TWI223007B - Coating apparatus - Google Patents

Coating apparatus Download PDF

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Publication number
TWI223007B
TWI223007B TW92107670A TW92107670A TWI223007B TW I223007 B TWI223007 B TW I223007B TW 92107670 A TW92107670 A TW 92107670A TW 92107670 A TW92107670 A TW 92107670A TW I223007 B TWI223007 B TW I223007B
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Taiwan
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coating
gear
patent application
scope
item
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TW92107670A
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Chinese (zh)
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TW200420734A (en
Inventor
Chen-Yuan Hsu
Wai-Song Liao
Chih-Hung Hsieh
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Prodisc Technology Inc
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Abstract

A coating apparatus includes a motive unit, a transition mechanism, a monitor mechanism, a substrate holding mechanism and a coating source. In this case, the motive unit has a rotation axle. The transition mechanism has a first gear and a second gear. Even more, the first gear is pivoted on the rotation axle and the second gear engages with the first gear. The center of the second gear has a first opening. The monitor mechanism has at least two testing units. The substrate holding mechanism that is connected with the second gear has a second opening. The second opening is set opposite to the first opening. The monitor mechanism sets through the first gear and the second gear through the first and second openings. The coating source sets corresponding to the substrate holding mechanism and the testing units.

Description

12230071223007

(一)、【發明所屬之技術領域] 特別關於一種具製程監 本發明係關於一種鍍膜設備 測功能的鍍膜設備。 二)、【先前技術】 用,其應用領域係跨 業等領域,由於近年 使得鍍膜技術亦有重 來半導體業與光電產業迅速的發展, 鍍膜製程於工業界具有極廣的應用,其應 越金屬加工業、半導體業以及光電產業等領域 大的進展。 如圖1所示’習知的鍍膜設備3係包括一馬達31、_伞 具式基板承載機構3 2、一測試片固定機構3 3及一鍍膜源 3 4 °其中’傘具式基板承載機構3 2通常由複數個基板承載 座321所組成,且傘具式基板承載機構32係軸設於馬達31之 軸心’錢膜源3 4與傘具式基板承載機構3 2相對而設,測試 片固定機構33係包括一固定板331及一固定架332,固定架 3 3 2之一端與固定板3 3 1相連結,固定板3 3 1係與鍍膜源3 4相 對而設,其中,固定板33 1通常設於傘具式基板承載機構32 之外圍或鍍膜源34之上方處,以避免影響鍍膜設備3之鍍膜 效果。 當操作鍍膜設備3時,通常會先將複數個基板3 5置於傘 具式基板承載座3 2 1上,並把測試元件3 6固定於固定板3 3 1 上,之後,啟動鍍膜設備3使傘具式基板承載機構3 2隨馬達 31而轉動,最後再利用真空蒸鍍或濺鍵等方式將鍍膜源3 4 之鍍材鍍至基板3 5上,如上所述’熟知技術者可藉由觀察(1) [Technical field to which the invention belongs] In particular, the present invention relates to a coating device with a process monitoring function. 2.) [Previous technology], its application fields are cross-industry and other fields. Due to the recent rapid development of coating technology in the semiconductor and optoelectronic industries, the coating process has a wide range of applications in the industry. Great progress has been made in the metal processing industry, semiconductor industry and optoelectronic industry. As shown in Figure 1, 'the conventional coating equipment 3 series includes a motor 31, _ umbrella-shaped substrate supporting mechanism 3 2, a test piece fixing mechanism 3 3, and a coating source 3 4 ° of which' umbrella-type substrate supporting mechanism 3 2 is usually composed of a plurality of substrate supporting bases 321, and the umbrella-type substrate supporting mechanism 32 is provided on the axis of the motor 31. The money film source 3 4 is opposite to the umbrella-type substrate supporting mechanism 3 2 and is tested. The sheet fixing mechanism 33 includes a fixing plate 331 and a fixing frame 332. One end of the fixing frame 3 3 2 is connected to the fixing plate 3 3 1. The fixing plate 3 3 1 is opposite to the coating source 34. Among them, the fixing plate The plate 33 1 is usually provided on the periphery of the umbrella-type substrate supporting mechanism 32 or above the coating source 34 to avoid affecting the coating effect of the coating equipment 3. When the coating device 3 is operated, a plurality of substrates 3 5 are usually placed on the umbrella-shaped substrate holder 3 2 1 and the test element 3 6 is fixed on the fixed plate 3 3 1. Then, the coating device 3 is started. The umbrella-type substrate supporting mechanism 32 is rotated with the motor 31, and finally the plating material of the coating source 3 4 is plated on the substrate 3 5 by means of vacuum evaporation or key splashing, as described above. By observation

