TW544646B - Improvement to coplanar-type plasma panels - Google Patents

Abstract

The present invention relates to a plasma panel comprising a first tile called the rear tile (10) and a second tile called the front tile (20), the two tiles being joined together with a distance of separation defining a space filled with gas, a first array of electrodes which is formed from a set of two parallel electrodes (11, 11'), called the sustaining electrodes, and which is placed on one of the tile, a second array of electrodes called the addressing electrodes (21) which is placed on the other tile, and an array of barriers (15) which is placed on one of the tiles parallel to the array of addressing electrodes. According to the invention, the array of barriers (15) is positioned on the tile (10) carrying the first array of electrodes (11, 11'), the barriers having a height (H) of less than the distance of separation (E) between the two tiles and the separation (E) between the two tiles is obtained by specific spacing means (16). The invention applies to so-called coplanar plasma panels.

Description

544646 _Case No. 88120498_year month__ V. Description of the invention (1) The present invention relates to a plasma panel, especially a coplanar plasma panel. Plasma panel (PDP for short) is a flat screen image display. There are two major groups of PDPs, namely those with DC function and those with AC function. All PDPs operate on the principle of gas discharge with incident light. It generally includes two insulating bricks, each with one or more rows of electrodes, defining a space for filling air between them. The bricks are joined together so that the electrode rows are orthogonal. The intersection of the electrodes is defined as a battery, which is equivalent to a gas space.

Among the AC-operated plasma panels, two types of panel structures are currently used, a so-called matrix structure, in which continuous discharge and address discharge occur between an electrode row on a front substrate and an electrode row on a rear substrate, and The so-called coplanar structure, in which the continuous discharge is generated between two parallel electrode rows deposited on the front substrate, and the address discharge occurs between one electrode row on the front substrate and the electrode row on the rear substrate . The invention relates more particularly to the latter structure. More specifically, as shown in FIG. 1, the currently manufactured coplanar plasma panel includes a glass brick and a substrate 1. In the specific example shown in the figure, an address or row electrode array 2 is generated on this glass tile. The electrode array 2 can be covered with a dielectric layer 3, which is necessary for a common AC operation. Second, a blocker 4 is deposited on this layer 3, and these blockers are detailed later. The plasma panel shown in Figure 1 also includes glass front bricks 5 to make up the front components. Two parallel electrodes 6 forming a continuous electrode,

An array of 6 'has been deposited on this brick. To make the display look good, these electrodes are made of a transparent material, such as indium tin oxide, called I TO. However, due to the low conductivity of the transparent material used for the continuous electrodes 6,6 ', aluminum or silver, or chromium-copper-chromium coatings are also deposited on each electrode 6 or 6'.

Page 6 544646 Case No. 88120498 Yu Yu ^ ......--_ Ren_I Yue Jian __, etc., "Ming Ming Ming ⑵", "Properties material electrode bus bar 7, 7 '". As shown in Fig. 1, a dielectric layer 8 usually made of lead sulphate lead frit is deposited on the sustaining electrodes 6,6 ,. This layer 8 is covered with a protective layer 9 and is generally made of magnesium oxide Mg0. In this type of panel, the 'blocker 4 is always of the "supporting" type, which means that its height is roughly equal to the distance between the rear element and the front element of the panel. These blockers have a wall shape with a width between 40 and 100 // m and a height h between 120 and 200 // m. Since these blocking fasts are of the “supporting” type, their height must be uniform, and the height difference must not be greater than ± 3%. The Gein height variation Ah is too large, which means that there is a space Δ h between the top of the blocker and the front substrate. This space is sufficient to allow the use of a charge transfer-shifter to extend from a battery discharge into an adjacent battery. This phenomenon is not good for panel operation. Of course, there exists a channel formed by this space, allowing the electric charge between the adjacent cells to diffuse, one of which can be ignited while the other is extinguished. This charge diffusion causes an accidental ignition of the so-called extinguished battery. In addition, the blocker is always deposited on the rear substrate} because a continuous discharge is generated on the surface of the front substrate. Today, these blockers are defined as cups' whose configuration allows the acceptance of phosphorus I p, which must not be in contact with the discharge to prevent deterioration. -The object of the present invention is to provide a novel plasma panel structure with coplanar plastic, which can overcome the various disadvantages mentioned above. Therefore, the subject of the present invention is a plasma panel, which includes a first brick, called a rear brick and a first brick, called a front brick. The first electrode array formed by the parallel electrodes is called a continuous electrode, which is located on a brick, and the second electrode array is called a _ addressing electrode, placed on another brick perpendicular to the first array, and the blocker array, placed on A brick parallel to the addressing electrode array is characterized by the resistance

