TWD169066S - Polishing pad - Google Patents

Polishing pad

Info

Publication number
TWD169066S
TWD169066S TW103306671F TW103306671F TWD169066S TW D169066 S TWD169066 S TW D169066S TW 103306671 F TW103306671 F TW 103306671F TW 103306671 F TW103306671 F TW 103306671F TW D169066 S TWD169066 S TW D169066S
Authority
TW
Taiwan
Prior art keywords
view
line
cross
enlarged view
article
Prior art date
Application number
TW103306671F
Other languages
Chinese (zh)
Inventor
Masaru Yamauchi
Motoyuki Miyasaka
Tatsuya Ishino
Original Assignee
丸石產業股份有限公司
Maruishi Sangyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 丸石產業股份有限公司, Maruishi Sangyo Co Ltd filed Critical 丸石產業股份有限公司
Publication of TWD169066S publication Critical patent/TWD169066S/en

Links

Abstract

【物品用途】;本物品係研磨例如矽晶圓、玻璃、金屬、無機氧化物等時所使用者。;【設計說明】;如立體圖、前視圖、後視圖、左側視圖、右側視圖、俯視圖、及仰視圖等所示，如是構成整體外觀具新穎性及特異視覺效果之設計。;「XY部分之放大圖」係將以前視圖的X-X線及Y-Y線所界定之部分放大顯示之圖式。;「A-A線剖面圖」係以「XY部分之放大圖」的A-A線進行剖面而顯示之圖式。;「B-B線剖面圖」係以「XY部分之放大圖」的B-B線進行剖面而顯示之圖式。[Use of article]; This article is used for grinding silicon wafers, glass, metals, inorganic oxides, etc. ;[Design Description];As shown in the three-dimensional view, front view, rear view, left view, right view, top view, and bottom view, this is a design that constitutes the overall appearance with novelty and unique visual effects. "Enlarged view of XY part" is an enlarged view of the part bounded by the X-X line and Y-Y line of the previous view. "A-A line sectional view" is a diagram showing a cross-section taken along the A-A line of "XY portion enlarged view". "B-B line cross-sectional view" is a diagram showing a cross-section taken along the B-B line of "XY part enlarged view".

TW103306671F 2014-05-20 2014-11-14 Polishing pad TWD169066S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2014-10697F JP1517658S (en) 2014-05-20 2014-05-20

Publications (1)

Publication Number Publication Date
TWD169066S true TWD169066S (en) 2015-07-11

Family

ID=53484541

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103306671F TWD169066S (en) 2014-05-20 2014-11-14 Polishing pad

Country Status (3)

Country Link
US (1) USD767840S1 (en)
JP (1) JP1517658S (en)
TW (1) TWD169066S (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD809234S1 (en) * 2016-02-05 2018-01-30 3M Innovative Properties Company Nonwoven abrasive with dot surface pattern
USD814727S1 (en) * 2017-02-03 2018-04-03 The Clorox Company Grill brush pad
USD866892S1 (en) * 2017-07-28 2019-11-12 3M Innovative Properties Company Scouring pad
USD850041S1 (en) * 2017-07-31 2019-05-28 3M Innovative Properties Company Scouring pad
USD825125S1 (en) * 2017-08-07 2018-08-07 3M Innovative Properties Company Dusting sleeve with a dot pattern bond
USD1004393S1 (en) * 2021-11-09 2023-11-14 Ehwa Diamond Industrial Co., Ltd. Grinding pad
USD1000928S1 (en) * 2022-06-03 2023-10-10 Beng Youl Cho Polishing pad
USD1004873S1 (en) * 2023-06-01 2023-11-14 Giant Media Network Culture (Shenzhen) Co., Ltd. Mop pad

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1222563A (en) * 1915-02-02 1917-04-10 Charles Schaefer Ground-mat.
US1808834A (en) * 1929-03-06 1931-06-09 Sr Rudolph Busch Cleaning pad
US1993174A (en) * 1933-07-01 1935-03-05 Earnshaw Knitting Company Sanitary wash cloth
US2354435A (en) * 1941-08-20 1944-07-25 Firestone Tire & Rubber Co Plastic fabric
US2886697A (en) * 1954-01-25 1959-05-12 Tyler Co W S Illuminated ceiling
US2809145A (en) * 1955-01-18 1957-10-08 Mcdermott Francis Roland Vibration-absorbing pad and process of manufacture
US3074099A (en) * 1959-02-09 1963-01-22 Gen Foods Corp Scouring and polishing device and method of producing same
US4993099A (en) * 1989-12-27 1991-02-19 Yachiyo Micro Science Company Limited Cleaning and polishing pad
US6453502B1 (en) * 1998-12-22 2002-09-24 Bishop Deforest Universal cleaning and polishing pad
JP3943753B2 (en) * 1999-04-13 2007-07-11 ユニ・チャーム株式会社 Method for producing disposable dirt wiping tool
USD429545S (en) * 1999-08-31 2000-08-15 Foamex Lp Mop head
US6544373B2 (en) * 2001-07-26 2003-04-08 United Microelectronics Corp. Polishing pad for a chemical mechanical polishing process
USD559064S1 (en) 2004-03-17 2008-01-08 Jsr Corporation Polishing pad
USD545018S1 (en) * 2005-07-14 2007-06-19 The Procter & Gamble Company Abrasive wipe
US20070077834A1 (en) * 2005-09-30 2007-04-05 Tyco Healthcare Retail Services Ag Absorbent cleaning pad having a durable cleaning surface and method of making same
USD636606S1 (en) * 2008-09-01 2011-04-26 Yao I Fabric Co., Ltd. Mesh-chair cloth
USD627941S1 (en) * 2009-12-17 2010-11-23 Diva International S.R.L. Wipe
US8834984B2 (en) * 2009-12-22 2014-09-16 Tietex International, Ltd Stitch bonded wipe
USD657103S1 (en) * 2011-05-04 2012-04-03 Tietex International Ltd. Cleaning wipe
USD657513S1 (en) * 2011-05-04 2012-04-10 Tietex International, Ltd Cleaning wipe
USD685544S1 (en) * 2012-05-09 2013-07-02 Umf Corporation Cleaning cloth
USD673745S1 (en) * 2012-06-14 2013-01-01 The Procter & Gamble Company Cleaning sheet
US9661973B2 (en) * 2013-03-15 2017-05-30 Rockline Industries, Inc. Cleaning pad with abrasive layer
USD714506S1 (en) * 2013-04-10 2014-09-30 Kikuo Yamada Cleaning sheet
US20150061171A1 (en) * 2013-09-04 2015-03-05 Bio-Medical Carbon Technology Co., Ltd. Method of manufacturing wound dressing
USD742195S1 (en) * 2013-12-16 2015-11-03 3M Innovation Properties Company Sanding article with pattern

Also Published As

Publication number Publication date
JP1517658S (en) 2015-02-16
USD767840S1 (en) 2016-09-27

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