1223007 五 發明說明(2) __________ 測試元件3 6來判齡屮A R λα 質。 < 出基板35的鍍膜情形’以確保鍍膜品 π上 基板,當 的頻率會 膜製程中 換言之, 膜層數的 件頻率之 熟悉該項 鍍膜成長 的增加而 之鍍膜層 積厚度將 鍍膜層數 所言,測 測試元件 隨石英測 ,石英測 當進行鍛 增加而下 變化可推 技術者都 速度及鑛 下降;一 超過30層 不具可靠 有其限制 試元件 為'~石 試元件 試元件 膜製程降,因 算出鍍 瞭解, 膜累積 ώπ. 力又rf〇 =時,所 通常係選用 英測試元件 之質量的增 之質量係隨 時’石英測 此,藉由觀 膜成長速度 利用石英測 厚度之精確 ’於實務上 推算出的鍍 性’亦即是單一石 石英測時,因 力口而下 鍍膜的 試元件 察鍍膜 及鍍膜 試元件 度係隨 ,當石 膜成長 英測試 試元件 石英測 降,所 厚度而 之頻率 時石英 累積厚 來監測 所鍍膜 英測試 速度及 元件所 或玻璃 試元件 以在鍍 增加, 係隨鍍 測試元 度。凡 推算出 的層數 元件上 鍍膜累 允許的 圖2為另一習知的鍍膜設備4,其係包括一馬達4丨、一 行生式基板承載機構4 2、一測試片固定機構4 3及一鍍膜源 44。行星式基板承載機構42係由一母齒輪42ι、複數個子齒 輪4 2 2及複數個基板承載座4 2 3所組成,其中,母齒輪4 2 1係 軸設於馬達41之軸心’子齒輪4 2 2係分別與母齒輪4 2 1相嚙 合’基板承載座4 2 3係分別軸設於子齒輪4 2 2之軸心,鑛膜 源44係與行星式基板承載機構42相對而設,測試片固定機 構43係包括一固定板4 31及一固定架432,固定架432之一端 係與固定板431相連結,固定板“I係與鍍膜源44相對而1223007 V Description of the invention (2) __________ Test element 36 to determine the age 屮 A R λα quality. < Show the coating situation of substrate 35 'to ensure that the coating product π is on the substrate. In other words, the frequency of the film will be familiar with the increase in coating growth and the thickness of the coating. In other words, the test component changes with the quartz measurement, and the quartz measurement changes when the forging is increased, which can push the technology and the speed of the mine down; a more than 30 layers are not reliable and have their limitations. The calculation is based on the calculation of the plating, and the film accumulates freely. When the force is rf0 =, the quality of the selected test element is usually increased at any time. This is measured by quartz, and the thickness of the film is measured by the growth rate of quartz. The "plating property calculated in practice" is the single-quartz quartz test. The test coatings and coating test components of the test components that are coated due to the force are measured. When the stone film grows, the test component quartz drops. The thickness and frequency of the accumulated quartz are used to monitor the test speed of the coating film and the glass or glass test component to increase the plating. Degree. Where the calculated number of layers on the calculated number of layers is allowed, FIG. 2 shows another conventional coating equipment 4, which includes a motor 4, a row of substrate support mechanisms 4, a test piece fixing mechanism 4 3, and a Coating source 44. The planetary substrate supporting mechanism 42 is composed of a mother gear 42 ι, a plurality of sub-gears 4 2 2 and a plurality of substrate bearing seats 4 2 3, wherein the mother gear 4 2 1 is provided with a shaft at the center of the motor 41 'child gear The 4 2 2 series are respectively meshed with the mother gear 4 2 1 'the substrate bearing seat 4 2 3 series are respectively arranged on the axis of the sub gear 4 2 2, and the ore film source 44 is opposite to the planetary substrate bearing mechanism 42. The test piece fixing mechanism 43 includes a fixing plate 4 31 and a fixing frame 432. One end of the fixing frame 432 is connected to the fixing plate 431. The fixing plate "I series is opposite to the coating source 44 and