Page 7 544646 ___Case No. 88120498_Year Month Revision_ V. Description of the Invention (3) The breaker array is located on a brick with a first electrode array. According to another feature of the present invention, the height of the blocker is smaller than the distance between the two bricks, and the distance between the two bricks can be obtained by a special isolation mechanism. However, the present invention can also be applied to a panel having a full-height blocker. According to a preferred embodiment, the blocker array is placed on the back squat, and the blocker height is between 60 and 80% of the distance between the bricks. According to another feature of the present invention, the phosphor of the first array is deposited on the front brick, and the phosphor of the second array is deposited on the rear brick in an area not subject to discharge. The purpose of this second array of phosphorous is to increase the area covered by phosphorous, so that the light output of the panel is increased. The second array of phosphorus is preferably deposited on the side wall of the blocker.

In this case, according to another feature of the present invention, the isolation mechanism includes beads or pillars, and the beads or pillars are positioned on the front or rear brick. The present invention also relates to components after the plasma panel, which are characterized by comprising: a monument; a continuous electrode of a first array, deposited on a brick;-a layer of so-called original dielectric material;-a protective layer to resist discharge. Ion bombardment; a blocker array.

According to a preferred embodiment, the array of continuous electrodes is made by photo-etching a thin metal layer or a silk-screened conductive paste, such as a silver paste. In addition, the dielectric layer is composed of a paste containing a glass frit, and the protective layer is composed of an oxidized ballast layer. According to another feature of the present invention, the rear element also contains a phosphor array, which is deposited in an undischarged area.

Page 8 544646 _Case No. 88120498_ Year Month__ V. Description of the invention (4) The present invention also relates to the original before the plasma panel, which is characterized by including-a monument;-an addressing electrode array; an insulating material layer; And a fill array.

According to a preferred specific example, the addressing electrode array is made of a photo-etched transparent conductive layer, and the insulating material is composed of a glass frit, such as side stone oxide, acid oxide, oxide oxide, and oxide ball, and is deposited as a thin film. In addition, the front element contains a black matrix deposited between the addressing electrode array and the layer of insulating material in a low-emission coefficient region on the surface to reduce the diffuse reflection coefficient of the panel. Another feature and advantage of the present invention can be understood by reading the following description of the preferred specific examples with reference to the accompanying drawings, in which: Figure 1 is a schematic diagram of the coplanar plasma panel of the previous case as described above Perspective view; FIG. 2 is a schematic perspective view of a specific example of a plasma panel according to the present invention; and FIG. 3 is a sectional view of a plasma panel type shown in FIG. 2. Specific examples of the plasma panel according to the present invention will be described with reference to FIGS. 2 and 3. In the figure, for the sake of simplicity, the same elements are given the same symbols.

Fig. 2 is a perspective view showing a small portion of the rear element of the plasma panel of the present invention. As shown in FIG. 2, the rear element includes a rear tile 10, especially a glass tile, on which a set of two continuous electrodes 11, Π ′ is deposited. The electrode coefficient of these electrodes cannot be too high, that is, one electrode is 100 Ω, which can be made by photoetching a thin metal layer or directly depositing, such as silk-screen silver paste. The array of continuous electrodes is covered with

Page 9 544646 _ case number 88120498 _ month month day_ί ± ^ _ V. Description of the invention (5) The so-called thick dielectric material layer 13. This layer is generally obtained by depositing a paste containing glass frit such as lead borosilicate using a silk screen method. Once deposited, the assembly is fired at a temperature of 5 2-59 ° C. Typically, the assembly is burned at 570 ° C for half an hour. Finally, a dielectric layer with a thickness of about 20-3 0 // m is obtained. In order to increase the reflection coefficient of the rear substrate, a pigment can be added to the medium in a known manner. Deposited on this layer 13 is a protective layer that resists ion bombardment caused by electrical discharge. 5 — 1 // m。 This protective layer is preferably a layer of magnesium oxide or MgO. This layer of magnesium oxide reduces the operating voltage of the element.

According to the present invention, as shown in Fig. 2, an array of blockers 15 is formed on the protective layer. These blockers can be processed by a variety of known techniques, such as photolithography, serigraphy, or shot peening. It is made of materials such as aluminum borosilicate type composition, with or without the addition of mineral fillers, silicon oxide, or oxide. Figure 2 shows a 15-blocker array, called a non-supporting blocker, which means that the height of the blocker is lower than the distance between the two bricks. However, the present invention can also be applied in a conventional manner to a panel having a full height or "support" blocker.

