TW594224B - Light-guiding structure of light-guiding device and manufacturing method thereof - Google Patents

Light-guiding structure of light-guiding device and manufacturing method thereof Download PDF

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Publication number
TW594224B
TW594224B TW91106262A TW91106262A TW594224B TW 594224 B TW594224 B TW 594224B TW 91106262 A TW91106262 A TW 91106262A TW 91106262 A TW91106262 A TW 91106262A TW 594224 B TW594224 B TW 594224B
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Taiwan
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light guide
light
angle
photoresist layer
manufacturing
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TW91106262A
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Chinese (zh)
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Guo-Ruei Huang
Shiuan-Yang Chen
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Wintek Corp
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Abstract

A light-guiding structure of light-guiding device and manufacturing method thereof are disclosed, which is to dispose an etched substrate on a tilted stage for heating. When the photoresist layer is softened by the heat, it will flow downward due to the slope of the tilted stage, so as to form a asymmetric deformation structure. The top surface of the deformed structure forms a slant plane more steeply, and a slant plane less steeply than the said slant plane.

Description

594224 _ 案號91106262_年月曰 修正_ 五、發明說明(1) 【技術領域】 本發明係有關一種導光元件之導光結構及其製造方法 ,尤指一種充填導光元件塑料時,能夠充填完全,以確保 導光元件之凸出部外側面完整,並藉由凸出部外側面所形 成的夾角能夠將光源所發出之光線導向預定方向,提高導 光功效之導光結構。 【先前之技術】 請參考第4圖,係說明習用導光元件之製造方法,其 係在一基材7 1上塗佈一層正型之光阻層7 2後,再於基 材7 1頂面上方覆蓋一光罩7 3 ,以於UV光源7 9底下 進行曝光,該光罩7 3具有多數孔洞7 3 1 ,使光阻層形 成多數曝光部分7 2 1及未曝光部分7 2 2。 再將曝光過之基材7 1浸於一顯影液7 4中,使未曝 光部份7 2 2被蝕刻掉,而後,將基材7 1自顯影液7 4 中取出進行熱處理,使曝光部份7 2 1頂部受熱軟化,而 分別形成一概呈圓形而均勻對稱之變形結構7 2 3。 再於光阻層7 2頂面沈積一層金屬層7 5後,使基材 7 1與金屬層7 5分離,讓金屬層7 5底面形成多數與變 形結構互補之凹面7 5 1 ,以該金屬層7 5製作模仁,將 其置入模具7 6中並注入塑料,於塑料硬化開模後,則製 得導光元件7 7。 然,由於光阻層7 2在受熱軟化後,係形成均勻對稱 之變形結構7 2 3 ,使得金屬層7 5之凹面7 5 1亦為均 勻對稱之型態,所以在注入塑料時,模穴内之空氣很容易594224 _ Case No. 91106262_ Modification of the month and month _ V. Description of the invention (1) [Technical Field] The present invention relates to a light guide structure of a light guide element and a method for manufacturing the same, especially when a light guide element is filled with plastic. The light guide structure is completely filled to ensure that the outer surface of the protruding portion of the light guide element is complete, and the angle formed by the outer surface of the protruding portion can guide the light emitted from the light source to a predetermined direction, thereby improving the light guide effect. [Previous technology] Please refer to FIG. 4 to explain the manufacturing method of the conventional light guide element, which is coated with a positive photoresist layer 7 2 on a substrate 7 1 and then on the substrate 7 1 A mask 7 3 is covered above the surface for exposure under the UV light source 7 9. The mask 7 3 has a plurality of holes 7 3 1, so that the photoresist layer forms a majority of exposed portions 7 2 1 and an unexposed portion 7 2 2. The exposed substrate 7 1 is immersed in a developing solution 7 4 so that the unexposed portion 7 2 2 is etched away. Then, the substrate 7 1 is taken out of the developing solution 7 4 for heat treatment to expose the exposed portion. The top of the portion 7 2 1 is softened by heat, and a deformed structure 7 2 3 is formed, which is almost circular and symmetrical. After depositing a metal layer 75 on the top surface of the photoresist layer 72, the substrate 7 1 is separated from the metal layer 75, and the bottom surface of the metal layer 75 is formed with a concave surface 7 5 1 which is complementary to the deformed structure. The layer 7 5 is made into a mold core, which is placed in a mold 76 and injected with plastic. After the plastic is hardened and opened, a light guide element 7 7 is obtained. However, after the photoresist layer 7 2 is softened by heat, it forms a uniform and symmetrical deformation structure 7 2 3, so that the concave surface 7 5 1 of the metal layer 7 5 is also a uniform and symmetrical shape. Therefore, when the plastic is injected, Air is easy

