TW561089B - Method for manufacturing mold inserts of light guide plates - Google Patents

Method for manufacturing mold inserts of light guide plates Download PDF

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Publication number
TW561089B
TW561089B TW91109448A TW91109448A TW561089B TW 561089 B TW561089 B TW 561089B TW 91109448 A TW91109448 A TW 91109448A TW 91109448 A TW91109448 A TW 91109448A TW 561089 B TW561089 B TW 561089B
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Taiwan
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substrate
polishing
light guide
processing
guide plate
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TW91109448A
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Chinese (zh)
Inventor
Jen-Chang Shiu
Ching-Fang Wang
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Wintek Corp
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Publication of TW561089B publication Critical patent/TW561089B/en

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Abstract

Disclosed is method for manufacturing mold inserts of light guide plates, which employs mechanical machining or laser machining to performing point machining operation on a machining surface of a substrate, so as to form a lumpy surface having plural dimples on the machining surface of the substrate. The substrate after machining is placed in a polishing tank for electrolysis or chemical polishing. Course protrusions projecting beyond the dimples on the substrate are subjected to a greater extent of etching to form smooth and fine surfaces. The substrate after polishing is placed in a nickel-plating tank, to deposit a nickel layer on the lumpy surface and the dimples by means of oxidation reduction, whereby the surfaces of the nickel layer forms a micro-structural face identical to the lumpy surface. The substrate plated with a nickel layer thereon may serve as a mold insert for light guide plates.

Description

561089 五、發明說明(1) 【技術領域】 本發明係有關一種導光板模仁之製造方法,其係先對 基材進行網點加工後,再藉由拋光步驟及鍍鎳層步驟,使 基材表面沈積光滑精細錄層之導光板模仁製造方法。 【先前之技術】 請參考第3 A圖,係一種習用之模仁微結構的成型方 法示意圖,其係利用一預定形狀之刀具8 1在一基材8 2 表面加工,使該基材8 2表面形成具有多數微結構凹部8 2 1 ,藉以作為模仁。561089 V. Description of the invention (1) [Technical field] The present invention relates to a method for manufacturing a light guide plate mold core, which first performs a dot processing on the substrate, and then performs a polishing step and a nickel plating step to make the surface of the substrate Manufacturing method of light guide plate mold core for depositing smooth and fine recording layer. [Previous technology] Please refer to FIG. 3A, which is a schematic diagram of a conventional mold core microstructure forming method, which uses a predetermined shape of a tool 8 1 on a substrate 8 2 surface processing to make the substrate 8 2 A concave portion 8 2 1 having a plurality of microstructures is formed on the surface as a mold core.

惟,請參考第3 B圖,其係該微結構凹部8 2 1之局 部放大示意圖,由於微結構凹部8 2 1係利用刀具8 1直 接雕刻所形成,導致微結構凹部8 2 1因刀具8 1切削端 之形狀,所經過之區域即會產生許多鋸齒狀凹凸的痕跡S ,而難以形成光滑平整的表面,以致影響光反射後之方向 〇 此外,刀具8 1為求能夠加工出微細的結構圖形,故 刀具8 1本身之尺寸通常較小(此種刀具通常為微形鑽頭 ),且為了讓刀具8 1加工容易,基材8 2表面的硬度便 不宜過高,但也因為基材8 2表面的硬度低,故將基材8 2放入模具中以作為模仁時,由於塑料是藉由高壓注入模 具中,使得基材8 2表面很容易受到塑料之衝擊、磨擦, 模仁本身之精度亦因此而降低,相對地影響到塑料成形後 所形成的導光板表面微結構。 但若提高基材表面之硬度,卻又會有加工不易,且刀However, please refer to FIG. 3B, which is a partially enlarged schematic diagram of the microstructure concave portion 8 2 1. Because the microstructure concave portion 8 2 1 is formed by direct engraving with the tool 8 1, the micro structure concave portion 8 2 1 is caused by the tool 8 1 the shape of the cutting end, there will be many sawtooth-like unevenness marks S in the passing area, and it is difficult to form a smooth and flat surface, which affects the direction after light reflection. In addition, the tool 8 1 is to be able to process fine structures Graphics, so the size of the tool 8 1 itself is usually small (this kind of tool is usually a micro drill), and in order to make the tool 8 1 easy to process, the hardness of the surface of the substrate 8 2 should not be too high, but also because of the substrate 8 2 The surface hardness is low, so when the substrate 8 2 is put into the mold as the mold kernel, the plastic is injected into the mold by high pressure, so that the surface of the substrate 8 2 is easily affected by the impact and friction of the plastic. The mold kernel itself As a result, the accuracy is also reduced, which relatively affects the surface microstructure of the light guide plate formed after the plastic is formed. However, if the hardness of the surface of the substrate is increased, it will be difficult to process, and the knife