According to a specific example of the present invention, the height of the non-supporting blocker is between 60-80% of the separation distance E. As shown in FIG. 3, when the electric paddle panel is completed, isolation. More specifically, the blocker height Η varies between 30 // 111 (South Resolution Panel) and 150 // πm (TV-specific panel). Figures 2 and 3 show rectangular blockers. In fact, the shape of the stopper is suitable for battery configuration in terms of area and wheel waste. According to the present invention, the rear element can accept the phosphor array 17 and consist of green, red, and blue phosphors in a known manner to make a color plasma panel. To prevent their degradation, these phosphors are deposited only in areas that are not subject to discharge. The screen is a blocker.

Page 10 544646 V. The side wall of the invention, which is composed of a bead volume Η1 and equivalent to 20,. These electrical layers are made if the transparent tin is made up of this busbar as shown in the figure. This black also changes like 2 and 3. This insulating oxide layer and // m layer are missing to form a thin film. Breaker 15 G λ R 'Be 2B is on the rear component. This board. This secret SS_88120498 is shown in Figures 2 and 3. In addition, the second one is composed of one. This separation diagram shows that the isolation mechanism 16 and the internal structure 16 are deposited in the separated areas of the battery, and the separation distance ε in the high-resolution figure d. One of the front elements of a plasma plasma panel, especially a glass tile. On the previous brick 20 = the previous components are from the previous brick site Lei Yu private guide 1 on the 7th addressing electrode 2 1 array The address electrode system, for example, uses photo-etching to transparently guide .. ^ ττλ ^. The lid therefore only needs to have a fairly low electrode, etc. However, Ke material has a very low conductivity. In particular, the addressing array can be covered by a metal busbar as shown in the 箆 1 m map. The specific example of the child product is as shown in Figure 1. As shown in Figure 3, Hei Mou Chen 2 矸 太 太 太 陵 陵 陵 陵 陵 陵 在 在, in the area of low emissivity on the surface car: in the reduction >, diffuse reflection coefficient of the panel. In addition, according to the same method, a color filter can be used to reduce the diffuse reflection coefficient of the panel. ^ A layer of insulating material 22 is deposited on the array of address electrodes 21 and is made of glass oxide, such as lead borosilicate, and silicon oxide. For glass frit, the thickness must be 10 to 30 Å, and if fired with silicon oxide, aluminum oxide, or magnesium oxide, this material is used to produce zinc oxide. The dish array 23 is deposited in a known manner on the surface corresponding to the resistance, and the deposited coating film is made in such a way that in the scale 11 surface panel, the isolation element formed by the bead 16 is deposited. However, the bead is also Former eves that can be deposited between the dielectric layer and the phosphorus can be sealed in a known manner, and hermetically sealed in a hermetically sealed manner on the front or back element of the plasma can also deposit well.

Page 11 544646 Case No. 88120498 Date of Amendment V. Description of Invention (7)

In particular, as shown in Figure 3, there is a space between the top of the blocker 15 and the front element in a so-called "non-supporting" structure. The size of this space is tens of microns, and the panel can be easily pumped when a vacuum is generated therein because the structure is more open. In addition, the battery conditioning effect can be seen, while the discharge does not propagate along the line. Therefore, with this structure, some of the charges (ions or electrons of the plasma) are moved from one battery to another, and there is ultraviolet radiation, which helps discharge in the gas. This phenomenon is shown by an arrow f in FIG. 3. However, in the proposed structure, the discharge extends along the sustaining electrode and is blocked by a blocker because the latter is actually deposited on the side supporting the sustaining electrode. The space between the blocker and the opposite substrate is close to the positioning electrode array, and the capacity density of the charge in this area is extremely low during discharge. Therefore, the discharge cannot be extended, and accidental ignition of the so-called extinguished battery can be eliminated. In addition, in this structure, the height of the blocker 15 is no longer a critical value, and the uniformity between 5 and 10% is acceptable. The address electrodes are easily made of transparent conductors such as I TO, and generally do not require metal buses. Row because the addressing electrode needs a low conductivity relative to the continuous electrode. With this plasma panel, a thin-film dielectric layer can also be used to protect the address electrodes from ion bombardment. High temperature combustion is not required to use the film, that is, temperatures above 480 ° C. Therefore, the bricks are not subject to any compaction or altered reality.

