TW514735B - Measurement and estimation method of the delay time of circuit in the chip under the consideration of voltage variation - Google Patents

Measurement and estimation method of the delay time of circuit in the chip under the consideration of voltage variation Download PDF

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TW514735B
TW514735B TW89114503A TW89114503A TW514735B TW 514735 B TW514735 B TW 514735B TW 89114503 A TW89114503 A TW 89114503A TW 89114503 A TW89114503 A TW 89114503A TW 514735 B TW514735 B TW 514735B
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Taiwan
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delay time
delay
voltage
change
time
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TW89114503A
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Chinese (zh)
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Bi-Cheng Chen
Wen-Hau Chen
Ming-Chiuan Chen
Shian-De Chen
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Taiwan Semiconductor Mfg
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Abstract

A measurement and estimation method of the delay time of circuit device in the chip under the consideration of voltage variation is disclosed, which comprises the following steps: measuring the delay time of each unit under the first voltage to obtain the corresponding first delay time; measuring the delay time of each unit under the second voltage to obtain the corresponding second delay time; then obtaining the corresponding delay time variation rate of each unit based on the first voltage, the second voltage, the first delay time, and the second delay time; measuring the input voltage variation of each unit, obtaining the corresponding delay time variation based on the delay time variation rate and the input voltage variation of each unit; obtaining a confirmed delay time based on the first delay time and the delay time variation.

Description

14735 曰 案號89114503 年…月 五、發明說明(1) 間 片 結 的 性 中 的 相 遲 如 路 元 件 在 準 入 壓 部 此 同 藉 本發明係有關於一種晶片分析方法’特別是有關於 士用以分析晶片延遲時間之方法。在測試晶片之 日守’根據晶片内部因為阻抗所產生的電壓下降而: 内部各單元的延遲時間,藉以得到符合實際情況:: 果’繼而確認晶片操作之時序延遲。 吴 由於近來晶片料之高密度化,對於晶片執行效能 要未也日益增加。然而,在晶片中之特定單元具 ,而此特性會造成晶片反應速度的延遲。在晶片' 相= 丄在操作時的時序延遲是相當重要的參數,因此,'正; 掌握晶片之反應速度,也就是確認晶片的延遲’ θ 當重要的課題。 间’疋 目前業界習用來確認晶片延遲時間的技術為標準延 粍式法(standard delay f0rmat,SDF ),其方法 y :首先,準備一單元模擬表,用以.描述在此晶/ 5構下各元件之間互連關係;接著,模擬此晶片 :在特定電壓下所產生之時序延遲;最後,計算上述元 ^此既定電壓下各自延遲時間之總和,即可得到此.晶片 輸入上述特定電壓下所產生之時序延遲之模擬值。 而,上述之習知標準延遲格式法所得之結果並不 原因在於上述方法是假設在晶^部各元件的輸 ,皆完全相同的條件下,也就是與待測晶片之輸入電 二:相同的情況下操作。但事實上卻不然,因為晶片内 的電壓會因為在其内部電路路徑存在阻抗而產生變化, 狀=與上述之習知標準延遲格式法所預言史之情況並不相 ,i此會產生與貫際情況不符的測試結果。由此可知,14735, case number 89114503 ... May 5. Description of the invention (1) Delayed components in the nature of the intersegmentation are in the entry pressure part. The present invention relates to a wafer analysis method, and particularly to Method used to analyze wafer delay time. On the day of testing the wafer, the delay time of each internal unit is obtained according to the voltage drop due to the impedance inside the wafer, so as to obtain the actual situation: Result and then confirm the timing delay of the wafer operation. Wu Due to the recent high density of wafer materials, the execution efficiency of wafers has also increased. However, there are specific units in the wafer, and this characteristic causes a delay in the response speed of the wafer. At the wafer 'phase = 的 The timing delay during operation is a very important parameter. Therefore,' positive; grasping the reaction speed of the wafer, that is, confirming the delay of the wafer 'θ is an important issue. The technology currently used in the industry to confirm the chip delay time is the standard delay method (standard delay f0rmat (SDF)). The method is as follows: First, prepare a unit simulation table for description. In this crystal / 5 configuration The interconnection relationship between the components; then, simulate the chip: the timing delay generated at a specific voltage; finally, calculate the sum of the delay times of the above elements ^ this predetermined voltage, you can get this. The analog value of the timing delay generated below. However, the result obtained by the above-mentioned conventional standard delay format method is not due to the fact that the above method is based on the assumption that the components of the crystal element are all the same, that is, the same as the input voltage of the chip under test: the same Operation. But in fact it is not, because the voltage in the chip will change due to the existence of impedance in its internal circuit path. State = is not the same as the situation predicted by the conventional standard delay format method described above. The test results did not match the circumstances. From this we know that

