TW562911B - Refillable ampule and method re same - Google Patents

Refillable ampule and method re same Download PDF

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Publication number
TW562911B
TW562911B TW91115800A TW91115800A TW562911B TW 562911 B TW562911 B TW 562911B TW 91115800 A TW91115800 A TW 91115800A TW 91115800 A TW91115800 A TW 91115800A TW 562911 B TW562911 B TW 562911B
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Taiwan
Prior art keywords
water level
valve
metal container
purity
refilling
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TW91115800A
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Chinese (zh)
Inventor
Stephen H Siegele
Craig M Noah
John N Gregg
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Advanced Tech Materials
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Priority claimed from US09/906,161 external-priority patent/US6557593B2/en
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Abstract

A highly reliable bulk chemical delivery system for high purity chemicals employing a manifold that ensures contamination free operation and canister change outs with a minimum of valves and tubing.

Description

562911 五、發明說明(1) 相關申請案 本申請案為亦正在審查中之由StePhen H, Siegele等人 於西元一九九八年一月二十六曰申請之美國專利申請第 0 9 / 0 1 3,3 2 7號「高純度化學品之化學品再填充系統」的部 分連續申請案。此外,該由Stephen H,Siegele等人於西 元一九九八年一月二十六曰申請之美國專利申請第 0 9 / 0 1 3,3 2 7號「高純度化學品之化學品再填充系統」案, 納入本申請案,謹供參酌。562911 V. Description of the invention (1) Related applications This application is also under review and is currently under review by the United States Patent Application No. 0 9/0, filed by StePhen H, Siegele, et al. On January 26, 1998. 1 3, 3 2 7 Partial applications for "Chemical Refill System for High Purity Chemicals". In addition, the US Patent Application No. 09/0 1 3, 3 2 7 "Refilling of High-Purity Chemicals" by Stephen H, Siegele, et al., Dated January 26, 1998 The "system" case is incorporated in this application for your reference.

本申請案為由Stephen Η, Siegele等人於西元一九九五 年六月七日申請且於一九九八年一月二十七日公告之美國 專利第5,7 1 1,3 5 4號「高純度化學品輸送系統之水位控制 系統」的部分連續申請案。該專利係曾與由Stephen Η, Siegele等人於西元一九九八年一月二十六曰申請之美國 專利申請第0 9 / 0 1 3,3 2 7號「高純度化學品之化學品再填充 系統」一起被審查。此外,該由Stephen Η,Siegele等人 於西元一九九五年六月七日申請且於一九九八年一月二十 七曰公告之美國專利第5, 71 1,354號「高純度化學品輸送 系統之水位控制系統」案,納入本申請案,謹供參酌。This application is U.S. Patent No. 5,7 1 1,3 5 4 filed by Stephen J, Siegele et al. On June 7, 1995 and published on January 27, 1998. Part of the serial application for "Water Level Control System of High Purity Chemical Conveying System". This patent is related to U.S. Patent Application No. 0 9/0 1 3, 3 2 7 "Chemicals of High-Purity Chemicals" filed by Stephen J., Siegele, et al. On January 26, 1998. "Refill System" was reviewed together. In addition, U.S. Patent No. 5,71 1,354, "High Purity," filed by Stephen J., Siegele, et al. On June 7, 1995 and published on January 27, 1998 The "Water Level Control System for Chemical Conveying System" case is incorporated into this application for your reference.

本申請案為由Stephen Η,Siegele等人於西元一九九五 年六月七日申請且於一九九六年十月八日公告之美國專利 第5,5 6 2,1 3 2號「高純度化學品輸送系統之集裝容器」的 部分連續申請案。該專利係曾與由Stephen H, Siegele等 人於西元一九九五年六月七日申請且於一九九八年一月二 十七曰公告之美國專利第5,711,3 5 4號「高純度化學品輸This application is U.S. Patent No. 5,5 6 2, 1 32, filed by Stephen J, Siegele et al. On June 7, 1995 and published on October 8, 1996. "Container containers for high-purity chemical delivery systems". This patent was filed with US Patent No. 5,711, 3 54, filed with Stephen H, Siegele et al. On June 7, 1995 and published on January 27, 1998. "High purity chemicals

C:\2D-CODE\91-09\91115800.ptdC: \ 2D-CODE \ 91-09 \ 91115800.ptd

562911 五、發明說明(2) 送系統之水位控制系統」一起被審查。此外,該由 Stephen Η, Siegele等人於西元一九九五年六月七日申請 且於一九九六年十月八日公告之美國專利第5, 5 62, 1 32號 「高純度化學品輸送系統之集裝容器」,納入本申請案, 謹供參酌。 本申請案為由Stephen H, Siegele等人於西元一九九五 年六月七日申請且於一九九七年一月七日公告之美國專利 第5,5 9 0,6 9 5號「高純度化學品輸送系統之岐管系統」的 部分連續申請案。該專利係曾與由Stephen H, Siegele等 人於西元一九九五年六月七日申請且於一九九八年一月二 十七曰公告之美國專利第5,7 11,3 5 4號「高純度化學品輸 送系統之水位控制系統」一起被審查。此外,該由 Stephen Η, Siegele等人於西元一九九五年六月七日申請 且於一九九七年一月七日公告之美國專利第5, 590, 695號 「高純度化學品輸送系統之岐管系統」案,納入本申請 案’謹供參酌。 本申請案為由Stephen Η,Siegele等人於西元一九九七 年三月十二日申請且於一九九九年三月九日公告之美國專 利第5,8 7 8,7 9 3號「可再填充式安瓿及其製法」的部分連 續申請案。該專利係曾與由Stephen Η,Siegele等人於西 元一九九五年六月七日申請且於一九九七年一月七日公告 之美國專利第5,5 9 0,6 9 5號「高純度化學品輸送系統之岐 管系統」一起被審查。此外,該由Stephen Η, Siegele等 人於西元一九九七年三月十二日申請且於一九九九年三月562911 V. Description of the invention (2) Water level control system of the delivery system "was reviewed together. In addition, U.S. Patent No. 5, 5 62, 1 32, filed by Stephen J, Siegele et al. On June 7, 1995 and published on October 8, 1996 "Container container for product conveying system" is incorporated in this application for your reference. This application is U.S. Patent No. 5,5 9 0, 6 9 5 filed by Stephen H, Siegele, et al. On June 7, 1995 and published on January 7, 1997. The "manifold system for high-purity chemical delivery system" is part of a continuous application. The patent was filed with US Patent No. 5,7 11,3 5 4 which was filed with Stephen H, Siegele et al. On June 7, 1995 and published on January 27, 1998. No. "Water level control system for high-purity chemical delivery system" was reviewed together. In addition, the US Patent No. 5,590, 695, filed by Stephen J, Siegele, et al. On June 7, 1995 and published on January 7, 1997, "High-Purity Chemical Delivery" The "manifold system of systems" case is incorporated in this application 'for your reference. This application is U.S. Patent No. 5,8 7 8,7 9 3, filed on March 12, 1997 by Stephen J, Siegele et al. And published on March 9, 1999. "Refillable ampoule and its manufacturing method" part of the serial application. The patent was filed with US Patent No. 5,59 0,6 9 5 which was filed by Stephen J, Siegele, et al. On June 7, 1995 and published on January 7, 1997. The "manifold system for high-purity chemical delivery system" was reviewed together. In addition, the application was filed by Stephen J, Siegele, et al on March 12, 1997 and in March 1999.

C:\2D-CODE\91-09\91115800.ptd 第5頁 562911 五、發明說明(3) 九曰公告之美國專利第5, 878, 793號「可再填充式安瓿及 其製法」案,納入本申請案,謹供參的。 本申請案為由Stephen Η,Siegele等人於西元一九九四 年十一月二十八日申請且於一九九七年三月四日公告之美 國專利第5,6 0 7,0 0 2號「高純度化學品之化學品再填充系 統」的部分連續申請案。該專利係曾與由Stephen Η, Siegele等人於西元一九九四年一月十九日申請且現已放 棄之美國專利申請第〇8/ 1 84, 226號案一起被審查。此外, 該由Stephen Η, Siegele等人於西元一九九四年十一月二 十八日申請且於一九九七年三月四日公告之美國專利弟 5,6 0 7,0 0 2號「高純度化學品之化學品再填充系統」案, 納入本申請案,謹供參酌。 本申請案為由Stephen Η,Siegele等人於西元一九九四 年一月十九曰申請且現已放棄之美國專利申請第 08/184, 226號的部分連續申請案。此外,該由Stephen Η, Siegele等人於西元一九九四年一月十九日申請且現已放 棄之美國專利申請第08/ 1 84, 226號案,納入本申請案,謹 供參酌。 本申請案為由Stephen Η,Siegele等人於西元一九九六 年七月十八曰申請且現已放棄之美國專利申請第 08/683,178號的部分連續申請案。此外,該由Stephen Η,C: \ 2D-CODE \ 91-09 \ 91115800.ptd Page 5 562911 V. Description of the Invention (3) US Patent No. 5,878,793 published on the 9th "Refillable Ampoule and Its Manufacturing Method" case, This application is incorporated for your reference. This application is U.S. Patent No. 5,6 0 7,0 0, filed on November 28, 1994 by Stephen J, Siegele, et al. And published on March 4, 1997. Part of the continuous application for "No. 2 Chemical Refill System for High Purity Chemicals". This patent was examined together with US Patent Application No. 08 / 184,226, filed by Stephen J, Siegele, et al., On January 19, 1994, and is now abandoned. In addition, this US patent application filed by Stephen J., Siegele et al. On November 28, 1994, and published on March 4, 1997, was 5,606,200. Case No. "Chemical Refill System for High-Purity Chemicals" was incorporated into this application for your reference. This application is a partial continuous application of US Patent Application No. 08/184, 226, filed by Stephen J, Siegele et al. On January 19, 1994, and has now been abandoned. In addition, the U.S. Patent Application No. 08 / 184,226, filed by Stephen J, Siegele, et al. On January 19, 1994, has been abandoned and is hereby incorporated into this application for your consideration. This application is part of a serial application of US Patent Application No. 08 / 683,178, filed by Stephen J, Siegele et al. On July 18, 1996, and has been abandoned. In addition, by Stephen 由,

Siegele等人於西元一九九六年七月十八日申請且現已放 棄之美國專利申請第0 8/ 683, 1 78號案,納入本申請案,謹 供參酌。Siegele et al., US Patent Application No. 0 8/683, 1 78, filed on July 18, 1996 and is now abandoned, is incorporated into this application for your consideration.

C:\2D-CODE\91-09\91115800.pld 第6頁 562911 五、發明說明(4) " * 本申請案為由Stephen H,Siegele等人於西元一九九三 年四月二=八日申請且於一九九五年十一月十四日公告: 美國專利第5,4 6 5,7 6 6號「高純度化學品之化學品再填充 系統」的~部分連續申請案。該專利係曾與由stephen H,C: \ 2D-CODE \ 91-09 \ 91115800.pld Page 6 562911 V. Description of the invention (4) " * This application was submitted by Stephen H, Siegele et al., April 2, 1993. It was filed on the 8th and announced on November 14, 1995: US Patent No. 5, 4 6 5, 7 6 "Serial Refilling System for High-Purity Chemicals" ~ Partial Application. This patent was previously filed with stephen H,

Siegele等人於西元一九九五年六月七日申請且於一九九 七年一月七日公告之美國專利第5, 59〇, 6 95號「高純度化 學品輸送系統之岐管系統」案—起被審查。此外,該由 Stephen H, Siesele 笔人认立一 , 由抹見於一 Λ Γ 西70 一九九三年四月二十八日 5 t五年十一月十四曰公告之美國專利第 =太申Λ 度化學品之化學品再填充系統」案, 、、内入本申5月案,謹供參酌。 發明之技術領^ 本發明之領域係關於化學口 品輸送系統之岐管和水位二^ 糸統,特別係關於化學 可信賴之高純度化學品之隼二:2 1更係關於-種高度 保無污染運作之岐管,# 了凌化予品輸送系統,其運用確 發明t背景 並M最少閥和管組來置換罐。 使用於積體電路製造之〇 有令人滿意之產能。隨者:;跋而具備超高之純度,以 源化學品純度之要求則隨 ^電路之尺寸漸小,維持供給 間介電層厚度之減小,污^提^ °此乃因為隨者線距及中 產生不良影響。 木較容易對積體電路之電子特性 一種使用於積體電路製 矽烷(TEOS)。TEOS之化^ 造之超高純度化學品為四乙基氧 式為(C2H5〇)4Si。TEOS業已廣泛Siegele et al., U.S. Patent No. 5,590.0,95, filed on June 7, 1995 and published on January 7, 1997, `` Manifold System for High-Purity Chemical Delivery Systems The case was examined. In addition, the author identified one by Stephen H, Siesele, and the other by U.S.A. Λ Γ West 70 April 28, 1993 5 t Five years, November 14th, the United States Patent No. = Tai The “Re-Chemical Refilling System for Chemicals” application case is incorporated in the May case of this application for your reference. Technical Field of the Invention ^ The field of the present invention is about the manifold and water level of the chemical oral product delivery system ^, especially the second aspect of chemically reliable high purity chemicals: 2 1 is more about-a kind of high security The manifold for pollution-free operation uses the Linghua pre-product conveying system, which uses the invention to minimize the number of valves and tube sets to replace the tank. Used in integrated circuit manufacturing. Satisfactory production capacity. Followers :; Postgraduate with ultra-high purity, the requirements of the purity of the source chemical will gradually decrease with the size of the circuit, to maintain a reduction in the thickness of the dielectric layer between the supply, and to increase the pollution ^ ° This is because the follower line Distance and medium have an adverse effect. Wood is easier to use for electronic characteristics of integrated circuits. It is a kind of silane (TEOS) used in integrated circuits. The ultra-high purity chemical produced by TEOS ^ is tetraethyloxy with the formula (C2H50) 4Si. TEOS has been extensive

562911 五、發明說明(5) 使用於例如化學氣相沈積(CVD )之積體電路製造作業,以 形成諸二氧化矽膜。該諸共形膜係在高溫低壓(LpcvD) 了 或於電漿增強及常壓反應器(PECVD,APCVD)中在低溫下當 TEOS之分子分解時產生。TEOS通常用來作為無摻雜2和^ 部摻雜之中間介電層、金屬層間介電層、側壁間隙壁及溝 槽填充等的應用。 積體電路製造商對於金屬圖案通常需要99. 999999% (8 - 9 ’ s + % )以上純度的T E 0 S。總體而言,該τ £ 〇 S必需展現 99· 99%以上之純度。該高純度係維持令人滿意產能所必要 的。惟其亦必需使用特殊裝備以收納並輸送該高純度7£:〇3 至CVD反應室。 傳統上,高純度TEOS係自一稱為安瓶之小型容器,送至 CVD反應室。長久以來,倶堅信安瓿不能為金屬質,且沒 有金屬可在安瓿中與該高純度TEOS或其他供給源化學品接 觸。基於使用在半導體製造產業之高純度TEOS和其他高純 度之供給源化學品可能自該金屬質容器以分解金屬離子型 式而產生污染的信念,業界曾排拒金屬安瓶之使用。故石 英安瓿幾為業界所專用。 當此等相當小之石英安瓿成為空安瓿時,便簡易地以一 滿裝之安瓿替換之。該安瓿並不於製造區中再填充。該空 的安訊係送回可洗滌且再填充該安訊之化學品廠商。 使用石英安瓿之不方便性在於因其體積小而必需經常地 加以置換,增加設備損壞之可能。而且’石英安瓶易於破 裂,且囿於其設計而無法具多用途功能。同時,石英之耐562911 V. Description of the invention (5) It is used for manufacturing integrated circuit such as chemical vapor deposition (CVD) to form silicon dioxide films. The conformal membranes are produced at high temperatures and low pressures (LpcvD) or in plasma enhanced and atmospheric reactors (PECVD, APCVD) at low temperatures when TEOS molecules decompose. TEOS is typically used as an application of undoped 2 and ^ -doped intermediate dielectric layers, interlayer dielectric layers, sidewall spacers, and trench fills. Integrated circuit manufacturers usually require T E 0 S with a purity of 99.999999% (8-9 s +%) for metal patterns. In general, the τ £ 〇S must exhibit a purity of 99.99% or more. This high purity is necessary to maintain satisfactory production capacity. However, it is also necessary to use special equipment to store and transport the high-purity 7 £: 03 to the CVD reaction chamber. Traditionally, high-purity TEOS is delivered from a small container called an ampoule to a CVD reaction chamber.倶 has long believed that ampoules cannot be metallic and that no metal can come in contact with this high-purity TEOS or other supply chemicals in the ampule. Based on the belief that high-purity TEOS and other high-purity supply chemicals used in the semiconductor manufacturing industry may decompose from metal ions to cause pollution, the industry has rejected the use of metal ampoules. Therefore, the ampoules are used exclusively by the industry. When these relatively small quartz ampoules become empty ampoules, they are simply replaced with a full ampule. The ampoule is not refilled in the manufacturing area. The empty Anxun was returned to a chemical manufacturer that could wash and refill the Anxun. The inconvenience of using a quartz ampoule is that it must be replaced frequently due to its small size, increasing the possibility of equipment damage. Furthermore, the 'quartz ampoule is easy to break, and because of its design, it cannot be used for multiple purposes. Meanwhile, the resistance of quartz