561089 五、發明說明(2) 具容易損耗的缺點。 因此,為了克服高硬度基材以傳統加工方式的問題, 於是衍生出利用黃光製程來製造導光板模仁的方法,請參 考第4圖,其係在一基材9 1上塗佈一層光阻層9 2後, 再對該光阻層9 2進行選擇性曝光,使光阻層形成多數曝 光部分9 2 1及未曝光部分9 2 2。 再將曝光過之基材9 1浸於一顯影液9 4中,使未曝 光部份9 2 2 (或曝光部分9 2 1 )被蝕刻掉,而後,將 基材9 1自顯影液中取出進行熱處理,使曝光部份9 2 1 (或未曝光部分9 2 2 )之頂部受熱軟化,而分別形成一 概呈圓形而均勻對稱之變形結構9 2 3 。 再於光阻層9 2頂面電鍍一金屬層9 3後,使基材9 1與金屬層9 3分離,該金屬層9 3底面即形成多數與變 形結構9 2 3互補之微結構9 3 1 。 雖然,黃光製程能夠製造出較精密的模仁,但因需要 進行曝光、顯影、電鍍等多重複雜程序,而顯得較為麻煩 ,且需花費較長的加工時間,且設備價格高昂,並不符經 濟效益。 【目的及功效】 本發明之主要目的,在於解決上述的問題而提供一種 導光板模仁之製造方法,其係先對一基材進行網點加工後 ,再藉由拋光處理使基材表面光滑精細,而製得之模仁, 並藉以讓翻模後所產生之導光板表面亦能夠光滑,以增進 導光功效;並藉由本發明之方法,來簡化導光板模仁之製561089 V. Description of the invention (2) It has the disadvantage of easy loss. Therefore, in order to overcome the problem of traditional processing methods for high-hardness substrates, a method for manufacturing light guide plate molds using a yellow light process has been derived. Please refer to FIG. 4, which is a layer of light coated on a substrate 91. After the resist layer 92, the photoresist layer 92 is selectively exposed, so that the photoresist layer forms a plurality of exposed portions 9 2 1 and unexposed portions 9 2 2. The exposed substrate 9 1 is immersed in a developing solution 9 4 so that the unexposed portion 9 2 2 (or the exposed portion 9 2 1) is etched away, and then the substrate 9 1 is taken out of the developing solution. Heat treatment is performed to soften the top of the exposed portion 9 2 1 (or the unexposed portion 9 2 2), and respectively form a deformed structure 9 2 3 that is approximately circular and uniformly symmetrical. After plating a metal layer 9 3 on the top surface of the photoresist layer 9 2, the substrate 9 1 is separated from the metal layer 9 3, and the bottom surface of the metal layer 9 3 forms a plurality of microstructures complementary to the deformed structure 9 2 3. 1 . Although the yellow light process can produce more precise mold kernels, it is more cumbersome due to the multiple complicated procedures such as exposure, development, and plating, and it takes a long processing time, and the equipment is expensive and uneconomical. benefit. [Objective and Effect] The main purpose of the present invention is to solve the above-mentioned problems and provide a method for manufacturing a light guide plate mold kernel, which first performs dot processing on a substrate, and then smoothes the surface of the substrate by polishing. The manufactured mold core is used to make the surface of the light guide plate generated after the mold turn smooth, so as to improve the light guide effect; and the method of the present invention is used to simplify the manufacture of the light guide plate mold core.