第5頁 594224 _案號91106262_年月曰 修正_ 五、發明說明(2) 集中在凹面最深處A而難以排出,導致塑料無法填充完全 ,以至於導光元件表面之凸出部會具有若干不理想之凹點 7 7 1 ,導致光源7 8所發出之光線射到凸出部内面時, 受到不規則之凹點内面的影響,而無法將光線導向預定方 向(第5圖),使得導光元件無法有效達其導光功效。 另外,如第5圖所示,光阻層7 2受熱軟化後所形成 的弧面弧度有限(即導光元件7 7之頂面夾角r太大), 因此光線反射後之方向很容易偏掉。 故,上述問題實有改良必要。 【目的及功效】 本發明之主要目的,在於解決上述的問題而提供一種 導光元件之導光結構及其製造方法,其藉由將具有光阻層 之玻璃基材置於傾斜台上,讓光阻層因受熱而軟化時,會 因傾斜台之傾斜型態而略向下流,以使之後所置得的導光 元件具有多數傾斜之凸出部,而藉由凸出部外側面所形成 的夾角,使光源所發出之光線能被該導光元件導向預定方 向,讓光線在反射時,不會形成不當且偏向之反射,集中 導光方向。 本發明之再一目的,提供一種導光元件之導光結構及 其製造方法,其藉由將具有光阻層之玻璃基材置於傾斜台 上,讓光阻層因受熱而軟化時,會因傾斜台之傾斜型態而 略向下流,藉以使得所製得之金屬層微結構面的凹面為不 對稱型態,故於注入塑料時,塑料會強迫空氣朝凹面較緩 之一側流出,使導光元件的凸出部外側面能夠完整,且能Page 5 594224 _Case No. 91106262_ Years and Months Revisions_ 5. Description of the Invention (2) Concentrated on the deepest part A and difficult to discharge, resulting in the plastic cannot be completely filled, so that the convex portion on the surface of the light guide element will have The undesired concave point 7 7 1 causes the light emitted by the light source 7 8 to hit the inner surface of the convex portion, and is affected by the inner surface of the irregular concave point, so that the light cannot be directed in a predetermined direction (Figure 5), so that The light element cannot effectively achieve its light guiding effect. In addition, as shown in FIG. 5, the arc surface formed by the photoresist layer 72 after being softened by heat is limited (that is, the angle r of the top surface of the light guide element 7 7 is too large), so the direction after light reflection is easily deviated. . Therefore, it is necessary to improve the above problems. [Objective and Effect] The main purpose of the present invention is to solve the above problems and provide a light guide structure of a light guide element and a manufacturing method thereof. By placing a glass substrate having a photoresist layer on an inclined table, When the photoresist layer is softened due to heat, it will flow slightly downward due to the inclined shape of the inclined table, so that the light guide element placed afterwards has most inclined convex portions, and is formed by the outer side of the convex portion The included angle allows the light emitted by the light source to be guided in a predetermined direction by the light guide element, so that when the light is reflected, it will not form an improper and deflected reflection and concentrate the light guide direction. Still another object of the present invention is to provide a light guide structure of a light guide element and a manufacturing method thereof. By placing a glass substrate having a photoresist layer on an inclined table, the photoresist layer will soften when heated due to heat. Due to the inclined shape of the inclined table, it flows slightly downward, so that the concave surface of the metal layer microstructure surface is asymmetrical. Therefore, when the plastic is injected, the plastic will force the air to flow out to the slower side of the concave surface. Make the outer side of the projection of the light guide element complete, and