:習知標準延遲格式法所模擬之結果並 早:元件來說’在同樣的情況下, =二:卜’就 ::長的延遲時間1此可以發現,習知標會導致 果擬之晶片延遲時間將較實際情況為短,若此^式决所 ,結果做為測試晶片效能的標準規二:疾之镇 良率大幅增加,然❿,此測試結果是錯誤广:產;的不 進習知的標準延遲格U,以期 1電ς而要改 遲時間之模擬結果。 峄估异電路疋件延 在中華名國專利公告編 路元件延遲時間之方法及其 確估算電路元件之延遲時間 升下降率對於電路元件延遲 中,因為阻抗所造成各元件 元件延遲時間的影響,並沒 技術的問題。 號3 345 1 2中所述之精確估曾 電路裝置,其目的也是為^正 ,然其僅考慮到輸入電壓之上 時間的影響,對於在晶片内部 的輸入電壓變化而造成對電路 有討論,因此並無法改善習知 有鑑於此,本發明的主要目的,在於提供一 θ 遲%間之分析方法,其在目前業界所普遍適用之標準延遲 格式法的架構下,將晶片内部因為阻抗所造成各元件之輸 入電壓下降而導致時序延遲增加的因素考慮進去,使得= 試晶片延遲時間之結果能夠更加準確。 “ 為獲致上述之目的,本發明提出一種考慮電壓變化下 之晶片内電路元件延遲時間的測量與估算方法,適用於測 里具有複數早元之晶片的確認延遲時間,包括下列步驟' 量測上述單元各自在一第一電壓下所延遲之時間,而得到 對應之第一延遲時間;量測上述單元各自在一第二電壓: The result simulated by the conventional standard delay format method is not too early: for the component, 'in the same situation, = 2: b' ::: long delay time 1 It can be found that the conventional standard will lead to the expected chip delay time. It will be shorter than the actual situation. If this formula is used, the result will be used as the standard rule for testing the chip performance: The yield of the disease town has increased sharply. However, the test result is wrong and widespread: production; The standard delay grid U is expected to change the simulation result of 1 time. The method of estimating the delay time of circuit components in the Chinese famous country patent announcement and the method of estimating the delay time of the circuit component delay time rise and fall rate for the delay of the circuit component, due to the impact of the delay time of each component due to the impedance, There is no technical problem. No. 3 345 1 2 accurately estimates the circuit device, its purpose is also positive, but it only considers the effect of time above the input voltage, and the circuit is discussed about the input voltage changes in the chip, Therefore, the conventional method cannot be improved. In view of this, the main purpose of the present invention is to provide an analysis method of θ delay%. Under the framework of the standard delay format method generally applicable in the industry at present, the inside of the chip is caused by impedance. Factors such as the timing delay increase caused by the input voltage drop of each component are taken into account, so that the result of the delay time of the test chip can be more accurate. "In order to achieve the above-mentioned object, the present invention proposes a method for measuring and estimating the delay time of circuit elements in a wafer under a change in voltage, which is suitable for measuring the confirmation delay time of a wafer with a plurality of early elements, including the following steps. The delay time of each unit at a first voltage to obtain the corresponding first delay time; measure each of the units at a second voltage