561089 五、發明說明(3) 造程序並縮短製造時間,而提高經濟效益。 本發明之次一目的,為提供一種導光板模仁之製造方 法,其係先以硬度較低之合金作為基材,而以一刀具對基 材加工完成後,再於基材表面形成一錄層而製得一模仁, 藉以提高模仁表面之硬度並延長使用壽命,同時能夠避免 刀具之損耗。 【技術内容】 本發明係提供一種導光板模仁之製造方法,包括下列步驟 網點加工步驟:以一加工器具對一基材之一加工面進 行加工,使該基材之加工面形成一具有多數凹穴之凹凸面 ,該凹穴之内面在加工後產生多數不規則凹凸之粗糙凸部 及粗糙凹部;拋光步驟:將該被加工過之基材置入一拋光 槽中,該拋光槽中承置有一拋光液,使該拋光液對該基材 之凹穴内較為凸出之粗糙凸部,產生較大程度地蝕刻,而 該粗糙凹部因係呈凹面狀態,則被小幅度的钱刻,以為不 均等蝕刻,使基材之凹穴形成光滑精細表面;鍍鎳層步驟 將該拋光完成之基材另置於一鍍鎳槽中,以氧化還原 的方式於該基材被加工過之凹凸面及該多數凹穴上沈積一 鎳層,該鎳層之表面係形成與該基材之凹凸面相同之微結 構面,使其表面具有金屬鎳層之基材即可成為導光板之模 仁(> 本發明之上述及其他目的與優點,不難從下述所選用561089 V. Description of the invention (3) Manufacturing process and shortening manufacturing time, and improving economic benefits. A second object of the present invention is to provide a method for manufacturing a light guide plate mold core, which first uses a lower hardness alloy as a substrate, and after a substrate is processed with a cutter, a recording layer is formed on the surface of the substrate. A mold kernel is made to increase the hardness of the surface of the mold kernel and extend the service life, and at the same time, to avoid the loss of the tool. [Technical content] The present invention provides a method for manufacturing a light guide plate mold core, which includes the following steps and dot processing steps: processing a processing surface of a substrate with a processing tool, so that the processing surface of the substrate has a plurality of depressions. The concave and convex surface of the cavity, and the inner surface of the cavity produces rough irregularities and rough depressions with irregular irregularities after processing; polishing step: the processed substrate is placed in a polishing bath, and the polishing bath is placed in the polishing bath There is a polishing liquid, which causes the rough convex part protruding more prominently in the cavity of the substrate to be etched to a large extent, and the rough concave part is engraved by a small amount of money because it is in a concave state. Equally etch to form a smooth and fine surface of the cavity of the substrate; the step of nickel plating layer places the polished substrate in a nickel plating bath, and oxidizes and reduces the uneven surface of the substrate and A nickel layer is deposited on the plurality of recesses, and the surface of the nickel layer is formed with the same microstructure surface as the uneven surface of the substrate, so that the substrate having the metal nickel layer on the surface can become the mold core of the light guide plate. ≫ The above and other objects and advantages of the present invention, chosen from the following difficult

