TWI226858B - Thin sheet conductive film and production of the same - Google Patents

Abstract

This invention relates to a thin sheet conductive film, particularly to one with low resistance and high transmittance. This invention mainly employs optical interference principles among film layers to obtain a transparent, conductive multi-layer film. At least one metal film and at least one conductive non-metal film are laminated over a substrate. The metal film is a metal, metal mixture or its alloy, consisting of one selected from the followings: Cr, Al, Ti, platinum and Au. The conductive non-metal film consists of one selected from the following, an oxide, nitride, carbide, boride, semiconductor and its mixture, organic and high molecular polymer or its chemical compounds. An interface layer may be added between the metal film and the non-metal film. The interface layer may be a conductive metal, half-metal, conductive non-metal or its mixture. Since this invention includes at least one metal film, it is able to reduce resistance to obtain excellent conductivity, while implementing optical interference principles among film layers to obtain provide the thin sheet with the effect of high transmittance.

Description

Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 1226858

The present invention relates to a thin-plate type conductive film, and more particularly to a thin-plate type conductive film having a low electric P and a transmittance. In the present invention, the transparent conductive multi-layer film designed by using the principle of optical interference between film layers in the main county, Di Xi & 1 ^ Dan is stacked on a substrate to form at least / layer of metal film layer and ^-layer of non-conductive Metal film layer, the metal film layer is formed of metal, metal mixture, or β gold, such as chromium, aluminum, titanium, platinum, silver, gold and other gold ^, any composition; the conductive non-metal film The layer system is selected from conductive oxides and gas

Milk 11, carbides, borides, semiconductors and mixtures thereof, organic / private / and ancient / V are all sub-polymers or any combination thereof. On the same temple, an interface layer can also be added between the 5 metal film layer and the non-metal film layer. The interface layer can be conductive metal, semi-metal, conductive non-metal or a mixture thereof. Because v has a metal hafnium layer, the resistance can be reduced to obtain good conductivity, and the design based on the principle of V> V makes the film layer have high transmittance and other effects. Background: Recently, as portable displays or notebook computers have been widely used, flat-panel displays such as liquid crystal displays (LCD), thin-film electroluminescence displays (TFEL), and plasma display panels (PDP) have gradually been replaced. The traditional cathode ray officer (CRT) has become a new generation display device. Among them, LCD monitors are the most popular. The power consumption of such displays is low, and the performance of TV screens and monitors can further replace cathode ray tubes. The structure of the liquid crystal display is formed by injecting a liquid crystal (liquid crystal) in the middle of two parallel conductive panels and adding other devices. The conductive panel is designed with patterns such as letters or Arabic numerals or a dot matrix and uses the electro-optic of the liquid crystal. The effect allows the aforementioned patterns to be selectively displayed. Since the molecules of the liquid crystal are arranged along the direction of the external electron beam, the optical axis of the liquid crystal is -2- This paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm)

Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 1226858 A7 B7___ 15. The description of the invention (2) (optical axial) is in the direction of the external electric chirp, so that the external light can follow the liquid crystal with the external electric chirp. The area's optical axis direction output 'causes its corresponding panel pattern to be displayed; on the other hand, if there is no liquid crystal area with an external battery, no light is output. In fact, the conductive panel is provided with a number of transparent electrodes made of indium tin oxide (hereinafter referred to as ITO), which are generally 18 cm long, 270 microns wide, and 0.2 microns thick to match 6 4 0 X 4 8 0 point matrix. Because the strip-shaped I τ 〇 transparent electrode itself has a resistivity of at least 20 Ω / □, there are some voltage drops across the electrode, so that the intensity of the electric field received by the liquid crystal located at both ends of the electrode also follows. There are some differences, which leads to shortcomings such as poor picture quality and overall power consumption. In order to solve the foregoing problem, the improved IT 0 structure (as shown in the first figure) as disclosed in US Patent Publication No. 5,7 〇 02, 8 71 will reduce the resistivity of the entire transparent conductive electrode. . In Figure 1, S represents a substrate whose material is glass or transparent plastic, 10 is a transparent conductive ITO pattern, and two layers of nickel (Ni) 12 and gold (Au) 14 are provided on the side of the IT0, and nickel is used. Wajin has a very low resistivity, so that the difference in voltage drop across the ITO can be reduced, thereby achieving the effect of improving the quality of the daytime surface. This kind of conventional metal film layer has not been subjected to any optical interference treatment, and is basically opaque, so the area occupied by such metal films is limited, otherwise the amount of light penetration will be affected, and its light transmission rate There is a need for further changes. Improved technology and application method In view of the above-mentioned various defects of the conventional conductive film, the inventor set out to conceive it. After painstaking research, the present invention finally came into being. It is based on a substrate _3_ This paper size applies to China National Standard (CNS) A4 (210x297 mm)-(Please read the precautions on the back before filling this page)

Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 1226858 A7 B7 V. Description of the Invention (3) At least one metal film layer and at least one conductive non-metal film layer are stacked on top of each other to achieve good conductivity, and by optical interference The design of the principle enables the film to have high transmittance and other effects, and can be widely used in light emitting diode (LED), electroluminescence (EL) light sources, and flat light sources, such as: daily white flat light sources, indoor Color flat light source for external advertising, flat light source for warning, flat light source for instrument and backlight panel, etc. Summary of the Invention: The main object of the present invention is to provide a thin-plate type conductive film structure with low resistivity and extremely high transmittance, and a method for manufacturing the same. The invention is mainly a transparent conductive multilayer film designed by using the principle of film optical interference, which is formed on a substrate to form at least one metal film layer and at least one conductive non-metal film layer. The metal film layer is a metal, Formed by a metal mixture or its alloy, such as chromium, titanium, titanium, platinum, silver and gold, or any mixture thereof; the conductive non-metallic film layer is selected from conductive oxides, nitrides, carbides, boron Any one or a combination of compounds, semiconductors and mixtures thereof, organic substances and high molecular polymers. At the same time, an interface layer may be added between the metal film layer and the non-metal film layer, and the interface layer is made of metal, semi-metal, conductive non-metal or a mixture thereof. Because it has at least one metal film layer, the resistance can be reduced to obtain good conductivity, and the optical interference thin film film stack is designed to form film layers of different thicknesses to have high optical transmission and other effects. BRIEF DESCRIPTION OF THE DRAWINGS: The first figure is a conventional thin-plate conductive film structure. The second figure is a thin-plate type conductive film structure according to the first embodiment of the present invention. -4- This paper size applies to Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page)

1226858 Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the Invention (4) The third figure is a thin-plate type conductive film structure according to the second embodiment of the present invention. The fourth figure is a thin plate type conductive film structure according to a third embodiment of the present invention. The fifth figure is a thin-plate type conductive film structure according to a fourth embodiment of the present invention. The sixth figure is the relationship between the transmittance and wavelength of the two-layer conductive film. The seventh graph is a graph of the transmittance and wavelength of the three-layer conductive film. The eighth figure is a graph of the transmittance and wavelength of the five-layer conductive film. The ninth figure is a graph of the relationship between the transmittance and wavelength of the nine-layer conductive film. The tenth figure is a relationship diagram of the transmittance and wavelength of another nine-layer conductive film. Detailed description of the first preferred embodiment: The present invention mainly uses the metal material to have a very low resistivity to solve the aforementioned problem of the difference in voltage drop across the electrodes. Opaque, which means that the metal has a very low transmittance to most light, so it cannot achieve the purpose of being a display. The present invention proposes an effective method to solve this problem, that is, the present invention uses the principle of optical interference to design a multilayer film containing metal, so that it has both low resistivity and high transmittance. First, please refer to the second picture, in which the film layer 1 is a substrate and the material can be glass or transparent plastic materials; the film layer 2 is a conductive non-metal film layer, and the material is mostly a conductive oxide such as ITO or nitrogen Compounds such as TiN, TaN, or conductive carbides, such as TaC, or borides, such as TiB, or conductive semiconductors and mixtures thereof, such as Si, Ge, GaAs or organics and polymers ( polymer), etc .; and the film layer 4 is made of metal. The metal film layer is formed of metal, metal mixture, or alloy thereof, such as chromium, metal, titanium, platinum, silver, and gold or any of its Paper size applies Chinese National Standard (CNS) A4 (210X 297 mm) (Please read the precautions on the back before filling this page)

Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 1226858 A7 B7___ V. Description of Invention (5) ^ ^ Mixture. The positions of the film layers 2 and 4 can be changed. · Detailed description of the second preferred embodiment: Please refer to the third figure again. The film layer 1 is a substrate, and the material can be glass or transparent plastic. The film layer 2 is a conductive non-metallic film layer. Conductive oxides, such as ITO, or nitrides, such as TiN, TaN, or conductive carbides, such as TaC, or borides, such as TiB, or conductive semiconductors and mixtures thereof, such as Si, Ge, GaAs, or Organic material (orSanic), polymer (polymer), etc .; the film layer 4 is made of metal, and the metal film layer is formed of metal, metal mixture or alloy thereof, such as chromium, aluminum, titanium, platinum, silver and Metals such as gold or any mixture thereof; and a film layer 3 is plated between the film layers 2 and 4 as an interface layer, and the film layer 3 can be made of metal, semi-metal, conductive non-metal or its mixture or alloy material, Materials such as Cr, Al, or semiconductors and their mixtures such as Si, Ge, GaAs, etc. are used. The positions of the film layers 2 and 4 can be interchanged. Detailed description of the third preferred embodiment: Please refer to FIG. 4 again, which is composed of a film layer 2 and a film layer 4 to form a basic film layer unit. Layer film stacks, such as 2-4 film stacks, are designed to form conductive multilayer films, where the thickness of each layer can be changed according to actual needs, and the effect of reducing the overall resistivity can be achieved by the repeated metal layer. The film layer 2 or the film layer 3 may also be a mixed layer of the above materials, and the overlapping order of the film layer 2 and the film layer 3 may be exchanged. The method for forming each film layer of the present invention can be formed by sputtering, evaporation, chemical vapor deposition (CVD), or physical vapor deposition (PVD). Among them, the chemical vapor deposition method may be a thermal chemical vapor deposition method, a plasma-assisted chemical vapor deposition method, and a metal organic chemistry or ion-6. This paper size is applicable to the Chinese National Standard (CNS) A4 specification (21〇 χ297 mm) " (Please read the notes on the back before filling in this page}

1226858 A7 B7 V. Description of the invention (6) Sub-assisted vapor deposition. The physical vapor deposition method may be a thermal resistance vapor deposition method, a thermal resistance plasma or ion assisted vapor deposition method, an electron gun vapor deposition method, an electron gun plasma or ion assisted vapor deposition method, a sputtering coating method, or a sputtering method. Radio plasma or ion-assisted vapor deposition, arc plasma coating. In order to simplify the process and be suitable for mass production, the optimal number of layers in this embodiment is 2-20 layers. In addition, a film layer 3 is plated between the film layer 2 and the film layer 4 as an interface layer to constitute a basic film layer unit. Detailed description of the fourth preferred embodiment: In order to protect the interface between the conductive multilayer films of the second figure, and to respond quickly to higher frequency electrical signals and further reduce the resistivity, we have A film layer 5 of metal, semi-metal, conductive non-metal, or a mixture or alloy thereof is distilled on at least one side or above one end, as shown in the fifth figure. Comparing the second graph with the fifth graph, it can be found that when a voltage drop is applied to the film layer 2, the current in the second graph will flow to the center along the two ends of the non-metal film of the film layer 2, because of the resistance of the conductive non-metal film Influence, when the current flows from both ends of the conductive non-metallic film to the center, the current will gradually decrease. However, the staff of the Central Standards Bureau of the Ministry of Economic Affairs printed the gold, semi-A, and fifth genus of the cooperative as above, and plated 5 end layers on the square film. The metal is non-conductive, and the metal XL is connected by its membrane system or the metal alloy of the road. The non-current mixed electricity is conducted or directed. When the metal is flowing, the gold current shows the non-electricity of the electricity to make the conductive layer. The central resistance of the body resistance's membrane is from the middle to the meridian ☆ 1 The two electric powers 5 The low-layer rate membrane is made of gold and its height is increased. The second layer is more than the second layer. On the side, there are as few layers as possible, and on the other side. The efficiency of the work is a matter of color. Nitrogen, oxygen, and oxygen can be mixed with the conductive layer of the conductive layer. Wuhezizi high and machine (please read the precautions on the back before filling this page)

This paper size applies to Chinese National Standard (CNS) A4 specification (210X297 mm) 1226858 A7 B7 V. Description of the invention () Drawing number description S ·· substrate; 1. substrate; 2. conductive non-metallic film layer; 3 Interface layer; 4. Metal film layer; 5. Film layer; 10 .. Transparent conductive ITO; 12, 14 ... Film layer (Please read the precautions on the back before filling this page) Wisdom of the Ministry of Economic Affairs The paper size printed by the Property Cooperative's Consumer Cooperative is applicable to China National Standard (CNS) A4 (210 X 297 mm)