C:\2D-C0DE\91-09\91115800.ptd 第8頁 562911 五、發明說明(6) 熱性有其限度,使得安瓿之溫度難以控制。加上,缺乏有 效之石英與不銹鋼間之密封,過去即造成嚴重之漏問 題。 Μ… 為解決有關石英安瓶之問題,至少一超高純产化學口口供 應商(Advanced Delivery & Chemical System、:0口司) 推翻業界中高純度之供給源化學品 人 . I興金屬相接觸之信 心,而發展出一種不銹鋼安瓿。此種安瓿 純度TEOS及其他高純度之供給源化學σ 用以直接將问 /外丨U干迗至丰導 備。如同石英安瓶般,當其變空時,並、 且、 係送回供應商處予以洗滌與再填充。 以再填充,而 使用不鏽鋼安瓿仍有諸多問題,芸 ^ 使得必需經常性地置換之。同時,i t瓿之體積小, 器曾作為安瓿中之高純度TEOS達一低水^央棒之光學感應 光學感應器(其運用光放射二極體和結人立之^偵測。可惜, 器)需要高度維修,因為倘經衝撞其便 英棒之光偵測 且,感應器之調整電路易受校準偏差,產生偏移。而 應輸出信號。此等問題可導致安瓿流=、’導致錯誤之感 空或全滿之安瓿。光學感應器之另一L ^ =導致過早移除未 送和洗滌時破裂,且需要經常置換。 =方、其4易在運 金屬離子污染該高純度化學品,雖麸二金屬粒子和 應器過去廣泛用於較可信賴之金屬;=,光學感 為解決經常置換不鏽鋼安瓶之 桶’以再填充該較小之不鏽鋼錢加 夕問通伴隨著光學水位式感應器,該桶亦使用光學^諸 子水位式C: \ 2D-C0DE \ 91-09 \ 91115800.ptd Page 8 562911 V. Description of the invention (6) The thermal property has its limits, making it difficult to control the temperature of the ampoule. In addition, the lack of effective sealing between quartz and stainless steel has caused serious leakage problems in the past. Μ ... In order to solve the problem of quartz ampoule, at least one ultra-high-purity chemical mouth supplier (Advanced Delivery & Chemical System, 0 mouth division) overthrow the industry's high-purity supply source chemicals. I 兴 金属 相Contact with confidence and developed a stainless steel ampoule. This ampoule-purity TEOS and other high-purity supply-source chemistry σ are used to directly dry the Q / U to U.S. equipment. Like a quartz ampoule, when it becomes empty, it is returned to the supplier for washing and refilling. To refill, there are still many problems with the use of stainless steel ampoules, making it necessary to replace them frequently. At the same time, it has a small volume. It was used as an optical sensor for high-purity TEOS in ampoules. It has a low water ^ central rod. (It uses a light emitting diode and a built-in detector. Unfortunately, the device ) It needs high maintenance, because if it collides with it, the light detection of the rod will be easy, and the adjustment circuit of the sensor is susceptible to calibration deviation and offset. Instead, a signal should be output. These problems can lead to ampoule flow =, 'cause false sense of empty or full ampoule. Another L ^ = of the optical sensor leads to premature removal, rupture during washing and washing, and requires frequent replacement. = Fang, Qi 4 It is easy to transport metal ions to contaminate the high-purity chemical, although bran metal particles and reactors have been widely used in more reliable metals in the past; =, the optical sense is to solve the frequent replacement of stainless steel ampoules' barrels. Refill the smaller stainless steel Qian Jiaxi Wentong with the optical water level sensor, the barrel also uses optical ^ Zhuzi water level

C:\2D-CODE\9l-09\9lll5800.ptd 562911C: \ 2D-CODE \ 9l-09 \ 9lll5800.ptd 562911

F之债測。和前述架構中之女咅瓦 L,而係送回供應商處’加以洗 自之體積和重量,其於運送並更 、安瓿為多之物理震動,故以習 卜、統中供給源化學品之低水位’ 反導致較高之出問題頻率。 抑再者’該再填充架構中,該等安瓿中需有第二光學感應 為其具有所有該等感應器之問題),以於再填充處理際指 出安瓶已填滿。在某些情況,其需於安瓿中另開一孔洞, 此開洞效盈係負面的,因為其會產生洩漏及污染點等額外 可能性。 為克服有關光學感應器之問題,利用一金屬水位感應器 來偵測五加侖集裝容器中高純度化學品之低水位。該:屬° 水位感應器一般係由不銹鋼製成之環形浮筒所組成,該浮 筒則固定於由電拋光不鏽鋼製成之中空軸上。該浮筒包含 一固定磁石。數位舌簧繼電器固設於在警示觸發點處之軸 内側的固定位置處。當浮筒經過該舌簧繼電器時,該固定 磁石將改變其狀態,故導致低水位警示情況之顯示。一 ^ 換筒接者將會取而代之。因為該磁性舌簧開關為一低故障 機械式開關且提供確實之開/關切換,用於金屬浮筒水位 式感應器中之該數位磁性舌簧繼電器,對於分置筒内之供 給源化學品的低水位偵測係較為可靠。如以往者,使用者 絕不再填充該空的五加侖容器’而係如往常般送回化學品 供應商,加以洗條和填充。 562911 五、發明說明(8) 低=位2屬洋筒感應器近來亦多用於不鏽鋼安瓿中— ί ,之&慮’使用者並不再填充該安瓶,而且僅用於 純度屬或其他f般,當金屬水位感應器指示高 ☆ #且4、,他π純度之供給源化學品之水位在低處時, Ϊ二& Μ ^ Β+滿裝之安瓶置換之。當安親被用於任何再填 純度蘭或其他以::中使用金屬水位感應器谓測高 於再填充式系統中之;η:化學品之水位情事。使用 可移動件之感應=*瓶亚未使用浮動式感應器或其他具 因為業界堅信金Μ彻a Μ 0日 之掉落和金屬離子乂屬?之滑動接觸會導致金屬粒子 純度TEOS或其他高吨而污染輸送系、统中所用之高 應器並不用於再;給源化學品’…屬水位感 安瓶係以置換桶二乃因為獨立系統中,該桶或 八w® f女°瓦在其使用之後分別相替換。而且, 71 ,忒桶或安瓿係於再填充以供再次使用之前 條因:洗條和再填充倶在遠處由供給源化ΐ = :^ 獨立系統中金屬浮筒浮動之量僅限於一填 滿及用光過程。另一方而$ ^ , 里惶I艮万、填 处狳伤定期岫白、土老 ’再填充糸統中’該安瓿每次用F's debt test. And the son-in-law tile L in the aforementioned structure, but returned to the supplier's volume and weight, washed and transported, the physical vibration of the ampoule is more, so the source chemical 'Low water level' in turn leads to higher frequency of problems. Furthermore, in the refilling structure, the second optical sensor in the ampoules needs to have a problem with all of the sensors), so that the refilling process indicates that the ampoule is full. In some cases, it is necessary to make another hole in the ampoule. The effect of this hole is negative, because it will create additional possibilities such as leaks and contamination points. To overcome the problems associated with optical sensors, a metal water level sensor was used to detect the low water level of high purity chemicals in five gallon container containers. The: The water level sensor is generally composed of a stainless steel ring buoy, which is fixed on a hollow shaft made of stainless steel. The buoy contains a fixed magnet. The digital reed relay is fixed at a fixed position on the inner side of the shaft at the alarm trigger point. When the pontoon passes the reed relay, the fixed magnet will change its state, which will cause a low water level warning condition to be displayed. A ^ can changer will replace it. Because the magnetic reed switch is a low-fault mechanical switch and provides reliable on / off switching, the digital magnetic reed relay used in metal buoy water level sensors is suitable for the supply of chemicals in the separate cylinder. Low water level detection is more reliable. As in the past, the user never fills the empty five-gallon container ’, but sends it back to the chemical supplier for washing and filling as usual. 562911 V. Description of the invention (8) Low = position 2 is a foreign-style tube sensor. Recently, it is also used in stainless steel ampoules — ί, & the user is no longer filling the ampoules, and only used for purity or other In general, when the metal water level sensor indicates a high ☆ # and 4, when the water level of the source chemical of the π purity is low, the second & M ^ Β + full filled ampoules will replace it. When AnQin is used for any refilling, purity blue or other: The use of metal water level sensors in :: is higher than that in refilling systems; η: water level of chemicals. Induction using movable parts = * Bottle Asia does not use floating sensors or other devices. Because the industry firmly believes that gold and metal ions fall on the 0th day and metal ions? Sliding contact will cause the metal particle purity TEOS or other high tons to pollute the transportation system, and the high reactor used in the system is not used for re-use; the source chemical '... belongs to the water level sense ampoule system to replace the barrel two because of the independent system The bucket or eight-w® f female ° watts are replaced after use. Furthermore, 71, puppets or ampoules are attached before refilling for reuse: strip washing and refilling. Sourced by supply at a distance. =: ^ The amount of floating metal pontoons in an independent system is limited to one fill. And run out of process. On the other hand, $ ^, I am a genius, I ’m filling my wounds regularly, I ’m old, I ’m refilling the system, I ’m using this ampoule every time.

^統中’該安瓶在每次再填充間從未完 L ΐ其他高純度之供給源…。故積體電路 源化學品供應商—直有個不確塞之擔{,蓋持續以相同;^ In the system, the ampoule is never finished between refills. L ΐ other high-purity supply ... Therefore, the integrated circuit source chemical supplier-there is always an uncertain burden {, the cover continues to be the same;

562911 五、發明說明(9) ΐ =充奴日寸間後,安瓿中金屬離子之聚積和金屬粒子可 2 ^ 2 ί至一無法接受的地步。有鑑於該擔憂,即使瞭解 奸斤同水位式感應器於再填充系統中較具可信賴度,曾 ^用於再填充式系統之安瓶—直皆裝配著光學感應器或 具非移動件之感應器。 如上所記述者,因為光學感應器需有較高度之維護且易 於發生經常性錯誤,使用光學感應器之集裝化學品再填充 糸;統之可靠性-直被質《。當該光學感應器未能偵測低或 空」水位,該安瓿會於CVD處理過程中流乾。如前所述 及’此將毀損-整批晶JU,接著需花費數十至數百萬美元 加以處理或2加工。反言之’當光學感應器未能於再填充 過程中偵測高《「滿」水位’該安瓿會被過度填充,可能 導致所費不貲設備之損壞、纟費昂貴之高純度供給源化學 品(向純度TEOS每加侖約值美金二千元) (、九通常為等級-或等級,之潔淨室環境)、污染或損壞潔 淨至中之其他设備、破壞處理中之晶圓以及導致嚴重之人 身安全問胃。過去’為避免這些問題,半導體製造商業已 使用具有額外光學水位式感應器之再填充系統,以減小感 應器失效之衝擊’亦曾使用其他類型水位式感應器(非前 述之浮筒式感應器),利用一定時再填充、再填充一小固 定量或再填充-定量之化學品。言亥等再填充系統面臨著因 為非線性交錯式感應技術、再填充量之不確定性、化學 填充確實關閉之缺乏、0系統組件之校準誤差所致故障危 機或缺乏可信賴之集裝供給源化學品之水位伯測等所衍生562911 V. Description of the invention (9) ΐ = After the time of filling, the accumulation of metal ions and metal particles in the ampoule can reach 2 ^ 2 to an unacceptable level. In view of this concern, even if it is understood that the gangster and water level sensor are more reliable in the refilling system, the ampoules used in the refilling system-all are equipped with optical sensors or non-moving parts. sensor. As described above, because the optical sensor requires a high degree of maintenance and is prone to frequent errors, the container chemical using the optical sensor is refilled. The reliability of the system-direct quality. When the optical sensor fails to detect a low or empty water level, the ampoule will dry out during the CVD process. As mentioned earlier and 'this will destroy the entire batch of crystal JUs, which will then cost tens to millions of dollars for processing or processing. In other words, "When the optical sensor fails to detect a high" full "water level" during the refilling process, the ampoule will be overfilled, which may cause damage to the equipment and expensive high-purity supply chemicals. (Approximately USD 2,000 per gallon to TEOS purity) (9, usually a grade-or grade, clean room environment), contamination or damage to other equipment cleaned, damage to the wafer in process, and cause serious damage. Personal safety asks the stomach. In the past, 'to avoid these problems, semiconductor manufacturing businesses have used refill systems with additional optical water level sensors to reduce the impact of sensor failure.' Other types of water level sensors (not the aforementioned float type sensors have been used). ), Use a certain time to refill, refill a small fixed amount or refill-quantitative chemicals. Refill systems such as Yanhai are facing a crisis of failure due to non-linear staggered induction technology, uncertainty of refill volume, lack of chemical filling, closed system component calibration errors, or lack of reliable supply sources Derived from chemical level measurement

562911 五、發明說明(10) 之特性問題。因此,需要一可信賴之集裝化學品再填充系 統,供應用於必需維持高度化學品純度之場所,且必需具 有高度之無誤差再填充信心。 發明之槪.沭 本發明提供化學品輸送系統之岐管和水位偵測設計,且 特別關於一種高度可信賴之高純度化學品之集裝化學品輪 送系統’其運用確保無污染運作之岐管,並以最少閥和管 組來置換罐。本發明實質消除或減少前所發展供化學品A 运系統用之水位式感應設計有關之缺失和問題。 Μ562911 V. Characteristics of invention description (10). Therefore, a reliable containerized chemical refilling system is needed, which is supplied to the place where high chemical purity must be maintained, and it must have a high degree of error-free refilling confidence. Invention of the invention. The present invention provides a manifold and water level detection design for a chemical delivery system, and in particular, it relates to a highly reliable, high-purity chemical container chemical rotation system. Tube and replace the tank with a minimum of valves and tube sets. The invention substantially eliminates or reduces the defects and problems related to the water level sensing design developed for the chemical A transport system previously developed. Μ

基此,本發明之一目的在提供一和前述高純度化學σ 類型之其他化學品用之集裝化學品輸送系統,但其°°二 t靠之山支管以及於集裝化學品輸送系統中使用該 : 方法。 人$ < =特殊設置之管和闕組以及其方法和操 罐可無污染之虞地置換之。此於可再填 果 之集裝輸送系統特別有用。 異充式-純度化學 本?月上揭和其他目的'特徵以及優點由 肢例的詳細說明及隨附之圖式當可更加明白。 車又佳 為更完全瞭解本發明及其優點,請配合 ^Based on this, it is an object of the present invention to provide a container chemical conveying system for other chemicals of the high-purity chemical σ type as described above, but its branch pipe of °° 2 t and a container chemical conveying system Use this: method. People $ < = Specially set pipes and tanks, their methods and tanks can be replaced without risk of pollution. This is especially useful for refillable container handling systems. Heterocharge-purity chemistry The features and advantages of the Moon Reveal and other purposes' will be more clearly understood from the detailed description of the limbs and the accompanying drawings. Good car. For a more complete understanding of the invention and its advantages, please cooperate ^

下列詳細說明,圖中類似參考扁號係、Θ式,苓 中: 可、闲I你夺曰不類似特徵者, i明之詳細説明 本發明之諸較佳具體例係例示於諸圖 以指示不同圖式之類似元件和對應元件。痛似編號用The following detailed description, similar reference to the flat number system, Θ formula, Lingzhong: can, leisure, you are not similar to those who have similar characteristics, detailed description of the preferred embodiments of the present invention are illustrated in the drawings to indicate different Similar and corresponding elements of the drawings. Painful numbering

562911562911

較ίίΐ1"’詳广,明一種高純度化學品再填充系統之-2η具祖m統由三個主要功能組件構成:集裝罐 2卜:二”式不鏽鋼安瓿30以及控制單元4〇。該集裝罐 22 \=處之化學室中’該室具-輪送咬管/清洗面板 姑;# " °再填充式不鏽鋼安瓶30係將高純度TE0S或其他高 j度之供給源化學品送予如CVD反應器之半導體製造設 備,該控制單元40乃監控該再填充操作’並監視集裝容器 之水位。Compared with the "Long 1", it is clear that the -2n ancestral system of a high-purity chemical refilling system is composed of three main functional components: container tank 2b: two "type stainless steel ampoule 30 and control unit 40. The In the chemical room of the container tank 22 \ =, the room is equipped with a rotary bite tube / cleaning panel. The refillable stainless steel ampoule 30 is a high-purity TE0S or other high-degree source chemical The product is sent to a semiconductor manufacturing equipment such as a CVD reactor, and the control unit 40 monitors the refill operation 'and monitors the water level of the container.

集裝化學品再填充系統1 8具兩種基本操作模式··一正常 處理操作和一再填充操作模式。在正常處理操作下,可再 填充式安瓿30將高純度TE0S或其他高純度之供給源化學品 經由出口通道32輸送至半導體製造設備。出口通道32利用 習知處理連接法連接半導體處理設備。 本具體例中,可再填充式安瓿3〇包含一光學感應器34, 以經由如圖1 3所示之習知低水位式感應器/反應器介面電 路,傳遞一低水位信號予CVD反應器。當一低水位信號傳 ,,製造設備時,該設備將依其正常慣有操作方式運用該 4吕號’例如’其正常低水位内定程序。The container chemical refilling system 18 has two basic operation modes: a normal processing operation and a refilling operation mode. Under normal processing operations, the refillable ampoule 30 conveys high-purity TEOS or other high-purity supply chemicals to the semiconductor manufacturing equipment through the outlet passage 32. The exit channel 32 is connected to a semiconductor processing device using a conventional processing connection method. In this specific example, the refillable ampoule 30 includes an optical sensor 34 to pass a low-water-level signal to the CVD reactor via a conventional low-water-level sensor / reactor interface circuit as shown in FIG. 13. . When a low water level signal is transmitted, when the equipment is manufactured, the equipment will use the 4 Lu's, for example, its normal low water level preset procedure according to its normal customary operation mode.

