TW576851B - Composition for forming film used for light diffusing-reflective substrate, light diffuse-reflective substrate and preparation method thereof, and liquid crystal display - Google Patents

Composition for forming film used for light diffusing-reflective substrate, light diffuse-reflective substrate and preparation method thereof, and liquid crystal display Download PDF

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TW576851B
TW576851B TW090111361A TW90111361A TW576851B TW 576851 B TW576851 B TW 576851B TW 090111361 A TW090111361 A TW 090111361A TW 90111361 A TW90111361 A TW 90111361A TW 576851 B TW576851 B TW 576851B
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Yuichi Takehata
Masashige Takatori
Natsuki Yamazaki
Yoshitaka Yamada
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Jsr Corp
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254After-treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/50Multilayers
    • B05D7/52Two layers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0268Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Liquid Crystal (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)

Abstract

A composition for forming film used for light diffusing-reflective substrate, characterized in that it contains [A] a copolymer of (a1) an unsaturated carboxylic acid and/or its anhydride, (a2) an epoxy-containing unsaturated compound and (a3) an olefinically unsaturated compound other than the monomers (a1) and (a2) and [B] particles, wherein [B] is present in an amount of 60 to 300 parts by weight per 100 parts by weight of [A].

Description

576851 經濟部智慧財產局員工消費合作社印製 A7 ______ B7 __五、發明説明(1 ) 【發明所屬之技術領域】 本發明係有關液晶顯示元件等所用之光擴散反射板之 膜形成用組成物、具有由該組成物所形成之膜的光擴散反 射板、及具有此光擴散反射板之液晶顯示元件。 【以往技術】 由於液晶顯示器需要均勻且正面輝度高之表面照明, 因此以往一向以具備後照光單元者爲主流。然而近年來受 到攜帶式終端機普及化等影響,由省電之觀點而採用半透 過型及反射形液晶顯示器者大爲增加。 半透過型及反射形液晶顯示器係於液晶面板下方設置 鋁板等反射板,藉由反射來自面板上部之光而獲得輝度。 .但使用該方法時,因反射板係平面,因此當來自面板上部 入射光之入射方向傾斜時,反射光之方向偏離面板之正面 方向,而不能獲得充分之正面輝度。 已揭示有爲了改善半透過型及反射形液晶顯示器之上 述缺點,而使用所謂光擴散板之技術。該方法係藉由在反 射板表面附加微細之凹凸形狀,使反射光之方向擴散,而 爲可得正面輝度之物。 例如日本特開2 0 0 0 - 1 1 1 8 8 6號公報所揭 示,於玻璃基板經由化學鈾刻而粗面化之表面上形成金屬 膜,而在反射板表面上賦予凹凸形狀之技術。依據該方 法,不僅爲了保護玻璃基板內面不受蝕刻液之侵蝕需要繁 雜之步驟,而且由於使用腐蝕性之蝕刻液而在裝置上、製 本紙張尺度適用中國國家標隼(CNS ) A4規格(2!0X297公釐) TaI " (請先閲讀背面之注意事項再填寫本頁) 576851 A7 B7 五、發明説明(2 ) 程上有成本方面之問題。 (請先閲讀背面之注意事項再填寫本頁) 又,曰本特開2000 — 193807號公報中揭 示,將含有氟化合物及烷氧矽烷之加水分解物之溶液狀組 成物塗佈於基板上,利用作成塗膜之際之相分離而製作具 有凹凸形狀之膜,而於其上形成金屬膜之技術。該方法對 凹凸形狀之控制不易而難以有效率的獲得擴散光’又’不 僅與基板之黏合性變差,透明性亦不足,因此並非能使用 於半透過型液晶顯示元件之物。 本發明係有鑑於上述情況其目的係提供用於光擴散反 射板具有粗面,且與基板之黏合性、耐熱性、透明性優 越,而容易形成反射形或半透過型之液晶顯示元件之用於 光擴散反射板之膜的組成物。 本發明之另一目的係提供具有由上述組成物所形成之 膜,而光擴散機能優越之光擴散反射板。 本發明之另一目的係提供具有上述光擴散反射板,且 持有充分之正面輝度的半透過型及反射形之液晶顯示元 件。 經濟部智慧財產局員工消費合作社印製 【解決問題之方法】 依據本發明,本發明之問題可藉由下列之任一方法達 成。 〔1〕用於光擴散反射板之膜形成用組成物,其特徵 爲含有〔A〕 (a 1)不飽和羧酸及/或不飽和羧酸酐、 (a2)含有環氧基之不飽和化合物、(a3)上述單體 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -5- 576851 A7 _ _ B7 _ 五、發明説明(3 ) (請先閱讀背面之注意事項再填寫本頁) (a 1 )及(a 2 )以外之烯烴系不飽和化合物之共聚物 以及〔B〕粒子,而〔B〕成分之含有量對每1 〇 〇重纛 份〔A〕成分爲60重量份以上300重量份以下。. 〔2〕如〔1〕中記載之組成物,其中之〔B〕粒子 爲無機氧化物粒子、有機粒子或礦物粒子者。 〔3〕如〔1〕中記載之組成物,係另含有多官能單 體〔C〕及聚合起始劑〔D〕,而〔C〕成分之含有量對 每100重量份〔A〕成分爲10_20重量份,〔D〕 成分之含有量對每1 00重量份〔C〕成分爲〇 . 〇 1 -6 0重量份者。 〔4〕如〔3〕中記載之組成物,其中之聚合起始劑 〔D〕係放射線感應性自由基聚合起始劑者。 〔5〕如〔3〕中記載之組成物,其中之聚合起始劑 〔D〕係熱感應自由基聚合起始劑,其含有量對每1〇 〇 重量份〔C〕成分爲0 · 0 1 — 40重量份者。 經濟部智慧財產局員工消費合作社印製 〔6〕如〔1〕中記載之組成物,係另含有〔A〕成 分以外之環氧化合物〔E〕以及酸發生劑〔F〕,〔 A〕 成分以外之環氧化合物〔E〕之含有量對每1 〇 〇重量份 〔A〕成分爲1 一 2 50重量份,酸發生劑〔F〕之含有 量對每100重量份〔E〕成分爲0 · 〇5 - 20重量份 者。 〔7〕如〔6〕中記載之組成物,其中之酸發生劑〔 F〕係放射線感應性酸發生劑者。 〔8〕如〔6〕中記載之組成物,其中之酸發生劑〔 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 7〇1 ~ 576851 A7 B7 五、發明説明(4 ) p〕係熱感應性酸發生劑者。 〔9〕如〔1〕中記載之組成物,係對每1 〇 〇重量 (請先閲讀背面之注意事項再填寫本頁) 份〔A〕另含有〇 · 〇5 — 20重量份酸發生劑〔f〕 者。 〔1 0〕如〔9〕中記載之組成物,其中之酸發生劑 [F〕係放射線感應性酸發生劑者。 〔1 1〕如〔9〕中記載之組成物,其中之酸發生劑 〔F〕係熱感應性酸發生劑者。 〔1 2〕光擴散反射板之製造方法其特徵係包括下列 步驟: (1 )於基體之表面形成〔4〕、〔 7〕及〔1 0〕項中 任一項之組成物之塗膜、 (2 )以放射線照射該塗膜表面至少一部份之步驟、 (3 )於以上形成之膜之表面形成金屬膜之步驟。 〔1 3〕光擴散反射板之製造方法其特徵係包括下列 步驟: (1)於基體之表面形成第〔5〕 、 〔8〕及〔11〕項 經濟部智慧財產局員工消費合作社印製 中任一項之組成物之塗膜、 (2 )將該塗膜加熱之步驟、 (3)於以上形成之膜之表面形成金屬膜之步驟。 〔1 4〕光擴散反射板係具有由〔1〕中記載之組成 物所形成之膜的。 〔1 5〕液晶顯示元件,係具有〔1 4〕中記載之光 擴散反射板者。 本紙張尺度適用中國國家標準(CNS ) A4規格(210x297公釐) -7 - 576851 A7 B7 五、發明説明(5 ) (請先閱讀背面之注意事項再填寫本頁) 又,於本發明中,所使用「放射線」一詞係包括紫外 線、遠紫外線、X射線、電子線、分子線、y線、同步加 速輻射線、質子束射線等。 下文詳細說明有關用於光擴散反射板之膜形成用組成 物。 本發明用於光擴散反射板之膜形成用組成物,其特徵 爲含有〔A〕 (a 1)不飽和羧酸及/或不飽和羧酸酐、 (a2)含有環氧基之不飽和化合物、(a3)上述單體 (a 1 )及(a 2 )以外之烯烴系不飽和化合物之共聚物 以及〔B〕光散射性物質。 下文說明有關本發明用於光擴散反射板之膜形成用組 成物之各成分。 共_聚合物〔Α Ί 共聚合物〔A〕係由化合物(a 1 ) 、 ( a 2 )及 (a 3 )共聚而得。 經濟部智慧財產局員工消費合作社印製 上述化合物(a 1 )可列舉如丙烯酸、甲基丙烯酸、 丁烯酸等不飽和單羧酸;馬來酸、富馬酸、檸康酸、中康 酸、衣康酸等不飽和二羧酸;以及此等不飽和二羧酸之酸 酐。此等之中,以共聚反應性、對鹼溶液之溶解性以及容 易取得方面而言以使用丙烯酸、甲基丙烯酸、馬來酸酐等 爲佳。此等(a 1 )成分亦可單獨或2種以上組合使用。 共聚物〔A〕較好含有1 一 5 0重量%,更好爲5 — 4 0重量%由化合物(a 1 )衍生之構成單位。若於該範 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 576851 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(6 ) 圍中使用時,共聚物〔A〕於黏合性、塗佈性及耐熱性方 面呈現最適性能。 上述化合物(a 2 )可列舉如: (甲基)丙烯酸環氧丙酯、(甲基)丙烯酸2-甲基環氧 丙酯、α -乙基丙烯酸環氧丙酯、α -正丙基丙烯酸環氧 丙酯、α -正丁基丙烯酸環氧丙酯等(甲基)丙烯酸環氧 丙酯及其衍生物類; (甲基)丙烯酸—3,4—環氧丁酯、(甲基)丙烯酸— 4,5 -環氧戊酯、(曱基)丙烯酸一 6 ,7 -環氧庚 酯、α -乙基丙烯酸- 6,7 -環氧庚酯等不飽和環氧化 合物等。 此等之中,就其共聚反應性、平坦化性等方面而言以 使用(甲基)丙烯酸環氧丙酯、(甲基)丙烯酸2 -甲基 環氧丙酯爲佳。此等(a 2 )成分可單獨亦可2種以上組 合使用。 共聚物〔A〕較好含有5-80重量%,最好爲7— 7 0重量%由化合物(a 2 )衍生之構成單位。若於該範 圍中使用時,共聚物〔A〕於耐熱性及黏合性方面呈現最 適性能。 上述化合物(a 3 )可列舉如(甲基)丙烯酸甲酯、 (甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙 烯酸一2-乙基己酯、(甲基)丙烯酸苯酯、(甲基)丙 烯酸環己酯、(甲基)丙烯酸三環〔5, . 2 · 1 . 〇 2 ’ 6 〕癸院- 8 —基酯(該技術領域中習用之名稱爲(甲基) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) _ g _ (請先閲讀背面之注意事項再填寫本頁) ,裝· 576851 A7 B7___ 五、發明説明(7 ) 丙烯酸二環戊酯)、(甲基)丙烯酸二環戊基氧基乙酯、 (甲基)丙烯酸異冰片酯等(甲基)丙烯酸酯類; (請先閱讀背面之注意事項再填寫本頁) 苯乙烯、α —甲基苯乙烯、.對—甲基苯乙烯、乙烯萘 等乙烯芳族系化合物; 胤、1 一甲基胤等胤衍生物; 苯基馬來醯亞胺、苯甲基馬來醯亞胺、環己基馬來醯 亞胺、Ν -琥珀醯亞胺基- 3 -馬來醯亞胺苯酸酯、Ν -琥珀醯亞胺基-4 -馬來醯亞胺丁酸酯、Ν -琥珀醯亞胺 基-6 -馬來醢亞胺己酸酯、Ν -琥珀醯亞胺基一 3 -馬 來醯亞胺丙酸酯、Ν -(9一吖啶基)馬來醯亞胺等二羰 基亞胺衍生物; 丁二烯、異戊間二烯等共軛二烯類等。 此等之中,就其黏合性、平坦化性等方面而言以使用 (甲基)丙烯酸酯、二羰基亞胺衍生物等爲佳。此等(a 3 )成分可單獨亦可2種以上組合使用。 經濟部智慧財產局員工消費合作社印製 共聚物〔A〕較好含有1 一 4 0重量%,最好爲2 -3 5重量%由化合物(a 3 )衍生之_成單位。若於該範 圍中使用時,共聚物〔A〕於黏合性及耐熱性方面呈現最 適性能。 共聚物〔A〕之較佳實例可列舉如: (甲基)丙烯酸/(甲基)丙烯酸環氧丙酯/苯乙烯/苯 基馬來醯亞胺共聚物、 (甲基)丙烯酸/(甲基)丙烯酸環氧丙酯/苯乙烯/環 己基馬來醯亞胺共聚物、 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -1〇 - 576851 Α7 Β7 經濟部智慧財產局員工消費合作社印製 五、發明説明(8) (甲基)丙烯酸/(甲基)丙烯酸環氧丙酯/苯乙烯/ (甲基)丙烯酸三環〔5 . 2 . 1. 〇2’ 6〕癸烷一 8 -酯共聚物、 (甲基)丙烯酸/(甲基)丙烯酸環氧丙酯/苯乙烯/丁 二烯共聚物、 (甲基)丙烯酸/(甲基)丙烯酸一 2 -甲基環氧丙酯/ 苯乙烯/苯基馬來醯亞胺共聚物等。 共聚物〔A〕換算成聚苯乙烯之重量平均分子量( Mw) —般爲 3,000 — 300,〇〇〇,較好爲 3 ’ 〇〇〇 - 100 ’ 000 ’ 更好爲 3 ’ 0 0 0 — 50,〇〇〇之範圍。 於共聚物〔A〕中,若採用該範圍之M w則能提供透 明性、保存安定性、黏合性等諸性能呈現優越平衡性之 膜,而可獲得保存安定性優越之組成物。 〔Β〕粒子 〔Β〕粒子係具有使光擴散反射板所用之膜形成適度 粗面作用之物質。 〔Β〕粒子可例舉如 ’ 氧化矽、氧化鈦、氧化鋁等無機氧化物粒子; 聚(甲基)丙烯酸甲酯、聚(甲基)丙烯酸丁酯 '聚 苯乙烯、苯并鳥嘌呤核苷、苯乙烯/二乙烯苯共聚物、纖 維素等有機粒子; (請先閱讀背面之注意事項再填寫本頁) ,裝· 、1Τ Μ. 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) 576851 A7 B7 五、發明説明(9 ) 雲母等礦物類; 鋁、錫、金等金屬粉等。 (請先閲讀背面之注意事項再填寫本頁) 〔B〕粒子之形狀係只要能形成粗面者均可使用,而 以球型及類球型爲佳。粒徑以1 一 2 0 // m爲佳,1 一 1 0 // m最佳。使用此種形狀、大小之粒子可有效提昇面 板之正面輝度。 當目的之液晶顯示元件爲反射型時,就選擇能如上數 般有效形成粗面之粒子形狀觀點而言,〔B〕粒子較好使 用金屬氧化物粒子、有機粒子、礦物粒子。 又,當目的之液晶顯示元件爲半透過型時,除了源自 粗面之光擴散機能之外,粒子本身亦帶有散射機能’因此 可有效率的利用入射光。就此觀點而言,較好使用透明性 高,折射率與〔A〕成分差異大,而光散射效果大之金屬 氧化物粒子,更好使用氧化矽。 此類〔B〕粒子之市售品可列舉如:氧化砂等無機氧 化物如尼噗希爾(Nipseal ) SS—10、同SS - 15、576851 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 ______ B7 __ V. Description of the Invention (1) [Technical Field to which the Invention belongs] The present invention relates to a film-forming composition for a light-diffusing reflection plate used for a liquid crystal display element and the like A light diffusion reflection plate having a film formed of the composition, and a liquid crystal display element having the light diffusion reflection plate. [Previous Technology] Since liquid crystal displays require surface illumination with uniform and high front luminance, those who have a backlight unit have been the mainstream in the past. However, due to the popularity of portable terminals in recent years, the number of transflective and reflective liquid crystal displays has increased greatly from the viewpoint of power saving. The transflective and reflective liquid crystal display is provided with a reflective plate such as an aluminum plate under the liquid crystal panel, and obtains luminance by reflecting light from the upper portion of the panel. However, when this method is used, because the reflecting plate is a flat surface, when the incident direction of incident light from the upper part of the panel is inclined, the direction of the reflected light deviates from the front direction of the panel, and sufficient front luminance cannot be obtained. In order to improve the above-mentioned disadvantages of the transflective and reflective liquid crystal displays, a technique using a so-called light diffusion plate has been disclosed. In this method, a fine uneven shape is added to the surface of the reflector to diffuse the direction of the reflected light, so that a front luminance can be obtained. For example, Japanese Patent Application Laid-Open No. 2000- 1 1 8 86 discloses a technique of forming a metal film on a surface of a glass substrate roughened by chemical uranium etching, and providing a concave-convex shape on the surface of a reflecting plate. According to this method, not only the complicated steps are required to protect the inner surface of the glass substrate from the etching solution, but also because of the use of corrosive etching solution, the Chinese national standard (CNS) A4 specification (2) is used on the device and the paper size. ! 0X297mm) TaI " (Please read the notes on the back before filling out this page) 576851 A7 B7 V. Description of the invention (2) There are cost problems in the process. (Please read the precautions on the back before filling in this page.) Also, Japanese Patent Application Laid-Open No. 2000-193807 discloses that a solution-like composition containing a hydrolyzate of a fluorine compound and an alkoxysilane is coated on a substrate. A technique of forming a film having a concave-convex shape by using phase separation when forming a coating film, and forming a metal film thereon. This method is difficult to control the uneven shape and it is difficult to efficiently obtain diffused light. Moreover, not only the adhesion to the substrate is deteriorated, but the transparency is also insufficient. Therefore, it cannot be used as a transflective liquid crystal display element. The present invention has been made in view of the above circumstances, and an object thereof is to provide a liquid-crystal display element having a rough surface for light diffusion and reflection, excellent adhesion to a substrate, heat resistance, and transparency, and easily forming a reflective or semi-transmissive liquid crystal display element. A composition for a film for a light-diffusing reflection plate. Another object of the present invention is to provide a light-diffusing reflecting plate having a film formed of the above composition and having excellent light-diffusing function. Another object of the present invention is to provide a transflective and reflective liquid crystal display device having the above-mentioned light diffusion and reflection plate and having sufficient front luminance. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs [Methods of Solving Problems] According to the present invention, the problems of the present invention can be achieved by any of the following methods. [1] A composition for forming a film for a light-diffusing reflective plate, characterized in that it contains [A] (a 1) an unsaturated carboxylic acid and / or an unsaturated carboxylic anhydride, and (a2) an unsaturated compound containing an epoxy group. (A3) The above-mentioned single paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -5- 576851 A7 _ _ B7 _ V. Description of the invention (3) (Please read the notes on the back before filling (This page) Copolymers of olefinic unsaturated compounds other than (a 1) and (a 2) and [B] particles, and the content of the [B] component is 60 per 1,000 parts by weight of the [A] component. At least 300 parts by weight. [2] The composition according to [1], wherein the [B] particles are inorganic oxide particles, organic particles, or mineral particles. [3] The composition described in [1], which additionally contains a polyfunctional monomer [C] and a polymerization initiator [D], and the content of the component [C] per 100 parts by weight of the component [A] is 10-20 parts by weight, the content of the [D] component is 0.01 to 60 parts by weight per 100 parts by weight of the [C] component. [4] The composition as described in [3], wherein the polymerization initiator [D] is a radiation-sensitive radical polymerization initiator. [5] The composition as described in [3], wherein the polymerization initiator [D] is a thermally induced radical polymerization initiator, and the content thereof is 0 · 0 per 100 parts by weight of the [C] component 1 — 40 parts by weight. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs [6] The composition as described in [1], which additionally contains the epoxy compound [E] and the acid generator [F], [A] in addition to the component [A] The content of the epoxy compound [E] other than 1,2 to 50 parts by weight per 1,000 parts by weight of the [A] component, and the content of the acid generator [F] to 0 per 100 parts by weight of the [E] component · 〇5-20 parts by weight. [7] The composition according to [6], wherein the acid generator [F] is a radiation-sensitive acid generator. [8] The composition as described in [6], in which the acid generator is used [This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 701 ~ 576851 A7 B7 V. Description of the invention (4) p] Department of heat-sensitive acid generator. [9] The composition as described in [1], for each 1,000 weight (please read the precautions on the back before filling this page). [A] It also contains 0.005 to 20 parts by weight of the acid generator. 〔F〕 [10] The composition according to [9], wherein the acid generator [F] is a radiation-sensitive acid generator. [1 1] The composition according to [9], wherein the acid generator [F] is a heat-sensitive acid generator. [1 2] The manufacturing method of a light-diffusing reflection plate is characterized by including the following steps: (1) forming a coating film of the composition of any one of [4], [7], and [10] on the surface of a substrate, (2) a step of irradiating at least a part of the surface of the coating film with radiation, and (3) a step of forming a metal film on the surface of the film formed above. [1 3] The manufacturing method of the light diffusion and reflection plate is characterized by the following steps: (1) Forming [5], [8], and [11] on the surface of the substrate during printing by the employee's consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs The coating film of any one of the compositions, (2) a step of heating the coating film, and (3) a step of forming a metal film on the surface of the film formed above. [1 4] The light-diffusing reflecting plate has a film formed of the composition described in [1]. [1 5] A liquid crystal display device having the light-diffusing reflection plate described in [1 4]. This paper size applies the Chinese National Standard (CNS) A4 specification (210x297 mm) -7-576851 A7 B7 V. Description of the invention (5) (Please read the precautions on the back before filling this page) Also, in the present invention, The term "radiation" used includes ultraviolet rays, extreme ultraviolet rays, X-rays, electron rays, molecular rays, y rays, synchrotron radiation, proton beam rays, and the like. Hereinafter, the composition for forming a film for use in a light-diffusing reflecting plate will be described in detail. The composition for forming a film for a light-diffusing reflection plate of the present invention is characterized by containing [A] (a 1) an unsaturated carboxylic acid and / or an unsaturated carboxylic acid anhydride, (a2) an unsaturated compound containing an epoxy group, (A3) A copolymer of an olefin-based unsaturated compound other than the monomers (a 1) and (a 2), and [B] a light-scattering substance. Hereinafter, each component of the composition for forming a film for a light-diffusing reflective plate according to the present invention will be described. Copolymer [A Ί] Copolymer [A] is obtained by copolymerizing compounds (a 1), (a 2), and (a 3). The above-mentioned compound (a 1) printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs may include unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, and butenoic acid; maleic acid, fumaric acid, citraconic acid, and mesaconic acid , Itaconic acid and other unsaturated dicarboxylic acids; and anhydrides of these unsaturated dicarboxylic acids. Among these, acrylic acid, methacrylic acid, and maleic anhydride are preferably used in terms of copolymerization reactivity, solubility in an alkali solution, and easy availability. These (a 1) components may be used alone or in combination of two or more. The copolymer [A] preferably contains 1 to 50% by weight, and more preferably 5 to 40% by weight, a constituent unit derived from the compound (a 1). If the paper size of this template applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 576851 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs V. Description of the invention (6) Copolymer [A] Optimum performance in terms of adhesion, coating properties and heat resistance. Examples of the compound (a 2) include propylene oxide (meth) acrylate, 2-methyl propylene oxide (meth) acrylate, propylene oxide α-ethylacrylate, and α-n-propylacrylic acid. (Meth) acrylic acid propylene oxide, α-n-butyl acrylate acrylic acid propylene oxide and its derivatives; (meth) acrylic acid 3,4-butylene oxide, (methyl) Unsaturated epoxy compounds such as acrylic acid — 4,5-epoxypentyl ester, (fluorenyl) acrylic acid-6,7-epoxyheptyl ester, and α-ethylacrylic acid-6,7-epoxyheptyl ester. Among these, in terms of copolymerization reactivity, flatness, and the like, it is preferable to use glycidyl (meth) acrylate and 2-methyl glycidyl (meth) acrylate. These (a 2) components may be used alone or in combination of two or more. The copolymer [A] preferably contains 5 to 80% by weight, and most preferably 7 to 70% by weight of a constituent unit derived from the compound (a 2). When used in this range, the copolymer [A] exhibits optimum properties in terms of heat resistance and adhesiveness. Examples of the compound (a 3) include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, and (meth) Phenyl acrylate, cyclohexyl (meth) acrylate, tricyclic (meth) acrylate [5,. 2 · 1. 〇 2 '6] decyl-8-yl ester (the name commonly used in this technical field is ( Methyl) The paper size applies to the Chinese National Standard (CNS) A4 specification (210X 297 mm) _ g _ (Please read the precautions on the back before filling out this page), loaded · 576851 A7 B7___ V. Description of the invention (7) (Dicyclopentyl acrylate), dicyclopentyloxyethyl (meth) acrylate, isobornyl (meth) acrylate, and other (meth) acrylates; (Please read the precautions on the back before filling this page ) Ethylene aromatic compounds such as styrene, α-methylstyrene, p-methylstyrene, vinylnaphthalene; fluorene derivatives such as fluorene, 1-methylfluorene; phenylmaleimide, benzyl Maleimide, cyclohexylmaleimide, N-succinimide-3-maleimide Acid esters, N-succinimide-4-maleimide butyrate, N-succinimide-6-maleimide hexanoate, N-succinimide-1-3 -Maleimidine imine propionate, N- (9-acridinyl) maleimide, and other dicarbonylimine derivatives; conjugated dienes such as butadiene and isoprene. Among these, it is preferable to use (meth) acrylic acid esters, dicarbonylimide derivatives, and the like in terms of adhesiveness, planarization, and the like. These (a 3) components may be used alone or in combination of two or more. The copolymer [A] printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs preferably contains 1 to 40% by weight, and most preferably 2 to 35% by weight, derived from the compound (a 3) into units. When used in this range, the copolymer [A] exhibits optimum properties in terms of adhesion and heat resistance. Preferred examples of the copolymer [A] include: (meth) acrylic acid / glycidyl (meth) acrylate / styrene / phenylmaleimide copolymer, (meth) acrylic acid / (formaldehyde) Based) Glycidyl acrylate / styrene / cyclohexyl maleimide copolymer, this paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) -10- 576851 Α7 Β7 Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the employee consumer cooperative V. Description of the invention (8) (meth) acrylic acid / (meth) acrylic acid propylene oxide / styrene / (meth) acrylic acid tricyclic [5. 2. 1. 〇 2 '6] Decane-8-ester copolymer, (meth) acrylic acid / (meth) acrylic acid propylene oxide / styrene / butadiene copolymer, (meth) acrylic acid / (meth) acrylic acid 2-methyl Glycidyl ester / styrene / phenylmaleimide copolymer. The weight average molecular weight (Mw) of the copolymer [A] converted into polystyrene is generally 3,000 to 300,000, preferably 3 '〇00〇-100' 000 ', more preferably 3' 0 0 The range is from 0 to 50,000. In the copolymer [A], if Mw in this range is used, a film having excellent balance in transparency, storage stability, adhesiveness and other properties can be provided, and a composition having excellent storage stability can be obtained. [B] Particle [B] Particle is a substance having a function to form a moderately rough surface of a film used for a light diffusion and reflection plate. [B] Examples of the particles include inorganic oxide particles such as 'silica oxide, titanium oxide, and alumina; poly (meth) acrylate, poly (meth) acrylate', polystyrene, and benzoguanine core. Glucoside, styrene / divinylbenzene copolymer, cellulose and other organic particles; (Please read the precautions on the back before filling out this page), installed, 1T Μ. This paper size applies to China National Standard (CNS) Α4 specifications ( 210 × 297 mm) 576851 A7 B7 V. Description of the invention (9) Minerals such as mica; metal powders such as aluminum, tin, and gold. (Please read the precautions on the back before filling in this page.) [B] The shape of the particles can be used as long as it can form a rough surface, and spherical and spherical shapes are preferred. The particle size is preferably 1 to 2 0 // m, and 1 to 1 0 // m is the best. Using particles of this shape and size can effectively enhance the frontal brightness of the panel. When the intended liquid crystal display element is a reflective type, from the viewpoint of selecting a particle shape that can effectively form a rough surface as described above, the [B] particles are preferably metal oxide particles, organic particles, or mineral particles. In addition, when the intended liquid crystal display element is a semi-transmissive type, in addition to the light diffusion function derived from the rough surface, the particles themselves have a scattering function ', so that incident light can be efficiently used. From this viewpoint, it is preferable to use metal oxide particles having high transparency, a large difference in refractive index from the component [A], and a large light scattering effect, and more preferably silicon oxide. Commercial products of such [B] particles can be exemplified by inorganic oxides such as oxidized sand such as Nipseal SS-10, the same as SS-15,

