TW591325B - A photomask of the hypershot exposure mode and a monitoring method with the same - Google Patents

Abstract

A photomask of the hypershot exposure mode and a monitoring method with the same is provided. The photomask is for the hypershot exposure mode and used to form a panel pattern on a liquid crystal display. The photomasks are set a mark on the side of the target at the overlap. The marks are then showed on both side of the target after linkage the photomasks. After exposure and development, the distance between the definition edge of marks that exposed by using the photomasks of hypershot exposure mode is utilized to judge the overlapping condition of the photomasks.

Description

591325 V. Description of the invention (1) The present invention relates to a method for bonding and aligning photomasks used in an exposure process of a liquid crystal display (1 qu id crystal display, LCD for short), and in particular to a gradient light shielding plate ( Hypershot (HS) exposure mask and its detection method. Liquid crystal displays have the advantages of lightness, thinness, small size, low voltage drive, low power consumption, and wide application range. They are widely used in small and medium-sized portable TVs, mobile phones, camcorders, notebook computers, Seven-expense electronic or computer products such as desktop monitors and projection televisions will gradually replace CRTs as the mainstream of displays. The gradient light-shielding plate exposure method is often used in the exposure process of liquid crystal displays. Its characteristics are shown in Figures 1A to 1B. It is mainly used in the design of a photomask to connect the two The overlapping parts of the mask are designed in a gray scale pattern, so the overlapping parts of the two sides of the mask will have areas with the same pattern but different shading degrees to improve the bonding between the mask and the mask. 0 Figure 1A and 1 B Shown in the figure is a schematic diagram of a mask design of a conventional gradation light-shielding plate exposure method. Please refer to FIG. 1A and FIG. 1B. In order to expose the pattern of a panel, at least two photomasks 100 and 110 are used to form a complete panel. In the photomasks 100 and 110, there are overlapped portions 102 and 112, respectively, in which the patterns are the same but appear in a grayscale state. Then, when the two photomasks 丨 〇〇 and 丨 10 are combined, as shown in FIG. 1B, the overlapped portions 102 and 112 will overlap to form the same mask pattern in the same area 130, and their exposure energies will be complementary It becomes a region with 100% exposure energy.

591325 V. Description of the invention (2), f 2 ,, & The above-mentioned joining of the step-up light-shielding plate exposure method is only an ideal case a # 21-layer light-shielding plate exposure method is only used to blur the pattern of overlapping parts to make W: It is impossible to detect the actual bonding effect of ΐ: i, and it is also impossible to identify which of the many masks is in error. The purpose of the present invention is to provide a light-shielding method of a step-up light-shielding plate exposure method, which can effectively detect the degree of mask engagement in an exposure machine. € Another purpose of Ming is to provide a gradation mask exposure method and / or detection method to understand the performance of the product in real time. In light of the above and other objectives, the present invention proposes a gradation light-shielding exposure mask, which includes indicators in the overlapping parts of two and two-phase masks that are connected to each other. :: I consist of the same marking pattern, in which the marking pattern needs to be located on the side of the indicator near the center of the mask, in order to expose clearly marked marks. In addition, a method for registering a mask using a stepwise exposure method for light exposure is proposed, which is suitable for forming a panel pattern on a liquid crystal display panel by using a stepped light exposure method, including providing several photomasks. In addition, the marker patterns of the connected indicators are arranged on the indicator side in the t-t part of the mask, so that there are one marker pattern on each side of the light, and the mask can be respectively based on the two markers formed on the I-plate of the liquid crystal display. The distance between the edges should be clear to determine whether the mask joint is standard. In the present invention, since a mark pattern is provided on the index-side position of the mask in the mask position using the step-up light-shielding exposure method, when the mask is shifted:. 9830twf.ptd Page 6 591325 V. Description of the invention (3) '^ ___________ Based on the large gap between the two marks formed after exposure and development, to determine whether the joint alignment between the masks is misaligned [, ~ point offset Measure to understand the performance of the product in real time. In addition, when the joint is improved, it is not only possible to determine the left and right joint offset of the photomask: standard: self; the shape is the upper and lower joint offset of the rectangular mask. Here, the light, features, and advantages can be obtained at the same time and can be more clear and in conjunction with the accompanying drawings, in order to make the above and other objects of the present invention more understandable in detail, the preferred embodiments are described below as follows: Explanation of reference numerals: 100, 110, 200, 210: photomask, 112, 202, 212: overlapped portion '214: index 206, 206a, 216, 216a: marked figure 300: provided with the first overlapped portion A part of the photomask, and a mark pattern 3202 is set on the side of the index of the overlapping part near the center of the photomask: a second part of the photomask having an overlapping part and the index of the overlapping part is close to the center of the photomask. Another mark pattern 304 is set on one side: a substrate is exposed with the first part of the mask and the second part of the mask 306: development is performed to form a pattern of marks and indicators on the substrate ^ 308 ·· Follow The distance between the two marks exposed by the mask with the overlapping of the two parts / the clear edge of the two marks to determine whether the joining status is standard 4 0 〇: Mark left and right space 4 0 2: Mark up and down space