561089 五、發明說明(4) 貫施例之詳細說明與附圖中’獲得深入了解。 當然,本發明在某些另件上,或另件之安排上容許有 所不同,但所選用之實施例,則於本說明書中,予以詳細 說明,並於附圖中展示其構造。 【實施例之詳細說明】 請參閱第1圖和第2圖,圖中所示者為本發明所選用 之第一實施例結構,此僅供說明之用,在專利申請上並不 受此種結構之限制。 本發明係一種導光板模仁之製造方法,其以包括下列 步驟: 網點加工步驟:以一碳化鎢之刀具6對一基材1之一 加工面1 2進行雕刻,本貫施例中,該基材1係以皱銅合 金(其硬度為H R C 2! 0 )製造而成,該刀具6係為一微 形鑽頭,該刀具6之切削之進給端具有一呈錐狀面之切削 端6 1 ,該切削端6 1具有一刃口角6 1 1 ,該刃口角6 1 1之失角為九十度,並設定該刀具6之轉速為3 0 0 0 0 r p in (轉/分),且該刀具6與基材1每次接觸之時 間為0 · 1秒,單次進給深度1 0〜7 0 u m ;使該刀具6之 切削端6 1觸及該基材1之加工面1 2 ,使該加工面1 2 形成一具有多數凹穴1 1 1之凹凸面1 1 ,該多數凹穴1 1 1之内徑大於該刀具6之外徑,且深度為1 0〜7 0 u m, 該凹穴1 1 1之内面會因刀具6之雕刻,及該刀具6刃口 角6 1 1之關係,而產生多數不規則凹凸之粗糙凸部1 1 2及粗糙凹部1 1 3 。561089 V. Description of the invention (4) Detailed descriptions of the embodiments and the drawings ′ gain in-depth understanding. Of course, the present invention allows some differences in the arrangement or arrangement of other parts, but the selected embodiment is described in detail in this specification and its structure is shown in the drawings. [Detailed description of the embodiment] Please refer to FIG. 1 and FIG. 2. The structure shown in the figure is the structure of the first embodiment selected by the present invention. This is for illustrative purposes only, and is not subject to this in patent applications. Structural restrictions. The invention relates to a method for manufacturing a light guide plate mold core, which comprises the following steps: a dot processing step: engraving a processing surface 12 of a substrate 1 with a tungsten carbide tool 6; in the present embodiment, the substrate Material 1 is made of corrugated copper alloy (its hardness is HRC 2! 0). The cutter 6 is a micro-shaped drill. The cutting feed end of the cutter 6 has a cutting end 6 1 with a tapered surface. , The cutting end 6 1 has a cutting edge angle 6 1 1, the missing angle of the cutting edge angle 6 1 1 is ninety degrees, and the rotation speed of the tool 6 is set to 3 0 0 0 0 rp in (rev / min), and The time of each contact between the tool 6 and the substrate 1 is 0 · 1 second, and the single feed depth is 10 to 70 um; the cutting end 6 1 of the tool 6 touches the processing surface 1 2 of the substrate 1, The processing surface 1 2 is formed into a concave-convex surface 1 1 having a plurality of recesses 1 1 1. The inner diameter of the plurality of recesses 1 1 1 is larger than the outer diameter of the tool 6 and the depth is 10 to 7 0 um. Due to the relationship between the engraving of the cutter 6 and the cutting edge angle of the cutter 6 1 1 on the inner surface of the recess 1 1 1, there are many irregular convex rough projections 1 1 2 and rough recesses 1 1 3.