圖2例示控制單元4〇之控制面板5 2的一較佳配置。控制 面板52包含五個開關:「主電源」切換開關、「壓按以測 試指示燈」開關、「放棄填充」開關、「壓按以填充」開 關以及「壓按靜音」開關。茲配合圖15、,詳細 說明該等開關之操作如下。 控制面板52同時包括若干發光指示燈,以報告集裝容器FIG. 2 illustrates a preferred configuration of the control panel 52 of the control unit 40. The control panel 52 includes five switches: a "main power" switch, a "press to test light" switch, a "discard fill" switch, a "press to fill" switch, and a "press to mute" switch. With reference to Figure 15, the operation of these switches is explained in detail as follows. The control panel 52 also includes several illuminated indicators to report the container

五、發明說明(12) 20和安瓿30中化 「正常容積」、「「^ 之狀態。該諸發光指示燈包括 充」、「安飯未再填奋」 空谷積」、「安瓶正再填 瓿在高水位」。 、」、「安瓿在雙高水位」以及「安 參照圖2,詳沭 a 操作方法。 '處理操作時一種控制單元40之較佳 正常處理操作時,集 不會改變。因此,「一二一的 中之供給源化學品水位應 「低容積」或「介六^吊容積」指示燈應保持亮著。惟倘 止。集裝容器20中水位★片以一滿裝容器置換 有詳細之解釋。 式感應益之操作於下述說明中會更 經過正常之處理操作 亮著,以顯干至枯Ϊ 女瓿未在填充」指示燈應仍 再填充式安哎30 Φ ^統並未處於再填充模式中。因為可 純度圓或其他高純度之供給源化 干。口的水位經過正常處理操作後會改變,該「安瓿在高 位」指不燈(其在再填充過程完成時係亮著)將保持亮著, $面純度TEOS或其他高純度之供給源化學品在可再填充式 安瓿30中之水位低於金屬水位感應器39之「安瓿在高水 位」觸發點41止。 ° 问7 /應注意者,倘「安瓿在雙高水位」指示燈在再填充過程 係如同「安親在高水位」般亮著的,該「安瓿在雙高水 位」指示燈將仍亮著,俟安瓿3〇中之高純度之供ς =化學 品降至金屬水位感應器3 9之「安瓿在雙高水位」觸發點V. Description of the invention (12) 20 and ampoule 30 Sinochem "normal volume", "state of" ^. The light-emitting indicators include filling "," Anfan is not refilled ", empty valley product", "Ampoule is re- Fill the ampoule at a high water level. " "", "Ampoules at double high water levels" and "Amp Refer to Figure 2 for details of the a method of operation. 'During the processing operation, a set of control unit 40's preferred normal processing operation, the set will not change. Therefore," One Two One The water level of the supply source chemical should be “low volume” or “Mei Liu ^ hanging volume” indicator light should remain on. But only if. The water level in the container 20 is replaced by a full container, as explained in detail. In the following description, the operation of the induction sensor will be brighter after normal processing to show that it is dry and dry. The female ampoule is not being filled. The indicator light should still be refilled. 30 Φ ^ System is not in refilling Mode. Because it can be dried with a purity circle or other high-purity sources. The water level of the mouth will change after normal processing operations. The "ampule is high" means that the light (which is on when the refill process is completed) will remain on, and the surface purity of TEOS or other high-purity supply chemicals The water level in the refillable ampoule 30 is lower than the "ampoules at high water level" trigger point 41 of the metal water level sensor 39. ° Question 7 / It should be noted that if the "ampoules at double high water level" indicator light is on like the "safety is at high water level" during the refilling process, the "ampoules at double high water level" indicator light will remain on , High purity supply in ampoule 30 = chemical drop to metal water level sensor 3 9 "ampoules at double high water level" trigger point

C:\2D-CODE\91-09\91]]5800.ptd 第15頁 562911 五、發明說明(13) 4 1 a以下。此情事下,該化學品水位將經過「安瓿在高水 位」觸發區而下降,故導致「安瓿在高水位」指示燈亮起 再接著如上所述般熄滅。 該再填充程序係自動地或半自動地啟動。該半自動程序 藉由彳呆作者以手動方式組裝安瓶3 0至再填充架構處。此之 完成乃關閉安瓿3 0上之出口閥3 6。此外,操作者將確認入 口閥38係關著的。 因為高純度TEOS或其他高純度之供給源化學品,於壓力 作用下,藉由例如氦之惰性氣體在正常操作際送至某些 CVD反應器,安瓿3〇或需被減壓並抽真空,以順利進行高 、:度T”或其他高純度之供給源化學品之傳輸過程。該減 i ‘ 4匕學氣相沈積技藝別中所用之標準技 ^ 而元成。減壓步驟之後,真空/壓力閥37便 Ξι供許⑽ 处Η之加@ π二 中。而對於其他安瓿3〇頂部 ; 厂'不致會有問題的應用情事,則並無加壓之心 半自動再填充過程需要操作者按下圖2中 。一 40之控制面板52上的「壓 ”工1早tl 「壓按以填充」開關,控制單S開::二壓按該 閱。,應用之狀況’高純度TEQS或其他高純:路4:中之 化學品隨後自集裝容器20流入安瓿3〇中。ν,、、又之供給源 閥42以氣動閥為較佳。當以一氣 控制壓力自才允告丨| S - I η ζ» "; 4乍為閥4 2時》装^^ 工制早兀40經過通道48輪送日4 # 、於 J迗日可開啟。用以開啟C: \ 2D-CODE \ 91-09 \ 91]] 5800.ptd Page 15 562911 V. Description of the invention (13) 4 1 a or less. In this case, the water level of the chemical will fall through the "Ampoule in High Water Level" trigger zone, which causes the "Ampoule in High Water Level" indicator to light up and then go out as described above. The refill procedure is initiated automatically or semi-automatically. This semi-automatic procedure manually assembles the ampoule 30 to the refill structure by the stupefying author. This is done by closing the outlet valve 36 on the ampoule 30. In addition, the operator will confirm that the inlet valve 38 is closed. Because high-purity TEOS or other high-purity source chemicals are sent under pressure to certain CVD reactors under inert gas such as helium during normal operation, the ampoule 30 may need to be decompressed and evacuated. In order to smoothly carry out the high, high degree T "or other high-purity supply source chemical transfer process. The standard method used in the vapor deposition technology is reduced. After the decompression step, the vacuum / Pressure valve 37 is provided for Xu ⑽ ⑽ @ @ π 二 中. For other ampoules, the top of the factory; no problematic application situation, there is no pressurized heart semi-automatic refilling process requires operators Press the button in Figure 2. The “press” button on the control panel 52 of the one 40 is the “press to fill” switch, and the control sheet S is turned on: two presses to read. Application Status ’High-purity TEQS or other high-purity: The chemicals in Road 4: then flow from the container 20 into the ampoule 30. The supply source valve 42 is preferably a pneumatic valve. Only when the pressure is controlled with one breath 丨 | S-I η ζ »" 4 is the valve 4 2 when it is installed ^^ The early system 40 is sent through the channel 48 to send the day 4 #, and may be on the next day On. Used to open

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氣或其他例如設備壓縮乾燦空氣之 之控制壓力的流動乃藉由控制單元 制。茲參酌圖1 5、1 5A和1 5B,詳述 閥4 2之控制壓力可為氮 加壓氣體。經過通道4 8 4 〇中之諸電磁閥加以控 遠等電磁閥之操作如下 集裝容器2 0以例如氦 開啟時,惰性氣體迫使 器2 0經過再填充管路4 4 安訊3 0中之金屬水位 位感應器3 9。金屬水位 給源化學品之二不同水 惟金屬水位感應器3 9亦 點式水位感應器並可為 中,金屬水位感應器3 9 式感應器。觸發點4 1乃 情況之用,而觸發點4 1 位」情況之用。 氣之惰性氣體連續加壓 高純度之供給源化學品 至安瓿3 0。 感應器總成2 1包含一高 感應器3 9以具有偵測安 位功能的雙水位式感應 可為單一水位式感應器 連纟買性式水位感應器。 為具兩個觸發點4 1和4 1 供偵測安瓿30中之「高 a則供偵測安瓿30中之 ’故當閥4 2 自該集裝容 水位金屬水 瓶3 0内之供 器為較佳。 或多重觸發 較佳具體例 a多之雙水位 水位」(滿) 「雙高水 當該金屬水位感應器3 9偵測得安瓿3 〇已滿,一信號經電 纜47迗至控制單元4〇。回應該信號,控制單元4〇不需操作 者之介入即關閉氣動閥42。同時,控制單元4〇於控制^板 52上產生二可聽聞且可識別之警報信號。倘金屬^位感應 器39之:高水位」觸發點41不作動,該金屬水位感應器39 之「雙南水位」觸發點4 1 a會取而代之,且將藉由控制單 元40内一獨立電路經電纜47,觸發並指示控制單元,告 知該安瓿30已滿。此「雙高」警報乃一種安全特徵,可二The flow of controlled pressure of air or other equipment such as compressed dry air is controlled by the control unit. Referring to Figures 15, 15A and 15B, the control pressure of valve 42 can be nitrogen pressurized gas. The solenoid valve is controlled by the solenoid valves in the channel 4 8 4 0. The operation of the solenoid valve is as follows: When the container 20 is opened with, for example, helium, the inert gas forces the device 20 through the refilling line 4 4 Metal water level sensor 3 9. Metal water level Two different types of water for the source chemical. The metal water level sensor 3 9 is also a point type water level sensor and can be a medium or metal water level sensor 3 9 type. The trigger point 41 is used for the situation, and the trigger point 41 is used for the situation. Continuously pressurize the inert gas with high purity supply chemicals to the ampoule 30. The sensor assembly 2 1 includes a high sensor 3 9 and dual water level sensing with a detection and positioning function. It can be a single water level sensor. There are two triggering points 4 1 and 4 1 for detecting the "Am" in the ampoule 30. Therefore, when the valve 4 2 is from the container water level metal water bottle 30, the supply is Better. Or multiple triggers. More specific examples a. Double water level "(full)" Dual high water. When the metal water level sensor 3 9 detects that the ampoule 3 is full, a signal via the cable 47 单元 to the control unit. In response to the signal, the control unit 40 closes the pneumatic valve 42 without operator intervention. At the same time, the control unit 40 generates two audible and recognizable alarm signals on the control panel 52. If the metal position The trigger point 41 of the "high water level" of the sensor 39 is not activated. The "shuangnan water level" trigger point 4 1 a of the metal water level sensor 39 will be replaced, and it will be triggered by a separate circuit in the control unit 40 via the cable 47. The control unit is instructed to inform that the ampoule 30 is full. This “double-height” alert is a safety feature.

562911 五、發明說明(15) 止安紙30之過度填充’並於「高水位」警告電路之電 用失效時停止再填充之進行,且參酌圖〗5、ΐ5Α*ΐ5β咩 ί下禮H t金屬水位感應器39僅為單-水位式感應/ 位之伯測。 况Ί被制侍’而無法提供安全水 控制單元40同時經電缆26與集裝容器2〇中之金屬水位 觸。該位於遠處集裝容器中之金屬水位Ϊ 39的觸rn設在剩餘2()%之供給源心 之供給源化學品為較佳…,亦可視特定處理之要匕 使用其他觸發點。倘供认湄仆與σ b y ^ 女永而 (其通常僅在再填充過= 板52上會有-可識別^「中低\=,制單元40之控制面 之低奋積」指示。倘供給源化學〇 ㈣聽聞之警報外,會有-可識;; 填充在控制面板52上產生,…動停止再 控2早兀40可同時架構成為於再填充過程時以手動 =者二種架構中,操作者將在收到可再填充式1 已滿之可識別或可辨卩卩- nTt u co 飞了恥聞私不盼,藉手動方式壓按控制面扭 上之按鈕,停止再填充過程。同樣地,可提供一全 :啟/自:關閉式架構。此之完成可以自動間(氣動者為2 /、、動真空/加壓閥π,且置入一壓力感應器於安瓿 之通道3 1内。_氣動閥和壓力感應器隨後連接控制單元 田安"瓦30於再填充過程開始際抽特定真空以使高純度 之供給源化學品易於流入安瓿30時,通道31中之壓力感應562911 V. Description of the invention (15) Overfilling of the security paper 30 'and stop the refilling when the electricity of the "high water level" warning circuit fails, and refer to the figure [5, ΐ5Α * ΐ5β 咩 ί 下 礼 H t The metal water level sensor 39 is only a single-level water level sensor / position. In addition, the system is unable to provide safe water. The control unit 40 is in contact with the metal water level in the container 20 via the cable 26 at the same time. The metal water level Ϊ 39 in the remote container is set at the remaining 2 ()% of the supply source. It is better to use the supply chemicals ... It is also possible to use other trigger points depending on the specific processing requirements. If the confession of Mae and σ by ^ female is permanent (which is usually only refilled = board 52 will have-identifiable ^ "medium low \ =, low struggling control surface of the control unit 40" instructions. If supply The source chemistry will hear the alarm, there will be-identifiable ;; filling is generated on the control panel 52, ... stop and re-control 2 early Wu 40 can be structured at the same time during the refill process to manually = , The operator will receive the refillable type 1 full of identifiable or recognizable 卩 卩-nTt u co flew the shameless private hope, by manually pressing the button on the control surface twist to stop the refilling process .Similarly, it can provide a full: open / self: closed structure. This can be completed automatically (pneumatic is 2 / ,, move the vacuum / pressure valve π, and a pressure sensor is placed in the channel of the ampoule 3 1 inside._The pneumatic valve and pressure sensor are then connected to the control unit Tian An " Wat 30. At the beginning of the refilling process, a specific vacuum is drawn to make high-purity supply chemicals easily flow into the ampoule 30. The pressure in the channel 31 is sensed.

562911 五、發明說明(16) 杰將通知控制早元4 〇。於回庫日本. P^7曰π n士扣„田话士 — 【^,控制單元40將關閉氣動 閱37且同時打開再填充管路44中 該再填充過程。 路44中之乳動閥42 ’故自動啟動 么幺將配合圖3,詳述一種特別佳 狀六哭9 rw; q彳以+ u 1 吁⑺佳之集爰容器2 0如下。集 衣今〇〇 2 0以3 1 6 L電抛光不錢鋼势成 八> 一“ & w ^ 哪衣成以減低污染桶中所包 八—曰仏以 子的危險。集裝容器20通常具五加 两谷里。惟車父大容量之罐可供作為鱼 以丄i ,L人 _ J 、作為集裝容器2 0之用,此包 括十和二十加侖容器。例如一或- π冰m ^ ^ J A 一加侖容器之較小容器亦562911 V. Description of the invention (16) Jie will notify the control early Yuan 40. In back to Japan. P ^ 7 π n Shikou „Tian Shishi — [^, the control unit 40 will close the pneumatic reading 37 and open the refilling process in the refilling line 44 at the same time. The milking valve in the road 44 42 'So it will start automatically with the help of Figure 3, a detailed description of a particularly good performance Liu Cui 9 rw; q 彳 + u 1 to call the best collection container 20 is as follows. Set clothes this year 002 2 to 3 1 6 L electro-polishing does not make money. The potential of the steel is "A" & The container 20 usually has five plus two grains. However, the car's large-capacity tanks can be used as fish, i, L, _J, and 20 containers, including ten and twenty gallon containers. For example one or-π ice m ^ ^ J A smaller container of one gallon container also

付使用之0集裝容器2 〇 #用L7白、告南W 及壯 > — 係用以自遂處將例如高純度TEOS之 集灰南純度供給源化學品钱5容坏q n #丄土土 ^ 子口口运主女口瓦30。該供給源化學品乃 精由連續加壓内部具有例如氦之惰松 巧〜即亥l < r月r生乳體罐,以立即依所 需再填充該可再填充式安瓿30。該惰性氣體經過入口㈣ 而提供。入口閥64連接輸送/清洗岐管22之通道⑽,並盥 該通道88相通,該輸送/清洗岐管22則與一惰性氣體源相 通。出口閥66同時利用岐管22連接至再填充管路44。故當 容器20以II氣或其他適當氣體加壓且氣動閥42開啟時,^ 純度TEOS或其他化高純度學品源被迫穿過出口管路6〇、出 口閥66、岐官22、再填充管路44、入口閥38,再進入可再 填充式安瓿30中。0 container container 2 〇 # Use L7 white, Gaonan W, and Zhuang> — It is used to self-supplied the high-purity TEOS collection ash south purity supply source chemical money 5rong bad qn # 丄 土Soil ^ Zikoukou transport master female mouth tile 30. The supply source chemical is a continuously pressurized inner container having, for example, helium, such as helium < rr raw milk tank, to immediately refill the refillable ampoule 30 as needed. The inert gas is supplied through the inlet ㈣. The inlet valve 64 is connected to the passage ⑽ of the delivery / washing manifold 22 and communicates with the passage 88, and the delivery / washing manifold 22 is in communication with a source of inert gas. The outlet valve 66 is also connected to the refill line 44 using the manifold 22. Therefore, when the container 20 is pressurized with II gas or other appropriate gas and the pneumatic valve 42 is opened, the purity TEOS or other high-purity chemical source is forced to pass through the outlet pipe 60, the outlet valve 66, Qiguan 22, and then The filling line 44 and the inlet valve 38 enter the refillable ampoule 30 again.

