TW538323B - Electron beam exposure apparatus - Google Patents
Electron beam exposure apparatus Download PDFInfo
- Publication number
- TW538323B TW538323B TW089108042A TW89108042A TW538323B TW 538323 B TW538323 B TW 538323B TW 089108042 A TW089108042 A TW 089108042A TW 89108042 A TW89108042 A TW 89108042A TW 538323 B TW538323 B TW 538323B
- Authority
- TW
- Taiwan
- Prior art keywords
- offset
- sub
- electron beam
- beams
- integer
- Prior art date
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31761—Patterning strategy
- H01J2237/31764—Dividing into sub-patterns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31776—Shaped beam
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Analytical Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12244399 | 1999-04-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW538323B true TW538323B (en) | 2003-06-21 |
Family
ID=14835986
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW089108042A TW538323B (en) | 1999-04-28 | 2000-04-27 | Electron beam exposure apparatus |
Country Status (4)
Country | Link |
---|---|
KR (1) | KR100339140B1 (de) |
DE (1) | DE10020714A1 (de) |
GB (1) | GB2349737B (de) |
TW (1) | TW538323B (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI579884B (zh) * | 2011-10-03 | 2017-04-21 | Param Corp | Electron beam rendering device and its rendering method |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008062450B4 (de) | 2008-12-13 | 2012-05-03 | Vistec Electron Beam Gmbh | Anordnung zur Beleuchtung eines Substrats mit mehreren individuell geformten Partikelstrahlen zur hochauflösenden Lithographie von Strukturmustern |
NL2006868C2 (en) | 2011-05-30 | 2012-12-03 | Mapper Lithography Ip Bv | Charged particle multi-beamlet apparatus. |
EP2913838B1 (de) | 2014-02-28 | 2018-09-19 | IMS Nanofabrication GmbH | Kompensation defekter Beamlets in einem Ladungsträger-Mehrstrahlbelichtungswerkzeug |
EP2937888B1 (de) * | 2014-04-25 | 2019-02-20 | IMS Nanofabrication GmbH | Mehrstrahliges werkzeug zum schneiden von mustern |
EP2937889B1 (de) | 2014-04-25 | 2017-02-15 | IMS Nanofabrication AG | Mehrstrahliges werkzeug zum schneiden von mustern |
EP2950325B1 (de) | 2014-05-30 | 2018-11-28 | IMS Nanofabrication GmbH | Kompensation von dosisinhomogenität mittels überlappender belichtungsorte |
JP6890373B2 (ja) | 2014-07-10 | 2021-06-18 | アイエムエス ナノファブリケーション ゲーエムベーハー | 畳み込みカーネルを使用する粒子ビーム描画機における結像偏向の補償 |
US9568907B2 (en) | 2014-09-05 | 2017-02-14 | Ims Nanofabrication Ag | Correction of short-range dislocations in a multi-beam writer |
US9653263B2 (en) | 2015-03-17 | 2017-05-16 | Ims Nanofabrication Ag | Multi-beam writing of pattern areas of relaxed critical dimension |
EP3096342B1 (de) | 2015-03-18 | 2017-09-20 | IMS Nanofabrication AG | Bidirektionales mehrstrahliges schreiben mit doppeldurchgang |
US10410831B2 (en) | 2015-05-12 | 2019-09-10 | Ims Nanofabrication Gmbh | Multi-beam writing using inclined exposure stripes |
US10325756B2 (en) | 2016-06-13 | 2019-06-18 | Ims Nanofabrication Gmbh | Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writer |
US10325757B2 (en) | 2017-01-27 | 2019-06-18 | Ims Nanofabrication Gmbh | Advanced dose-level quantization of multibeam-writers |
US10522329B2 (en) | 2017-08-25 | 2019-12-31 | Ims Nanofabrication Gmbh | Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus |
US11569064B2 (en) | 2017-09-18 | 2023-01-31 | Ims Nanofabrication Gmbh | Method for irradiating a target using restricted placement grids |
US10651010B2 (en) | 2018-01-09 | 2020-05-12 | Ims Nanofabrication Gmbh | Non-linear dose- and blur-dependent edge placement correction |
US10840054B2 (en) | 2018-01-30 | 2020-11-17 | Ims Nanofabrication Gmbh | Charged-particle source and method for cleaning a charged-particle source using back-sputtering |
JP7275647B2 (ja) | 2019-02-27 | 2023-05-18 | 株式会社ニューフレアテクノロジー | マルチビーム用アパーチャ基板セット及びマルチ荷電粒子ビーム装置 |
US11099482B2 (en) | 2019-05-03 | 2021-08-24 | Ims Nanofabrication Gmbh | Adapting the duration of exposure slots in multi-beam writers |
KR20210132599A (ko) | 2020-04-24 | 2021-11-04 | 아이엠에스 나노패브릭케이션 게엠베하 | 대전 입자 소스 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL8200559A (nl) * | 1982-02-15 | 1983-09-01 | Ir Jan Bart Le Poole Prof Dr | Bestralingsinrichting met bundelsplitsing. |
US6014200A (en) * | 1998-02-24 | 2000-01-11 | Nikon Corporation | High throughput electron beam lithography system |
US6989546B2 (en) * | 1998-08-19 | 2006-01-24 | Ims-Innenmikrofabrikations Systeme Gmbh | Particle multibeam lithography |
-
2000
- 2000-04-26 KR KR1020000022196A patent/KR100339140B1/ko not_active IP Right Cessation
- 2000-04-27 GB GB0010288A patent/GB2349737B/en not_active Expired - Fee Related
- 2000-04-27 DE DE10020714A patent/DE10020714A1/de not_active Withdrawn
- 2000-04-27 TW TW089108042A patent/TW538323B/zh active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI579884B (zh) * | 2011-10-03 | 2017-04-21 | Param Corp | Electron beam rendering device and its rendering method |
Also Published As
Publication number | Publication date |
---|---|
KR20010014831A (ko) | 2001-02-26 |
KR100339140B1 (ko) | 2002-05-31 |
GB2349737B (en) | 2001-06-13 |
DE10020714A1 (de) | 2001-01-25 |
GB0010288D0 (en) | 2000-06-14 |
GB2349737A (en) | 2000-11-08 |
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