A7 B7A7 B7
經濟部智慧財產局員工消費合作社印製 587187 五、發明說明（） 發明領域： 本發明係有關於一種製造有機發光裝置之方法，例如 有機發光二極體（OLEDs)、多色顯示器及類似物，本發明 之多層結構具有提供第一電極層之基板層、第二電極層以 及至少一層位於基板層與第二電極層之間的發光有機材 料，本發明亦與一種有機發光二極體之結構有關。 發明背景： 有機發光二極體（OLEDs)是一種有潛力的顯示技術， 其可作為個別分離的顯示裝置，或是作為發光陣列或顯示 裝置（例如平面顯示器）的主動元件。在有機發光二極體的 堆疊中，有機層係被兩個電極所包夾。這些電極中的至少 一個必須為透明的以便使光（產生於有機堆疊之主動區域） 可透出。 有機發光二極體所發之光來自有機電激發光材料 (EL)。低效率的電激發光材料以金屬/有機物/金屬之結構 被發現已有多年，例如Pope等人於1 963年之Journal Chem. Phys.Vol.38的第2024頁所提出之報告，以及Helfrich等 人於 1 965 年之 Physical Review Letters, Vol.14，No.7 中第 229-23 1 頁之 ’’Recombination Radiation in Anthracene Crystal”。最近有兩篇高效率有機電激發光材料的報告發 展出來，其係C.W· Tang等人於1987年之Applied Physical Letters 中的 Vol.5 1，No· 1 2，第 9 1 3-9 1 5 頁之 ”Organic electroluminescent diodes"，以及劍橋大學 Burroughes 等 第4頁 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）""" " (請先閱讀背面之注意事項再填寫本頁)Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 587187 V. Description of invention () Field of the invention: The present invention relates to a method for manufacturing organic light-emitting devices, such as organic light-emitting diodes (OLEDs), multi-color displays, and the like. The multilayer structure of the present invention has a substrate layer that provides a first electrode layer, a second electrode layer, and at least one light-emitting organic material between the substrate layer and the second electrode layer. The present invention also relates to the structure of an organic light-emitting diode . BACKGROUND OF THE INVENTION Organic light-emitting diodes (OLEDs) are a promising display technology that can be used as individual display devices or as active components in light-emitting arrays or display devices such as flat-panel displays. In a stack of organic light emitting diodes, the organic layer is sandwiched by two electrodes. At least one of these electrodes must be transparent in order to allow light (generated in the active area of the organic stack) to pass through. Organic light-emitting diodes emit light from organic electroluminescent materials (EL). Low-efficiency electroluminescent materials have been found for many years as metal / organic / metal structures, such as the report presented by Pope et al., Journal Chem. Phys. Vol. 38, p. 2024, and Helfrich et al. "Recombination Radiation in Anthracene Crystal" in Physical Review Letters, Vol. 14, No. 7, pp. 229-23, 1 965. Recently, two reports on high-efficiency organic electro-excitation light materials have been developed. It is Vol. 5 1, No. 12 in Applied Physical Letters by CW · Tang et al. In 1987, “Organic electroluminescent diodes” on page 9 1 3-9 1 5 and Burroughes of Cambridge University on page 4 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) " " " " (Please read the precautions on the back before filling this page)
587187 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（） 人之團隊於1990之Nature，Vol· 347，第539-54 1頁之 ’’Light-emitting diodes based on conjugated p〇lymers”。其 中Tang等人以真空沉積分子染色化合物製造一種兩層之 有機發光裝置，且Burroughes使用旋塗覆蓋之ppv(I^ phenylenevinylene)，其係一種聚合物。 標準的有機發光二極體（OLED)包含一玻璃基板、一或 多層有機薄膜以及金屬上方接點，其中破璃基板上覆蓋有 一透明電極（通常為氧化銦錫物IT0)。這種二極體見於美 國專利第5,247，190號（Friend等人）、美國專利第4,356,429 號（Friend等人）以及Tang與Burroughes等人之前述文 章。 將這種二極體應用於顯示器時，需要外部電路驅動晶 片、複雜的連線及結合，若能將有機顯示器能整合於其提 供每一像素底部電極之驅動電路中，則此問題將不會存 在。因此，沉積於基板上之電極的結構係為單獨之金屬 墊，其定義出顯示器之像素的每一電極。欲實現這種企圖 的表面發光二極體結構已由Parker等人揭露於1 994年之 Appl.Phys.Lett.Vol.64，no· 1 4 之第 1 774-1 1 76 頁，或是 Burroughes 等人揭露於 1994 年之 App丨.Phys.Lett.Vol.65 ηο·21 之第 2636-2638 頁。 有機層係沉積於結構電極之上方且顯示器具有一共 用上方電極。在這種情況下，透明電極是必須的，因為具 有驅動電路之基板通常是不透明的。