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Application filed by 南韓商吉佳藍科技股份有限公司filedCritical南韓商吉佳藍科技股份有限公司
Publication of TWD210155SpublicationCriticalpatent/TWD210155S/en
【物品用途】;本設計係關於一種等離子體處理裝置用容器之設計，特別是有關於一種用於等離子體處理半導體製造基板裝置中的容器。;【設計說明】;無。[Use of article]; This design is about a container for a plasma processing device, especially a container used in a plasma processing device for semiconductor manufacturing substrates. ;[Design description];None.
Description
等離子體處理裝置用容器Container for plasma processing device
本設計係關於一種等離子體處理裝置用容器之設計，特別是有關於一種用於等離子體處理半導體製造基板裝置中的容器。This design is related to the design of a container used in a plasma processing device, especially a container used in a plasma processing semiconductor manufacturing substrate device.
無。no.
TW109300766D01F2019-08-202020-02-19A vessel for plasma processing device
TWD210155S
(en)
