TW542911B - Inclusion detection - Google Patents

Inclusion detection Download PDF

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Publication number
TW542911B
TW542911B TW90107805A TW90107805A TW542911B TW 542911 B TW542911 B TW 542911B TW 90107805 A TW90107805 A TW 90107805A TW 90107805 A TW90107805 A TW 90107805A TW 542911 B TW542911 B TW 542911B
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Taiwan
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patent application
scope
item
solid medium
light
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TW90107805A
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Chinese (zh)
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Chunzhe C Yu
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Corning Inc
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N2021/4704Angular selective
    • G01N2021/4726Detecting scatter at 90°
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N2021/4735Solid samples, e.g. paper, glass

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

This light scattering technique for size measurement is based on the fact that an illuminated particle (inclusion) serves as a secondary radiation source in a manner which is related to its size. This technique allows for detection of inclusions in the interior of solid media, such as bulk glass. When illuminated with a beam of monochromatic light such as a laser beam as the primary light source, the angular distribution of the scattered intensity originated from the inclusion in the micron to submicron range, is a function of intensity, wavelength and index of refraction. The primary beam of light passes through the solid media on a straight line path parallel to a horizontal axis. A detector positioned at an angle to the horizontal axis detects the secondary scattered light.

Description

542911 A7 B7 五、發明説明(ί ) 技術領域: 本發明係關於-種在固體介質例如為大型玻璃中感測 小雜質之方法與裝置。 發明背景·. 在玻璃中感測小的(微米以及次微米)雜質永遠是一項 挑戰工作。對_測各種難之賺在於餘之深度,靈 敏性,解析度。顯微鏡具有感測達到次微米範圍之雜質,然 而/、〔、有非4狹乍的焦點深度以及在高倍放大情況下取樣 區域為很小。感測小的雜質為非常需要的。假如單獨地使 用顯微鏡,這些_使其辭科能對大魏舰行分析。 已使用擴散反射/散射以鐘別雜f。在繪製其位置後,雜質 能夠更進-步藉由顯微鏡鑑定出。儘管如此,擴散反射/散 射綠之感測限制極限為5微米。除此,玻璃厚度再次些許 地文到顯微鏡技術聚焦狹窄之深度所限制。 迠齋印中fc票养苟員二肖皆6W口乍ri中乾 另外一方面,懸浮於流體介質例如為液體或氣體中之 小顆粒能夠藉由散射光線方法例行性地加以量測。固體玻 璃中雜質與懸浮於流體中顆粒間之差異職要的。一項差 異在於玻射雜質為靜㈣。錢中㈣常#常低,即訊 號強度非常觸,其非常難以由倾中區分出。噪訊為表 面感測(表面訊號)與深度感測(内部訊號)間之串音。除此 ,,玻璃中雜質位置為重要的資訊。由於流體介質中懸浮顆 粒之動雜性,其位置無鱗製。因而,目齡在儀器無法 設計具有顆粒位置之繪製能力。儘管如此,我們發現在懸 浮於流體介質中顆粒量測之原理能夠適用於固體玻璃^ 之 本紙張尺度適用中國2^7^17 542911 五、發明説明(X) 雜質量測。 發明大要: 本發明使用經過選擇結構之兩個斷面。當玻璃方塊放 平台上時,_始操作。當方塊存在被感測出 日守或虽啟触令發㈣,Y姆座_至檢觀始位置。γ 軸滑動在水平γ方向提供精確方塊祕。及CCD線掃 4田攝心機裝置於第二2軸滑座上,作為垂直方向之移動。除 此攝影機能夠裝置於微小載台上,#方塊2尺度内每—平面 進行掃描時將促使其軸所需要之小距離贿持所有平面 之焦點。平面接著平面之掃描連續性地進行持續到含蓋整 個方塊之三度深度紙謝細麻彡機通常放置與 主要光線路徑成一個角度。 對於尺寸量測之光線散射方法主要姻被照射顆粒( 或雜貝)此夠作為與其尺寸大小相關之第二輕射光源。在 利1單色光束使用雷射光束作為主要光源照射時,由微米 至次微米範圍内之雜質所發出散射光線強度之角度分佈為 下列情況之函數。散射強度之角度分佈為下列因素之函數 關係,包含散射光線與入射光束,入射光線之波長,以及與 相對於外圍介質之顆粒折射率。 附圖簡單說明: 第一圖(圖1)顯示出大型玻璃玻璃雜質量測設置之前 端示意圖。 第二圖(圖2)為玻璃方塊檢視之側邊示意圖。 附圖元件符號說明: 本紙張尺度適用中國國家標準(CNS ) A#規格(21〇><297公釐) 542911 A7 ———-—-— _一 —_ B7五'發明説明(3) 4 線性陣列12;雷射監測器延遲光學裝置16•聚隹 滑座18; z軸滑座2〇;焦點22;氦鼠雷射24;稜鏡邡.’、、、X軸滑座28。 ’ 詳細說明: 感測器中感覺元件可包含各種構造例如為單一元件, 線性陣列以及空間性陣列。本發明中優先地結構為線性陣 列。在雜性影像方法中,兩個感測器陣列幾何形狀為可 能的:單-雜,㈣具有設計骑齡⑽)之線性感覺 陣列。TDI為一項技術,其藉由利用多個感測器元件依時間 順序地觀察相_目標顧及在適當延遲時間後共同加入 該點所有影像。