TW546473B - Measuring inclusion depth - Google Patents

Measuring inclusion depth Download PDF

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Publication number
TW546473B
TW546473B TW90107807A TW90107807A TW546473B TW 546473 B TW546473 B TW 546473B TW 90107807 A TW90107807 A TW 90107807A TW 90107807 A TW90107807 A TW 90107807A TW 546473 B TW546473 B TW 546473B
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patent application
scope
item
light
solid medium
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TW90107807A
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Chinese (zh)
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Martin Andrew Sala
Harrie James Stevens
David Inscho Wilcox
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Corning Inc
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N21/49Scattering, i.e. diffuse reflection within a body or fluid
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8803Visual inspection

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

The measurement herein determines the depth of an inclusion in a solid media such as fused silica. A trigonometric function such as the tangent calculates the depth of the inclusion. A light source having a primary incident beam of light enters a solid media having at least one inclusion therein. The primary incident beam of light enters the solid media on a straight line path at an angle to a horizontal axis and secondary scattered light is detected at an angle to the horizontal axis. Preferably, the detector is positioned on a perpendicular axis above the inclusion and the angle of the primary beam to the horizontal axis is 45 degrees. The solid media has an exterior surface parallel to the horizontal axis and the primary beam of light and the perpendicular axis intersect the exterior surface. As a result, the perpendicular axis intersect is equidistant from the primary beam intersect and the inclusion. The scattered light can be viewed from many directions with varying intensities.

Description

經濟部中央榡準局員工消費合作枉印製 546473 A7 ——--------B7 五、發明説明(f ) 技術領域: 本發明係關於-種在固體介質例如為大型玻璃中量測 雜質永度之方法與裝置。 發明背景: 在玻璃中感測小的(微米以及次微歩)雜質永遠是一項 挑戰工作。對於感測各種顆粒之困難在於聚焦之深度,靈 敏性,解析度。顯微鏡具有感測達到次微米範圍之雜質,然 而其具有非常狹窄的焦點深度以及在高倍放大情況下取樣 區域為很小。感測小的雜質為非常需要的。假如單獨地使 用顯微鏡,這些限制使其幾乎不可能對大型玻璃進行分析。 已使用擴散反射/散射以鑑別雜質。在繪製其位置後,雜質 能夠更進一步藉由顯微鏡鑑定出。玻璃厚度再次些許地受 到顯微鏡技術聚焦狹窄之深度所限制。 處理工%師以及佈局相關業界具有一種需求以發現以 及決疋出埋嵌於基質内例如為高純度炼融矽石(jjppg)塊内 雜質物體之位置與深度。在矽石塊形成後,處理工程師能夠 將雜質物體與所觀察高溫爐事件產生關連。藉由了解雜質 物體深度以及高溫爐形成速率,有可能及時向後外插以及尋 找出發生雜質之事件。佈局工作者需要知道雜質物體之深 度以規劃由矽石塊取出部份之最佳位置。 只有處理工程師具有經驗進行猜測。佈局工作者具有 繁複的顯微觀測,其需要相當良好的精確度以及時間以定 位以及調整。其亦需要特定數量之内插。其他方面破璃之 製造例如光遮罩基質,NIF光學元件以及空間工作台/來 本紙張尺度適用中國國家標準(CNS ) A4規格(21〇x297公着) --r-------r------------^ , (請先閱讀背面之注意事項再填寫本頁) 經濟部中央標準局J工消費合作社印製 546473 A7 五、發明説明(α) 移動視窗亦缺乏有效率尋找,辨識以及定位雜質物體之能 力。 考务明大要: 本發明係關於一種裝置以及處理過程以量測固體介質 中之雜質深度。我們投射具有主要入射.光束之光源進入具 有至少一個雜質在其中之固體介質。雜質截取主要入射光 、線以及產生向前散射光線之第二輻射光源。主要光束以直 、線路徑以與水平軸成一個角度地進入固體介質。其次,感 填、J與水平軸成90度之第二散射光線。我們放置感測器直接 地位於雜質垂直軸上方。優先地,主要光束與水平軸角度 為45度。固體介質之外側表面通常平行於水平軸以及主要 光束以及垂直軸與外部表面相交。因而,垂直軸交點與主 要光束交點與雜質為等距離的。散射光線能夠利用不同的 光線強度由許多方向觀察。 此方式能夠容易地以及精確地量測透明塊狀物内雜質 物體之深度。折射率改正雷射片狀物傳送於大型塊狀物内 ,其中觀察者看到物體之位置於具有刻度透明銀幕上。與 零刻度間距離為該物體之絕對深度。 附圖簡單說明: 第一圖(圖1)顯示出對大型玻璃量測雜質深度之示意 圖。 第二圖(圖2)為量測底座之示意圖。 附圖元件數宇符號說明: 透明塊狀物2;操作者4;雷射光束6;角度8;雜質 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) — .1 :——------------T-----^‘ (請先閲讀背面之注意事項再填寫本頁) 546473 Α7 Β7 4 五、發明説明(3 ) 經濟部中央標準局員工消費合作社印製 1〇;雜質深度12;觀察位置14;視線16;角度18;零刻度 20;底部22;次要記號標示24;主要記號標示26;雷射線 產生器28;角度30;片狀物32;放大鏡36。 