同 SS — 10A、同 SS — 20、同 SS — 30、同 SS 經濟部智慧財產局員工消費合作社印製 —30P、同 SS — 30A、同 SS — 40、同38 — 50、同SS — 70、同SS — 72F、同SS — 115、同 SS — 170X、同 E — 75、同 E — 150、同 E — 200A、同 E — 220A、同 K — 300 (以上,日本矽石工業(股)製)’薩里希亞 (SaiHsia ) 250、同 250N、同 256、同 2 N、同 310、同 320、同 350、同 358、同 張尺度適用中國國家標準(CNS ) A4規格(210'/297公釐1 -12- 576851 經濟部智慧財產局員工消費合作杜印製 A7 B7五、發明説明(1〇 ) 430、同 431 、同 440、同 450、同 470、同 435 、同 445 、同 436 、同 44 6、同 456 、同 530、同 540、同 550、同 730、同 740、同 770 (以上,富士希里醯亞(S i 1 i s i a)化學 (股)製),環珠(Cyclopearl )(積水化學(股)製), 粗珠粒(Tosspearl) 1 0 5、同 1 2 0、同 1 3 0、同 145、同3120、同240 (以上,東芝矽酮工業 (股)製),AER0SIL 130、同 200、同 200V、同 200CF、同 200FAD、同 300、同 300CF、同 3 80 、同 R972 、同 R974、同 RX200 、同 RY 200 、同 R202 、同 R805 、同 R8 12 、同〇X 50、同丁丁600、同“〇又170、同〇〇1<:84 (以上,日本耶羅希爾(A E R〇S I L )(股)製); 有機粒子可列舉如依譜卡拉(Epocala ) 、E P系列、 Μ A系列、依譜斯塔(Eposta )— L15、同MS、同M — 30、同S12、同S6、同S、依譜斯塔一MA1001、同 1002、同 1004、同 1006、同 1010、同 10 1 3 、依譜斯塔一 G P — Η系列、希赫斯塔 (Sehesta ) ΚΕ — Ε系列、同ΚΕ — Ρ (以上,日本觸媒 (股)製)、特克聚合物(Teckpolymer ) — Μ B系列、同 Ε Μ Α系列、词Μ Β X系列、同S Β X系列、同Β Μ X系 列、同Μ Β Ρ系列、同S Β Ρ系列(以上,積水化成品工 業(股)製),Μ Ρ系列、M R系歹[J、S G Ρ系歹!J (以 上,綜硏化學(股)製)、Ρ Β系列(以上,花王(股) 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X297公釐) _ 13 _ (請先閱讀背面之注意事項再填寫本頁) 576851 經濟部智慧財產局員工消費合作社印製 A7 B7五、發明説明(11 ) 製),環珠系列(以上,積水精密化學(FineChemical ) (股)製),歇福羅(Seflo )系列(以上,績索(股) 製); 雲母等礦物類可列舉如天然雲母及合成雲母珠顏料、 阿帖密卡(Alutemica) S A — 1 0 0、同 S B — 1 0 〇、 同YB — 1〇〇、同BB — 100 (以上,日本光硏工業 (股)製)等。 〔B〕粒子之添加量對每1 0 0重量份共聚物〔A〕 一般爲60重量份以上3 0 0重量份以下,較好爲8 0重 量份以上2 0 0重量份以下。若於該範圍中使用時,可形 成對光擴散反射有效率的粗面。 又,爲使〔B〕粒子有效分散於共聚物〔A〕中,可 倂用分散劑。此種分散劑可列舉如矽烷偶合劑、尿烷系分 散劑、聚乙烯亞胺系分散劑、聚氧化乙烯之醚類、聚乙二 醇之酯類等,其中較好使用矽烷偶合劑、尿烷系分散劑。 上述矽烷偶合劑可列舉如具有羧基、甲基丙烯醯基、 異氰酸基、環氧基等反應性基之矽烷偶合劑,具體而言可 列舉如三甲氧基矽烷基苯甲酸、r -甲基丙烯氧基丙基三 甲氧基矽烷、乙烯基三乙醯氧基矽烷、乙烯基三(2 —甲 氧乙氧基)砂院、N -(2 —胺基乙基)3 —胺基丙基甲 基二甲氧基矽烷、N —(2-胺基乙基)3 -胺基丙基甲 基三甲氧基矽烷、r -胺基丙基三乙氧基矽烷、r -環氧 丙氧基丙基三甲氧基矽烷、r -環氧丙氧基丙基甲基二甲 氧基砂院、7 —氯丙基甲基二甲氧基砂院、7 一氯丙基二 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -14 : (請先閲讀背面之注意事項再填寫本頁) 576851 經濟部智慧財產局員工消費合作社印製 A7 _ B7五、發明説明(12) 甲氧基矽烷、r 一甲基丙烯氧基丙基三甲氧基矽烷、r -锍基丙基三甲氧基矽烷、乙烯基三甲氧基矽烷、r 一異氰 酸丙基三乙氧基矽烷、/3 —(3,4 一環氧基環己基)乙 基三甲氧基矽烷等。 尿烷系分散劑較好爲芳族二異氰酸酯類與一末端具有 羥基之聚內酯類及/或兩末端均具有羥基之聚內酯類之反 應生成物,最好爲甲苯撐二異氰酸酯類與一末端具有羥基 之聚己內酯類及/或兩末端具有羥基之聚己內酯類之反應 生成物。此等尿烷系分散劑可具體列舉如商品名爲 EFKA(EFKA Chemicals 公司製)、Disper byk ( B Y K 公司 製)、迪斯帕隆(Disparon)(楠本化成(股)製)等。 使用上述分散劑時其使用量對每1 0 0重量份〔B〕 粒子一般爲100重量份以下,較好爲〇 . 01 - 70重 量份。 若於該範圍中使用時,〔B〕粒子可有效的分散於〔 A〕成分中,而且對形成後用於光擴散反射板之膜的黏合 性、耐熱性等諸物性均無損。 本發明用於光擴散反射板之膜形成用組成物除了〔 A 〕成分及〔B〕成分之外,可另含有多官能單體〔C〕及 聚合起始劑〔D〕。藉由做成此種組成物,於後述之膜形 成步驟中可成爲適用於利用經多官能基單體之自由基之硬 化反應方法的組成物。 以下,詳細敘述〔C〕成分與〔D〕成分。 上述〔C〕成分之多官能性單體,係由具有2個以上 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) .15- (請先閲讀背面之注意事項再填寫本頁) 576851 經濟部智慧財產局員工消費合作社印製 A7 B7 ___五、發明説明(13 ) 可聚合之乙烯性不飽和鍵,而對下述之聚合起始劑〔D〕 進行放射線照射及/或加熱時藉由產生之自由基種會進行 聚合之單體所構成。 本發明所用之〔C〕多官能性單體較好使用2官能或 3官能以上之(甲基)丙烯酸酯,其中以3官能以上之 (甲基)丙烯酸酯最佳。 上述2官能(甲基)丙烯酸酯可例舉如乙二醇二(甲 基)丙烯酸酯、1 ,6-己二醇二(甲基)丙烯酸酯、 1 ,9 一壬二醇二(甲基)丙烯酸酯、聚丙二醇二(甲 基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、雙苯氧基 乙醇芴二丙烯酸酯等。其市售品可列舉如阿樓尼克斯 (Aloneks ) M-2 10、同 M—240、同 M-6200 (以上,東亞合成(股)製)、KAYARAD HDDA、同Η X 一 220、同R— 604 (以上,日本化藥(股)製)、 畢士柯特(Biscot) 260、同 312、同 335HP (以 上,大阪有機化學工業(股)製)等。 上述3官能以上之(甲基)丙烯酸酯可列舉如三羥甲 基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸 酯、三((甲基)丙烯醯氧基乙基)磷酸酯、季戊四醇四 (甲基)丙烯酸酯、二季戊四醇五(曱基)丙烯酸酯、二 季戊四醇六(甲基)丙烯酸酯等。其市售品可列舉如阿樓 尼克斯M— 309 、同 M— 400、同 M— 402、同 Μ —405、同 Μ— 450、同 Μ— 7100、同 Μ — 8030、同 Μ— 8060、同 Μ — 1310、同 Μ — 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) 576851 經濟部智慧財產局員工消費合作社印製 A7 ______ _ B7 _ 五、發明説明(14 ) 、同 μ — 1960、同Μ — 8 100、同Μ — 853〇 、同 Μ — 8 560 、同 Μ-9 0 50 、同 Τ〇一 1 4 5 0 (以上,東亞合成(股)製)、KAYARAD ΤΜΡΤΑ、同 DPHA 、同 DPCA— 20 、同 DPCA — 3〇、同 DPCA— 60 、同 DPCA — 120 、同 MAX— 3510(以上,日本化藥(股)製)、畢士柯 特 295、同 300、同 3 6 0、同 GPT、同 3PA、 同4 0 〇 (以上,大阪有機化學工業(股)製)等。 此等2官能或3官能以上之(甲基)丙烯酸酯可單獨 亦可組合使用。 〔C〕成分之使用量對每1 〇 〇重量份〔A〕成分一 般爲1 0 — 2 0 0重量份,較好爲2 0 - 1 5 0重量份。 若於該範圍中使用時,可提供高耐熱性、黏合性及耐藥品 性優越之膜。 本發明所用之〔D〕成分係具有經由熱可產生自由 基,而使上述〔C〕成分開始聚合之熱感應自由基聚合起 始劑,或者具有經由放射線可產生自由基,而使上述〔C 〕成分開始聚合之放射線感應性自由基聚合起始劑。 此等化合物中,熱感應自由基聚合起始劑可例舉如雙 咪唑系化合物、二苯乙醇酮系化合物、三畊系化合物、苯 乙酮系化合物、二苯甲酮系化合物、α —二酮系化合物、 多核喹啉系化合物、咕噸酮系化合物、偶氮系化合物等, 其中以雙咪唑系化合物、三畊系化合物、苯乙酮系化合物 爲佳。 本紙張尺度適财ί®家辟(CNS ) Α4規格(21GX297公釐).~ (請先閲讀背面之注意事項再填寫本頁) 576851 A7 B7 五、發明説明(15 ) \ 上述雙咪唑化合物可例舉如: 2,2,一雙(2 —氯苯基)一4,4, ,5,5, —肆(4 一乙氧羰基苯基)一 1,2,—雙咪唑、 2,2,—雙(2 —溴苯基)—4,4’ ,5,5’ 一肆(4 —乙氧羰基苯基)一 1,2’ —雙咪唑、 2,2,—雙(2 —氯苯基)—4,4, ,5,5’ —四苯基—1,2,—雙咪唑、 2,2,—雙(2,4 —二氯苯基)一 4,4’ , 5 ’ 5 —四苯基—1,2’ 一雙味π坐、 2,2’ —雙(2,4,6〜三氯苯基)一 4, 4’ ,5,5’ —四苯基—1,2,—雙咪唑、 2,2’ —雙(2 —溴苯基)—4,4, ,5,5’ 一四苯基—1,2,_雙咪唑、 2,2’ —雙(2 ,4 —二溴苯基)一 4,4’ , 5,5,—四苯基—1,2,—雙咪π坐、 2,2’ —雙(2,4,6 —三溴苯基)一 4, 4, ,5,5,—四苯基—1,2, 一雙咪唑等。 此等雙咪唑系化合物中,較佳之化合物爲: 2,2,—雙(2 —氯苯基)—4,4’ ,5,5’ 一四苯基_1 ,2’ 一雙咪唑、 2 ,2’ 一雙(2,4 一二氯苯基)—4,4’ , 5,5’ —四苯基—1,2,—雙咪唑、 2,2,—雙(2,4,6-三氯苯基)—4, 4’ ,5’5’-四苯基-1,2,—雙咪唑,最佳之化 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) —:--------- (請先閲讀背面之注意事項再填寫本頁)The same SS-10A, the same SS-20, the same SS-30, and the SS printed by the Consumer Property Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs—30P, the same SS-30A, the same SS-40, the same 38-50, the same SS-70, Same SS — 72F, same SS — 115, same SS — 170X, same E — 75, same E — 150, same E — 200A, same E — 220A, same K — 300 (above, Japan's Silica Industries (stock) system ) 'SariHsia (SaiHsia) 250, same 250N, same 256, same 2 N, same 310, same 320, same 350, same 358, same size apply Chinese National Standard (CNS) A4 specifications (210' / 297 1 -12- 576851 Consumption cooperation between employees of the Intellectual Property Bureau of the Ministry of Economic Affairs, printed A7 B7 V. Invention Description (10) 430, same 431, same 440, same 450, same 470, same 435, same 445, same 436 , The same 44 6, the same 456, the same 530, the same 540, the same 550, the same 730, the same 740, and the 770 (above, Fuji Silysia (Si 1 isia) chemical (stock) system), Cyclopearl ) (Made by Sekisui Chemical Co., Ltd.), coarse beads (Tosspearl) 1 0 5, same 1 2 0, same 1 3 0, same 145, same 3120, same 240 (above, Zhisi Silicone Industry Co., Ltd., AER0SIL 130, same 200, same 200V, same 200CF, same 200FAD, same 300, same 300CF, same 3 80, same R972, same R974, same RX200, same RY 200, same R202 , Same as R805, same as R8 12, same as OX 50, same as ding 600, same as “170 and 170,” 〇01 <: 84 (above, Japan AEROSIL (share) system); organic The particles can be exemplified as Epocala, EP series, ΜA series, Eposta-L15, same MS, same M-30, same S12, same S6, same S, according to Ipsta MA1001, the same as 1002, the same as 1004, the same as 1006, the same as 1010, the same as 10 1 3, Ipsta-GP series, Η series, Sehesta KE-E series, and KE-P (above, Japan contact (Stock) system), Teckpolymer — Μ B series, the same Μ Α series, the word Μ Β X series, the same S Β X series, the same Β MX series, the same Μ Β series, the same S Β Ρ series (above, Sekisui Chemical Industry Co., Ltd.), MP series, MR series [J, SG Ρ 系 歹! J (above, comprehensive chemical ( (Stock) system), PB series (above, Kao (shares) This paper size applies to Chinese National Standard (CNS) A4 specifications (210X297 mm) _ 13 _ (Please read the precautions on the back before filling out this page) 576851 Economy A7 B7 printed by the Ministry of Intellectual Property Bureau Consumer Cooperative Fifth, the invention description (11) system, ring beads series (above, Sekisui Fine Chemical (Fine Chemical) (stock) system), Seflo series (above, performance Mine and other minerals can be listed as natural mica and synthetic mica pearl pigments, Alutemica SA — 100, same as SB — 100, same as YB — 100, same as BB — 100 (above, Japan's Guangye Industry Co., Ltd.), etc. [B] The amount of particles added per 100 parts by weight of the copolymer [A] is generally 60 parts by weight or more and 300 parts by weight or less, preferably 80 parts by weight or more and 200 parts by weight or less. When used in this range, a rough surface that is effective in diffusing and reflecting light can be formed. In order to effectively disperse the [B] particles in the copolymer [A], a dispersant may be used. Examples of such dispersants include silane coupling agents, urethane-based dispersants, polyethyleneimine-based dispersants, polyethylene oxide ethers, and polyethylene glycol esters. Among them, silane coupling agents and urine are preferred. Alkane-based dispersant. Examples of the silane coupling agent include a silane coupling agent having a reactive group such as a carboxyl group, a methacryl group, an isocyanate group, and an epoxy group. Specific examples include trimethoxysilylbenzoic acid and r-formyl. Allyloxypropyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) sand, N- (2-aminoethyl) 3-aminopropyl Methyldimethoxysilane, N- (2-aminoethyl) 3-aminopropylmethyltrimethoxysilane, r-aminopropyltriethoxysilane, r-propylene oxide Propyltrimethoxysilane, r-glycidoxypropylmethyldimethoxy sand, 7-chloropropylmethyldimethoxy sand, 7 monochloropropyl China National Standard (CNS) A4 Specification (210X297 mm) -14: (Please read the notes on the back before filling this page) 576851 Printed by A7 _ B7, Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, V. Invention Description (12) Methoxysilane, r-methacryloxypropyltrimethoxysilane, r-fluorenylpropyltrimethoxysilane, vinyltrimethoxy Alkyl, R & lt an isocyanato propyl triethoxy Silane acid, / 3 - (3,4-epoxycyclohexyl) ethyl trimethoxy Silane like. The urethane-based dispersant is preferably a reaction product of an aromatic diisocyanate and a polylactone having a hydroxyl group at one end and / or a polylactone having a hydroxyl group at both ends, and preferably a toluene diisocyanate and Reaction products of polycaprolactones having hydroxyl groups at one end and / or polycaprolactones having hydroxyl groups at both ends. Specific examples of such urethane-based dispersants include trade names such as EFKA (manufactured by EFKA Chemicals), Disper byk (manufactured by BYK Company), Disparon (manufactured by Kusumoto Chemical Co., Ltd.), and the like. The amount of the dispersant used is generally 100 parts by weight or less per 100 parts by weight of the [B] particles, and preferably 0.01 to 70 parts by weight. When used in this range, the [B] particles can be effectively dispersed in the [A] component, and the physical properties such as the adhesiveness and heat resistance of the film used for the light diffusion reflection plate after formation are not impaired. The composition for forming a film for use in a light-diffusing reflective plate of the present invention may contain a polyfunctional monomer [C] and a polymerization initiator [D] in addition to the [A] component and the [B] component. By making such a composition, it becomes a composition suitable for the hardening reaction method using a radical via a polyfunctional monomer in a film formation step described later. Hereinafter, the [C] component and the [D] component will be described in detail. The above-mentioned [C] multifunctional monomer is composed of two or more paper sizes that are applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm). 15- (Please read the precautions on the back before filling this page ) 576851 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 ___ V. Description of the invention (13) Polymerizable ethylenically unsaturated bonds, and the following polymerization initiator [D] is irradiated with radiation and / or During heating, it is composed of monomers that are polymerized by the generated radical species. [C] The polyfunctional monomer used in the present invention is preferably a bifunctional or trifunctional or higher (meth) acrylate, and the trifunctional or higher (meth) acrylate is most preferred. Examples of the bifunctional (meth) acrylate include ethylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, and 1,9 nonanediol di (methyl) ) Acrylate, polypropylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, bisphenoxyethanol and diacrylate. Its commercial products can be listed as Aloneks M-2 10, same M-240, same M-6200 (above, made by East Asia Synthetic (Stock)), KAYARAD HDDA, same X-220, same R — 604 (above, manufactured by Nippon Kayaku Co., Ltd.), Biscott 260, same 312, same as 335HP (above, Osaka Organic Chemical Industry Co., Ltd.), etc. Examples of the trifunctional or higher (meth) acrylates include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, and tri ((meth) acryloxyethyl) phosphoric acid. Esters, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (fluorenyl) acrylate, dipentaerythritol hexa (meth) acrylate, and the like. The commercially available products can be exemplified by Alunox M-309, the same M-400, the same M-402, the same M-405, the same M-450, the same M-7100, the same M-8030, the same M-8060, Same M — 1310, Same M — This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling this page) 576851 Printed by A7, Consumer Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs ______ _ B7 _ V. Description of the invention (14), same μ — 1960, same M — 8 100, same M — 853〇, same M — 8 560, same M-9 0 50, and same T0 1 4 5 0 (Above, made by East Asia Synthetic Co., Ltd.), KAYARAD TMTPA, same as DPHA, same as DPCA-20, same as DPCA-30, same as DPCA-60, same as DPCA-120, same as MAX-3510 (above, Nippon Kayakusho (stock) ), Besquite 295, the same 300, the same 360, the same GPT, the same 3PA, the same 400 (above, Osaka Organic Chemical Industry (stock) system) and so on. These bifunctional or trifunctional (meth) acrylates may be used alone or in combination. The amount of the [C] component is generally 10 to 200 parts by weight, and preferably 20 to 150 parts by weight per 100 parts by weight of the [A] component. When used in this range, a film having high heat resistance, adhesion, and chemical resistance can be provided. The component [D] used in the present invention has a thermally induced radical polymerization initiator that can generate radicals through heat and start the polymerization of the component [C], or has a radical that can generate radicals through radiation, so that the [C] ] A radiation-sensitive radical polymerization initiator that starts polymerization of components. Among these compounds, the thermal-inductive radical polymerization initiator may be exemplified by bisimidazole-based compounds, benzophenone-based compounds, Sancang-based compounds, acetophenone-based compounds, benzophenone-based compounds, and α-bis Ketone-based compounds, polynuclear quinoline-based compounds, gluttonone-based compounds, azo-based compounds, and the like are preferred. Among them, bisimidazole-based compounds, Sancang-based compounds, and acetophenone-based compounds are preferred. The paper size is suitable for the family (CNS) A4 size (21GX297mm). ~ (Please read the precautions on the back before filling out this page) 576851 A7 B7 V. Description of the invention (15) \ The above bisimidazole compounds can be For example: 2,2,1-bis (2-chlorophenyl) -4,4,5,5,5- (4-ethoxycarbonylphenyl) -1,2, -bisimidazole, 2,2 , -Bis (2-bromophenyl) -4,4 ', 5,5' 1- (4-ethoxycarbonylphenyl) -1,2'-bisimidazole, 2,2, -bis (2-chloro (Phenyl) -4,4,4,5,5'-tetraphenyl-1,2, -bisimidazole, 2,2, -bis (2,4-dichlorophenyl) -4,4 ', 5' 5-tetraphenyl-1,2 'one pair of π π, 2,2'-bis (2,4,6 ~ trichlorophenyl) -4,4', 5,5'-tetraphenyl-1 , 2, -bisimidazole, 2,2'-bis (2-bromophenyl) -4,4,5,5'-tetraphenyl-1,2, _bisimidazole, 2,2'-bis ( 2,4—dibromophenyl) -4,4 ′, 5,5, —tetraphenyl-1,2, —bisimide, 2,2′—bis (2,4,6-tribromobenzene) Radical) -4,4,5,5,5-tetraphenyl-1,2, a bisimidazole and the like. Among these bisimidazole-based compounds, preferred compounds are: 2,2, -bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenyl_1,2'-bisimidazole, 2 , 2'-bis (2,4-dichlorophenyl) -4,4 ', 5,5'-tetraphenyl-1,2, -bisimidazole, 2,2, -bis (2,4,6 -Trichlorophenyl) -4,4 ', 5'5'-tetraphenyl-1,2, -bisimidazole, optimized for paper size Applicable to China National Standard (CNS) A4 (210X297 mm) — : --------- (Please read the notes on the back before filling this page)

