1 ~ ______ 521006 A7 _______ B7 五、發明說明（/ ) 發明領域·： 本發明係關於一種淨化裝置與淨化方法。更亘體的說 ’本發明係關於技術用於淨化流體爲基礎，以化學試劑來 淨化一容器或隔間內部的工作。 先前技藝之說明 用於製造半導體裝置及電子裝置與儀器的處理設備， 經常使用難以處理的化學試劑的處理液體，化學試劑的殘 留物難以僅藉由一氣體淸洗來移除。以用來形成高度絕緣 薄膜（film)的PET(pentaethoxytantalum)爲例，跑空氣接觸時 本試劑與〇2及H2〇作用來形成一種膠狀的材料。例如，當 想要進行維護或更換或改變試劑時，一旦ρΕτ通過一歧管 (manifold)或蒸f留器(vaporizer)之後，其內部_間無法僅藉由 一簡單的氣體淸洗循環來淸洗及淨化圓滿地處理(以氣體反 覆加壓並真空排氣）。除了氣體淸洗之外，一種現有的技術 將此包含溶劑使用的難題稱爲淨化流體，以達成良好的淸 洗及目標隔間的淨化。 一種使用揭示於美國第5,964,230號專利特別技術的裝 置。本裝置用在溶劑爲主的淸洗及一化學處理歧管的淨化 ，其特性在於透過一相對於歧管徑向安裝的噴嘴將溶劑導 入歧管。分別提供所要處理的容器，用於溶劑進料及溶劑 的回復:當被用來淨化歧管的廢溶劑(spent s〇lvent)被回復到 回復容器時，新溶劑(fresh solvent)從進料容器進料到歧管 朱纸張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) I -------訂·--------I ---- 521006 A7 _______ B7 _ 五、發明說明（/) 本發明欲解決之課題 淨化裝置的預備技術，使用溶劑來淨化化學處理隔間 的形式，如藉由揭示於美國第5,964,230號專利的裝置所示 ’包含兩個容器來達成溶劑進料與溶劑回復功能。這些容 器每個都透過其專用的導管結構連接到等待淨化的隔間， 並用於溶劑進料或溶劑回復。此架構需要一大口徑導管類 型(population) ’在淨化裝置本身及在淨化裝置與隔間之間 都需要淨化’也需要一種較大的面積用在淨化裝置上。這 些要求一個個增加淨化裝置的成本，並降低其可操作性。 本發明係針對上述預備技術的難題發展而來。有關使 用一淨化流體來淨化一目標隔間內部的淨化裝置，本發明 的目的是用來降低裝置的成本，並藉由降低裝置所需的導 管類型來改善其可操作性，並降低裝置所佔有的面積。 解決課題之方法 · 本發明的第一態樣係以淨化流體淨化一目標隔間內部 的淨化裝置，其特點係配備有： 一氣密容器來裝該淨化流體； 一分隔壁面以一氣密方式來分隔該容器的內部，進入 一裝有新淨化流體的進料隔間及一裝有廢淨化流體的回復 隔間，其中該分隔壁面可扮演等化(equaUze)在該進料隔間 內與該回復隔間內壓力的功能； 一包含第一閥門的進料導管被安裝，以便將該進料隔 間連接到前面的該目標隔間； 幸、紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐〉 (請先閱讀背面之注意事項再填寫本頁) ·· 訂---------線1 521006 五、發明說明（3 ) 一包含第二閥門的回復導管被安裝，以便將該回復隔 間連接到前面的該目標隔間； 一氣體導入導管導入加壓氣體’並連接到位於該第一 閥門與該目標隔間之間的該進料導管；以及 一排氣導管執行真空排氣，並連接到位於該第一閥門 與該目標隔間之間的該進料導管，或連接到位於該第二閥 門與該目標隔間之間的該回復導管。 本發明的第二態樣其特徵在於第一態樣的淨化裝置的 分隔壁面包含一剛性板，並以可沿著容器的內表面滑動的 方式支撐。 本發明的第三態樣其特徵在於第~態樣的淨化裝置的 分隔壁面包含一彈性袋，它膨脹及收縮來反應該進料隔間 與該回復隔間內的壓力。 本發明的第四態樣其特徵在於根據一通風機構之第一 到第三態樣中任一態樣中，藉由在一裝置內額外的安裝， 通風機構連接到該回復隔間，或連接到位於該回復隔間與 該第二閥門之間的該回復導管。 本發明的第五態樣其特徵在於根據一分離的加壓氣體 導入導管之第一到第四態樣中任一態樣，藉由在一裝置內 額外的安裝，導入導管連接到該回復隔間或該回復導管。 本發明的第六要點係一使用淨化裝置的淨化方法，依 照第一態樣來淨化一目標隔間，其特徵係包含： -準備程序，藉由加壓氣體來加壓容器內部，同時目 標隔間的內容物被釋放出來，接著其中將該第一與第二閥 7紙張尺度適用中國國家標準（CNS)A4規格（21(}><29/公€ - - 一 (請先閱讀背面之注意事項再填寫本頁) 訂---------線1 A7 521006 __,_B7______ 五、發明說明（*f ) 門關閉，藉由透過真空排氣導管抽氣來降低目標隔間的內 部壓力； 一進料及淨化程序，在該準備程序之後被執行’在此 程序中該第一閥門開啓及該第二閥門關閉，運用容器與目 標隔間之間的壓力差，新淨化流體從該進料隔間透過進料 導管注入目標隔間，目標隔間因而被淨化；以及 一回復程序，在該進料及淨化程序之後被執行，其中 該第一閥門關閉及該第二閥門開啓，加壓氣體從該氣體導 入導管導入，然後廢淨化流體從目標隔間透過回復導管回 復，再進入回復隔間。 本發明的第七態樣其特徵在於容器在第六態樣方法的 準備程序中，藉由從氣體導入導管導入的加壓氣體來加壓 ，其該第一閥門關閉及該第二閥門開啓。 本發明的第八態樣其特徵在於容器在第六態樣方法的 準備程序中，藉由從一分離的加壓氣體導入導管導入的加 壓氣體來加壓，導入導管被連接到該回復隔間或回復導管 Ο 本發明的第九態樣在於依照第六到第八態樣中任一態 樣的額外運作(provmon)，該運作在進料及淨化程序之後以 i 及在回復程序之前或期間發生，此一程序包含一開啓的通 風機構，它連接到回復隔間，或連接到位於回復隔間與第 二閥門之間的回復導管。 本發明的實施例探討本發明的各種實施方法，以及本 發明藉由所揭示的組成構件複數的適當組合可得到的各種 —_____7 度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 訂---------線丨 _ 521006 A7 __ B7 __________ 五、發明說明（^ ) 實施例。例如，當一本發明現有的實施例中某些組成構件 已從出現的實施例整組組成構件省略’這些省略的構件可 藉由傳統現有的技術，在現有發明的實施例的實務工作中 適當地完成。 圖式簡單說明 圖1包含一淨化裝置導管設計的示意圖，其係爲本發 明的一實施例。其係顯示該淨化裝置連接到一半導體處理 系統的歧管（目標隔間）。 圖2包含一淨化裝置導管設計的示意圖，其係爲本發 明的另一種實施例。其係顯示該淨化裝置連接到一歧管。 圖3包含一淨化裝置導管設計的示意圖，其係爲本發 明的另一種實施例。其係顯示該淨化裝置連接到一歧管。 圖4包含一淨化裝置導管設計的槪要圖式，這也是本 發明的另一實施例。顯示淨化裝置連接到一歧管。 圖5包含一淨化裝置導管設計的示意圖，其係爲本發 明的再另一種實施例。其係顯示該淨化裝置連接到一歧管 〇 圖6包含一描繪淨化裝置的容器的圖式，其係爲本發 明的另一實施例。 圖7包含描繪一用於淨化歧管內部方法的順序的流程 圖；此方法係使用描繪在圖1中的淨化裝置來達成。 元件符號說明 _____^___ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 譽--------訂---------線—_丨丨丨 521006 A7 _B7 五、發明說明（L) 12 ' 歧管 14 主導管’ 16 試劑槽 18 分支導管 20 處理隔間 22 下噴嘴 24 上噴嘴 30-30F 淨化裝置 32 容器 34 分隔壁面 36 進料隔間 38 回復隔間 42 滑動支撐元件 44 進料導管 46 回復導管 52 氣體導入導管 54 加壓氣體源 56 出口噴嘴 62 排氣導管 64 真空排氣源 66 吸入噴嘴 72 通風機構 74 .通風導管 82 第二氣體導入導管 (請先閱讀背面之注意事項再填寫本頁) 本纸張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 84 86 92 94 96 98 100 521006 A7 ------~____________ 五、發明說明（"]) 加壓氣體源 出口噴嘴' 溶劑再裝塡導管 進料幫浦 溶劑槽 排水導管 樹酯袋 本發明的實施例 本發明的實施例係參考隨附的圖式而作說明。在下面 的說明中，具有大致相同之結構與功能的組成構件係指定 一共同的參考符號，它們的說明只有在需要時才會重複出 現。 圖1包含一淨化裝置30導管設計的示意圖，此淨化裝 置係本發明的一種實施例。本實施例顯示發明的裝置連接 到一半導體處理系統的歧管12(目標隔間）。 此歧管12透過一配備有閥門VI的主導管14連接到 一儲槽16，該儲槽儲存一化學試劑(處理液體）。該歧管12 也透過一配備有閥門V2的分支導管18連接〜半導體處理 系統的處理隔間20。該歧管12同時透過分離的分支連接 到其它的處理隔間，但這些特性爲了方便而未顯示。 爲達淨化的目的，一下噴嘴22與一上噴嘴24連接到 歧管12，适些卩貝嘴h過化學试劑(處理液體)通過與歧管η 內的空間有所交流。一配備有凸緣的闕門V3裝置在下噴 _ _____—10 __ 本紙張尺度適用中國國家標準（CNS)A4規格(210 X 297公爱「 一"' ' - (請先閱讀背面之注意事項再填寫本頁> - -線_1 ~ ______ 521006 A7 _______ B7 V. Description of the invention (/) Field of the invention: The present invention relates to a purification device and a purification method. More specifically, the present invention relates to the technology used to purify fluids, using chemicals to purify the interior of a container or compartment. Description of the prior art The processing equipment used to manufacture semiconductor devices and electronic devices and instruments often uses processing liquids of difficult-to-handle chemical reagents, and the residues of chemical reagents are difficult to remove only by a gas rinse. Taking PET (pentaethoxytantalum), which is used to form highly insulating films, as an example, this reagent interacts with 02 and H2O to form a gel-like material when exposed to air. For example, when it is desired to perform maintenance or replace or change reagents, once ρΕτ passes through a manifold or vaporizer, its interior cannot be separated by a simple gas scrubbing cycle. Wash and purify satisfactorily (repeatedly pressurized with gas and evacuated under vacuum). In addition to gas scrubbing, an existing technology refers to this problem that involves the use of solvents as a purge fluid to achieve good scrubbing and purification of the target compartment. A device using the special technique disclosed in U.S. Patent No. 5,964,230. The device is used for solvent-based decontamination and purification of a chemical treatment manifold. Its characteristics are that the solvent is introduced into the manifold through a nozzle installed radially relative to the manifold. Provide the container to be processed separately for solvent feeding and solvent recovery: when the spent solvent used to purify the manifold is returned to the recovery container, fresh solvent is returned from the feeding container The size of the paper fed to the manifold is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back