詳細說明: 圖1顯示出透明塊狀物2以及含有雜質1〇在其中。已知 預定數值之雷射光束6以角度8進入透明塊狀物2,該角度為 相對於表面大約45度。我們優先選擇45度,因為容易顯示 出本發明。雜質深度12和距離零刻度26與觀察位置14間距 离隹兩者之比值保持為1:1,角度優先地調整為45度。操作者 4由垂直於雜質1〇以及塊狀物2表面之視線16看到雜質。 圖2詳細顯示出本發明的優先實施例。底部22包含透 明材料。保持目前之指向,雷射線產生器28按裝於左側發 身ί光線之片狀物32。角度30能夠加以變化以改變解析度以 及配合不同的雷射光線波長或塊狀物之折射率。零刻度2〇 位於光束進入塊狀物2之表面處。所有量測距離係參考該 點。主要記號標示26為距離零刻度20之均勻的任意距離以 及以整數表示。次要記號標示24表示與零刻度2〇均勻的任 意分數值。細線16為垂直於底部22以及雜質1〇之表面。為 了有助於該處理過程,使用放大鏡。任何偏離正常值之偏 差將使雜質物體看不到。放大鏡36有助於讀取微細距離之 刻度線。 我們可以廣泛地量測各種固體介質。通常,固體介質 可為任何之透明玻璃,塑膠,結晶材料,玻璃陶曼等。我們 本紙張尺度適用中國國家標準(CNS ) Α4規格(21〇χ297公釐) (請先閱讀背面之注意事項再填寫本頁) 、1Τ 線 經濟部中央標率局員工消費合作社印裂 546473 A7 B7 五、發明説明(午) 需要在HPFS塊中感測氣態以及耐火性之雜質。—塊fjPFS約 為數英呎之碟狀物以及厚度在24"範圍内變化。對於6”尺 寸之光遮罩基質,直徑60"碟狀物首先切割為6. 25x6. 25”碟 片大物完全厚度之方塊。塊狀物在三個側面進行抛光以及傳 送通過檢視處理過程。除此能夠量測塊狀物本身。我們所 言支計之檢視處理過程將去除或減少切割以及抛光之步驟。 固體介質透明度廣泛地變化。明顯地,假如介質不透 明或霧狀,感測系統將無法精確。我們發現介質内部透明 度至少為65%。優先地,透明度應該至少9〇%。 可能的照明光源包含鹵素燈泡以及閃光燈泡。鹵素以 及閃光燈泡具有非同調之優點以及最常使用於高倍放大高 解析度之應用中。除此,鹵素照明器能夠達到非常高穩定 十生之光源以作為精確之輻射性量測。不過在所提出系統中 ,最佳操作需要使用高度準直小斷面之光束。利用雷射能 夠最佳地達成該效果,因而具有非常低發散接近繞射極限 之光束相等地照射通過玻璃塊整個寬度之雜質。雷射二極 體提供非常小的包裝以及所需要功率以產生良好得訊噪比 。數瓦雷射.能夠由多個光源提供。通常,功率輸入值將決 定儀器之靈敏性。 彳、 在圖1觀察者眼睛4為單一感測器元件,其使用高靈敏 十生感測器例如為光放大管件或突崩式光二極體。由於單一 元件,此非影像系統並不需要動態聚焦以及提供非 的含蓋。 亦可加以使用具有面積掃描雷射之陣列(二維CCD攝影 適 (CNS) μ 規; --:--------— ' -------訂------線 ί (請先閲讀背面之注意事項再填寫本頁) 546473 A7 五、發明説明(g ) 4幾),以及由閃光燈或白熱燈泡發出大面積之準直光束q感 測為'或陣列放置為與垂直於水平面成一角度。 圖1顯示出角度18至45度。距離12能夠對任何角度18 以及任何距離14使用正切三角函數加以計算。三角形之銳 角之正切為對邊與鄰邊之比值。 tan 0 =b/a 在圖1中,tan(角18M距離14)/(距離12)。一般角度 之正切值等於: 角度0 tan0 0 0 15 0. 2679 30 0. 5774 45 1.0000 60 1.7321 75 3.7321 90 _ 月匕夠使用其他二角函數例如正弦以及餘旋,以及畢氏 定理,。然而這些函數難以適用。能夠使用其他三角定理例 麵滴部中央榡準局員工消費合作社%製 如為等腰以及等邊三角形。然而,其亦難以適用於實設 定中。 、、 雜質可分類為兩種··固體雜質,其由未熔融或外界材料 =狀物所構成;空隙雜質,通常為氣泡所構成。固體雜質通 二為使用來形成玻璃之原料中的結晶玻璃或微小雜質;配 衣破璃所使用谷器壁面之耐火材料片狀物,·玻璃流體所通 546473 A7 B7 五、發明説明({;) 經濟部中央檩準局員工消費合作衽印製 過g線之壁面義片狀物所構成。固體雜質為不透明的或 清澈的。空隙雜質或氣泡以目視難以檢視。儘管如此,這 二雜貝需要加以計數以及適當地加以分析。下列範例將提 供非常良好技術以感測這些内部雜質。 下列範例顯示一種以量測雜質物體之深度,該雜質位 於透明塊狀物兩個表面之間。以—個角#度產生可見光雷射 光束,使得低於表面之角度正確地等於奶度。任何位於光 、線路徑中雜質物體將散射部份該能量以及對使用者呈現出 光壳。由於下列關係:tan(45度M.0,因而DA寸卜雜質物 體之深度等於離一點之距離,該點為將觀察光束進入透明 塊狀物(零刻度)之點。參考圖丨,相對於觀察者之視線必需 垂直於透明體之表面。入射雷射光束能夠加以調整以考慮 不同的折射率之各種材料。在任何情況下,角度8必需加以 調整以考慮雷射之波長(顏色)以及材料之折射率,使得角 度精確地為45度。對於上述參數之雷射,被照射物體之深 度等於與一點之距離,該點為雷射光束進入玻璃(零刻度) 之處。 對於實·際儀器,利用單一圓柱形光束定位雜質物體已 證實為複雜的。為了提高雜質定位之機會,建議使用發出 雷射之光面。該光面能夠藉由產生雷射線構件而形成。光 束指向之相同規則亦適用。透明底部22在通過其表面具有 相等的平行線,由零刻度或雷射進入線20開始。 在圖2中,主要記號標線26之間距為1英吋以及次要記 號標線24之間距為0.5英吋。為了清楚顯示,能夠使用最小 本紙張尺度適用中國國家標準(CNS > A4規格(210X;297公釐) (請先閱讀背面之注意事項再填寫本頁) τ 經濟部中央標準扃員工消費合作社印製 546473 A7 B7 五、發明説明( 間距為0_ 1英吋。假如需要較大精確度,角度30能夠加大。 此將具有擴展除法之效果而產生較大的精確性。不過,底 咅P22之長度亦將提高以得到相同的最大深度。對於6”塊狀 物内部角度為18至45度,裝置之長度等於6英忖。裝置之寬 度為在已知通過過程中需要評估塊狀物弹積之函數。在我 們的經驗中,在綠色頻帶中波長呈現出更有效率地照射雜 質,而優於長波長例如為HeNe或二極體所產生之紅色頻帶。 在使用日守,底部22為通過設立構件表面之玻璃片。當 雷射光面遭遇雜質物體時,該雜質物體發光。操作者將停 止器具之移動以及直接地在記號標線底下(插入位置)觀察 雜質物體之位置。表面下之距離直接地由刻度讀取。 關於折射率,熔融矽石折射率約為丨· 457。此係指光線 運行通過玻璃之速度低於通過空氣情況之1 457倍。因而 你艾如物體埋嵌於10英吋熔融矽石之底部,聚焦於其上面所 需要之工作距離並非1〇英吋。對於透鏡或攝影機,英吋 將呈現出15· 57英时深度。如先前所說明,攝影機能夠代替 觀察者眼睛4。角度8加以改正以適合特定折射率。 除了所提出實施例,熟知此技術者能夠作出各種變化 及改正而不會脫離本發明之精神及範圍。 紙張尺度適用中國國家標準(CNS ) M規格(210x7^^7 (° ------ 1 »1. 