一具體例中,集裝容器20設置有金屬水位感應器總成 2 1 ’ 4總成2 1包括金屬水位感應器3 9,該感應器3 9以金屬 浮筒24觸發之雙極性舌簧開關組成為較佳。吾人當知,其 他型式之觸發器(例如霍爾效應感應器)或得使用之。該雙 極性舌簧開關經電纜26直接與控制單元40面接觸。金屬$In a specific example, the container 20 is provided with a metal water level sensor assembly 2 1 ′ 4 assembly 2 1 including a metal water level sensor 39, which is a bipolar reed switch group triggered by a metal buoy 24. Become better. We should know that other types of triggers (such as Hall-effect sensors) may be used. The bipolar reed switch is in direct surface contact with the control unit 40 via a cable 26. Metal $

C:\2D-CDDE\91 -09\91115800.ptd 第19頁 562911 五、發明說明(17) 位感應器3 9以雙水位式感應器為較隹,其中勺人 開關。雖然和可再填充式安瓿30中之厶,包含有二舌簧 接加甘叮a人 办批旦 金屬水位感應器39 — 樣,但其可包含任何所需數置之舌菩閔 尹、閉關,以偵測一式鉍 個之供給源化學品的水位,進一步t.,y A數 立式金屬水位感應器3 9言,或得個別#用甘ώ 獨 筒24。 文用具自己之金屬浮 金屬水位感應器39背後的操作原理係配合圖4和5中 示之單一水位式金屬感應器39來加以詳細敘述。金屬水二 感應器3 9乃由以不銹鋼或其他非磁性且不易起化與微^ 材料製成的環形金屬浮筒24構成。或者,金屬浮$二 一氟聚合物或其他不易起化學變化之塗声。* 土復 敉佳構成之材 料為316L不銹鋼。金屬浮筒24包含一固定絲 0 心域石23,並固掊 於一中空金屬轴28上。惟該軸28之底部係加以密封並延 至安瓿3 0中,以防止高純度之供給源化學品往上流入$ 軸。另外,金屬軸28以電拋光31 6L不鏽鋼或其他不易^化 學變化之材料製成者為較佳。或者,軸28以塗覆一 I ^合 物或其他不易起化學變化塗層之非磁性材料製成。轴2 8 口 内,一數位磁性舌簧繼電器開關RS固定於一預設警報觸發 點處之固定位置中。該觸發點對應例如「空容積」觸發言^ 定點。一套圈4 6則永久性地套接於軸2 8之一端,以連結容 器0 可於軸28内增加額外之舌簧繼電器開關RS,以形成多重 式水位偵測器。例言之,倘第二舌簧繼電器開關Rs增設至 軸28内之第二固定觸發點處,便建立一雙水位式浮筒感應C: \ 2D-CDDE \ 91 -09 \ 91115800.ptd Page 19 562911 V. Description of the invention (17) The position sensor 39 is a double-water level sensor, among which the person switches. Although it is similar to the refillable ampoule 30, it includes a two-reed spring connected with a Gan Ding metal water sensor 39, but it can contain any desired number of tongues. In order to detect the water level of one bismuth supply source chemical, further t., Y A digital vertical metal water level sensor 3 9 words, or have individual # 用 甘 ώ 独 筒 24. The operation principle behind the stationery's own metal floating metal water level sensor 39 is described in detail in conjunction with the single water level metal sensor 39 shown in Figs. The metal water sensor 39 is composed of a ring-shaped metal pontoon 24 made of stainless steel or other non-magnetic materials that are not easily lifted and micro-materials. Alternatively, the metal floats with fluoropolymer or other coatings that are not prone to chemical changes. * The material made by Tufujia is 316L stainless steel. The metal buoy 24 includes a fixed wire 0 and a center stone 23 and is fixed on a hollow metal shaft 28. However, the bottom of the shaft 28 is sealed and extended into the ampoule 30 to prevent high-purity supply chemicals from flowing up into the shaft. In addition, the metal shaft 28 is preferably made of electropolished 3 16L stainless steel or other materials that are not easily changed chemically. Alternatively, the shaft 28 is made of a non-magnetic material coated with a compound or other coatings that are not easily chemically altered. A digital magnetic reed relay switch RS is fixed in a fixed position at a preset alarm trigger point in the port 2 and 8 of the shaft. This trigger point corresponds to, for example, the "empty volume" trigger point. A ring 4 6 is permanently connected to one end of the shaft 2 8 to connect to the container 0. An additional reed relay switch RS can be added in the shaft 28 to form a multi-level water level detector. For example, if the second reed relay switch Rs is added to the second fixed trigger point in the shaft 28, a double water level float sensor is established.

562911 五、發明說明(18) 器。得增設額外之舌簧繼電器開 測用。 ’(、任何水位量之偵 諸扣環2 7用以制止金屬浮筒2 4之 20時,該浮筒不致在整支轴28上:&填充集裝容器 2 0變空時沿著整支轴28往下滑回。=,且不致於集裝容器 要,本架構中或得捨棄上扣環27 二應注意,倘有需 金屬浮筒24滑離該軸28。扣介而下扣環27,以防止 品牌或其他適當且不易起秀鋼、Kalrez 包含軸28、金屬浮筒24和扣環27 成者為較佳。 21經電拋光下述總成為較佳。此之金屬水,感應器總成 金屬件之表面光潔度以Ra2〇 土電拋光前,所有浸濕 金屬水位感應器39之作動佳。 在上扣環上方時,金屬浮筒24維持之供給源化學品 環27處。當該液體水位下降時 =置中之頂 移。當固定磁石之磁場閃鎖磁性舌菩;=2 :對於轴28下 24則在「下沈」位置中。當磁性舌菩二關;:金屬浮筒 示燈電路。此輸出信號經電纜26中:二=,完成指 元4 0中之警報電路。 兔、、泉2 5傳輸至控制單 圖4和5例示正常開啟 可使用正常關閉之磁性舌乂 之使用。惟,或 筒24經過舌簧繼電哭士 :: 牙情事中,當金屬浮 RS。故警報情固定磁石23將開啟磁性舌簧開關 丨月况係U開啟該已關閉之繼電哭 已開啟之繼電器觸件方式而告知。玉m觸件或關閉该 如上所述,較佳具體一 便 又水位式金屬感應器 C:\2D-CODE\91-09\9II15800.ptd 第21頁 562911 發明說明(19) — ^ :水位式金屬感應器3 9乃簡易地將第二數位磁性舌笼 之:::::RS固定於所需之警報觸發點處而設置。軸28 : ::二屬洋筒24可觸發兩舌簧開關。倘使用 金屬感應器,雷# 2 7 Φ 4女rm作 又h彳立式 通知控制單元40。較佳;事者''電線’用以將開關之狀態 m之供給源化學品。本=者且?二觸發點應設為剩下 容積」觸發點。 # 列中,此即對應該「低 第二感應器架構得包含一固定 結軸28,該磁石在一盥全屬、、率23並错由—鉸鏈連 筒内。當該浮筒柩轉時固=之材料所製成的浮 開關RS,並將舌簧繼電器之狀態從開啟改;器 關閉改變為開啟。 马關閉或者從 現配合圖6和7,詳 瓿30以31 6L電拋光不 瓿30之容量為2. 3升 升、1加俞、1 · 6加命 決於處理之所需。 述可再填充式安瓶3〇。可再填充 銹鋼結構製成為較佳。一般而言〜 但可提供大範圍之體積(包括1 · 3女 、2加侖和5加侖)。安瓿之大小僅取 真空/加壓閥3 7允許可成i +古十 CVD安瓿)以例如氦氣之惰性體在"女^3〇(其通常為諸多 壓。該閥同時具備於持續再埴奋吊处理過程時予以办 子、戈再填充或將安瓿3 0移籬糸此]0 雨允許安瓶30減壓及真空應用之功能。 離糸統18之 出口閥3 6連接可再填 管在正常處理操作時, 供給源化學品送至半導 充式安瓿3 0至一導出管32,該 將液態高純度TEOS或其他高純 體處理設備。故正常處理操作$,562911 V. Description of the invention (18). An additional reed relay may be added for testing. '(, When any water level detection ring 2 7 is used to stop the metal buoy 2 4 20, the buoy will not be on the entire shaft 28: & filling the container 20 along the entire shaft when it becomes empty 28 slide back down. =, And does not require the container. In this structure, the upper retaining ring 27 may be discarded. Second, it should be noted that if there is a need for the metal buoy 24 to slide away from the shaft 28. The retaining ring 27 is lowered to It is better to prevent brands or other suitable and difficult to pick up show steel, Kalrez including shaft 28, metal buoy 24 and buckle 27. 21 is better after electropolishing. The metal water, the sensor assembly metal The surface finish of the parts is good before Ra20 soil electro-polishing. All wetted metal water level sensors 39 work well. Above the upper retaining ring, the supply source chemical ring 27 maintained by the metal buoy 24. When the liquid water level drops = Centered top shift. When the magnetic field of the fixed magnet flashes the magnetic tongue; = 2: For the shaft 28 down 24, it is in the "sinking" position. When the magnetic tongue is at the second level ;: Metal pontoon lamp circuit. This The output signal passes through the cable 26: two =, complete the alarm circuit in finger 40. Rabbit, spring 2 5 pass Figures 4 and 5 of the control chart illustrate the use of a magnetic tongue that is normally closed and normally closed. However, or the cylinder 24 passes through the reed relay relay cry: :: When the metal is floating RS in the dental event. Therefore, the alarm is fixed to the magnet 23 The magnetic reed switch will be turned on. 丨 The monthly condition is informed by the way of turning on the closed relay contact that has been turned on. The jade contactor or closed should be as described above, preferably concrete and water level type metal sensor. Device C: \ 2D-CODE \ 91-09 \ 9II15800.ptd Page 21 562911 Description of the invention (19) — ^: Water level metal sensor 3 9 is simply a second magnetic tongue cage ::::: RS is fixed and set at the required alarm trigger point. Shaft 28: :: Two-piece ocean tube 24 can trigger two reed switches. If a metal sensor is used, Ray # 2 7 Φ 4 female rm works h h vertical Notify the control unit 40. It is better; the "wire" of the subject is used to supply the source chemical of the state m of the switch. The trigger point should be set to the remaining volume "trigger point. # In the column, this That is, corresponding to the "low second sensor architecture, a fixed knot shaft 28 is included, and the magnet It is made of —hinge coupling tube. When the buoy is turned, the floating switch RS made of solid material changes the state of the reed relay from on; the device is changed to off. The horse is closed or cooperated with now from Figure 6 And 7, detailed ampoule 30 with 31 6L electropolished non-ampoules 30 has a capacity of 2.3 liters, 1 plus, and 1.6 plus life depends on the processing needs. Refillable ampoules are described above. 30 It is better to refill with rusty steel structure. Generally speaking ~ but can provide a wide range of volumes (including 1 · 3 women, 2 gallons and 5 gallons). The size of the ampoule is only the vacuum / pressure valve 3 7 allows to be i + ancient ten CVD ampoules) with an inert body such as helium at " Female ^ 30 (which is usually a lot of pressure. The valve also has the function of refilling or refilling the ampoule 30 during the continuous re-hanging process. The rain allows the ampoule 30 to be decompressed and vacuum applied. The outlet valve 36 of the system 18 is connected to the refillable tube. During normal processing operations, the supply chemicals are sent to the semi-conducting filling ampoule 30 to an outlet tube 32, which is a liquid high-purity TEOS or other high-purity body. Processing equipment. So the normal processing operation $,

562911 五、發明說明(20) =或其他惰性加Μ氣體經真心加 3〇。施予安瓿30内部凹今令颅+ α 、山玎女口凡 純度之供給源化學品通迫使向純度謂或其他高 液體予⑽反應室之導通出過其中32空管五路33/口出口閥36至一提供 未全部顯示於圖上,俾允%3:。二人/注意者’管路33並 般而言,管路33沿著器總成45之顯示… 系統之正t # #。 感應W WF方延#,以允許 ^ m 兮出與成广抑 VD處理故備之型式,故不需細加 ^ 。〜先子感應态34之電路簡圖例示於圖1 4中。低水位 光學感應器34經電纜35,將 ::低水位 ^ ^ ^ η, ^ 肘、號达至一獨立式警報模組、 ,Ι( Ζ 7 4 π ν卜不面板或經由一溫度控制器(但不經由控 -光學感應器,其可 或溫度控制器面接觸::、!;;=、⑽立式警報模組 式警報模組或溫度控制學編與反應器、獨立 :=二動式關閉再填充管路“之間。間38在正常 ::Γ白i持續再填充際開㉟。在全自動處 里7此閥為-自動Μ,以氣動者為較佳。 』屬;:=器總成21包含至少一單-水位式金屬感應 :3二:金屬t位感應器39為雙水位式感應器為較佳,以 trm位」…雙高水位」。該金屬水位感應 U1之孟屬水位感應器39以和圖4及5所敘述之相同方562911 V. Description of the invention (20) = or other inert plus M gas is added 30% by heart. The ampoule is administered with 30 internal recesses, cranial crests + α, and the purity of the chemical source of the mandarin duck's mouth. It is forced to lead to the purity chamber or other high-liquid to the radon reaction chamber through 32 of the empty tubes and five of 33 / mouth outlets. Valves 36 to 1 are not all shown on the chart, allowing% 3 :. Two people / attentioners ’pipe 33 and in general, the pipe 33 is displayed along the device assembly 45 ... The system is positive t # #. Induction W WF 方 延 #, to allow ^ m to come out and form a wide range of VD processing, so there is no need to add ^. ~ A schematic diagram of the circuit of the proton induction state 34 is shown in FIG. 14. Low water level optical sensor 34 via cable 35 will :: Low water level ^ ^ ^ η, ^ elbow, number up to a stand-alone alarm module,, (I 7Z π π νbu panel or via a temperature controller (But without the control-optical sensor, it can be contacted with the temperature controller ::,! ;; =, stand-alone alarm module alarm module or temperature control editor and reactor, independent: = two actions Between the closed and refilled pipelines. The interval 38 is normal during the refilling: Γ 白 i is continuously refilled. The valve is-automatic M in the fully automatic position, and the pneumatic one is better. = The device assembly 21 contains at least one single-water level metal sensor: 32: The metal t-position sensor 39 is preferably a dual-water level sensor, with trm position "... double high water level". The metal water level sensor U1 Monsoon water level sensor 39 is the same as described in Figs. 4 and 5.