然而，沉積透明橫向 導體（TLC)會產生一些問題，特別是大面積之的有機發光 第5頁 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） --------訂·！ (請先閲讀背面之注意事項再填寫本頁) ΦΨ 經濟部智慧財產局員工消費合作社印製 587187 A7 B7 ---- 五、發明說明（） 二極體，其理由如下所述： 現今最熟知的透明橫向導體材料係前述的氧化銦錫 物（ITO)’且這種材料通常是錢鍵而成的。然而，相當具 有侵略性的濺鍍製程會損及底部之有機材料，甚至造成底 部電極的短路。 常用的透明橫向導體係金屬氧化物，在富含氧的環境 下蒸鍍適當的金屬，有機金屬可能會退化。 目前為止，尚未找到具高透光率及高導電率之替代性 的透明橫向導體材料。 有一種薄的半透明金屬電極（TME)，可用於這種大面 積顯示器中的小區域，但是對大區域而言，這種半透明金 屬電極之導電性不足以施加足夠的電流來點亮所有的像 素。位於顯示器中間部份的像素其薄金屬電極會發生極大 的壓降，而必須施加較高的電壓來達到同樣的亮度。若增 加此半透明金屬電極的厚度將會導致無法接受的光吸收 度而大幅地降低顯示裝置的發光效率。 因此，結合製造時不傷及發光區域、且能提供高度橫 向導電性及透明性之製程的裝置結構將是吾人想要的。 發明目的及概述： 本發明之目的係提供一種新穎的改良方法，用以製造 有機發光裝置、陣列以及以其為基礎之顯示器並避免前述 之缺點。 本發明之另一目的係提供一種發光區域具有均勻亮 第6頁 本紙張尺度適用中國國家標準(CNS)A4規格（210 X 297公* )： ' " (請先間讀背面之注意事項再填寫本頁)587187 Printed by the Consumer Property Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention () Nature's team in 1990, Vol. 347, 539-54, page 1 `` Light-emitting diodes based on conjugated p〇lymers "Among them, Tang et al. Used vacuum deposition of molecularly dyed compounds to make a two-layer organic light-emitting device, and Burroughes uses spin-coated pPV (I ^ phenylenevinylene), which is a polymer. Standard organic light-emitting diodes (OLED ) Includes a glass substrate, one or more organic thin films, and contacts above the metal, wherein the broken glass substrate is covered with a transparent electrode (usually indium tin oxide IT0). Such a diode is found in US Patent No. 5,247,190 ( Friend et al.), U.S. Patent No. 4,356,429 (Friend et al.), And the aforementioned articles by Tang and Burroughes et al. Applying such a diode to a display requires an external circuit drive chip, complex wiring, and bonding. If the organic display can be integrated into the driving circuit that provides the bottom electrode of each pixel, this problem will not exist. Therefore, the deposition The structure of the electrodes on the substrate is a separate metal pad, which defines each electrode of the pixels of the display. The surface-emitting diode structure to achieve this attempt has been disclosed by Parker et al., Appl. Phys, 1994 .Lett.Vol.64, no. 1 of pp. 1 774-1 1 76, or Burroughes et al., Disclosed in 1994 App 丨. Phys. Lett. Vol. 65 ηο · 21 pp. 2636-2638 The organic layer is deposited over the structure electrode and the display has a common upper electrode. In this case, a transparent electrode is necessary because the substrate with the drive circuit is usually opaque. However, a transparent lateral conductor (TLC) is deposited There will be some problems, especially for large areas of organic light emission. Page 5 The paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) -------- Order ·! (Please read first Note on the back, please fill out this page) ΦΨ Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 587187 A7 B7 ---- 5. Description of the invention () Diode, the reason is as follows: The most well-known transparent transverse conductor today Material is the aforementioned oxidation Indium tin (ITO) 'and this material is usually made of money bonds. However, the rather aggressive sputtering process can damage the organic materials on the bottom and even cause short circuits on the bottom electrodes. Common transparent lateral conduction systems Metal oxides. Organic metals may be degraded by depositing appropriate metals in an oxygen-rich environment. So far, no alternative transparent lateral conductor material with high light transmittance and high electrical conductivity has been found. There is a thin