Claims (1)

I vehicles 85 | Α8 Β8 C8 D8 (Amended in August 1999) 6. Scope of patent application 1. A thin-plate conductive film structure includes: a non-conductive transparent glass or plastic substrate; a conductive film on a surface of the substrate, the conductive The film is composed of a plurality of conductive layers, wherein the conductive layers may be metallic or non-metallic materials, but the first conductive layer on the surface of the substrate is the metallic material; wherein the conductive film contains The thickness and order of each conductive layer and the average optical refractive index of visible light are arranged under the principle of optical interference, so that the electrically conductive film has an average visible light transmittance of 60% -95%. 2. For example, the thin-plate type conductive film structure of the scope of patent application, wherein the plurality of conductive layers of the conductive film are 2η layers, η is an integer greater than or equal to 1 and less than 10, and the odd number of conductive layers are the same or different The metallic substance and the even-numbered conductive layers are the same or different non-metallic substances. Printed by the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs (please read the precautions on the back before filling this page) 3. If the thin-plate conductive film structure in item 2 of the patent application scope, where the metallic substance is a single metal or a metal The alloy and the non-metallic substance are selected from the group consisting of conductive oxides, nitrides, carbides, borides, semiconductors, organics, or high molecular polymers, and mixtures of any one or more thereof. 4. The thin-plate type conductive film structure according to item 3 of the application, wherein the metallic substance is gold, silver, copper, chromium, aluminum, titanium, or an alloy thereof. -Τ ---------- 1Π. This paper size applies to China National Standard (CNS) A4 specification (210X297 mm) 1226858 ABCD (Amended in August 1999) Printed by the Consumers' Cooperative of the Central Bureau of Standards, Ministry of Economic Affairs 6. The scope of patent application 5. The thin-plate type conductive film structure according to item 4 of the scope of patent application, wherein the metallic substance is silver or an alloy of silver and other metals. 6. The thin-plate conductive film structure according to item 3 of the patent application scope, wherein the non-metallic substance is indium oxide doped with tin or zinc, silicon carbide (SiC), doped diamond-like, Sn02, ln203, ZnO , CdO, or Cd0-Sn02. 7. For example, the thin-plate type conductive film structure of the scope of patent application, wherein the non-metallic substance is indium oxide (ITO) or silicon carbide (SiC) doped with tin 〇8. The thin-plate type conductive film structure, wherein the metallic substance is silver or an alloy of silver and other metals. 9. The thin-plate type conductive film structure according to item 1 of the application, wherein the thickness of each of the conductive layers included in the conductive film is between 1 nm and 200 nm. 10. The thin-plate conductive film structure according to item 1 of the patent application scope, further comprising one or more conductive interface layers between the conductive layers to increase the bonding between layers, and the thickness of the conductive interface layer and The average visible optical refractive index does not substantially reduce the average visible light transmittance of the transparent conductive film plate. -II- This paper size is applicable to China National Standard (CNS) A4 (210X 297mm) (Please read the precautions on the back before filling this page) Order 1226858 A8 B8 C8 D8 Printed by the Consumers ’Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs System 6. Application Patent Scope 11. The thin-plate type conductive film structure according to item 10 of the application patent scope, wherein the conductive interface layer is a metal, a metal alloy, or a doped semiconductor. 12. The thin-plate conductive film structure according to item 1 of the patent application scope, further comprising one or more conductive or non-conductive interface layers between the substrate and the conductive film to increase the bonding between the two, and the conductive The thickness of the non-conductive interface layer and the average optical refractive index of visible light do not substantially reduce the average visible light transmittance of the transparent conductive film. When the interface layer is a single layer, the interface layer may be a conductor or It may be non-conductive; when the interface layer is multilayer, the conductive interface layer is closer to the conductive film, and the non-conductive interface layer is closer to the substrate. 13. The thin-plate type conductive film structure according to item 12 of the application, wherein the conductive interface layer is a metal, a metal alloy, or a doped semiconductor. 14. The thin-plate conductive film structure according to item 12 of the application, wherein the non-conductive interface layer is selected from non-conductive oxides, nitrides, fluorides, carbides, organics, high-molecular polymers, and any of them. A group of one or more mixtures. -------- ^ I- ^ IIΦ ----- Order ------ $ 11- (Please read the precautions on the back before filling this page) This paper size applies to Chinese National Standard (CNS) A4 size (210 X ^ 2: 7 mm)