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514735 :❹1· 4” 29514735: ❹1 · 4 ”29

號 891URf^ 五、發明說明(3) 所延遲之時間,而得到對應之第二 一電壓、第二電壓、第一延遲時間、坌間,根據上述第 到上述單元對應之延遲時間變化旦、、1 一延遲時間而得 單元之輸入電壓變化;根據上述延遲二^ ^述晶片内部各 元之輸入電壓變化而得到對應之 B =化率及上述單 述第-延遲時間與上述延遲時間夺=量被依據上 時間。 又化里以传到一確認延遲 圖式之簡單說明: 為使本發明之上述目的、牲 下文特舉-較佳實施例,並配合能更明顯易懂, 下: σ所附圖式,作詳細說明如 圖示說明: 弟1圖係顯不根據本發明 第2圖係顯示根據本發明 圖。 符號說明: 貫施例之流程圖。 實施例於預備動作之流程 S1至S 5〜操作流程步驟; S1 1至S1 5〜操作流程步驟。 貫施例: 參閱第1圖,第1圖係& ‘ 1 ^ 。首先必須準備有關本發明二根據本發明實施例之流程圖 (S1 )。參閱第2圖,第2圖:施例#作流程之預備動作 元模擬表(Spice Net 1 i st )中,首先準備測試晶片之單No. 891URf ^ V. Description of the invention (3) The corresponding delay time is obtained, and the corresponding second voltage, second voltage, first delay time, and time interval are obtained, and the delay time corresponding to the first to the above units is changed. 1 The input voltage change of the unit is obtained by a delay time; according to the above-mentioned delay, the corresponding input voltage of each element in the chip is changed to B = conversion rate and the above-mentioned single-delay time and the above-mentioned delay time. Based on time. In order to make the above-mentioned purpose of the present invention, a specific example is given below-a preferred embodiment, and it can be more clearly understood in conjunction with the following: σ The detailed description is as illustrated: Figure 1 shows a diagram according to the present invention, and Figure 2 shows a diagram according to the present invention. Explanation of symbols: Flow chart of the implementation example. The embodiment includes the steps S1 to S5 to the operation flow steps of the preparatory action; S1 to S1 5 to the operation flow steps. Implementation Example: Please refer to FIG. 1, which is & ‘1 ^. First, a flowchart (S1) concerning the second embodiment of the present invention must be prepared. Refer to Fig. 2 and Fig. 2: Example #Preparatory actions for the process In the meta simulation table (Spice Net 1 i st), first prepare the test chip list.

0503-5480TWF2 ; TSMC2000-0176 ; Robert.ptc 備動作之流程圖。在預備動作顯不根據本發明實施例於預 描述一晶片之架構。接著,^ ( S H )。單元模擬表係用來 ----又義單元之輸入/輸出路徑0503-5480TWF2; TSMC2000-0176; Robert.ptc flow chart of standby operation. In preparation, the architecture of a chip is described in advance according to an embodiment of the present invention. Then, ^ (SH). The unit simulation table is used to ---- mean the input / output path of the unit