594224 _案號91106262_年月日__ 五、發明說明(3) 夠形成一弧度較大之緩面,而確保導光功效。 【技術内容】 本發明係提供一種導光元件之導光結構製造方法,其 係在一基材頂面塗佈一光阻層,再將該基材置於一光罩下 方,該光罩具有多數預定形狀之孔洞,並以一設於該光罩 上方之U V光源進行曝光,使該U V光源所發出之U V光 穿過光罩之孔洞而照設在光阻層上,讓該光阻層形成多數 曝光部份及多數未曝光部份,再將該基材及光阻層浸入一 顯影液中,使該光阻層之多數曝光或未曝光部份被蝕刻而 分別形成一凹部,相對未被蝕刻之部分則分別形成一較凹 部凸出之保留部分; 再將蝕刻後之光阻層與基材置入一加熱箱中加熱,使 該光阻層之多數保留部份受熱軟化而分別形成一變形結構 ,再於該光阻層遠離基材之面電鑄一金屬層,使該金屬層 形成一與光阻層之多數變形結構對應互補之微結構面,將 該金屬層置入模具後並注入塑料,而於塑料硬化開模後, 則形成該導光元件,該導光元件具有一與該微結構面對應 互補之導光面,其特徵在於: 於加熱基材時,係將該基材置於一傾斜台上,使該多 數保留部份之頂部於軟化時,會因傾斜台之傾斜而藉重力 略向下流,使該變形結構呈不對稱之型態,該變形結構具 有一最凸點,而自該最凸點向周圍傾斜延伸,且該變形結 構頂面上之各切線皆不互相重疊,該最凸點一侧形成一較 陡之陡面,相對該陡面之一側則因向下流動而形成一較平594224 _ Case No. 91106262_ 年月 日 __ V. Description of the invention (3) It can form a smooth surface with a large arc, and ensure the light guide effect. [Technical content] The present invention provides a method for manufacturing a light-guiding structure of a light-guiding element, which comprises coating a photoresist layer on the top surface of a substrate, and placing the substrate under a photomask. The photomask has A plurality of holes of a predetermined shape are exposed by a UV light source provided above the mask, so that the UV light emitted by the UV light source passes through the holes of the mask and is irradiated on the photoresist layer, so that the photoresist layer Form most exposed portions and most unexposed portions, and then immerse the substrate and the photoresist layer in a developing solution, so that most exposed or unexposed portions of the photoresist layer are etched to form a concave portion, respectively. The etched portions respectively form a convex portion that is more convex than the concave portion; and then the etched photoresist layer and the substrate are placed in a heating box and heated, so that most of the remaining portions of the photoresist layer are softened by heat and formed separately. A deformed structure, and a metal layer is electroformed on the side of the photoresist layer away from the base material, so that the metal layer forms a microstructure surface that is complementary to most of the deformed structure of the photoresist layer. And inject plastic, while plastic is hard After the mold is opened, the light guide element is formed. The light guide element has a light guide surface that is complementary to the microstructure surface. The light guide element is characterized in that when the substrate is heated, the substrate is placed on an inclined table. When the tops of the majority of the retained parts are softened, they will flow downwards by gravity due to the inclination of the inclined platform, so that the deformed structure has an asymmetrical shape, and the deformed structure has a most convex point. The bumps extend obliquely to the surroundings, and the tangents on the top surface of the deformed structure do not overlap each other. The side of the most bumped point forms a steeper steep surface, and the side opposite to the steep surface is formed by downward flow. A relatively flat