1223007 五、發明說明(3) 设’蜊試片固定機構4 3 然而,當使用習知 膜源之相對位置以及基 的差異(如前所述),因 誤差,結果會導致膜厚 外:單一測試元件所允 膜製程中所需的鍍膜層 試準確度,及如何突破 係為目前鍍膜技術中重 係用以固定測試元件4 6。 的鑛膜設備時,由於測試元件與 板與鍍膜源之相對位置有相當程= 此測試兀件與基板之鍍膜情况會= 監測的準確度無法有效提昇;此 許的鐘膜層數可能無法滿足多層趟 數。因此,如何提高鍍膜設備之= 單一測試元件的鍍膜層數之限制,' 要的課題之一。 ’ ('【發明 有鑑於上 試元件與鍍膜 相近似,以提 本發明之 測試元件來監 本發明之 且具有至少二 緣是,為 動力單元、一 錢嗅源。在本發明中 動機構係包括 係軸設於動力 嘀合,且第二 内容】 述課題,本 源之相對位 南膜厚監測 另一目的係 測鍍膜品質 特徵係在於 測試元件。 達上述目的 傳動機構、 一第一齒輪 單元之旋轉 齒輪之中央 發明之目的為提供一種能夠讓测 置以及基板與鑛膜源之相對位置 之準確度的鍍膜設備。 提供一種可依序使用兩個以上的 之鍍膜設備。 ' 監控機構係穿設於承載機構中, ’依本發明之鍍膜設備係包括一 一監控機構、一基板承载機構及 動力單元係具有一旋轉軸心;傳 及一第二齒輪,其中,第一齒輪 軸心,第二齒輪係與第一齒輪相 具有一第一開口;監控機構係具1223007 V. Description of the invention (3) Set the clam test piece fixing mechanism 4 3 However, when using the relative position of the conventional film source and the difference of the base (as described above), due to the error, the result will result in a film thickness outside: single The accuracy of the coating test required in the film production process of the test element, and how to break through it is the heavy system in the current coating technology to fix the test element 4 6. In the case of the mineral film equipment, the relative position of the test element, the board and the coating source has a considerable distance = the coating condition of the test element and the substrate will = the monitoring accuracy cannot be effectively improved; the number of clock film layers may not be sufficient Multiple trips. Therefore, how to increase the limit of the number of coating layers of a single test device for coating equipment is one of the important issues. '(' [Invention: In view of the similarity between the upper test element and the coating, the test element of the present invention is used to monitor the present invention and has at least two edges. It is a power unit and a source of money. In the present invention, the moving mechanism is Including the shaft is installed in the power coupling, and the second content is the subject mentioned above. The other purpose of the relative thickness monitoring of the original source is to measure the quality of the coating. The characteristics are the test elements. To achieve the above purpose, the transmission mechanism, a first gear unit The purpose of the central invention of the rotating gear is to provide a coating device capable of measuring and the accuracy of the relative position of the substrate and the source of the mineral film. To provide a coating device that can use two or more coating devices in sequence. In the bearing mechanism, 'the coating device system according to the present invention includes a monitoring mechanism, a substrate bearing mechanism and a power unit having a rotation axis; and a second gear, wherein the first gear axis and the second The gear train has a first opening with the first gear;

第8頁 鲁 五、發明說明(4) 有至少二測試 有一第二開口 構係穿設於第 之相對位置與 _位置相近似 而設。 承上所述 元件,故在鍍 鍍膜層數;且 與鍍膜源之相 確度。因此, 夠準確、確實 兀:牛丄基板承載機構係連設於第二齒輪且具 第一開,係與第一開口相對而言史,監控機 -開口及第二開口 +,使測試元件與鍍膜源 基板承載機才冓所承載之各基板與錢源之相 ;鍍膜源係與基板承載機構及測試元件相對 ,因依本發明之鍍膜設備係具有至少二測試 膜製程時並不受限於單一測試元件所允許之 由於測試元件與鍍膜源之相對位置以及基板 對位置相近似,所以能夠提高膜厚監測的準 能夠有效地提高生產良率及降低成本,並能 地監測鍍膜製程的執行。 (四)、【實施方式】 以下將筝照相關圖式,說明依本發明較佳實施例之鍍 骐設備。 ' 請參照圖3所示,本發明較佳實施例之鍍膜設備1係包 舌—動力單元11、一傳動機構12、一監控機構13、一基板 承載機構1 4及一鍍膜源1 5。 動力單元11係具有一旋轉軸心1 11。在本實施例中,動 〇口一 早元11係為一馬達,且其可以具有一轉速控制元件丨丨2及 时扭力保護元件11 3,轉速控制元件11 2可以是習知的控制 ,’用以控制動力單元丨1之轉速;扭力保護元件丨丨3係可以 疋—具有扭力限額的連軸器(C〇up 1 e r),用以連結旋轉軸心Page 8 Lu V. Description of the invention (4) There are at least two tests and a second opening. The relative position of the structure is similar to that of _. With the components mentioned, it is the number of coating layers; and the accuracy with the coating source. Therefore, it is accurate and reliable: the burdock substrate supporting mechanism is connected to the second gear and has a first opening, which is relatively historical relative to the first opening, the monitoring machine-opening and the second opening +, so that the test element and the The phase of each substrate and money source carried by the coating source substrate carrier; the coating source is opposite to the substrate bearing mechanism and the test element, because the coating equipment according to the present invention is not limited to having at least two test film processes A single test element allows the relative position of the test element to the coating source and the substrate pair position to be similar, so it can improve the accuracy of film thickness monitoring, effectively increase production yield and reduce costs, and can monitor the execution of the coating process. (IV) [Embodiment] The following is a description of a zhengzhuang related diagram to describe a cymbal plating apparatus according to a preferred embodiment of the present invention. ′ Please refer to FIG. 3, a coating device 1 according to a preferred embodiment of the present invention includes a tongue-and-groove unit 11, a transmission mechanism 12, a monitoring mechanism 13, a substrate carrying mechanism 14, and a coating source 15. The power unit 11 has a rotation axis 11. In this embodiment, the moving port 11 early element 11 is a motor, and it may have a speed control element 丨 2 timely torque protection element 11 3, the speed control element 112 may be a conventional control, 'for Control the speed of the power unit 丨 1; Torque protection element 丨 丨 3 series can be used—Coupling with torque limit (Coup 1 er) to connect the rotation axis