before filling this page) I ------- Order ·- ------ I ---- 521006 A7 _______ B7 _ V. Description of the invention (/) The preparatory technology of the purification device for the subject to be solved by the present invention, the use of solvents to purify the form of the chemical treatment compartment, such as by revealing As shown in the device of US Pat. No. 5,964,230, 'contains two containers for solvent feeding and solvent recovery functions. Each of these containers is connected to the compartment to be cleaned through its dedicated conduit structure and is used for solvent feed or solvent recovery. This architecture requires a large-diameter catheter type, which requires purification both in the purification device itself and between the purification device and the compartment. It also requires a larger area for the purification device. These requirements increase the cost of the purification device one by one and reduce its operability. The present invention has been developed in response to the above-mentioned problems of the preliminary technology. Regarding a purification device that uses a purification fluid to purify the interior of a target compartment, the purpose of the present invention is to reduce the cost of the device, and to improve the operability by reducing the type of conduit required for the device, and to reduce the occupation of the device Area. Solution to the Problem The first aspect of the present invention is a purification device for purifying the interior of a target compartment with a purification fluid, which is characterized by being equipped with: an airtight container to hold the purification fluid; a partition wall surface to be separated in an airtight manner The inside of the container enters a feed compartment filled with fresh purified fluid and a recovery compartment filled with spent purified fluid, wherein the partition wall surface can play an equalization (equaUze) in the feed compartment with the recovery The function of the pressure in the compartment; a feed duct containing a first valve is installed to connect the feed compartment to the target compartment in front; fortunately, the paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm> (Please read the precautions on the back before filling out this page) ·· Order --------- Line 1 521006 V. Description of the invention (3) A return duct containing a second valve is installed To connect the recovery compartment to the target compartment in front; a gas introduction duct to introduce pressurized gas' and connect to the feed duct between the first valve and the target compartment; and an exhaust Catheter performs vacuum Gas, and is connected to the feed conduit between the first valve and the target compartment, or to the return conduit between the second valve and the target compartment. A second aspect of the invention It is characterized in that the partition wall surface of the purification device of the first aspect includes a rigid plate and is supported so as to be slidable along the inner surface of the container. A third aspect of the present invention is characterized by that of the purification device of the first aspect The partition wall surface includes an elastic bag, which expands and contracts to reflect the pressure in the feed compartment and the recovery compartment. A fourth aspect of the present invention is characterized in that according to the first to third aspects of a ventilation mechanism, In any aspect, with additional installation in a device, the ventilation mechanism is connected to the recovery compartment or to the recovery duct located between the recovery compartment and the second valve. Fifth of the invention The aspect is characterized in that according to any of the first to fourth aspects of a separate pressurized gas introduction duct, the introduction duct is connected to the recovery compartment or the recovery duct by additional installation in a device The hair The sixth point of the Ming is a purification method using a purification device to purify a target compartment according to the first aspect, which is characterized by:-a preparation procedure to pressurize the interior of the container with pressurized gas, while the target compartment The contents are released, and then the paper size of the first and second valves 7 is applied to the Chinese National Standard (CNS) A4 specification (21 (} > & 29/29 / €--one (please read the first Please fill in this page again) Order --------- Line 1 A7 521006 __, _ B7______ V. Description of the invention (* f) The door is closed, and the target compartment is lowered by exhausting through the vacuum exhaust duct. Internal pressure; a feed and purification procedure, which is performed after the preparation procedure, in which the first valve is opened and the second valve is closed, using the pressure difference between the container and the target compartment, the newly purified fluid is removed from The feed compartment is injected into the target compartment through a feed conduit, and the target compartment is thus purified; and a recovery procedure is performed after the feed and purification procedure, wherein the first valve is closed and the second valve is opened, Pressurized gas is introduced from this gas Introducing tube, and then purifying the waste fluid compartment reply from the target through the return duct, and then into the return compartment. A seventh aspect of the present invention is characterized in that the container is pressurized by a pressurized gas introduced from a gas introduction duct in the preparation procedure of the sixth aspect method, wherein the first valve is closed and the second valve is opened. An eighth aspect of the present invention is characterized in that, in the preparation procedure of the sixth aspect method, the container is pressurized by a pressurized gas introduced from a separate pressurized gas introduction