594224 _案號 91106262_年月曰 修正_ 五、發明說明(4) 緩之緩面,該陡面之切線與基材頂面之夾角係大於缓面切 線與基材頂面之央角。 本發明之上述及其他目的與優點,不難從下述所選用 實施例之詳細說明與附圖中,獲得深入了解。 當然,本發明在某些另件上,或另件之安排上容許有 所不同,但所選用之實施例,則於本說明書中,予以詳細 說明,並於附圖中展示其構造。 【實施例之詳細說明】 請參閱第1圖至第3圖,圖中所示者為本發明所選用 之實施例結構,此僅供說明之用,在專利申請上並不受此 種結構之限制。 本發明係一種導光元件之導光結構及其製造方法,該 製造方法係經過: 塗佈光阻:在一玻璃基材1頂面1 1塗佈一光阻層2 ,該光阻層2之黏度介於100〜1600厘泊(cp s )之間,其塗佈方式可為熟於此項技術者所熟知之方 法,如喷灑、輥輪等等,該光阻層2可為正型光阻(如C lariant Α ζ ρ462 Ό)或負型光阻。 曝光:將塗有光阻層2之玻璃基材1置於一光罩3 1 下方,該光罩3 1具有多數預定形狀之孔洞3 1 1 ,且光594224 _Case No. 91106262_ Years and months Amendment _ V. Description of the invention (4) The angle between the tangent of the steep surface and the top surface of the substrate is greater than the central angle between the tangent of the surface and the top surface of the substrate. The above and other objects and advantages of the present invention can be easily understood from the detailed description and accompanying drawings of the selected embodiments below. Of course, the present invention allows some differences in the arrangement or arrangement of other parts, but the selected embodiment is described in detail in this specification and its structure is shown in the drawings. [Detailed description of the embodiment] Please refer to FIG. 1 to FIG. 3, which are the structure of the embodiment of the present invention, which is used for illustration only, and is not subject to such structure in patent applications. limit. The present invention relates to a light guiding structure of a light guiding element and a manufacturing method thereof. The manufacturing method is performed by: coating a photoresist: coating a photoresist layer 2 on a glass substrate 1 top surface 1, the photoresist layer 2 The viscosity is between 100 and 1600 centipoise (cp s), and the coating method can be a method familiar to those skilled in the art, such as spraying, rollers, etc. The photoresist layer 2 can be positive Type photoresist (such as C lariant Α ζ ρ462 Ό) or negative type photoresist. Exposure: The glass substrate 1 coated with the photoresist layer 2 is placed under a photomask 3 1. The photomask 3 1 has a plurality of holes 3 1 1 of a predetermined shape.

罩3 1上方設有一 U V光源3 2 ,使光阻層2因受到該U V光源3 2之照射,而形成多數曝光部份2 1及多數未曝 光部份2 2。 蝕刻:將曝光過後之光阻層2及玻璃基材1浸入一蝕A U V light source 3 2 is provided above the cover 31, so that the photoresist layer 2 is irradiated by the U V light source 32 to form most exposed portions 21 and most unexposed portions 22. Etching: dipping the photoresist layer 2 and glass substrate 1 after exposure

594224 _案號 91106262_年月曰 修正_ 五、發明說明(5) 刻槽3 3中,該蝕刻槽3 3内儲有一顯影液3 4 ,以對該 光阻層2進行蝕刻,由於玻璃基材1上係塗佈正型光阻, 因此,受到U V光源3 2照射之曝光部份2 1不會被蝕刻 ,而形成一保留部分2 3 ,未受U V光源3 2照射的未曝 光部份2 2則被蝕刻使其厚度向下變薄,而形成一較保留 部分2 3凹陷之凹部2 4。 加熱:將蝕刻後之光阻層2置於一傾斜台4上,該傾 斜台4係設於一加熱箱8 1内,且該傾斜台底端結合有一 驅動馬達4 1 ,該傾斜台4係受驅動馬達4 1之驅動而旋 轉,並藉加熱箱8 1將光阻層2及玻璃基材加熱至1 1〇 〜2 5 0 °C,該傾斜台4頂面4 1與水平面之夾角係1度 〜4 0度,藉由該傾斜台4之傾斜型態,使該保留部分 2 3之頂部受熱而軟化時,其軟化之頂部會因重力而略向 下流,而分別形成一不對稱之變形結構2 5 ,該變形結構 2 5具有一最凸點2 5 1 ,而自該最凸點向周圍傾斜延 伸,且變形結構2 5頂面上之各切線皆不互相重疊,該最 凸點2 5 1 —側形成一較陡之陡面2 1 1 ,相對該陡面 2 1 1之一側則因向下流動而形成一平缓之缓面2 1 2 , 該陡面2 1 1及緩面2 1 2之切線與玻璃基材1頂面之夾 角分別為一夾角α及一夾角/3 ,其中,該夾角α大於該夾 角/5 。 電鑄:於具有多數變形結構之光阻層2頂面上電鑄一 預定厚度之金屬層5。 分離:使該金屬層5與玻璃基材1分開,而於金屬層594224 _Case No. 91106262_ Revised Year_ of the Invention_5. Description of the Invention (5) In the etched groove 3 3, a developing solution 3 4 is stored in the etched groove 3 3 to etch the photoresist layer 2. Material 1 is coated with a positive-type photoresist. Therefore, the exposed portion 2 1 exposed to the UV light source 3 2 will not be etched, and a reserved portion 2 3 is formed, and the unexposed portion is not exposed to the UV light source 3 2. 2 2 is etched to make it thinner downward to form a recessed portion 2 4 which is recessed more than the remaining portion 2 3. Heating: The etched photoresist layer 2 is placed on a tilting table 4, which is arranged in a heating box 81, and a driving motor 4 1 is combined at the bottom end of the tilting table 4 Driven by the driving motor 41, the photoresist layer 2 and the glass substrate are heated to 110 ° -250 ° C by a heating box 81. The angle between the top surface 41 of the inclined table 4 and the horizontal plane is 1 ° ~ 40 °. When the top of the retaining portion 23 is softened by heating with the inclined form of the inclined platform 4, the softened top will flow downward due to gravity, forming an asymmetrical shape. Deformed structure 25, the deformed structure 25 has a most convex point 2 5 1, and is inclined to extend from the most convex point to the surroundings, and the tangents on the top surface of the deformed structure 25 do not overlap each other, the most convex point 2 5 1 —A relatively steep surface 2 1 1 is formed on one side, and a gentle surface 2 1 2 is formed as a result of downward flow on one side opposite to the steep surface 2 1 1. The steep surface 2 1 1 is gentle The included angle between the tangent of the surface 2 12 and the top surface of the glass substrate 1 is an included angle α and an included angle / 3, respectively, wherein the included angle α is greater than the included angle / 5. Electroforming: A metal layer 5 of a predetermined thickness is electroformed on the top surface of the photoresist layer 2 having a large number of deformed structures. Separation: the metal layer 5 is separated from the glass substrate 1 and separated from the metal layer