514735 _#號 89114Sn^、 ; 五、發明說明(4^ --^ (S 1 2 )。在根據本發明徐> 元之輸入及輸出的路經,例中,必須先定義出一單 驟中將會用到。接著,$此資料在稍後有關電路分析之步 Simulation deck) (Sl^t冓單元模擬平台(sPice 主要係根據該待測電路元 ’在此步驟中,單元模擬平台 載而架構之二維陣列。接^之輪入訊號轉換時間及輸出負 電壓(S14 )。此方法係+著’分析晶片内部各單元之輸入 之電路結構,藉此可計’算猎由電路分析工具分析晶片内部 電壓與輸入電壓之差異了 f晶片内部各單元之節點上的 輸入電壓變化下,以輸入j著’取得晶片在忽略各單元之 (S15),此步驟係藉别由—特定電壓所得之延遲時間 測晶片之延遲時間而得,口之、標準延遲格式法模擬該待 晶片延遲時間。 此定義該模擬出之時間為第一 以上所介紹有關準備 熟知此技藝人士所習知之 (1 )之步驟,為一般業界 驟以精簡說明。 ’因此僅大略描述上述各步 在完成準備動作(^〗彳% η士 M r Q 9、 ^ >後’模擬晶片内部單元之π、伊 時間(S2 ),在此記錄一元杜甘灿# 1平兀之延遲 /5處Hi Ρ弓,_ 9 件其對應不同輸入電壓所兩+ 反應,間,也就疋所謂的延遲時間。一般,=而之 受較高之輸入電壓時,合右# 疋件在给 Τ θ百較短的延遲時問· 5 — 較低之輸入電壓時,會有較# , 之,接受 會根據不同電壓以及不同雷冷々〆 少驟中, A汉个叫寬流路徑以 之延遲時間。 j早疋所對應 抑-接下來,根據先前所模擬之單元延遲時間以 單元對應於電>1變化之延遲時間變化率DR (S3 )。异出各514735 _ # 号 89114Sn ^,; V. Description of the invention (4 ^-^ (S 1 2). In the path of the input and output of Xu > Yuan according to the present invention, in the example, a single step must be defined first It will be used in the next step. This information will be used later in the circuit analysis step Simulation deck (Sl ^ t 冓 unit simulation platform (sPice is mainly based on the circuit unit under test). In this step, the unit simulation platform contains The two-dimensional array of the structure. The turn-on signal conversion time and output negative voltage (S14). This method is based on the analysis of the circuit structure of the input of each unit in the chip, which can be calculated by the circuit analysis. The tool analyzes the difference between the internal voltage of the chip and the input voltage. Under the input voltage changes at the nodes of each unit in the chip, the input j is used to obtain the chip and the unit is ignored (S15). This step is based on-specific voltage The obtained delay time is obtained by measuring the delay time of the wafer, and the standard delay format method is used to simulate the delay time of the wafer. This definition of the simulated time is the first one described above about preparing the person familiar with this technology. 1) The steps are simplified descriptions for the general industry. 'Therefore, only the above steps are described briefly after completing the preparatory actions (^〗 彳 % η 士 M r Q 9, ^ > Time (S2), here record one yuan Du Gancan # 1 Ping Wu of the delay / 5 Hi Hi bow, _ 9 pieces corresponding to different input voltages + +, between, also called the so-called delay time. Generally, = and When receiving a higher input voltage, the combination of ## is required to give a short delay of θ θ. 5 — When the input voltage is lower, there will be a #, and the acceptance will be based on different voltages and different lightning. In the cold rush, A is called the delay time of the wide-flow path. J Early 疋 corresponds to the next-Next, according to the previously simulated unit delay time, the delay time change rate of the unit corresponding to the electric > 1 change. DR (S3). Different from each other