、1T Μ. 經濟部智慧財產局員工消費合作社印製 576851 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(16 ) 合物爲 2,2’ —雙(2,4 —二氯苯基)—4,4’ , 5,5’ —四苯基—1,2’ —雙咪唑。 又,上述三畊系化合物可具體例舉如: 2,4,6 —參(三氯甲基)一s —三畊、 2 —甲基一 4,6 —雙(三氯甲基)一 s —三哄、 2 — 〔2 — (5 —甲基呋喃一 2 —基)乙烯基〕— 4,6 —雙(二氯甲基)一s —二哄、 2 —〔2 —(呋喃一 2_基)乙烯基〕—4,6 —雙 (三氯甲基)一s—三哄、 2 —〔 2 — (4 —一乙基胺基一2 —甲基苯基)乙儲 基〕一 4,6 —雙(三氯甲基)一 s —三畊、 2 —〔2 — (3 ,4 —二甲氧苯基)乙烯基〕—4, 6 —雙(二氯甲基)—s —二哄、 2 — (4 —甲氧苯基)-4,6—雙(三氯甲基)一 s —三畊、 2 —(4 一乙氧基苯乙烯基)一 4,6 —雙(三氯甲 基)—s —三畊、 2 — (4 一正一丁氧苯基)一 4 ,6 —雙(三氯甲 基)- s -三畊等具有鹵甲基之三畊系化合物。 此等三畊系化合物中以2 —〔 2 — ( 3 ,4 —二甲氧 苯基)乙烯基〕一 4,6 —雙(三氯甲基)一 s —三畊爲 佳。 此等三哄系化合物可單獨或2種以上混合使用。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -19 (請先閲讀背面之注意事項再填寫本頁) 576851 A7 B7 五、發明説明(17 ) 上述苯乙酮系化合物之具體例可列舉如: 2 -羥基一 2〜甲基—1 —苯基丙烷—1 一酮、 2 —甲基一1 一〔4 —〔(甲硫基)苯基〕一2 —嗎 啉基丙烷一 1 一酮、 2 —苯甲基一2 —二甲胺基一1 一 (4 一嗎啉并苯 基)丁酮—1、 1一經基一環己基一苯基一酮、 2 ,2 —二甲氧基_i ,2 —二苯基乙烷一2 —酮 等。 此等苯乙酮系化合物之中,以2 —苯甲基一2 —二甲 月女基一 1 一( 4 一嗎啉并苯基)丁酮一 1最佳。 上述苯乙酮系化合物可單獨亦可2種以上混合使用。 上述偶氮系化合物之具體例可例舉如2,2 ’ -偶氮 雙(4 —甲氧基一 2,4—二甲基戊腈)、2 ,2,—偶 氮雙(2,4 一二甲基戊腈)、2,2’ —偶氮雙(2 - 甲基丙腈)、2,2’ 一偶氮雙(2 —甲基丁腈)、1, 1’ 一偶氮雙(環己烷一 1—腈)、4,4,—偶氮雙 (4 —氰基戊酸)、1,1,—偶氮雙(1—乙醯氧基— 1苯基乙烷)等。 此等偶氮系化合物之中,最好使用2,2, 一偶氮雙 (4 一甲氧基一2,4 —二甲基戊腈)、2,2, 一偶氮 雙(2,4 —二甲基戊腈)、2,2’ —偶氮雙(2 —甲 基丙腈)、2,2’ —偶氮雙(2 —甲基丁腈)、1, 1 ’ 一偶氮雙(環己烷一 1 一腈)等。 本紙張尺度適用中國國家標隼(CNS ) A4規格(210X297公釐) IL--------- (請先閲讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 -20- 576851 Α7 Β7 經濟部智慧財產局員工消費合作社印製 五、發明説明(18 ) 如上述之熱感應自由基聚合起始劑之使用量’對每 100重量份〔C〕多官能性單體,一般爲0 · 0 1 -40重量份,較好爲〇·5-30重量份,更好爲1一 2 0重量份。 又,〔D〕聚合起始劑之中,放射線感應性自由基聚 合起始劑可例舉如苯甲基、二乙醯基等^ 一二酮類;二苯 乙醇酮等偶姻類;二苯乙醇酮甲基醚、二苯乙醇酮乙基 醚、二苯乙醇酮異丙基醚等偶姻醚類;硫代咕噸酮、2, 4 一二乙基硫代咕噸酮、硫代咕噸酮一 4 一磺酸、二苯甲 酮、4,4,一雙(二甲胺基)二苯甲酮、4,4’ —雙 (二乙胺基)二苯甲酮等二苯甲酮類;苯乙酮、對一二甲 胺基苯乙酮、α,α’ 一二甲氧基乙醯氧基苯乙酮、2, 2 一二甲氧基一 2 —苯基苯乙嗣、封一甲氧基本乙嗣、 2 —甲基〔4 一(甲硫基)苯基〕一 2 —嗎啉基一 1 一丙 酮、2 —苯甲基一 2 —二甲胺基一 1一 (4 —嗎啉并苯 基)丁一 1 一酮等苯乙酮類;蒽醌、1 ,4 一萘醌等醌 類;苯醯甲基氯化物、三溴甲基苯基硕、參(三氯甲基) 一 s —三畊等之鹵化物;2,4,6 —三甲基苯醯基二苯 基膦氧化物、雙(2 ,6 —二甲氧基苯甲醯基)一 2 , 4,4 —三甲基一戊基膦氧化物、雙(2 ,4,6 —三甲 基苯醯基)苯基膦氧化物等醯基膦氧化物;以及二一第三 丁基過氧化物。 此等放射線感應性自由基聚合起始劑之市售品可例舉 如 IRGACURE — 184、同 369、同 50 0、同 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐1 721 - (請先閱讀背面之注意事項再填寫本頁) 576851 經濟部智慧財產局員工消費合作社印製 A7 ____B7 _ 五、發明説明(19 ) 651、同 907、同 1700、同 819、同 124、 同 1000、同 2959、同 149、同 1800、同 1850、 Daro cur — 1173、同 1116、同 2959、同1664、同4043 (以上,千葉•特殊 化學公製)、KAYACURE-DETX、同 MBP、同 DMBI、 同EPA、同OA (以上,日本化藥(股)製)、LUCIRIN TP〇(BASF股份有限公司製)、VICURE— 1 〇、同5 5 (以上,STAUFFER股份有限公司製)、TRIG0NALP1 (AKZ0股份有限公司製)、SAND0RAY 1000 (SAND0Z股份 有限公司製)、DEAP(APJ〇HN股份有限公司製)、 QUANTACURE-PDO、同 ITX、同 EPD (以上,WARD BLEKINSOP股份有限公司製)等。 又,由於此等放射線感應性自由基聚合起始劑與放射 線感應性增感劑倂用時,可減低因氧氣而導致之不活性, 而可獲得高感度之放射線感應性組成物。 放射線感應性自由基聚合起始劑之使用量,對每 100重量份〔C〕多官能性單體,一般爲〇 . 〇1 — 60重量份,較好爲0·5-50重量份,更好爲1一 4 0重量份。 本發明用於光擴散反射板之膜形成用組成物除了上述 〔A〕成分及〔B〕成分以外,可另含有〔A〕成分以外 之環氧化合物〔E〕以及酸發生劑〔F〕。 又,本發明用於光擴散反射板之膜形成用組成物除了 上述〔A〕成分及〔B〕成分以外,可另含有酸發生劑〔 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) · 22 - 576851 A7 _____ B7 _ 五、發明説明(20 ) F〕。 (請先閲讀背面之注意事項再填寫本頁) 藉由製作此種組成物,於下述之膜形成步驟中,可製 作適用於使用環氧化合物反應方法的組成物。 以下詳述可使用於本發明之〔E〕成分及〔F〕成 分。 〔E〕 〔 A〕成分以外之環氧化合物,係藉由〔A〕 成分中之羧基及/或下述之〔F〕酸發生劑所產生之酸而 引發聚合或交聯反應,而促成組成物塗膜進行硬化反應作 用之成分。 上述〔E〕成分之環氧化合物可例舉如 雙酚A系環氧樹脂、氫化雙酚A系環氧樹脂、雙酚F 系環氧樹脂、氫化雙酚F系環氧樹脂、雙酚S系環氧樹 脂、氫化雙酚S系環氧樹脂、雙酚A D系環氧樹脂、氫化 雙酚AD系環氧樹脂、酚醛淸漆型環氧樹脂、環脂族系環 氧樹脂、雜環環氧樹脂、環氧丙酯系環氧樹脂、環氧丙胺 系環氧樹脂、環氧化油、環氧基酚醛淸漆樹脂等環氧樹脂 經濟部智慧財產局員工消費合作社印製 、醚醚醚 、、、醚基基基 醚醚醚基丙丙丙 基基基丙氧氧氧 丙丙丙氧環環環 氧氧氧環 AFS ; 環環環 D 酚酚酚 物 A F s A 雙雙雙 化 酣酸 酣 酣 化化化 溴雙雙雙雙氫氫氫 其 及 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 23 576851 A7 _______ B7 _ 五、發明説明如) 氫化雙酚AD環氧丙基醚、 溴化雙酚A環氧丙基醚、 (請先閱讀背面之注意事項再填寫本頁) 溴化雙酚F環氧丙基醚、 溴化雙酚S環氧丙基醚、 溴化雙酚AD環氧丙基醚等芳族環氧化合物等。 此等環氧化合物之中,就硬化後之膜硬度高、對其他 膜物性之不良影響小之觀點而言以環氧樹脂爲佳,特別適 宜使用雙酚A系環氧樹脂、酚醛淸漆型環氧樹脂、環脂族 系環氧樹脂等具有2 - 1 0 0個環氧基之環氧樹脂。 此等環氧樹脂之市售品可例舉如: 雙酚A型環氧樹脂如埃比柯德8 2 8、同8 3 4、同 10 〇1、同 1002、同 1003、同 1004、同 1007、同 1009、同 1010、同 157SS6 5、同1 〇 3 2H6 0 (以上,油化貝殻環氧(〇il shell 經濟部智慧財產局員工消費合作社印製 epoxy )(股)製)等,雙酚F型環氧樹脂如埃比柯德 806 、同806L、同807 (以上,油化貝殼環氧 (股)製),酚醛淸漆型環氧樹脂如埃比柯德1 5 2、同 1 5 4 (以上,油化貝殼環氧(股)製)、EPPN201同、 202 (以上,日本化藥(股)製)、EOCN — 102、 EOCN-103S, E〇CN— 10 4S、 EOCN-1020、 EOCN-1025、 E〇CN— 1027 (以上,日本化藥(股)製)、埃比柯德1 8 0 S 7 5 (以上,油化貝殼環氧(股)製)等,多官能環氧樹脂如 埃比柯德1 0 3 2 Η 6 0 (以上,油化貝殼環氧(股) 本紙張尺度適用中國國家標準(CNS ) Α4規格(210父297公^1 - 24 - " 576851 A7, 1T Μ. Printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 576851 A7 B7 Printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs Phenyl) -4,4 ', 5,5'-tetraphenyl-1,2'-bisimidazole. In addition, the above-mentioned three-tillage compounds can be specifically exemplified as: 2, 4, 6-shen (trichloromethyl) -s-three-tillage, 2-methyl-4, 6-bis (trichloromethyl) -s —Triad, 2 — [2 — (5-methylfuran-2-yl) vinyl] — 4,6 —bis (dichloromethyl) -s —diad, 2 — [2 — (furan-1 2 _Yl) vinyl] -4,6-bis (trichloromethyl) -s-trioxo, 2- [2- (4-ethylethylamino- 2-methylphenyl) ethoxy]- 4,6 —bis (trichloromethyl) -s —Sangen, 2 — [2 — (3,4-dimethoxyphenyl) vinyl] -4, 6 —bis (dichloromethyl) —s —Dioxane, 2— (4-methoxyphenyl) -4,6—bis (trichloromethyl) —s—Sangen, 2— (4-ethoxystyryl) —4,6—bis (Trichloromethyl) -s-three-tillage, 2- (4-n-butoxyphenyl) -4,6-bis (trichloromethyl) -s-three-tillage and other three-tillage systems with halomethyl Compounds. Among these three-tillage compounds, 2- [2- (3,4-dimethoxyphenyl) vinyl] -4,6-bis (trichloromethyl) -s-three-tillage is preferred. These three compounds can be used alone or in combination of two or more. This paper size applies Chinese National Standard (CNS) A4 specification (210X297mm) -19 (Please read the precautions on the back before filling this page) 576851 A7 B7 V. Description of the invention (17) Specific details of the above acetophenone compounds Examples can be listed as: 2-hydroxy- 2 ~ methyl-1-phenylpropane-1 monoketone, 2-methyl-1 1- [4- — [(methylthio) phenyl] -2 2-morpholinylpropane 1-one ketone, 2-benzyl-1, 2-dimethylamino-1, 1- (4-morpholinophenyl) butanone-1, 1-mercapto-cyclohexyl-phenyl-one, 2, 2-dione Methoxy_i, 2-diphenylethane-2-one and the like. Among these acetophenone-based compounds, 2-benzyl-2-dimethylolyl-1,4- (morpholinophenyl) butanone-1 is most preferred. These acetophenone-based compounds may be used alone or in combination of two or more. Specific examples of the above-mentioned azo-based compound may include 2,2′-azobis (4-methoxy-2,4-dimethylvaleronitrile), 2,2, -azobis (2,4 Mono-dimethylvaleronitrile), 2,2'-azobis (2-methylpropionitrile), 2,2'-azobis (2-methylbutyronitrile), 1, 1'-azobis (Cyclohexane- 1-nitrile), 4,4, -azobis (4-cyanovaleric acid), 1,1, -azobis (1-acetamido-1phenylphenylethane), etc. . Among these azo compounds, 2,2,1-azobis (4-monomethoxy-2,4-dimethylvaleronitrile), 2,2,1-azobis (2,4 —Dimethylvaleronitrile), 2,2 ′ —azobis (2-methylpropionitrile), 2,2 ′ —azobis (2-methylbutyronitrile), 1, 1′-azobis (Cyclohexane-1 Nitrile) and so on. This paper size applies to China National Standard (CNS) A4 specification (210X297 mm) IL --------- (Please read the notes on the back before filling this page) Order the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed -20- 576851 Α7 Β7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (18) As mentioned above, the amount of the thermally-induced radical polymerization initiator used is' per 100 parts by weight [C] polyfunctional The monomer is generally from 0. 0 1 to 40 parts by weight, preferably from 0.5 to 30 parts by weight, more preferably from 1 to 20 parts by weight. [D] Among the polymerization initiators, the radiation-sensitive radical polymerization initiator may be exemplified by benzyl, diethylfluorenyl, and the like; diketones; diphenolone and the like; Ether ethers such as acetophenone methyl ether, acetophenone ethyl ether, and acetophenone isopropyl ether; thioxanthones, 2, 4-diethylthioxanthones, thioxanthone Dixanthone-4 monosulfonic acid, benzophenone, 4,4, bis (dimethylamino) benzophenone, 4,4'-bis (diethylamino) benzophenone and other diphenyls Methyl ketones; acetophenone, p-dimethylaminoacetophenone, α, α'-dimethoxyethoxymethylacetophenone, 2, 2-dimethoxy-2-2-phenylacetophenone Hydrazone, monomethoxybenzidine, 2-methyl [4-mono (methylthio) phenyl] 2-morpholinyl-1 acetone, 2-benzyl-1 2-dimethylamino-1 Mono (4-morpholinophenyl) butanone and other acetophenones; anthraquinone, 1,4-naphthoquinone and other quinones; benzamidine chloride, tribromomethylphenyl, (Trichloromethyl) one s —halogen compounds such as Sangen; 2,4,6-trimethyl Fluorenyldiphenylphosphine oxide, bis (2,6-dimethoxybenzylfluorenyl) -2,4,4-trimethylmonopentylphosphine oxide, bis (2,4,6-tri Methylphenylfluorenyl) phenylphosphine oxides such as phenylphosphine oxide; and di-third butyl peroxide. The commercially available products of these radiation-sensitive free radical polymerization initiators can be exemplified by IRGACURE — 184, 369, 50,000, and the same paper size as the Chinese National Standard (CNS) A4 specification (210 × 297 mm 1 721- (Please read the notes on the back before filling out this page) 576851 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 ____B7 _ V. Invention Description (19) 651, Same 907, Same 1700, Same 819, Same 124, Same 1000 , Same 2959, same 149, same 1800, same 1850, Daro cur — 1173, same 1116, same 2959, same 1664, same as 4043 (above, Chiba Special Chemical Metric), KAYACURE-DETX, same MBP, same DMBI, Same as EPA, same OA (above, made by Nippon Kayakusho Co., Ltd.), LUCIRIN TP〇 (made by BASF Co., Ltd.), VICURE — 1 〇, same as 5 5 (above, made by STAUFFER Co., Ltd.), TRIG0NALP1 (AKZ0 shares Co., Ltd.), SAND0RAY 1000 (SAND0Z Co., Ltd.), DEP (APJOHN Co., Ltd.), QUANTACURE-PDO, ITX, EPD (above, WARD BLEKINSOP Co., Ltd.), etc. Also, because When these radiation-sensitive radical polymerization initiators and radiation-sensitive sensitizers are used together, they can reduce the inactivation caused by oxygen, and can obtain high-sensitivity radiation-sensitive composition. The amount of the initiator used is generally from 0.01 to 60 parts by weight, preferably from 0.5 to 50 parts by weight, more preferably from 1 to 40 per 100 parts by weight of the [C] polyfunctional monomer. The composition for forming a film for use in a light-diffusing reflector according to the present invention may contain an epoxy compound [E] and an acid generator [A] in addition to the component [A] in addition to the components [A] and [B]. F] In addition to the components [A] and [B] described above, the composition for forming a film for use in a light-diffusing reflector of the present invention may further contain an acid generator [(Please read the precautions on the back before filling in this (Page) This paper size applies to Chinese National Standard (CNS) A4 (210X297 mm) · 22-576851 A7 _____ B7 _ V. Description of Invention (20) F] (Please read the precautions on the back before filling this page) By making such a composition, in In the film formation step described above, a composition suitable for the reaction method using an epoxy compound can be produced. The [E] component and [F] component that can be used in the present invention will be described in detail below. [E] [A] Rings other than the component An oxygen compound is a component that initiates a polymerization or cross-linking reaction by a carboxyl group in the component [A] and / or an acid generated by the following [F] acid generator, and promotes a hardening reaction of the coating film of the composition. Examples of the epoxy compound of the component [E] include bisphenol A epoxy resin, hydrogenated bisphenol A epoxy resin, bisphenol F epoxy resin, hydrogenated bisphenol F epoxy resin, and bisphenol S. Epoxy resin, hydrogenated bisphenol S epoxy resin, bisphenol AD epoxy resin, hydrogenated bisphenol AD epoxy resin, phenolic epoxy resin, cycloaliphatic epoxy resin, heterocyclic ring Epoxy resins, propylene oxide epoxy resins, propylene oxide epoxy resins, epoxy oils, epoxy phenolic lacquer resins and other epoxy resins, printed by employees' cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, Ethyl ether ether ether ether propyl propyl propyl propyl oxy propyl oxy propyl propyl propylene epoxide epoxide epoxide epoxide oxo ring AFS; cyclic ring D phenol phenol phenol AF AF A Tritiated bromide bisbisbishydrogen hydrogen and its paper size are applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 23 576851 A7 _______ B7 _ 5. The description of the invention is as follows: Hydrogenated bisphenol AD epoxypropyl ether , Brominated Bisphenol A Glycidyl Ether, (Please read the precautions on the back before filling this page) Aromatic epoxy compounds such as brominated bisphenol F glycidyl ether, brominated bisphenol S glycidyl ether, and brominated bisphenol AD glycidyl ether. Among these epoxy compounds, epoxy resins are preferred from the viewpoint of high hardness of the cured film and little adverse effect on the physical properties of other films. Particularly suitable are bisphenol A epoxy resin and phenolic paint type. Epoxy resins, such as epoxy resins and cycloaliphatic epoxy resins, which have 2 to 100 epoxy groups. Commercial products of these epoxy resins can be exemplified by: Bisphenol A epoxy resins such as Epicord 8 2 8, same 8 3 4, same 10 01, 1002, 1003, 1004, 100 1007, the same as 1009, the same as 1010, the same as 157SS6 5, the same as 〇3 2H6 0 (above, oiled shell epoxy (〇il shell, Intellectual Property Bureau of the Ministry of Economic Affairs, employee consumer cooperatives printed epoxy) (share) system, etc., double Phenol F-type epoxy resins such as Epicord 806, same 806L, and 807 (above, made of oiled shell epoxy (stock)), phenolic epoxy resins such as Epicord 1 5 2, same as 1 5 4 (above, oiled shell epoxy (stock) system), EPPN201 same, 202 (above, Nippon Kayakusho (stock) system), EOCN — 102, EOCN-103S, E〇CN — 10 4S, EOCN-1020 , EOCN-1025, E〇CN— 1027 (above, manufactured by Nippon Kayaku Co., Ltd.), Epicod 1 180 0 S 7 5 (above, made of oiled shell epoxy (stock)), etc., multifunctional ring Oxygen resins such as Ebikode 1 0 3 2 Η 6 0 (above, oiled shell epoxy (stock) This paper size applies to Chinese National Standard (CNS) A4 specifications (210 father 297 male ^ 1-24-" 576851 A7