594224 _案號 91106262_年月日__ 五、發明說明(6) 5靠近基材1之一面形成一微結構面5 1 ,該微結構面 5 1具有多數與變形結構互補對應的凹面5 1 1 ,再將該 金屬層5與一模具鋼9結合,而形成一模仁9〇。 成型:將該模仁9 0置於一模具3 5中,模仁9 0與 模具3 5間則界定出一空間3 5 1 ,再將塑料6 0注入該 空間3 5 1内,使塑料6 0完全填滿整個空間3 5 1 ,待 塑料6 0硬化後,再開模使該硬化之塑料6 0形成一導光 元件6。該導光元件6頂面形成一與微結構面5 1對應之 導光面6 1 ,且該導光面6 1具有多數與微結構面5 1對 應之凸出部6 1 1 ,該凸出部6 1 1外側面具有一最凸點 6 1 5 ,而自該最凸點向周圍傾斜延伸,且凸出部6 1 1 外側面上之各切線皆不互相重疊,該最凸點6 1 5 —側形 成一較陡之陡面6 1 2 ,相對該陡面6 1 2之一側則因向 下流動而形成一平缓之緩面6 1 3 ,該陡面6 1 2之切線 與導光面6 1之夾角係為一夾角α ,而缓面6 1 3切線與 導光面6 1之炎角係一夾角/?,該夾角/3係大於夾角α , 且凸出部6 1 1外側面上之各切線皆不互相重疊。 由上述說明可知,本發明藉由將具有光阻層2之玻璃 基材1置於傾斜台4上,使光阻層2之多數曝光部分2 1 頂部在受熱軟化時,會因傾斜台4之傾斜型態而藉由重力 向下流,使變形結構2 5頂面兩端分別形成一陡面2 1 1 及一缓面2 1 2 ,因此,金屬層5之凹面5 1 1亦形成一 側較陡、另一側較緩之不對稱型態,故,當塑料注入模具 3 5内時,會強迫空氣朝向較缓之側流出,讓塑料能夠完594224 _Case No. 91106262_ 年月 日 __ V. Description of the invention (6) 5 A microstructured surface 5 1 is formed near one surface of the base material 1, and the microstructured surface 5 1 has a concave surface 5 1 which is mostly complementary to the deformed structure. 1, and then combine the metal layer 5 with a mold steel 9 to form a mold core 90. Molding: The mold core 90 is placed in a mold 3 5, and a space 3 5 1 is defined between the mold core 90 and the mold 3 5, and then a plastic 60 is injected into the space 3 5 1 to make the plastic 6 0 completely fills the entire space 3 5 1. After the plastic 60 is hardened, the mold is opened to form the hardened plastic 60 to form a light guide element 6. The top surface of the light guide element 6 forms a light guide surface 6 1 corresponding to the microstructure surface 51, and the light guide surface 6 1 has a plurality of convex portions 6 1 1 corresponding to the microstructure surface 51. The outer mask of the part 6 1 1 has a most convex point 6 1 5, and the oblique extension from the most convex point to the surroundings, and the tangent lines on the outer surface of the protruding part 6 1 1 do not overlap each other, the most convex point 6 1 A side of the steep surface 6 1 2 is formed on the 5 side, and a gentle surface 6 1 3 is formed on the side opposite the steep surface 6 1 2 due to the downward flow. The tangent and guide of the steep surface 6 1 2 The included angle of the smooth surface 6 1 is an included angle α, and the tangent of the slow surface 6 1 3 and the inflammation angle of the light guide surface 61 is an included angle / ?, the included angle / 3 is greater than the included angle α, and the protruding portion 6 1 1 The tangents on the outside surface do not overlap each other. It can be known from the above description that the present invention, by placing the glass substrate 1 having the photoresist layer 2 on the inclined table 4, most of the exposed portions 2 1 of the photoresist layer 2 are softened by heat due to the The oblique shape and the downward flow of gravity cause the deformed structure 2 5 to form a steep surface 2 1 1 and a gentle surface 2 1 2 at both ends of the top surface. Therefore, the concave surface 5 1 1 of the metal layer 5 is also formed on one side. Steep, asymmetrical shape on the other side, so when the plastic is injected into the mold 35, the air will be forced to flow out towards the slower side, so that the plastic can finish

