TWI242860B - Semiconductor package with heat dissipating structure - Google Patents
Semiconductor package with heat dissipating structure Download PDFInfo
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- TWI242860B TWI242860B TW092102837A TW92102837A TWI242860B TW I242860 B TWI242860 B TW I242860B TW 092102837 A TW092102837 A TW 092102837A TW 92102837 A TW92102837 A TW 92102837A TW I242860 B TWI242860 B TW I242860B
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- heat sink
- wafer
- chip
- semiconductor package
- heat dissipating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
- H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
1242860 五、發明說明(1) 丨[發明所屬之技術領域] I 本發明係有關於一種具散熱件之半導體封裝件,更詳 ί而吕之,係關於一種晶片與散熱件為點接觸方式黏接之半 |導體封裝件。 < j [先前技術] ! 隨著電子元件處理速度愈來愈快及體積之縮小,散熱 |性的需求亦相對提高。若無法提供有效的散熱機制,將影 響該電子元件之性能及可靠度,甚至縮短其壽命。因此, 如何有效逸散使用中之半導體晶片所產生之熱量,以確保 包覆有半導體晶片之半導體封裝件之使用壽命及品質,一 直為半導體封裝業界之一大課題。 針對於此,美國專利第5, 2 1 6, 2 78號案提出如第i ( A )圖所示之半導體封裝件。該種習知之半導體封裝件1乃 於半導體晶片10上黏接一散熱件n ( Heat spreader〇 , =該散熱件1 1之頂面i丨〇外露出用以包覆該晶片丨〇之封裝 膠體1 2。由於晶片丨〇直接與散熱件丨丨黏接且散熱件丨丨之頂 面1 1 0乃外曰露出封裝膠體i 2而直接與大氣接觸,故晶片j 〇 產生之熱置得直接傳遞至散熱件丨丨以逸散至大氣中,盆散 熱途徑毋須通經封裝膠體12,使該種半導體封裝件1具、良 好之散熱效率。 該種半導體封裝件1在製造上係先於一基板丨3之上表 面1 30上的預設位置處以膠黏劑丨4黏接該晶片i 〇 ;接著進 行辉線製程(Wire Bonding),以將多數之金線15銲接至 該晶片1 0及基板1 3之上表面丨3〇上,俾使該晶片丨〇電性連1242860 V. Description of the invention (1) 丨 [Technical field to which the invention belongs] I The present invention relates to a semiconductor package with a heat sink, and more specifically, it relates to a method in which a chip and a heat sink are adhered in a point contact manner. Connected Half | Conductor Package. < j [prior art]! As electronic component processing speeds become faster and smaller in size, the demand for heat dissipation is also increasing. Failure to provide an effective heat dissipation mechanism will affect the performance and reliability of the electronic component and even shorten its life. Therefore, how to effectively dissipate the heat generated by the semiconductor wafer in use to ensure the service life and quality of the semiconductor package covered with the semiconductor wafer has always been a major issue in the semiconductor packaging industry. In response, US Patent No. 5, 2 1 6, 2 78 proposes a semiconductor package as shown in FIG. I (A). The conventional semiconductor package 1 is a heat spreader n (Heat spreader 0, = the top surface of the heat sink 11) exposed on the semiconductor wafer 10, and a packaging gel for covering the wafer is exposed. 1 2. Since the chip 丨 〇 is directly bonded to the heat sink 丨 丨 and the top surface 1 1 0 of the heat sink 丨 is exposed to the packaging gel i 2 and directly in contact with the atmosphere, the heat generated by the chip j 〇 is placed directly Passed to the heat sink 丨 丨 to escape to the atmosphere, the basin heat dissipation path does not need to pass through the packaging gel 12, so that this kind of semiconductor package 1 has good heat dissipation efficiency. This kind of semiconductor package 1 is manufactured before one The wafer i is bonded to the wafer i at a predetermined position on the upper surface 1 30 of the substrate 3 with adhesive 4; then, a wire bonding process is performed to solder most of the gold wires 15 to the wafer 10 and On the upper surface of the substrate 13, the wafer is electrically connected.