五、發明説明泛2 製)’環脂族系環氧樹脂如CY17 c Y 1 7 7、 C γ 1 7 9 (以上,CIBA-GEIGY A. G 製)、E R L — 4234、ERL- 4299、ERL-4221、 ERL-4206 (以上,U.C·社製)、修代因 ludin ) 5 0 9 (昭和電工(股)製) 阿拉代德 (Aladiet) CY— 182、同 CY-192、同 CY — 1 8 4 (以上,CIBA-GEIGY A.G 製)、埃比庫隆(E p i cu 1 〇n) 200、同40 0 (以上,大日本油墨工業 (股)製)、埃比柯德8 7 1、同8 7 2 (以上,油化貝 威运氧(股)製)、ED— 566 1、E D — 5 6 6 2 (以上,歇拉兹科廷(Selaniz coating)(股)製)等。 〔E〕成分之添加量對每1 0 0重量份〔A〕成分一 般爲1 — 2 50重量份,較好爲3 - 200重量份。若爲 (請先閲讀背面之注意事項再填寫本頁) -裝·V. Description of the invention Pan 2) 'Cycloaliphatic epoxy resin such as CY17 c Y 1 7 7, C γ 1 7 9 (above, made by CIBA-GEIGY A. G), ERL-4234, ERL-4299, ERL -4221, ERL-4206 (above, UC · company system), Shudaiin ludin) 5 0 9 (Showa Denko Corporation) Aladiet CY-182, same as CY-192, same as CY-1 8 4 (above, manufactured by CIBA-GEIGY AG), Epicuron 200 (Epi cu 1 00n) 200, same as 40 0 (above, manufactured by Dainippon Ink Industry (stock)), Epicor 8 7 1. Same as 8 7 2 (above, petrochemical Bewell Oxygen (stock) system), ED—566 1, ED — 5 6 6 2 (above, Selaniz coating (stock) system), etc. The amount of the [E] component to be added is generally 1 to 50 parts by weight, and preferably 3 to 200 parts by weight per 100 parts by weight of the [A] component. If it is (Please read the precautions on the back before filling this page)

