TW593209B - Porous silicon nitride ceramics and method for producing the same - Google Patents

Porous silicon nitride ceramics and method for producing the same Download PDF

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Publication number
TW593209B
TW593209B TW91103295A TW91103295A TW593209B TW 593209 B TW593209 B TW 593209B TW 91103295 A TW91103295 A TW 91103295A TW 91103295 A TW91103295 A TW 91103295A TW 593209 B TW593209 B TW 593209B
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Taiwan
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silicon nitride
metal
powder
porous silicon
pores
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TW91103295A
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Chinese (zh)
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Michimasa Miyanaga
Osamu Komura
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Sumitomo Electric Industries
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Abstract

The invention provides porous silicon nitride ceramics that have uniform, fine closed pores and a manufacturing method thereof. Metal Si powder is mixed with a sintering additive, followed by thermal treatment, which is a pre-process for forming a specific grain boundary phase. Two-stage thermal treatment is thereafter performed by microwave heating at a temperature of 1000 DEG C or more. The metal Si powder is thereafter subjected to a nitriding reaction from its surface, the metal Si is thereafter diffused to nitride formed on the outer shell of the metal Si, and thereby porous silicon nitride ceramics that have uniform, fine closed pores can be obtained. Since the porous silicon nitride ceramics of the present invention have a high ratio of closed pores and are superior in electrical/mechanical characteristics, excellent characteristics can be displayed if they are used, for example, for an electronic circuit board that requires an anti-hygroscopicity, a low dielectric constant, a low dielectric loss, and mechanical strength.

Description

A7 ________ Β7 五、發明説明( ) 發明之技術領域 、X月係有關使用在各種配線電路基板、絕緣部材或電 波透過材等之介電材料,或輕質有耐吸濕性結構材料之多 孔質氮化矽陶瓷及其製造方法。 先前技術 陶瓷疋做為各種結構材料或電子零組件材料使用之材 料仁近年心切要求質輕且高強度,或是改善電氣特性等 提尚此等特性者。例%,在做為料體製造裝置零組件所 使用之晶片搬送置物台或描畫用置物台等,為了高精度' 回速度驅動之置物台材質的更為輕質化要求,又,在電子 機中所用之電路基板或絕緣材料等,隨著近曰之高頻率 化,強烈要求更為低介電率、低介電損失之材料。 -為此,認為將陶瓷做成多孔質來使用應會有效,例如陶 瓷之相對雄度降低50%的話,此重量就可以降低,又 因空氣顯示出之介電率約為〗,介電損失為0之優異電氣絕 緣性,所以多孔質陶瓷是可望求得低介電率、低介電損失 之材料。 然而,單單控制陶瓷燒結體之燒結步驟,很難獲得均勻 分散微細氣孔之多孔質燒結體。通常之情形,是藉由粗大 氣孔之發生會產生強度下降或特性不均勻之問題。又,所 得多孔質燒結體之氣孔因幾乎是開氣孔之故,會損害陶瓷 本來之耐濕性,由於水分之電氣特性(介電率、介電損失)顯 著惡化,或各種特性之偏差等,而有得不到實用上期望之 特性問題產生。 000317 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593209 A7A7 ________ Β7 V. Description of the invention () The technical field of the invention, X month is related to the use of dielectric materials such as various wiring circuit boards, insulating materials or radio wave transmission materials, or porous nitrogen with light moisture-resistant structural materials Siliconized ceramics and methods of making them. Prior art Ceramics are used as materials for various structural materials or electronic component materials. In recent years, they have been eager for light weight and high strength, or improved electrical characteristics. For example, in order to reduce the weight of the table material used for high-accuracy 'return speed drive', such as wafer transfer table or drawing table used for components of material manufacturing equipment, etc. With the recent increase in frequency of circuit substrates and insulating materials used in such applications, materials with lower dielectric constant and lower dielectric loss are strongly demanded. -For this reason, it is believed that it is effective to use ceramics as porous materials. For example, if the relative rigidity of ceramics is reduced by 50%, this weight can be reduced, and the dielectric constant shown by air is about 〖, and the dielectric loss is Because of its excellent electrical insulation properties of 0, porous ceramics are expected to be materials with low dielectric constant and low dielectric loss. However, it is difficult to obtain a porous sintered body in which fine pores are uniformly dispersed only by controlling the sintering step of the ceramic sintered body. Generally, the occurrence of coarse pores causes problems such as decreased strength or uneven characteristics. In addition, since the pores of the obtained porous sintered body are almost pores, the original moisture resistance of the ceramic is impaired, the electrical characteristics (dielectric rate, and dielectric loss) of the moisture are significantly deteriorated, or variations in various characteristics, etc. However, there is a problem that the characteristics cannot be expected practically. 000317 This paper is sized for China National Standard (CNS) A4 (210X297 mm) 593209 A7

593209 A7 -—__B7 五、發明説明(Q ) 花更多功夫的問題。 特開平1 1-1 16333號公報中,是揭示熱處理硼矽酸 玻璃而分相化,溶出可溶性相,粉碎後,只在表面以火炎 溶融’藉由使閉氣孔化’能調整擁有奈米級之閉氣孔多孔 質玻璃m玻璃結晶化熱處理所得之多孔f骨材,調 整玻璃/骨材/樹脂球之混合物,⑽μ制法製作陶竟電路 基板之方法。在此方法所得陶:£電路基板之比介電率在2以 下,熱膨脹係數在13〜17 ppm/t:。在此方法中,以熱處理 分相化,限定溶出可溶性相之材料。χ,不僅製程複雜, 在異相中有必要使用複合化之故,得不到本來之機械的、 電氣的特性’再者,一旦開氣孔被包圍,就因吸著水分等 而會有困難完全解離、控制之問題產生。 形成上述般閉氣孔之以往技術,因有必要添加由起泡劑 或熔融物或是與熱膨脹係數不同相等之基材相所成之相異 第2相,由於第2相或第2相之殘渣,而會有大幅度降低電氣 的、機械的特性問題產生。又,氣孔率過大時,不能形成 基材骨格,變成不能控制氣孔徑等,所形成之氣孔率、氣 孔徑會受到限制。 發明所欲解決之課題 本發明是提供解決上述問題點者,即,本發明是有均勻 且微細之閉氣孔的多孔質氮化矽陶瓷及其製造方法。 本發明之多孔質氮化矽陶瓷,是相對密度為不滿70〇/〇 , 全氣孔中之閉氣孔比率為5 0%以上,更佳者,相對密度為 不足5 0%,全氣孔中閉氣孔之比率為90%以上。593209 A7 ---__ B7 V. Description of the Invention (Q) Questions that take more effort. Japanese Patent Application Laid-Open No. 1 1-1 16333 discloses that the heat-treated borosilicate glass is phase-separated to dissolve the soluble phase. After pulverization, it is melted with flame only on the surface, and it can be adjusted to have a nanometer level by closing the porosity. A method for producing a ceramic circuit board using a closed-cell porous glass m glass porous heat treatment obtained by crystallization heat treatment, adjusting a glass / aggregate material / resin ball mixture, and a method of making μ. The specific dielectric constant of the circuit board obtained by this method is less than 2 and the coefficient of thermal expansion is 13 to 17 ppm / t :. In this method, the materials are separated by heat treatment to define a material that dissolves the soluble phase. χ, not only the manufacturing process is complicated, but it is necessary to use compounding in heterogeneous phases. The original mechanical and electrical characteristics are not obtained. Moreover, once the open pores are surrounded, it will be difficult to completely dissociate due to moisture absorption. The problem of control arises. In the conventional technique for forming the closed pores as described above, it is necessary to add a second phase different from the foaming agent or the melt or a base material phase with a coefficient of thermal expansion that is different. Because of the residue of the second phase or the second phase, However, there will be a significant reduction in electrical and mechanical characteristics. In addition, if the porosity is too large, the matrix of the base material cannot be formed, the pore size cannot be controlled, etc., and the porosity and pore size formed will be limited. Problems to be Solved by the Invention The present invention is to provide a solution to the above-mentioned problems. That is, the present invention is a porous silicon nitride ceramic having uniform and fine closed pores and a method for producing the same. The porous silicon nitride ceramic of the present invention has a relative density of less than 70/0, a closed pore ratio in the whole pores of 50% or more, and more preferably, a relative density of less than 50%, and the closed pores in the full pores. The ratio is above 90%.

本纸張尺度適用中國國家標準(CNS) Α4規格(210 X 297公釐) 593209 A7 B7This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 593209 A7 B7

五、發明説明(4 通常多孔質陶瓷的情形,相對於如圖2模式般所示粒子間 變為氣孔者,本發明之多孔質氮化矽陶瓷,是如圖丨模式所 示般粒子變成中空狀之結構,緻密質部分(骨幹部)為網狀連 續之結構,且因不含粗大之空孔,有比一向之多孔質陶瓷 更優之機械強度與電氣特性,尤其,因粒子成中空化之 故’均勻徑之空孔有分散結構的多孔質陶瓷中,在多孔質 陶瓷之任意斷面中,相鄰接之2個空孔半徑rl、^與陶曼部 之寬度b間,可以有(1^ + r2)/b〉i之關係,較佳者為 + r2)/b > 2。 又,本發明之多孔質氮化矽陶瓷,是含有RE4Si2N2〇7或 RE1GN2(Si〇4)6所示之氧氮化物或氧氮化矽化合物結晶相。 又’至少有一部分絕緣層為上述多孔質陶瓷材料所成,以 此為特徵之陶瓷電路基板。 又’本發明之多孔質氮化矽陶瓷,是將金屬以粉與含有 Yb、Sm或Er中至少!種,相當於以粉有〇 2〜2 5莫爾者, 製作成形體後,在含有氮氣之包圍氣中,藉由熱處理製造 方法來製得。再者,上述成形體藉由微波或毫波照射下熱 處理’由中空化之氮化矽陶瓷粒子可得多孔質氮化矽陶 瓷。 圖式說明(元件符號說明) 圖1是本申請發明之多孔質陶瓷的斷面組織模式圖。 圖2是一向之多孔質陶瓷之斷面組織模式圖。 圖3表示在本申請發明多孔質陶瓷之燒結過程,是成形 狀態’(b)是燒結初期狀態,(c)是燒結完了狀態。 Γ Ρ ο ο ο η 本紙張尺度適用中國國家標準(CNS) A4規格(210 x 297公釐)V. Description of the invention (4 In the case of porous ceramics, the porous silicon nitride ceramics of the present invention have hollow particles as shown in the pattern. Structure, the dense part (backbone) is a continuous network structure, and because it does not contain coarse pores, it has better mechanical strength and electrical characteristics than conventional porous ceramics, especially because the particles become hollow. Therefore, in the porous ceramics with uniform structure of the pores with a dispersed diameter, in any section of the porous ceramics, there can be between the two adjacent pore radii rl, ^ and the width b of the Taoman part. The relationship (1 ^ + r2) / b> i is preferably + r2) / b > 2. The porous silicon nitride ceramic of the present invention contains a crystal phase of an oxynitride or a silicon oxynitride compound represented by RE4Si2N207 or RE1GN2 (Si〇4) 6. It is a ceramic circuit board characterized in that at least a part of the insulating layer is made of the porous ceramic material. In addition, the porous silicon nitride ceramic of the present invention is a metal powder containing at least Yb, Sm or Er! This kind of powder is equivalent to those having a powder content of 2 to 25 moles. After forming the molded body, it is produced by a heat treatment manufacturing method in a surrounding gas containing nitrogen. Furthermore, the above-mentioned formed body is subjected to thermal treatment under microwave or millimeter irradiation 'to obtain a porous silicon nitride ceramic from hollow silicon nitride ceramic particles. BRIEF DESCRIPTION OF THE DRAWINGS (Description of Element Symbols) FIG. 1 is a schematic diagram of a sectional structure of a porous ceramic according to the invention of the present application. FIG. 2 is a schematic diagram of a cross-sectional structure of a conventional porous ceramic. Fig. 3 shows the sintering process of the porous ceramic according to the present invention. It is a formed state '(b) is an initial state of sintering, and (c) is a state of being sintered. Γ Ρ ο ο ο η The paper size applies to China National Standard (CNS) A4 (210 x 297 mm)

線 593209 A7 ___B7 五、發明説明(5 ) 圖4表示在本申請發明多孔質陶瓷之燒結過程中,丨個金 屬粒子之變化模式說明圖,(a)是燒結前之狀態,(b)是燒結 初期狀態,(c)是燒結進行狀態,是燒結完了狀態。 發明之實施形態: 有關本發明之多孔質氮化矽陶瓷,其製造方法用以下交 差式詳述。本發明之多孔質氮化矽陶瓷,是藉由含有由金 屬石夕粉末與燒結助劑粉末之準備步驟、將此等粉末混合做 成混合粉末之步驟、將該混合粉末成形成形體之步驟、與 將該成形體在氮氣存在包圍氣氛下燒結,做成金屬氮化物 燒結體之步驟的方法所製得。閉氣孔是將金屬矽粉末中空 化而得,相對密度與全氣孔中之閉氣孔比率是可以由做為 出發原料之金屬矽粉末的粒度來控制,金屬矽粉末是可以 使用市售之高純度金屬粉末,然而,在金屬矽表面,藉由 自然氧化膜或之後的熱處理形成熱氧化膜,依此氧化膜量 中空化之程度,因有顯著變化之故,隨著在金屬矽粉末中 之氧量或該氧量來控制粒界相之組成是很重要的事實,氧 量,換算成金屬氧化物(Si〇2),是期望選擇在〇.2莫爾%以 上,1.0莫爾%以下之範圍者,再者,混合中之氧量增加雖 可藉由添加偶合劑等來控制,或很重要地可藉由添加苯酚 脂還原劑等來抑制氧量之增加。 金屬石夕粉末之平均粒徑是以0.1微米以上,不足15微米者 為且。不足0·1微米時,比表面積大,上述氧量控制變得很 困難。又,在15微米以上時,因完全中空化,所以反應時 間變長,而不經濟。 0C2321 _8- 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐) 593209Line 593209 A7 ___B7 V. Description of the invention (5) Figure 4 shows the change pattern of metal particles during the sintering process of the porous ceramic of the present invention, (a) is the state before sintering, and (b) is sintering The initial state (c) is a state in which sintering is progressing and a state in which sintering is completed. Embodiments of the invention: The porous silicon nitride ceramics of the present invention is produced by the following cross formula in detail. The porous silicon nitride ceramic of the present invention includes a step of preparing a metal powder and a sintering aid powder, a step of mixing these powders into a mixed powder, a step of forming the mixed powder into a molded body, It is prepared by a method of sintering the formed body in an atmosphere surrounded by nitrogen to form a metal nitride sintered body. The closed pores are obtained by hollowing out the metal silicon powder. The ratio of the relative density to the closed pores in the whole pores can be controlled by the particle size of the metal silicon powder as the starting material. The metal silicon powder can be a commercially available high-purity metal. Powder, however, on the surface of metal silicon, a thermal oxide film is formed by a natural oxide film or subsequent heat treatment. The degree of cavitation of the oxide film is significantly changed due to the significant change in the amount of oxygen in the metal silicon powder. Or it is very important to control the composition of the grain boundary phase with this amount of oxygen. The amount of oxygen, converted into metal oxide (Si〇2), is preferably selected in the range of 0.2 mole% or more and 1.0 mole% or less. In addition, although the increase in the amount of oxygen in the mixing can be controlled by adding a coupling agent or the like, or it is important to suppress the increase in the amount of oxygen by adding a phenol lipid reducing agent or the like. The average particle size of the metal powder is 0.1 micrometer or more and less than 15 micrometers. If it is less than 0.1 m, the specific surface area becomes large, and the above-mentioned control of the amount of oxygen becomes difficult. Moreover, when it is 15 micrometers or more, since it becomes completely hollow, the reaction time becomes long, which is uneconomical. 0C2321 _8- This paper size applies to China National Standard (CNS) A4 specification (210X297 mm) 593209

在上述金屬石夕粉末中做為燒結助劑者,是添加几、^或 Er至少-種之氧化物、氧氮化物切化物等之化合物較 佳者是Yb或Sm之氧化物,添加量是相當金屬矽粉之"莫 爾%以上’ 2.5莫爾%以下者為宜,不足〇 2莫爾%時不能 促進金屬矽之擴散,矽粒子之中空化不能充分進行,又在 2.5莫爾%以上時’全氣孔率變得容易下降—向已知之 金屬矽氮化促進劑有三氧化二鐵或三氧化二鋁等,在本發 明之情形,中空化不能充分進行,並不好。 又,添加之燒結助劑的平均粒徑是以〇1微米以上,1微 米以下為宜,在不足Oj微米時,因易產生凝集等,所以變 得很困難處理,又在1微米以上時,變得不易進行金屬粉末 之氮化反應,又,金屬粉末之表面氧化膜會妨害反應之情 形,加入上述燒結助劑,較佳者是將鹼金屬或鹼土類金屬 或此等金屬之氧化物做為第2燒結助劑來添加,第2燒結助 劑之添加量以在0 · 1莫爾%以上,1 5莫爾%以下為宜,此平 均粒徑是以在0.1微米以上,2微米以下為宜。 金屬矽粉末與燒結助劑及添加必要之對應有機粘著劑, 藉由即存之球磨或超音波混合等方法來混合。混合後,使 其乾燥。之後,成形所定之形狀,可得成形體,成形通常 可以選擇使用乾式加壓成形法、押出成形法、刮刀成形法 及射出成形法等公知成形法,在所期望之形狀上配合品質 上、生產上最為期望之成形方法,其中在成形上將預先混 合之混合粉末以顆粒狀造粒,可以預先提高膨鬆密度,提 高成形性。上述有機粘著劑是在再提高成形性之情形下添 %;C2322 -9 - 本紙張尺度適用中國國家標準(CNS) A4規格(210 x 297公釐)As the sintering aid in the above-mentioned metal stone powder, a compound containing at least one kind of oxide, oxynitride cutting compound, etc. is preferably added as the oxide of Yb or Sm. The added amount is It is appropriate that the metal silicon powder is " more than Mohr% and more than 2.5 Mohr%. When it is less than 0.2 Molar%, the diffusion of metallic silicon cannot be promoted, and cavitation in the silicon particles cannot be fully performed, and at 2.5 Molar% In the above case, the total porosity is liable to decrease—ferrous oxide or aluminum oxide is known to the known metal silicon nitriding accelerator. In the case of the present invention, cavitation cannot be performed sufficiently, which is not good. In addition, the average particle diameter of the sintering additive added is preferably from 0.01 μm to 1 μm. When the average particle diameter is less than 0 μm, aggregation is likely to occur, which makes it difficult to handle. When it is 1 μm or more, It becomes difficult to carry out the nitriding reaction of the metal powder, and the surface oxide film of the metal powder may hinder the reaction. The above-mentioned sintering aid is added, and it is preferable to use an alkali metal or an alkaline earth metal or an oxide of these metals. It is added for the second sintering aid, and the addition amount of the second sintering aid is preferably 0.1 mol% or more and 15 mol% or less. The average particle diameter is 0.1 micrometer or more and 2 micrometers or less. Better. The metal silicon powder and the sintering auxiliary agent and the necessary corresponding organic adhesive are added by a method such as ball milling or ultrasonic mixing. After mixing, it is dried. After that, a predetermined shape can be formed to obtain a formed body. Generally, a known forming method such as a dry press forming method, an extrusion forming method, a doctor blade forming method, and an injection forming method can be selected for forming. The most desirable molding method mentioned above, in which the pre-mixed mixed powder is granulated in the shape of the molding, can increase the bulk density in advance, and improve the moldability. The above organic adhesive is added in the case of further improving the formability; C2322 -9-This paper size applies the Chinese National Standard (CNS) A4 specification (210 x 297 mm)