1223007 五、發明說明(5) 111及傳動機構1 2,扭力保護元件11 3在扭力大於動力單元 11的額定扭力範圍時將會使旋轉軸心111與傳動機構1 2由連 結狀態轉換成分離狀態,致使旋轉軸心111空轉,以避免動 力單元11因扭力過大而損壞。 傳動機構12係包括一第一齒輪1 21及一第二齒輪122, 其中’第一齒輪1 2 1係軸設於動力單元11之扭力保護元件 113 ’第二裔輪122之軸心係為固定式,並與第一齒輪κι相1223007 V. Description of the invention (5) 111 and transmission mechanism 12, torque protection element 11 3 When the torque is greater than the rated torque range of the power unit 11, the rotating shaft center 111 and the transmission mechanism 12 will be converted from the connected state to the separated state. , Causing the rotating shaft center 111 to idle, so as to prevent the power unit 11 from being damaged due to excessive torque. The transmission mechanism 12 includes a first gear 121 and a second gear 122, wherein the 'first gear 1 2 1' is a shaft provided with a torque protection element 113 of the power unit 11 'and the axis of the second descending wheel 122 is fixed. With the first gear κι

,合,且第二齒輪122之中央具有一第一開口1221,其中, 第二齒輪1 22之軸心固定方式係具有多種實施方式,例如以 齒輪座(未示於圖上)承載第二齒輪122,使第二齒輪122可 以在固定的軸心上轉動。於本實施例中,第二齒輪122 機構14的轉速會低於動力單元丨丨之轉速。 監控機構13係具有至少二測試元件131,且監 係穿設於傳動機構12與基板承載機構14中,使I '彳 與鑛膜源15之才目對位置與純承載機構u 與鑛膜源15之相對位置相近似。在本實施例中載 13係具有六測試元件131。另外,監控機構13皿控機構The center of the second gear 122 has a first opening 1221. Among them, the axis fixing method of the second gear 122 has various embodiments, for example, a gear seat (not shown in the figure) carries the second gear. 122, so that the second gear 122 can rotate on a fixed axis. In this embodiment, the speed of the second gear 122 mechanism 14 is lower than the speed of the power unit 丨 丨. The monitoring mechanism 13 has at least two test elements 131, and the monitoring system is arranged in the transmission mechanism 12 and the substrate bearing mechanism 14 so that the positions of I ′ and the mineral film source 15 are aligned with the pure bearing mechanism u and the mineral film source. The relative position of 15 is similar. In this embodiment, the carrier 13 has six test elements 131. In addition, the monitoring agency 13

遮罩部132,此遮罩部丨32係設於測試元件 更八有一 間;遮罩部132係設置有一孔洞1321 (如所、鑛膜源15: 罩部132係藉由孔洞1321以曝露出一測气元所不)’且遮 未與孔洞1321相對的其他測試元件131 W ^ =131,並遮蔽 中,在每一個時點僅有一測試元件丨31會_於鍍膜製程 意者,遮罩部132係為可旋式,因此當^ =上膜層。需;· 田…、卓口P1 3 2轉動時,A masking portion 132, which is provided in the test element and a room; the masking portion 132 is provided with a hole 1321 (as in the case, the mineral film source 15: the masking portion 132 is exposed through the hole 1321) A test element does not) 'and other test elements 131 W ^ = 131 that are not opposed to the hole 1321, and in the mask, there is only one test element at each point in time 丨 31 will be applied to the coating process, the mask part The 132 series is rotatable, so when ^ = upper film layer. Required; · Tian ..., Zhuokou P1 3 2 when turning,