Anyone skilled in this way knows that the structure in Figures 2 and 3 can be modified without violating the scope of patent application below. As mentioned earlier, the present invention can also be particularly applied to full-height blockers deposited on rear bricks, with phosphorus placed on the second brick. In addition, the isolation mechanism is formed by a cylinder or other mechanism made by a silk screen method, a photolithography method, or an equivalent method. Therefore, the present invention can be applied to various structures for coplanar plasma panels.

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Claims (1)

544646 _Case No. 88120498_ Modifications of Years and Years__ 6. The scope of patent application 1. A plasma panel includes a first brick, called the rear brick (1 0), and a second brick, called the front brick (20), The two bricks are combined together to define the space filled with gas at a distance. A first electrode array formed by a group of two parallel electrodes (Π, 1 Γ) is called a continuous electrode. It is called addressing electrode (2 1), placed on another brick perpendicular to the first array, and the blocker (1 5) array, placed on a brick parallel to the addressing electrode array, which is characterized by blocking The device array (1 5) is located on a brick (10) carrying an array of first electrodes (1, 1 1 '). 2. For example, the plasma panel of the scope of patent application, wherein the array of blockers (1 5) is placed on the rear brick (1 0). 3. If the plasma panel of item 1 or 2 of the patent application scope, the height of the blocker (Η) is less than the separation distance (E) between the two bricks, and the separation distance (E) between the two bricks uses a special isolation mechanism ( 1 6) Winner. 4. For the plasma panel of item 3 of the patent application, the height of the blocker (Η) is between 60 and 80% of the distance between the bricks. 5. If the plasma panel of item 1 or 2 of the patent application scope, the height of the blocker (阻断) is equal to the distance between the two bricks. 6. For example, the plasma panel of the scope of patent application, wherein the first array of phosphorus (2 3) is deposited on the front brick (20). 7. For the plasma panel of item 1 of the patent application scope, in which the second array of phosphorus (17) is deposited on the rear brick (1 0), and the area is not subjected to discharge. 8. The plasma panel according to item 7 of the patent application, wherein the second array (17) of phosphorus is deposited on the side wall of the blocker. 9. If the plasma panel of item 3 of the patent application scope, in which the isolation mechanism ( Page 14 544646 Case No. 88120498 Date of Amendment VI. Scope of Patent Application 16) It is composed of beads or cylinders. 10. The plasma panel according to item 9 of the patent application scope, wherein the bead or column system is located on the front squat. 1 1. The plasma panel according to item 9 of the patent application, wherein the bead or column system is located on the rear brick. 1 2. A rear brick for a plasma panel, including: a monument (1 0); a first array of continuous electrodes (1 1, 1 1 ′) deposited on the brick; a so-called original dielectric material layer (1 3 ); A protective layer (1 4), resistant to ion bombardment caused by discharge; A blocker array (1 5). 13 3. The rear brick for plasma panel as in item 12 of the patent application scope, wherein the continuous electrode array is made by photo-etching a thin metal layer. 14. The back tablet for a plasma panel according to item 12 of the application, wherein the continuous electrode array is made by using a conductive paste, such as silver paste, for silk screen printing. 1 5. The rear brick for the plasma panel according to item 12 of the patent application scope, wherein the dielectric layer is composed of a paste containing a glass frit such as lead borosilicate. 16 6. The rear brick for plasma panel as in item 12 of the patent application scope, in which the protective layer is composed of an oxidized ballast layer. 1 7. The rear brick for plasma panels according to item 12 of the patent application scope, which also contains a phosphorus array (17), which is deposited in areas not subject to discharge. 18. —Front bricks for plasma panels, including: a monument (2 0); —address electrode array (2 1); Page 15 544646 _ Case No. 88120498 _ __ Date of the application for patents-Insulation material layer (2 2); and a phosphorous array (2 3). 19. The front brick for a plasma panel according to item 18 of the patent application, wherein the address electrode array is made of a photo-etched transparent conductive layer. 20. For example, the front panel for plasma panel of item 18 in the patent application scope, wherein the insulating material is composed of glass frit such as lead borosilicate, or silicon oxide, aluminum oxide, magnesium oxide and the like are deposited into a thin film. 21. The front brick for a plasma panel as claimed in claim 18, wherein a black matrix (2 4) is included between the addressing electrode array and the insulating material layer, and the black matrix (2 4) is deposited on the surface with a low emission coefficient area. Page 16