17130. ptd17130.ptd
第7頁 1242860 五、發明說明(2) 接至該基板1 3上;於該晶片1 0與基板電性連接後,即將該 散熱件1 1藉由膠黏劑1 6與晶片1 0黏接;接著,進行模壓製 程使散熱件為形成該封裝膠體之封裝樹脂所完成包覆,接 著進行一研磨製程(Grinding)以如研磨石研磨位於該散 熱件上方已固化之封裝樹脂,直迄該散熱件1 1之上表面 Π 0外露出封裝膠體1 2。 該種半導體封裝件1之製程上之缺點即在於模壓作業 及後續之製程中的溫度變化下,基板1 3會因翹曲 (w a r p a g e)而導致晶片1 0歪斜,而會連帶地使以面接觸 方式黏接於該晶片1 0上的散熱件1 1亦產生斜置,如第1 ( B )圖所示,故進行後續之研磨作業時,磨輪(G r i n d i n g Wheel)除了去除覆蓋於該散熱件1 1’上的封裝膠體之外, 亦會磨除該散熱件1 Γ因斜置而上斜的部分,致易損及該 散熱件11 ’,如第1 ( C)圖所示;且由於該位置斜偏之散 熱件1 1 ’其一邊翼部1 1 Γ上斜,故磨輪磨除該上斜翼部 1 1 1 ’會減少該散熱件1 Γ與大氣的接觸面積,而影響至該 散熱件1 1 ’之散熱效率。 再者,對上述具基板1 3 ’翹曲之封裝件半成品進行研 磨製程時,由於斜置之散熱件1 1 ’,導致研磨後之散熱形 狀改變,如第1 ( C)圖所示,因而影響產品之外觀品質。 [發明内容] 鑒於上述習知技術之缺點,本發明之主要目的在於提 供一種具散熱件之半導體封裝件,使該散熱件與晶片得以 點接觸之黏接以避免因基板之歪斜使研磨製程中的散熱件Page 7 1242860 V. Description of the invention (2) Connected to the substrate 13; After the wafer 10 is electrically connected to the substrate, the heat sink 11 is bonded to the wafer 10 with an adhesive 16 Then, a molding process is performed so that the heat dissipation member is completely covered with the encapsulating resin forming the encapsulating colloid, and then a grinding process is performed to grind the solidified packaging resin above the heat dissipation member, such as a grinding stone, until the heat dissipation. The upper surface Π 0 of the component 1 1 exposes the encapsulant 12. The disadvantage of this semiconductor package 1 in the manufacturing process is that under the temperature change during the molding operation and subsequent processes, the substrate 13 will be warped and the wafer 10 will be skewed, and the surface will be brought into contact with each other. The heat sink 11 adhered to the wafer 10 in a manner is also inclined, as shown in FIG. 1 (B). Therefore, in the subsequent grinding operation, the grinding wheel (Grinding Wheel) is removed to cover the heat sink. In addition to the encapsulation gel on 1 1 ', the part of the heat sink 1 Γ which is tilted up due to the oblique position will be worn away, which will easily damage the heat sink 11', as shown in Figure 1 (C); and because The heat dissipating member 1 1 ′ inclined at this position is inclined upward on one side of the wing portion 1 1 ′, so grinding the grinding wheel 1 1 1 ′ will reduce the contact area of the heat dissipating member 1 Γ with the atmosphere and affect the The heat dissipation efficiency of the heat sink 1 1 ′. Furthermore, during the polishing process of the above-mentioned semi-finished package with a substrate 1 3 'warm, the heat dissipation shape after polishing is changed due to the inclined heat sink 1 1', as shown in FIG. 1 (C). Affect the appearance quality of the product. [Summary of the Invention] In view of the shortcomings of the above-mentioned conventional technology, the main object of the present invention is to provide a semiconductor package with a heat sink, so that the heat sink and the wafer can be adhered in point contact to prevent the substrate from being deformed during the polishing process Heat sink