由於訊賴所有元件為湖的,同時相同 讀的嘴訊為不相關的,識得觀善倍數為元件數目之平 方根。TDI方法需要精確同步性以及定時控伽得到良好的結果。在需要最佳影像之影像應财,顶提供非常高的 影像品質以及靈敏性。 利用數個雷射光源進行計算以及量測顯示出所提出構 造為十分良好而低於雷射嗓訊極限。_由6_波長之 35mW雷射二極體對丨微采顆粒照射產生s·為大於1〇。同時 此為較低靈敏度低於利用某些TDI陣列所得到情況陣列之 其他特性财作賴_為良好的獅。超低輯特性能 夠產生較咼掃瞄速度以及較佳之顆粒鑑別度。除此,許多 該裝置具有内建定時產生器以及計時·_器,其相當直接 地將裝置整合為完整的❹後时。可程式化遮蔽功能提 供額外背景鑑別以及控制。優先地,感測器相對於水平轴( 本紙張尺度適用中國國^#57 cNS ) A4Wt^ ( 210X297^ ) ε (請先閲讀背面之注意事項再填寫本頁)542911 A7 B7 V. Description of the Invention (Technical Field) The present invention relates to a method and device for sensing small impurities in a solid medium such as a large glass. BACKGROUND OF THE INVENTION Sensing small (micron and sub-micron) impurities in glass is always a challenge. The difficulty of measuring various difficulties lies in the depth, sensitivity, and resolution of the rest. The microscope has the ability to sense impurities in the sub-micron range, however, [, [,] has a depth of focus that is not narrow, and the sampling area under high magnification is small. Sensing small impurities is highly desirable. If a microscope is used alone, these _ enable its dictionary to analyze the Dawei ship. Diffusion reflection / scattering has been used to reduce noise. After plotting its location, the impurities can be further identified by microscopy. Nonetheless, the sensing limit for diffuse reflection / diffuse green is 5 microns. In addition, the glass thickness is again limited by the depth to which the microscopy technique focuses narrowly. On the other hand, small particles suspended in a fluid medium such as a liquid or gas can be routinely measured by the scattered light method. The difference between impurities in solid glass and particles suspended in a fluid is important. One difference is that the glassy impurities are quiet.钱 中 ㈣ 常 # is often low, that is, the signal strength is very touching, and it is very difficult to distinguish it from the middle. Noise is crosstalk between surface sensing (surface signal) and depth sensing (internal signal). In addition, the location of impurities in glass is important information. Due to the turbulent nature of suspended particles in the fluid medium, their positions are not scaled. Therefore, the eye-age instrument cannot design the drawing ability with the particle position. Nevertheless, we found that the principle of particle measurement in a suspended fluid medium can be applied to solid glass ^ The paper size is applicable to China 2 ^ 7 ^ 17 542911 V. Description of the invention (X) Impurity measurement. Summary of the invention: The present invention uses two sections of a selected structure. When the glass cube is placed on the platform, the operation begins. When the presence of the block is sensed, the day guard or the start triggers, Ymza_ arrives at the starting position. γ-axis sliding provides precise square secrets in the horizontal γ direction. And the CCD line scan 4-field telecentric device is installed on the second 2-axis slide as a vertical movement. In addition, the camera can be mounted on a micro stage. Scanning every plane in the #square 2 scale will cause the small distance required by its axis to take the focus of all planes. Scanning from plane to plane is performed continuously to a three-degree depth paper cricket machine that