第10頁 1223〇〇7 —___Page 10 1223〇〇7 —___

五、發明說明(6) 孔洞1321能夠被移至與另一測試元件131相對的位置,以便 依序暴露出測試元件1 3 1 ;所以當一測試元件j 3 i上累積一 定層數的鍍膜而導致其不具可靠度後,遮罩部132會轉動以 便繼續利用另一測試元件丨3 1來進行膜厚監測。又,本實施 例之測試元件1 3 1係為習知的石英測試元件;另外,測試元 件1 3 1亦可以遠自玻璃基板或其他習知的測試元件。 請再參考圖3所示,在本實施例中基板承載機構丨4係為 一傘具式基板承載機構,其係用以承載一個以上的基板1 6 且連設於第二齒輪122,並具有一第二開口 141。在本發明 中,第二開口141係與第一開口1221相對而設,監控機\冓13 係穿設於第一開口1221及第二開口141中,且測試元件131 係約與基板承載機構1 4所承載之各基板丨6設於近似的位 置,所以相對於鍍膜源1 5而言測試元件131與基板丨6具有近 似的鍍膜條件。 一請參考圖3所示,鍍膜源1 5係與基板承載機構丨4及測試 兀件1 3 1相對而設。在本實施例中,鍍膜源丨5可以是任意一 種習知的鍍膜材料;而且鍍膜設備1可以是具有複數個鍍膜 源(圖中未顯示)。 、 另外’測試元件1 3 1與基板承載機構1 4之相對高度係為 可調整’在本實施例中,測試元件丨3 1之高度的調整範圍係 介於基板承載座14之外緣與中央之間,使測試元件丨31於鍍 膜製程時得到與基板1 6相近似的鍍膜效果,以達成最佳的 監控效果。於此,測試元件131與基板承載機構14之相對高 度的調整方式係可以利用更換不同尺寸之監控機構或其他V. Description of the invention (6) The hole 1321 can be moved to a position opposite to another test element 131, so that the test element 1 3 1 is sequentially exposed; therefore, when a certain number of coatings are accumulated on a test element j 3 i After causing it to be unreliable, the mask portion 132 will rotate in order to continue to use another test element 31 for film thickness monitoring. In addition, the test element 1 31 of this embodiment is a conventional quartz test element; in addition, the test element 1 31 may be far from a glass substrate or other conventional test elements. Please refer to FIG. 3 again. In this embodiment, the substrate carrying mechanism 丨 4 is an umbrella-type substrate carrying mechanism, which is used to carry more than one substrate 16 and is connected to the second gear 122 and has一 second opening 141. In the present invention, the second opening 141 is opposite to the first opening 1221, the monitoring device \ 13 is disposed in the first opening 1221 and the second opening 141, and the test element 131 is approximately the same as the substrate carrying mechanism 1 The substrates 6 carried by 4 are set at similar positions, so that the test element 131 and the substrate 6 have similar coating conditions with respect to the coating source 15. First, please refer to FIG. 3, the coating source 15 is opposite to the substrate supporting mechanism 丨 4 and the test element 1 3 1. In this embodiment, the coating source 5 may be any conventional coating material; and the coating equipment 1 may have a plurality of coating sources (not shown in the figure). In addition, the relative height of the test element 1 31 and the substrate supporting mechanism 14 is adjustable. In this embodiment, the adjustment range of the height of the test element 31 is between the outer edge and the center of the substrate supporting seat 14. In between, the test element 丨 31 can obtain a coating effect similar to that of the substrate 16 during the coating process to achieve the best monitoring effect. Here, the adjustment method of the relative height of the test element 131 and the substrate carrying mechanism 14 can be replaced by a monitoring mechanism of a different size or other