第10頁 594224 _案號 91106262_年月日__ 五、發明說明(7) 全充填空間3 5 1 ,使導光元件6的凸出部6 1 1外側面 能夠完整。 此外,如第3圖所示,由於導光元件6之凸出部 6 1 1外側面沒有凹凸不平的結構,且藉由緩面6 1 3之 成型 ,使凸出部6 1 1外侧面一侧之弧度變大,即利用緩面 6 1 3夾角/3小於先前技術導光元件7 7頂面夾角r之特 性 ,使本發明之導光元件6能夠將光源8 2所發出之光線導 向預定方向,而不會發生如先前技術中所述之光線容易偏 向的問題。 需特別提醒的是,本發明之光阻層不侷限使用正型光 阻,而亦可採用負型光阻,當將塗佈有負型光阻之玻璃基 材置於光罩下曝光,再浸入特定顯影液時,其多數曝光部 份會被钱刻,而未曝光部份則不會被钱刻。 綜上所述,本發明藉由將具有光阻層之玻璃基材置於 傾斜台上,讓光阻層因受熱而軟化時,會因傾斜台之傾斜 型態而略向下流,藉以使得所製得之金屬層微結構面的凹 面為不對稱型態,故於注入塑料時,塑料會強迫空氣朝凹 面較緩之一側流出,使導光元件的凸出部外側面能夠完 整,且藉由缓面之型態讓導光元件能有效地將光線導向預 定方向,而降低光在導光板内部所造成的光損失,確保導 光功效。 當然,本發明仍存在許多例子,其間僅細節上的變化Page 10 594224 _Case No. 91106262_ Year Month Date__ V. Description of the invention (7) The full filling space 3 5 1 enables the outer side of the protruding portion 6 1 1 of the light guide element 6 to be completed. In addition, as shown in FIG. 3, since the outer surface of the protruding portion 6 1 1 of the light guide element 6 has no uneven structure, and by forming the gentle surface 6 1 3, the outer surface of the protruding portion 6 1 1 The radian of the side becomes larger, that is, the characteristic that the included angle of the slow surface 6 1 3/3 is smaller than the included angle r of the top surface of the prior art light guide element 7 7 enables the light guide element 6 of the present invention to direct the light emitted by the light source 8 2 to a predetermined Direction without the problem that the light is easily deflected as described in the prior art. It should be particularly reminded that the photoresist layer of the present invention is not limited to using a positive type photoresist, but a negative type photoresist may also be used. When a glass substrate coated with a negative type photoresist is placed under a photomask and exposed, When immersed in a specific developer, most of the exposed parts will be engraved with money, while the unexposed parts will not be engraved with money. In summary, in the present invention, by placing a glass substrate with a photoresist layer on an inclined table, when the photoresist layer is softened by heat, it will flow slightly downward due to the inclined form of the inclined table, thereby making all The concave surface of the microstructure surface of the prepared metal layer is asymmetrical, so when plastic is injected, the plastic will force the air to flow out to the slower side of the concave surface, so that the outer side of the convex portion of the light guide element can be completed, and The shape of the slow surface allows the light guide element to effectively guide light to a predetermined direction, and reduces the light loss caused by light inside the light guide plate, ensuring the light guide effect. Of course, there are still many examples of the present invention, in which only the details have changed