covers the entire square, usually placed at an angle to the main light path. The light scattering method for size measurement is mainly based on the irradiated particles (or miscellaneous shells), which is enough as a second light source related to its size. When the Li 1 monochromatic light beam is irradiated with a laser beam as the main light source, the angular distribution of the scattered light intensity from impurities in the range of micrometers to submicrons is a function of the following conditions. The angular distribution of the scattering intensity is a function of the following factors, including scattered light and incident light, the wavelength of the incident light, and the refractive index of the particles relative to the surrounding medium. Brief description of the drawings: The first diagram (Fig. 1) shows a schematic diagram of the front end of a large glass glass impurity measurement setup. The second figure (Figure 2) is a schematic side view of the glass square. Description of the symbols of the attached drawings: This paper size is applicable to the Chinese National Standard (CNS) A # specification (21〇 > < 297 mm) 542911 A7 ———-—-— _ 一 —_ B7 five 'invention description (3) 4 Linear array 12; Laser monitor delay optics 16 • Polymer slider 18; z-axis slider 20; focal point 22; helium rat laser 24; 稜鏡 邡. ,,, X-axis slider 28. ’Detailed description: The sensing element in the sensor may include various structures such as a single element, a linear array, and a spatial array. In the present invention, the structure is preferably a linear array. In the heterosexual imaging method, the geometry of the two sensor arrays is possible: single-hybrid, a linear sensory array with a design age. TDI is a technology that uses multiple sensor elements to sequentially observe the phase_target in time and allows all images at that point to be added together after an appropriate delay time. Since all the components of Xunli are lakes, and the same readings are irrelevant, it is recognized that the multiple of goodness of view is the square root of the number of elements. The TDI method requires precise synchronization and timing control to get good results. When it comes to images that require the best image, Top provides very high image quality and sensitivity. Calculations and measurements using several laser sources show that the proposed structure is very good and below the laser noise limit. The irradiation of micro-collected particles by a 35mW laser diode with a wavelength of 6_ produces s · greater than 10. At the same time, it is a good lion because it has lower sensitivity than other characteristics of the array obtained by using some TDI arrays. The ultra-low editing performance is enough to produce faster scanning speed and better particle discrimination. In addition, many of these devices have built-in timing generators and timing generators, which quite directly integrate the device into a complete time series. Programmable masking provides additional background identification and control. Preferentially, the sensor is relative to the horizontal axis (this paper size applies to China ^ # 57 cNS) A4Wt ^ (210X297 ^) ε (Please read the precautions on the back before filling this page)