1Γ線 — (請先閱讀背面之注意事項再填寫本頁)Printed by the Ministry of Economic Affairs of the Central Government Bureau of the People's Republic of China on consumer cooperation 546473 A7 ——-------- B7 V. Description of the invention (f) Technical field: The present invention relates to a kind of solid medium such as large glass. Method and device for measuring impurity permanentness. BACKGROUND OF THE INVENTION: Sensing small (micron and submicron) impurities in glass is always a challenging task. The difficulty in sensing various particles is the depth of focus, sensitivity, and resolution. The microscope has the ability to sense impurities in the sub-micron range, yet it has a very narrow depth of focus and a small sampling area at high magnification. Sensing small impurities is highly desirable. These restrictions make it almost impossible to analyze large glasses if a microscope is used alone. Diffusion reflection / scattering has been used to identify impurities. After plotting its location, the impurities can be further identified by a microscope. Glass thickness is again somewhat limited by the narrow depth of focus of the microscope technology. There is a need for processing engineers and layout-related industries to find and determine the location and depth of foreign objects embedded in a matrix such as high-purity fused silica (jjppg) blocks. After the silica blocks have been formed, processing engineers are able to correlate foreign objects with the observed high-temperature furnace events. By knowing the depth of the impurities and the formation rate of the high-temperature furnace, it is possible to extrapolate in time and find out what happened to the impurities. The layout worker needs to know the depth of the foreign object to plan the optimal location of the part taken from the silica block. Only the process engineer has the experience to make a guess. Layout workers have complicated microscopic observations that require fairly good accuracy and time to position and adjust. It also requires a certain amount of interpolation. The manufacturing of other broken glass such as light masking substrate, NIF optical element and space workbench / paper size are applicable to China National Standard (CNS) A4 (21 × 297). --R ------- r ------------ ^, (Please read the precautions on the back before filling out this page) Printed by J Industry Consumer Cooperative, Central Standards Bureau, Ministry of Economic Affairs 546473 A7 V. Description of Invention (α) Mobile window It also lacks the ability to efficiently find, identify, and locate foreign objects. Important considerations: The present invention relates to a device and a process for measuring the depth of impurities in a solid medium. We project the light source with the main incident beam into a solid medium with at least one impurity in it. The impurities intercept the main incident light, lines, and a second radiation source that generates forward scattered light. The main beam enters the solid medium in a straight, linear path at an angle to the horizontal axis. Secondly, the second diffused light is sensed by J, which is 90 degrees from the horizontal axis. We placed the sensor directly above the vertical axis of impurities. Preferably, the main beam angle is 45 degrees from the horizontal axis. The outer surface of the solid medium usually intersects the outer surface parallel to the horizontal axis and the main beam and vertical axis. Therefore, the intersection of the vertical axis and the main beam intersection are equidistant from the impurities. Scattered light can be viewed in many directions using different light intensities. This method can easily and accurately measure the depth of foreign objects in the