、1T 經濟部智慧財產局員工消費合作社印製 該範圍之使用量,可獲得黏合性、 可使用於光擴散反射板之膜。 又,共聚物〔A〕有時亦稱爲 物〔A〕就分子內同時含有羧基之 同。 上述〔F〕成分係經由放射線 射線感應性酸發生劑或熱感應酸發 成分及/或〔E〕成分進行交聯· 射線感應性酸發生劑可例舉如二芳 鹽類,以使用此等者爲佳。又’熱 硫鐵鹽(前述之三芳基硫鐵鹽除外 塗佈性及耐熱性優越, 「環氧化合物」,共聚 點而言與〔D〕成分不 照射或熱而產生酸之放 生劑,而使上述〔A〕 硬化反應之化合物。放 基鐄鹽類、三芳基硫鐵 感應酸發生劑可例舉如 )、苯并噻唑鐵鹽、銨 Μ. 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) -25 · 經濟部智慧財產局員工消費合作社印製 576851 A7 ___^___B7 ___ 五、發明説明泛3 ) 鹽、鳞鹽等,此等之中較好使用硫鑰鹽(前述之三芳基硫 鐵鹽除外)、苯并墙唑鐵鹽類。 上述二芳基鎭鹽類可例舉如二苯基碘四氟硼酸鹽、二 苯基鎭六氟膦酸鹽、二苯基銚六氟砷酸鹽、二苯基鎭三氟 甲烷磺酸鹽、二苯基鎭三氟乙酸鹽、二苯基銚-對-甲苯 磺酸鹽、4 -甲氧基苯基苯基鎮六氟膦酸鹽、4 -甲氧基 苯基苯基鍈六氟砷酸鹽、4 -甲氧基苯基苯基碘三氟甲烷 磺酸鹽、4 -甲氧基苯基苯基鎭三氟乙酸鹽、4 -甲氧基 苯基苯基鎭-對-甲苯磺酸鹽、雙(4 -第三丁基苯基) 捵四氟硼酸鹽、雙(4 -第三丁基苯基)鍈六氟砷酸鹽、 雙(4 一第三丁基苯基)銚三氟甲烷磺酸鹽、雙(4 一第 三丁基苯基)碘三氟乙酸鹽、雙(4 一第三丁基苯基)鎭 .-對-甲苯磺酸鹽等。此等之中較好使用二苯基鎮六氟膦 酸鹽。 上述二芳基硫鐵鹽類可例舉如,二苯基硫鐵四氟硼酸 鹽、三苯基硫§翁六氟膦酸鹽、三苯基硫鑰六氟砷酸鹽、三 苯基硫鏺三氟甲烷磺酸鹽、三苯基硫鏺三氟乙酸鹽、三苯 基硫鐵-對-甲苯磺酸鹽、4 -甲氧基苯基二苯基硫鑰六 氟硼酸鹽、4 一甲氧基苯基二苯基硫鐵四氟硼酸鹽、4 -甲氧基苯基二苯基硫鐵六氟膦酸鹽、4 -甲氧基苯基二苯 基硫鏺六氟砷酸鹽、4 -甲氧基苯基二苯基硫鑰三氟甲烷 磺酸鹽、4 一甲氧基苯基二苯基硫鐵三氟乙酸鹽、4 -甲 氧基苯基二苯基硫鐵一對一甲苯磺酸鹽、4 -苯基硫代苯 基二苯基四氟硼酸鹽、4 -苯基硫代苯基二苯基四氟硼酸 本紙張尺度適用中國國家標隼(CNS ) A4規格(210Χ297公釐) -26 - ' " (請先閱讀背面之注意事項再填寫本頁)1T printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. The amount used in this range can obtain the adhesive film that can be used for light diffusion and reflection plates. The copolymer [A] may also be referred to as a substance [A], as long as it contains a carboxyl group in the molecule. The above-mentioned [F] component is cross-linked via a radiation-sensitive acid generator or a heat-sensitive acid generator and / or an [E] component. Examples of the radiation-sensitive acid generator include diaryl salts, and these are used. Those are better. Also, “hot iron thiosulfate (except for the aforementioned triaryl iron thiosulfate) is superior in coating properties and heat resistance. In terms of the“ epoxy compound ”, the copolymerization point and the component [D] are not irradiated or heated to generate acid, and Compounds that harden the above [A]. Examples of fluorenyl salts, triarylsulfuric acid-inducing acid generators, iron benzothiazole salts, and ammonium M. This paper size applies Chinese National Standard (CNS) A4 Specifications (210X 297mm) -25 · Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 576851 A7 ___ ^ ___ B7 ___ V. Invention Description Pan 3) Salt, scale salt, etc. Among these, sulfur key salt ( (Except for the aforementioned triaryl iron thiosulfate salts), iron benzoconazole iron salts. Examples of the above-mentioned diarylphosphonium salts include diphenyliodonium tetrafluoroborate, diphenylphosphonium hexafluorophosphonate, diphenylphosphonium hexafluoroarsenate, and diphenylphosphonium trifluoromethanesulfonate. , Diphenylphosphonium trifluoroacetate, diphenylphosphonium-p-toluenesulfonate, 4-methoxyphenylphenyl hexafluorophosphonate, 4-methoxyphenylphenylphosphonium hexafluoro Arsenate, 4-methoxyphenylphenyliodine trifluoromethanesulfonate, 4-methoxyphenylphenylfluorene trifluoroacetate, 4-methoxyphenylphenylfluorene-p-toluene Sulfonate, bis (4-Third-butylphenyl) hydrazone tetrafluoroborate, bis (4-Third-butylphenyl) fluorene hexafluoroarsenate, bis (4-Third-butylphenyl)铫 Trifluoromethanesulfonate, bis (4-Third-butylphenyl) iodotrifluoroacetate, bis (4-Third-butylphenyl) 鎭 .-p-toluenesulfonate, etc. Among these, diphenyl town hexafluorophosphonate is preferably used. Examples of the above-mentioned diaryl iron thiosulfate salts include diphenyl iron thiotetrafluoroborate, triphenyl thiosulfonium hexafluorophosphonate, triphenyl thiohexafluoroarsenate, and triphenyl sulfur鏺 Trifluoromethane sulfonate, triphenylthiosulfan trifluoroacetate, triphenyl iron thio-p-toluene sulfonate, 4-methoxyphenyldiphenylthiocarbamate hexafluoroborate, 4 a Methoxyphenyldiphenylthiosulfate tetrafluoroborate, 4-methoxyphenyldiphenylthiosulfate hexafluorophosphonate, 4-methoxyphenyldiphenylthiophosphonium hexafluoroarsenate , 4-methoxyphenyldiphenylsulfanyl trifluoromethanesulfonate, 4-monomethoxyphenyldiphenylsulfur trifluoroacetate, 4-methoxyphenyldiphenylsulfurone P-Toluenesulfonate, 4-phenylthiophenyldiphenyltetrafluoroborate, 4-phenylthiophenyldiphenyltetrafluoroborate This paper is sized for China National Standard (CNS) A4 (210 × 297 mm) -26-'" (Please read the notes on the back before filling in this page)