-IT 線- -m m----- 542911 A7 B7 五 、發明説明(+ 主要光束之路徑)為90度。 可能的照明光源包含齒素燈泡以及閃光燈泡。鹵素以 糾光燈泡具有非_之優_及最常使胁高倍放大, 雨解析度之躺巾。除此,岐㈣器㈣制非常高穩 定性之光源以作為精確之細性制。*過在所提出系統 中,最佳操作需要使用高度準直小斷蚊縣。利用雷射 能夠最佳地達成該效果,_具有料低發散接近繞射極 限之光束相軸照射通過玻射塊整個寬度之雜質。準直 ,射光束鱗地照射通過整個。為了得到 最佳性能,需要彻具有原子能控制(APG)祕以及良好的 熱學穩定性之雷射模組。 我們可以廣泛地量測各種固體介質。通常,固體介質 可為任何之透明玻璃,塑膠,結晶材料,玻璃陶瓷等。特別 地,主要挑戰為量測光遮罩應用之高純度熔融矽石中的雜 質。我們需要在HPFS中感測氣態以及耐火性之雜質。—塊 HPFS約為60英吋碟狀物以及厚度在6”至1〇"之間變化。對 於6”尺寸光遮罩基質,直徑60”碟狀物首先切割為6 25,,χ 6. 25"碟狀物完全厚度之平方方塊。方塊在三個側面進行 拋光以及傳送通過檢視處理過程。 片狀物透明度廣泛地變化。明顯地,假如介質為半透 明,感測系統將無法很精確。我們發現介質内部透明度至 少為65%。優先地,透明度應該至少為9〇%。 圖1顯示出當方塊在Z軸掃描時,更多玻璃包含於光學 路徑中,其需要小焦點調整而為焦點位置之函數。調整能 本纸張尺度適用中國國家檁準(CNS ) A4規格(210X 297公釐) (請先閱讀背面之注意事項再填寫本頁)-IT line- -m m ----- 542911 A7 B7 5. The invention description (+ the path of the main beam) is 90 degrees. Possible lighting sources include toothed bulbs and flash bulbs. Halogen light-correcting light bulbs have non-excellent advantages and are the most commonly used towels with high resolution and rain resolution. In addition, the Qiqi device produces a light source with very high stability as a precise fine system. * Over the proposed system, optimal operation requires the use of a highly collimated small broken mosquito county. This effect can be best achieved by using lasers. The beam axis with low divergence close to the diffraction limit irradiates the impurities across the entire width of the glass block. Collimation, the beam of light shining through the entire scale. In order to obtain the best performance, a laser module with atomic energy control (APG) and good thermal stability is required. We can measure a wide range of solid media. Generally, the solid medium can be any transparent glass, plastic, crystalline material, glass ceramic, etc. In particular, the main challenge is measuring impurities in high-purity fused silica for light mask applications. We need to sense gaseous and refractory impurities in HPFS. -A block of HPFS is approximately 60 inches and the thickness varies from 6 "to 10". For a 6 "size light masking substrate, a 60" diameter dish is first cut to 6 25, χ 6. 25 " Square square of the complete thickness of the dish. The square is polished on three sides and transmitted through the inspection process. The transparency of the sheet varies widely. Obviously, if the medium is translucent, the sensing system will not be very accurate. We found that the media's internal transparency is at least 65%. Preferentially, the transparency should be at least 90%. Figure 1 shows that when the square is scanned in the Z axis, more glass is included in the optical path, which requires small focus adjustments to focus. The function of the position. The paper size is applicable to China National Standard (CNS) A4 (210X 297mm) (Please read the precautions on the back before filling this page)