transparent block. The refractive index-corrected laser sheet is conveyed in a large block, where the observer sees the object on a transparent screen with a scale. The distance from the zero scale is the absolute depth of the object. Brief description of the drawings: The first figure (Figure 1) shows a schematic diagram of measuring the depth of impurities on a large glass. The second figure (Figure 2) is a schematic diagram of the measurement base. Description of components in the drawing: Symbols: transparent block 2; operator 4; laser beam 6; angle 8; impurities The size of this paper applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) — .1: — —------------ T ----- ^ '(Please read the notes on the back before filling out this page) 546473 Α7 Β7 4 V. Description of Invention (3) Central Bureau of Standards, Ministry of Economic Affairs Printed by Employee Consumer Cooperatives 10; Impurity Depth 12; Observation Position 14; Sight 16; Angle 18; Zero Scale 20; Bottom 22; Minor Marker 24; Major Marker 26; Thunder Ray Generator 28; Angle 30; Tablets物 32; Magnifier 36. Detailed description: FIG. 1 shows a transparent block 2 and an impurity 10 contained therein. The laser beam 6 of known predetermined value enters the transparent block 2 at an angle 8 which is about 45 degrees with respect to the surface. We prefer 45 degrees because it is easy to show the invention. The ratio of the depth of the impurity 12 and the distance from the zero scale 26 to the distance 14 from the observation position is kept at 1: 1, and the angle is preferably adjusted to 45 degrees. The operator 4 sees the impurities from a line of sight 16 that is perpendicular to the surface of the impurities 10 and the mass 2. Fig. 2 shows a preferred embodiment of the invention in detail. The bottom 22 contains transparent material. Keeping the current orientation, the thunder-ray generator 28 is attached to the left-side body sheet 32 of light. The angle 30 can be changed to change the resolution and to match the wavelength of the laser light or the refractive index of the block. The zero scale 20 is located at the surface where the light beam enters the block 2. All measuring distances refer to this point. The main symbol 26 is a uniform arbitrary distance from the zero scale 20 and is expressed as an integer. The minor mark 24 indicates an arbitrary fraction value that is even with a zero scale of 20. The thin line 16 is a surface perpendicular to the bottom 22 and the impurities 10. To help with this process, use a magnifying glass. Any deviation from the normal value will make the foreign objects invisible. The magnifying glass 36 helps to read tick marks of fine distances. We can measure a wide range of solid media. Generally, the solid medium can be any transparent glass, plastic, crystalline material, glass Taoman, etc. Our paper size applies the Chinese National Standard (CNS) A4 specification (21 × 297 mm) (please read the precautions on the back before filling this page), 1T Line Ministry of Economic Affairs Central Standards Bureau employee consumer cooperative print 546473 A7 B7 V. Description of the invention (L) It is necessary to sense the gaseous and refractory impurities in the HPFS block. -The block fjPFS is about several feet of dish and the thickness varies within 24 ". For a 6 "size light masking substrate, a diameter 60 " dish is first cut into 6.25x6. 