第11頁 594224 _案號91106262_年月日_^_ 五、發明說明(8) ,本發明第二實施例的不同處在於,加熱:將蝕刻後之玻 璃基材置於一不會旋轉的傾斜台上,而達到第一實施例中 所述之功效。 以上所述實施例之揭示係用以說明本發明,並非用以 限制本發明,故舉凡數值之變更或等效元件之置換仍應隸 屬本發明之範疇。 由以上詳細說明,可使熟知本項技藝者明瞭本發明的 確可達成前述目的,實已符合專利法之規定,爰提出專利 申請。Page 11 594224 _Case No. 91106262_Year Month Date _ ^ _ V. Description of the Invention (8) The difference of the second embodiment of the present invention is that heating: place the etched glass substrate on a non-rotating glass substrate Tilt the table to achieve the effect described in the first embodiment. The disclosure of the embodiments described above is used to illustrate the present invention, and is not intended to limit the present invention. Therefore, any change in the value or replacement of equivalent components should still belong to the scope of the present invention. From the above detailed description, those skilled in the art can understand that the present invention can indeed achieve the aforementioned purpose, and it has indeed complied with the provisions of the Patent Law, and filed a patent application.

第12頁 594224 案號91106262 年月日 修正 圖式簡單說明 第1圖係本發明導光元件製造方法之流程示意圖 第2 a圖係本發明導光元件凸出部之放大示意圖 第2 b圖係本發明導光元件凸出部之頂視圖 第3圖係說明本發明導光元件具有良好導光效果之情 形 第 4 圖 係 習 用 導 光 元 件 製 第 5 圖 係 說 明 習 用 導 光 元 方 , 導 致 光 線 偏 向 [ 圖 號 言兄 明 ] ( 習 用 部 分 ) 基 材 7 1 光 罩 7 光 阻 層 7 2 孔 洞 7 曝 光 部 分 7 2 1 顯 影 液 未 曝 光 部 分 7 2 2 金 屬 層 變 形 結 構 7 2 3 凹 面 7 造方法之流程不意圖 件無法良好地將光線導向前 之情形 3 模具7 6 3 1 導光元件7 7 7 4 凹點7 7 1 7 5 光源7 8 5 1 U V光源7 9 (本發明部分) 基材1 頂面1 1 光阻層2 曝光部份2 1 陡面2 1 1 缓面2 1 2 未曝光部份2 2 光罩3 1 孔洞3 1 1 U V光源3 2 蝕刻槽3 3 顯影液3 4 模具3 5 空間3 5 1 塑料6 0 導光元件6 導光面6 1 凸出部6 1 1 陡面6 1 2 缓面6 1 3 最凸點6 1 5Page 12 594224 Case No. 91106262 Revised diagram Brief description Briefly, Figure 1 is a schematic flow chart of the light guide element manufacturing method of the present invention. Figure 2a is an enlarged schematic view of the projection of the light guide element of the present invention. Figure 2b is Top view of the projection of the light guide element of the present invention. FIG. 3 illustrates a case where the light guide element of the present invention has a good light guide effect. FIG. 4 illustrates a conventional light guide element. FIG. 5 illustrates a conventional light guide element, which causes light. Biased [Pictures and Numbers] (conventional part) Substrate 7 1 Photomask 7 Photoresist layer 7 2 Hole 7 Exposed part 7 2 1 Unexposed part of developer 7 2 2 Deformed structure of metal layer 7 2 3 Concave surface 7 Manufacturing method The process is not intended to be a situation where the light cannot be guided well 3 mold 7 6 3 1 light guide element 7 7 7 4 pit 7 7 1 7 5 light source 7 8 5 1 UV light source 7 9 (part of the present invention) substrate 1 Top surface 1 1 Photoresist layer 2 Exposed portion 2 1 Steep surface 2 1 1 Slow surface 2 1 2 Unexposed portion 2 2 Mask 3 1 Hole 3 1 1 UV light source 3 2 Etching tank 3 3 Developer 3 4Mold 3 5 Space 3 5 1 Plastic 6 0 Light guide element 6 Light guide surface 6 1 Projection 6 1 1 Steep surface 6 1 2 Slow surface 6 1 3 Most convex point 6 1 5