A7 _________ ____ B7 、發明説明(f) 動能用在主要Z崎座上第二平移載台達成。所產生差分 心焦=排列能夠部份地補償:!、點在整個玻璃方塊整個高 X内之、交化。未補償焦點偏移以及像散性以及其他像差產 生非均勻影像模糊尺寸跨越影像場以及在方塊高度内。由 ;,、充並不依罪影像品質,由所有像差以及扭曲來源產生 ^测誤差能夠藉由適當純之標定減為最低。適當空間 渡波能夠提供高度精確的量測結果。 圖1及2顯示出所提出經選擇結構之兩個斷面。當玻璃 ί塊ΐ置於荷重平台上時,系統開始操作。當方塊存在被 i §啟始指令發出時,γ轴滑座縮回至檢視啟始位 動在水w方向提供精確方塊移動。雷射及CCD 線^攝衫健置於第二艰滑座上,作為垂直方向之移動 平=攝if,褒置於微小載台上,當方塊2維度内每一 隹ΤΓ_吏其移動所需要之小距離以保持所有 平面接著平面之掃描連續性地進行持續到含 三ί度深度。該平面接著平面之掃描使用來 作為較低規格之應用。 /吏用 常為使用來形成玻璃之原料中的結日日日麵 ^.队 製玻璃所使用容II壁面之敎材料片狀; /體貝所酉己 過管線之㈣的峨峨不透^ 542911 A7 ____ B7 五、發明説明(6) 清澈的。空隙雜質或氣泡以目視難以檢視。儘管如此,這 些雜質需要加⑽數以及輕地加时析。下_例將提 供非常良好技術以感測這些内部雜質。範例: 下列為自動化系統之一個範例。其能夠檢視玻璃方塊 之雜質以及尺寸大於1微米之其他缺陷。在_方塊中能 夠感測缺陷之位置精確性為± 300微米。邊緣表面接近度 為125 mil以及最大檢視時間小於3〇分鐘。系統包含線性 陣列感測純合至二維雷射掃描構件以作為已知的量測。 使用波長為650nm功率為35mW之二極體雷射模組以及調變 (TTL)作為絲。感測n放置為⑽度驗而垂直於水平轴 (例如垂直於雷射光束)。 —玻璃塊在水平軸(y方向)移動以產生完全區域影像。. 在母、’?、>像知描後,雷射在垂直軸(z方向)步進以產生下一 影像平面。處理過料續性地進行持續職視全部方塊。 除了這些實施例,熟知此技術者能夠作出上述本發明 之终多改變及變化而不會麟本發明之精神及範圍。 (請先閱讀背面之注意事項再填寫本頁) # 訂 線A7 _________ ____ B7. Description of the invention (f) Kinetic energy is achieved by the second translation stage on the main Zaki seat. The resulting differential focus = permutation can be partially compensated for:!, Points within the entire height X of the entire glass square, cross. Uncompensated focus offset and astigmatism and other aberrations create non-uniform image blur sizes that span the image field and within the height of the cube. Since;, and the charge do not depend on the image quality, the measurement error caused by all aberrations and distortion sources can be minimized by proper pure calibration. Proper space A wave can provide highly accurate measurements. Figures 1 and 2 show two sections of the proposed selected structure. When the glass block is placed on the load platform, the system starts to operate. When the block existence is issued by the i § start command, the γ-axis slide is retracted to the viewing start position to provide precise block movement in the direction of water w. The laser and CCD line are placed on the second hard seat, as the vertical movement of the camera = photo if placed on a micro-stage, when each of the two dimensions in the block 2 The small distance needed to keep the scanning of all planes and then planes continuously to a depth of three degrees. Scanning this plane followed by the plane is used for lower specification applications. / It is often used in the raw materials used to form the glass. ^. The sheet material of the wall surface of the volume II used by the team glass; / The opaque material that the body has passed through the pipeline ^ 542911 A7 ____ B7 V. Description of the invention (6) Clear. Void impurities or bubbles are difficult to visually inspect. Nonetheless, these impurities need to be added and lightly timed. The following example will provide very good techniques to sense these internal impurities. Example: The following is an example of an automation system. It can inspect impurities in glass cubes and other defects larger than 1 micron in size. The accuracy of the position where defects can be sensed in the square is ± 300 microns. Edge surface proximity is 125 mil and maximum viewing time is less than 30 minutes. The system contains linear array sensing homozygous to a two-dimensional laser scanning component as a known measurement. A diode laser module with a wavelength of 650nm and a power of 35mW and a modulation (TTL) are used as the wires. Sensing n is placed as a vertical test and is perpendicular to the horizontal axis (for example, perpendicular to the laser beam). -The glass block is moved in the horizontal axis (y direction) to produce a full area image. After mastering, '?, ≫ imaging, the laser is stepped on the vertical axis (z direction) to generate the next image plane. After processing, we will continue to perform all the blocks of the continuous job video. In addition to these embodiments, those skilled in the art can make many changes and modifications to the present invention without departing from the spirit and scope of the present invention. (Please read the notes on the back before filling out this page) # Order Line