12230071223007

方式達成。 此外,熟習該項技術者都瞭解,上述之基板承载機 二:以疋其他類型之基板承載機構,例如其係可為—行母 / 土板承載機構。請參照圖5,顯 一 之鍍膜設備2的干音圖,幻系勺# :: 只施例 W扪不思圖其係包括一動力單元1 1、一傳動機 才1 2、一監控機構丨3、一基板承載機構24及一鍍膜源1 5。 在明中,動力單元U、傳動機構12(包括第一齒輪ΐ2ι 及j二齒輪122)、監控機構13及鍍膜源15係與圖3所示之 膜·•又備1相同,故此不再闡述;而,鍍膜設備2之基板承 = 24:、為一行星式基板承載機構,於此,基板承載機構 24係由一母齒輪241、複數個子齒輪242、複數個基板承 座243、一旋轉連接元件244及複數個軸承元件245所組成, 其中,旋轉連接元件244之一端係與第二齒輪122相連結, 而各軸承元件2 4 5係對稱地設於旋轉連接元件2 4 4上(如圖 所示),軸承元件245之兩端係分別連接子齒輪242與基^ 承載座243,且子齒輪242與基板承載座243係軸設於軸承元 件245上,俾使子齒輪242與基板承載座243能夠同步旋轉, 在此軸承元件2 4 5係可以為滾珠軸承、針狀軸承、滾子軸 承或其他形式的軸承;在本實施例中,母齒輪24 i係為固定 式’且不隨鍍膜設備2之運作而移動或轉動,各子齒輪242 係分別與母齒輪241相喃合,因此當旋轉連接元件244^皮第 二齒輪122帶動而旋轉時,子齒輪2 42係分別圍繞母齒輪241 進行公轉,並各自以相對應的軸承元件245進行自轉,進而 帶動各基板承載座2 4 3進行公轉及自轉。Way reached. In addition, those who are familiar with this technology know that the above-mentioned substrate carrier 2: Second, other types of substrate bearing mechanism, for example, it can be-line mother / soil plate bearing mechanism. Please refer to FIG. 5, the dry sound diagram of the coating device 2 of the first display, the magical spoon # :: Example only W 扪 Do not think of the diagram, it includes a power unit 1 1, a drive only 1 2, a monitoring mechanism 丨3. A substrate supporting mechanism 24 and a coating source 15. In the Ming, the power unit U, the transmission mechanism 12 (including the first gear ΐ2ι and j two gears 122), the monitoring mechanism 13 and the coating source 15 are the same as the film shown in FIG. ; And the substrate bearing of the coating equipment 2 = 24: is a planetary substrate bearing mechanism, here, the substrate bearing mechanism 24 is composed of a mother gear 241, a plurality of sub-gears 242, a plurality of substrate holders 243, and a rotary connection The element 244 is composed of a plurality of bearing elements 245. One end of the rotary connecting element 244 is connected to the second gear 122, and each bearing element 2 4 5 is symmetrically disposed on the rotary connecting element 2 4 4 (as shown in FIG. (Shown), the two ends of the bearing element 245 are respectively connected to the sub-gear 242 and the base bearing seat 243, and the sub-gear 242 and the substrate bearing seat 243 are shaft-mounted on the bearing element 245, so that the sub-gear 242 and the substrate bearing seat are connected 243 can rotate synchronously. Here, the bearing element 2 4 5 series can be ball bearings, needle bearings, roller bearings or other types of bearings. In this embodiment, the mother gear 24 i series is fixed and does not follow the coating. Movement or rotation of device 2 Each of the sub-gears 242 is coupled to the mother gear 241. Therefore, when the rotation connecting element 244 ^ is driven by the second gear 122 to rotate, the sub-gears 2 42 are respectively revolved around the mother gear 241 and correspond to each other. The bearing element 245 rotates, which in turn drives each substrate carrier 2 4 3 to perform revolutions and rotations.

1223007 五、發明說明(8) 承上所述,依本發明較佳實施例之鍍膜設備於操作 時,係先將基板置於基板承載機構上,並將測試元件置於 監控機構中,之後,啟動鍍膜設備並使旋轉軸心透過扭力 保護元件、傳動機構以帶動基板承載機構,最後由鍍膜源 對基板及測試元件進行鍍膜動作,監控機構係利用測試元 件進行鍍膜製程的監控,且於必要時可以旋轉遮罩部,以 便於鍍膜層數超過單一測試元件之容許值時,依序利用不 同測試元件來進行鍍膜製程的監測。 少二測試元件,因 件所允許之鍍膜層 之鍍膜條件的位 依本發明之鍍膜設 ,並可用於超過單 由於依本發明之鍍膜設備係具有至 此於鍍膜製程時並不受限於單一測試元 數’且測試元件係位於與基板具有相似 置’以提咼膜厚監測的準確度。所以, 備能夠有效地提高生產良率、降低成本 一測試元件所允許的多層鍍膜製程。 以上所述僅為舉例性,而非為限制性 本發明之精神與範_,而對其進行之等:未脫離 應包含於後附之申請專利範圍中。 > 文或.楚更,均1223007 V. Description of the invention (8) According to the above description, when the coating device according to the preferred embodiment of the present invention is in operation, the substrate is first placed on the substrate carrying mechanism, and the test element is placed in the monitoring mechanism. The coating equipment is started and the rotating shaft passes through the torque protection element and the transmission mechanism to drive the substrate bearing mechanism. Finally, the substrate and the test element are coated by the coating source. The monitoring mechanism uses the test element to monitor the coating process, and when necessary, The mask can be rotated so that when the number of coating layers exceeds the allowable value of a single test element, different test elements are used in order to monitor the coating process. Less two test elements, due to the coating conditions of the coating layer allowed by the device according to the coating design of the present invention, and can be used for more than just because the coating equipment according to the present invention has so far not limited to a single test during the coating process The element number and the test element are located at a position similar to the substrate 'to improve the accuracy of the film thickness monitoring. Therefore, the equipment can effectively improve the production yield and reduce the cost. The multi-layer coating process allowed by the test device. The above description is only exemplary, rather than limiting the spirit and scope of the present invention, and the same is applied to it: without departing from, it should be included in the scope of the attached patent application. > Text or. Chu more, both