duct, and the introduction duct is connected to the recovery compartment. Intermittent recovery catheter 0 The ninth aspect of the present invention is an additional operation (provmon) according to any one of the sixth to eighth aspects, which operation is performed after the feeding and decontamination procedure and before the recovery procedure or During this period, this procedure includes an open ventilation mechanism that is connected to the recovery compartment or to the recovery duct located between the recovery compartment and the second valve. The embodiments of the present invention discuss various implementation methods of the present invention, and various kinds of the present invention which can be obtained by proper combination of the plurality of disclosed component members —_____ 7 degrees applicable to China National Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back before filling this page) Order --------- Line 丨 521006 A7 __ B7 __________ V. Description of the Invention (^) Examples. For example, when certain constituent components of an existing embodiment of the present invention have been omitted from the entire set of constituent components of the present embodiment, these omitted components can be appropriately used in the practical work of the embodiments of the existing invention by the conventional existing technology. To finish. Brief Description of the Drawings Figure 1 contains a schematic diagram of the design of a duct of a purification device, which is an embodiment of the present invention. It is shown that the purification unit is connected to a manifold (target compartment) of a semiconductor processing system. Fig. 2 contains a schematic diagram of the design of a duct of a purification device, which is another embodiment of the present invention. It is shown that the purification device is connected to a manifold. Fig. 3 contains a schematic diagram of the design of the duct of a purification device, which is another embodiment of the present invention. It is shown that the purification device is connected to a manifold. Fig. 4 contains a schematic diagram of the design of a duct of a purification device, which is another embodiment of the present invention. The display purification device is connected to a manifold. Fig. 5 contains a schematic diagram of a duct design of a purification device, which is yet another embodiment of the present invention. It shows that the purification device is connected to a manifold. Figure 6 contains a drawing depicting a container of the purification device, which is another embodiment of the invention. FIG. 7 contains a flowchart depicting the sequence of a method for purifying the interior of a manifold; this method is accomplished using the purification device depicted in FIG. Component symbol description _____ ^ ___ This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page) Reputation -------- Order- -------- Line—_ 丨 丨 丨 521006 A7 _B7 V. Description of the invention (L) 12 'Manifold 14 Main duct' 16 Reagent tank 18 Branch duct 20 Processing compartment 22 Lower nozzle 24 Upper nozzle 30- 30F purification device 32 container 34 partition wall surface 36 feed compartment 38 return compartment 42 sliding support element 44 feed duct 46 return duct 52 gas introduction duct 54 pressurized gas source 56 outlet nozzle 62 exhaust duct 64 vacuum exhaust source 66 Suction nozzle 72 Ventilation mechanism 74. Ventilation duct 82 Second gas introduction duct (please read the precautions on the back before filling this page) This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 84 86 92 94 96 98 100 521006 A7 ------ ~ ____________ V. Description of the invention ("]) Pressurized gas source outlet nozzle 'Solvent refilling duct Feed pump Solvent tank drainage duct Resin bag of the present invention Examples of the invention Example-based reference to the accompanying drawings and be described. In the following description, constituent components having substantially the same structure and function are assigned a common reference symbol, and their descriptions will only appear repeatedly when needed. Fig. 1 contains a schematic diagram of the design of a duct of a purification device 30, which is an embodiment of the present invention. This embodiment shows that the inventive device is connected to a manifold 12 (target compartment) of a semiconductor processing system. The manifold 12 is connected to a storage tank 16 through a main pipe 14 equipped with a valve VI, which stores a chemical reagent (treatment liquid). The manifold 12 is also connected to the processing compartment 20 of the semiconductor processing system through a branch conduit 18 equipped with a valve V2. The manifold 12 is simultaneously connected to other processing compartments through separate branches, but these characteristics are not shown for convenience. For the purpose of purification, the lower nozzle 22 and the upper nozzle 24 are connected to the manifold 12, and some chemical reagents (treatment liquids) are used to communicate with the space in the manifold η. A card-equipped V3 device equipped with a flange is sprayed down _ _____— 10 __ This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 public love "I " ''-(Please read the precautions on the back first Fill out this page again-> -line_