576851 經濟部智慧財產局員工消費合作社印製 A7 B7 _五、發明説明㊁4 ) 鹽、4 -苯基硫代苯基二苯基六氟膦酸鹽、4 一苯基硫代 苯基二苯基六氟砷酸鹽、4 -苯基硫代苯基二苯基三氟甲 烷磺酸鹽、4 -苯基硫代苯基二苯基三氟乙酸鹽、4 一苯 基硫代苯基二苯基-對-甲苯磺酸鹽等。此等之中以使用 三苯基硫鑰三氟甲烷磺酸鹽爲佳。 上述硫鐵鹽(前述之二芳基硫鐵鹽除外)之具體例可 例舉如4 一乙釀苯基二甲基硫鐵/、氣鍊酸鹽、4 一乙釀氧 苯基二曱基硫鐵六氟銻酸鹽、二甲基- 4 -(苯甲氧基羰 氧基)苯基硫鐵六氟銻酸鹽、二甲基一4一(苯甲氧基羰 氧基)苯基硫鐵六氟銻酸鹽、二甲基一4—(苯醯氧基) 苯基硫鑰六氟銻酸鹽、二甲基- 4 -(苯醯氧基)苯基硫 鐵六氟砷酸鹽、二甲基一 3 -氯一 4 一乙醯氧基苯基硫鐵 .六氟銻酸鹽等烷基硫鐵鹽; 苯甲基一 4 一羥基苯甲基硫鐵六氟銻酸鹽、苯甲基-4 -經基苯甲基硫鐵六氟磷酸鹽、4 -乙醯氧基苯基苯甲 基甲基硫鑰六氟銻酸鹽、苯甲基一4一甲氧基苯基甲基硫 鏺六氟銻酸鹽、苯甲基一 2 —甲基一 4 一羥基苯甲基硫鐵 六氟銻酸鹽、苯甲基一 3 —氯一 4 一羥基苯基甲基硫鏺六 氟磷酸鹽等苯甲基硫鎩鹽; 二苯甲基一 4 -羥基苯基硫鑰六氟銻酸鹽、二苯甲基 - 4 -羥基苯基硫鐵六氟磷酸鹽、4 -乙醯氧基苯基二苯 甲基硫鐵六氟銻酸鹽、二苯甲基一 4 -甲氧基苯基硫鑰六 氟銻酸鹽、二苯甲基—3 -氯一 4 一羥基苯基硫鑰六氟砷 酸鹽、二苯甲基一 3 —甲基一 4 一羥基一 5 —第三丁基苯 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 197 - (請先閲讀背面之注意事項再填寫本頁) 576851 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明説明05 ) 基硫鏺六氟鍊酸鹽、苯甲基—4 一甲氧基苯甲基一4 —經 基苯基硫鎩六氟磷酸鹽等二苯甲基硫鑰鹽; 對一氯苯甲基一 4 -羥基苯基甲基硫鏺六氟銻酸鹽、 對-硝基苯甲基- 4 -羥基苯基甲基硫鐵六氟銻酸鹽、對 -氯苯甲基- 4 一羥基苯基甲基硫鐵六氟磷酸鹽、對-硝 基苯甲基一 3 —甲基-4 —羥基苯基甲基硫鑰六氟銻酸 鹽、3 ,5 —二氯苯甲基一 4 一羥基苯基甲基硫鐵六氟銻 酸鹽、鄰一氯苯甲基—3 -氯一 4 一羥基苯基甲基硫鐵六 氟銻酸鹽等經取代之苯甲基硫鐵鹽等。 此等之中以使用4 -乙醯氧苯基二甲基硫鐵六氟砷酸 鹽、苯甲基一 4 一羥基苯基甲基硫鏺六氟銻酸鹽、4 一乙 醯氧苯基苯甲基硫鎩六氟砷酸鹽、二苯甲基- 4 -羥基苯 基硫鑰六氟銻酸鹽、4 -乙醯氧苯基苯甲基硫鑰六氟銻酸 鹽等爲佳。 上述苯唑鑰鹽可例舉如3 -苯甲基苯并噻唑鐵六氟銻 酸鹽、3 -苯甲基苯并噻唑鎩六氟磷酸鹽、3 -苯甲基苯 并噻唑鐵四氟硼酸鹽、3 -(對-甲氧基苯甲基)苯并噻 唑鑰六氟銻酸鹽、3 —苯甲基- 2 -甲基硫代苯并噻唑鐵 六氟銻酸鹽、3 -苯甲基-5 -氯苯并噻唑鎩六氟銻酸鹽 等苯甲基苯并噻唑鎩鹽。 此等之中以使用3 -苯甲基苯并噻唑鐵六氟銻酸鹽等 爲佳。 此等〔F〕成分之使用量,於組成物不含〔E〕成分 時對每1 0 0重量份〔A〕成分一般爲0 · 0 5 — 2 0重 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -28 - (請先閲讀背面之注意事項再填寫本頁) 576851 A7 _ B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(26 ) 量份’較好爲0 · 1 - 1 0重量份,於組成物含〔E〕成 分時對〔A〕成分與〔E〕成分之合計量每1〇 〇重量份 一般爲0·05-20重量份,較好爲〇·1-1〇重量 份。 於該範圍使用可獲得良好之硬化特性,且不損及硬化 後之膜的各種物性。 其他添加劑 本發明用於光擴散反射板之膜用組成物中,視需要可 另含有上述以外之添加劑。 例如,爲改善組成物之塗佈性等,亦可配合界面活性 劑。界面活性劑較好可使用氟系界面活性劑及矽酮系界面 活性劑。 氟系界面活性劑可使用具有至少一個氟烷基或氟伸烷 基之化合物,其具體例可例舉如1 ,2,2,2 —四戴辛 基(1 ,1 ,2 ,2 —四氟丙基)醚、1 ,2 ,2,2 — 四氟己基醚、八乙二醇二(1 ,1 ,2 ,2 —四氟丁基) 醚、六乙二醇二(1 ,1 ,2 ,2 ,3 ,3 —六氟戊基) 醚、八丙二醇二(1 ,1 ,2,2 —四氟丁基)醚、六丙 一醇一(1 ’ 1 ’ 2 ’ 2 ’ 3 ’ 3-六氟戊基)醚、全氟 十二烷基磺酸鈉、1 ,1 ,2,2,8,8、9,9, 10,10 - 十氟十二院、1 ,1 ,2,2,3,3 -六 氟癸烷等。 除此之外氟烷基苯磺酸鈉類、氟烷氧基乙烯醚類、二 — ----C 裝! (請先閱讀背面之注意事項再填寫本頁) 、1Τ Μ 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) _ 29 _ 576851 A7 _B7 五、發明説明(27 ) 甘油肆氟烷基聚氧化乙烯醚類、全氟烷基聚氧化乙醇類、 全氟烷基烷氧醇酸類、氟系烷基酯類亦適宜使用。 此等氟系界面活性劑之市售品可例舉如B Μ -1000 ,BM— 1100(以上,BM Chemie 公司 製)、伊伏特譜(Eftop )EF301、同303、同 3 5 2 (以上、新秋田化成(股)製)、Megafak F142D、 同 F171 、同 172、同 173、同 F183、同 F178、同F191、同F471 (以上,大日本 (股)製)、Flolad FC430、同 431、同 170C、同 FC171、同 FC430、同 FC431 (以上,住友 3M (股)製)、AsahigadAG71〇、薩氟龍 S — 3 8 2、 SC-l〇l、l〇2、103、104、105、 1 0 6 (以上,旭玻璃(股)製)等。 又,矽酮系界面活性劑可例舉如有機矽氧烷聚合物K P341 (信越化學工業(股)製)、丙烯酸系或甲基丙 烯酸系(共)聚合物聚氟婁(Polyflo) N 〇 · 5 7、9 5 (以上,共榮油脂化學工業(股)製)、東D C 3 P A、 同 DC7PA、同 SH11PA、同 SH21PA、同 SH28PA、同 SH29PA 同 SH30PA、同 FS —12 6 5 - 300 (以上,東(股)製)、TSF — 4440、TSF — 4300、TSF — 4445、 TSF — 44 46、TSF-4460、TSF - 4 4 5 2 (以上,東芝(股)製)等市販品。 又,除了上述氟系界面活性劑及矽酮系界面活性劑之 本紙張尺度適用中國國家標準(CNS ) A4規格(210 X 297公釐) -30 - ^ 批衣-- (請先閱讀背面之注意事項再填寫本頁) 、?τ 經濟部智慧財產局員工消費合作社印製 576851 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明細) 外,亦可使用聚氧化乙烯月桂醯基醚、聚氧化乙烯硬脂醯 基醚、聚氧化乙烯硬脂醯基醚、聚氧化乙烯油醯基醚等聚 氧化乙烯烷基醚類,聚氧化乙烯辛基苯基醚、聚氧化乙儲 壬基苯基醚等聚氧化乙烯芳基醚類,聚乙二醇二月桂酸 酯、聚乙二醇二硬脂酸酯等聚乙二醇二烷基酯類等。 此等界面活性劑可單獨亦可2種以上組合使用。 此等界面活性劑之使用比率係依據其種類或構成硬化 劑組成物各成分之種類而有所差異,較好對每1 0 0份〔 A〕成分使用〇 - 10重量份,更好爲〇 · 0001 — 5 重量份之範圍。 又爲改善本發明組成物與基板或下層之黏合性亦可配 合接著助劑。又於本發明組成物中視需要亦可配合保存安 定劑、消泡劑等。 溶劑 本發明之用於光擴散反射板之膜形成用組成物,係調 製成固形物濃度較好爲1 0 - 5 0重量%,均勻分散於溶 劑中之狀態。 此時所使用之溶劑可使用例如二丙酮醇、丙二醇等醇 類;乙二醇單甲基醚、乙二醇單乙基醚等乙二醇醚類;甲 基溶纖劑乙酸酯、乙基溶纖劑乙酸酯等乙二醇烷基醚乙酸 酯類;二乙二醇單甲基醚、二乙二醇單乙基醚等二乙二醇 烷基醚類;丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸 酯、丙二醇單丙基醚乙酸酯等丙二醇烷基醚乙酸酯類;甲 (請先閲讀背面之注意事項再填寫本頁) u 1 - 11 —I— T — LRI 1 - --- —15 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) _ 31 _ 576851 A7 五、發明説明如) 本' 二甲苯等芳族烴類;甲基乙基酮、環己酮、2 一庚 醒、甲基異丁基酮等酮類;2 —羥基丙酸甲酯、2 -羥基 丙酸乙酯、2 —羥基一 2 —甲基丙酸甲酯、2 —羥基一 2 一甲基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、2 — 經基一 3 —甲基丁酸甲酯、3 —甲基一 3 —甲氧基丁基丙 酸酯、3 —甲基—3 —甲氧基丁基丁酸酯、乙酸乙酯、乙 甲酯、3 。此等溶 酸丁酯、乳酸甲酯、乳酸乙酯、3 一甲氧基丙酸 -甲氧基丙酸乙酯、3 -甲氧基丙酸丁酯等酯類 劑可單獨亦可混合使用。 此外視需要亦可添加苯甲基乙基醚、二己基 二醇單甲基醚、二乙二醇單乙基醚、二乙二醇單 醚、二乙 丁基醚、 I------衣-- (請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 丙酮基丙酮、異佛爾酮、己酸、癸酸、1—辛醇、1-壬 醇、苯甲醇、乙酸苯甲酯、苯甲酸甲酯、草酸二乙酯、馬 來酸二乙酯、r 一丁內酯、碳酸乙烯酯、碳酸丙烯酯、苯 基溶纖劑乙酸酯、卡必醇乙酸酯等高沸點溶劑。 光擴散反射板之形成方法 繼之敘述有關使用本發明之用於光擴散反射板之膜形 成用組成物以形成本發明之光擴散反射板之方法。 於基板上形成具有源自本發明組成物粗面之膜,於其 上施與金屬蒸鍍而作成本發明之光擴散反射板。 於形成本發明之光擴散反射板時,首先將本發明用於 光擴散反射板之膜形成用組成物塗佈於基體表面,進行預 備燒結去除溶劑而形成硬化性組成物之塗膜。576851 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 _V. Description of the Invention ㊁ 4) Salt, 4-Phenylthiophenyldiphenylhexafluorophosphonate, 4-Phenylthiophenyldiphenyldiphenyl Hexafluoroarsenate, 4-phenylthiophenyldiphenyltrifluoromethanesulfonate, 4-phenylthiophenyldiphenyltrifluoroacetate, 4-monophenylthiophenyldiphenyl -P-toluenesulfonate and the like. Of these, the use of triphenylsulfanyl trifluoromethanesulfonate is preferred. Specific examples of the above-mentioned ferric iron salt (except the aforementioned diaryl ferrothioate) may be exemplified by 4-ethyl ethyl phenyl iron thiosulfate /, gas chain acid salts, and 4- ethyl ethyl oxyphenyl difluorenyl Ferric hexafluoroantimonate, dimethyl-4-(benzyloxycarbonyloxy) phenyl ferric hexafluoroantimonate, dimethyl-4-(benzyloxycarbonyloxy) phenyl Ferric hexafluoroantimonate, dimethyl-4- (phenylfluorenyloxy) phenylthiocarbamate hexafluoroantimonate, dimethyl-4-(phenylfluorenyl) phenylthioferric hexafluoroarsenic acid Salts, alkyl thiosulfate salts such as dimethyl-1, 3-chloro-4, 4-ethylacetoxyphenylsulfuric acid, and hexafluoroantimonate; benzyl-4, hydroxybenzylthiosulfate, hexafluoroantimonate , Benzyl-4-mesityl benzyl iron hexafluorophosphate, 4-ethoxyloxyphenyl benzyl methylthio hexafluoroantimonate, benzyl 4-methoxymethoxybenzene Methylmethylthiosulfate hexafluoroantimonate, benzyl-1, 2-methyl-1, 4-hydroxybenzyl iron, iron hexafluoroantimonate, benzyl-1, 3-chloro-1, 4-hydroxyphenylmethylsulfide Benzylthiosulfonium salts such as hexafluorophosphate; benzyl-4-hydroxyphenylthiocarbamate hexafluoroantimonate Diphenylmethyl- 4-hydroxyphenylsulfuric acid hexafluorophosphate, 4-ethoxymethoxyphenyldiphenylmethylsulfuric acid hexafluoroantimonate, diphenylmethyl 4-methoxyphenylsulfide Hexafluoroantimonate, benzhydryl-3-chloro-4 monohydroxyphenylthio hexafluoroarsenate, benzyl-1,3-methyl-1, 4-hydroxy-1,5-tert-butylbenzene This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 197-(Please read the precautions on the back before filling out this page) 576851 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Invention Description 05 ) Dithiomethyl hexafluoroalkanoate, benzyl-4 monomethoxybenzyl-4, diphenylmethylsulfide salts such as phenylphenylthiothiohexafluorophosphate; p-chlorobenzyl 4-Hydroxyphenylmethylthiosulfate hexafluoroantimonate, p-nitrobenzyl-4, hydroxyphenylmethylsulfuric acid hexafluoroantimonate, p-chlorobenzyl-4 4-hydroxybenzene Methylmethylthioferrate hexafluorophosphate, p-nitrobenzyl-1, 3-methyl-4, hydroxyphenylmethylsulfide hexafluoroantimonate, 3,5-dichlorobenzyl-1, 4-1 Hydroxyphenyl methyl sulfide Hexafluoroantimonate, monochlorobenzene, o-methyl-3 - chloro - 4 - hydroxyphenyl methylthio iron hexafluoroantimonate, etc. The substituted benzyl sulfur, iron salts. Among these, 4-ethylacetoxyphenyldimethylthiosulfate hexafluoroarsenate, benzyl-4-hydroxyphenylmethylthiohexafluoroantimonate, and 4-ethylacetoxyphenyl Benzylthiosulfanium hexafluoroarsenate, benzyl-4-hydroxyphenylthiocarbamate hexafluoroantimonate, 4-acetamyloxyphenylbenzylsulfonium hexafluoroantimonate, etc. are preferred. Examples of the benzoxazole key salt include 3-benzylbenzothiazole iron hexafluoroantimonate, 3-benzylbenzothiazole hexafluorophosphate, and 3-benzylbenzothiazole iron tetrafluoroborate. Salt, 3- (p-methoxybenzyl) benzothiazole key hexafluoroantimonate, 3-benzyl-2-methylthiobenzothiazole iron hexafluoroantimonate, 3-benzyl Benzyl benzothiazole sulfonium salts such as chloro-5 -chlorobenzothiazolium hexafluoroantimonate. Among these, 3-benzylbenzothiazole iron hexafluoroantimonate is preferably used. The amount of these [F] ingredients, when the composition does not contain the [E] ingredient, is generally 0 · 0 5 — 2 0 per 100 parts by weight of the [A] ingredient. ) A4 specification (210X297mm) -28-(Please read the notes on the back before filling out this page) 576851 A7 _ B7 Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs V. Invention Description (26) Quantities are 'good' 0-1-10 parts by weight, when the composition contains the [E] component, the total amount of the [A] component and the [E] component is generally 0.05 to 20 parts by weight per 100 parts by weight, preferably It is from 0.1 to 10 parts by weight. Use within this range can obtain good hardening characteristics without compromising the various physical properties of the cured film. Other Additives The present invention is used in a film composition for a light-diffusing reflective plate, and may further contain additives other than those described above, if necessary. For example, in order to improve the coating properties of the composition, a surfactant may be blended. As the surfactant, a fluorine-based surfactant and a silicone-based surfactant are preferably used. As the fluorosurfactant, a compound having at least one fluoroalkyl group or fluoroalkylene group can be used, and specific examples thereof include 1,2,2,2-tetradaisinyl (1,1,2,2-tetrayl Fluoropropyl) ether, 1,2,2,2-tetrafluorohexyl ether, octaethylene glycol bis (1,2,2,2-tetrafluorobutyl) ether, hexaethylene glycol bis (1,1, 2,2,3,3-Hexafluoropentyl) ether, octapropylene glycol di (1,1,2,2-tetrafluorobutyl) ether, hexapropanol-1 (1 '1' 2 '2' 3 ' 3-Hexafluoropentyl) ether, sodium perfluorododecylsulfonate, 1,1,2,2,2,8,8,9,9,10,10-Decafluorododecane, 1,1,2 , 2,3,3-hexafluorodecane and the like. In addition, sodium fluoroalkylbenzene sulfonates, fluoroalkoxy vinyl ethers, and two — ---- C equipment! (Please read the precautions on the back before filling out this page), 1T Μ This paper size is applicable to Chinese National Standard (CNS) A4 specification (210X297 mm) _ 29 _ 576851 A7 _B7 V. Description of the invention (27) Glycerol silflurane Polyoxyethylene ethers, perfluoroalkyl polyoxyethanols, perfluoroalkylalkoxyalkyds, and fluorine-based alkyl esters are also suitable for use. The commercially available products of these fluorine-based surfactants can be exemplified by B M-1000, BM-1100 (above, manufactured by BM Chemie), Eftop EF301, same 303, and 3 5 2 (above, New Akita Kasei (share) system), Megafak F142D, same F171, same 172, same 173, same F183, same F178, same F191, same F471 (above, Greater Japan (stock) system), Flolad FC430, same 431, same 170C, same FC171, same FC430, same FC431 (above, Sumitomo 3M (shares) system), AsahigadAG71〇, Seflon S — 3 8 2, SC-101, 103, 104, 105, 1 0 6 (above, asahi glass (stock) system) and so on. Examples of the silicone-based surfactant include an organosiloxane polymer K P341 (manufactured by Shin-Etsu Chemical Industry Co., Ltd.), and an acrylic or methacrylic (co) polymer Polyflo N. · 5 7, 9 5 (above, Gongrong Oil Chemical Industry Co., Ltd.), East DC 3 PA, same as DC7PA, same as SH11PA, same as SH21PA, same as SH28PA, same as SH29PA, same as SH30PA, and same as FS —12 6 5-300 (Above, Toshiba (stock) system), TSF — 4440, TSF — 4300, TSF — 4445, TSF — 44 46, TSF-4460, TSF — 4 4 5 2 (above, Toshiba (stock) system), etc. In addition, in addition to the above-mentioned fluorine-based surfactants and silicone-based surfactants, the paper size of this paper applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -30-^ Approval-(Please read the back Note: Please fill out this page again),? Τ Printed by the Employees 'Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 576851 A7 B7 Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Details of the invention) In addition, polyethylene oxide lauryl Ethers, polyoxyethylene stearyl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether and other polyoxyethylene alkyl ethers, polyoxyethylene octylphenyl ether, polyoxyethylene nonylbenzene Polyoxyethylene aryl ethers such as alkyl ethers, polyethylene glycol dilaurates, and polyethylene glycol dialkyl esters such as polyethylene glycol distearate. These surfactants may be used alone or in combination of two or more kinds. The use ratio of these surfactants varies depending on the type or the type of each component constituting the hardener composition, and it is preferred to use 0-10 parts by weight, and more preferably 100 parts per 100 parts of [A] component. · 0001 to 5 parts by weight. In order to improve the adhesion of the composition of the present invention to a substrate or a lower layer, an adjuvant may be blended. If necessary, a storage stabilizer, an antifoaming agent, and the like can also be added to the composition of the present invention. Solvent The composition for forming a film for a light-diffusing reflection plate of the present invention is adjusted to a solid content concentration of preferably 10 to 50% by weight, and is uniformly dispersed in a solvent. As the solvent used at this time, for example, alcohols such as diacetone alcohol and propylene glycol; glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; methyl cellosolve acetate, ethyl alcohol Base cellosolve acetates, such as ethylene glycol alkyl ether acetates; diethylene glycol monomethyl ethers, diethylene glycol monoethyl ethers, and other diethylene glycol alkyl ethers; propylene glycol monomethyl ether Acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, and other propylene glycol alkyl ether acetates; A (Please read the precautions on the back before filling this page) u 1-11 —I — T — LRI 1---- — 15 This paper size is applicable to Chinese National Standard (CNS) A4 (210X297 mm) _ 31 _ 576851 A7 V. Description of the invention Such as xylene and other aromatic hydrocarbons; A Ketones such as ethyl ethyl ketone, cyclohexanone, 2-heptane, methyl isobutyl ketone; methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, 2-hydroxy-2 methyl propionate Methyl ester, 2-hydroxy-2 methyl ethyl propionate, ethyl ethoxyacetate, ethyl hydroxy ethyl acetate, 2-methyl 3-methyl butyrate, 3-methyl A 3 - methoxybutyl propionate, 3 - methyl-3 - methoxybutyl butyrate, ethyl acetate, methyl acetate, 3. These esters such as butyl acid soluble ester, methyl lactate, ethyl lactate, 3-monomethoxypropionic acid-methoxymethoxypropionate, and butyl 3-methoxypropionate can be used alone or in combination. . In addition, benzylethyl ether, dihexyl glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monoether, diethylbutyl ether, I ----- -Clothing-(Please read the notes on the back before filling this page) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, Acetoacetone, Isophorone, Caproic acid, Decanoic acid, 1-octanol, 1-nonyl Alcohol, benzyl alcohol, benzyl acetate, methyl benzoate, diethyl oxalate, diethyl maleate, r-butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate, High boiling point solvents such as carbitol acetate. Method for Forming Light Diffusion Reflective Plate Next, a method for forming the light diffusive reflective plate of the present invention by using the composition for forming a film for a light diffusive reflective plate of the present invention will be described. A film having a rough surface derived from the composition of the present invention is formed on a substrate, and a metal vapor deposition is applied thereon to form a light-diffusing reflection plate according to the present invention. When forming the light-diffusing reflecting plate of the present invention, the film-forming composition of the present invention for a light-diffusing reflecting plate is first coated on the surface of a substrate, and sintering is performed to remove the solvent to form a coating film of a hardening composition.

、1T .0 本紙張尺度適用中國國家標準·( CNS ) A4規格(210X297公釐) 32- 576851 A7 B7 五、發明説明(30 ) 塗佈方法並無特別限制,可採用例如噴霧法、輥塗佈 法、迴轉塗佈法等適當方法。 預備燒結之條件係視組成物溶液中各成分之種類、使 用比例等而異,較好爲6 0 - 1 2 0 °C下3 0秒一 2 0分 鐘左右。 塗膜之厚度爲去除溶劑後之膜厚較好爲1 - 2 0 //m、更好爲 1— l〇/zm。 此處膜形成用組成物係含有作爲〔D〕成分之放射線 感應性自由基聚合起始劑時,或含有作爲〔F〕成分之放 射線感應性酸發生劑時,其後經由放射線照射則塗膜表面 即會硬化。 此時照射之放射線可使用紫外線、遠紫外線、X射 線、電子線、分子線、r線、同步加速輻射線、質子束射 線等。 於照射放射線之際,亦可經由規定之圖案光罩照射放 射線,繼之藉由顯像液顯像而去除不需要之部分。 顯像液可使用例如氫氧化鈉、氫氧化鉀、碳酸鈉、矽 酸鈉、聚矽酸鈉、氨水等無機鹼類;乙基胺、正-丙基胺 等第一級胺類;二乙胺、二-正一丙基胺等第2級胺類; 三乙胺、甲基二乙胺、N —甲基吡咯烷酮等第3級胺類; 二’甲基乙醇胺、三乙醇胺等醇胺類;氫氧化四甲基銨、氫 氧化四乙基銨、膽鹼等第4級銨鹽;吡咯、六氫吡啶、 1,8 —二氮雜環〔5 · 4 · 0〕— 7 —十一烯、1,5 -二氮雜環〔4 · 3 · 0〕- 5—壬烷等環胺類之鹼類所 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -33 - ------衣--I (請先閲讀背面之注意事項再填寫本頁)、 1T .0 This paper size applies to Chinese national standard (CNS) A4 size (210X297mm) 32- 576851 A7 B7 V. Description of the invention (30) There is no special limitation on the coating method, such as spray method, roller coating, etc. Appropriate methods such as a cloth method and a spin coating method. The conditions for preliminary sintering vary depending on the type of each component in the composition solution, the use ratio, etc., and it is preferably about 30 seconds to 20 minutes at 60 to 120 ° C. The thickness of the coating film is preferably 1-2 0 // m, more preferably 1-10 / zm after removing the solvent. Here, when the composition for film formation contains a radiation-sensitive radical polymerization initiator as the [D] component, or when it contains a radiation-sensitive acid generator as the [F] component, the film is coated after irradiation with radiation. The surface will harden. The radiation to be irradiated at this time may be ultraviolet rays, far ultraviolet rays, X-rays, electron rays, molecular rays, r rays, synchrotron radiation, proton beam rays, and the like. When the radiation is irradiated, the radiation can also be irradiated through a predetermined pattern mask, and then the unnecessary portion is removed by developing with a developing solution. As the developing solution, for example, inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium polysilicate, ammonia water, etc .; primary amines such as ethylamine, n-propylamine; and diethyl Tertiary amines such as amines, di-n-propylamine; tertiary amines such as triethylamine, methyldiethylamine, N-methylpyrrolidone; alcohol amines such as di'methylethanolamine, triethanolamine ; 4th ammonium salts such as tetramethylammonium hydroxide, tetraethylammonium hydroxide, and choline; pyrrole, hexahydropyridine, 1,8-diaza heterocyclic rings [5 · 4 · 0] — 7 — eleven Olefins, 1,5-diazaheterocycles [4 · 3 · 0]-5-nonane and other cyclic amine bases This paper is applicable to China National Standard (CNS) A4 (210X297 mm) -33- ------ 衣 --I (Please read the precautions on the back before filling this page)