1223007 圖式簡單說明 (五)、【圖式簡單說明】 圖1為一示意圖,顯示習知之鍍膜設備的示意圖; 圖2為一示意圖,顯示另一習知之鑛膜設備的示意圖; 圖3為一示意圖,顯示依本發明較佳實施例之鍍膜設備 的不意圖, 圖4為一示意圖,顯示圖3中區域A的詳圖,其係為遮罩 部的不意圖,以及 圖5為一示意圖,顯示依本發明另一較佳實施例之鍍膜 設備的示意圖,其具有一行星式基板承載機構。 元件符號 說 明 1 鍍 膜 設 備 11 動 力 單 元 111 旋 轉 軸 心 112 轉 速 控 制元 件 113 扭 力 保 護元 件 12 傳 動 機 構 121 第 — 齒 輪 122 第 二 齒 輪 1221 第 一 開 α 13 監 控 機 構 131 測 試 元 件 132 遮 罩 部 1321 孔 洞1223007 Schematic description (five), [Schematic description] Figure 1 is a schematic diagram showing a schematic diagram of a conventional coating equipment; Figure 2 is a schematic diagram showing another schematic diagram of a mineral coating equipment; Figure 3 is a A schematic view showing the intent of the coating device according to a preferred embodiment of the present invention. FIG. 4 is a schematic view showing a detailed view of area A in FIG. 3, which is a schematic view of the mask portion, and FIG. 5 is a schematic view. A schematic diagram of a coating apparatus according to another preferred embodiment of the present invention is shown, which has a planetary substrate carrying mechanism. Explanation of component symbols 1 Coating equipment 11 Momentum unit 111 Rotating shaft center 112 Rotational speed control element 113 Torque protection element 12 Transmission mechanism 121 The first gear wheel 122 The second gear wheel 1221 The first opening of the α 13 Monitoring and control mechanism 131 The test hole component 13 The 13 shielding cover

第14頁 1223007Page 14 1223007

第15頁 圖式簡單說明 14 基 板 承 載 機 構 141 第 二 開 V 15 鍍 膜 源 16 基 板 2 鍍 膜 設 備 24 基 板 承 載 機 構 241 母 齒 輪 242 子 齒 輪 243 基 板 承 載 架 244 旋 轉 連 接 元 件 245 軸 承 元 件 3 鍍 膜 設 備 31 馬 達 32 伞 具 式 基 板 承 載 機 構 321 基 板 承 載 座 33 固 定 機 構 331 固 定 板 332 固 定 架 34 鍍 膜 源 35 基 板 36 測 試 元 件 4 鍍 膜 設 備 41 馬 達 42 行 星 式 基 板 承 載 機 構 1223007Brief description of drawings on page 15 14 Substrate carrying mechanism 141 Second open V 15 Coating source 16 Substrate 2 Coating equipment 24 Substrate carrying mechanism 241 Mother gear 242 Sub gear 243 Substrate carrier 244 Rotary connection element 245 Bearing element 3 Coating equipment 31 Motor 32 Umbrella-type substrate carrying mechanism 321 Substrate bearing seat 33 Fixing mechanism 331 Fixing plate 332 Fixing frame 34 Coating source 35 Substrate 36 Test element 4 Coating equipment 41 Motor 42 Planetary substrate carrying mechanism 1223007

第16頁Page 16

Claims (1)