translucent metal electrode (TME) that can be used for small areas in such large area displays, but for large areas, this translucent metal electrode is not conductive enough to apply enough current to light all Pixels. The thin metal electrodes of the pixels located in the middle of the display will have a large voltage drop, and a higher voltage must be applied to achieve the same brightness. Increasing the thickness of this translucent metal electrode will result in unacceptable light absorption and greatly reduce the luminous efficiency of the display device. Therefore, a device structure combining a manufacturing process that does not damage the light-emitting area and can provide high lateral conductivity and transparency will be what I want. OBJECTS AND SUMMARY OF THE INVENTION The object of the present invention is to provide a novel and improved method for manufacturing organic light-emitting devices, arrays, and displays based thereon and avoiding the aforementioned disadvantages. Another object of the present invention is to provide a light-emitting area with uniform brightness. Page 6 The paper size is applicable to China National Standard (CNS) A4 (210 X 297 male *): '" (Please read the precautions on the back first. (Fill in this page)
587187 A7 B7 五、發明說明（ 度、壽命期長且製程費用低廉的有機發光裝置。 (請先閱讀背面之注意事項再填寫本頁) 本發明之上述目的已藉由提供一種製造多層結構之 有機發光裝置的方法達成之，該有機發光裝置包含一提供 第一電極層之基板層、一第二電極層以及至少一層的發光 有機材料層，且該發光有機材料層係位於該第一電極層與 該第二電極層之間。根據本發明，該第二電極層至少包含 兩層分離之膜層’其係半透明金屬電極層（丁me)以及透光 橫向導體層（TLC)，該半透明金屬電極層係沉積於該發光 有機材料層之上，接著至少一層不發光之保護性透光層沉 積於該半透明金屬電極層之上，用以避免後續沉積之透光 導體層（作為該透光橫向導體層TLC)的影響。該保護層必 須能使發光有機材料層及半透明金屬電極層（tme)不受沉 積製程（例如在含氧環境下濺鍍或是蒸鍍IT〇)所伴隨之侵 蝕效應的影響。 經濟部智慧財產局員工消费合作社印製 適用於保護層的材料通常為透明絕緣材料或是半導 月豆材料，例如氮化鎵、氮化鋁、氮化矽、其他氮化物或是 氟化鈣、氟化鎂’其他氟化物及光阻或是環氧樹脂。除了 以銦錫氧化物作為透明橫向導體層（TLC)之外，亦可使用 氮化銦鎵、氧化銦或是其他透明導電金屬氧化物。 本發明提供一種保護層以製造大面積之有機多色顯 示器發光表面的方法，其概述如下： 以上述之結構沉積第一電極層係於基板之表面，以形 成定義出多個發光像素之電極塾。沉積一有機材料層的堆 番於該第一電極層以覆蓋該電極墊及基板未被覆蓋之區 587187 A7 B7 >儿積一導體材料於該有機材料層之上表面， 五、發明說明（ 的半透明金屬電極（TME)。該膜層係作為對有機材如〜薄 上方載子注入接點，並且對像素僅施加電流。料層之 在有機材料層之上方，均勻地沉積第一保護 整個表面，該第一電極層係由氮化鎵、氮化鋁、氮化覆蓋 其他氮化物或是氟㈣、氟化鍰，及其他氟化物所：: 的。在該第一保護層及該半透明金屬電極層之上方，、成 沉積一第二保護層’該第二保護層係由光阻：： 或是環氧樹脂所製成的，且適用於微影製程或是其它米成 圖案的方法。發光區域係由第一電極層之電極墊的面積所 定義，位於像素之間的空隙僅被該第一保護層所覆蓋。 在後續濺鍍或是蒸鍍透明橫向導體層（例如由ΙΤ〇所 製成）的步驟中，該發光區域或是像素區域係被第—及第 二保護層該所覆蓋及保護。如此，透明橫向導體層必須與 半透明金屬電極層形成接觸，換言之，第一保護層必須為 導體’或是透明橫向導體層的製程必須能夠穿透該第一保 護層以使其與半透明金屬電極之接觸發生。 藉此’可沉積一對主動有機層無損傷之高透明度的上 方電極。透明橫向導體層可藉由像素間之空隙與發光像素 區域形成電性接觸，在該處TLC與該半透明金屬電極形成 接觸。藉由本製程可製造大面積之顯示器，因為半透明金 屬電極具有高度的透明度，且具有足夠的厚度以供給每一 像素足夠的電流。高電流密度發生於厚的透明橫向導體 第8頁 表紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） --------訂---------ΦΑΧ. (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消费合作社印製 587187 A7 B7 五、發明說明（） 層，其供給整個顯示器的電流 圖丈簡蕈說明 第1圖係一有機顯示器之像素的剖面 第2圖數個像素所成陣列之平面圖。 圖號對照說明： 1 第一電極層 3 發光有機材料 5 第一保護層 7 透明橫向導體 9 發光區域 2 4 6 8 基板 半透明金屬電極 第二保護層 發光區域中的區域 經濟部智慧財產局員工消费合作社印製 發明詳細說明： 第1圖係顯示一有機顯示器之像素的剖面範伊卜該有 機顯π器之像素係由一作為陰極之金屬製電極墊丨所定 義。 該電極墊1係整合於基板2之表面中且與整體之驅動 電路（未顯示）連接。一種有機層3的堆疊接著沉積於該基 板2之上方並覆蓋該電極墊丨，最後再覆蓋—厚之鈣 層（以導體金屬層4表示之或是稱為半透明金屬電極 TME)。沉積一厚度20 run之氮化鎵（(}_層5以避免該鈣 層4之氧化以及不受後續沉積之第二保護層的影響。 一光阻層6旋塗於該氮化鎵層5之上，所以面積大於 第9頁 -.