第7頁 561089 五、發明說明(5) 拋光步驟:本實施例係以電解拋光為例,將該鈹銅合 金之基材1置入一電解拋光槽A中,該電解拋光槽A中承 置有一填酸水溶液3 2 (該填酸水溶液3 2之填酸(Η 3 Ρ〇3 )與水體積比為7 2 : 2 8 ),該磷酸水溶液3 2 中並置有一銅片31 ,以該銅片31作為陰極,而該基材 1作為陽極,分別使該銅片3 1接通負極電流,而該基材 1接通正極電流^並在室溫(2 5 C )下施予電流密度 6〜8 A S D ,進行電解拋光3分鐘。請參考第2圖,當 進行電解拋光時,該凹穴1 1 1内較為凸出之粗糙凸部1 1 2因較易形成尖端放電之效應,故會被較大程度地蝕刻 掉,而反觀該粗糙凹部1 1 3因係呈凹面狀態,則不易被 大幅度的蝕刻,故能在不均等蝕刻下,使基材1之凹穴1 1 1漸漸形成光滑精細表面。 鍍鎳層步驟:將拋光完成該鈹銅合金之基材1另置於 一鍵錄槽B中,該鑛鎳槽B中則置有一錄一填溶液2 ,該 鎳一磷溶液2係被加溫至8 0〜9 0 °C,且ρ Η值4 . 5 ,以氧化還原的方式於該基材1被加工過之凹凸面1 1及 該多數凹穴1 1 1上沈積一鎳層1 3 ,該鎳層1 3之厚度 為5 u m,且該錄層1 3之硬度為H R C 4 5 ,該鎳層1 3之表面係形成與該基材1之凹凸面1 1相同形狀之微結 構面1 4 ,並使具有錄層1 3之該鈹銅之基材1即可成為 一模仁4 ◦藉由該錄層1 3提高基材1表面之硬度且延長 基材1之使用壽命,以避免習用技術中因為模仁硬度較低 使用壽命有限的情況發生。Page 7 561089 V. Description of the invention (5) Polishing step: This embodiment is an example of electrolytic polishing. The substrate 1 of the beryllium copper alloy is placed in an electrolytic polishing tank A, and the electrolytic polishing tank A is placed. An acid-filled aqueous solution 3 2 (the volume ratio of the acid-filled aqueous solution (Η 3 PO 3) to the water is 7 2: 2 8), and the phosphoric acid aqueous solution 3 2 is juxtaposed with a copper sheet 31. The sheet 31 is used as the cathode, and the substrate 1 is used as the anode. The copper sheet 3 1 is connected to the negative current, and the substrate 1 is connected to the positive current ^, and a current density of 6 is applied at room temperature (2 5 C). ~ 8 ASD, electrolytic polishing for 3 minutes. Please refer to Figure 2. When the electrolytic polishing is performed, the rough convex portion 1 1 2 which is more convex in the cavity 1 1 1 is more likely to be etched due to the effect of tip discharge. Since the rough concave portion 1 1 3 is in a concave state, it is not easy to be etched to a large extent, so that the unevenness 1 1 1 of the base material 1 can gradually form a smooth and fine surface under uneven etching. Step of nickel plating: The substrate 1 of the beryllium copper alloy after polishing is placed in another key recording tank B, and a recording and filling solution 2 is placed in the nickel nickel tank B. The nickel-phosphorus solution 2 is added. A nickel layer 1 is deposited on the embossed surface 1 1 of the substrate 1 and the majority of the recesses 1 1 1 by a redox method at a temperature of 80 to 9 0 ° C and a ρ Η value of 4.5. 3, the thickness of the nickel layer 13 is 5 um, and the hardness of the recording layer 13 is HRC 4 5. The surface of the nickel layer 13 is formed into a microstructure with the same shape as the uneven surface 11 of the substrate 1. Surface 1 4 and make the base material 1 of the beryllium copper with the recording layer 1 3 become a mold core 4 ◦ through the recording layer 13 to increase the hardness of the surface of the substrate 1 and extend the service life of the substrate 1, In order to avoid the situation of conventional technology because of the lower hardness of the mold kernel, the limited life span occurs.