591325 V. Description of the invention (4) 404: Index Examples Figures 2A and 2B are schematic diagrams of a photomask according to a preferred embodiment of the present invention, which is a step-up light-shielding plate exposure method. Please refer to FIG. 2A and FIG. 2B. If the pattern of a liquid crystal display panel requires two photomasks to be exposed, design two photomasks 200 and 210 to expose the complete pattern of the panel, respectively. In the masks 200 and 210, there are overlapping portions 202 and 212, respectively. The mask patterns are the same but appear in a gray scale state. The outward exposure energy is lower, and the overlapping portions 202 and 212 have a cross shape. The targets are 204 and 214. In addition, a mark pattern 206 of the connected index 204 is arranged on the side of the index 204 near the center of the mask 200; and a mark pattern 21 of the connected index 2 1 4 is arranged on the side of the index 214 near the center of the mask 210, of which index 2 0 6 and 21 6 have the same shape and size, and in this embodiment, it is a rectangular mark, of course, it may also be a mark of other shapes. Then, when the two photomasks 2000 and 2 10 are exposed and developed respectively, the overlapping parts 2 02 and 21 2 will overlap into the same pattern in the same area, and the pattern exposed by the cross-shaped indicator 204 will also cross the cross. The patterns exposed by the type indicator 214 overlap each other, and the marker patterns 206 and 216 will expose the marks formed on both sides of the indicator. 77 When detecting the alignment of the stitching using the reticle of the gradient light-shielding exposure method described above, the steps are shown in FIG. 3. ° FIG. 3 > The schematic diagram of the steps of the mask bonding and alignment of the method of detecting the gradation and the light-shielding plate exposure method according to a preferred embodiment of the present invention. In step 300, a first portion of light having a coincident portion is provided.

591325

^ And at the index of the weight σ σ 卩 position, a bar is set near the center of the mask ### Next, in Qing 302, do you provide a superimposed site? The photomask is damaged, and a mark pattern is set on the side of the index of the overlapping area near the center of the photomask. Next, in step 304, a substrate is exposed by using the first partial light and the second partial mask. After that, in step 306, development is performed to form a mark on the substrate. The pattern of the indicator. Subsequently, in step 308, it is determined whether the joining condition is normal according to the distance between the clear edges of the two marks exposed by the two-part overlapping mask. Although only two photomasks are used in this embodiment, the number of photomasks constituting a liquid crystal display panel can be two or more. In addition, when the mark pattern is rectangular, not only can the photomasks be detected to be left and right. The amount of offset can also be obtained at the same time. The following figure is the pattern obtained after exposure and development. Fig. 4 shows the index and mark patterns formed on the substrate after the exposure and development of the mask according to the gradation mask exposure method shown in Figs. 2A and 2B, respectively. Please refer to FIG. 4. When the alignment of the masks 200 and 210 (see FIGS. 2A and 2B) is correct, the marks 206a and 216a formed on the substrate after exposure and development will be as shown in this figure. As shown, the markers 206a and 216a located on both sides of the indicator 404 are gradually shaded due to the overlapping portions 202 and 212 (see Figures 2A and 2B), so their peripheral edges are significantly closer to the center of the indicator 404. It is clear, so you can get the left and right pitches of the measuring side 400 and the top and bottom pitches of 402, so that the center point of the actual pitch is the same as the standard pitch center point. Otherwise, you will find