«1 n ϋ -ϋ ϋ ϋ n^"J· ϋ n n 1 ϋ a— n I . (請先閱讀背面之注意事項再填寫本頁) A7587187 A7 B7 V. Description of the invention (organic light-emitting device with long life span and low manufacturing cost. (Please read the precautions on the back before filling out this page) The above purpose of the present invention has been to provide an organic multilayer structure The method for a light-emitting device is achieved. The organic light-emitting device includes a substrate layer that provides a first electrode layer, a second electrode layer, and at least one light-emitting organic material layer. The light-emitting organic material layer is located between the first electrode layer and the first electrode layer. Between the second electrode layer. According to the present invention, the second electrode layer includes at least two separated film layers, which are a translucent metal electrode layer (Me) and a translucent transversal conductor layer (TLC), the translucent A metal electrode layer is deposited on the light-emitting organic material layer, and then at least one non-light-emitting protective light-transmitting layer is deposited on the translucent metal electrode layer to avoid the subsequent deposition of a light-transmitting conductive layer (as the transparent Light lateral conductor layer TLC). The protective layer must be able to protect the light-emitting organic material layer and the translucent metal electrode layer (tme) from the deposition process (for example, in oxygen containing The effect of erosion caused by sputtering or vapor deposition in the environment. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The material suitable for the protective layer is usually a transparent insulating material or a semiconducting moon bean material, such as nitrogen. Gallium nitride, aluminum nitride, silicon nitride, other nitrides or calcium fluoride, magnesium fluoride 'other fluorides and photoresist or epoxy resin. Except for indium tin oxide as the transparent lateral conductor layer (TLC) In addition, indium gallium nitride, indium oxide, or other transparent conductive metal oxides can also be used. The present invention provides a method for manufacturing a light-emitting surface of a large-area organic multicolor display with a protective layer, which is summarized as follows: With the above structure A first electrode layer is deposited on the surface of the substrate to form an electrode 定义 defining a plurality of light-emitting pixels. A stack of an organic material layer is deposited on the first electrode layer to cover the electrode pad and the uncovered area of the substrate 587187 A7 B7 > A conductive material is deposited on the top surface of the organic material layer. 5. Description of the invention (Translucent metal electrode (TME). The film layer is used as a thin film for organic materials such as ~ Contacts are injected and current is only applied to the pixels. Above the organic material layer, a first protective layer is uniformly deposited on the material layer, and the first electrode layer is covered with other nitrides by gallium nitride, aluminum nitride, and nitride. Or fluorine fluoride, thorium fluoride, and other fluorides:: on top of the first protective layer and the translucent metal electrode layer, a second protective layer is deposited, the second protective layer system Photoresist :: It is made of epoxy resin, and is suitable for photolithography or other methods of patterning. The light-emitting area is defined by the area of the electrode pads of the first electrode layer and is located between the pixels. The gap is covered only by the first protective layer. In the subsequent sputtering or evaporation step of the transparent lateral conductor layer (for example, made of ITO), the light-emitting area or the pixel area is first- and second- The second protective layer is covered and protected. In this way, the