561089 五、發明說明(6) 另外,該拋光步驟亦可採用硝酸、硫酸、鹽酸、磷酸 …等溶液或其混合之溶液作化學拋光方式來處理,而無論 電解或化學拋光技術,皆為習知者,且非本發明技術特徵 ,在此不另詳述。 由上述說明可知,本發明藉由在刀具6將基材1雕刻 完成後,即對基材1進行拋光步驟,再鍍上鎳層1 3 ,使 該模仁4之微結構面1 4表面能夠光滑及維持預定之硬度 ,進而讓翻模後所產生之導光板之微結構具有一光滑之導 光面,藉以增進導光功效。 再者,在本發明之方法中,只要於基材1加工後,進 行拋光處理使其表面光滑,及鍍錄層1 3之加工步驟,即 製得模仁4。由於本發明保持了傳統機械加工方式之快速 切削特性,使得本發明比傳統之黃光製程加工方式,可大 大地簡化製造程序,及縮短製造時間,而提高經濟效益; 且更進一步的消除了傳統機械加工方式無法克服之微結構 面表面光滑之問題,而使得以本發明模仁4製成之導光板 之導光效率得以提高。 綜上所述,本發明之網點加工係可利用刀具加工或雷 射加工方式於基材上加工,使基材表面形成一凹凸面後, 進行拋光處理,使微結構面之表面光滑精細,而提高導光 效果,同時讓導光板模仁之製造上更加方便,而符合經濟 效益。 以上所述實施例之揭示係用以說明本發明,並非用以 限制本發明,故舉凡數值之變更或等效元件之置換仍應隸561089 V. Description of the invention (6) In addition, the polishing step can also be treated by chemical polishing with a solution such as nitric acid, sulfuric acid, hydrochloric acid, phosphoric acid, etc., regardless of electrolytic or chemical polishing technology. This is not a technical feature of the present invention and will not be described in detail herein. It can be known from the above description that the present invention enables the surface of the microstructure surface 14 of the mold core 4 to be polished by performing a polishing step on the substrate 1 after engraving the substrate 1 with the cutter 6 and then plating a nickel layer 1 3. Smooth and maintain a predetermined hardness, so that the microstructure of the light guide plate generated after the mold turning has a smooth light guide surface, thereby improving the light guide effect. Furthermore, in the method of the present invention, as long as the substrate 1 is processed, the polishing process is performed to make the surface smooth, and the processing steps of plating the recording layer 13 are performed to obtain the mold core 4. Because the present invention maintains the fast cutting characteristics of the traditional mechanical processing method, the present invention can greatly simplify the manufacturing process and shorten the manufacturing time, and improve economic benefits, compared with the traditional yellow light process processing method; and further eliminate the traditional The mechanical processing method cannot overcome the problem of smooth surface of the microstructure surface, so that the light guide efficiency of the light guide plate made of the mold core 4 of the present invention is improved. To sum up, the dot processing of the present invention can be processed on the substrate by means of cutter processing or laser processing, so that the surface of the substrate is formed with an uneven surface, and then polished to make the surface of the microstructure surface smooth and fine. Improve the light guide effect, and make the manufacture of the light guide plate mold kernel more convenient, which is in line with economic benefits. The disclosure of the embodiments described above is used to illustrate the present invention, and is not intended to limit the present invention. Therefore, any change in numerical values or replacement of equivalent components should still be subject to

561089 五、發明說明(7) 屬本發明之範疇。 由以上詳細說明,可使熟知本項技藝者明瞭本發明的 確可達成前述目的,實已符合專利法之規定,爰提出專利 申請。561089 V. Description of the invention (7) belongs to the scope of the present invention. From the above detailed description, those skilled in the art can understand that the present invention can indeed achieve the aforementioned purpose, and has indeed complied with the provisions of the Patent Law, and filed a patent application.

第10頁 561089 圖式簡單說明 第1圖係本發明導光模仁製造方法之流程示意圖 第2圖係本發明基材受刀具切削之凹凸面放大示意圖 第3 A圖係習用導光板模仁製造方法之示意圖 第3 B圖係習用之模仁表面亦產生鋸齒狀痕跡的情形 第4圖係另一種習用導光板模仁製造方法之流程示意圖 【圖號說明】 (習用部分) 刀具8 1 基材8 2 微結構面8 2 1 基材9 1 光阻層9 2 曝光部分9 2 1 未曝光部分9 2 2 變形結構9 2 3 金屬層9 3 微結構9 3 1 顯影液9 4 (本發明部分) 基材1 凹凸面11 凹穴111 粗糙凸部1 1 2 粗糙凹部1 1 3Page 10561089 Brief description of the diagram. Figure 1 is a schematic flow chart of the manufacturing method of the light guide mold core of the present invention. Figure 2 is an enlarged schematic view of the concave-convex surface of the substrate of the present invention being cut by a tool. Schematic diagram of the method. Figure 3B shows the case where jagged marks are also generated on the surface of the conventional mold core. Figure 4 is a schematic flow chart of another method for manufacturing a conventional light guide plate mold. [Illustration of the number] (conventional part) Tool 8 1 Substrate 8 2 Microstructured surface 8 2 1 Substrate 9 1 Photoresist layer 9 2 Exposed portion 9 2 1 Unexposed portion 9 2 2 Deformed structure 9 2 3 Metal layer 9 3 Microstructure 9 3 1 Developer 9 4 (Part of the invention ) Substrate 1 Convex surface 11 Cavity 111 Rough convex part 1 1 2 Rough concave part 1 1 3