12230071223007 六、申請專利範圍 1、一種鍍膜設備,包含: 一動力單元,其係具有一旋轉軸心; 一傳動機構,其係包含一第一齒輪及一第二齒輪,該第一 齒輪係軸設於該旋轉軸心,該第二齒輪係與該第一齒輪 相嚙合,該第二齒輪之中央具有一第一開口; 一監控機構,其係具有至少二測試元件’且该監控機構係 穿設於該第一開口; 一基板承載機構,其係連設於該第二齒輪且具有一第二開 口,該第二開口係與該第一開口相對而設,該監控機構 係穿設於該第二開口;以及 一鍍膜源,其係與該基板承載機構及該等測試元件相對而 設0 2、 如申請專利範圍第1項所 構更具有一遮罩部,該遮罩 試元件與該鍍膜源之間,該 3、 如申請專利範圍第1項所 係為 < 旋式’俾使該孔洞移 述之鍍膜設備’其中該監控機 部係具有一孔洞且位於該等測 孔洞係用以曝露該等測試元件 述之鍍膜設備,其中該遮罩部 動以曝露該等測試元件之另 4、如申請專利範圍第j 元件與該基板承载機構 項所述之鍍膜設備,其中該等測試 之相對位置係為可調整。6. Scope of patent application 1. A coating equipment, including: a power unit having a rotating shaft center; a transmission mechanism including a first gear and a second gear, the first gear system shaft is provided at The rotation axis, the second gear train is meshed with the first gear, a center of the second gear has a first opening; a monitoring mechanism, which has at least two test elements, and the monitoring mechanism is provided in The first opening; a substrate bearing mechanism, which is connected to the second gear and has a second opening, the second opening is opposite to the first opening, and the monitoring mechanism is passed through the second opening; An opening; and a coating source, which is 0 opposite to the substrate bearing mechanism and the test elements 2. As described in item 1 of the scope of patent application, there is a mask portion, the mask test element and the coating source In the meanwhile, as in the first item of the scope of the patent application, the "rotary type" coating device for making the hole repeat "is used in the monitor, wherein the monitoring unit has a hole and is located in the measuring hole for exposure. Such tests The coating device described in the component, wherein the mask part is moved to expose the other coating devices described in item j of the patent application scope and the substrate bearing mechanism item, wherein the relative positions of the tests are Adjustable. 弟17頁 1223007 六、中請專利範圍 5、 如申請專利範圍第1項所述之鍍膜設備,其中該動力單 元係具有一轉速控制元件。 6、 如申請專利範圍第1項所述之鍍膜設備,其中該基板承 載機構係為一行星式基板承載機構。Brother 17 Page 1223007 6. The scope of patent application 5. The coating equipment as described in item 1 of the scope of patent application, wherein the power unit has a speed control element. 6. The coating equipment according to item 1 of the scope of patent application, wherein the substrate supporting mechanism is a planetary substrate supporting mechanism. 7、 如申請專利範圍第1項所述之鍍膜設備,其中該基板承 載機構係為一傘具式基板承載機構。 8、 如申請專利範圍第1項所述之鍍膜設備,其中該等測試 元件係為石英測試元件。 9、 如申請專利範圍第1項所述之鍍膜設備,其中該等測試 元件係為玻璃基板。 1 0、如申請專利範圍第1項所述之鍍膜設備,其中該動力單 元係具有一扭力保護元件。7. The coating equipment according to item 1 of the scope of patent application, wherein the substrate supporting mechanism is an umbrella-type substrate supporting mechanism. 8. The coating equipment as described in item 1 of the scope of patent application, wherein the test elements are quartz test elements. 9. The coating equipment as described in item 1 of the patent application scope, wherein the test elements are glass substrates. 10. The coating device according to item 1 of the scope of patent application, wherein the power unit has a torque protection element. 第18頁Page 18
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Cited By (3)

* Cited by examiner, † Cited by third party
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TWI427171B (en) * 2008-10-17 2014-02-21 Hon Hai Prec Ind Co Ltd Film coating device
TWI447247B (en) * 2008-10-24 2014-08-01 Hon Hai Prec Ind Co Ltd Sputtering tool, sputtering device and sputtering method
TWI662731B (en) * 2017-09-29 2019-06-11 大陸商昆山國顯光電有限公司 Evaporation mask, OLED panel and system, and evaporation monitoring method

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Publication number Priority date Publication date Assignee Title
TWI468541B (en) * 2010-04-07 2015-01-11 Ulvac Inc Film coating system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI427171B (en) * 2008-10-17 2014-02-21 Hon Hai Prec Ind Co Ltd Film coating device
TWI447247B (en) * 2008-10-24 2014-08-01 Hon Hai Prec Ind Co Ltd Sputtering tool, sputtering device and sputtering method
TWI662731B (en) * 2017-09-29 2019-06-11 大陸商昆山國顯光電有限公司 Evaporation mask, OLED panel and system, and evaporation monitoring method
US11374173B2 (en) 2017-09-29 2022-06-28 Kunshan Go-Visionox Opto-Electronics Co., Ltd. Evaporation mask, OLED panel and system, and evaporation monitoring method

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