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k 593209 A7 B7 五、發明説明 加0 將上述成形體藉由含氮氣體包圍氣雰下熱處理,形成特 定之粒界層後,在進行金屬矽之氮化反應時,在每個金屬 矽粉末中空化之同時,反應之鄰接金屬矽粉末氮化物成一 體化,可以得到有微細之閉氣孔多孔質氮化矽陶瓷,熱處 理是為了形成特定粒界相而進行前處理與氮化反應之中空 化反應處理之2階段。 前處理是可以在碳加熱爐中進行,將上述成形體在800°C 以上,不滿1〇〇〇。(:之溫度中,進行1小時以上之熱處理,熱 處理時包圍氣體是含有20體積%以上之惰性氣體的包圍氣 體。在此前處理中,將Yb、Sm或Er以RE來表示,有必要 形成RE1()N2(Si〇4)6或RE4Si2N207所示粒界相,在不形成 如此粒界相之情形中,於下步驟之反應處理中不會促進矽 粒子之中空化,本發明之多孔質氮化矽陶瓷變成很困難製 得,因此,為了形成如此之粒界相,調整燒結助劑之組成 或原料粉末之氧量或熱處理條件,前處理之溫度不足8〇〇。〇 時,不會形成上述粒界相。又在1000°C以上之溫度時,因 在上述粒界相形成不充分下,開始金屬矽的氮化反應,很 難得到目的之多孔質氮化矽陶瓷,尤其粒界相是以 RE10N2(SiO4)6 為佳。 第2階段熱處理之反應處理,是在1000它以上之含氮氣或 是氨氣包圍氣雾中進行,在包圍氣雾中,在氮氣或是氨氣 中也可以加入氦氣,加熱雖然也可以用碳加熱爐等,但為 了金屬石夕粉末之擴散’促進中空化,抑制粒子成長中空構 10- r. η n η ο ^ 本紙張尺度適用中國國家標準(CNS) Α4規格(210 X 297公釐) 593209 A7 B7 五、發明説明 造之消失,以使用微波或毫米波熱處理較佳,尤其以2〇 GHz以上之頻率微波照射加熱時,在金屬矽粉末之外殼所 形成之金屬氮化物(ShN4)可以促進金屬之擴散,金屬粉末 之中空化因而變得容易,所以較佳。 反應處理溫度是以1000°c以上較佳,不滿i〇〇〇t時,金 屬粉末之氮化反應進行變慢,沒有經濟性,又以碳加熱爐 加熱以在1500°C之下,微波加熱在175(rc以下之溫度較 佳,在此以上之溫度因會產生金屬氮化物之變態相或粒子 成長之故,中空化結構生變後,很難得到本發明之多孔質 陶瓷。 又,上幵到最兩溫度之昇溫是以分成2階段以上之階段昇 溫較佳,在此,金屬之氮化反應因是發熱反應之故,一下 子昇溫到最終燒結溫度時,因本身之發熱溫度會超過金屬 之融點,會造成金屬之熔融,金屬熔融時,會變成末反應 之熔融塊,因會造成粗大之空孔,或自成形體熔出會引起 多孔質陶瓷之機械的、電氣的特性劣化。 同時,通常之情形,金屬矽變成完全氮化矽,到金屬矽 消失為止’約需進行2小時以上之熱處理,但依目的,可望 縮短熱處理之時間,藉由殘留金屬矽,可得到較高閉氣孔 率的氮化矽陶瓷。 在反應處理中,如圖3、4所示模式般,首先氮化金屬石夕 粉末之表面,進行反應處理時,氮化反應之際,有金屬向 外周之氮化物擴散、進行氮化反應、中空化之模樣,為 此’最終在有金屬矽粉末部分變成空孔,如此對金屬矽的 本紙張尺度適用中國國家標準(CNS) A4規格(2l〇x 297公釐)k 593209 A7 B7 V. INTRODUCTION OF THE INVENTION Add 0. The above shaped body is heat-treated in an atmosphere surrounded by a nitrogen-containing gas to form a specific grain boundary layer. When the nitriding reaction of metal silicon is performed, each metal silicon powder is hollow. At the same time, the adjacent metal silicon powder nitrides are integrated into the reaction, and fine porous silicon nitride ceramics with closed pores can be obtained. The heat treatment is to perform a pretreatment and a cavitation reaction in order to form a specific grain boundary phase. Stage 2 of the process. The pretreatment can be performed in a carbon heating furnace, and the above-mentioned formed body is at a temperature of 800 ° C or higher and less than 1,000. (: The heat treatment is performed for more than 1 hour at the temperature. The surrounding gas during the heat treatment is an envelope gas containing 20% by volume or more of an inert gas. In the previous treatment, Yb, Sm, or Er is represented by RE, and it is necessary to form RE1. () The grain boundary phase shown by N2 (Si〇4) 6 or RE4Si2N207. In the case where such a grain boundary phase is not formed, the cavitation in the silicon particles will not be promoted in the subsequent reaction treatment. The porous nitrogen of the present invention Siliconized ceramics are difficult to produce. Therefore, in order to form such a grain boundary phase, the composition of the sintering aid, the amount of oxygen in the raw material powder, or the heat treatment conditions are adjusted. When the temperature of the pretreatment is less than 80000, no formation occurs. The above grain boundary phase. At temperatures above 1000 ° C, because the above-mentioned grain boundary phase is not sufficiently formed, the nitridation reaction of metal silicon starts, and it is difficult to obtain the desired porous silicon nitride ceramic, especially the grain boundary phase. RE10N2 (SiO4) 6 is preferred. The reaction treatment of the second-stage heat treatment is performed in an aerosol surrounded by nitrogen or ammonia containing more than 1,000, and in a surrounding aerosol, also in nitrogen or ammonia. You can add helium and heat Although a carbon heating furnace can also be used, the hollow structure is promoted for the diffusion of the metal powder, and the growth of the particles is suppressed. 10- r. Η n η ο ^ This paper size applies the Chinese National Standard (CNS) Α4 specification (210 X 297 mm) 593209 A7 B7 5. Invention description disappeared, it is better to use microwave or millimeter wave heat treatment, especially when heating with microwave radiation at a frequency above 20GHz, the metal nitrogen formed in the shell of metal silicon powder The compound (ShN4) can promote the diffusion of the metal, and the cavitation in the metal powder becomes easier, so it is better. The reaction treatment temperature is preferably 1000 ° c or higher, and the nitriding reaction of the metal powder is less than 10000t. Slow down, no economical, heating with carbon heating furnace below 1500 ° C, microwave heating below 175 (rc is preferred, above this temperature will produce metamorphic phases or particles of metal nitrides For growth, it is difficult to obtain the porous ceramics of the present invention after the cavitation structure is changed. In addition, it is better to increase the temperature from the uppermost temperature to the most two temperatures in two or more stages. Here, the metal Nitriding reaction is due to exothermic reaction. When the temperature is raised to the final sintering temperature, the exothermic temperature will exceed the melting point of the metal, which will cause the metal to melt. When the metal is melted, it will become an unreacted melting block. It will cause coarse pores or melt out of the formed body, which will cause the mechanical and electrical characteristics of porous ceramics to deteriorate. At the same time, usually, silicon metal becomes completely silicon nitride, and it will be done until the silicon metal disappears. Heat treatment for more than 2 hours, but depending on the purpose, it can be expected to shorten the heat treatment time, and silicon nitride ceramics with higher closed porosity can be obtained by the residual metal silicon. In the reaction treatment, the pattern is shown in Figures 3 and 4. First, the surface of the metal stone powder is nitrided. When the reaction process is performed, during the nitriding reaction, the metal diffuses to the periphery of the nitride, performs the nitriding reaction, and cavitation. To this end, there is finally a metal silicon powder. Partially becomes a hole, so the Chinese paper standard (CNS) A4 (2l0x 297 mm) is applied to the paper size of metal silicon

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593209593209

外周部氮化物之擴散’在於形成上述特定粒界層之情形變 得特別顯著。中空化程度是依含在出發原料之金屬矽粉末 中的氧量,或燒結助劑之種類或熱處理方法而異,每個閉 氣孔的大小,在基本上,因是依出發原料之金屬矽粉末粒 度來決定大小,金屬矽粉末的粒徑若均勻的話,閉氣孔的 大小就變得均勻,不會含有粗大之閉氣孔。同時,熱處理 時包圍氣體之壓力並無限定,但以在1氣壓(1〇lkPa)以上, 5氣壓(507 kPa)以下為佳。 裝 訂The diffusion of nitride in the peripheral portion is particularly remarkable in the case where the specific grain boundary layer is formed. The degree of hollowing depends on the amount of oxygen contained in the metallic silicon powder of the starting material, or the type of sintering aid or the heat treatment method. The size of each closed pore is basically based on the metallic silicon powder of the starting material. The size is determined by the particle size. If the particle size of the metal silicon powder is uniform, the size of closed pores will become uniform, and no coarse closed pores will be contained. At the same time, the pressure of the surrounding gas during the heat treatment is not limited, but it is preferably at least 1 atmosphere (10 kPa) and at most 5 atmospheres (507 kPa). Binding