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第12頁Page 12

Claims (1)

561089 六、申請專利範圍 1 、一種導光板模仁之製造方法,包括下列步驟:· 網點加工步驟:以一加工器具對一基材之一加工面進 行加工,使該基材之加工面形成一具有多數凹穴之凹 凸面,該凹穴之内面在加工後產生多數不規則凹凸之 粗糙凸部及粗糙凹部;561089 VI. Application for Patent Scope 1. A method for manufacturing light guide plate mold kernels, including the following steps: · Dot processing step: processing a processing surface of a substrate with a processing tool, so that the processing surface of the substrate forms a Concave and convex surface of most pits, and the inner surface of the pits produces rough irregularities and rough dents with irregular irregularities after processing; 拋光步驟:將該被加工過之基材置入一拋光槽中 ,該拋光槽中承置有一拋光液,使該拋光液對該基材 之凹穴内較為凸出之粗糙凸部,產生較大程度地蝕刻 ,而該粗糙凹部因係呈凹面狀態,則被小幅度的蝕刻 ,以為不均等蝕刻,使基材之凹穴形成光滑精細表面 鍍鎳層步驟:將該拋光完成之基材另置於一鍍鎳 槽中,以氧化還原的方式於該基材被加工過之凹凸面 及該多數凹穴上沈積一鎳層,該錄層之表面係形成與 該基材之凹凸面相同之微結構面,使其表面具有金屬 錄層之基材即可成為導光板之模仁。 2 、依申請專利範圍第1項所述之導光板模仁之製造方法Polishing step: The processed substrate is placed in a polishing bath, and a polishing liquid is placed in the polishing bath, so that the polishing liquid produces rough protrusions that protrude from the recesses of the substrate. It is etched to a certain extent, and because the rough concave portion is in a concave state, it is etched in a small amount, which is considered to be uneven etching, so that the recesses of the substrate form a smooth and fine surface nickel plating step. Step: Place the polished substrate separately. In a nickel plating bath, a nickel layer is deposited on the uneven surface of the substrate and the majority of the recesses in a redox manner, and the surface of the recording layer is formed to have the same micro-scale as the uneven surface of the substrate. Structural surface, so that the substrate with metal recording layer on its surface can become the mold core of the light guide plate. 2. Manufacturing method of the light guide plate mold core as described in item 1 of the scope of patent application ,其中,該網點加工步驟之加工器具係為一碳化鎢微 形鑽頭之刀具,該刀具之切削之進給端具有一呈錐狀 面之切削端,該切削端具有一刃口角,該刃口角之夾 角為九十度,並設定該刀具之轉速為3 0 0 00 r p m (轉/分),且該刀具與該基材每次接觸之時間為 〇 · 1秒,單次進給深度1 0〜7 0 u m。 3 、依申請專利範圍第1項所述之導光板模仁之製造方法Wherein, the processing tool of the dot processing step is a tool of a tungsten carbide micro drill, the cutting feed end of the tool has a cutting end having a tapered surface, the cutting end has a cutting edge angle, and the cutting edge angle The included angle is ninety degrees, and the rotation speed of the tool is set to 3000 rpm (revolutions per minute), and the time between each contact between the tool and the substrate is 0.1 second, and the single feed depth is 10 ~ 7 0 um. 3. Manufacturing method of the light guide plate mold core according to item 1 of the scope of patent application 第13頁 561089 六、申請專利範圍 ,其中,該鍍鎳層步驟係將該基材置入一鎳系合金溶 液中進行無電鍍鎳處理,使基材表面藉由氧化還原反 應而形成該金屬鎳層,該金屬録層表面對應該微結構 面之紋路亦形成一具有相同微結構之面。 4、依申請專利範圍第1項所述之導光板模仁之製造方法 ,其中,該拋光步驟為施予電流之電解抛光及不施予 電流之化學拋光其中之一者。 5 、依申請專利範圍第4項所述之導光板模仁之製造方法 5其中’該電解抛光之抛光液係為一填酸水溶液’該 石粦酸水溶液中並置有一銅片,以該銅片作為陰極,而 該基材作為陽極’分別使該銅片接通負極電流’而該 基材接通正極電流,並在室溫下施予電流密度6〜8 Λ S D,進行電解拋光分鐘。