第13頁 594224 案號 91106262 曰 修正 圖式簡單說明 保留部分2 3 傾斜台4 凹部2 4 驅動馬達 變形結構2 5 金屬層5 最凸點2 5 1 微結構面 凹面5 1 加熱箱8 1 光源8 2 模具鋼9 模仁9〇Page 13 594224 Case No. 91106262 Brief description of the revised diagram Reserved part 2 3 Inclined table 4 Concave part 2 4 Deformed structure of drive motor 2 5 Metal layer 5 Most convex point 2 5 1 Microstructure concave surface 5 1 Heating box 8 1 Light source 8 2 Mould steel 9 Mould core 9〇

第14頁Page 14

Claims (1)

594224 ;_案號91106262_年月曰 修正_ 六、申請專利範圍 與基材頂面之夾角係大於缓面切線與基材頂面之夾角 〇 2 ·依申請專利範圍第1項所述之導光元件之導光結構製’ 造方法,其中,該傾斜台與水平面之夾角係1度〜 . 4 0度之間。 3 ·依申請專利範圍第1項所述之導光元件之導光結構製 造方法,其中,該光阻層之黏度介於100〜600 厘泊之間,且係將該基材及光阻層加熱至 1 1 0 °C〜2 5 0 °C,使該多數保留部份之頂部軟化 〇 4 ·依申請專利範圍第1項所述之導光元件之導光結構製 造方法,其中,該傾斜台結合有一驅動馬達,該傾斜 台係受驅動馬達之驅動而旋轉。 5 · —種以申請專利範圍第1項至第4項中任一項製造方 法製得之導光結構,該導光結構具有一導光面,該導 光面具有多數不對稱之凸出部,該凸出部具有一最凸 點,而自該最凸點向周圍傾斜延伸,且該凸出部外側 面上之各切線皆不互相重疊,該最凸點一側形成一較 陡之陡面,該陡面切線與導光面之間係形成一夾角 α ;相對該陡面之一側則形成一較陡面平緩之缓面, 該緩面切線與導光面之間則形成一夾角万,該夾角/5係 大於炎角α 。594224; _Case No. 91106262_Amended in January of the year. 6. The angle between the scope of the patent application and the top surface of the substrate is greater than the angle between the tangent of the gentle surface and the top surface of the substrate. The manufacturing method of the light guide structure of the optical element, wherein the angle between the inclined table and the horizontal plane is between 1 degree and .40 degrees. 3. The manufacturing method of the light guide structure of the light guide element according to item 1 of the scope of the patent application, wherein the viscosity of the photoresist layer is between 100 and 600 centipoise, and the substrate and the photoresist layer Heating to 110 ° C ~ 250 ° C to soften the top of the majority of the retained parts. 4 According to the manufacturing method of the light guide structure of the light guide element described in item 1 of the patent application scope, wherein the tilt The table is combined with a driving motor, and the tilting table is rotated by the driving motor. 5 · A light-guiding structure made by any one of the methods of applying for a patent in the range of items 1 to 4, the light-guiding structure has a light-guiding surface, and the light-guiding surface has most asymmetric projections The protruding portion has a most protruding point, which extends obliquely from the most protruding point to the surroundings, and the tangent lines on the outer surface of the protruding portion do not overlap each other, and a steeper steepness is formed on one side of the most protruding point. Surface, an angle α is formed between the tangent of the steep surface and the light guide surface; a gentle surface with a steeper surface is formed opposite to one side of the steep surface, and an angle is formed between the tangent of the slow surface and the light guide surface The angle / 5 is greater than the angle of inflammation α. 第16頁Page 16
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