Claims (1)

542911 A8 B8 CB D8 六 、申請專利範圍 1 · 一種在透明固體介質中感測器雜質之裝置,其包含: 一個光源,其具有主要入射光束; 固體介質,具有至少一個雜質在其中,在其中雜質截取主 要入射光東以及形成第二照射光源向前散射光線; 其中主要光束通過平行水平軸之直線路徑上之固體介質 •,以及 感測器位於與水平軸成一個角度以感測第二散射之光線 2.依據申請專利範圍第丨項之裝置,其中角度為9〇度而垂直 於水平軸。 3·依據申請專利範圍第1項之裝置,其中固體介質為三維性 的,其具有内部深度以及外部表面,其中雜質位於内部深度 範圍内。 4·依據申請專利範圍第1項之裝置,其中固體介質為玻 料或塑膠。 W 5·依據申請專利範圍第丨項之裝置,其中固體介質為大型玻 璃。 、 6. 依據申請專利範圍第1項之裝置,其中固體介質為言 之炼融石夕石。 、”'、冋、、’又 7. 依據申請專利範圍第丨項之裝置,其中主要光束為雷 束。 、田、 8. 依據中請專利範圍第1項之裝置,其中感測器為光二 9. 依據申請專利範圍第丨項之裝置,其中感測哭=且 CCD陣列。 ~勺一卓之 10·依據申請專利範圍第1項之裝置,其中感測雜質尺寸在 (請先聞^^面之注意事項再填寫本頁) *1T % 私紙張尺度適用中國國家標準(CNS ) Μ规你(2〖〇><297公釐) V m 1^1 542911 A8 B8 C8 --—__ —_D8、申請專利範圍 經濟部中夬檫擎局員工消費合^沣中象 微米或次微米範圍内。 1L 一種在固體介質中感測雜質之處理過程,其包含下列步 驟: 投射光源,該光源具有準直光線之主要光束光源傳送通 過固體介質,該固體介質至少具有一個雜質在其中; 將主'要入射光束與雜質相交以及形成第二照射光源向前 散射光線; 連續投射主要光束通過平行於水平軸直線路徑上之固體 介質;以及 以與水平軸成一個角度地感測第二散射之光線。 12.依據申請專利範圍第n項之處理過程,其中角度為9〇度 而垂直於水平軸。 13·依據申請專利範圍第1〇項之處理過程,其中固體介質為 三維性的,其具有内部深度以及外部表面,其中雜質位於内 部深度範圍内。 14·依據申請專利範圍第11項之處理過程,其中固體介質為 玻璃材料或塑膠。 15. 依據申請專利範圍第η項之處理過程,其中固體介質為 大型玻璃。 16. 依據申請專利範圍第11項之處理過程,其中固體介質為 高純度之溶融矽石。 17·依據申請專利範圍第11項之處理過程,其中主要光束為 雷射光束。 18.依據申請專利範圍第11項之處理過程,其中感測雜質尺 表紙張尺度邊用中國固家襟率(CNS ) A4规格(210 X 297公釐) m m 0 — i m I- -I 1.11 ml I (請先閱面之注意事項再填寫本頁) ,ιτ 542911 A8 B8 C8 D8 六、申請專利範圍 寸在微米或次微米範圍内。 19. 依據申請專利範圍第11項之處理過程,其中固體介,質具 t多個平面平行於水平轴以及各步驟依序地對多個平面重 複進行。 20. 依據申請專利範圍第19項之處理過程,复 地平面接料面崎描重觀行,持翻_^^依序 衣紙張尺度適用中國國家椽準(CNS ) A4規格(210Χ297公釐)542911 A8 B8 CB D8 VI. Patent application scope 1 · A device for detecting impurities in a transparent solid medium, comprising: a light source having a main incident light beam; a solid medium having at least one impurity therein, among which impurities Intercept the main incident light and form a second light source to scatter the light forward; where the main beam passes through the solid medium on a straight path parallel to the horizontal axis, and the sensor is positioned at an angle to the horizontal axis to sense the second scattered light Light 2. The device according to item 丨 of the patent application, wherein the angle is 90 degrees and is perpendicular to the horizontal axis. 3. The device according to item 1 of the scope of patent application, in which the solid medium is three-dimensional and has an internal depth and an external surface, and impurities are located within the internal depth range. 4. The device according to item 1 of the scope of patent application, wherein the solid medium is glass or plastic. W 5. The device according to the scope of the patent application, wherein the solid medium is large glass. 