983 () tw [.ptd page 9 591325 591325 V. Redundant explanation (6) The center point will be different from the standard distance center point. As mentioned above, the features of the present invention include: The most important feature of photomasks using the gradient light-shielding exposure method is: = set the mark pattern, so when the photomask is biased, the distance between the two marks formed after the shoulder shadow of the second shadow of the second age and its center point is low. Is there any deviation in the alignment of the joints between the photomasks? The offset can be changed: Because the joints of the photomasks can be correctly detected, so when the joints are changed, the performance of the product can be understood immediately. 3, m The Ming mark is a rectangle or other clear-edge image. It can not only detect the offset offset of the left and right of the mask, but also the offset offset of the top and the bottom of the mask at the same time. However, it is not intended to be limited to the present invention. Any person skilled in the art can make various modifications and retouching without departing from the scope of the present invention. Therefore, the scope of the present invention should be regarded as the scope of patent application attached As defined "°

eXS30twf .ptd Page 10

591325 The diagram simply illustrates that the design of the mask shown in FIG. 1A and FIG. 1B is not familiar with a gradation light exposure method; FIG. 2A and FIG. 2B are according to one of the preferred embodiments of the present invention. A schematic view of a mask of a step-up light-shielding plate exposure method according to the embodiment; and FIG. 3 is a schematic diagram of the steps for detecting the alignment of the mask of the step-up light-shielding plate exposure method according to a preferred embodiment of the present invention; and FIG. 4 is an index and mark chart formed on a substrate after exposure and development of a photomask according to the gradation mask exposure method shown in FIGS. 2A and 2B.

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Claims (1)

591325 1. Patent application scope 1 · + —A kind of gradation light-shielding plate exposure method mask includes: a plurality of reticles, each of which has a coincident portion, wherein the exposure energy of the coincident portion is lower toward the outside, and It has an index; and a marking pattern, and the index set at the overlapped part is near the center of the photomasks. 2 · The mask of the gradation light-shielding plate exposure method described in item 1 of the scope of the patent application, wherein the mark pattern includes a rectangle. 3. The mask of the gradation light-shielding plate exposure method according to item 1 of the scope of patent application, wherein the index includes a cross shape. 4. A gradation mask exposure method mask comprising: a first partial mask including: a first overlapping portion, the lower the exposure energy of the smoke toward the outside, and having a first index; and A first mark pattern, a side of the first index disposed at the first overlapping portion near the center of the first partial mask; and a second partial mask for connecting with the first partial mask The mask pattern is joined to form a panel, wherein the second partial mask includes: a second overlapping part, the lower the exposure energy of which is toward the outside, and the first overlapping part and the first overlapping part have the same pattern 'And the second overlapping position has a second finger vote, wherein the second index is the same as the position of the first index after exposure; and 第 -th: mark map $, the second index is located at the second overlapping position The second index is near a side of the center of the second partial mask. Page 12 591325 6. Scope of patent application 5 · The mask of the gradation mask exposure method described in item 4 of the scope of patent application, wherein the first mark pattern and the second mark pattern include a rectangle. 6. The exposure of the gradation light-shielding plate as described in item 4 of the scope of patent application: cover ', wherein the first indicator and the second indicator include a cross shape. 7, 7 — A kind of mask joint pairing method for the exposure measuring method of the oblique-grading layer, which includes a plurality of photomasks for forming a panel pattern, wherein the photomasks each include an overlapping part, and The connected mask parts are produced in a stack, and there is an indicator on the overlapped part, and a marker pattern is set on the side of the overlapped part near the center of the masks. These photomasks separately expose a substrate; develop to form a plurality of marks on the substrate; and compare the center point of the pitch of the marks with the center point of the standard pitch to determine the joint alignment of the connected photomasks situation. 8 · The method for detecting the mask joint alignment of the stepwise light-shielding plate exposure method as described in item 7 of the scope of patent application, wherein the mark pattern includes a rectangle. 9 · The detection as described in item 7 of the scope of patent application The method of mask joint alignment of the step-up light-shielding plate exposure method, wherein the index includes a cross shape. Page 13