、1T 經濟部智慧財產局員工消費合作社印製 576851 A7 B7 五、發明説明(31 ) ' &quot;* 成之鹼水溶液。 (請先閲讀背面之注意事項再填寫本頁) 又於上述鹼水溶液中適當量添加甲醇、乙醇等水溶性 有機溶劑、界面活性劑等之水溶液亦可作爲顯像液使用。 顯像時間較好爲3 0 - 1 8 0秒之間。又,顯像方法 可使用液蒸法或浸漬法等之任一者均可。顯像後,於3 〇 - 9 0間秒以流水洗淨,經壓縮空氣或壓縮氮氣風乾,去 除基板上之水分而形成圖案狀被膜。 然後’進行主燒結而形成用於光擴散反射板具有粗面 之膜’此時主燒結之條件一般係採用1 5 0 - 2 5 0 t下 3 0分鐘一 2小時左右。 繼之,藉由金屬蒸鍍等方法而於粗面表面形成金屬 膜,可作成本發明之光擴散反射板。此時所用之金屬並無 特別限制,但較好使用在可視光領域中具有高反射率之金 屬。就此觀點而言以含有鋁、銀及其中至少一種之合金爲 佳。 經濟部智慧財產局員工消費合作杜印製 又,此處膜形成用組成物爲含有作爲〔D〕成分之放 射線感應性自由基聚合起始劑之物時,或含有作爲〔F〕 成分之熱感應酸發生劑之物時,經上述之預備燒結後,可 不經放射線照射步驟而直接進行主燒結,然後藉由實施金 屬蒸鍍步驟,可作成本發明之光擴散反射板。 此時,預備燒結及主燒結可分別以1階段或2階段以 上步驟之組合進行之。 繼之說明本發明之液晶顯示元件。 本發明之液晶顯示元件具有如上述般形成之光擴散反 本^張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -34- 576851 經濟部智慧財產局員工消費合作社印製 A7 ____ B7 _ 五、發明説明(32 ) 射板。 有可能作爲液晶元件構造之適宜構造可列舉如第1圖 及第2圖所示般,具有於基板1上形成本發明之光擴散反 射板2 3與濾色層4,且經由液晶層6形成對面電極7及 對面基板8之構造。此種情況如第1圖般構成光擴散反射 板2 3之金屬層3亦可具有電極之機能,如第2圖般濾色 層4上亦可形成電極5。又,視需要亦可於爐色層4上形 成保護膜。 其他構造可例舉如第3圖及第4圖所示般,具有於基 板1上形成本發明之光擴散反射板2 3,經由液晶層6形 成濾色層4、對面電極7及對面基板8之構造。此種情況 亦可如第3圖般於濾色層4之上方具有對面電極7之構 造,亦可如第4圖般於濾色層4之下方具有對面電極7之 構造。又,視需要濾色層4下方亦可形成保護膜。第3圖 及第4圖之構造爲構成光擴散反射板2 3之金屬層3亦可 扮演電極之機能。 又,本發明之光擴散反射板之膜形成用組成物,由以 下實施例可確知係可簡易的形成用於光擴散反射板之膜, 且該膜呈現優越之黏合性、耐熱性,膜上金屬蒸鍍之光擴 散反射板亦呈現優越之光擴散特性。 【實施例】 下文,藉由實施例更詳細說明本發明,但本發明並非 限定於此等實施例者。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -35 - ϋί— I m n I ^^11 i m n I n T In ——-----I m (請先閲讀背面之注意事項再填寫本頁) 576851 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明説明(33 ) 合成例1 (共聚物〔A 1〕之合成) 將作爲(a 1 )成分之甲基丙烯酸2 0重量份、作爲 (a 2)成分之甲基丙烯酸環氧丙酯4 5重量份、作爲 (a 3 )成分之苯乙烯2 0重量份與環己基馬來醯亞胺 1 5重量份添加至2 5 0重量份二乙二醇甲基乙基醚乙酸 酯中並混合之,於添加6重量份偶氮雙戊腈(A D V N ) 後,於7 0 t:下聚合6小時,而獲得共聚物〔A 1〕濃度 爲28重量%之聚合物溶液。 共聚物〔A 1〕換算成聚苯乙烯計其重量平均份子量 (以〜)爲6,000。 合成例2 (共聚物〔A 2〕之合成) 將作爲(a 1 )成分之甲基丙烯酸2 〇重胃丨分' f乍胃 (a 2 )成分之甲基丙烯酸環氧丙酯4 5重i丨分' 丨乍胃 (a 3 )成分之苯乙烯2 0重量份與苯基馬來安1 5 重量份添加至2 5 0重量份二乙二醇甲基乙基酸乙酸醋中 並混合之,於添加6重量份偶氮雙戊腈(ADVN)後’ 於7 0 °C下聚合6小時,而獲得共聚物〔A 2 ] ^ $胃2 8 · 2重量%之聚合物溶液。 共聚物〔A 2〕換算成聚苯乙烯計其重量平均份子量 (Mw)爲 6,500。 合成例3 (共聚物_〔 A 3 J之合成) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -36 - IU------#-¾衣-----Ί--1T------ (請先閲讀背面之注意事項再填寫本頁) 576851 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明説明(34) 將作爲(a 1 )成分之甲基丙烯酸2 0重量份、 • * (a 2)成分之甲基丙烯酸環氧丙酯45重量份、 *' (a 3 )成分之苯乙烯2 0重量份與甲基丙烯酸t 5 · 2 · 1 · Ο 2 ’ 6〕癸烷—8 -酯1j重量份添加至 2 5 0重量份二乙二醇甲基乙基醚乙酸酯中並混合之,於 添加6重量份偶氮雙戊腈(A D V N )後,於7 0 °C下聚 合6小時,而獲得共聚物〔A3〕濃度爲29.1重量% 之聚合物溶液。 共聚物〔A3〕換算成聚苯乙烯計其平均份子量( ]\4〜)爲7,000〇 實施例1 將含有上述合成例1所合成共聚物〔A 1〕之溶液 (相當於1 0 0重量份(固形物)共聚物〔A 1〕)加至 二乙二醇甲基乙基醚乙酸酯中作成總量爲4 5 0重量份之 溶液後,添加作爲矽烷偶合劑之r -環氧丙氧基丙基二乙 氧基矽烷7重量份、作爲〔B〕成分之粗珠粒145 (日 本矽石工業(股)製)1 5 0重量份、作爲〔C〕成分之 二季戊四醇六丙烯酸酯(東亞合成(股)製)6 0重量 份、作爲〔D〕成分之1,1’ 一偶氮雙(環己烷一 1 — 腈)(熱自由基發生劑,和光純藥(股)製)2重量份、 SH28PA (東雷矽酮(股)製)0 · 05重量份並充 分攪拌後,使用孔徑1 0 // m之聚氟龍製濾膜過濾之,而 獲得膜形成用組成物〔S 1〕。 I--------裝------1T------ (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X297公釐) -37- 576851 Α7 Β7 五、發明説明(35 ) 县有粗面之膜 於玻璃基板上,使用旋轉塗佈器將上述膜形成用組成 物〔S 1〕塗佈成顯出粒子凹凸狀,藉由加熱板於8 0 °C 下進行5分鐘預備燒結以形成塗膜。然後,將形成有塗膜 之基板於乾淨烘箱中以2 3 0 °C 3 0分鐘之條件進行主燒 結’而獲得具有粗面之膜。 复有粗面之臈之評估 透明性 有關如上述所形成之具有粗面之膜,以Haze gard plas 裝置〈型號Cat. No4725&gt;(BYK Gardner (股)製)測定其透 明性(累計透過率)。結果示於表1。 耐熱性; 如上述般測定透明性(累計透過率)後,置於乾淨烘 箱中實施2 5 0 °C 6 0分鐘之追加焙燒。追加焙燒後,再 度測定透明性,計算追加焙燒前後之變化比率。結果示於 表1。 光擴散反射板之形成; 於如上述般形成之具有粗面之膜上,藉由真空蒸鍍裝 置而形成約1,Ο Ο Ο A之鋁膜,獲得光擴散反射板。 黏合性 依據:f IS K - 5400 (1900) 8 · 5 之附 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X297公釐) _ 38 - ---^--------- (請先閱讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 576851 A7 經濟部智慧財產局員工消費合作社印製 五、發明説明(36 著性試驗中,以8 · 5 · 2之棋盤格子帶法,以切刀使以 i形成之光擴散反射板形成1 〇 〇個之棋盤格子而進行附 著性試驗。此時,殘留之棋盤格子數示於表1。 實施例2 將含有上述合成例1所合成共聚物〔A 1〕之溶液 (相當於1 〇 〇重量份(固形物)共聚物〔A 1〕)加至 二乙二醇甲基乙基醚乙酸酯中作成總量爲4 5 〇重量份之 溶液後,添加作爲矽烷偶合劑之7 一環氧丙氧基丙基二乙 氧基矽烷7重量份、作爲〔B〕成分之粗珠粒145 (曰 本矽石工業(股)製)1 5 0重量份、作爲〔E〕成分之 埃比柯德1 〇 3 2 Η 6 0 (雙酚A型環氧樹脂,油化貝殼 環氧(股)製)4 0重量份、作爲〔F〕成分之善埃得 (Sunaid) 1 〇 〇 L (硫鐵鹽型酸發生劑,三新化學(股) 製)5重量份、SH28PA (東雷矽酮(股)製) 0 · 0 5重量份並充分攪拌後,使用孔徑1 〇 //m之聚贏 龍製濾膜過濾之,而獲得膜形成用組成物〔S 2〕。 使用〔S 2〕替代〔S 1〕,與實施例1同樣操作而 形成具有粗面之膜及光擴散反射板,評估之。結果示於表 實施例3 於實施例1中除使用含有上述合成例3所合成共聚物 〔A 3〕之溶液(相當於1 0 0重量份(固形物)共聚物 (請先閱讀背面之注意事項再填寫本頁) 裝·Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, 1T 576851 A7 B7 V. Description of the Invention (31) '&quot; * Aqueous alkaline aqueous solution. (Please read the precautions on the back before filling this page.) An aqueous solution containing a suitable amount of water-soluble organic solvents such as methanol and ethanol and surfactants can also be used as a developing solution. The development time is preferably between 30 and 180 seconds. The development method may be any of a liquid evaporation method and a dipping method. After development, it is washed with running water between 30-90 seconds, and then air-dried with compressed air or compressed nitrogen to remove the moisture on the substrate to form a patterned film. Then, "the main sintering is performed to form a film having a rough surface for the light diffusion reflection plate". At this time, the conditions for the main sintering are generally about 15 minutes to 2 hours at 150-2 50 t. Next, a metal film is formed on the rough surface by a method such as metal evaporation, which can be used as a light-diffusing reflection plate according to the present invention. The metal used at this time is not particularly limited, but a metal having high reflectance in the visible light field is preferably used. From this viewpoint, an alloy containing at least one of aluminum, silver, and the like is preferable. Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs for consumer cooperation. When the composition for film formation is a substance containing a radiation-sensitive radical polymerization initiator as the [D] component, or as a component containing the [F] component, When inducing an acid generator, after the above-mentioned preliminary sintering, the main sintering can be directly performed without a radiation irradiation step, and then a metal vapor deposition step can be performed, which can be used as a light-diffusing reflection plate of the present invention. At this time, the preliminary sintering and the main sintering may be performed by a combination of one or more steps, respectively. Next, the liquid crystal display element of the present invention will be described. The liquid crystal display element of the present invention has the light diffusion counter-sheets formed as described above, and is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -34- 576851 printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 ____ B7 _ 5. Description of the invention (32) Shooting board. As suitable structures that may be used as the structure of the liquid crystal element, as shown in FIG. 1 and FIG. 2, the light diffusing reflection plate 23 and the color filter layer 4 of the present invention are formed on the substrate 1, and are formed through the liquid crystal layer 6. Structures of the opposite electrode 7 and the opposite substrate 8. In this case, the metal layer 3 constituting the light diffusion and reflection plate 23 as shown in Fig. 1 may also have the function of an electrode, and the electrode 5 may be formed on the color filter layer 4 as shown in Fig. 2. If necessary, a protective film may be formed on the furnace color layer 4. Other structures can be exemplified as shown in FIG. 3 and FIG. 4. The light diffusion reflection plate 23 of the present invention is formed on the substrate 1. Of the structure. In this case, the structure of the opposite electrode 7 may be provided above the color filter layer 4 as shown in FIG. 3, and the structure of the opposite electrode 7 may be provided below the color filter layer 4 as shown in FIG. A protective film may be formed under the color filter layer 4 as necessary. The metal layers 3 constructed in FIGS. 3 and 4 so as to constitute the light diffusion and reflection plate 23 can also function as electrodes. In addition, the composition for forming a film of a light diffusion reflection plate of the present invention can be confirmed from the following examples that a film for a light diffusion reflection plate can be easily formed, and the film exhibits excellent adhesion and heat resistance. Metal vapor-deposited light diffusion and reflection plates also exhibit superior light diffusion characteristics. [Examples] Hereinafter, the present invention will be described in more detail through examples, but the present invention is not limited to these examples. This paper size applies to Chinese National Standard (CNS) A4 (210X297 mm) -35-ϋί— I mn I ^^ 11 imn I n T In ——----- I m (Please read the precautions on the back first (Fill in this page again) 576851 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of Invention (33) Synthesis Example 1 (Synthesis of Copolymer [A 1]) Methacrylic acid 2 as component (a 1) 0 parts by weight, glycidyl methacrylate as component (a 2) 4 5 parts by weight, 20 parts by weight of styrene as component (a 3) and 15 parts by weight of cyclohexylmaleimide 2 50 parts by weight of diethylene glycol methyl ethyl ether acetate were mixed and mixed. After adding 6 parts by weight of azobisvaleronitrile (ADVN), polymerization was performed at 70 t for 6 hours to obtain copolymerization. [A 1] polymer solution having a concentration of 28% by weight. The copolymer [A 1] had a weight average molecular weight (in terms of ~) of 6,000 in terms of polystyrene. Synthesis Example 2 (Synthesis of Copolymer [A 2]) As the component (a 1), methacrylic acid was used as a heavy weight component, and as the component (a 2), glycidyl methacrylate was used as a weight component. i 丨 分 '丨 20 parts by weight of styrene (a 3) ingredients and 15 parts by weight of phenyl malein are added to 250 parts by weight of diethylene glycol methyl ethyl acetate and mixed In other words, after adding 6 parts by weight of azobisvaleronitrile (ADVN), polymerization was performed at 70 ° C. for 6 hours to obtain a copolymer [A 2] ^ stomach 2 8 · 2% by weight polymer solution. The copolymer [A 2] had a weight average molecular weight (Mw) of 6,500 in terms of polystyrene. Synthesis Example 3 (Copolymer_ [Synthesis of A 3 J) This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -36-IU ------ #-¾ 衣 ----- Ί--1T ------ (Please read the notes on the back before filling out this page) 576851 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. The invention description (34) will be used as (a 1) 20 parts by weight of methacrylic acid, 45 parts by weight of glycidyl methacrylate as component * (a 2), 20 parts by weight of styrene as component * '(a 3) and t 5 · 2 of methacrylic acid · 1 · Ο 2 '6] Decane-8-ester 1j parts by weight is added to 250 parts by weight of diethylene glycol methyl ethyl ether acetate and mixed, and 6 parts by weight of azobispentane is added After nitrile (ADVN) was polymerized at 70 ° C for 6 hours, a polymer solution having a copolymer [A3] concentration of 29.1% by weight was obtained. The copolymer [A3] is converted into polystyrene and its average molecular weight (] \ 4 ~) is 7,000. Example 1 A solution (equivalent to 10) containing the copolymer [A 1] synthesized in the above Synthesis Example 1 will be used. 0 parts by weight of the (solid) copolymer [A 1]) was added to diethylene glycol methyl ethyl ether acetate to make a total solution of 450 parts by weight, and r-as a silane coupling agent was added. 7 parts by weight of glycidoxypropyldiethoxysilane, 145 coarse beads as component [B] (manufactured by Japan Silica Industries, Ltd.) 150 parts by weight, and dipentaerythritol as component [C] Hexacrylic acid ester (manufactured by Toa Kosei Co., Ltd.) 60 parts by weight as the [D] component of 1,1'-azobis (cyclohexane-1—nitrile) (thermal radical generator, Wako Pure Chemicals ( 2) parts by weight), SH28PA (Toray Silicone (manufactured)) 0. 05 parts by weight and fully stirred, and then filtered using a polyfluorocarbon filter membrane having a pore diameter of 1 0 // m to obtain a membrane. With the composition [S 1]. I -------- Packing ------ 1T ------ (Please read the precautions on the back before filling this page) This paper size applies to China National Standard (CNS) Α4 specification (210X297 (Mm) -37- 576851 Α7 B7 V. Description of the invention (35) There is a film with a rough surface on a glass substrate, and the above-mentioned film-forming composition [S 1] is coated with a spin coater to show irregularities of particles. Then, preheating was performed on a hot plate at 80 ° C for 5 minutes to form a coating film. Then, the substrate on which the coating film is formed is subjected to main sintering in a clean oven at 230 ° C for 30 minutes to obtain a film having a rough surface. Evaluation of Transparency with a Coarse Surface: As for the film with a rough surface formed as described above, its transparency (cumulative transmittance) was measured using a Haze gard plas device <Model Cat. No4725> (by BYK Gardner). . The results are shown in Table 1. Heat resistance: After measuring the transparency (cumulative transmittance) as described above, place it in a clean oven and perform additional firing at 250 ° C for 60 minutes. After the additional baking, the transparency was measured again, and the change ratio before and after the additional baking was calculated. The results are shown in Table 1. Formation of a light diffusion reflection plate; On the film having a rough surface formed as described above, an aluminum film of about 1,00 OO A was formed by a vacuum evaporation device to obtain a light diffusion reflection plate. Adhesiveness basis: f IS K-5400 (1900) 8 · 5 attached paper size applicable to China National Standard (CNS) A4 specifications (210X297 mm) _ 38---- ^ --------- (Please read the notes on the back before filling out this page) Order printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 576851 A7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs In the checkerboard grid method of 5 · 2, a cutting knife was used to form 1,000 checkerboard grids with a light diffusion reflection plate formed by i. The adhesion test was performed. At this time, the number of checkerboard grids remaining is shown in Table 1. Example 2 A solution containing the copolymer [A 1] synthesized in the above Synthesis Example 1 (equivalent to 1,000 parts by weight (solid matter) copolymer [A 1]) was added to diethylene glycol methyl ethyl ether acetate After preparing a total solution of 45.0 parts by weight, 7 parts by weight of 7-glycidoxypropyldiethoxysilane as a silane coupling agent was added, and coarse beads 145 as the component (B) [Silica Industry Co., Ltd.] 150 parts by weight, [E] component of Epicord 1.03 2 Η 6 0 (bisphenol A type epoxy resin, made of oiled shell epoxy (stock)) 40 parts by weight, as [F] component, Sunaid 10000L (sulfuric acid type acid Generator, 5 parts by weight of Sanxin Chemical Co., Ltd., SH28PA (manufactured by Torayon Silicone Co., Ltd.) 0 · 0 5 parts by weight and fully stirred, and then use polywin filter made with a pore size of 10 // m The film was filtered to obtain a film-forming composition [S 2]. Using [S 2] instead of [S 1], the same operation as in Example 1 was performed to form a film with a rough surface and a light-diffusing reflector, and the results were evaluated. It is shown in Table Example 3. In Example 1, except that the solution containing the copolymer [A 3] synthesized in Synthesis Example 3 described above (equivalent to 100 parts by weight (solid matter) copolymer (please read the precautions on the back first) (Fill in this page again)

、1T f 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 39 經濟部智慧財產局員工消費合作社印製 576851 A7 ____ B7__ 五、發明説明(37 ) 〔A 3〕)替代含有共聚物〔A 1〕之溶液外,與實施例 1同樣操作而獲得膜形成用組成物〔S 3〕。 使用〔S 3〕替代〔S 1〕,與實施例1同樣操作而 形成具有粗面之膜及光擴散反射板,評估之。結果示於表 實施例4 於實施例1中除使用1 5 0重量份丙烯酸系粒子特克 聚合物Μ B 2 〇 X - 5 (積水化成品工業(股)製)作爲 〔Β〕成分替代〔Β〕成分之無機粒子粗珠粒1 4 5 (曰 本矽石工業(股)製)外,與實施例1同樣操作而獲得膜 形成用組成物〔S 4〕。 使用〔S 4〕替代〔S 1〕,與實施例1同樣操作而 形成具有粗面之膜及光擴散反射板,評估之。結果示於表 實施例5 於實施例1中除使用3 0重量份2 —甲基一 1 一〔4 一〔(甲硫基)苯基〕一 2 —嗎啉基丙烷一 1 一酮(熱自 由基發生劑,衣嘎居爾(Irgacure ) - 9 0 7 ;千葉•特殊 化學公司製)替代作爲〔D〕成分之1 ,1 ’ 一偶氮雙、 1T f This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 39 Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 576851 A7 ____ B7__ V. Description of the invention (37) [A 3]) Replacement contains copolymerization Except for the solution of the substance [A 1], it carried out similarly to Example 1, and obtained the composition [S3] for film formation. [S 3] was used in place of [S 1], and a film having a rough surface and a light diffusion reflection plate were formed in the same manner as in Example 1 and evaluated. The results are shown in Table Example 4. In Example 1, except that 150 parts by weight of acrylic particle Tec polymer M B 2 OX-5 (made by Sekisui Chemical Industry Co., Ltd.) was used as the [B] component instead of [ Β] A component [S 4] was obtained in the same manner as in Example 1 except that the inorganic particles of the component were coarse beads 1 4 5 (manufactured by Japan Silica Industries Co., Ltd.). [S 4] was used in place of [S 1], and a film having a rough surface and a light diffusion reflection plate were formed in the same manner as in Example 1 and evaluated. The results are shown in Table Example 5. In Example 1, except that 30 parts by weight of 2-methyl-1 1- [4-[(methylthio) phenyl] -2-morpholinylpropane-1 1-ketone (thermal Free radical generator, Irgacure-9 0 7; Chiba Specialty Chemicals Co., Ltd.) is used as a substitute for [D] 's 1,1'-azobisbis