17130.ptd 第8頁 1242860 五、發明說明(3) 受到影響。 本發明之另一目的在提供一種具散熱件之半導體封裝 件,使該散熱件與晶片之黏接無斜置之虞,以利進行後續 作業。 為達上揭及其它目的,本發明所提供之具散熱件之半 導體封裝件係包括:一晶片承載件;一接置於該晶片承載 件上並與該晶片承載件電性連接之晶片;一具有一朝向該 晶片之第一表面、一對應於該第一表面之第二表面及一自 該第一表面凸伸出之連接部的散熱件,其中,該連接部對 應於該晶片部位之一表面上設有多數凸部;該凸部用以與 該晶片黏接而使該散熱件黏接至該晶片上,且使該散熱件 與該晶片間隔開;以及一用以包覆該晶片及該散熱件封裝 膠體,並使該散熱件之第二表面外露出該封裝膠體。 該散熱件係藉由連接部之多數凸部與晶片黏接,以提 供點接觸之黏接方式,從而避免因基板之歪斜導致該散熱 件斜置於晶片上,故於研磨製程中將不致損毀該散熱件。 [實施方式] 如第2 ( A)及第2 ( B)圖所示者分別為本發明之半導 體封裝件之散熱件2 1之側視圖及仰視圖。 參照第2 ( A)及第2 ( B)圖,本發明之半導體封裝件 之散熱件2 1係由銅、鋁、銅合金或鋁合金等金屬材料製 成,其具有一上表面210、一相對於該上表面21 0之下表面 2 1 1以及一自該下表面2 1 1凸伸出之連接部2 1 2 ;且該連接 部2 1 2與晶片(未圖示)相對之一表面2 1 3上形成有多數之17130.ptd Page 8 1242860 V. Description of Invention (3) Affected. Another object of the present invention is to provide a semiconductor package with a heat sink, so that the adhesion between the heat sink and the wafer is not inclined, so as to facilitate subsequent operations. In order to achieve the disclosure and other purposes, the semiconductor package with a heat sink provided by the present invention includes: a wafer carrier; a wafer connected to the wafer carrier and electrically connected to the wafer carrier; A heat sink having a first surface facing the wafer, a second surface corresponding to the first surface, and a connection portion protruding from the first surface, wherein the connection portion corresponds to one of the wafer portions There are a plurality of convex portions on the surface; the convex portions are used to adhere to the wafer so that the heat sink is adhered to the wafer, and the heat sink is spaced from the wafer; and a cover is used to cover the wafer and The heat dissipating member encapsulates the gel, and the second surface of the heat dissipating member exposes the encapsulating gel. The heat sink is bonded to the chip by most of the convex parts of the connection part to provide a point contact bonding method, so as to avoid the heat sink being tilted on the wafer due to the skew of the substrate, so it will not be damaged during the grinding process The heat sink. [Embodiment] As shown in Figs. 2 (A) and 2 (B), the side view and the bottom view of the heat sink 21 of the semiconductor package of the present invention are respectively. Referring to Figures 2 (A) and 2 (B), the heat sink 21 of the semiconductor package of the present invention is made of metal materials such as copper, aluminum, copper alloy or aluminum alloy, and has a top surface 210, a The lower surface 2 1 1 is opposite to the upper surface 21 0 and a connecting portion 2 1 2 protruding from the lower surface 2 1 1; and a surface of the connecting portion 2 1 2 opposite to the chip (not shown) There is a majority on 2 1 3
第9頁 17130. ptd 1242860 五、發明說明(4) 凸部2 1 4,藉由該些凸部2丨4以與該晶片黏接而使該散熱件 2 1黏接至該晶片上。 、 接著,如第3 ( A)至第3 ( F)圖所示者為本發明之半 導體封I件2之製法流程示意圖。如第3 ( a)圖所示,於 一基板23之一上表面2 3 0上之預設位置處以膠黏劑24黏接 一晶片20,並以多數之金線25分別銲接至該晶片2〇及基板 2 3之上表面2 3 0,以使該晶片2 0電性連接至該基板2 3 (此 一銲線製程與習知者相同,故在此不予贅述)。 然後’如第3 ( B)圖所示,於該晶片2〇與基板23電性 連接後,即將該散熱件2 1藉由一絕緣材質之導熱性膠黏劑 26 ( thermal grease)與晶片 20黏接。 如第3 ( C)圖所示,該散熱件2丨之連接部2丨2之表面 2 13所形成的多數凸部214將與該晶片2〇之上表面2〇〇黏 接,藉由該凸部214以提供晶片20與散熱件2]"一 點接觸 之黏接結構,且透過該膠黏劑26使晶片2 面 散熱件21之連接部212表面213可全面黏接,因=由於利 m 1接方式,從而克服因晶片20查斜而造成散熱 件2 1_置的問題,進而便於後續之製程。 如第3 ( D)圖所示,將該合有散熱件2丨、晶片2 〇及基 =Μ之半成品置入封裝模具之模穴(未圖示)中,以進行 二I作業,藉由該注入該模穴内之封裝樹脂形成一用以包 復該散熱件2卜晶片2〇及基板23之封裝膠體22。 如第3 ( Ε)圖所示,該模壓製程結束 行研磨而使散熱件21之上表自210直接外露出用^包覆該Page 9 17130. ptd 1242860 V. Description of the invention (4) The convex portions 2 1 4 are bonded to the wafer by the convex portions 2 丨 4 to adhere to the wafer. Then, as shown in Figs. 3 (A) to 3 (F), it is a schematic flow chart of the method for manufacturing the semiconductor package I of the present invention. As shown in FIG. 3 (a), a wafer 20 is bonded with an adhesive 24 at a predetermined position on an upper surface 2 3 0 of one of the substrates 23, and a plurality of gold wires 25 are respectively soldered to the wafer 2 〇 and the upper surface 2 3 0 of the substrate 23, so that the chip 20 is electrically connected to the substrate 2 3 (this bonding wire manufacturing process is the same as the conventional one, so it will not be repeated here). Then 'as shown in FIG. 3 (B), after the chip 20 is electrically connected to the substrate 23, the heat sink 21 is connected to the chip 20 with a thermally conductive adhesive 26 (thermal grease) of an insulating material. Adhesive. As shown in FIG. 3 (C), the majority of the convex portions 214 formed on the surface 2 13 of the connecting portion 2 丨 2 of the heat sink 2 丨 will be bonded to the upper surface 200 of the chip 20. The convex portion 214 provides a bonding structure of the chip 20 and the heat sink 2], and the surface 213 of the connection portion 212 of the heat sink 21 on the surface of the chip 2 can be fully adhered through the adhesive 26, because The m 1 connection method overcomes the problem of placing the heat sink 2 1_ due to the tilting of the wafer 20, thereby facilitating subsequent processes. As shown in FIG. 3 (D), the semi-finished product with the heat sink 2 丨, the wafer 20, and the base = M is placed in the cavity (not shown) of the packaging mold to perform the second I operation. The encapsulating resin injected into the cavity forms an encapsulating gel 22 for encapsulating the heat sink 2, the wafer 20, and the substrate 23. As shown in FIG. 3 (E), the molding process is finished, grinding is performed so that the upper surface of the heat sink 21 is directly exposed from 210, and the surface is covered with ^
17130. ptd17130.ptd
1242860 五、發明說明(5) 晶片Γί=Γ2的表面,使散熱效率進—步提高。 如弟(F)圖所π,該研磨製程結束後,即於基板 之下表面231上植接多數銲球27,以供該晶片2鳴之^ 界裝置形成電性連接關係。並且以切割工具進行二單、 (Si ngul ah οη)以形成複數個單一之半導體封 一植球及切單製程與習知者相同,故在此不予贅% 如第4圖所示,藉由半導體封裝件4之散熱件1連接部 2 12表面21 3所形成之凸部214,將使晶片2〇,與該散埶件 之凸部214接觸,而散熱件21之連接部212未形成凸部2 之表面21 3則與晶片20,上表面2〇〇,之膠黏劑26 此本發明之半導體封裝件(2、4)之晶片(2〇/'2〇 = 散熱件2 1間形成點接觸之黏接結構,而非習知之面接觸、, 如此不因晶片20’之翹曲而使與晶片2〇,黏接之散熱件21 置。 …、 ” 上述之實施例僅用以例釋本發明之特點及功效,而 用以限定本發明之可實施範疇,例如,如第2 ( A)及第2 (β)圖所示之散熱件2 1而言,其仰視外形並不限定為圓 形’其亦可為方形等外形;再者,形成於該連接部 表面21 3的凸部21 4數量及形狀亦非如圖式之限定,且今美 板2 3除如圖示之BGA( Ball Grid Array)基板外,復可靡 用於QFN ( Quad Flat Non lead)導線架之晶片承載件或g 晶式BGA上,亦即,端視實施形態而定。故在未脫離本發1 明上述揭露之精神與技術特徵下,任何運用本發明所揭X示 者而完成之修飾或改變,均應仍為本發明下揭之申★青專^1242860 V. Description of the invention (5) The surface of the wafer Γί = Γ2 further improves the heat dissipation efficiency. As shown in Figure (F), after the polishing process is completed, a plurality of solder balls 27 are planted on the lower surface 231 of the substrate, so as to form an electrical connection relationship between the two boundary devices of the chip. And the cutting tool is used to make two orders (Si ngul ah οη) to form a plurality of single semiconductors. The process of encapsulating and planting the balls is the same as that of the known person, so it is not redundant here. As shown in Figure 