25" discs with large thicknesses. The lumps are polished on three sides and transported through the inspection process. In addition, the mass itself can be measured. Our review process will eliminate or reduce the cutting and polishing steps. The transparency of solid media varies widely. Obviously, if the medium is not transparent or foggy, the sensing system will not be accurate. We found that the media's internal transparency is at least 65%. Priority should be at least 90%. Possible lighting sources include halogen bulbs as well as flash bulbs. Halogen and flash bulbs are non-homogeneous and are most commonly used in high magnification and high resolution applications. In addition, halogen illuminators are able to achieve very stable light sources for accurate radiometric measurements. However, in the proposed system, optimal operation requires the use of highly collimated beams with small cross sections. This effect is best achieved with lasers, so that a light beam with very low divergence close to the diffraction limit equates the impurities that pass through the entire width of the glass block. Laser diodes provide very small packaging and the power required to produce a good signal-to-noise ratio. A few watts of laser. Can be provided by multiple light sources. In general, the power input value will determine the sensitivity of the instrument.彳. The observer's eye 4 in FIG. 1 is a single sensor element, which uses a highly sensitive ten sensor such as a light amplification tube or a burst photodiode. Due to the single component, this non-imaging system does not require dynamic focusing and provides non-covered. Can also be used with an area scanning laser array (two-dimensional CCD photography (CNS) μ gauge;-: ---------- '------- order ------ Line ί (please read the notes on the back before filling this page) 546473 A7 V. Description of the Invention (g) 4), and a large area of collimated beam q emitted by a flash or incandescent light bulb is sensed as' or array placed as At an angle perpendicular to the horizontal plane. Figure 1 shows an angle of 18 to 45 degrees. Distance 12 can be calculated for any angle 18 and any distance 14 using a tangent trigonometric function. The tangent of the acute angle of a triangle is the ratio of the opposite side to the adjacent side. tan 0 = b / a In FIG. 1, tan (angle 18M distance 14) / (distance 12). The tangent of a general angle is equal to: angle 0 tan0 0 0 15 0. 2679 30 0. 5774 45 1.0000 60 1.7321 75 3.7321 90 _ Moon dagger is enough to use other two-angle functions such as sine and cosine, and Bishop's theorem. However, these functions are difficult to apply. Other triangle theorem examples can be used. The Department of Consumer Affairs Cooperatives of the Central Dept. of the Central Government Department, such as isosceles and isosceles triangles. However, it is also difficult to apply in the actual setting. The impurities can be classified into two types: solid impurities, which are composed of unmelted or external materials; void impurities are usually composed of air bubbles. The solid impurities are the crystalline glass or small impurities in the raw materials used to form the glass; the refractory flakes on the wall surface of the trough used for dressing and breaking glass; the glass fluid is passed 546473 A7 B7 V. Description of the invention ({; ) Consumption cooperation between employees of the Central Bureau