C:\2D-CODE\91-09\91115800.ptd 第23頁 562911 五、發明說明(21) ,操=。例示於圖6中之的金屬水位感應器39為一種且有 Ϊ應:水位」41和「雙高水位」…之觸發點的雙水位式 種特別土之可再填充式安瓶3 〇例示於圖8中。圖8中之 兩個金屬水位感應器總成21,各金屬水位感應 包s —金屬水位感應器39。第一總成55係供積測高 立月況。,如上述者般,金屬水位感應器3 9為圖6中所述 之雙水位式感應器為較佳。第二總成58則供偵測低水位情 況,低水位金屬水位感應器58為單一水位式浮筒感應器, 以將安瓿30中之供給源化學品水位已達低水位訊息,通知 CVD反應器、獨立式警報模組或溫度控制單元,並結束正 常處理操#。電纜35具二電線。該二電線用來與半導體處 理設備面接觸。尤特別者,該二電線通過圖13中所述之介 面電路的接腳〗和2而連接。當使用金屬水位感應器Μ時, 接腳3係未加接觸。 基上之說明可得知,金屬水位感應器總成2 i可具備多種 架構。圖9至1 2所例示者僅些許現有之較佳架構。 圖9例示一種供可再填充式安瓿3〇用之金屬水位感應器 總成21,其包含一種具有「高水位」觸發點4丨和「雙高水 位」觸發點4 1 a二觸發點的金屬水位感應器3 9。 圖1 0例示一種供可再填充式安瓿3 〇用之金屬水位感應器 總成21 ’其包含兩個水位式感應器39。第一個49為如圖^ 中所述之雙水位式感應器。第二個5〇偵測低水位情況。低 水位金屬水位感應器50為單一水位式感應器,其將安瓿3〇 C:\2D-CODE\91-09\91115800.ptd 第24頁 562911C: \ 2D-CODE \ 91-09 \ 91115800.ptd Page 23 562911 V. Description of the invention (21), operation =. The metal water level sensor 39 exemplified in FIG. 6 is a kind of refillable ampoule with special soil of double water level type which has the trigger points of “water level” 41 and “double high water level” ... In Figure 8. The two metal water level sensor assemblies 21 in FIG. 8 and each metal water level sensor package s-metal water level sensor 39. The first assembly 55 series is for cumulative measurement of high monthly conditions. As mentioned above, it is preferable that the metal water level sensor 39 is a dual water level sensor as described in FIG. 6. The second assembly 58 is used to detect the low water level condition. The low water level metal water level sensor 58 is a single water level pontoon sensor to notify the CVD reactor that the water level of the supply source chemical in the ampoule 30 has reached the low water level. Stand-alone alarm module or temperature control unit, and end normal processing operation #. The cable has two wires. These two wires are used to make surface contact with the semiconductor processing equipment. In particular, the two wires are connected through pins 2 and 2 of the interface circuit described in FIG. When the metal water level sensor M is used, pin 3 is left untouched. Based on the above description, it can be known that the metal water level sensor assembly 2 i can have various structures. The examples illustrated in FIGS. 9 to 12 are only a few of the existing preferred architectures. FIG. 9 illustrates a metal water level sensor assembly 21 for a refillable ampoule 30, which includes a metal having a “high water level” trigger point 4 丨 and a “double high water level” trigger point 4 1 a and two trigger points. Water level sensor 3 9. FIG. 10 illustrates a metal water level sensor assembly 21 'for a refillable ampoule 30, which includes two water level sensors 39. FIG. The first 49 is a dual water level sensor as described in Figure ^. The second 50 detects low water conditions. The low water level metal water level sensor 50 is a single water level sensor, which will ampoule 30 C: \ 2D-CODE \ 91-09 \ 91115800.ptd page 24 562911

=之供給源化學品水位已達低水位訊息,通知CVD反應 器、,立式警報模組或溫度控制單元,並結束正常處理操 作。高水位金屬水位感應器49為一種如前所述之具有「^ 水位」、觸發點4 1和「雙高水位」觸發點4丨a二觸發點的雙 水位式浮肉感應裔。本架構具有對於諸供給源化學品水位 式感應器僅需設置一孔洞於安瓿3〇之蓋43中的優點,故降 低污染供給源化學品之可能。電纜35備有六條電線。該六 條電線中之四條終結於如圖丨5、丨5 A和丨5B所示之控制面板 中’兩條則用來與半導體處理設備面接觸。較特別者,該 兩條電線係通過圖1 3中所述之介面電路的接腳1和2而連 接。當使用金屬水位感應器39時,接腳3係未加接觸。 圖1 1例不一種集裝容器2 〇用之金屬水位感應器總成2 j, 5玄金屬水位感應器總成包含一種具有於「空容積」觸發點 和滿容積觸發點處設置二觸發點的雙水位式金屬水位感應 3 9。該滿容積觸發點係供高純度之供給源化學品供應商 在對桶進行洗滌和服務後,填充集裝容器2 〇使用。 圖12例示一種集裝容器20用之金屬水位感應器總成21, 該金屬水位感應器總成包含一種具有谓測「空容積」、 「低谷積」和「滿容積」水位情況而設置之觸發點的三水 位式金屬水位感應姦3 9。同樣地,該滿容積觸發點係供高 純度之供給源化學品供應商在對桶進行洗滌和服務後^ ^ 充集裝容器2 0使用。 ' 茲配合圖8至1 2,詳述金屬水位感應器總成2丨連結安瓶 30之方式。一套圈46係永久性地連結軸28 一端,以將金屬= The source water level has reached the low water level. The CVD reactor, vertical alarm module, or temperature control unit is notified, and normal processing operations are terminated. The high water level metal water level sensor 49 is a dual water level floating meat sensor with a “^ water level”, a trigger point 41, and a “double high water level” trigger point 4 丨 a as described above. This structure has the advantage that only one hole is required to be provided in the lid 43 of the ampoule for the water level sensor of the supply chemical, so the possibility of contaminating the supply chemical is reduced. The cable 35 is provided with six wires. Four of the six wires terminate in the control panel shown in Figures 5, 5, 5 A, and 5B, which are used to make surface contact with the semiconductor processing equipment. More specifically, the two wires are connected through pins 1 and 2 of the interface circuit described in FIG. 13. When the metal water level sensor 39 is used, pin 3 is not in contact. Figure 1 An example of a container container 2 〇 Metal water level sensor assembly 2 j, 5 metal metal water level sensor assembly includes a trigger point set at the "empty volume" trigger point and full volume trigger point Double water level type metal water level sensor 3 9. This full-volume trigger point is for high-purity supply source chemical suppliers to fill the container 20 after washing and servicing the barrel. FIG. 12 illustrates a metal water level sensor assembly 21 for a container 20. The metal water level sensor assembly includes a trigger set to measure water levels of "empty volume", "valley volume" and "full volume". Point three water level type metal water level sensor 3 9. Similarly, the full volume trigger point is used by high-purity supply source chemical suppliers to fill the container 20 after washing and servicing the barrel. 'With reference to FIGS. 8 to 12, the method of connecting the metal water level sensor assembly 2 to the ampoule 30 will be described in detail. A ring 46 is used to permanently connect one end of the shaft 28 to the metal

562911 五、發明說明(23) 益總成21連結至安瓿30。套圈46以31虬不銹鋼構 成j較佳,且較佳之連結方法為焊接。 構 孟2水位感應器總成21利用套圈46與夾件61而 二用夹:6=於衛生管路之凸緣爽件型式者為較; 延伸出之管路63:4的U緣表面62 ’頂抵自安瓿蓋43頂部 -65,緊住套圈4 :。:用凸緣表面。夾件61藉由鎖緊旋 乙烯〇形環67(設置於έ士人ώ故矣*⑴:+ : t四氣 以壓縮,故提供無洩漏之密封。 人系日令予 全ΐ:二ί由螺接式連接器插銷與軸28焊接方式,連结 至屬水位感應器總成21與安瓿30。該 =: 後便螺人安瓶30之蓋43上的結合料連=連接益插銷隨 作現配合圖卜2、15、15“d15B ’詳述控制單元4〇之操 經ΐ匕一十伏特之交流電。工廠電源便 又爪電、,見組CS1之標準ϋ型接地式母插頭提供。電 入過濾窃總成L1。過濾器總成L1對近出姐 線路調^且連接交流電源至主電源開_出之 成L1亦提供底盤之接地。 。過慮器總 主電源開關SW1為雙刀雙擲(DPDT)跳動式 、 於控制單元40之4空制面板52左上方角落上。Ά’並二置軌 中性二側為開和關之切換。切換式交流:主 關SWi連接至保險絲F1。保險絲以係為四分原;主電源開 AG尺寸(四分之一英忖乘四分之十一英叶)的二、,三且 562911 五、發明說明(24) 設置於控制單元4 〇之内。 調整、切換和具保險絲之交流 器PS 1之交流電輪人_ + 、塔M ,、運接至線性電源供應 内,並提/Λ輸^處本。^供應器PS1設置於控制單元40 回路。 周式二十四伏特直流電廢予控制單元4。電氣 !!隹「t f積」電路83將首先予以詳細說明。 畜木裝容器2 0中之供給源化學口 點之上時,"24往上化…上位在「低水位」觸發 RS1開啟且「低^ Λ 广’ 低谷積」感應繼電器開關 開啟且低谷積」指示燈LED1熄滅。(五 繼電器開關因在控制板 〇人iC庄思,诸 實際上,諸繼電4==而僅以所代表之型式顯示。 容器中。) 開關在金屬水位感應器總成21内之各個 當集裝容器2 0内之吝〇 士 a _ μ r T 0# ^ nr ^產卩X位下降至「低水位」觸發點以 且「低容積」指示燈LEDt=」。感應繼電器開關脱關閉 口 電路85,當集裝容器20中之供給源化學 7空-i : ΐ t」角蜀發點之上時,'浮筒24往上漂浮, 圈(接^ 7' Γ、薩電态開關RS2開啟,且控制繼電器RY 1線 圈C接腳2至7)斷電。去繼兩抑^ (N 0 、鎚丛,社0田、、k電為RY1斷電時,該諸通常開啟 :(接腳8至6)開啟,且 滅0當繼電器RY1鼢雷奸 π」1 ^ Q ^ „ 「 電寸’該諸通常關閉(Ν· C·)觸件(接腳 G芏D)關閉,且「正堂交 RYi斷電時,該諸n c 指示燈LED3亮起。當繼電器 充電路。 ··觸件(接腳1至4)關閉,且導通再填 第27頁 C:\2D-CODE\9l-〇9\91115800.ptd 562911 五、發明說明(25) 虽集裝谷窃内之產品水位下降至「空水位 時’浮筒24下沈,「空容積」感應繼 關觸發广以下 ,繼電器州線圈(接腳2至7)通電。當繼電關器R ;:雪 蚪,该諸N. 〇.觸件(接腳8至6 )關閉,且「办* ° 、二 LED2亮起。當繼電器Rn ,該諸二積:指示燈 W開啟,且「正常容積」指示燈LED3媳滅。觸=^腳8至 通電時,該諸n.c.觸件(接 路。 且再填充電路斷 現詳細說明安瓿之「雙高水位」電路86。 當安瓿30内之產品水位下降至「雙高水位, 位式金屬水位感應器39之浮筒24相對於該 :: 發點41a下沈,且安瓿3η「雔古 成處π 又同水位」觸 ^ ° it ^ M PV9 问」感應态繼電器開關RS3開 啟。故控制鉍電wY2線圈(接腳2至7)斷電。 斷電時,該諸Ν.〇·觸件(接腳8至6)開啟,且「安電。。古RY2 指示燈LED4熄滅。當繼電器RY2斷電時,該諸。二 腳8至6)開啟’且空氣控制闊V1n線圈斷t,·^妾 開啟。當繼電器RY2斷電時,該諸N.c.觸件( 閉,且導通再填充電路。 J _ 當安瓿30内之產品水位超越「雙高水位」觸發點4i a 時,雙水位式金屬水位感應器39之浮筒24相對於該「雙 水位」觸發點41 a上浮,且安「雙高」感應器繼電器 開關RS3關閉。故控制繼電器RY2線圈(接腳2至7)通電。者 繼電器RY2JI電時,該諸N.〇•觸件(接腳8至6)關閉,且田 「安瓿雙南」指不燈LED4亮起。當繼電器RY2通電時,該562911 V. Description of the invention (23) The benefit assembly 21 is connected to the ampoule 30. The ferrule 46 is preferably made of 31 虬 stainless steel, and the preferred connection method is welding. The structure 2 of the water level sensor assembly 21 uses the ferrule 46 and the clamp 61 and the clamp is used for two purposes: 6 = The type of the flange on the sanitary pipe is more suitable; the U edge surface of the extended pipe 63: 4 62 'presses against the top of the ampoule cap 43-65, holding the ferrule 4 :. : Use flange surface. The clamp 61 is locked by rotating the vinyl O-shaped ring 67 (set in the hand of the person to buy the old 矣 * ⑴: +: t four gases to compress, so it provides a leak-free seal. It is connected to the water level sensor assembly 21 and the ampoule 30 by welding the bolt of the screw-type connector with the shaft 28. This =: the binding material on the lid 43 of the screwdriver ampoule 30 is connected = Now cooperate with Figures 2, 15, and 15 "d15B 'to detail the operation of the control unit 40. The AC power of 10 volts. The factory power supply is claw power, see the standard ϋ type grounding female plug provided by group CS1. The electric ingress filter theft assembly L1. The filter assembly L1 adjusts the nearest outgoing line and connects the AC power to the main power switch. The output L1 also provides the grounding of the chassis. The main power switch SW1 of the filter is double Knife Double Throw (DPDT) jump type, at the upper left corner of the control unit 40-4 air control panel 52. Ά 'and two rails on the neutral side for switching between on and off. Switching exchange: the main switch SWi is connected to Fuse F1. The fuse is based on the quarter; the main power supply is AG size (a quarter of an inch by 11 a quarter of an inch). 562911 V. Description of the invention (24) It is set in the control unit 4 0. Adjust, switch and fuse the AC wheeler _ +, tower M, and connect to the linear power supply, and provide / Λ input ^ place. ^ The supply PS1 is installed in the control unit 40 circuit. The weekly twenty-four volt DC power is waste to the control unit 4. Electrical !! 隹 "tf product" circuit 83 will be explained in detail first. Above the chemical source point of the source in 0, "24 goes up ... The upper position triggers RS1 to turn on and the" low ^ Λ wide 'low valley product "inductive relay switch opens and the valley product" indicator LED1 Off. (Five relay switches are displayed on the control panel 0 people iC, in fact, the relays 4 == only in the type represented. In the container.) The switch is within the metal water level sensor assembly 21. Each time in the container container 20, a _ μ r T 0 # ^ nr ^ The X level drops to the "low water level" trigger point and the "low volume" indicator LEDt = ". The induction relay switch is off Closed circuit 85, when the supply source chemistry in the container 20 is 7 Air-i: ΐ t ”When the angle of the horn is above, the 'float 24 floats upward, and turns (connected to ^ 7' Γ, the Sa state switch RS2 is turned on, and the control relay RY 1 coil C pins 2 to 7) Power off. Two relays (N 0, Hammer Cong, She 0 Tian, and k power are normally turned on when RY1 is powered off: (pins 8 to 6) on, and off when relay RY1 is thunder Ππ ”1 ^ Q ^„ "Electric inch 'the normally closed (N · C ·) contact (pin G 芏 D) is closed, and" when the main hall RYi is powered off, the nc indicator LED3 lights up . When the relay is charging. ·· The contacts (pins 1 to 4) are closed, and the continuity is filled. Page 27 C: \ 2D-CODE \ 9l-〇9 \ 91115800.ptd 562911 V. Description of the invention (25) When the product water level drops to the "empty water level", the buoy 24 sinks, and the "empty volume" induction relay is below the trigger level, and the relay state coil (pins 2 to 7) is energized. When the relay switch R :: Snow, the N. 〇 contacts (pins 8 to 6) are closed, and "off * °, two LED2 lights up. When the relay Rn, the two products: indicator light W turns on, and the "normal volume" indicator LED3 goes out. When contact = ^ foot 8 to power, the nc contacts (connected.) And the refill circuit breaks down to explain the "double high water level" circuit 86 of the ampoule. When the product water level in the ampoule 30 drops to the "double high water level, The buoy 24 of the position type metal water level sensor 39 is relative to that :: The starting point 41a sinks, and the ampoule 3η "the ancient place π and the same water level" touches ^ ° it ^ M PV9 Q "The inductive state relay switch RS3 is turned on. Therefore, the control bismuth electric wY2 coil (pins 2 to 7) is powered off. When the power is turned off, the N.〇. Contacts (pins 8 to 6) are turned on, and "Energy ... The ancient RY2 indicator LED4 is off. When the relay RY2 is de-energized, the two. The two pins 8 to 6) are turned on and the air control V1n coil is disconnected t, and ^ 妾 is turned on. When the relay RY2 is de-energized, the Nc contacts (closed and turned on again) Fill the circuit. J _ When the product water level in the ampoule 30 exceeds the "dual high water level" trigger point 4i a, the float 24 of the dual water level metal water level sensor 39 rises relative to the "dual water level" trigger point 41 a, and The “double-height” sensor relay switch RS3 is turned off. Therefore, the control relay RY2 coil (pins 2 to 7) is energized. When the electrical appliance RY2JI is powered, the N.〇 • contacts (pins 8 to 6) are closed, and the field "ampoules double south" means that the LED 4 is not on. When the relay RY2 is powered on, the

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諸N.O.觸件(接聊8至6)關閉,且 通電’而閥Vi關閉 之N.O.線圈 電時,該諸N C ,… 充過程。當繼電器"2通 ⑶.C.觸件(接腳1至4)開啟,且再填充電路斷 「一、 鬲」電路87,當安瓿30内之產品水位下卩夂5 咼水位」觸發點4 j之 雔 口口 牛至 之浮筒相對於4p 又欠位式金屬水位感應器39 、:π和對方“亥「南水位」觸發點 感應器繼電器開關^ α α 丑 女口瓦问」 至7)斷電。A 制繼電器以3線圈(接腳2 至U斷尾。當繼電器RY3斷電時 問啟,日「A — Α θ ^Ν· 0·觸件(接腳8至 雷時,Μ「女〇问」指不燈LED5熄滅。當繼電器RY3斷 :μ啫N· C.觸件(接腳1至4)關閉,且導通再填充電 當安瓶30内之供給源化學品水位往上或超越 觸發點4 1時,雙水位十八Μ卜从a & 门X位」 —二=水位式金屬水位感應器39之浮筒24浮起, 線圈Γ接腳繼電器開關RS4關I控制繼電器· Λ圈(接腳2至7)通電。當繼電器RY3通電時 件接腳8至6)關閉,且「安吾瓦高」指示燈UD5亮^·。0.當觸繼 電益RY3通電時,該諸N· C.觸件(接腳1至4)開啟, 充電路斷路。 丹具 現詳細說明再填充電路82。再填充過程開始前,嗜「 =填充」開關SW2開啟,該「放棄填充」開關m關 控制繼電器RY4線圈(接腳2至7)斷電,該諸Nc觸 / 腳8至5)關閉’且「安瓶未在填充」指示燈UD7亮起= 諸Ν·0·觸件(接腳8至6)開啟,且「安瓿正再填充」led6\自When the N.O. contacts (contacts 8 to 6) are closed, and the N.O. coils which are energized and the valve Vi is closed, the N C, ... charging process. When the relay " 2-way ⑶.C. Contact (pins 1 to 4) is open, and the refill circuit breaks the "1, 鬲" circuit 87, when the product water level in the ampoule 30 is 卩 夂 5 咼 water level "trigger point 4 jzhikoukou oregano's buoy relative to 4p and under-position metal water level sensor 39: π and the other side "Hai" South Water Level "trigger point sensor relay switch ^ α α Ugly female mouth tile ask" to 7 ) Power off. The A system relay uses 3 coils (pins 2 to U break the tail. When the relay RY3 is powered off, it will be turned on, and "A — Α θ ^ N · 0 · contact (When pin 8 to thunder, M" female 0 asked ”Means that the LED 5 is off. When the relay RY3 is off: μ 啫 N · C. The contacts (pins 1 to 4) are closed and refilled when the supply source chemical level in the ampoule 30 is raised or exceeded. At 11:00, the double water level of 18 megabytes from a & door X position "— two = water level type metal water level sensor 39 floats 24, coil Γ pin relay switch RS4 off I control relay · Λ circle ( Pins 2 to 7) are energized. Pins 8 to 6) are turned off when relay RY3 is energized, and the "Ango Watt High" indicator light UD5 lights up. 0. When the energized relay RY3 is energized, these N · C. The contacts (pins 1 to 4) are turned on, and the charging circuit is disconnected. Dange now details the refill circuit 82. Before the refill process starts, the "= fill" switch SW2 is turned on, and the "abandon fill" switch is turned off. The relay RY4 coil (pins 2 to 7) is de-energized, the Nc contacts / pins 8 to 5) are off 'and the "ampoules are not filling" indicator light UD7 is lit = the Ν · 0 · contacts (pin 8 To 6) Open, and "the ampoule is being refilled" led6 \ from