transparent lateral conductor layer must be in contact with the translucent metal electrode layer. In other words, the first protective layer must be a conductor, or the process of the transparent lateral conductor layer must be able to penetrate the first protective layer to make it contact with the translucent metal. Electrode contact occurs. With this, a pair of upper electrodes with high transparency without damage to the active organic layer can be deposited. The transparent lateral conductor layer can be in electrical contact with the light-emitting pixel region through the gap between the pixels, where the TLC makes contact with the translucent metal electrode. Large-area displays can be manufactured by this process because translucent metal electrodes have a high degree of transparency and have a sufficient thickness to supply sufficient current to each pixel. High current density occurs in thick transparent transverse conductors. The paper size on page 8 applies to China National Standard (CNS) A4 (210 X 297 mm). -------- Order --------- ΦΑχ. (Please read the precautions on the back before filling this page) Printed by the Intellectual Property Bureau Employee Consumer Cooperative of the Ministry of Economic Affairs 587187 A7 B7 V. Description of the invention () layer, its current supply to the entire display It is a cross section of a pixel of an organic display. FIG. 2 is a plan view of an array of a plurality of pixels. Comparative description of drawing numbers: 1 First electrode layer 3 Luminous organic material 5 First protective layer 7 Transparent transverse conductor 9 Light emitting area 2 4 6 8 Substrate transparent metal electrode Substrate Protective area Intellectual property bureau employee of the Ministry of Economic Affairs Detailed description of the invention printed by the Consumer Cooperative: Figure 1 shows a cross section of a pixel of an organic display. Fan Yib The pixel of the organic display is defined by a metal electrode pad as a cathode. The electrode pad 1 is integrated in the surface of the substrate 2 and is connected to a whole driving circuit (not shown). A stack of organic layers 3 is then deposited over the substrate 2 and covers the electrode pads, and finally covered with a thick calcium layer (represented by the conductive metal layer 4 or referred to as a translucent metal electrode TME). A gallium nitride ((} _ layer 5) with a thickness of 20 run is deposited to avoid oxidation of the calcium layer 4 and not to be affected by a second protective layer deposited later. A photoresist layer 6 is spin-coated on the gallium nitride layer 5 Above, so the area is larger than page 9-. «1 n ϋ -ϋ ϋ ϋ n ^ " J · ϋ nn 1 ϋ a— n I. (Please read the precautions on the back before filling this page) A7
587187 五、發明說明（） 陰極電極墊1所定義之區域仍會留在光阻層6之上。該薄 的透明光阻6可避免在後續ITO濺鍍過程（形成IT〇層7) 中發光區域的電漿擊傷。在未被光阻6覆蓋之區域8處， 濺鍍步驟之離子可穿過薄的氮化鎵層5, aIT〇層7可與 躬層4形成接觸。 在第2圖所示之許多像素陣列的平面中，可以清楚地 看到分離之像素的配置。每個像素的尺寸是由電極塾丨所 在的區域所定義的，其即為發光區域9。發光區域9被第 二保護層所層疊，例如光阻層6。在介於像素中的區域8 中’該ITO層7(或稱為透明橫向導體）係與薄金屬電極$ 形成電性連結。 為顧及第一、第二保護層及透明橫向導體的特性規 格，必須滿足下列要求： 該第一保護層係由高透明度、高導電性或絕緣性之材 料所製成的。在絕緣材料垂直於膜層表面的情況下，必須 選擇透明橫向導體的沉積製程以便使透明橫向導體可與 該半透明金屬電極（TME)形成接觸。例如濺鍍法。可用的 材料係氮化鎵、氮化鋁、氮化矽、其他氮化物以及氟化鈣、 氟化鐵或是其他氟化物。 唯一關於沉積第一保護層於半透明金屬電極之上的 要求係避免傷及該半透明金屬電極或是底層的有機層。適 當的沉積技術係電漿輔助分子束沉積法、熱蒸鍍法以及化 學氣相沉積法等等。 