線 如以上所得本發明之多孔質陶瓷,是金屬矽粉末之每個 粒子藉由中空化,而成為均勻徑之空孔分散組織。為此, 其為耐吸濕性優、低介電率、低介電損失之多孔質氮化矽 陶瓷,相對密度不足70%,全氣孔中之閉氣孔比率變為 50%以上。再者,選擇原料金屬矽粉末之平均粒徑、表面 氧量、燒結助劑之種類、燒結條件,可以做成相對密度不 足5 0%,全氣孔中之閉氣孔比率變為9〇%以上。 本發明之多孔質氮化矽陶瓷之任意剖面中,如圖1所示 般,相鄰接空孔之半徑分別定為^、r2,陶瓷部之厚度定 為b,可以變成(rl + r2)/b>1之關係,總之可以選擇原料 金屬矽粉末之平均粒徑、表面氧量、燒結助劑之種類、燒 結條件,空孔之徑為與陶瓷之厚度相等以上,較佳為(^ + r2)/b > 2。如此之組織,介電損失可以更為降低。 又,做為本發明多孔質氮化矽陶瓷,所期望形態之介電 損失是在1〇-4程度以下。做為機械的特性,3點彎曲之抗折 強度是在200MPa以上,為有優異之電氣的、機械特性2多The porous ceramic of the present invention obtained as described above is a hollow-dispersed structure having a uniform diameter by hollowing out each particle of the metal silicon powder. For this reason, it is a porous silicon nitride ceramic with excellent hygroscopicity resistance, low dielectric constant, and low dielectric loss. The relative density is less than 70%, and the closed-cell ratio in all pores becomes more than 50%. Furthermore, by selecting the average particle diameter, surface oxygen content, type of sintering aid, and sintering conditions of the raw metal silicon powder, the relative density can be made less than 50%, and the closed-pore ratio in the entire pores becomes more than 90%. In any section of the porous silicon nitride ceramic according to the present invention, as shown in FIG. 1, the radius of adjacent voids is set to ^, r2, and the thickness of the ceramic portion is set to b, which can be changed to (rl + r2) / b > 1, in short, the average particle diameter of the raw metal silicon powder, the amount of surface oxygen, the type of sintering aid, and sintering conditions can be selected. The diameter of the pores is equal to or greater than the thickness of the ceramic, preferably (^ + r2) / b > 2. With such an organization, the dielectric loss can be further reduced. The porous silicon nitride ceramic according to the present invention has a dielectric loss of about 10-4 or less in a desired form. As a mechanical property, the flexural strength of 3-point bending is above 200MPa, which has excellent electrical and mechanical properties.

593209593209

孔質氮化矽陶瓷。 實施例1 準備平均粒徑為1 // 功n 之夕粉末與燒結助劑,平均粒徑為 0.8//m之Er203,相當於々 '矽粉末之0.8莫爾%。任一種粉末 都是市售品’又,準備石夕令、士 w y务末之表面氧量是,惰性氣體融 解以、.工外線;^出法測定,換算成训2預先確認有〇7莫爾 %者。將準備之各粉末溶解到乙醇中,以球混機混合24小 時’此時’做為氧化抑制劑者為添加4 Wt%之辛基三乙氧基 石夕院’混合後,自然乾燥,制乾式加壓,成形直徑 23mm、高度3mm與縱4.5mm、橫7賴、高度4 5舰大小 之成形體。 將此成形體在含有大氣壓3〇 v〇1%氬的氮氣包圍氣體中 (30 vol% Ar - 70 v〇l〇/。NO藉由頻率28GHz之微波加熱, 在95 C保持1小時。之後,將包圍氣體做成大氣壓之氮包圍 氣體後’以表1之條件進行反應處理,在此,12〇〇*3 + 1400*3者是表示在1200°C保持3小時後,昇溫到1400°C保 持3小時之意思,2階段昇溫的理由是聚矽酮之氮化反應, 在1400°(:中因是發熱反應(3丨+ 2/3 1^2=1/3 51以4 + 641^) 之故,一下子就昇溫到1400 °C時,由於本身發熱,溫度變 成在1400°C以上,矽等就會發生熔融。自然冷卻後,使用 直徑20mm、高度1mm以及縱3mm、橫4mm、高度40mm大 小之外周研削盤與平面研削盤進行最後加工,用最後加工 之燒結體,進行如其次般來測定各特性。同時,燒結體藉 由X線折射,確認得知金屬矽不殘留,全部變成Si3N4。Porous silicon nitride ceramic. Example 1 An Er203 powder and an sintering aid having an average particle diameter of 1 // work n and an average particle diameter of 0.8 // m are prepared, which is equivalent to 0.8 mol% of silicon powder. Any kind of powder is a commercial product. Also, the surface oxygen content of Shi Xiling and Shi wy at the end of preparation is: melting of inert gas, and outside line; measured by the method of conversion, converted to training 2 and confirmed in advance. Seoul%. The prepared powders were dissolved in ethanol, and mixed with a ball mixer for 24 hours. At this time, as the oxidation inhibitor, 4 Wt% of octyl triethoxy stone evening courtyard was added. After mixing, it was naturally dried to make a dry type. Pressed to form a shaped body with a diameter of 23mm, a height of 3mm and a height of 4.5mm, a width of 7mm, and a height of 45mm. This formed body was heated in a nitrogen-enclosed gas (30 vol% Ar-70 vol / l) containing 30 vol.% Of argon at atmospheric pressure. NO was heated by a microwave having a frequency of 28 GHz and maintained at 95 C for 1 hour. After that, After the surrounding gas is made into a nitrogen surrounding gas at atmospheric pressure, the reaction treatment is performed under the conditions shown in Table 1. Here, 12000 * 3 + 1400 * 3 means that the temperature is increased to 1400 ° C after being held at 1200 ° C for 3 hours. The meaning of maintaining for 3 hours, the reason for the temperature rise in 2 stages is the nitriding reaction of polysiloxane, at 1400 ° (: the reason is the exothermic reaction (3 丨 + 2/3 1 ^ 2 = 1/3 51 to 4 + 641 ^ ) When the temperature rises to 1400 ° C all of a sudden, due to its own heating, the temperature will rise above 1400 ° C, and silicon will melt. After natural cooling, use a diameter of 20mm, a height of 1mm, a length of 3mm, a width of 4mm, The peripheral grinding disc and the flat grinding disc are final processed outside the height of 40mm, and the characteristics are measured as follows using the final processed sintered body. At the same time, the sintered body was refracted by X-rays, and it was confirmed that metal silicon did not remain. Into Si3N4.

裝 訂Binding

λlambda

GG

-13- 本紙張尺度適用中國國家標準(CNS) Α4規格(210 X 297公釐) 593209 五、發明説明( A7 B7-13- The size of this paper applies to Chinese National Standard (CNS) A4 (210 X 297 mm) 593209 5. Description of the invention (A7 B7

全氣孔率是自燒結體之尺寸與重量算出外表密度,又理 論密度則是由燒結助劑之添加量混合法則來計算,依下式 求得, (卜外表密度/理論密度)X 100(%) 閉氣孔比率是由水銀孔度計,測定開氣孔容積,由下式 計算出。(全氣孔容積-開氣孔容積)/全氣孔容積X i 〇〇 (%) 相鄰之空孔半徑Γ1、Γ2及陶瓷部厚度b是,將燒結體切 斷,將斷面研磨後,以SEM觀察。由此SEM照片,用2次元 破疋空孔之中心點的重心位置點’如圖1所示般,連結任意 鄰接空孔中心點,測定空孔之半徑rl、r2及陶瓷部厚度b, 測定50個點之結果平均值在表1表示。 做為電氣特性,在30GHz之介電率及介電損失(tan5)依 JIS R 1627規定測定方法測定,此結果在表1表示。 表1The total porosity is the apparent density calculated from the size and weight of the sintered body, and the theoretical density is calculated from the mixing rule of the amount of sintering aid added. It is calculated according to the following formula: (Appearance density / theoretical density) X 100 (% ) The closed stomata ratio is measured by a mercury porosimeter and the open stomata volume is calculated by the following formula. (Total pore volume-Open pore volume) / Total pore volume X i 〇 (%) Adjacent void radii Γ1, Γ2, and thickness of ceramic part b are, the sintered body is cut, the cross section is ground, and SEM is used. Observed. Based on this SEM photograph, the center of gravity of the center point of the hollow hole was broken in two dimensions as shown in FIG. 1. The center points of adjacent adjacent holes were arbitrarily connected, and the radius rl, r2 of the hole and the thickness b of the ceramic part were measured. The average of the results at 50 points is shown in Table 1. As the electrical characteristics, the dielectric constant and dielectric loss (tan5) at 30 GHz were measured according to the measurement method specified in JIS R 1627. The results are shown in Table 1. Table 1

裝 訂Binding

No 燒結條件 全氣孔率 (%) 閉氣孔 比率(%) (rl + r2) /b 介電率 tan δ (ΧΙΟ·5) 1 1200 * 3 + 1400 * 3 80 92 2.43 2.1 12 2 1300 * 3 + 1500 * 3 80 90 2.40 2.1 7 3 1300 *3 + 1600 * 3 75 88 2.01 2.9 9 4 1300 * 3 + 1650 * 3 31 Ί 70 2.0 5 35 5* 1300 * 3 + 1700 * 3 28 51 1.4 6.8 90 6* 1300 * 3 + 1800 * 3 29 35 1.20 7.5 100 -14-No Sintering conditions Total porosity (%) Closed porosity (%) (rl + r2) / b Dielectric ratio tan δ (ΧΙΟ · 5) 1 1200 * 3 + 1400 * 3 80 92 2.43 2.1 12 2 1300 * 3 + 1500 * 3 80 90 2.40 2.1 7 3 1300 * 3 + 1600 * 3 75 88 2.01 2.9 9 4 1300 * 3 + 1650 * 3 31 Ί 70 2.0 5 35 5 * 1300 * 3 + 1700 * 3 28 51 1.4 6.8 90 6 * 1300 * 3 + 1800 * 3 29 35 1.20 7.5 100 -14-

0C032? ________ 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐) 593209 五、發明説明(12 *表示比較例 自表丨可知,本發明多孔質氮化梦是,氣孔率為3〇%以 上,即相對密度不滿70% ’閉氣孔之比率在5〇%以上,如 此做得之多孔質氮切m關定為電⑽性,尤其 介電損失特性優之n,又,燒結溫度為18G(rc之情形, 依粒子成長與相變態,中空化之結構為有變化、細緻^。 燒結溫度為1200t〜1650°C ’(rl +r2)/b之值在2以上,介 電損失是在12 X 1〇_5以下的優秀品。 實施例2 準備平均粒徑1/zm之矽粉末與做為燒結助劑,平均粒徑 〇.8//m之表2所述稀土類氧化物,相當於矽粉末之〇 8莫^ γ者。任一種粉末都是市售品,又,準備矽粉末表面氧量 是,惰性氣體融解,以紅外線檢出法測定,換算成以〇2預 先確認有0·7莫爾%者。將準備之各粉末以與實施例丨相同之 方法,進行混合、成形、熱處理。 之後,將包圍氣體做成大氣壓之氮包圍氣體後,昇溫到 1000°C保持3小時後,昇溫到^⑽它保持3小時,自然冷卻 後,與實施例1相同進行最後加工,各燒結體之全氣孔率、 閉氣孔率、”電率及介電損失以與實施例1相同方法進行測 定。又,做為機械特性者以JIS Rl601規定做成強度試驗片 形狀,3點彎曲強度以同規定為基準測定,此等測定結果在 表2中表示,同時,各燒結體是由χ線折射確認得知金屬矽 不殘留’全部變成Si3N4。 本紙張尺度適用中國國家標準(CNS) A4規格(21〇x 297公釐) 593209 A7 B7 五、發明説明( 表20C032? ________ This paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) 593209 5. Description of the invention (12 * indicates a comparative example from the table 丨 It can be seen that the porous nitriding dream of the present invention has a porosity of 3 〇% or more, that is, the relative density is less than 70%. The ratio of closed pores is more than 50%. The porous nitrogen cut m made in this way is defined as electrical resistance, especially the dielectric loss characteristic is excellent, and the sintering temperature. For the case of 18G (rc, depending on the particle growth and phase transition, the structure of the cavitation is changed and detailed ^. The sintering temperature is 1200t ~ 1650 ° C '(rl + r2) / b value is above 2, dielectric loss It is an excellent product below 12 X 10-5. Example 2 A silicon powder having an average particle diameter of 1 / zm and a rare earth oxide as described in Table 2 as an sintering aid with an average particle diameter of 0.8 // m are prepared. The amount of silicon powder is equivalent to 0.88 ^ γ of silicon powder. Any powder is a commercially available product, and the surface oxygen of the silicon powder is prepared by melting the inert gas and measuring with an infrared detection method. It is confirmed that there is 0.7 mole%. Each powder prepared is carried out in the same manner as in Example 丨. After that, the surrounding gas is made into a nitrogen surrounding gas at atmospheric pressure, and then the temperature is raised to 1000 ° C for 3 hours, and then the temperature is increased to ^ ⑽, and it is maintained for 3 hours. After natural cooling, the same as in Example 1 is performed. During processing, the total porosity, closed porosity, specific permittivity, and dielectric loss of each sintered body were measured in the same manner as in Example 1. Also, as a mechanical property, a shape of a strength test piece was prepared in accordance with JIS Rl601, 3 The point bending strength was measured based on the same regulations, and the results of these measurements are shown in Table 2. At the same time, each sintered body was confirmed by χ-ray refraction to know that the metal silicon does not remain 'all changed to Si3N4. This paper scale applies Chinese national standards ( CNS) A4 specification (21 × 297 mm) 593209 A7 B7 V. Description of the invention (Table 2