Page 13 561089 6. The scope of the patent application, wherein the nickel plating step is to place the substrate in a nickel-based alloy solution to perform electroless nickel treatment, so that the surface of the substrate is formed into the metallic nickel through a redox reaction. Layer, the texture of the surface of the metal recording layer corresponding to the microstructure surface also forms a surface having the same microstructure. 4. The manufacturing method of the light guide plate mold kernel according to item 1 of the scope of the patent application, wherein the polishing step is one of electrolytic polishing to which electric current is applied and chemical polishing to which electric current is not applied. 5. The manufacturing method of the light guide plate mold kernel according to item 4 of the scope of the patent application, wherein 'the polishing liquid of the electrolytic polishing is an acid-filled aqueous solution', and a copper sheet is juxtaposed in the aqueous solution of hydration, and the copper sheet is used as The cathode is used as the anode, and the copper sheet is turned on to the negative current, and the substrate is turned on to the positive current, and a current density of 6 to 8 Λ SD is applied at room temperature for electrolytic polishing. 第14頁Page 14
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103231223A (en) * 2012-06-27 2013-08-07 田耕 Method for manufacturing optical element graph substrate, device for realizing collision process of method, and light guiding body component manufactured by applying method
TWI453467B (en) * 2004-08-12 2014-09-21 Sumitomo Chemical Co An antiglare film, a method for producing the film, a method for producing a mold used in the method for producing the film, and a display device
CN111976065A (en) * 2018-02-28 2020-11-24 扬昕科技(苏州)有限公司 Mould core for manufacturing light guide plate and method for manufacturing microstructure thereof
US10859751B1 (en) 2019-08-30 2020-12-08 Darwin Precisions Corporation Backlight module having a light guide with a plurality of microstructure groups and prims connected there between
US11143809B2 (en) 2019-08-30 2021-10-12 Darwin Precisions Corporation Backlight module with light guide having groups and microstructures connecting adjacent prisms

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI453467B (en) * 2004-08-12 2014-09-21 Sumitomo Chemical Co An antiglare film, a method for producing the film, a method for producing a mold used in the method for producing the film, and a display device
CN103231223A (en) * 2012-06-27 2013-08-07 田耕 Method for manufacturing optical element graph substrate, device for realizing collision process of method, and light guiding body component manufactured by applying method
CN111976065A (en) * 2018-02-28 2020-11-24 扬昕科技(苏州)有限公司 Mould core for manufacturing light guide plate and method for manufacturing microstructure thereof
CN111976065B (en) * 2018-02-28 2022-03-22 扬昕科技(苏州)有限公司 Mould core for manufacturing light guide plate and method for manufacturing microstructure thereof
US10859751B1 (en) 2019-08-30 2020-12-08 Darwin Precisions Corporation Backlight module having a light guide with a plurality of microstructure groups and prims connected there between
US11143809B2 (en) 2019-08-30 2021-10-12 Darwin Precisions Corporation Backlight module with light guide having groups and microstructures connecting adjacent prisms

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