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i號89114通 五、發明說明(5) ^延遲時間變化率DR= AT/ AV。其中為延遲時 交化里,AV為輸入電壓之變化量。其計算之方式如 根據步驟S2所模擬之延遲時間結果,假設將一第一 · ㈣輸人-特定單元時,其延遲時間為[,而將_第^入電 特定單元時,其延遲時間為?2,其中'‘;二 ^係大於第二輸入電壓V2,如上所述,元 文較尚之輸入電壓時,會有較短的延遲時間;反之, 較低之'入電壓時,會有較長的延遲時間,因此可 : 遲時間τ2係大於延遲時間^。而τ2_Τι = ΔΤ △Τ除以AV即可得知延遲時間變化率Dr。 、 斤接下來,取得各單元延遲時間之變化量(以)。其 算的方法係將步驟S14中所計算之各單元節點上的電壓愈8 輸入電壓之間的電壓變化量與延遲時間變化率DR相乘,〃 可得知各單元之延遲時間變化量。現以内部具有1^個單元 之晶片為例,各單元之電壓與輸入電壓之間的電壓變化旦 各自為 里 士日日△%、△'、...... 、△、」、△、等,而各自之延遲 ” 1化率為DRl、DR2、.......DRh、DRn因此各自之延 遲柃間變/匕量、△Tf △&*])&、...... 、△i. No. 89114. V. Description of the invention (5) ^ Delay time change rate DR = AT / AV. Among them, in the crossover at the time of delay, AV is the change amount of the input voltage. The calculation method is based on the delay time result simulated in step S2. Assume that when a first · ㈣ is input to a specific unit, the delay time is [, and when the _th is entered into a specific unit, the delay time is? 2. Among them, "2" is greater than the second input voltage V2. As mentioned above, Yuanwen will have a shorter delay time when it has a higher input voltage; otherwise, it will have a longer delay when the input voltage is lower. The delay time can therefore be: The delay time τ2 is greater than the delay time ^. And τ2_Τι = ΔΤ ΔΤ divided by AV can know the delay time change rate Dr. Next, obtain the change amount (in) of the delay time of each unit. The calculation method is to multiply the voltage change amount between the input voltage of each unit node calculated in step S14 and the delay time change rate DR by multiplying the delay time change rate DR to obtain the delay time change amount of each unit. Now taking a wafer with 1 ^ cells as an example, the voltage change between the voltage of each unit and the input voltage is respectively Richter Day △%, △ ', ..., △, ", △ , And so on, and the respective delays are calculated as DR1, DR2,... DRh, DRn. Therefore, the respective delays vary between 匕 / 量, △ Tf △ & *]) &, .. .... △

Li AVny DI^、ΛΤη - 。而總延遲時間變化量△ ΤΓΓί"ί+ΔΤ2 +......+ ΑΤη-丨+ △!;,藉此可以計算出此晶 片因為其内部阻抗所造成之電壓變化而導致其延遲時間 變化量。 接著,根據步驟S15所提供之待測晶片在不考慮其内 f降效應、之模擬延遲日_^_^及步驟S4中所得之總延遲 514735 _案號89114503_年月曰 修正_ 五、發明說明(6) 時間變化量ΛΤΤ(^ι,取其兩者之和,即可取得晶片之確認 延遲時間(S5 )。 本發明提供一種晶片延遲時間之分析方法,解決了晶 片内部各元件之阻抗所造成其内部單元各自之輸入電壓與 該晶片之輸入電壓不同的情形所導致習知標準延遲格式法 的錯誤,使得測試晶片延遲時間之結果能夠更加準確。 本發明雖以較佳實施例揭露如上,然其並非用以限定 本發明的範圍,任何熟習此項技藝者,在不脫離本發明之 精神和範圍内,當可做些許的更動與潤飾,因此本發明之Li AVny DI ^, ΔΤη-. And the total delay time change △ ΤΓΓί " ί + ΔΤ2 + ...... + ΑΤη- 丨 + △ !; This can calculate the delay time of the chip due to the voltage change caused by its internal impedance the amount. Next, according to the chip under test provided in step S15 without considering the f-drop effect, the simulated delay date _ ^ _ ^ and the total delay obtained in step S4 514735 _ case number 89114503 _ year month month amendment _ V. Invention Explanation (6) The amount of time change ΛΤΤ (^ ι, which is the sum of the two can be used to obtain the confirmation delay time (S5) of the wafer. The invention provides a method for analyzing the delay time of the wafer, which solves the impedance of each component inside the wafer As a result of the fact that the input voltages of the internal units are different from the input voltage of the chip, the error of the conventional standard delay format method makes the result of testing the delay time of the chip more accurate. Although the present invention is disclosed as above with a preferred embodiment However, it is not intended to limit the scope of the present invention. Any person skilled in the art can make some changes and decorations without departing from the spirit and scope of the present invention.