562911 五、發明說明(27) ^烕,該諸N.O.觸件(接腳8至6) C.線圈斷電,且電磁闊12關閉。當該"= 、並無控制壓力經過通道40施;氣動U磁闕V2關閉562911 V. Description of the invention (27) ^ 烕, the N.O. contacts (pins 8 to 6) C. The coil is powered off, and the electromagnetic coil 12 is closed. When the " = and no control pressure is applied through the channel 40; the pneumatic U magnetic valve V2 is closed

Pit :寺2 : 5 ::填充過程,胃「壓按以填充」開關SW2係 寺土女關閉者,該控制繼電器”^ ^ ^ ^ ^ 至。μ)通電。當RY4通電時,諸N.0.觸件(接腳1 此時或二鏗:使繼電器RY4通電且於通電狀態中閂鎖住。 ’ 5、于釋放開「壓按以填充」開關SW2。 腳^ ’持續進行再填充過程’該諸n. c.觸件(接 士 碣欠,且「安瓿未在填充」指示燈LED7熄滅。同 日厂該諸N. 0二觸件(接腳8至6)關閉,且「安瓿正再填充」 ^不燈LED6亮起。最後’該諸N 〇.觸件(接腳8至6)關閉, 该N.C.電磁閥V2開啟,控制壓力經過通道48施予氣動闊 42 :並開啟氣動閥42。來自集裝容器20之供給源化學品現 可流經再填充管路44至安瓿3〇。 再填充過程之結束係以六種方式之一完成: 、杈式1 .切斷控制壓力:氣動閥4 2關閉,結束該再填充 過程。 模式2 ,·切斷電源··該N · C ·電磁閥v 2斷電,且電磁閥v 2 關閉。當該N. C·電磁閥V2關閉時,並無控制壓力經過通道 4 8而施予氣動閥42。故該氣動閥42關閉’且結束該再填充 過程。 模式3 :放棄填充:倘操作者壓按「放棄填充」開關 562911Pit: Temple 2: 5 :: Filling process, the stomach "presses to fill" switch SW2 is the temple soil female closer, the control relay "^ ^ ^ ^ ^ to .μ) power. When RY4 is powered, N. 0. Contact (Pin 1 at this time or two: Energize relay RY4 and latch in the energized state. '5. Release the "press and fill" switch SW2 when released. Pin ^' Continue the refill process 'The nc contacts (the receiver is owed, and the "ampule is not filling" indicator LED7 is off. On the same day, the N. 0 second contacts (pins 8 to 6) are closed, and "the ampoule is being refilled" ^ No light LED6 lights up. Finally, the N. contact (pins 8 to 6) is closed, the NC solenoid valve V2 is opened, the control pressure is applied to the pneumatic valve 42 through the channel 48: and the pneumatic valve 42 is opened. The supply source chemicals for the container 20 can now flow through the refill line 44 to the ampoule 30. The end of the refill process is completed in one of six ways: 1. Fork type 1. Cut-off control pressure: Pneumatic valve 4 2 closes to end the refilling process. Mode 2, cut off the power supply, the N · C · solenoid valve v 2 is powered off, and solenoid valve v 2 is closed. When this When the N. C. solenoid valve V2 is closed, no control pressure is applied to the pneumatic valve 42 through the passage 48. Therefore, the pneumatic valve 42 is closed and the refilling process is ended. Mode 3: Give up filling: If the operator presses "Abandon Fill" switch 562911

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制繼電器RY5斷電並打開未加閃鎖 傳感器S1之RY5的觸件電源解除。 持靜音。 ,且同時將連接至聲響 故该可聽聞信號將仍維 该再填充過程結束時,控制繼電器RY4斷電。此 ^C·觸件(接腳8至5)關閉,且經過RY5之諸N c·觸,諸 至5 )。’將聲響傳感器s丨通電,故使該可聽聞信號發聲。I7 依操作者之裁量,該可聽聞聲響信號或得藉按下「耳 無聲響」開關S W 4而予以靜音。當s f 4 —直關閉基, 女 雷哭dvu , 罝關閉者,控制繼 電wRY5如上所述係通電且閂鎖著。接著,諸N c•觸 腳8至5)開啟,並將該聲響傳感器S1斷電。同時,諸Ν· 〇. 觸件(接腳1至3)關閉,將處於通電狀態之繼電器RY5通電 亚閂鎖。此時或得釋放開r壓按無聲響」開關SW4,且該 可聽聞信號將程序關閉著,俟下一個再填充過程結束止。 “當一直按著「壓按以測試指示燈」開關SW5,完成測試 電路86且將電源連通至LED1、LED2、leD3、LED4、LED5、 LED6、LED7和聲響傳感器S1,故使所有這些指示燈通電。 測試電路8 6之各二極體陽極係以平行方式連接各種指示 4電路之直接骚動式二極體陽極。此斷絕任何通電路徑不 作用之可能。 諸二極體D9、D14、D19、D20、D22、D23係皆以其靠近 正電源電線之陰極跨過其個別之繼電器線圈而以平行方式 連接。當已經通電之線圈斷電時,所產生之磁場迅速瓦 解’並產生與通過線圈端之激勵電壓相反極性之瞬間電 壓。諸二極體D9、D14、D19、D20、D22、D23對該瞬間電The relay RY5 is de-energized and the contact power of the RY5 sensor S1 is unlocked. Hold mute. , And at the same time will be connected to the sound so the audible signal will still be maintained. When the refilling process is over, the control relay RY4 is powered off. The ^ C · contact (pins 8 to 5) is closed and passes through Nc · contacts of RY5, to 5). ′ The sound sensor s 丨 is powered on, so that the audible signal sounds. I7 According to the operator's discretion, the audible signal may be muted by pressing the "earless" switch S W 4. When s f 4-closes the base directly, the female thunder cries dvu, 罝 closes, the control relay wRY5 is energized and latched as described above. Then, the N c contact pins 8 to 5) are turned on, and the acoustic sensor S1 is powered off. At the same time, the Ν · 〇. Contacts (pins 1 to 3) are closed, and the relay RY5, which is in the energized state, is energized to the sub-latch. At this time, you may release the switch and press the "no sound" switch SW4, and the audible signal will close the program, and the next refilling process ends. "When you press and hold the" press and test indicator "switch SW5, complete the test circuit 86 and connect the power to LED1, LED2, LED3, LED4, LED5, LED6, LED7 and sound sensor S1, so all these indicators are powered on . Each of the diode anodes of the test circuit 86 is connected to a variety of indications in a parallel manner. The direct agitation diode anodes of the circuit 4 are connected. This cuts off the possibility that any energized path is inoperative. The diodes D9, D14, D19, D20, D22, and D23 are all connected in parallel with their cathodes close to the positive power line across their individual relay coils. When the coil that has been energized is de-energized, the generated magnetic field rapidly disintegrates' and generates an instantaneous voltage of opposite polarity to the excitation voltage passing through the coil end. The diodes D9, D14, D19, D20, D22, D23 are

C:\2D-CODE\91-09\91115800.ptd 第33頁 562911 五、發明說明(31) 壓朝其正向偏壓方向 量。該架構係保護開 弧破壞之高電壓尖端 安靜之電環境。 圖1 6例示一種内具 各岐管2 2朝上連接一 閥:處理隔離閥7 0、 低壓排氣閥73、緊急 室6 9内可依據處理設 一種特佳之岐管配 16中者之不同處在於 再填充管路隔離閥7 0 7 0和7 2。基此變更, 在圖1 6中所例示之再 道89已完全自岐管移 架構進一步降低系統 岐管2 2之一種最佳 中,除運用處理隔離 離閥7 0之用外,並使 氣閥7 3和輸送氣體隔 述之具體例般,諸岐 處理之岐管操作的敘 例。 當集裝容器2 0以新 提供一放電路徑,並放掉所儲存能 關之諸觸件,該開關乃自可能導致電 使線圈通電,並同時提供一整體較為 有二岐管2 2之化學室6 9的部分視圖。 獨立之集裝容器20。岐管22包括六個 輸送氣體隔離閥71、容器回流閥7 2、 關閉閥7 4和真空供給閥7 5。顯然化學 備而具備一或較多岐管。 置詳述於圖17中。圖17中之岐管和圖 •一阻絕閥7 6包含一容器回流閥7 2和 。故阻絕閥7 6係取代圖1 6中分開之閥 高純度之供給源化學品便不至於滯留 填充管路44的通道89中。此乃因為通 離,而使用阻絕閥7 6。故圖1 7之岐管 遭污染之危險。 具肢例係詳述於圖1 8中。本具體例 阻絕閥7 6供罐回流閥7 2和處理管路隔 用一真空/壓力阻絕閥9丨供該低壓排 離閥7 1之用。再次地,如同圖丨7中詳 官之基本操作係相同。故對各種不同 述可應用至所有三個所敘述之具體 桶置換時’以岐管2 2隔離再填充管路C: \ 2D-CODE \ 91-09 \ 91115800.ptd Page 33 562911 V. Description of the invention (31) The amount of pressure in the direction of its forward bias. This architecture protects the quiet electrical environment of high-voltage tips that are damaged by arcing. Figure 16 illustrates an example of a valve with manifolds 22 connected upwards: a processing isolation valve 70, a low-pressure exhaust valve 73, and an emergency room 69. A special manifold with 16 can be set according to the processing. It lies in the refill line isolation valves 7 0 7 0 and 7 2. Based on this change, one of the best ways to further reduce the system manifold 22 from the manifold 89 illustrated in FIG. 16 is to completely reduce the system manifold 22. In addition to using the isolation valve 70, A specific example of the isolation of the valve 73 and the conveying gas, and an example of the operation of the manifold in Zhuqi processing. When the container 20 newly provides a discharge path, and the stored contacts can be released, the switch may cause the coil to be energized by electricity, and at the same time, it provides a chemistry that has a more bifurcated tube 2 2 Partial view of the rooms 6-9. Independent container container 20. The manifold 22 includes six delivery gas isolation valves 71, a container return valve 72, a shutoff valve 74, and a vacuum supply valve 75. Obviously the chemical equipment is available with one or more manifolds. This is detailed in FIG. 17. Manifolds and Figures in Figure 17 • A blocking valve 76 includes a container return valve 72 and. Therefore, the blocking valve 76 replaces the separate valve in FIG. 16 and the high-purity supply chemical will not stay in the channel 89 of the filling pipe 44. This is because the stop valve 7 6 is used because of the disconnection. Therefore, the manifold in Figure 17 is in danger of contamination. The limbs are detailed in Figure 18. In this specific example, a shut-off valve 7 6 for the tank return valve 72 and a processing line are separated by a vacuum / pressure shut-off valve 9 丨 for the low-pressure drain valve 71. Again, the basic operation is the same as detailed in Figure 7. Therefore, the different descriptions can be applied to all three specific barrel replacements. Isolate and refill the pipeline with manifold 2 2

第34頁 562911 五、發明說明(32) 44為較佳。此有助於防止系統之污染。 不需要用於再填充系統18之操作乂 $ :管22並 管,集袭罐輸入_將需要連結—調;二=^吏用岐 集,罐輸出閥64將需要連結至該再填充“44乳組源’且 置於再填充管路“中,該再 "方、女忒30之入口閥38和集裝容器2〇之 ^ 理隔離間70關閉時,閥7。下游之處理管路“:6八?’ :當處 f Ϊί:7Τ〇際與大氣隔絕。輸送氣體隔離閥7刀1】、:= 矾s路77中,該輸送氣體管路7 ' , k 閥64和輸送氣體供應源間。 ,方、集衣谷為20之入口 低麼排氣閥73置於真空管路78 i 再填充管路44。不過,容器:流 C G I狀心而予以加壓或真空化。 =閉閥74為通常關閉之閥,以氣動閥為較 員失’空氣壓力將立即關閉該閥。通常"關 制。將乳動式通常關閉閥使用於岐管中和 哭, 厂i門ΐ得:有閥成為緊急關閉閥。故當啟動e:〇情兄及 供給將被切斷,並關閉所有S。二 閥75叹置方;文氏回路99中, 直 具工1,、、、、。 真空供給管路78 〇 田…幵欠彳,真空會提供至 正常操作時,岐管22係在輸送架 之氣動閥42用以控制再填 路44中 术卞在輸运糸構中,緊急關Page 34 562911 V. Description of the Invention (32) 44 is preferred. This helps prevent system contamination. No operation for the refilling system 18 is required. $: Pipe 22 is connected in parallel, and the tank input_ will need to be linked—adjusted; two = ^ use the divergence, the tank output valve 64 will need to be connected to the refill "44 The milk group source is placed in the refilling pipeline, and the inlet valve 38 of the refill party and son-in-law 30 and the physical isolation compartment 70 of the container 20 are closed, and the valve 7 is closed. The downstream processing pipeline ": 6 八?": Everywhere f Ϊί: 7T0 is isolated from the atmosphere. Gas transmission isolation valve 7 knife 1],: = 77 in the alum s road, the gas transmission pipeline 7 ', k Between the valve 64 and the supply gas supply source, the inlet of the square and the jacket is 20, the exhaust valve 73 is placed in the vacuum line 78 i and the line 44 is refilled. However, the container: CGI is pressurized or pressurized or Vacuum. = Closed valve 74 is a normally closed valve, and a pneumatic valve is used to close the valve. Air pressure will close the valve immediately. Usually " closed. Use milk-actuated normally closed valve in the manifold and cry, The door of the factory i got: the valve becomes an emergency shut-off valve. When the e: 〇 brother and the supply are started, all the S will be closed and the two valves will be closed. The second valve is 75 square meters; 、、、、、。 Vacuum supply line 78 〇field ... 彳 彳, vacuum will be provided to normal operation, the manifold 22 is connected to the pneumatic valve 42 of the conveyor to control the refilling path 44 during the operation Under construction, emergency clearance

