TW526367B - Substrate assembling apparatus - Google Patents
Substrate assembling apparatus Download PDFInfo
- Publication number
- TW526367B TW526367B TW089105073A TW89105073A TW526367B TW 526367 B TW526367 B TW 526367B TW 089105073 A TW089105073 A TW 089105073A TW 89105073 A TW89105073 A TW 89105073A TW 526367 B TW526367 B TW 526367B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrates
- substrate
- assembling apparatus
- vacuum chamber
- vacuum
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
Abstract
Description
526367 A8 B8 C8 D8 六、申請專利範圍 ,並吸收該貼合手段受到的變形之變形吸收手段。 7 ·如申請專利範圍第1項所述之基板之安裝裝置, 至少在利用兩真空室單元之合體所形成的真空室之外側, 設有可使解除合體之任一真空室單元水平移動之移動手段 、和在位於該真空室外側的該工作台上之另一側的基板, 以閉鎖的圖形來繪製接著劑之繪製手段以及在利用該工作 台上之另一側的基板之接著劑所繪製的閉鎖圖形之內側, 滴下液晶之滴下手段。 8 .如申請專利範圍第1項所述之基板之安裝裝置, 在該工作台設有利用靜電吸著力來保持另一側的基板之靜 電吸著板。 —- .1^1 ^^1 n —l·. k n n (讀先閱·#背面之注意事項再填寫本頁) 訂 線 經濟部智慧財產局員工消費合作社印製 I紙張尺度適用中國國家糅準(CNS ) A4此格(21GX297公釐) -3 一526367 A8 B8 C8 D8 6. Scope of patent application and deformation absorption means to absorb the deformation of the laminating means. 7 · The mounting device for the substrate as described in item 1 of the scope of the patent application, at least on the outside of the vacuum chamber formed by the combination of the two vacuum chamber units, is provided with a movement that can move any of the vacuum chamber units horizontally Means, and a drawing method for drawing an adhesive with a latched pattern on a substrate on the other side of the table on the outside of the vacuum chamber, and drawing on an adhesive using a substrate on the other side of the table On the inside of the latch pattern, the dripping means for dripping the liquid crystal. 8. The mounting device for a substrate as described in item 1 of the scope of the patent application, the table is provided with an electrostatic absorbing plate that holds the substrate on the other side by electrostatic attraction. —- .1 ^ 1 ^^ 1 n —l ·. Knn (Read the first read · Notes on the back of the page before filling out this page) Threading printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, printed by the consumer co-operative society I Paper standards are applicable to Chinese national standards (CNS) A4 this grid (21GX297 mm) -3 1
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP08961299A JP3410983B2 (en) | 1999-03-30 | 1999-03-30 | Substrate assembly method and apparatus |
JP17290399A JP3535044B2 (en) | 1999-06-18 | 1999-06-18 | Substrate assembling apparatus and method, and liquid crystal panel manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
TW526367B true TW526367B (en) | 2003-04-01 |
Family
ID=26431027
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW089105073A TW526367B (en) | 1999-03-30 | 2000-03-20 | Substrate assembling apparatus |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR100360833B1 (en) |
SG (1) | SG87888A1 (en) |
TW (1) | TW526367B (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7190431B2 (en) | 2004-07-09 | 2007-03-13 | Innolux Display Corp. | Method for curing sealant used when sealing an LCD panel |
US7372691B2 (en) | 2004-06-11 | 2008-05-13 | Innolux Display Corp. | Apparatus and method for joining two substrates |
CN102636913A (en) * | 2011-02-15 | 2012-08-15 | 常阳工学株式会社 | Sealing method and apparatus thereof |
CN103959453A (en) * | 2011-11-25 | 2014-07-30 | 信越工程株式会社 | Wafer transport apparatus and wafer assembly line |
CN104898310A (en) * | 2014-03-06 | 2015-09-09 | Nlt科技股份有限公司 | Substrate laminating apparatus, substrate laminating method, and stereoscopic display device |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6739929B2 (en) * | 2000-03-31 | 2004-05-25 | Minolta Co., Ltd. | Method and apparatus for producing a display panel, method for adhering an adhesive sheet and method for adhering plates |
KR100783705B1 (en) * | 2001-06-26 | 2007-12-07 | 삼성전자주식회사 | Devices for combining panels for a display and methods for manufacturing the display using the same |
JP3693972B2 (en) * | 2002-03-19 | 2005-09-14 | 富士通株式会社 | Bonded substrate manufacturing apparatus and substrate bonding method |
KR100847816B1 (en) * | 2002-03-25 | 2008-07-23 | 엘지디스플레이 주식회사 | Vacuum bonding device for liquid crystal display |
KR101245181B1 (en) * | 2006-03-13 | 2013-03-19 | 엘아이지에이디피 주식회사 | Substrate bonding apparatus |
KR101292803B1 (en) * | 2006-12-06 | 2013-08-02 | 엘아이지에이디피 주식회사 | Apparatus for assembling substrates having a gap control unit |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2925427B2 (en) * | 1993-05-14 | 1999-07-28 | 信越化学工業株式会社 | Electrostatic chuck |
JPH1026763A (en) * | 1996-07-11 | 1998-01-27 | Seiko Epson Corp | Production of liquid crystal panel and device therefor |
-
2000
- 2000-03-20 SG SG200001561A patent/SG87888A1/en unknown
- 2000-03-20 TW TW089105073A patent/TW526367B/en not_active IP Right Cessation
- 2000-03-29 KR KR1020000015984A patent/KR100360833B1/en not_active IP Right Cessation
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7372691B2 (en) | 2004-06-11 | 2008-05-13 | Innolux Display Corp. | Apparatus and method for joining two substrates |
US7190431B2 (en) | 2004-07-09 | 2007-03-13 | Innolux Display Corp. | Method for curing sealant used when sealing an LCD panel |
CN102636913A (en) * | 2011-02-15 | 2012-08-15 | 常阳工学株式会社 | Sealing method and apparatus thereof |
CN103959453A (en) * | 2011-11-25 | 2014-07-30 | 信越工程株式会社 | Wafer transport apparatus and wafer assembly line |
CN103959453B (en) * | 2011-11-25 | 2017-03-08 | 信越工程株式会社 | Base board delivery device and substrate assembly line |
CN104898310A (en) * | 2014-03-06 | 2015-09-09 | Nlt科技股份有限公司 | Substrate laminating apparatus, substrate laminating method, and stereoscopic display device |
CN104898310B (en) * | 2014-03-06 | 2019-05-10 | Nlt科技股份有限公司 | Substrate stacked laminator, substrate laminating method and 3 d display device |
US10718953B2 (en) | 2014-03-06 | 2020-07-21 | Tianma Microelectronics Co., Ltd. | Substrate laminating apparatus, substrate laminating method, and stereoscopic display device |
Also Published As
Publication number | Publication date |
---|---|
KR20010020690A (en) | 2001-03-15 |
KR100360833B1 (en) | 2002-11-13 |
SG87888A1 (en) | 2002-04-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent | ||
MM4A | Annulment or lapse of patent due to non-payment of fees |