521006 五、發明說明（^) 嘴22，一配備有凸緣的閥門V4裝置在上喧嘴24，使得淨 化裝置30與其相對應的管件可拆卸式⑽咖㈣連接。 該淨化裝置30包含〜氣密容器32一以—種剛性抗腐 餓的材料製成〜用來裝載溶劑，健是淨化用的流體。此 容器32被一種剛性抗腐蝕材料製成的分隔壁面％氣密分 隔成一裝有新溶劑的進料(feed)隔間％與一裝有廢溶劑的 回復隔間38。該分隔壁面34係以滑動支撐元件42來支撐 ，例如，包含一 0型環及活塞環，以如此支撐方式壁面可 沿著容器32的內表面滑動。換言之，該分隔壁面34可將 進料隔間36內的壓力及回復隔間38內的壓力連續等化 (equalization)。 該進料隔間36係透過一配備有閥門vii的進料導管 44連接到歧管丨2的下噴嘴22。一凸緣F11係安裝在該進 料導管44的末端，以便完成可拆卸式銜接7到下噴嘴22 的凸緣。該回復隔間3 8透過一配備有閥門V12的回復導管 46連接到歧管12的上噴嘴24。一凸緣F12係安裝在回復 導管46的末端，以便完成可拆卸式銜接到上噴嘴24的凸 緣。 用來導入加壓氣體的一氣體導入導管52被連接到位於 閥門VII與凸緣F11之間的進料導管44。爲了獲得一加壓 鈍氣像是M(Ar)的進料，該氣體導入導管52係被連接到— 加壓氣體源54的出口噴嘴56，該加壓氣體源被安裝在機 組(Plant)設備側上，該側包含半導體處理系統。一配備有 凸緣的閥門V21被安裝在出口噴嘴56上，造成可拆卸式連 ，—-------y_— t、紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐) '一"''- (請先閱讀背面之注意事項再填寫本頁) - — III---^ · I---I---I I I I I 1 521006 A7 B7 - -- ~ — ---- ~ —— 五、發明說明) 接到淨化裝置30相對應的管件。一凸緣F13被安裝在氣體 導入導管52的末端，造成可拆卸式銜接到出口噴嘴56的 凸緣。 一排氣導管62以完成真空排氣被連接到位於閥門Vl2 與凸緣F12之間的回復導管46。此排氣導管62被連接到 一真空排氣源64的吸入(sucUon)噴嘴66，真空排氣源包括 一真空幫浦並安裝在機組設備的一側，該側包括半導體處 理系統。一配備有凸緣的閥門V22安裝在吸入噴嘴66上， 使淨化裝置30與相對應的管件可拆卸式銜接。一凸緣F14 安裝在排氣導管62的末端，可拆卸式銜接到吸入噴嘴66 的凸緣。如在以下將說明之，該排氣導管62可連接到位於 閥門VII與凸緣F11之間的進料導管44，而非連接到回復 導管46。 一通風機構72包含一配備有閥門V13的通風導管74 係被連接到容器32的頂端，也就是連接到回復隔間38。 如有必要，此通風導管74被連接到一適當的溶劑回復元件 (未顯示）。此外，該通風機構72可被連接到位於回復隔間 38與凸緣F12之間的回復導管46，而非連接到該回復隔間 38 ° 一用於淨化歧管12內部發明的方法之實施例的說明如 下；此實施例使用描繪在圖1中的淨化裝置來執行。圖7 包含用於此淨化方法的一連串流程圖。 在包含歧管12的半導體處理系統的運作過程中，該淨 化裝置30可處在與歧管12斷連，或可處在連接到歧管12 (請先閱讀背面之注意事項再填寫本頁) · 訂· •線. 本紙張尺度適闬中國國家標準（CNS)A4規格（210 X 297公釐） 521006 B7 五、發明說明（|〇) 的狀悲、但處在一閒置模式。當隨後在保養或試劑替換或變 更需要淨化歧管12的內部時，半導體程序系統的運作被停 止’換言'之’化學試劑從儲槽16的進料(程序液體)被停止 ’在程序隔間20內的程序被終止，然後淨化裝置30開始 使用。 當淨化裝置30開始使用時，實質上只有新淨化流體， 也就是溶劑係裝在容器32中。該進料隔間36因此裝滿而 回復隔間38是空的。可滑動的分隔壁面34會因此被升高 到其最上面的位置Tp，如圖1中的虛線所顯示(Bp在圖1 中表示分隔壁面34的最底部位置）。指明此狀態爲開始狀 態，根據如下結果的解說淨化程序接著進行。在解說中假 設是遵照其運作是所有閥門VI到V22 一開始設定在〜關 閉位置來開始。 歧管12首先淨空(程序S1)。 此程序是將閥門VI、V3、及V21切入其開啓位置(閥 門V2關閉)來達成。在此架構中，加壓氣體從加壓氣體源 54透過氣體導入導管52及進料導管44導入歧管12。利用 加壓氣體的壓力，在歧管12中的化學試劑(處理液體)因而 回到槽16，或透過一位於儲槽16附近的排水導管傳送到 一適當的處理液體回復元件(未顯示）。一旦該歧管12被浄 空閥門VI關閉，處理液體的回送(back-tr*anSport)接著完成 〇 容器32的內部接著被加壓(程序S2)。 此程序係將閥門V3、V4、V12、及V21切入其開啓位 本纸張尺度適3中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 4^1. 丨線_ A7 521006 ________ B7____ 五、發明說明（（丨） 置（閥門VII關閉）來達成。在此架構中加壓氣體係從加壓 氣體源54透過氣體導入導管52、進料導管44、歧管12、 及回復導管46導入該回復隔間38。此動作使用加壓氣體 的壓力從回復隔間38的側邊來加壓容器32的內部。一旦 容器32的內部提高到所要的目標壓力後，該閥門V12與 V21被關閉，因此停止容器32的內部的加壓。既然分隔壁 面34可因應壓力來滑動，在加壓過程中進料隔間36內的 壓力與回復隔間38內的壓力相等。既然容器32的加壓係 經由歧管12來達成，歧管12內的壓力也等於壓力容器32 內的壓力。 歧管12的內部接著減壓(程序S3)。 此程序係將閥門V3、V4、及V22切入其開啓位置(閥 門VII與V12被關閉）來達成。在此架構中，該歧管12的 內部係藉由真空排氣源64經排氣導管62與回復導管46抽 成真空。此動作用來降低歧管12內的壓力’歧管之前與容 器32內的壓力相等，並在容器32的內部與歧管12的內部 之間產生一足夠大小的壓力差。一旦歧管12的內部被淨空 到達目標壓力後，閥門V4及V22被關閉’因此停止歧管 12內部的減壓。 新溶劑接著被導入歧管12(程序S4)。 此程序係將閥門V3與VII切入其開啓位置(閥門V4 被關閉），因而在進料隔間36的內部與歧管I2的內部之間 產生聯繫。基於容器32內部與歧管12內部之間的壓力差 ，新溶劑因而從進料隔間36透過進料導管44被傳送到歧 (請先閱讀背面之注意事項再填寫本頁) 訂---------線| 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7 521006 B7_； __ 五、發明說明（f X) 管12。一旦歧管12的內部被裝滿後閥門VII被關閉，停 止溶劑進料到歧管12的內部。該歧管12的內部接著用來 代表某些期間在此充滿溶劑的情況下以便讓溶劑來分解歧 管12內的殘留物。換言之’溶劑回復程序以後，直到一規 定的處理時間流逝後才開始° 容器32的內部接著減壓(程序S5)。 在此程序中在通風機構72中的閥門V13被開啓(閥門 VII及V12被關閉），並且在容器32中的壓力透過通風導 管74來釋放。此動作用來降低容器32內的壓力’此時容 器內壓力仍然相當高，並因而改善在接下來的溶劑回復程 序中的運作效率。一旦容器32的內部減壓到規定的目標壓 力後，閥門V13也可以關閉，或可以在溶劑回復的下一個 程序期間保持開啓。 在歧管12內部裝滿溶劑的情況的期間’也可以釋放容 器32的壓力。另一方面，可使用真空排氣源64釋放容器 32的壓力，而非用通風機構72來達成。在另一選擇下’ 假如容器32內壓力夠低在完成溶劑進料到歧管12時’不 需釋放容器32的壓力。 廢溶劑接著被回復到容器32(程序S6)。 在此程序中，閥門V3、V4、V12、及V2被切入其開 啓位置(閥門VII關閉），因而使隔間38的內部與歧管12 的內部之間產生交流。在此架構中，加壓氣體係從加壓氣 體源54導入透過氣體導入導管52及進料導管44進入歧管 12。此動作，利用加壓氣體的壓力，從歧管12的內部透過 ___15__---- 本纸張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 訂： —線. 521006 A7 〜 〜 ----------—--------—___ 五、發明說明q 回復導管~ 46來傳送廢溶劑，然後進入回復隔間38。當在 通風機構72上的閥鬥vl3保持開啓時，過量的加壓氣體可 透過通風導管74排出。一旦歧管12的內部被淨空，完成 溶劑回復到容器32。 接著決定是否要重覆淨化(程序S7)。 當歧管12的內部未被再淨化，一旦歧管12的內部被 淨空，閥門V3、V4、V12、及V21係被關閉，而停止歧管 12內的淨化處理。相反的，當歧管π的內部需要再次淨 化時，運作回到程序S2。想要重複淨化，當廢溶劑回復程 序S6停止時，閥門V3、V4、V12、及V21係非關閉的； 而是，這些閥門保持開啓（閥門VII關閉）並繼續導入加壓 氣體。然而，此時在通風機構72中的閥門V13必須關閉。 此架構從回復隔間38的一側使用加壓氣體的壓力導致容器 32內部的加壓。 根據上面已經說明的程序S2到S7，運作持續進行。 藉由重複程序S2到S7的順序任何幾次，歧管12內的淨化 處理可達到需要的次數。 圖2包含一示意圖其顯示一淨化裝置3〇B的導管設計 ，其係爲本發明的另一實施例。該淨化裝置3〇B係顯示成 被連接到歧管12。 在本實施例的淨化裝置30B中，該進料隔間36係經由 進料導管44連接到歧管12的上噴嘴22,，同時該回復隔 間38係經由回復導管46連接到達歧管π的下噴嘴24,。 此外，用來真空排氣的排氣導管62係被連接到位於閥門 ____-_— 16__ 木紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） '"—-—-- (請先閱讀背面之注意事項再填寫本頁) · -線. A7 521006 __B7 五、發明說明（/f) VII與凸緣F11之間的進料導管44，而非連接到回復導管 46。該排氣導管62係連接到安裝在機組設備側的真空排氣 源64的吸入噴嘴66。 ' 具有上述結構的淨化裝置30B，藉由參考圖7中的流 程圖透過程序S1到S7所描述的應用，也可以用來淨化歧 管12的內部。然而，以淨化裝置30的操作程序的推導， 需要在說明中替換，藉由圖1中的噴嘴22及24及閥門V3 及V4的運作，分別對應到圖2中噴嘴22'及24'及閥門V3 及V4'的運作。 圖3包含一示意圖其顯示一淨化裝置30C的導管設計 ，其係本發明的再另一實施例。該淨化裝置30C係顯示成 連接到歧管12。 在本實施例的淨化裝置30C中，一用來導入加壓氣體 的第二氣體導入導管82係連接到位於容器32與凸緣F12 之間的回復導管46。爲了獲得一像是氬(Ar)的加壓鈍氣的 進料，該氣體導入導管82係連接到一加壓氣體源84的出 口噴嘴86,該加壓氣體源裝置在包含半導體處理系統的機 組設備的一側。一配備有凸緣的閥門V23安裝在出口噴嘴 86上，使其可拆卸式銜接到淨化裝置3〇(：相對應的管件。 凸緣F15係女裝在氣體導入導管8 2的末端，使其可拆卸 式銜接到出口噴嘴86的凸緣。 圖4包含一示意圖其顯示一淨化裝置3〇E)的導管設計 ，係爲本發明的另一實施例。該淨化裝置3〇D係顯示成連 接到歧管12。 (請先閱讀背面之注意事項再填寫本頁) · -丨線 i紙張尺度適用中國國家標準（CNS)A4規格（210 x 2^7公釐） —-一 A7 521006 __B7___ 五、發明說明（ (Γ) 在此實施例的淨化裝置30D中的第二氣體導入導管82 係直接地連接到頂端，換言之，連接到容器32的回復隔間 38，而非連接到回復導管46。該氣體導入導管82也連接 到一加壓氣體源84的出口噴嘴86，加壓氣體源安裝在機 組設備的一側。 具有在圖3及4中說明的結構的淨化裝置30C與30D ，透過參考圖7中的流程圖透過程序S1到S7所描述的應 用，也可以用來淨化歧管12的內部。然而，所考慮的裝置 ，該容器32內部的加壓(對應到前面的程序S2)係使用銜接 到氣體導入導管82的進料系統，而非銜接到氣體導入導管 52的進料系統來達成。換言之，將閥門V12及V23切入其 開啓位置(閥門V4關閉），加壓氣體係從加壓氣體源84透 過第二氣體導入導管82導入回復隔間38的內部。本實施 例提供容器32內部加壓時機的一種高自由度，因爲容器 32的內部可藉由氣體導入導管82來加壓，而不需通過歧 管12。 圖5包含一示意圖其顯示一淨化裝置3(m的導管設計 ’其亦係爲本發明的另一實施例。淨化裝置3〇Ε係與歧管 12 —起顯示。 基於凸緣F11到F15的使用，顯示於圖1到4中的裝 置30到30D被構成獨立裝置，它們銜接到歧管12並且可 從歧管12拆卸。然而，描繪於實施例圖5中的淨化裝置 30Ε構成一種永久性安裝在歧管12上的銜接。爲了使一新 溶劑的再裝塡進料，進料幫浦94與溶劑槽96係透過一配 張尺度適用中國國豕標準（CNs)A4規格（21〇 χ 公爱1 ' (請先閱讀背面之注意事項再填寫本頁) 攀： - 521006 A7 -------B7 五、發明說明（（έ ) 備有閥門-V31的溶劑再裝塡導管92連接到進料隔間36。 一配備有閥門V32的排水導管98也被連接到回復隔間38 來排出廢溶劑。如有需要，該排水導管98係被連接到〜適 當的溶劑回復元件(未顯示）。 在帶有上述結構的淨化裝置30Ε的情況中，該容器32 可再裝塡溶劑，並且溶劑可由此排出而不需從歧管12分離 。此外’透過進料幫浦94的運作，再裝塡新溶劑及排出廢 溶劑可同時進行。也就是，將閥門V31及V32切到其開啓 位置’該進料幫浦94的運作造成進料隔間36從溶劑槽％ 再裝塡新溶劑。在此操作過程中，由於在進料隔間36內的 壓力與回復隔間38內的壓力相等時分隔壁面34的向上滑 動’在回復隔間38內的廢溶劑自然透過排水導管98排出 〇 圖6包含一描繪淨化裝置3〇f的容器32的圖式，其係 爲本發明的另一實施例。 描繪在圖1到5裡淨化裝置30到30E的情況中，該 容器32的內部係藉由一剛性分隔壁面34以一氣密方式分 隔成進料隔間36及回復隔間38。與此相比，在圖6實施 例的淨化裝置30F的情況中，該容器32的內部係藉由〜彈 性抗腐飽合成樹酯袋丨⑻以一氣密方式分隔成進料隔間％ 及回復隔間38。該樹酯袋1〇〇的內部形成回復隔間38，同 時在樹醋袋1〇〇的外表面與容器32的內表面之間形成進料 隔間36 °該樹酯袋100因應進料隔間36與回復隔間38內 的壓力膨脹與收縮。換言之，彈性合成樹酯壁面形成的樹 ----- _19_ t、紙張尺度適用中國_準（C^)A4規格（21〇 χ 297公釐） --- 2请先閱讀背面之注意事項再填寫本頁) 0 - -線· 521006 A7 ------B7___ 五、發明說明（1) 酯袋100當成一活動分隔壁面，來區隔進料隔間36與一回 復隔間38。 _ 該歧管12的內部可使用具有上述結構的淨化裝置3〇f 來淨化’再次使用參考圖7上述的程序S1到S7。當該容 器32的內部裝滿新淨化流體(溶劑），樹酯袋1〇〇假定爲〜 收縮狀態，如圖6中的實線所示。當淨化處理進行中，樹 酯袋100膨脹到假定的狀態，以圖6中的虛線顯示，當新 溶劑的量減少時廢溶劑回復。 在圖1到5的淨化裝置30到30E中，該分隔壁面34 做成活動式來回應進料隔間36與回復隔間38內的壓力， 由於被滑動支撐元件42所支撐，滑動支撐元件例如包含一 〇型環與活塞環。