6. The device according to item 1 of the scope of patent application, in which the solid medium is a smelting stone. ””, 冋 ,, ′ 7. The device according to item 丨 of the scope of patent application, the main beam of which is a thunder beam., Tian, 8. The device according to item 1 of the scope of patent application, where the sensor is light two 9. The device according to item 丨 of the scope of patent application, in which the sensor is crying and the CCD array. ~ Spoon 10 · The device according to item 1 of the scope of patent application, in which the size of the sensing impurities is (please smell first ^ Please fill in this page again before filling in this page) * 1T% The private paper size applies the Chinese National Standard (CNS) M Regulation You (2 〖〇 > < 297mm) V m 1 ^ 1 542911 A8 B8 C8 ---__ —_D8. Patent application scope. The employees of the Ministry of Economic Affairs of the Ministry of Economic Affairs of the People's Republic of China are in the micron or sub-micron range. 1L A process for sensing impurities in a solid medium, including the following steps: a projection light source, which The main beam source with collimated light is transmitted through the solid medium, which has at least one impurity in it; intersects the main incident beam with the impurities and forms a second illumination source to scatter the light forward; continuously projects the main beam through parallel The solid medium on the straight path of the horizontal axis; and the second scattered light is sensed at an angle to the horizontal axis. 12. The process according to item n of the patent application scope, wherein the angle is 90 degrees and is perpendicular to the horizontal axis 13. Processing according to item 10 of the scope of the patent application, in which the solid medium is three-dimensional, which has an internal depth and an external surface, and impurities are located within the internal depth range. 14. Processing according to item 11 of the scope of patent application Process, where the solid medium is glass material or plastic. 15. The process according to item η of the scope of patent application, where the solid medium is large glass. 16. The process according to item 11, scope of the patent application, where the solid medium is of high purity Melted silica. 17. The process according to item 11 of the scope of patent application, where the main beam is a laser beam. 18. The process according to item 11 of the scope of patent application, in which the paper scale of the impurities is sensed in China Consolidation rate (CNS) A4 size (210 X 297 mm) mm 0 — im I- -I 1.11 ml I (Please read the precautions before reading (Fill in this page), ιτ 542911 A8 B8 C8 D8 6. The scope of patent application is in the micron or submicron range. 19. According to the process of item 11 in the scope of the patent application, the solid media, the multiple planes of the quality and t The horizontal axis and each step are repeated for multiple planes in sequence. 20. According to the processing procedure of item 19 of the scope of patent application, the ground plane of the multi-level plane is described carefully. China National Standard (CNS) A4 specification (210 × 297 mm)
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JP6033041B2 (en) * 2012-10-31 2016-11-30 株式会社オハラ Automatic quality inspection device for optical glass base material and automatic quality inspection method for optical glass base material
DE102013002602B4 (en) 2013-02-15 2022-05-05 Hegla Boraident Gmbh & Co. Kg Method and device for detecting particles in glass

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