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第35頁 562911 五、發明說明(33) 閉閥74係開啟,輸送氣體隔離間7】開啟,處理管路隔 70,啟’真空氣體關閉閥75關閉,低麼排氣閥^關閉,罐 回流閥72關f才’,集裝罐入口閥“開啟且集裝罐出口閥⑼開 啟。 产:ΐ ?:裝ΐ2ν:下述較佳程序係用以防止所運送高純 又干σσ之巧乐。百先,該高純度化學品必需從岐管 j :將集裝罐20減壓並隔離。其次,清洗岐管。清洗 後,解除連接並移離該空的集裝罐。接者,設置 新滿裝的集裝罐2 〇。岸針兮、、其歧&崔壯# 運接口亥 接著,應清洗該岐管:置3 if罐進㈣漏測試。 作。 又g 再置入新的集裝罐20,開始進行工 為排出殘留於岐管22中之高純 〇 和關閉集裝罐20,下述泣f A日二έ子印、,隔離、減壓 意,除非其他特別:佳者。(吾人應注 程中開啟著)。確令罐回^7^關„閉闊74應在下述整個流 、英力σ播由7罐回肌閥72關閉,該罐回流閥應在輸 t木構中。接者,關閉處理管路隔離閥7〇。之. 裝罐出口閥66。關閉輸送氣體隔離閱7ι,並開啟真; Ϊ閉閥75以及低壓排氣閥73。等到岐管壓力錶92 :賣::έ; 零psia,此大約需時四分鐘。 贫貝出大約 關閉集裝罐入口閥64。關閉低壓排氣閥73 氣體隔離閥7 1以及罐θ & μ 7 9 ” 、’開啟輸送 箄待约车八Η ί 開啟集裝罐出口 _,並 容器回流闊72、集裝罐出口嶋和輸;=離=集裝 啟集裝罐入口間64。前述諸步驟重複數次為:佳開 第36頁 C:\2D-CODE\91-09\91115800.ptd 562911 五、發明說明(34) 者,至少五次。最後,集裝罐入口閥6 4應關閉。 為於空罐2 0拆卸前清洗岐管,進行下述諸步驟為較佳。 開啟罐回流閥7 2和低壓排氣閥7 3。等待約三十秒,以儘量 排出岐管中殘留之高純度化學品。關閉低壓排氣閥7 3,並 開啟輸送氣體隔離閥7 1。等待約四秒鐘,接著關閉輸送氣 體隔離閥7 1。開啟低壓排氣閥約十秒鐘’。艾兩―竹时丹關 閉。重複ό玄低壓排氣閥7 3之關閉、輸送氣體隔離閥7 1之開 啟、等待約四秒鐘再將輸送氣體隔離閥7丨關閉、低壓排氣 ,開啟約十秒鐘、接著再關閉(此進行^至少十九次為較佳) 等諸步驟。接著,關閉真空氣體關閉閥75,並等待約三秒 鐘。之後,開啟該低壓排氣閥73大約五秒鐘。 乂 為拆卸並移離空的集裴罐20,下述諸步驟為較佳。 ’以㈣岐f上加Μ氣體(以氦為較 之正壓力。開啟罐入口和出口閥64和66。配合適當工且, 支撐該罐出口閥66,以防止旋轉,且接著鬆 ^ 66之連接,並拆卸罐出口管道79。相類似口閥 該罐入口管道88。力口壓氣體在整個過程中且俟:::,拆: 應會順利地流出罐入口和出口管道88 、連接新罐前 大氣污染。拆卸水位式感應器電乡覽 安2止岐管之 心翼翼地自包覆體移離空的集裝罐2〇氣女王鏈和帶並小 為設置滿裝的集裝罐2〇,進 翼翼地將集裝罐置入包覆體中,且^ γ ^驟為較佳。小心 以自空的集裝罐20拆卸下的相反作業安全帶和鏈。 和出口閥66至入口和出口管道88和7:。連=罐入口閥64 連接水位式感應器Page 35 562911 V. Description of the invention (33) Closed valve 74 is opened, and the gas transmission compartment 7 is opened. The processing pipeline is separated by 70, and the vacuum gas shutoff valve 75 is closed. The low exhaust valve ^ is closed, and the tank is refluxed. The valve 72 is closed, and the tank inlet valve "opens and the tank outlet valve ⑼ opens. Production: ΐ?: Installation 2ν: The following better procedures are used to prevent the transport of high-purity and dry σσ Baixian, the high-purity chemical must be depressurized and isolated from manifold j: Second, clean the manifold. After cleaning, disconnect and remove the empty container. Then, set The newly filled container tank 2 0. Shore needle, and its ambiguities & Cui Zhuang # operation interface Hai, then, the manifold should be cleaned: put 3 if the tank into the leak test. Make again. The container tank 20 is started to discharge the high-purity residues remaining in the manifold 22 and close the container tank 20. The following is to be printed, isolated, and decompressed, unless otherwise specified: The best person. (I should open it during the note.) Make sure that the tank returns ^ 7 ^ Close „Closed 74 should be in the following flow, Yingli σ broadcast from 7 tank back muscle valve 72 Close, the tank return valve should be in the wooden structure. Then, close the processing line isolation valve 70. Of. Canning outlet valve 66. Close the delivery gas isolation module and open the valve; close the valve 75 and the low-pressure exhaust valve 73. Wait until the manifold pressure gauge 92: sell :: έ; zero psia, this takes about four minutes. Lean out approximately close the tank inlet valve 64. Close the low-pressure exhaust valve 73, the gas isolation valve 7 1 and the tank θ & μ 7 9 ”, 'Open the conveyance 箄 waiting car Η Η Open the container tank outlet_, and return the container 72, container outlet 嶋 and Lose; = off = container opening container inlet 64. The above steps are repeated several times as follows: Jiakai Page 36 C: \ 2D-CODE \ 91-09 \ 91115800.ptd 562911 V. Description of the invention (34) At least five times. Finally, the tank inlet valve 64 should be closed. To clean the manifold before disassembling the empty tank 20, it is better to perform the following steps. Open the tank return valve 72 and the low-pressure exhaust valve 7 3. Wait about 30 seconds to discharge as much as possible the high-purity chemicals remaining in the manifold. Close the low-pressure exhaust valve 7 3 and open the delivery gas isolation valve 71. Wait for about four seconds and then close the delivery gas isolation Valve 7 1. Open the low-pressure exhaust valve for about ten seconds'. Ai Liang-Zhu Shidan closed. Repeat the closing of the low-pressure exhaust valve 7 3 and the opening of the transport gas isolation valve 71, wait for about four seconds and then Close the transport gas isolation valve 7 丨, exhaust it at low pressure, open it for about ten seconds, and then close it again (this is at least nineteen The next step is better.) Then, close the vacuum gas shut-off valve 75 and wait for about three seconds. After that, open the low-pressure exhaust valve 73 for about five seconds. 乂 Remove and remove the empty collecting tank 20, the following steps are preferred. 'Add M gas to helium f (with helium as the positive pressure. Open the tank inlet and outlet valves 64 and 66. Cooperate with appropriate work and support the tank outlet valve 66, To prevent rotation, and then loosen the connection of 66, and remove the tank outlet pipe 79. Similar to the port valve, the tank inlet pipe 88. The pressure of the port pressure gas during the entire process and 俟 :::, disassembly: It should flow smoothly Tank inlet and outlet pipes 88, air pollution before connecting a new tank. The water level sensor was removed. The township Lan'an 2 stop manifold was moved away from the empty container tank 20 queen chain and belt. Small is to set a full container tank 20, and put the container tank into the covering body in a gradual manner, and ^ γ ^ step is better. Be careful with the opposite operation safety from the empty container tank 20 disassembly Belt and chain. And outlet valve 66 to inlet and outlet pipes 88 and 7 :. connected = tank inlet valve 64 connected to water level Reactor

562911 五、發明說明(35) 電纜並關閉輸送氣體隔離閥7 1。 在進到下一步驟之前,應進行 關閉閥7 5和低壓排氣閥7 3。約十 閥7 3並打開輸送氣體隔離閥71。 關閉該輸送氣體隔離閥71和真空 當之洩漏測試器,檢查罐連接之 無洩漏發生,清洗該岐管,並接 作。 為清洗該岐管,罐入口和出口 流閥7 2、真空氣體關閉閥7 5和低 十秒鐘後,該低壓排氣閥7 3應關 閥7 1約四秒鐘,且接著將其關閉 該輸送氣體隔離閥7 1之開啟和關 開啟該低壓排氣閥73大約十五秒 真空,且接著將其關閉。關閉該 罐回流閥7 2。 為於正常操作架構中承置該岐 體隔離閥7 1。接著緩慢開啟罐入 罐出口閥6 6。調整壓力調節器至 理管路隔離閥7 〇。 此外,該岐管2 2亦可用來清洗 達此目的,該清洗並清空過程之 閥開啟且將該氣動閥4 2關閉。同 統元件可僅將下游諸閥開啟至所 洩漏測試。開啟真空氣體 秒鐘後,關閉該低壓排氣 數秒鐘(較佳為四秒)後, 氣體關閉間7 5。利用^一適 入口和出口有無洩漏。倘 著加以設置,供正常操 閥64和66係關閉著,罐回 壓排氣閥7 3應先開啟。約 閉。開啟該輸送氣體隔離 。重複該低壓排氣閥73和 閉(至少十九次為較佳)。 冬里以確保岐管上已經抽 真空氣體關閉閥7 5以及該 官2 2 ’緩慢開啟該輸送氣 口閥64 ’之後再緩慢開啟 所需輸送壓力,並開啟處 並清空再填充管路44。為 進灯係將該處理管路隔離 時,倘有需要,額外之系 需清洗的終點而加以清空562911 V. Description of the invention (35) Cable and close the transmission gas isolation valve 71. Before proceeding to the next step, close the valve 75 and the low-pressure exhaust valve 73. Approximately ten valves 7 3 and open the delivery gas isolation valve 71. Close the transfer gas isolation valve 71 and vacuum as a leak tester, check the tank connection for leaks, clean the manifold, and connect. To clean the manifold, the tank inlet and outlet flow valves 7 2, the vacuum gas shut-off valve 75, and the lower ten seconds, the low-pressure exhaust valve 73 should close the valve 71 for about four seconds, and then close it Opening and closing the delivery gas isolation valve 71 opens the low-pressure exhaust valve 73 for about fifteen seconds and then closes it. Close the tank return valve 72. To house the manifold isolation valve 71 in a normal operating framework. Then slowly open the tank inlet valve 6 6. Adjust the pressure regulator to the isolating line isolation valve 7 〇. In addition, the manifold 22 can also be used for cleaning. To this end, the valve of the cleaning and emptying process is opened and the pneumatic valve 4 2 is closed. The same element can only open downstream valves to the leak test. After turning on the vacuum gas for a few seconds, turn off the low-pressure exhaust for a few seconds (preferably four seconds), and then the gas will be shut off for 7 5. Take advantage of the leaks at the inlet and outlet. If it is set so that the normal operating valves 64 and 66 are closed, the tank pressure relief valve 73 should be opened first. About closed. Turn on the transport gas isolation. Repeat the low pressure exhaust valve 73 and close (preferably at least nineteen times). In winter, make sure that the vacuum gas shut-off valve 75 and the valve 22 'have been slowly opened on the manifold, and then slowly open the delivery port valve 64', and then slowly open the required delivery pressure, and open and empty the refill line 44. In order to isolate the processing pipeline for the incoming light, if necessary, the extra is the end point to be cleaned and emptied.

C:\2D-CODE\91-09\91115800.ptd 第38頁 562911 五、發明說明(36) 並清洗。建議用於清洗和清空之時間應予以延長,以允許 所進行清空和清洗之諸管路已完全被抽真空。 雖然本發明之集裝化學品再填充系統業經配合高純度 TEOS加以詳細說明,一如熟習本技藝者所知,該系統具有 許多其他高純度供給源化學品之應用。得用於本發明之化 學品再填充系統之各種高純度之供給源化學品的例示清單 則包刮於表1中。 表1 級丁氧鋁 石朋(Borazine 四氣化碳 三氯乙烷 三氣曱烷 磷酸三假酯 —鼠乙細 三曱基硼酸 二氣甲烷 新丁醇鈦 二乙基石夕烧 鈦 四異丙酯 六氟乙醯基丙 嗣酸 乙醇鈦 銅(I )-三曱基磷烷 四氣化石夕 乙基硼酸 四-二乙基氨欽C: \ 2D-CODE \ 91-09 \ 91115800.ptd Page 38 562911 V. Description of the invention (36) and cleaning. It is recommended that the time for cleaning and emptying should be extended to allow the emptying and cleaning of all lines to be completely evacuated. Although the container chemical refilling system of the present invention has been described in detail in conjunction with high-purity TEOS, as known to those skilled in the art, the system has many other applications for high-purity source chemicals. An exemplary list of various high-purity supply source chemicals that can be used in the chemical refill system of the present invention is shown in Table 1. Table 1 Borazine tetrabutadiene carbon tetrachloroethane trichloroethane trifluoromethane tri-pseudo-pseudo-methylene tris (trimethyl) borate digas methane neobutoxide titanium diethyl sulphate titanium isopropyl Ester hexafluoroacetamidate propionate ethanol titanium copper (I) -trimethylphosphine tetragas fossil ethyl boronic acid tetra-diethylammine

C:\2D-CODE\91-09\91115800.ptd 第39頁 562911 ί、發明說明(37) 二 乙基磷酸 三乙基次磷酸 二 曱基磷酸 四氟化鈦 乙醇鈦 三甲基正矽酸 * 新 丙氧鈦 曱基環四矽氧 異 丁氧鈦 三甲基矽氧硼 三曱基矽石粦 雖然本發明業經詳細說明,應瞭解者,係可對本案所作 之各種改變、取代和互換,仍未脫離如後列所敘述申請專 利範圍之本發明的精神和範疇。 元件編號之說明 1 接 腳 2 接 腳 3 接 腳 4 接 腳 5 接 腳 6 接 腳 7 接 腳 8 接 腳 12 電 磁閱C: \ 2D-CODE \ 91-09 \ 91115800.ptd Page 39 562911 ί, Description of invention (37) Diethyl phosphate triethyl hypophosphite difluorenyl phosphate titanium tetrafluoride ethanol titanium trimethyl orthosilicate * New propoxytitanium ring tetrasilyl isobutoxytitanium trimethylsilyl boron trifluoride silica. Although the present invention has been described in detail, it should be understood that it is possible to make various changes, substitutions and interchanges in this case. , Has not deviated from the spirit and scope of the present invention as claimed in the scope of the patent application described below. Description of component number 1 pin 2 pin 3 pin 4 pin 5 pin 6 pin 7 pin 8 pin 12 Electromagnetic reading

C:\2D-CODE\91-09\91115800.ptd 第40頁 562911 五、發明說明(38) 18 再填充系統 20 集裝罐 21 金屬水位感應器總成 22 岐管 23 磁石 24 金屬浮筒 25 電線 26 電缆 27 扣環 28 中空金屬軸 30 安瓿 31 通道 32 出口通道/導出管 33 中空管路 34 光學感應器 35 電纜 36 出口閥 37 真空/壓力閥 38 入口閥 39 金屬水位感應器 40 控制單元 通道40 41 「安親在南水位」觸 41a 「安瓿在雙高水位」 42 閥C: \ 2D-CODE \ 91-09 \ 91115800.ptd Page 40 562911 V. Description of the invention (38) 18 Refill system 20 Container tank 21 Metal water level sensor assembly 22 Manifold 23 Magnet 24 Metal pontoon 25 Electric wire 26 Cable 27 Retaining ring 28 Hollow metal shaft 30 Ampoule 31 Channel 32 Outlet channel / outlet tube 33 Hollow line 34 Optical sensor 35 Cable 36 Outlet valve 37 Vacuum / pressure valve 38 Inlet valve 39 Metal water level sensor 40 Control unit Channel 40 41 `` Safety at South Water Level '' 41a `` Ampoule at Double High Water Level '' 42 Valve

mmmm

C:\2D-CODE\91-09\91115800.ptd 第41頁 562911 五、發明說明(39) 4 3 蓋 44 再填充管路 45 光學感應器總成 46 套圈 4 7 電缆 48 通道 4 9 高水位金屬水位感應器/第一個金屬水位感應器 5 0 低水位金屬水位感應器/第二個金屬水位感應器 52 控制面板 55 第一個金屬水位感應器總成 58 第二個金屬水位感應器總成 6 0 出口管路 61 夾件 62 凸緣表面 63 管路 64 入口閥 6 5 鎖緊旋纽 6 6 出口閥 67 0形環 69 化學室 70 處理隔離閥 71 輸送氣體隔離閥 72 容器支流閥 73 低壓排氣閥C: \ 2D-CODE \ 91-09 \ 91115800.ptd Page 41 562911 V. Description of the invention (39) 4 3 Cover 44 Refilling pipeline 45 Optical sensor assembly 46 Ferrule 4 7 Cable 48 Channel 4 9 High water level metal level sensor / first metal level sensor 5 0 Low water level metal level sensor / second metal level sensor 52 Control Panel 55 First metal level sensor assembly 58 Second metal level sensor Device assembly 6 0 outlet line 61 clamp 62 flange surface 63 line 64 inlet valve 6 5 locking knob 6 6 outlet valve 67 0-ring 69 chemical chamber 70 processing isolation valve 71 conveying gas isolation valve 72 container tributary Valve 73 Low-pressure exhaust valve

C:\2D-C0DE\91-09\91115800.ptd 第42頁 562911 五、發明說明(40) 7 4 緊急關閉閥 75 真空供給閥 7 6 阻絕閥 77 輸送氣體管路 78 真空管路 79 罐出口管道 8 2 再填充電路 83 「低容積」電路 84 聲響電路 86 測試電路/「雙高水位」電路86 87 「安瓿高」電路 88 通道/罐入口管道 89 通道 91 真空/壓力阻絕閥 92 壓力錶 99 文氏回路 CS1 電纜組 D 9 二極體 D1 4 二極體 D1 7 二極體 D1 9 二極體 D20 二極體 D22 二極體 D23 二極體C: \ 2D-C0DE \ 91-09 \ 91115800.ptd Page 42 562911 V. Description of the invention (40) 7 4 Emergency stop valve 75 Vacuum supply valve 7 6 Blocking valve 77 Conveying gas line 78 Vacuum line 79 Tank outlet pipe 8 2 Refill circuit 83 "Low volume" circuit 84 Acoustic circuit 86 Test circuit / "Double high water level" circuit 86 87 "Ampoule high" circuit 88 Channel / tank inlet pipe 89 Channel 91 Vacuum / pressure block valve 92 Pressure gauge 99 CS1 Cable Group D 9 Diode D1 4 Diode D1 7 Diode D1 9 Diode D20 Diode D22 Diode D23 Diode