(環己烷一 1 一腈)(熱自由基發生劑,和光純藥(股) 製)外,與實施例1同樣操作而獲得膜形成用組成物〔S 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) -40 - I^^IT. (請先閲讀背面之注意事項再填寫本頁) 576851 A7 -______ B7 五、發明説明(38 ) 使用〔S 5〕替代〔S 1〕,與實施例1同樣進行預 備燒結而形成塗膜。使用規定之光罩以3 6 5 n m,強度 (請先閱讀背面之注意事項再填寫本頁) 1 0 m W/ c m 2之紫外線對所得之塗膜照射3 0秒。此時 之紫外線照射係於氧氣籠罩下(空氣中)進行。繼之以 〇 . 1 4重量%之氫氧化四甲基銨水溶液於2 5 °C顯像1 分鐘後’以純水啉洗1分鐘。藉由此等操作可去除不需要 之部分。然後,將形成有塗膜之基板置於乾淨烘箱中以 2 3 0 t: 3 0分鐘之條件進行主燒結,而獲得具有粗面之 膜。又,使用所得具有粗面之膜,進行鋁蒸鍍,而形成光 擴散反射板,評估之。結果示於表1。 實施例6 於實施例5中除使用1 5 0重量份丙烯酸系粒子特克 聚合物Μ B 2 Ο X - 5 (積水化成品工業(股)製)作爲 〔Β〕成分替代〔Β〕成分之無機粒子粗珠粒1 4 5 (日 本矽石工業(股)製)外,與實施例5同樣操作而獲得膜 形成用組成物〔S 6〕。 經濟部智慧財產局員工消費合作社印製 使用〔S 6〕替代〔S 5〕,與實施例5同樣操作而 形成具有粗面之膜及光擴散反射板,評估之。結果示於表 實施例7 於實施例1中除〔Β〕成分之使用量改爲9 0重量份 外,與實施例1同樣操作而獲得膜形成用組成物〔S 7 本紙張尺度適财關家標隼(CNS ) Α4規格(21GX297公釐)Ι7ΤΊ ~ ^/6851 五、 發明説明(39 Α7 Β7 使用〔S 7〕替代〔S 1〕,與實施例1同樣操作而 % $具有粗面之膜及光擴散反射板,評估之。結果示於表 表 —__ 透明性 耐熱性 粘合性 94.0% 99.2% 100/100 2 9 3.5 % 9 8.8% 100/100 93.8% 97.5% 100/100 4 94.2% 98.5% 100/100 5 9 3.1% 9 8.5 % 100/100 93.4% 98.0% 100/100 ϊ^^ίΐ 7 94.0% 9 8.7 % 100/100 實施例8 光擴散特性; 綾濟部智慧財產局員工消費合作社印製 使用3次元變角光度計((股)村上色彩技術硏究所 製)對實施例1及7所形成之光擴散反射板,自一 1 0 ° Μ 7 0 °改變角度分別測定3 0 °入射時之散射特性。結果 示於第5圖。 由上述實施例可確知,由本發明之組成物所得之膜, 具有與基板優良之黏合性、耐熱性、透明性,而進行金屬 蒸鍍之光擴散反射板具有優越之光擴散特性。 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X297公釐) _ 42 - 576851 A7 B7 五、發明説明(4〇 ) 【發明之效果】 (請先閲讀背面之注意事項再填寫本頁) 依據本發明係提供用於光擴散反射板用之具有粗面, 與基板黏合性、耐熱性、透明性優越,而可容易形成使用 於反射型或半透過型液晶顯示元件之光擴散反射板用之膜 的組成物。 此外,依據本發明係提供具有優越擴散特性之光擴散 反射板、具有該反射板之優良液晶顯示元件。 圖示之簡單說明 〔第1圖〕 係液晶顯示元件構造之模式圖。 〔第2圖〕 係液晶顯示元件構造之模式圖。 〔第3圖〕 係液晶顯示元件構造之模式圖。 〔第4圖〕 經濟部智慧財產局員工消費合作社印製 係液晶顯示元件構造之模式圖。 〔第5圖〕 係顯示3 0 °入射時之散射特性之圖形。 〔符號之說明〕 1 基板 2 光擴散反射板用之膜 -43- 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 576851 A7 五、發明説明⑷) 3 金屬層 2 3 光擴散反射板 4 濾色層 5 電極 6 液晶層 7 對向電極 8 對向基板 --------l·------裝----Ί.--訂----- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -44 -(Cyclohexane-1, Nitrile) (a thermal radical generator, manufactured by Wako Pure Chemical Industries, Ltd.), and a film-forming composition was obtained in the same manner as in Example 1 [S This paper is in accordance with Chinese National Standards (CNS ) A4 specification (210X 297mm) -40-I ^^ IT. (Please read the notes on the back before filling out this page) 576851 A7 -______ B7 V. Description of the invention (38) Use [S 5] instead of [S 1] In the same manner as in Example 1, preliminary sintering was performed to form a coating film. Use the specified mask with a strength of 3 6 5 n m (please read the precautions on the back before filling this page) and irradiate the resulting coating film with UV light of 10 m W / cm 2 for 30 seconds. The ultraviolet irradiation at this time was performed under an oxygen envelope (in the air). This was followed by development with 0.1% by weight of a tetramethylammonium hydroxide aqueous solution at 25 ° C for 1 minute, followed by washing with pure waterline for 1 minute. By doing so, unnecessary portions can be removed. Then, the substrate on which the coating film was formed was placed in a clean oven and subjected to main sintering at 230 to 30 minutes to obtain a film having a rough surface. Further, the obtained film having a rough surface was subjected to aluminum vapor deposition to form a light-diffusing reflection plate and evaluated. The results are shown in Table 1. Example 6 In Example 5, except that 150 parts by weight of acrylic particle tex polymer MG B 2 0 X-5 (made by Sekisui Chemical Industry Co., Ltd.) was used as the [B] component instead of the [B] component. A film-forming composition [S 6] was obtained in the same manner as in Example 5 except that the inorganic particles were coarse beads 1 4 5 (manufactured by Japan Silica Industries, Ltd.). Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs [S 6] was used instead of [S 5], and the same operation as in Example 5 was performed to form a film with a rough surface and a light-diffusing reflection plate, and evaluated it. The results are shown in Table Example 7. In Example 1, except that the amount of the [B] component was changed to 90 parts by weight, the composition for film formation was obtained in the same manner as in Example 1. (CNS) Α4 specification (21GX297 mm) I7Τ7 ~ ^ / 6851 V. Description of the invention (39 Α7 Β7 uses [S 7] instead of [S 1], the same operation as in Example 1 and% $ has a film with a rough surface and Light diffusing reflector, evaluate it. The results are shown in the table —__ Transparency, heat resistance, adhesiveness 94.0% 99.2% 100/100 2 9 3.5% 9 8.8% 100/100 93.8% 97.5% 100/100 4 94.2% 98.5 % 100/100 5 9 3.1% 9 8.5% 100/100 93.4% 98.0% 100/100 ϊ ^^ ίΐ 7 94.0% 9 8.7% 100/100 Example 8 Light diffusion characteristics; Employee Consumer Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs Printed using a three-dimensional variable angle photometer (made by Murakami Color Technology Research Co., Ltd.) for the light diffusion and reflection plates formed in Examples 1 and 7, the angles were changed from 10 ° Μ 7 0 ° to 30 ° ° Scattering characteristics at incidence. The results are shown in Fig. 5. From the above examples, it can be confirmed that those obtained from the composition of the present invention The film has excellent adhesion, heat resistance, and transparency to the substrate, and the light diffusion reflective plate with metal evaporation has excellent light diffusion characteristics. This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) _ 42-576851 A7 B7 V. Description of the invention (4〇) [Effects of the invention] (Please read the precautions on the back before filling this page) According to the present invention, a rough surface for light diffusion reflectors is provided, and The substrate is excellent in adhesiveness, heat resistance, and transparency, and can easily form a composition for a film for a light diffusion reflection plate of a reflective or semi-transmissive liquid crystal display element. In addition, the present invention provides a composition having excellent diffusion characteristics Light diffusive reflection plate and excellent liquid crystal display element with the reflection plate. Brief description of the diagram [Fig. 1] is a schematic diagram of the structure of a liquid crystal display element. [Fig. 2] is a schematic diagram of the structure of a liquid crystal display element. Figure 3] Schematic diagram of the structure of a liquid crystal display element. [Figure 4] Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. Schematic diagram. [Figure 5] It is a graph showing the scattering characteristics at 30 ° incidence. [Explanation of symbols] 1 Substrate 2 Film for light diffusion and reflection plate -43- This paper size applies Chinese National Standard (CNS) A4 Specifications (210X297 mm) 576851 A7 V. Description of the invention ⑷) 3 metal layer 2 3 light diffusion reflection plate 4 color filter layer 5 electrode 6 liquid crystal layer 7 counter electrode 8 counter substrate -------- l · ------ Equipment ------.-- Order ----- (Please read the notes on the back before filling out this page) Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper is applicable to China Standard (CNS) A4 size (210X297 mm) -44-

Claims (1)

六、申請專利範圍 經濟部智慧財產局員工消費合作社印製 576851 第90 1 1 1 36 1號專利申請案Scope of patent application Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 576851 No. 90 1 1 1 36 patent application 民國92年7月25日修正 1 · 一種用於光擴散反射板之膜形成用組成物,其特 徵胃#有〔A〕 (a 1)不飽和羧酸及/或不飽和羧酸 ff' (a2)含有環氧基之不飽和化合物、(a3)上述 單體(a 1 )及(a 2 )以外之烯烴系不飽和化合物之共 聚牧及〔B〕粒子,而〔B〕成分之含有量對每1 ◦ 〇 重量份〔A〕爲60重量份以上300重量份以下。- 2 ·如申請專利範圍第i項之組成物,其中之〔b〕 粒子爲無機氧化物粒子、有機粒子或礦物粒子者。 3 ·如申請專利範圍第1項之組成物,係另含有多官 會g單體〔C〕及聚合起始劑〔D〕,而〔C〕成分之含有 量對每1 0 〇重量份〔A〕成分爲1 〇 — 2 0重量份,〔· D〕成分之含有量對每1 〇 〇重量份〔C〕成分爲 0 .〇1 — 6 Q重量份者。 4 ·如申請專利範圍第3項之組成物,其中之聚合起 始劑〔D〕係放射線感應性自由基聚合起始劑者。 5 .如申請專利範圍第3項之組成物,其中之聚合起 始劑〔D〕係熱感應自由基聚合起始劑,其含有量對每 1〇0重量份〔C〕成分爲〇.01-40重量份者。 6 .如申請專利範圍第1項之組成物,係另含有〔a 〕成分以外之環氧化合物〔Έ〕以及酸發生劑〔F〕,〔 A〕成分以外之環氧化合物〔E〕之含有量對每1 0 〇重 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) --穿-- (請先閲讀背面之注意事項再填寫本頁) 古.Amended July 25, 1992 1. A composition for forming a film for a light-diffusing reflective plate, characterized in that [A] (a 1) an unsaturated carboxylic acid and / or an unsaturated carboxylic acid ff '( a2) Copolymerization of unsaturated compounds containing epoxy groups, (a3) olefinic unsaturated compounds other than the monomers (a 1) and (a 2), and [B] particles, and the content of [B] component The [A] is 60 to 300 parts by weight per 1 part by weight. -2 · If the composition of the scope of application for item i, wherein [b] particles are inorganic oxide particles, organic particles or mineral particles. 3. If the composition in item 1 of the scope of the patent application contains additional monomers [C] and polymerization initiator [D], the content of the [C] component is 100 parts by weight [ A] The component is 10-20 parts by weight, and the content of the [· D] component is 0.01- 6 Q parts by weight per 100 parts by weight of the [C] component. 4. The composition as claimed in item 3 of the scope of patent application, wherein the polymerization initiator [D] is a radiation-induced radical polymerization initiator. 5. The composition according to item 3 of the scope of patent application, wherein the polymerization initiator [D] is a thermally induced radical polymerization initiator, and its content is 0.01 per 100 parts by weight of the [C] component -40 parts by weight. 6. If the composition of item 1 of the scope of the patent application contains an epoxy compound [Έ] other than the component [a] and an acid generator [F], an epoxy compound [E] other than the component [A] The quantity is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) per 100 weight of this paper.-Wear-(Please read the precautions on the back before filling this page) Ancient. 576851 經濟部智慧財產局員工消費合作社印製 A8 B8 C8 D8 六、申請專利範圍 4份〔A〕成分爲丨一2 5 0重量份,酸發生劑〔F〕之 t有量對〔A〕成分及〔E〕成分合計量每1 〇 0重量份 爲〇 · 05 — 20重量份者。 7 .如申請專利範圍第6項之組成物,其中之酸發生 劑〔F〕爲放射線感應性酸發生劑者。 8 .如申請專利範圍第6項之組成物,其中之酸發生 劑〔F〕係熱感應酸發生劑者。 9 ·如申請專利範圍第1項之組成物,係對每1 〇 〇 重量份〔A〕另含有〇 _ 〇 5 — 2 0重量份酸發生劑〔F 〕者。 1 0 .如申請專利範圍第9項之組成物,其中之酸發 生劑〔F〕爲放射線感應性酸發生劑者。 1 1 .如申請專利範圍第9項之組成物,其中之酸發 生劑〔F〕爲熱感應酸發生劑者。 1 2 . —種光擴散反射板之製造方法,其特徵係包括 下列步驟: (1 )於基體之表面形成申請專利範圍第4、7及 1 0項中任一項之組成物之塗膜、 (2 )以放射線照射該塗膜表面至少一部份之步驟、 (3 )於以上形成之膜之表面形成金屬膜之步驟。 1 3 . —種光擴散反射板之製造方法,其特徵係包括 下列步驟: (1 )於基體之表面形成申請專利範圍第5、8及 1 1項中任一項之組成物之塗膜、 U3- (請先閱讀背面之注意事項再填寫本頁) 、言576851 Printed by A8, B8, C8, D8, Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 6. The scope of patent application is 4 parts. [A] The composition is 丨 2 50 parts by weight. The amount of acid generator [F] is equal to [A]. And [E] The total amount of the components is 0.05 to 20 parts by weight per 100 parts by weight. 7. The composition according to item 6 of the patent application, wherein the acid generator [F] is a radiation-sensitive acid generator. 8. The composition according to item 6 of the patent application scope, wherein the acid generator [F] is a heat-sensitive acid generator. 9 · If the composition of item 1 of the scope of the patent application is for those that contain __ 05-20 parts by weight of the acid generator [F] per 100 parts by weight of [A]. 10. The composition according to item 9 of the scope of patent application, wherein the acid generator [F] is a radiation-sensitive acid generator. 1 1. The composition according to item 9 of the scope of patent application, wherein the acid generator [F] is a heat-sensitive acid generator. 1 2. A method for manufacturing a light diffusive reflection plate, which is characterized by including the following steps: (1) forming a coating film of the composition of any of claims 4, 7 and 10 on the surface of the substrate, (2) a step of irradiating at least a part of the surface of the coating film with radiation, and (3) a step of forming a metal film on the surface of the film formed above. 1 3. A method for manufacturing a light-diffusing reflection plate, which is characterized by including the following steps: (1) forming a coating film of the composition of any one of claims 5, 8 and 11 on the surface of the substrate, U3- (Please read the notes on the back before filling this page) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -2 - 576851 A8 B8 C8 一 D8 六、申請專利範圍 (2 )將該塗膜加熱之步驟、 (3 )於以上形成之膜之表面形成金屬膜之步驟。 1 4 . 一種光擴散反射板,係具有由申請專利範圍第 1項之組成物所形成之膜者。 1 5 .如申請專利範圍第1 4項之光擴散反射板,其 係作爲液晶顯示元件使用。 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家梂準(CNS)A4規格(210x297公嫠) ~This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) -2-576851 A8 B8 C8-D8 VI. Patent application scope (2) The step of heating the coating film, (3) The film formed above Forming a metal film on the surface. 1 4. A light-diffusing reflecting plate having a film formed from the composition of the scope of claim 1 of the patent application. 15. The light-diffusing reflecting plate according to item 14 of the scope of patent application, which is used as a liquid crystal display element. (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper size applies to China National Standard (CNS) A4 (210x297 cm) ~
TW090111361A 2000-09-18 2001-05-11 Composition for forming film used for light diffusing-reflective substrate, light diffuse-reflective substrate and preparation method thereof, and liquid crystal display TW576851B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7867602B2 (en) 2006-12-25 2011-01-11 Eternal Chemical Co., Ltd. Scratch-resistant optical film

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4193591B2 (en) * 2003-05-28 2008-12-10 ソニー株式会社 Polarization separation element
JP4687027B2 (en) * 2004-01-30 2011-05-25 Dic株式会社 Curable resin composition, transfer material and method for forming protective layer

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0862836A (en) * 1994-08-26 1996-03-08 Konica Corp Picture forming material and picture forming method
JPH10333324A (en) * 1997-04-03 1998-12-18 Toray Ind Inc Photosensitive paste
JP3993691B2 (en) * 1997-09-24 2007-10-17 関西ペイント株式会社 Resist pattern forming method
JP2000029212A (en) * 1998-07-10 2000-01-28 Taiyo Ink Mfg Ltd Photosetting-thermosetting resin composition and resinous insulation pattern forming method
JP2000121813A (en) * 1998-10-21 2000-04-28 Sumitomo Chem Co Ltd Reflection plate
JP3640008B2 (en) * 1999-02-23 2005-04-20 シャープ株式会社 Reflective plate for liquid crystal display device, method for producing the reflective plate, and reflective liquid crystal display device
JP3310234B2 (en) * 1999-02-25 2002-08-05 シャープ株式会社 Method of manufacturing reflection plate for reflection type liquid crystal display device
JP2000250026A (en) * 1999-02-25 2000-09-14 Sumitomo Chem Co Ltd Liquid crystal display device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7867602B2 (en) 2006-12-25 2011-01-11 Eternal Chemical Co., Ltd. Scratch-resistant optical film

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