of the Ministry of Economic Affairs and the Central Government Bureau of the Ministry of Economic Affairs. Solid impurities are opaque or clear. Void impurities or bubbles are difficult to visually inspect. Nevertheless, these two molluscs need to be counted and properly analyzed. The following examples will provide very good techniques for sensing these internal impurities. The following example shows a method for measuring the depth of a foreign object between two surfaces of a transparent block. A visible laser beam is produced at an angle # degrees, so that the angle below the surface is exactly equal to the milk degree. Any impurity object located in the light and line paths will scatter part of this energy and present a light shell to the user. Because of the following relationship: tan (45 degrees M.0, the depth of the DA inch impurity object is equal to the distance from a point, which is the point where the observation beam enters the transparent block (zero scale). Refer to Figure 丨, relative to The observer's line of sight must be perpendicular to the surface of the transparent body. The incident laser beam can be adjusted to take into account various materials of different refractive indices. In any case, the angle 8 must be adjusted to take into account the wavelength (color) of the laser and the material The refractive index makes the angle accurate to 45 degrees. For lasers with the above parameters, the depth of the illuminated object is equal to the distance from a point where the laser beam enters the glass (zero scale). For real-world instruments The use of a single cylindrical beam to locate impurity objects has proven to be complicated. In order to increase the chance of impurity positioning, it is recommended to use a laser-emitting surface. This surface can be formed by generating a ray component. The same rules for beam pointing are also Applicable. The transparent bottom 22 has equal parallel lines across its surface, starting with a zero-scale or laser entry line 20. In Figure 2, the main notation The distance between the lines 26 is 1 inch and the distance between the minor mark lines 24 is 0.5 inches. For clear display, the smallest paper size can be used in accordance with Chinese national standards (CNS > A4 size (210X; 297 mm)) Please read the notes on the back before filling this page) τ Central Standard of the Ministry of Economics 印 Printed by the Employee Consumer Cooperative 546473 A7 B7 V. Description of the Invention (Pitch is 0_ 1 inch. If greater accuracy is required, the angle 30 can be increased This will have the effect of extended division and produce greater accuracy. However, the length of the base 咅 P22 will also be increased to get the same maximum depth. For a 6 ”block, the internal angle is 18 to 45 degrees, and the length of the device It is equal to 6 inches. The width of the device is a function that needs to be evaluated for the bulk of the product during the known process. In our experience, the wavelength in the green band appears to irradiate impurities more efficiently than the long wavelength. For example, it is the red frequency band generated by HeNe or the diode. In the use of the sun guard, the bottom 22 is a glass sheet that passes through the surface of the component. When the laser light surface encounters an impurity object, the impurity object emits The operator will stop the movement of the