第二保護層的材料包含高透明度且易於圖案化之材 第10頁 本紙張尺度適財國國冢標準（CNS)A4規格⑽χ 297公着了 (請先閱讀背面之注意事項再填寫本頁)587187 V. Description of the invention () The area defined by the cathode electrode pad 1 will remain on the photoresist layer 6. This thin transparent photoresist 6 can avoid plasma damage in the light emitting area during the subsequent ITO sputtering process (formation of the IT0 layer 7). At the area 8 not covered by the photoresist 6, the ions in the sputtering step can pass through the thin gallium nitride layer 5, and the aIT0 layer 7 can make contact with the bow layer 4. In the plane of many pixel arrays shown in Figure 2, the arrangement of the separated pixels can be clearly seen. The size of each pixel is defined by the area where the electrode 塾 is located, which is the light emitting area 9. The light emitting region 9 is laminated with a second protective layer, such as a photoresist layer 6. In the region 8 between the pixels, the ITO layer 7 (also referred to as a transparent lateral conductor) is electrically connected to a thin metal electrode. In order to take into account the characteristics of the first and second protective layers and transparent lateral conductors, the following requirements must be met: The first protective layer is made of a material with high transparency, high conductivity or insulation. In the case where the insulating material is perpendicular to the surface of the film layer, the deposition process of the transparent lateral conductor must be selected so that the transparent lateral conductor can be brought into contact with the translucent metal electrode (TME). For example, sputtering. Available materials are gallium nitride, aluminum nitride, silicon nitride, other nitrides, and calcium fluoride, iron fluoride, or other fluorides. The only requirement for depositing the first protective layer on the translucent metal electrode is to avoid damaging the translucent metal electrode or the underlying organic layer. Appropriate deposition techniques include plasma-assisted molecular beam deposition, thermal evaporation, and chemical vapor deposition. The material of the second protective layer includes a material with high transparency and easy patterning. Page 10 This paper is published in JIS 297 (CNS) A4 specification (Please read the precautions on the back before filling out this page)
經濟部智慧財產局員工消f合作社印製 587187 A7 五、發明說明（ 料，如光阻或是環氧樹脂材料。適當的製程係旋塗法、喷 塗法、濕浸法等等。亦可使用具有匹配之折射係、數且類似 鏡面可增強光輸出之材料。 透月橫向導月Λ (TLC)的材料必須具有高透明度及高導 電性’如氧化銦錫物、氮化嫁銦'氮化欽、氧化銦等等 其沉積製程不可傷及位於第二保護看底部的有機材 係由底部電極所定義且被第二保護層所覆蓋。適當的製程 方法係濺鍍法及蒸鍍法。 & ----.—«_—；—--------訂--------- (請先閱讀背面之注意事項再填寫本頁} 用 適 度 尺 張 紙 _本 經濟部智慧財產局員工消費合作社印製 國 中Employees of the Intellectual Property Bureau of the Ministry of Economic Affairs printed 587187 A7 Fifth, the description of the invention (materials, such as photoresist or epoxy materials. Appropriate processes are spin coating, spraying, wet dipping and so on. Use a material with a matching refractive index, number, and mirror-like surface to enhance light output. The material for translucent lateral transmissive moon Λ (TLC) must have high transparency and high conductivity, such as indium tin oxide, indium nitride, and nitrogen. The deposition process of Huaqin, indium oxide, etc. must not hurt the organic material located at the bottom of the second protective view. The organic material is defined by the bottom electrode and covered by the second protective layer. The appropriate process methods are sputtering and evaporation. & ----.— «_—; --------- Order --------- (Please read the notes on the back before filling this page} Use a moderate rule of paper_ Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs