiqun. The substrate 10==(4) is made by a mm. 10 ^::::ί 3; Hollow body structure 30 1 The anode treatment of 4 can be used to form a mold, which is another mold of alloy material. The ground fixture can be copied or recorded as hardened (w embQSSmgH=y, ^ff^ in the example, using ultraviolet light W glue The formed film is such that after the UV ^ ^ is pressed into the uncured, the UV glue is hardened by UV light, and the optical film of the hollow structure of the column is extracted. The surface of the film is made to have a sub-wavelength. The molding die of the anti-reflective optical structure of the present invention can also have an anti-reflection effect by using yttrium (ILS^C-ec.on, then, 4 wavelengths, and σ structure). The sub-wavelength gentleman's structure two Xianxing 22's, the upper and lower curves respectively show that there is no application ί oxygen tree month leP〇XyreSm) and the use of this real anti-= than the light without the sub-wavelength structure ί, The foot is in the ΐ ΐ ΐ ί ί ί ί ί 为 为 为 为 为 为 为 为 为 找 奈 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在Wavelength: ^ = I two films (the material is epoxy resin) and the optical film after the transfer of the anti-reflection = light + structure mold of Figure 5 (the material is the epoxy printing rate / no sub-wavelength) The optical film of the structure can be reduced by 2~4 and 1 s't ί, and the anti-reflective optical structure of the provided mold can be formed in a certain thickness and has a uniformity of t-spacing and distribution. Anode treatment In addition, the molding die of this anti-reflective optical structure can be used for the effect of reflection, for example, on large-size displays or other large-faced; i-view large-faced slabs, thus having a low-cost iy』 For a half (10) substrate such as Yuxi or ht^ (GaAs), you can use f Γ ΓΓ2 = () after the inscription plated metal to the substrate surface i, for 'together with the long side under ί,) technique, and a large sum of money can be made to ride listening mode to follow a rotation device size. In addition, the width of the production equipment can reach more than 2 meters ^ The equipment of the method of accidental shadowing, laser or electron beam writing is reduced by more than tens of times, and the light is not limited to the invention. Any familiarity with the technique of Asian and African, can be used to make some changes and retouching, so the page depends on the application of the book to turn the model and thin skin [simplified description] I疋4 Feng Zhun. ^==^ Provided by the anti-Nasi structure of the molding die 11 1250928 constituting ===== real earning optical optical fittings = medium tZiZ Τ 'reflective optical structure of the molding module and ί H =彻本实_ The anti-reflective optical structure under the molding of the ^ _ not: the domain length of the knots of the optical age of different wavelengths of electricity ί,, the mold is in the film; and ',,, the soil is nickel The reflectivity of the molding die of the transfer structure of the cylindrical hollow structure of the mold. , Wo /, - Human wavelength structure of the optical film at different wavelengths [Main component symbol description] 10 Substrate 2 〇 Oxidation film 30 Cylindrical hollow structure Step 100 Provide ^ ^ ^ #面面粗缝度系系 is less than 〇1 The purity must be above, and the first step of the step 200 is performed (four), ... a step 300 stripping molybdenum oxide to form an aluminum oxide film step 400 to perform a second, cylindrical hollow structure human anode treatment' To form a plurality of alumina