C:\2D-CODE\91-09\91115800.ptd 第43頁 562911 五、發明說明(41) F1 保險絲 L1 過濾器總成 LED1 指示燈 LED2 「空容積」指示燈 LED3 「正常容積」指示燈 LED4 「安瓿雙高」指示燈 L E D 5 「安瓶南」指不燈 LED6 「安瓿正在填充」指示燈 LED7 「安瓿未在填充」指示燈 PS1 線性電源供應器 RS 數位磁性舌簧繼電開關 RS1 「低容積」感應繼電開關 RS2 「空容積」感應繼電開關 RS3 「雙高」感應器繼電開關 RS4 「安瓿高」感應器繼電開關 RY1 控制繼電器 RY2 控制繼電器 RY3 控制繼電器 RY4 控制繼電器 RY5 控制繼電器 S1 聲響傳感器 SW1 主電源開關 SW2 「壓按以填充」開關 SW3 「放棄填充」開關C: \ 2D-CODE \ 91-09 \ 91115800.ptd Page 43 562911 V. Description of the invention (41) F1 Fuse L1 Filter assembly LED1 indicator LED2 "empty volume" indicator LED3 "normal volume" indicator LED4 "Ampoule double height" indicator LED 5 "Ampoule south" means no LED 6 "Ampoule is filling" indicator LED7 "Ampule is not filling" indicator PS1 Linear power supply RS Digital magnetic reed relay switch RS1 "Low "Volume" inductive relay switch RS2 "Empty volume" inductive relay switch RS3 "Double height" sensor relay switch RS4 "Ampoule" sensor relay switch RY1 control relay RY2 control relay RY3 control relay RY4 control relay RY5 control relay S1 Acoustic sensor SW1 Main power switch SW2 "Press to fill" switch SW3 "Abandon fill" switch

C:\2D-CODE\91-09\91115800.ptd 第44頁 562911 五、發明說明(42) SW4 「壓按無聲響」開關 開關 S W 5 「壓按以測試指示燈」 VI 空氣控制閥 V2 空氣控制閥C: \ 2D-CODE \ 91-09 \ 91115800.ptd Page 44 562911 V. Description of the invention (42) SW4 "Press to silence" switch SW 5 "Press to test indicator" VI Air control valve V2 Air Control valve

C:\2D-CODE\91-09\91115800.ptd 第45頁 圖式簡單說明 圖1為根據本發明一呈麵 系統的示意圖; 〃南純度化學品再填充輸送 圖2為根據本發明—呈 視圖; 工制早元之控制面板的前 圖3為五加命式高純度化“。 圖4為-具體例之單—水位::盗的部分剖面側視圖; 置的示意圖; 〉予向控制感應器於「開」位 圖5為本發明之一具雕 口口 「關」位置的示意圖;,之早水位浮筒控制感應器於 圖6為根據本發明一且雕 側視圖; ”版,可填充式安瓿的部分剖面 圖7為圖6中所示安 圖8為根據本發明另且^視圖; 面概略側視圖; ^ ^例之可填充式安瓿的部分剖 圖9為根據本發明一 水位開關總成的側視圖;土八肢例之可填充式容器用金屬 圖1 〇為根據本發明另一呈雕 位開關總成的側視圖;/、肢例之可填充式容器用金屬水 圖11為根據本發明—罝轉 總成的側視圖; 一 列之集裝容器用金屬水位開關 圖1 2為根據本發明另 關總成的側視圖; 一具體例之集裝容器用金屬水位開 圖1 3為供現有半導 觸用之一般習知調整 體製造設備與一 $路的示意圖; 光學水位式感應器接C: \ 2D-CODE \ 91-09 \ 91115800.ptd Page 45 Brief Description of the Drawings Figure 1 is a schematic diagram of a noodle system according to the present invention; refilling and transportation of Taonan purity chemicals Figure 2 is according to the present invention-rendering Front view of the control panel of the early system of the industrial system. Figure 3 is a five-plus-type high-purification ". Figure 4 is a specific example-water level :: a partial cross-sectional side view of the theft; The sensor is in the "on" position. Fig. 5 is a schematic view of the carved port "closed" position according to the present invention. The early water level buoy control sensor is shown in Fig. 6 as a side view according to the present invention; Partial sectional view of the filled ampoule FIG. 7 is shown in FIG. 6 and FIG. 8 is another view according to the present invention; a schematic side view of the surface; Side view of switch assembly; Metal for filling container with eight limbs Figure 10 is a side view of another switch assembly with carved position according to the present invention; 11 is a side view of the revolving assembly according to the present invention; a row of container containers Metal water level switch Figure 12 is a side view of another closed assembly according to the present invention; a specific example of the metal water level for a container is opened. Figure 13 is a conventionally known adjusting body manufacturing equipment and a $ Road schematic diagram; optical water level sensor

562911 圖式簡單說明 圖1 4為習知光學水位式感應器的電路示意圖; 圖1 5、1 5A和1 5B為控制單元用之控制電路的示意圖; 圖1 6為根據本發明一具體例之岐管架設的前視圖; 圖1 7為供本發明一具體例用之岐管架設的前視圖;以及 圖1 8為供本發明較佳具體例用之岐管架設的示意圖。562911 Brief description of the diagrams Figure 14 is a schematic diagram of a conventional optical water level sensor circuit; Figures 15, 15A and 15B are schematic diagrams of a control circuit for a control unit; Figure 16 is a schematic diagram of a specific example according to the present invention. Front view of the manifold erection; FIG. 17 is a front view of the manifold erection for a specific example of the present invention; and FIG. 18 is a schematic view of the manifold erection for a specific example of the present invention.

C:\2D-CODE\91-09\91115800.ptd 第47頁C: \ 2D-CODE \ 91-09 \ 91115800.ptd Page 47

Claims (1)

562911562911 ’其包含一入 一低水位信號 該第一金屬容 • >種向純度化學品再填充系統,包含: 一第一金屬容器,供儲存諸高純度化學品 口、二出口及第一水位感應器,且產生至少 牙 问水位化號’該第一水位感應器設置於 〇 -=二金屬容器,供儲存諸高純度Ίυ千而,其包含一 ?卢,;ί 口及第二水位感應器’且產生至少-低水二言 虎一5亥弟二水位感應器設置於該第二金屬容器内;'It contains a low water level signal and the first metal capacity. ≫ A repurchasing system for directional chemicals, including: a first metal container for storing high purity chemicals, two outlets, and a first water level sensor. The first water level sensor is provided in a 0- = two metal container for storing high-purity water pumps, which includes a magnetic field, and a mouth and a second water level sensor. 'And produce at least-low-water two-speaking tigers one and five Haidi two water level sensors are arranged in the second metal container; 一再填充管路,以可移離方式連接該第一:屬容器之 入口以及該第二金屬容器之該出口; 一第一閥,其在該再填充管路中; 一惰,氣體壓力源,供連通該第二金屬容器之内部; 。。匕制單元,電連通泫第一水位感應器、該第二水位感應 二乂及《亥第一閥,其中該第一閥係開啟,以回應該控制單 元自該第一水位感應器所接收之低水位信號,而允許諸高 純度化學品輸入該第一金屬容器,接著,該第一閥關閉, 以回應該控制單元自該第一水位感應器所接收之高水位传 號,而終止諸高純度化學品之輸入;以及 σ 一岐管,其包含: 一輸送氣體管路, 該第二金屬容器; 自該惰性氣體壓力源提供惰性氣體予A refilling pipeline, which is removably connected to the first: the inlet of the container and the outlet of the second metal container; a first valve in the refilling pipeline; an inert, gas pressure source, For communicating with the inside of the second metal container; . The dagger unit is electrically connected to the first water level sensor, the second water level sensor two, and the first valve of the Hai, wherein the first valve system is opened in response to the control unit receiving from the first water level sensor. The low water level signal allows high-purity chemicals to be input into the first metal container. Then, the first valve is closed in response to the high water level signal received by the control unit from the first water level sensor, and the high levels are terminated. Input of purity chemicals; and a sigma manifold comprising: a transport gas line, the second metal container; and an inert gas supplied from the inert gas pressure source 一第二閥,其設置於該再填充管路内,其中該第二閥可 被關閉,以自部分該再填充管路隔離該第二金屬容哭之兮 出口閥;A second valve disposed in the refilling pipeline, wherein the second valve can be closed to isolate the second metal cryogenic outlet valve from part of the refilling pipeline; 562911 六、申請專利範圍 一第三閥,其設置於該輸送氣體管路内,其中該第三閥 可被關閉,以自該第二金屬容器之該入口閥隔離該惰性氣 體壓力源; 一供連接一真空源至該輸送氣體管路的裝置;以及 一供將該惰性氣體壓力源和真空源回流至至少部分該再 填充管路的裝置,該至少部分再填充管路並未被該第二閥 所隔離。 2. 如申請專利範圍第1項之高純度化學品再填充系統, 其中該第一金屬容器包含不銹鋼。 3. 如申請專利範圍第2項之高純度化學品再填充系統, 其中該第二金屬容器包含不銹鋼。 4. 如申請專利範圍第1項之高純度化學品再填充系統, 其中該第一閥為通常關閉之氣動閥。 5. 如申請專利範圍第1項之高純度化學品再填充系統, 其中該第二金屬容器尚包含具有與該入口整裝為一體之入 口氣動閥。 6. 如申請專利範圍第1項之高純度化學品再填充系統, 其中該第二金屬容器尚包含具有與該出口整裝為一體之出 口氣動閥。 7. 如申請專利範圍第1項之高純度化學品再填充系統, 其中該第一水位感應器為不鏽鋼金屬浮筒感應器。 8. 如申請專利範圍第1項之高純度化學品再填充系統, 其中該第二水位感應器為不鏽鋼金屬浮筒感應器。 9. 一種再填充第一金屬容器之方法,使用如申請專利範562911 VI. Patent application scope A third valve is arranged in the conveying gas pipeline, wherein the third valve can be closed to isolate the inert gas pressure source from the inlet valve of the second metal container; A device for connecting a vacuum source to the gas transmission line; and a device for returning the inert gas pressure source and the vacuum source to at least part of the refilling line, the at least part of the refilling line not being used by the second The valve is isolated. 2. The high-purity chemical refilling system according to item 1 of the patent application, wherein the first metal container comprises stainless steel. 3. The high-purity chemical refilling system of item 2 of the patent application, wherein the second metal container comprises stainless steel. 4. If the high-purity chemical refilling system of item 1 of the patent application scope, wherein the first valve is a normally closed pneumatic valve. 5. If the high-purity chemical refilling system of item 1 of the patent application scope, wherein the second metal container further includes an inlet pneumatic valve that is integrated with the inlet. 6. If the high-purity chemical refilling system of item 1 of the patent application scope, wherein the second metal container further includes an outlet pneumatic valve integrally with the outlet. 7. The high-purity chemical refilling system of item 1 of the patent application scope, wherein the first water level sensor is a stainless steel metal float sensor. 8. The high-purity chemical refilling system of item 1 of the patent application scope, wherein the second water level sensor is a stainless steel metal float sensor. 9. A method for refilling a first metal container using a patent application C:\2D-(DDE\91-09\91]15800.ptd 第49頁 562911 六 申請專利範圍 圍第1項之高純度化學品再填充系統,包含·· 以U性氣體,加壓該第二金屬容哭; ::啟該第一 Μ,以回應該控制單元自該第一水 之低水位㈣,而允許高純度化學品自該第::屬° 今為輸入該第一金屬容器;以及 、’屬 :閉該第- Μ ’以回應該控制單元自該第一水位哭 之高水位信Ε,而終止高純度化學品自該第::屬。 今态輪入該第一金屬容器。 、屬 10·厂種高純度化學品再填充系統,包含: 第一金屬容器,供儲存諸高純度化學品,其包含一入 采一古出口及第一水位感應裔,且產生至少一低水位信號 哭口内南水位信號,該第一水位感應器設置於該第一金屬容 第二金屬容器 一出口及第二 該第二水位感 再填充管路, 以及該第二金 一第一閥,其在 一惰性氣體壓力 一控制單元,電 應器以及該第一閥 單元自該第一水位 高純度化學品輸入 口 號 入 ’供儲存諸高純度化學品,其包含一入 水位感應裔,且產生至少一低水位信 應器設置於該第二金屬容器内; 以可移離方式連接該第一金屬容器之該 屬容器之該出口; 5亥再填充管路中; 源’供連通該第二金屬容器之内部; 連通該第一水位感應器、該第二水位感 、其中泫第一閥係開啟,以回應該控制 感應器所接收之低水位信號,而允許諸 該第一金屬容器,接著,該第一閥關C: \ 2D- (DDE \ 91-09 \ 91] 15800.ptd Page 49 562911 Six high-purity chemical refilling systems covering the scope of item 1 of the patent application, including ... U-gas is used to pressurize the The two metals are allowed to cry; :: start the first M to respond to the control unit from the low water level of the first water, and allow high-purity chemicals from the first :: belongs to the first metal container; And, 'genus: Close the first -M' in response to the control unit crying from the first water level to the high-water level letter E, and terminate the high-purity chemical from the first:: genus. The current state turns into the first metal container . It belongs to the 10 · plant high-purity chemical refilling system, including: a first metal container for storing high-purity chemicals, which includes an inlet and an ancient outlet and a first water level sensor, and generates at least one low A water level signal, a south water level signal in the mouth, the first water level sensor is disposed at an outlet of the first metal container, a second metal container, and a second water level sensing refilling pipeline, and the second gold-first valve, It is under an inert gas pressure a control unit, a reactor and The first valve unit receives a high-purity chemical input slogan for storing high-purity chemicals from the first water level. The first valve unit includes a water-level induction sensor and generates at least one low-water level receiver disposed in the second metal container. ; Removably connect the outlet of the first metal container that belongs to the container; refill the pipeline in 5h; the source is used to communicate with the interior of the second metal container; communicate with the first water level sensor, the first Two water level senses, where the first valve system is opened in response to the low water level signal received by the control sensor to allow the first metal container, and then the first valve is closed 562911 六、申請專利範圍 閉,以回應該控制單元自該第一水位感應器所接收之高水 位信號,而終止諸高純度化學品之輸入;以及 一岐管,其包含: 一處理管路隔離閥,其在該再填充管路中,以隔離該第 二金屬容器與部分該再填充管路: 一輸送氣體隔離閥,供隔離該第二金屬容器與該惰性氣 體壓力源; 一在該輸送氣體管路中之低壓排氣閥;以及 一在該輸送氣體管路中之容器回流閥。 11.如申請專利範圍第1 0項之高純度化學品再填充系 統,其中該第一金屬容器包含不銹鋼。 1 2.如申請專利範圍第11項之高純度化學品再填充系 統,其中該第二金屬容器包含不銹鋼。 1 3.如申請專利範圍第1 0項之高純度化學品再填充系 統,其中該第一閥為通常關閉之氣動閥。 1 4.如申請專利範圍第1 0項之高純度化學品再填充系 統,其中該第二金屬容器尚包含具有與該入口整裝為一體 之入口氣動閥。 1 5.如申請專利範圍第1 0項之高純度化學品再填充系 統,其中該第二金屬容器尚包含具有與該出口整裝為一體 之出口氣動閥。 1 6.如申請專利範圍第1 0項之高純度化學品再填充系 統,其中該第一水位感應器為不鏽鋼金屬浮筒感應器。 1 7.如申請專利範圍第1 0項之高純度化學品再填充系562911 VI. The scope of patent application is closed in response to the high water level signal received by the control unit from the first water level sensor to terminate the input of high-purity chemicals; and a manifold including: a processing pipeline isolation A valve in the refilling pipeline to isolate the second metal container from part of the refilling pipeline: a transport gas isolation valve for isolating the second metal container from the inert gas pressure source; A low-pressure exhaust valve in the gas line; and a container return valve in the gas delivery line. 11. The high-purity chemical refilling system of claim 10, wherein the first metal container comprises stainless steel. 1 2. The high-purity chemical refilling system according to item 11 of the patent application scope, wherein the second metal container comprises stainless steel. 1 3. The high-purity chemical refilling system according to item 10 of the patent application scope, wherein the first valve is a normally closed pneumatic valve. 1 4. The high-purity chemical refilling system according to item 10 of the patent application scope, wherein the second metal container further includes an inlet pneumatic valve that is integrated with the inlet. 15. The high-purity chemical refilling system according to item 10 of the patent application scope, wherein the second metal container further comprises an outlet pneumatic valve having an outlet integrally with the outlet. 16. The high-purity chemical refilling system according to item 10 of the patent application scope, wherein the first water level sensor is a stainless steel metal float sensor. 1 7. The high-purity chemical refilling system as described in the scope of patent application No. 10 C:\2D-CODE\91-09\91115800.ptd 第51頁 562911 六、申請專利範圍 統,其中該第二水位感應器為不鏽鋼金屬浮筒感應器。 1 8. —種再填充第一金屬容器之方法,利用如申請專利 範圍第1 0項之高純度化學品再填充系統,包含: 以惰性氣體,加壓該第二金屬容器; 開啟該第一閥,以回應該控制單元自該第一水位感應器 所接收之低水位信號,而允許高純度化學品自該第二金屬 容器輸入該第一金屬容器;以及 關閉該第一閥,以回應該控制單元自該第一水位感應器 所接收之高水位信號,而終止高純度化學品自該第二金屬 容器輸入該第一金屬容器。C: \ 2D-CODE \ 91-09 \ 91115800.ptd Page 51 562911 6. Scope of patent application, where the second water level sensor is a stainless steel metal float sensor. 1 8. A method for refilling the first metal container, using a high-purity chemical refilling system such as the scope of patent application No. 10, comprising: pressurizing the second metal container with an inert gas; opening the first metal container A valve in response to a low water level signal received by the control unit from the first water level sensor, and allowing high-purity chemicals to be input from the second metal container into the first metal container; and closing the first valve in response The control unit receives a high water level signal from the first water level sensor, and terminates the high-purity chemical input from the second metal container to the first metal container. C:\2D-mDE\91-09\91115800.ptd 第52頁C: \ 2D-mDE \ 91-09 \ 91115800.ptd Page 52
TW91115800A 2001-07-16 2002-07-16 Refillable ampule and method re same TW562911B (en)

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