No 燒結助 劑種類 全氣孔 率(%) 閉氣孔 比率(%) (rl + r2)/b tan 5 (x 10'5) 介電率 抗折強 度(MPa) 7* La)〇i 58 10 0 120 4.5 40 8* Nd,〇i 59 20 0.54 110 4.2 TV/ 50 9 Sin^O^ 88 98 2.2 5 1.8_ 300 10 Er20^ 80 90 1.8 20 3.0 200 11* Gd20^ 65 45 1.2 70 4.1 190 12 Yl>2〇3 78 99 2.61 6 2.5 300 13* A120^ 28 2 0 320 6.8 60 14* Fe2〇3 38 <1 0 400 6.5 50 表示比較例 自表2可知,本發明添加燒結助劑所得燒結體是,氣孔率 為70%以上,即相對密度在30%以下,閉氣孔之比率在 5 0%以上,又介電損失與一向之多孔質陶瓷相比,低到2 X 1〇4,抗折強度為200MPa以上,有優異之電氣的、機械的 特性。 又,(rl +r2)/b之值雖在1以上,但選擇燒結助劑的話,2 以上即可變成空孔之直徑為陶瓷部厚度之2倍以上之多孔質 氮化矽陶瓷。空孔之直徑,例如在No 9之試料中,為 0 · 7 // m ’又’使用氦測定機,測定泄漏量時,泄漏量在n 〇 9之試料中,為8 X 1(T9 atm.cc/sec,No 10之試料,為7 X 1(T7、No 12之試料,為5 X 1(Τ9,判定有氣密封止效果。 CC0329 -16- 適用中國國家標準(CNS) Α4規格(210 X 297公釐y 五、發明説明(14 ) 實施例3 千m τ巧粒徑 0 8/ym^ VK η 物禾與做為燒結助劑,平均粒徑 之Yb2〇3相當於矽粉 市售品,X,準備石夕於古4 干饪種私末都疋 法測定,換算面之氧量是’如實施例1相同方 2相同之方法進Λ認有G.7莫爾%者。以與實施例 A 法進仃混合、成形、熱處理,最後加工。所得 粍結體之全氣孔率、閉氣 方法進行測定,結果如表3所^;^失以與實施例1相同 表3No Type of sintering additive Total porosity (%) Closed porosity ratio (%) (rl + r2) / b tan 5 (x 10'5) Dielectric flexural strength (MPa) 7 * La) 〇i 58 10 0 120 4.5 40 8 * Nd, 〇i 59 20 0.54 110 4.2 TV / 50 9 Sin ^ O ^ 88 98 2.2 5 1.8_ 300 10 Er20 ^ 80 90 1.8 20 3.0 200 11 * Gd20 ^ 65 45 1.2 70 4.1 190 12 Yl > 2〇3 78 99 2.61 6 2.5 300 13 * A120 ^ 28 2 0 320 6.8 60 14 * Fe2 0 3 38 < 1 0 400 6.5 50 shows a comparative example. As can be seen from Table 2, the sintered body obtained by adding a sintering aid according to the present invention Yes, the porosity is above 70%, that is, the relative density is below 30%, the ratio of closed pores is above 50%, and the dielectric loss is as low as 2 X 104 compared with the conventional porous ceramics. The strength is 200 MPa or more, and it has excellent electrical and mechanical characteristics. In addition, although the value of (rl + r2) / b is 1 or more, if a sintering aid is selected, 2 or more can become a porous silicon nitride ceramic having a diameter of pores that is twice or more the thickness of the ceramic portion. The diameter of the hole is, for example, 0 · 7 // m in the sample No. 9 when the helium measuring machine is used. When the leakage is measured, the leakage is 8 X 1 (T9 atm) in the sample of n 〇9. .cc / sec, No 10 sample is 7 X 1 (T7, No 12 sample is 5 X 1 (T9, it is judged to have air-tight effect. CC0329 -16- Applicable to China National Standard (CNS) Α4 specification ( 210 X 297 mm y V. Description of the invention (14) Example 3 Thousand m τ Smart particle size 0 8 / ym ^ VK η Wuhe is used as a sintering aid, and the average particle size of Yb203 is equivalent to the silicon powder market Sales, X, preparation Shi Xi Yugu 4 dry cooking seeds and private matter were measured by the method, the oxygen content of the conversion surface is' as in Example 1 the same way 2 the same method into G.7 Moire%. It was mixed, shaped, heat-treated, and finally processed with the method of Example A. The total porosity and air-closing method of the obtained concrete body were measured. The results are shown in Table 3;

自表3可知’燒結助劑之添加量為不滿〇2则1%,若超過 2·5ϊΠ〇1%時’可判定為閉氣孔之比率變低,介電損失變 大。總之’燒結助劑之添加量少時,梦粒子之中空化不能 充分進行,多時因粒子成長,閉氣孔之比率變少。 實施例4 準備平均粒徑0.8H’之各石夕粉末與做為燒結助劑平 均粒徑0.8鋒之Sm2〇3 ’相當於碎粉末〇為以者。各石夕 粉末表面之氧量是以如實施#u所述相同方法測定,結果From Table 3, it can be seen that 'the amount of the sintering additive added is less than 0% and then 1%, and if it exceeds 2.5%, it is determined that the ratio of closed pores becomes low and the dielectric loss becomes large. In short, when the amount of the sintering additive is small, the cavitation in the dream particles cannot be sufficiently progressed, and because the particles grow, the ratio of closed pores decreases. Example 4 Each stone powder having an average particle diameter of 0.8H 'and Sm2O3', which is an average particle diameter of 0.8 as a sintering aid, are prepared as the crushed powder. The amount of oxygen on the surface of each Shi Xi powder was measured by the same method as described in Implementation #u.

-17- 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐) 五、發明説明(15 ) (換异成31〇2)如表4所示,各粉末任—種都是市售品,使用 此等粉末1與實_2相同之方法,進行⑤合、成形熱 後加工。但N°22試料,在球磨混合時,添加氧化 P、、·…:各燒結體之全氣孔率、閉氣孔率以與實施W相同 方法進仃測疋’結果如表4所示。又,由X線折射來同定粒 界相也如表4所示。 表4-17- This paper size is in accordance with Chinese National Standard (CNS) A4 specification (210X 297mm) 5. Description of the invention (15) (change to 3120) As shown in Table 4, each powder For commercial products, using these powders 1 and _2, the same method is used to carry out ⑤combination and hot forming after processing. However, when the N ° 22 sample was mixed by ball milling, oxidized P,... Were added: the total porosity and closed porosity of each sintered body were measured in the same manner as in W. The results are shown in Table 4. Table 4 also shows the boundary grain phase with X-ray refraction. Table 4

