TWD231990S - 用於半導體製造設備之氣體分配器 - Google Patents

用於半導體製造設備之氣體分配器 Download PDF

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Publication number
TWD231990S
TWD231990S TW111305569F TW111305569F TWD231990S TW D231990 S TWD231990 S TW D231990S TW 111305569 F TW111305569 F TW 111305569F TW 111305569 F TW111305569 F TW 111305569F TW D231990 S TWD231990 S TW D231990S
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TW
Taiwan
Prior art keywords
semiconductor manufacturing
gas distributor
manufacturing apparatus
article
design
Prior art date
Application number
TW111305569F
Other languages
English (en)
Inventor
辛進豪
金材玹
李政鎬
Original Assignee
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 (荷蘭)
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司
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Publication date
Application filed by 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 (荷蘭), 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 filed Critical 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 (荷蘭)
Publication of TWD231990S publication Critical patent/TWD231990S/zh

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Abstract

【物品用途】;本設計物品關於一種用於半導體製造設備之氣體分配器。;【設計說明】;「9-9剖視圖」係顯示沿著「俯視圖」中之線段9-9之剖視圖。

Description

用於半導體製造設備之氣體分配器
本設計物品關於一種用於半導體製造設備之氣體分配器。
「9-9剖視圖」係顯示沿著「俯視圖」中之線段9-9之剖視圖。
TW111305569F 2022-05-19 2022-11-11 用於半導體製造設備之氣體分配器 TWD231990S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/839,254 2022-05-19
US29/839,254 USD1005974S1 (en) 2022-05-19 2022-05-19 Gas distributor for semiconductor manufacturing apparatus

Publications (1)

Publication Number Publication Date
TWD231990S true TWD231990S (zh) 2024-07-01

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ID=88840224

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111305569F TWD231990S (zh) 2022-05-19 2022-11-11 用於半導體製造設備之氣體分配器

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US (1) USD1005974S1 (zh)
TW (1) TWD231990S (zh)

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USD1071886S1 (en) * 2022-01-20 2025-04-22 Applied Materials, Inc. Substrate support for a substrate processing chamber
USD1066275S1 (en) * 2022-04-04 2025-03-11 Applied Materials, Inc. Baffle for anti-rotation process kit for substrate processing chamber
USD1081331S1 (en) * 2022-08-03 2025-07-01 Jacob Frost Magnetic plate wall mount assembly
USD1073758S1 (en) * 2022-10-13 2025-05-06 Lam Research Corporation Baffle for substrate processing system
USD1076837S1 (en) * 2023-01-19 2025-05-27 Lam Research Corporation Baffle
USD1119756S1 (en) * 2024-08-15 2026-03-24 Broadata Communications, Inc. Battery pack for wireless cart

Citations (1)

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Publication number Priority date Publication date Assignee Title
TWD209937S (zh) 2019-08-22 2021-02-21 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 氣體分佈器

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USD411516S (en) * 1996-03-15 1999-06-29 Tokyo Electron Limited Gas diffusion plate for electrode of semiconductor wafer processing apparatus
US7479304B2 (en) * 2002-02-14 2009-01-20 Applied Materials, Inc. Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate
US20050252447A1 (en) * 2004-05-11 2005-11-17 Applied Materials, Inc. Gas blocker plate for improved deposition
US20090159002A1 (en) * 2007-12-19 2009-06-25 Kallol Bera Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution
USD655261S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
USD654882S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
USD655260S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
US10167557B2 (en) * 2014-03-18 2019-01-01 Asm Ip Holding B.V. Gas distribution system, reactor including the system, and methods of using the same
US11015245B2 (en) * 2014-03-19 2021-05-25 Asm Ip Holding B.V. Gas-phase reactor and system having exhaust plenum and components thereof
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
TWD178699S (zh) 2016-01-08 2016-10-01 Asm Ip Holding Bv 用於半導體製造設備的氣體分散板
TWD178424S (zh) * 2016-01-08 2016-09-21 Asm Ip Holding Bv 用於半導體製造設備的氣流控制板
USD880437S1 (en) * 2018-02-01 2020-04-07 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
JP1624668S (zh) * 2018-06-08 2019-02-18
US11286562B2 (en) * 2018-06-08 2022-03-29 Asm Ip Holding B.V. Gas-phase chemical reactor and method of using same
USD935572S1 (en) * 2019-05-24 2021-11-09 Asm Ip Holding B.V. Gas channel plate
USD980814S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
USD980813S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD990441S1 (en) * 2021-09-07 2023-06-27 Asm Ip Holding B.V. Gas flow control plate

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD209937S (zh) 2019-08-22 2021-02-21 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 氣體分佈器

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