appliance and directly observe the position of the foreign object under the marked line (insertion position). The distance below the surface is directly read by the scale. Regarding the refractive index, the refractive index of fused silica is about 丨 · 457. This means that the speed of light traveling through the glass is 1 457 times lower than that of air. Therefore, your Airu object is embedded in the bottom of 10 inches of fused silica, and the working distance required to focus on it is not 1.0. Inches. For lenses or cameras, inches will present a depth of 15.57 inches. As explained previously, cameras can replace the viewer's eyes 4. Angle 8 is corrected to fit a specific refractive index. In addition to the proposed embodiments, it is well known Those skilled in the art can make various changes and corrections without departing from the spirit and scope of the present invention. Paper size applies Chinese National Standard (CNS) M specification (210x7 ^^ 7 (° ------ 1 »1. 1Γ line — (Please read the precautions on the back before filling in this page)

Claims (1)

11·依據申請專利範圍第丨項之裝置 之溶融碎石。 14·依據申請專利範圍第丨項之襄置,其中感測 電荷耦合裝置(CCD)陣列。 A8 B8 —"~ --____ s 六、申請專利範圍 〜~ 破璃。 ,其中固體介質為高純 1 為2雷依射據=料概”1奴裝1其中親之主要光束 =依據申請專利範圍第1項之裝置,其中感_為光二極 器為二維之 15· -種在透明 >;狀物巾感獅質之處理棘,其包含 步驟: 投射光源,該光源具有準直光線之主要光束絲傳送通 過固體介質,該固體介質至少具有一個雜質在其中; 將光線之主要入射光東與雜質相交以及形成第二照射光 源、之向前散射光線; 將光線之主要光束以相對於水平轴一個角度投射通過直 線路徑上之固體介質;以及 以與水平轴成90度地感測第二散射之光線。 16·依據申請專利範圍第15項之處理過程,其中角度為90度。 17·依據申請專利範圍第14項之處理過程,其中感測器直接 地位於高於雜質上方之垂直軸上。 18. 依據申請專利範圍第14項之處理過程,其中主要光束相 對於水平軸之角度為45度。 19. 依據申請專利範圍第18項之處理過程,其中固體介質具 氏張尺度適用中國國家標準(CNS ) A4说格(公釐) I I I I I I I —訂,! I —. 線 (請先閱讀背面之注意事項再填寫本I.) 經濟部中央標準局男工消費合作社印裝 ^^0473 、申請專利範圍 ABICID 經濟部中央標準局員工消費合作社印裝 有平行於水平軸之外侧表面,以及光線之主要光束與垂直轴 與外側表面相交。 20·依據申請專利範圍第19項之處理過程,其中垂直軸交點 與主要光束交點與雜質為等距離的。 21·依據申請專利範圍第15項之處理過程,其中主要光束之 角度對固體介質折射率知以改正。 22·依據申請專利範圍第19項之處理過程,其t包含放置量 測底部相鄰於外侧表面之步驟。 23·依據申請專利範圍第19項之處理過程,其中包含下列步 驊:使用三角函數以計算與雜質相交之垂直軸距離。 24·依據申請專利耗圍第23項之處理過輕,其中:角函數為 正切函數。 25·依據申請專利範圍第15項之處理過程,其中固體介質為 玻璃材料或塑膠。 ^ 26·依據申讀專利範圍第15項之處理過程,其中固體介質為 大型玻璃。 27.依據申請專利範圍第15項之處理過程,其中固體介質為 高純度嫁融石夕石。 ' 28·依據申請專利範圍第15項之處理過程,其中主要光束為 雷射光束。 1·^-------訂.-------ii (請先閲讀背面之注意事項再填寫本頁) 準(CNS ) A4祕(21〇X297公釐11. Melt crushed stone of the device according to the scope of application for patent application. 14. The arrangement according to item 丨 of the patent application scope, wherein a charge-coupled device (CCD) array is sensed. A8 B8 — " ~ --____ s 6. Scope of patent application ~~ Broken glass. Among them, the solid medium is high-purity, 1 is 2 Rayleigh radio data = material profile, 1 slave is installed, 1 is the main beam of the parent = the device according to the first scope of the patent application, where the sense _ is a two-dimensional 15 -A kind of transparent thorny lion-like processing spine, comprising the steps of: a projection light source having a main beam of collimated light transmitted through a solid medium, the solid medium having at least one impurity therein; Intersect the main incident light of the light with impurities and form a second illuminating light source to scatter the light forward; project the main light beam of the light through a solid medium on a straight path at an angle relative to the horizontal axis; The second scattered light is sensed at 90 degrees. 16. The process according to item 15 of the patent application, where the angle is 90 degrees. 