然而，在圖.6中所描繪的淨化裝置30F 中’由於以彈性樹酯袋100構成的分隔壁面做成活動式來 回應進料隔間36與回復隔間38內的壓力。反應壓力的分 _壁面也可基於已知橫隔膜(diaphragm)與風箱(bellow)的原 理來構成。 如上述說明，在圖1到4中的淨化裝置30到30D被構 胃成獨立的裝置，有需要時可被運送到一場所再連接到淨 化目標。另一方面，在圖5中所描繪的淨化裝置30E，被 構建成一種永久性安裝在淨化目標上的銜接件。在圖6中 所顯示配備有樹酯袋100的淨化裝置30F，本身可被當作 一獨立的裝置或一銜接件。 在本發明槪念的技術範圍內各種的修正與改變，可被 熟悉此項技藝之人士所設計，其應該瞭解的是，這些修正 -_丨_一一—— 90 _________ τ、紙張尺度適用中國國家標準（CNS)A4規格（21〇 χ 297公爱） (請先閱讀背面之注意事項再填寫本頁) 訂· _ .線- 521006 A7 B7 五 、發明說明πΡί 及改變也涵括在本發明的範圍內。 本發明的有利影響 如上述的說明，用於淨化一具有淨化流體目標隔間內 部的發明的淨化裝置，需要一種較小的導管類型及較小空 間，並導致成本降低及提供一改進的可操作性。 (請先閱讀背面之注意事項再填寫本頁) 21 訂！ 線· 幸、紙張尺度適罔中國國家標準（CNS)A4規格（210 X 297公釐）521006 V. Description of the invention (^) The mouth 22, a valve V4 equipped with a flange, is installed on the upper mouth 24, so that the purification device 30 is detachably connected to its corresponding pipe fitting. The purification device 30 includes an air-tight container 32, which is made of a rigid, anti-corrosive material, and is used to load a solvent, which is a fluid for purification. The container 32 is air-tightly separated by a partition wall surface made of a rigid anti-corrosive material into a feed compartment% filled with fresh solvent and a recovery compartment 38 filled with waste solvent. The partition wall surface 34 is supported by a sliding support member 42, for example, including a 0-ring and a piston ring. In this manner, the wall surface can slide along the inner surface of the container 32. In other words, the partition wall surface 34 can continuously equalize the pressure in the feed compartment 36 and the pressure in the recovery compartment 38. The feed compartment 36 is connected to the lower nozzle 22 of the manifold 2 through a feed conduit 44 equipped with a valve vii. A flange F11 is mounted at the end of the feed duct 44 to complete the flange of the detachable engagement 7 to the lower nozzle 22. The recovery compartment 38 is connected to the upper nozzle 24 of the manifold 12 through a recovery duct 46 equipped with a valve V12. A flange F12 is attached to the end of the return duct 46 to complete the detachable engagement with the flange of the upper nozzle 24. A gas introduction pipe 52 for introducing a pressurized gas is connected to a feed pipe 44 between the valve VII and the flange F11. In order to obtain a pressurized blunt gas like M (Ar) feed, the gas introduction conduit 52 is connected to an outlet nozzle 56 of a pressurized gas source 54 which is installed in a plant equipment On the side, this side contains a semiconductor processing system. A valve V21 equipped with a flange is installed on the outlet nozzle 56, resulting in a detachable connection. ——————— y_— t, paper size applies Chinese National Standard (CNS) A4 (210 X 297) Li) '一 "' '-(Please read the notes on the back before filling this page)--III --- ^ · I --- I --- IIIII 1 521006 A7 B7--~-- -~--5. Description of the invention) Connected to the pipe fittings corresponding to the purification device 30. A flange F13 is installed at the end of the gas introduction duct 52, resulting in a flange that is detachably engaged with the outlet nozzle 56. An exhaust duct 62 is connected to the return duct 46 between the valve V12 and the flange F12 to complete the vacuum exhaust. This exhaust duct 62 is connected to a sucUon nozzle 66 of a vacuum exhaust source 64, which includes a vacuum pump and is mounted on one side of the unit equipment, which includes a semiconductor processing system. A flange-equipped valve V22 is mounted on the suction nozzle 66, so that the purification device 30 is detachably engaged with the corresponding pipe. A flange F14 is installed at the end of the exhaust duct 62 and is detachably connected to the flange of the suction nozzle 66. As will be explained below, the exhaust duct 62 may be connected to the feed duct 44 between the valve VII and the flange F11 instead of the return duct 46. A ventilation mechanism 72 includes a ventilation duct 74 equipped with a valve V13, which is connected to the top of the container 32, that is, to the recovery compartment 38. If necessary, this ventilation duct 74 is connected to a suitable solvent recovery element (not shown). In addition, the ventilation mechanism 72 may be connected to the recovery duct 46 located between the recovery compartment 38 and the flange F12, instead of being connected to the recovery compartment 38 °. An embodiment of the method for purifying the interior of the manifold 12 The explanation is as follows; this embodiment is performed using the purification device depicted in FIG. 1. Figure 7 contains a series of flowcharts for this purification method. During the operation of the semiconductor processing system including the manifold 12, the purification device 30 may be disconnected from the manifold 12 or may be connected to the manifold 12 (please read the precautions on the back before filling this page) · Order · • Line. This paper is suitable for Chinese National Standard (CNS) A4 specification (210 X 297 mm) 521006 B7 5. The description of the invention (| 〇) is sad, but it is in an idle mode. The operation of the semiconductor programming system is stopped when subsequent maintenance or reagent replacement or modification is required to purify the inside of the manifold 12. In other words, the feeding of chemical reagents (programming liquid) from the storage tank 16 is stopped in the programming compartment. The program in 20 is terminated, and then the purification device 30 is used. When the purification device 30 starts to be used, essentially only the new purification fluid, that is, the solvent is contained in the container 32. The feed compartment 36 is therefore full and the return compartment 38 is empty. The slidable partition wall surface 34 is thus raised to its uppermost position Tp, as shown by the dashed line in FIG. 1 (Bp represents the bottommost position of the partition wall surface 34 in FIG. 1). This state is indicated as the