0503-5480TWF2 ; TSMC2000-0176 ; Robert.ptc 第9頁0503-5480TWF2; TSMC2000-0176; Robert.ptc Page 9

Claims (1)

514735 i號891〗45似 六、申請專利範圍 1 · 一種考慮電壓 測量與估算方法,包 量測上述單元各 得到對應之延遲時間 取得上述單元對 量測上述單元之 根據上述單元之 得到對應之延遲時間 依據上述單元延 認延遲時間。 2 ·如申請專利範 之晶片内電路元件延 之延遲時間係利用標 3 ·如申請專利範 之晶片内電路元件延 延遲時間變化率係代 間變化量。 4·如申請專利範 之晶片内電路元件延 單元之延遲時間變化 及輸入電壓變化量之 5 ·如申請專利範 之晶片内電路元件延 確認延遲時間係根據 間變化量之總和而得 年月 變化下之晶片内 _ 括下列步驟: 路疋件延遲時間的 自在一特定電厭 ^ ; 笔曼下所延遲之時間,而 應之延遲時間變化率. 輸入電壓變化量·午, 延遲時間變化^及 變化量;及 輸入電壓變化量而 遲時間與延礎時間變化曰 文化1以得到一確 圍第1項所述之— 遲時間的测量#種考慮電壓變化下 準延遲格式法& =异方法,其中上述 圍第1項所述<所取得° 遲時間的測量與種Μ考慮電壓變化下 表單位電壓中,。σ二方法’其中上述 早兀所對應之延遲時 圍第1項所述之一籀 遲砗Η沾、目丨曰 檀考慮電壓變化下 遲日守間的測頁與估算 甘士 L、、 量係根據上述單元 / ^八中上述 乘積而得。 之延遲時間變化率 圍第1項所述之一種考慮電壓變化下 遲時間的測量與估算方法,其中上述 上述各單元延遲時間及對應之延遲時 〇514735 i No. 891 〖45 like six, patent application scope 1 · A method that considers voltage measurement and estimation, including measuring the corresponding delay time of each of the above units, obtaining the above unit pair, measuring the above unit, and obtaining the corresponding delay according to the above unit The time is extended according to the above unit. 2 • The delay time of the circuit element delay in the patent application is based on the standard. 3 • The delay time change rate of the circuit element delay in the patent application is the change between generations. 4 · If the delay time of the circuit element delay unit in the patent application is changed and the input voltage is changed.5 · If the delay time of the circuit component in the patent application is confirmed, the delay time is based on the sum of the changes. In the chip, the following steps are included: the delay time of the circuit board is from a specific electrical stress ^; the delay time under the penman, and the corresponding rate of change of the delay time. The amount of change in the input voltage, noon, the change of the delay time, and the amount of change ; And the amount of change in input voltage and the delay time and the extension of the base time, said Culture 1 to get a certain range as described in the first item — the measurement of the delay time # kinds of quasi-delay format method considering the voltage change & = different methods, where The measurement of the obtained late time as described in the above item 1 < considers the voltage variation in the unit voltage table below considering the voltage change. σ two methods, where one of the delay time corresponding to the above-mentioned early time frame is described in item 1 (1), (2), (1), (2) Considering the page measurement and estimation of Gan Shi L, and the amount of time between late-day guards under the consideration of voltage changes. It is based on the above product in the above unit / ^ eight. The delay time change rate is a method for measuring and estimating the delay time in consideration of the voltage change described in item 1, wherein the delay time of each of the above units and the corresponding delay time. 0503-5480TWF2 ; TSMC20〇〇.〇i76 ; Robert.ptc 第10頁 -^^89114503 六、申請專利範圍 6 · —種考慮電壓 測量與估算方法,包 量測上述單元各 得到對應之第一延遲 量測上述單元各 得到對應之第二延遲 根據上述第一電 二延遲時間而得到上 量測上述單元之 根據上述延遲時 應之延遲時間變化量 依據上述第一延 一確認延遲時間。 中請專利範 電路元件延 第一延遲時間及第二 得。 8·如申請 之晶片内電路 延遲時間變化 差’除以上述 9·如申請 之晶片内電路 單元之延遲時 及輸入電壓變 7 ·如 之晶片内 專利範 元件延 率係將 第一電 專利範 元件延 間變化 化量之 曰 ,而 ,而 修正 變化下之晶片内電路元件延遲時間的 括下列步驟: 自在一第一電壓下所延遲之時| 時間; 自在一第二電壓下所延遲之時間 時間; 壓、第二電壓、第一延遲時間、及第 述單元對應之延遲時間變化率; 輸入電壓變化量; 間變化率及輸入電壓變化量而得到 :及 遲時間與上述延遲時間變化量以得到 圍第6項所述之一種考慮電壓變化下 遲時間的測量與估算方法,其中上述 延遲時間係利用標準延遲格式法所取 圍第6項所述之_種考慮電壓變化下 遲時間的測量與估算方法,其中上述 ^述第一延遲時間及第二延遲時間之 壓及第二電壓之差而得。 