17. The process according to item 14 of the patent application, where the sensor is directly located Above the vertical axis above the impurities. 18. According to the processing procedure of item 14 of the scope of patent application, the angle of the main beam relative to the horizontal axis is 45 degrees. 19. According to the application The process of item 18 of the patent scope, in which the solid medium has a scale of scale applicable to the Chinese National Standard (CNS) A4 grid (mm) IIIIIII — order,! I —. Line (please read the precautions on the back before filling in this I.) Printed by the male workers' consumer cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs ^^ 0473, patent application scope ABICID Printed by the Consumer ’s Cooperative of the Central Bureau of Standards of the Ministry of Economics, printed on the outer surface parallel to the horizontal axis, and the main beam of light with the vertical axis and The outer surfaces intersect. 20. The processing according to item 19 of the scope of patent application, where the intersection of the vertical axis and the intersection of the main beam and the impurities are equidistant. 21. The process according to item 15 of scope of the patent application, where the angle of the main beam The refractive index of the solid medium is known to be corrected. 22 · The process according to item 19 of the scope of the patent application, where t includes the step of placing a measurement of the bottom adjacent to the outer surface. 23 · The process according to the aspect 19 of the scope of patent application, It includes the following steps: Use a trigonometric function to calculate the vertical axis distance that intersects with impurities. The treatment of item 23 is too light, of which: the angle function is a tangent function. 25. The treatment process according to item 15 of the scope of the patent application, where the solid medium is glass material or plastic. ^ 26. According to the scope of the patent application, item 15 Treatment process, in which the solid medium is large glass. 27. Treatment process in accordance with item 15 of the scope of patent application, in which the solid medium is high-purity dowry stone. '28. Treatment process in accordance with item 15 of the scope of patent application, where The main beam is a laser beam. 1 · ^ ------- Order .------- ii (Please read the precautions on the back before filling this page) Standard (CNS) A4 Secretary (21〇X297 Mm
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DE2050672C3 (en) * 1970-10-15 1975-02-06 Phywe Ag, 3400 Goettingen Flow cell for microscopic photometric measurement of particles suspended in a liquid
US3814946A (en) * 1972-12-04 1974-06-04 Asahi Glass Co Ltd Method of detecting defects in transparent and semitransparent bodies
US4136961A (en) * 1977-07-01 1979-01-30 Corning Glass Works Method and apparatus for detection of inclusions in glass article or the like
EP0162120B1 (en) * 1984-05-14 1988-12-07 Ibm Deutschland Gmbh Method and device for the inspection of surfaces
US4623252A (en) * 1984-10-09 1986-11-18 Spectrex Corporation Particulate counter
WO1996028721A1 (en) * 1995-03-10 1996-09-19 Hitachi, Ltd. Inspection method, inspection apparatus and method of production of semiconductor device using them
US6157444A (en) * 1997-11-28 2000-12-05 Hitachi, Ltd. Defect inspection apparatus for silicon wafer

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