start state, and the purification process according to the following results is explained. In the explanation, it is assumed that all the valves VI to V22 are set in the ~ closed position to start in accordance with its operation. The manifold 12 is first cleared (procedure S1). This procedure is achieved by cutting valves VI, V3, and V21 into their open positions (valve V2 closed). In this architecture, pressurized gas is introduced into the manifold 12 from a pressurized gas source 54 through a gas introduction duct 52 and a feed duct 44. Utilizing the pressure of the pressurized gas, the chemical reagent (treatment liquid) in the manifold 12 is thus returned to the tank 16 or transferred to an appropriate processing liquid recovery element (not shown) through a drain pipe located near the storage tank 16. Once the manifold 12 is closed by the vacuum valve VI, the back-tr * anSport of the processing liquid is then completed. The inside of the container 32 is then pressurized (procedure S2). This procedure cuts the valves V3, V4, V12, and V21 into their open positions. The paper size is 3 Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page. ) 4 ^ 1. 丨 line _ A7 521006 ________ B7____ V. Description of the invention ((丨) (valve VII closed) to achieve. In this architecture, the pressurized gas system from the pressurized gas source 54 through the gas introduction conduit 52, into The feed conduit 44, the manifold 12, and the return conduit 46 are introduced into the return compartment 38. This action pressurizes the inside of the container 32 from the side of the return compartment 38 using the pressure of a pressurized gas. Once the inside of the container 32 is raised to After the desired target pressure, the valves V12 and V21 are closed, so the internal pressure of the container 32 is stopped. Since the partition wall 34 can slide in response to the pressure, the pressure in the feed compartment 36 and the recovery compartment during the pressurization process The pressure in the chamber 38 is equal. Since the pressure of the container 32 is achieved through the manifold 12, the pressure in the manifold 12 is also equal to the pressure in the pressure container 32. The inside of the manifold 12 is then decompressed (procedure S3). The program is to cut in the valves V3, V4, and V22. The open position (valves VII and V12 are closed) is achieved. In this architecture, the inside of the manifold 12 is evacuated by a vacuum exhaust source 64 through an exhaust duct 62 and a return duct 46. This action is used to reduce The pressure in the manifold 12 'The manifold was previously equal to the pressure in the container 32, and a sufficient pressure difference was generated between the inside of the container 32 and the inside of the manifold 12. Once the inside of the manifold 12 was cleared to reach the target After pressure is applied, valves V4 and V22 are closed, thus depressurizing the internal pressure of manifold 12. New solvent is then introduced into manifold 12 (procedure S4). This procedure cuts valves V3 and VII into their open positions (valve V4 is closed ), Thus creating a connection between the interior of the feed compartment 36 and the interior of the manifold I2. Based on the pressure difference between the interior of the container 32 and the interior of the manifold 12, a new solvent is thus passed from the feed compartment 36 through the feed conduit 44 was transmitted to the ambiguity (please read the precautions on the back before filling this page) Order --------- line | This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) A7 521006 B7_; __ 5. Description of the invention (f X) Pipe 12. Once the manifold After the inside of 12 is filled, valve VII is closed, stopping the solvent feed to the inside of the manifold 12. The inside of the manifold 12 is then used to represent the period when the solvent is full in order to allow the solvent to decompose the manifold Residues in 12. In other words, after the solvent recovery process, it does not start until a prescribed processing time has elapsed. The inside of the container 32 is then decompressed (procedure S5). In this process, the valve V13 in the ventilation mechanism 72 is opened. (Valves VII and V12 are closed), and the pressure in the container 32 is released through the ventilation duct 74. This action is used to reduce the pressure inside the container 32 'at this time, and the pressure inside the container is still quite high, thereby improving the operation efficiency in the subsequent solvent recovery process. Once the inside of the container 32 is depressurized to a prescribed target pressure, the valve V13 may also be closed or may remain open during the next procedure of solvent recovery. The pressure of the container 32 may also be released during the time period when the inside of the manifold 12 is filled with the solvent. On the other hand, a vacuum exhaust source 64 may be used to release the pressure of the container 32 instead of using the ventilation mechanism 72. In another option, 'if the pressure in the container 32 is low enough to complete the feed of the solvent to the manifold 12,' there is no need to release the pressure in the container 32. The waste solvent is then returned to the container 32 (procedure S6). In this procedure, the valves V3, V4, V12, and V2 are switched into their open positions (valve VII is closed), thereby communicating between the interior of the compartment 38 and the interior of the manifold 12. In this architecture, a pressurized gas system is introduced from a pressurized gas source 54 into a permeate gas introduction conduit 52 and a feed conduit 44 into the manifold 12. This action uses the pressure of pressurized gas to pass through the inside of the manifold 12 _15 __---- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the note on the back first Please fill in this page again for matters) Order: —line. 521006 A7 ～ ～ ----------—--------——___ V. Description of the invention q Recovery duct ~ 46 to transfer waste solvent, Then enter the recovery compartment 38. When the valve bucket vl3 on the ventilation mechanism 72 remains open, excess pressurized gas can be discharged through the ventilation duct 74. Once the interior of the manifold 12 is emptied, the solvent is returned to the container 32. It is then decided whether to repeat the purification (procedure S7). When the inside of the manifold 12 is not re-purified, once the inside of the manifold 12 is cleared, the valves V3, V4, V12, and V21 are closed, and the purification process in the manifold 12 is stopped. In contrast, when the inside of the manifold π needs to be purified again, the operation returns to the routine S2. To repeat the purification, when the waste solvent recovery program S6 is stopped, the valves V3, V4, V12, and V21 are not closed; instead, these valves remain open (valve VII is closed) and continue to introduce pressurized gas. However, the valve V13 in the ventilation mechanism 72 must be closed at this time. This architecture uses the pressure of the pressurized gas from the side of the recovery compartment 38 to cause pressure inside the container 32. According to the procedures S2 to S7 already explained above, the operation is continued. By repeating the sequence of the procedures S2 to S7 any number of times, the purification process in the manifold 12 can be performed as many times as necessary. FIG. 2 includes a schematic diagram showing a catheter design of a purification device 30B, which is another embodiment of the present invention. The purification device 30B is shown connected to the manifold 12. In the purification device 30B of this embodiment, the feed compartment 36 is connected to the upper nozzle 22 of the manifold 12 via a feed conduit 44, and the return compartment 38 is connected to the manifold π via a return conduit 46 Lower nozzle 24 ,. In addition, the exhaust pipe 62 for vacuum exhaust is connected to the valve ____-_— 16__ wood paper size applies Chinese National Standard (CNS) A4 specification (210 X 297 mm) '" —-—- -(Please read the precautions on the back before filling out this page) · -line. A7 521006 __B7 V. Description of the invention (/ f) The feed conduit 44 between VII and flange F11 is not connected to the return conduit 46. The exhaust duct 62 is connected to a suction nozzle 66 of a vacuum exhaust source 64 mounted on the equipment side of the unit. The purifying device 30B having the above structure can also be used to purify the inside of the manifold 12 by referring to the flow chart in FIG. 7 through the applications described through the programs S1 to S7. However, the derivation of the operation procedure of the purification device 30 needs to be replaced in the description. The operations of the nozzles 22 and 24 and the valves V3 and V4 in FIG. 1 correspond to the nozzles 22 'and 24' and the valve in FIG. 2, respectively. V3 and V4 'operation. FIG. 3 includes a schematic diagram showing a catheter design of a purification device 30C, which is yet another embodiment of the present invention. The purification device 30C is shown connected to the manifold 12. In the purification device 30C of this embodiment, a second gas introduction pipe 82 for introducing a pressurized gas is connected to the return pipe 46 between the container 32 and the flange F12. In order to obtain a feed of pressurized inert gas like argon (Ar), the gas introduction duct 82 is connected to an outlet nozzle 86 of a pressurized gas source 84 which is installed in a unit containing a semiconductor processing system One side of the device. A flange-equipped valve V23 is installed on the outlet nozzle 86 so that it can be detachably connected to the purification device 30 (: corresponding pipe fittings. The flange F15 is a women's clothing at the end of the gas introduction duct 82, so that The flange is detachably connected to the outlet nozzle 86. Fig. 4 includes a schematic diagram showing the design of the duct of a purification device 30E), which is another embodiment of the present invention. The purification device 30D is shown connected to the manifold 12. (Please read the precautions on the back before filling this page) ·-丨 The paper size of the paper is applicable to the Chinese National Standard (CNS) A4 specification (210 x 2 ^ 7 mm) —-A7 521006 __B7___ V. Description of the invention (( Γ) The second gas introduction duct 82 in the purification device 30D of this embodiment is directly connected to the top end, in other words, connected to the recovery compartment 38 of the container 32 instead of the recovery duct 46. The gas introduction duct 82 It is also connected to an outlet nozzle 86 of a pressurized gas source 84, which is installed on one side of the unit equipment. Purification devices 30C and 30D having the structure illustrated in Figs. 3 and 4 are explained by referring to the flow in Fig. 7 The application described in Figures S1 through S7 can also be used to purify the inside of the manifold 12. However, for the device under consideration, the pressurization inside the container 32 (corresponding to the previous program S2) uses a connection gas introduction This is achieved by the feeding system of the duct 82 instead of the feeding system connected to the gas introduction duct 52. In other words, the valves V12 and V23 are cut into their open positions (valve V4 is closed) and the pressurized gas system passes through the pressurized gas source 84 Second gas The introduction duct 82 is introduced into the interior of the recovery compartment 38. This embodiment provides a high degree of freedom for the pressure timing inside the container 32 because the inside of the container 32 can be pressurized by the gas introduction duct 82 without going through the manifold 12. Fig. 5 contains a schematic diagram showing a duct design of a purification device 3 (m) which is also another embodiment of the present invention. The purification device 30E is shown together with the manifold 12. Based on flanges F11 to F15 1 to 4, the devices 30 to 30D shown in Figs. 1 to 4 are constituted as separate devices, which are connected to and detachable from the manifold 12. However, the purification device 30E depicted in Fig. 5 of the embodiment constitutes a permanent It is installed on the manifold 12. In order to refill a new solvent, the feed pump 94 and the solvent tank 96 are applied to the China National Standards (CNs) A4 specification (21 °) through a tensioning standard. χ Public love 1 '(Please read the precautions on the back before filling this page) Climb:-521006 A7 ------- B7 V. Description of the invention ((έ) Solvent refitting catheter with valve -V31 92 is connected to the feed compartment 36. A drainage duct 98 equipped with a valve V32 is also Is connected to the recovery compartment 38 to drain the waste solvent. If necessary, the drainage duct 98 is connected to a ~ appropriate solvent recovery element (not shown). In the case of the purification device 30E with the above structure, the container 32 The solvent can be refilled, and the solvent can be discharged therefrom without being separated from the manifold 12. In addition, through the operation of the feed pump 94, refilling the new solvent and draining the waste solvent can be performed simultaneously. That is, the valve V31 and V32 are switched to their open positions. 'The operation of the feed pump 94 caused the feed compartment 36 to be refilled with new solvent from the solvent tank%. During this operation, due to the upward sliding of the partition wall 34 when the pressure in the feed compartment 36 and the pressure in the recovery compartment 38 are equal, the waste solvent in the recovery compartment 38 is naturally discharged through the drainage duct 98. 6 includes a drawing depicting a container 32 of the purification device 30f, which is another embodiment of the present invention. In the case of the purification devices 30 to 30E shown in Figs. 1 to 5, the inside of the container 32 is partitioned into a feed compartment 36 and a recovery compartment 38 in an airtight manner by a rigid partition wall 34. In contrast, in the case of the purification device 30F of the embodiment of FIG. 6, the inside of the container 32 is partitioned into a feed compartment in an air-tight manner by an elastic anti-corrosive synthetic resin bag. Compartment 38. The inside of the resin bag 100 forms a recovery compartment 38, and at the same time, a feed compartment 36 is formed between the outer surface of the resin vinegar bag 100 and the inner surface of the container 32. The resin bag 100 responds to the feed compartment. The pressure in the compartment 36 and the recovery compartment 38 expands and contracts. In other words, the tree formed by the wall of elastic synthetic resin ----- _19_ t, the paper size is applicable to China _ standard (C ^) A4 specification (21〇χ 297 mm) --- 2 Please read the precautions on the back first (Fill in this page) 0--line · 521006 A7 ------ B7___ V. Description of the invention (1) The ester bag 100 is used as a movable partition wall to separate the feed compartment 36 from a recovery compartment 38. _ The inside of the manifold 12 can be purified using the purification device 30f having the above structure 'again using the procedures S1 to S7 described above with reference to FIG. When the inside of the container 32 is filled with fresh purified fluid (solvent), the resin bag 100 is assumed to be in a contracted state, as shown by the solid line in FIG. 6. When the purification process is in progress, the resin bag 100 swells to an assumed state, which is shown by a dotted line in FIG. 6, and the waste solvent recovers when the amount of the new solvent decreases. In the purification devices 30 to 30E of FIGS. 1 to 5, the partition wall surface 34 is made movable to respond to the pressure in the feed compartment 36 and the recovery compartment 38. Since it is supported by the slide support element 42, the slide support element such as Contains 10-ring and piston ring. However, in the purification device 30F depicted in FIG. 6 ', the partition wall surface made of the elastic resin bag 100 is movable to respond to the pressure in the feed compartment 36 and the recovery compartment 38. The reaction pressure component wall surface can also be constructed based on known principles of diaphragms and bellows. As described above, the purification devices 30 to 30D in Figs. 1 to 4 are constructed as separate devices, and can be transported to a place and connected to the purification target when necessary. On the other hand, the purification device 30E depicted in Fig. 5 is constructed as a coupling member which is permanently mounted on a purification target. The purification device 30F equipped with the resin bag 100 shown in Fig. 6 may itself be regarded as a separate device or an adapter. Various corrections and changes within the technical scope of the present invention can be designed by those familiar with the art, and it should be understood that these corrections -_ 丨 _ 一一 —— 90 _________ τ, paper size applies to China National Standard (CNS) A4 specification (21〇χ 297 public love) (Please read the notes on the back before filling this page) Order _. Line-521006 A7 B7 V. Description of the invention πΡί and changes are also included in the invention In the range. The beneficial effects of the present invention are as described above. The purifying device for purifying an invention having a purifying fluid inside the target compartment requires a smaller duct type and a smaller space, leads to a reduction in cost and provides an improved operability. Sex. (Please read the notes on the back before filling this page) 21 Order! Line · Fortunately, paper size is suitable for Chinese National Standard (CNS) A4 (210 X 297 mm)