圍第6項所述之一種考慮電壓變化 遲日守間的測量盘杜瞀古沐 旦 』里”估异方法,其中上述 :係根據上述單元之延遲時間變化率 乘積而得。 _0503-5480TWF2; TSMC20〇〇〇〇i76; Robert.ptc Page 10-^^ 89114503 6. Application for patent scope 6 · A method that considers the voltage measurement and estimation method, including measuring each of the above units to obtain the corresponding first delay amount Measure each of the units to obtain a corresponding second delay. According to the first electric two delay time, obtain the measured delay time change of the unit according to the delay according to the first delay. The patented patent claims that the circuit elements have a first delay time and a second delay. 8 · If the difference in delay time of the on-chip circuit applied is divided by the above 9 · If the delay time and input voltage of the on-chip circuit unit are changed as 7 · The on-chip patented component delay rate is the first electrical patented model The amount of change in the delay of a component is described, and the delay time of a circuit component in a chip under a modified change includes the following steps: time delayed from a first voltage | time; time delayed from a second voltage Time; the voltage, the second voltage, the first delay time, and the delay time change rate corresponding to the first unit; the input voltage change amount; the time change rate and the input voltage change amount are obtained: the delay time and the above delay time change amount are A measurement and estimation method of delay time under voltage variation described in item 6 is obtained, wherein the above delay time is a measurement of delay time under voltage variation described in item 6 taken by standard delay format method. And the estimation method, wherein the difference between the voltage of the first delay time and the second delay time and the difference between the second voltage are obtained. The measurement method described in item 6 taking into account the voltage change and the delay time is a different method for estimating the distance, where the above is based on the product of the delay time change rate of the above unit. _ 0503-5480TW2 ; TSMC2〇〇〇-〇m ; R〇bert 第11頁 514735 _ U _案號89114503_年’厂 曰 修正___ 六、申請專利範圍 1 0 ·如申請專利範圍第6項所述之一種考慮電壓變化下 之晶片内電路元件延遲時間的測量與估算方法,其中上述 確認延遲時間係根據上述各單元第一延遲時間及對應之延 遲時間變化量之總和而得。0503-5480TW2; TSMC2 0OO〇-〇m; R〇bert page 11 514735 _ U _ case number 89114503 _ year 'factory amendment ___ VI. Patent application scope 1 0 · as described in the patent application scope item 6 A method for measuring and estimating the delay time of a circuit element in a wafer considering a voltage change, wherein the above-mentioned confirmation delay time is obtained according to the sum of the first delay time of each unit and the corresponding delay time variation. 0503-5480TWF2 ; TSMC2000-0176 ; Robert.ptc 第12頁0503-5480TWF2; TSMC2000-0176; Robert.ptc Page 12
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI420335B (en) * 2010-03-03 2013-12-21 Himax Tech Ltd Signal analyzing method for electronic device having on-chip network and off-chip network

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI420335B (en) * 2010-03-03 2013-12-21 Himax Tech Ltd Signal analyzing method for electronic device having on-chip network and off-chip network

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