4, borrow The convex part 214 formed by the heat sink 1 connection part 2 12 surface 21 3 of the semiconductor package 4 will make the wafer 20 contact the convex part 214 of the loose part, and the connection part 212 of the heat sink 21 is not formed. The surface 21 3 of the convex part 2 and the adhesive 20 of the wafer 20, the upper surface 200, and the wafer 26 of the semiconductor package (2, 4) of the present invention (2〇 / '2〇 = the heat sink 21) Form a point contact bonding structure, instead of a conventional surface contact, so that the heat sink 21, which is bonded to the chip 20, is not placed due to the warpage of the chip 20 '. The above-mentioned embodiment is only used for The features and effects of the present invention are exemplified and used to limit the implementable scope of the present invention. For example, as shown in Figures 2 (A) and 2 (β), the heat sink 21 does not look upright. It is limited to a circular shape, which may also have a shape such as a square shape; moreover, the number and shape of the convex portions 21 4 formed on the surface 21 3 of the connecting portion are not limited by the drawings. In addition to the BGA (Ball Grid Array) substrate shown in the figure, today's US board 2 3 can be used on QFN (Quad Flat Non lead) leadframe wafer carriers or g-crystalline BGA, that is, It depends on the implementation form. Therefore, without departing from the spirit and technical features of the disclosure disclosed in this disclosure, any modification or change made using the disclosure disclosed in the present invention should still be the application disclosed in the present invention. ★ Youth Academy ^
17130. ptd 第11頁 1242860 五、發明說明(6) 範圍所涵蓋。 17130. ptd 第12頁 1242860 圖式簡單說明 [圖式簡單說明] 第1 ( A)至第1 ( C)圖係習知具散熱件之半導體封裝 件之剖視圖; 第2 ( A)及第2 ( B)圖係分別為本發明之半導體封裝 件之散熱件之側視圖及仰視圖; 第3 ( A)至第3 ( F)圖係本發明之具散熱件之半導體 封裝件之製造流程示意圖;以及 第4圖係本發明之具散熱件之半導體封裝件之另一實 施例示意圖。 卜2、4 半導體封裝件 10、 10’ 、 20、20, η、11’ 散熱件 110 頂面 111' 111 ’翼部 12 封裝膠體 13、23 基板 130、 200 > 2 0 0、210' 230 上表面 m、211 、231 下表面 16 膠黏劑 21 散熱件 212 連接部 213 表面 214 凸部 215 弧面結構 24、26、 2 6 ’膠黏劑 25 金線 27 鮮球 3 磨輪 曰a 片17130. ptd Page 11 1242860 V. Description of Invention (6) The scope is covered. 17130. ptd Page 12 1242860 Brief description of drawings [Simplified description of drawings] Sections 1 (A) to 1 (C) are sectional views of conventional semiconductor packages with heat sinks; Sections 2 (A) and 2 (B) is a side view and a bottom view of the heat sink of the semiconductor package of the present invention; Figures 3 (A) to 3 (F) are schematic diagrams of the manufacturing process of the semiconductor package with the heat sink of the present invention And FIG. 4 is a schematic diagram of another embodiment of a semiconductor package with a heat sink according to the present invention. Bu 2, 4 Semiconductor packages 10, 10 ', 20, 20, η, 11' Heat sink 110 Top surface 111 '111' Wing 12 Packaging gel 13, 23 Substrate 130, 200 > 2 0 0, 210 '230 Upper surface m, 211, 231 Lower surface 16 Adhesive 21 Radiator 212 Connecting portion 213 Surface 214 Convex portion 215 Curved surface structure 24, 26, 2 6 'Adhesive 25 Gold wire 27 Fresh ball 3 Grinding wheel a piece
17130.ptd 第13頁17130.ptd Page 13
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