TWD153743S - 沉積室襯墊 - Google Patents

沉積室襯墊

Info

Publication number
TWD153743S
TWD153743S TW101304222F TW101304222F TWD153743S TW D153743 S TWD153743 S TW D153743S TW 101304222 F TW101304222 F TW 101304222F TW 101304222 F TW101304222 F TW 101304222F TW D153743 S TWD153743 S TW D153743S
Authority
TW
Taiwan
Prior art keywords
sectional
sedimentation chamber
chamber liner
creation
cross
Prior art date
Application number
TW101304222F
Other languages
English (en)
Inventor
Ashish Goel
Anantha K Subramani
Original Assignee
應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 應用材料股份有限公司 filed Critical 應用材料股份有限公司
Publication of TWD153743S publication Critical patent/TWD153743S/zh

Links

Abstract

【物品用途】;本創作係一種沉積室襯墊之設計，係設置在沉積室之沉積室襯墊。;【創作特點】;參照立體圖、及另一立體圖，本創作之沉積室襯墊，係略呈中空管狀。;另參照前視圖、及沿A-A線所取得之剖面視圖，該沉積室襯墊被兩個直徑較大的環狀突起，分成三個直徑較小的環狀部分。靠近頂部的環狀突起的直徑，略大於靠近底部的環狀突起的直徑。;再參照沿A-A線所取得之剖面視圖、B區域之放大剖面視圖、及C區域之放大剖面視圖，該兩個環狀突起與三個直徑較小的環狀部分，係一體成形且其剖面的形狀獨特。;整體而言，本創作的外型獨特美觀，實為一外型新穎之設計。
TW101304222F 2012-01-25 2012-07-20 沉積室襯墊 TWD153743S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/411,698 USD665071S1 (en) 2012-01-25 2012-01-25 Deposition chamber liner

Publications (1)

Publication Number Publication Date
TWD153743S true TWD153743S (zh) 2013-05-21

Family

ID=46583725

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101304222F TWD153743S (zh) 2012-01-25 2012-07-20 沉積室襯墊

Country Status (2)

Country Link
US (1) USD665071S1 (zh)
TW (1) TWD153743S (zh)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber

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US8833013B2 (en) * 2011-08-18 2014-09-16 Rodney James Harman Termination collar for air duct
US9376752B2 (en) 2012-04-06 2016-06-28 Applied Materials, Inc. Edge ring for a deposition chamber
US10504719B2 (en) 2012-04-25 2019-12-10 Applied Materials, Inc. Cooled reflective adapter plate for a deposition chamber
USD735786S1 (en) * 2013-07-11 2015-08-04 Sievert Ab Blowtorch
USD735255S1 (en) * 2013-12-24 2015-07-28 The Yankee Candle Company, Inc. Heater dish and wax cup for electric wax melting system
USD747378S1 (en) * 2014-10-31 2016-01-12 Victor Equipment Company Adapter sleeve for an arc welding apparatus
USD799690S1 (en) * 2014-12-22 2017-10-10 Ebara Corporation Inner cylinder for exhaust gas treatment apparatus
USD838756S1 (en) * 2016-03-31 2019-01-22 America Sequesters Co2, Llc Biochar kiln
USD846010S1 (en) * 2017-03-23 2019-04-16 Dalian Talent Gift Co., Ltd. Wax cup assembly
USD844768S1 (en) * 2017-09-06 2019-04-02 Rheem Manufacturing Company Water heater top cap assembly
USD909559S1 (en) 2019-01-09 2021-02-02 Rodney James Harman Grille for air duct
USD914807S1 (en) * 2019-10-04 2021-03-30 Aristocrat Technologies Australia Pty Limited Gaming machine island
USD896351S1 (en) * 2019-11-08 2020-09-15 Gale C. Banks, III Air intake coupling hose
USD1020904S1 (en) 2021-05-10 2024-04-02 Aristocrat Technologies Australia Pty Limited Wedge for a gaming machine island

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber

Also Published As

Publication number Publication date
USD665071S1 (en) 2012-08-07

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