No 粒徑 (/m) 表面氧量 (mol%) 全氣孔率 (%) 閉氣孔比 率(%) 粒界相 19* 10 --—^ 一 0.17 65 —---- 21 SmSiN02 20 4 0.5 82 92 SminN^CSiOA 21 1 0.9 72 99 SiruSi9N,〇7 22* 1 0.9 52 45 Sm2Si3N40^ 23* 0.8 3.0 40 10 Sm^Si^N^O^ * ^ i-U A* / . 表示比較例 比較使用相同原料之碎粉末Ng 21與Ng 22之試料時,No 22者因有添加氧化抑制劑之故’在ball miu(球磨)混合後 之金屬矽粉末的氧量增加到1.7mol%。此事由表4可以判 定’金屬發粉末之氧量為不足〇.2mol%或超過l.Omol% 時粒界相之組成與本發明目的之粒界相組成,因有不同 之組成’全氣孔率變少,閉氣孔比率變低,此等被認為是 因為粒界相組成不同,所以反應形態變得不同,不會促進 金屬石夕之中空化α CC9331 -18_ 本紙張尺度適财a s $:橾準(CNS) Α4規格(21Q χ 297公董) 593209 A7 B7 五、發明説明(16 ) 實施例5 準備與實施例1相同之矽粉末與Εγ2〇3粉末,使用此等粉 末,以與實施例1相同之方法,進行混合、成形。與實施例 1相同在950°C保持1小時後,成形體在大氣壓之氮氣包圍氣 雾下,以碳加熱器加熱,以表5條件燒結,同時,燒結條件 與實施例1所述相同,燒結體如實施例1進行最後裝飾加 工,各燒結體之全氣孔率、閉氣孔率、(rl +r2)/b之值及介 電損失以與實施例1相同方法進行測定,結果如表5所示。 又,(r 1 +r2)/b之值是測定50個地方之平均值。No Particle size (/ m) Surface oxygen content (mol%) Total porosity (%) Closed porosity ratio (%) Grain boundary phase 19 * 10 --- ^ 0.17 65 ------ 21 SmSiN02 20 4 0.5 82 92 SminN ^ CSiOA 21 1 0.9 72 99 SiruSi9N, 〇7 22 * 1 0.9 52 45 Sm2Si3N40 ^ 23 * 0.8 3.0 40 10 Sm ^ Si ^ N ^ O ^ * ^ iU A * /. It shows that the comparative example uses the same raw material. When crushed powders of Ng 21 and Ng 22 were tested, the oxygen content of metal silicon powder after mixing with ball miu (ball mill) was increased to 1.7 mol% due to the addition of an oxidation inhibitor. According to Table 4, it can be determined that when the oxygen content of the metal hair powder is less than 0.2 mol% or more than 1.0 mol%, the composition of the grain boundary phase and the composition of the grain boundary phase for the purpose of the present invention are different because of the different composition. Decreased, closed stomata ratio becomes lower. These are considered to be due to different grain boundary phase composition, so the reaction morphology becomes different, and will not promote cavitation in metal stones. CC9331 -18_ This paper is suitable as $ : as Standard (CNS) A4 specification (21Q χ 297 directors) 593209 A7 B7 V. Description of the invention (16) Example 5 The same silicon powder and Εγ203 powder as in Example 1 were prepared, and these powders were used in accordance with the examples. 1 The same method, mixing and molding. After holding at 950 ° C for 1 hour in the same manner as in Example 1, the formed body was heated under a carbon dioxide atmosphere at atmospheric pressure, heated with a carbon heater, and sintered under the conditions shown in Table 5. At the same time, the sintering conditions were the same as those described in Example 1. The final decoration process was performed as in Example 1. The total porosity, closed porosity, (rl + r2) / b value, and dielectric loss of each sintered body were measured in the same manner as in Example 1. The results are shown in Table 5. Show. The value of (r 1 + r2) / b is an average value measured at 50 places.

裝 表5 No 燒結條件 全氣孔率 (%) 閉氣孔比率 (%) (rl +r2)/b tan δ (χ ίο-5) 24 1300 * 3 + 1500 * 3 50 65 1.2 100 25 1000 * 3 + 1200 * 3 55 70 1.8 80 26* 1300 * 3 + 1800 * 3 15 30 0.54 160 *表示比較例 訂Table 5 No Sintering conditions Total porosity (%) Closed porosity ratio (%) (rl + r2) / b tan δ (χ ίο-5) 24 1300 * 3 + 1500 * 3 50 65 1.2 100 25 1000 * 3 + 1200 * 3 55 70 1.8 80 26 * 1300 * 3 + 1800 * 3 15 30 0.54 160 * indicates the comparison example

線 由表5可知,燒結溫度在1800°C之情形,由於粒成長與相 變態,中空化之結構起變化而緻密,又,表1與表5比較 時,可知由微波加熱的一方,閉氣孔比率變高,介電損失 變低。在此,微波之一方為效率佳,因可以加熱之故,被 認為對金屬矽之外殼(氮化矽)因藉由擴散反應而得以促進進 行。 發明之效果 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 593209 A7 B7 五、發明説明(17 ) 依本發明的話,與其他之材料相比,又與一向之方法相 比,可得閉氣孔比率高、且閉氣孔均勻分散之多孔質氮化 矽陶瓷,本發明的多孔質氮化矽陶瓷因閉氣孔比率高、電 氣的、機械的特性優,所以可以對應需要求耐濕性、低介 電率與低介電損失,又機械強度也有必要之電子電路基板 等使用,能發揮優異之特性。 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)It can be seen from Table 5 that when the sintering temperature is 1800 ° C, the structure of cavitation changes and becomes dense due to grain growth and phase transformation. In addition, when Table 1 and Table 5 are compared, it can be seen that the one heated by the microwave closes the pores. The higher the ratio, the lower the dielectric loss. Here, one of the microwaves is efficient, and because it can be heated, it is considered that the metal silicon case (silicon nitride) is promoted by a diffusion reaction. Effect of the invention The paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 593209 A7 B7 5. Description of the invention (17) According to the invention, compared with other materials, it is also consistent with the conventional method Ratio, a porous silicon nitride ceramic with a high closed pore ratio and uniformly dispersed closed pores can be obtained. The porous silicon nitride ceramic of the present invention has high closed pore ratio and excellent electrical and mechanical characteristics, so it can meet the requirements. Moisture resistance, low dielectric constant, low dielectric loss, and mechanical strength are also required for electronic circuit substrates, etc., which can exhibit excellent characteristics. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

Claims (1)

593209 第091103295號專利申請案92. 12.-藏 中文申請專利範圍替換本(92年月益 申請專利範圍 1. 一種多孔質氮化矽陶瓷,其特徵為: 相對密度不足70%,全氣孔中閉氣孔之比率為5〇%以上; 其任意斷面中,相鄰之2個空孔半徑rl、r2與陶瓷部之寬 度b之間,具有(rl + r2)/b〉丨之關係;且 含有REJizN^7或REiGN2(Si〇4)所示之氧氮化物或氧氮 化矽化合物結晶相,其中尺£為丫13、Sm*Er。 2· —種氮化矽陶瓷電路基板,其特徵為至少一部分之絕緣層 係包含如申請專利範圍第丨項所述之多孔質氮化矽陶瓷材 料。 3·種多孔質氮化矽陶瓷之製法,其特徵為將金屬矽粉末與 含有相當於金屬矽粉末0 2〜2 5 mol%之Yb、Sm或Er中 至少一種之化合物粉末,製作為成形體後,在含有氮氣之 包圍氣雾中進行熱處理。 4·如申請專利範圍第3項之多孔質氮化矽陶瓷之製法,其中 藉由以微波或毫米波照射下對上述成形體熱處理,而得包 含中空化氮化石夕陶瓷粒子之多孔質氮化矽陶瓷。593209 No. 091103295 Patent Application 92. 12.- Replacement of Tibetan patent application scope (Yueyi patent application scope in 1992 1. A porous silicon nitride ceramic, characterized by: relative density less than 70%, in all pores The ratio of closed pores is 50% or more; in any section, the radii rl, r2 of two adjacent pores and the width b of the ceramic portion have a relationship of (rl + r2) / b> 丨; and Contains the crystal phase of oxynitride or silicon oxynitride compound represented by REJizN ^ 7 or REiGN2 (Si〇4), where the rule is λ13, Sm * Er. 2 · —a silicon nitride ceramic circuit substrate, its characteristics The insulating layer, which is at least a part, includes the porous silicon nitride ceramic material as described in item 丨 of the patent application scope. 3. A method for producing porous silicon nitride ceramics, which is characterized in that a metal silicon powder and an equivalent metal are contained. Silicon powder 0 2 to 2 5 mol% of at least one of Yb, Sm, or Er compound powder, after forming into a shaped body, heat treatment in a surrounding aerosol containing nitrogen. 4. Porosity such as item 3 of the scope of patent application Of high quality silicon nitride ceramics by using microwave Or the above-mentioned molded body is heat-treated under millimeter wave irradiation to obtain a porous silicon nitride ceramic containing hollow ceramic nitride ceramic particles.
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