TW508668B - Method and device for inspecting defect of gray tone mask and those for inspecting defect of photomask - Google Patents
Method and device for inspecting defect of gray tone mask and those for inspecting defect of photomask Download PDFInfo
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- TW508668B TW508668B TW090124053A TW90124053A TW508668B TW 508668 B TW508668 B TW 508668B TW 090124053 A TW090124053 A TW 090124053A TW 90124053 A TW90124053 A TW 90124053A TW 508668 B TW508668 B TW 508668B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136231—Active matrix addressed cells for reducing the number of lithographic steps
- G02F1/136236—Active matrix addressed cells for reducing the number of lithographic steps using a grey or half tone lithographic process
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- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Abstract
Description
508668 五、發明說明(1) [發明所屬之技術領域] 本發明係有關包含灰階罩幕或微細圖案之光罩缺陷檢查 方法及缺陷檢查裝置者。 — [習知之技術] 近年來,在大型LCD罩幕之領域,有人試圖利用灰階罩 幕以減少罩幕張數(月刊FPD Intel ligence,1 9 9 9年5月)。 在此,灰階罩幕,如圖6 (1)所示,係於透明基板上,具 有遮光部(1),透射部(2)和灰階部(3)。灰階部(3),例/、 如,係屬於使用灰階罩幕之大型LCD用曝光機形成解像界 限以下之遮光圖案(3a)之領域,其形成之目的在減少該領 域之光線透射量,並減少該領域之照射量而選擇性地變 光阻之膜厚者。(3b)係灰階部(3)之曝光機解像界限以下 之微細透射部。遮光部(1)和遮光圖案(3a)通常均係由絡 或鉻化合物等同一材質、同一厚度之膜所形成。透射部σ (2)和微細透射部(3b),均屬於透明基板未形成遮暖 之透明基板之部分。 元Μ寺 使用灰階罩幕之大型LCD用曝光機之解像界限,在+、 機方式之曝光機約為3 // m,鏡面投影方式之曝光機約V $ // m。因此,例如,假設圖6 (1 )中灰階部(3 )之透射:… 空間寬度為未滿3 // m,曝光機之解像界限以下夕、^ F U b) (3 a )之線寬度為未滿3 // m。則使用上述大型l c D田 " 曝光時,通過灰階部(3 )之曝光光線總體上會曝光、% 因此介由該灰階部(3)曝光之陽片型光阻膜厚只是m 留在基板上。也即,由於光阻係依曝光量之差而又'專而 J使其與普508668 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a defect inspection method and a defect inspection device for a mask including a gray scale mask or a fine pattern. — [Knowledgeable Technology] In recent years, in the field of large LCD screens, some people have tried to reduce the number of screens by using gray-scale screens (monthly FPD Intel ligence, May 1999). Here, the gray scale cover is attached to a transparent substrate, as shown in FIG. 6 (1), and includes a light shielding portion (1), a transmission portion (2), and a gray scale portion (3). The gray scale section (3), for example, belongs to the field of forming a light-shielding pattern (3a) below the resolution limit for a large LCD exposure machine using a gray scale mask. The purpose of its formation is to reduce light transmission in this area. And reduce the amount of irradiation in the field to selectively change the thickness of the photoresist. (3b) is a fine transmission section below the resolution limit of the exposure device of the gray scale section (3). The light-shielding portion (1) and the light-shielding pattern (3a) are usually formed of a film made of the same material and the same thickness as a chromium compound or a chromium compound. The transmissive portion σ (2) and the minute transmissive portion (3b) belong to a portion of the transparent substrate where the transparent substrate is not covered with heat. Yuan M Temple The resolution limit of a large LCD exposure machine using a gray scale mask is about 3 // m in the + and + modes and about V $ // m in the mirror projection mode. Therefore, for example, suppose the transmission of the gray-scale part (3) in Fig. 6 (1): ... the space width is less than 3 // m, the line below the resolution limit of the exposure machine, ^ FU b) (3 a) The width is less than 3 // m. When using the large-scale LCD field mentioned above, the exposure light passing through the gray-scale portion (3) will be exposed as a whole, so the thickness of the positive-type photoresist film exposed through the gray-scale portion (3) is only m. On the substrate. That is, because the photoresist is based on the difference in exposure,
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508668 五、發明說明(2) 2遮光部(1)對應之部分和與灰階部(3)對應之部分, 對於顯像液之溶解度有差別,故顯像後之光阻彤:相 6(2)所示,通常對應於遮光部(1)之部分 / °圖 ,對應於灰階部(3)之部分(3,),例如為約約為 m,對應於透射部(2)之部分(2,)為無光阻之部'分(2,· / 後在無光阻之部分(2 ’)進行被加工基板 然 應於灰階部⑻部分(3,)之光阻對 ::罩分進行㈣刻,藉此以1張單幕二 傳統罩幕2張份之步驟,而減少罩幕張數。 田於 <1 ==由? Ϊ部和透射部組成之習知罩幕檢查方法 r】)產方生缺陷(12)(黑點)之狀態,箭 &置一方之鏡頭(以下簡稱上鏡頭)之掃描情況。仏查 圖9 (2)顯示沿著上述鏡頭之掃描 (13W射量信號(13)係由,例如配置於號 CCD線形感測器,來檢測。透射量信號(⑻之水準内之 光部⑴為B,透射部(2)為[分別設定遮光部(1Uf 率為0%,透射部(2)之透射率為1〇〇%。透射量信號(ι射 基^上係由圖案之邊緣(遮光部與透射部之邊界)〜所產’ =邊緣線信號(圖案形狀信號)所組成,若之 在遮光部⑴發生之白缺陷信號⑴’),及在Ϊ ^ (2)發生之黑缺陷信號(12,)。 在透射部 圖9⑺顯示和圖9⑴相同之圖案而未發生缺陷 一方之鏡頭(以下簡稱下鏡頭)所得到之透射量信號(l3 f508668 V. Description of the invention (2) 2 The part corresponding to the light-shielding part (1) and the part corresponding to the gray-scale part (3) differ in the solubility of the developing solution, so the photoresistance after development: phase 6 ( As shown in 2), the part corresponding to the light-shielding part (1) / °, and the part (3,) corresponding to the gray-scale part (3), for example, is about m and corresponds to the part of the transmitting part (2). (2,) is the part without photoresistance (2, · / / The photoresistance of the processed substrate in the part (2 ') without photoresistance, but the photoresistance pair in the grayscale part (3,) :: The mask is engraved to reduce the number of masks by one single screen and two traditional masks. Tian Yu < 1 == Conventional mask inspection consisting of? Method r]) The state of the defect (12) (black dot) produced by the producer, and the scan of the lens (hereinafter referred to as the upper lens) of the arrow & (Fig. 9 (2) shows the scanning along the above lens (13W emissivity signal (13) is detected by, for example, a CCD line sensor. Transmittance signal (light section within the level of ⑻) Is B, the transmission part (2) is [set the light-shielding part (1Uf rate is 0%, the transmission rate of the transmission part (2) is 100%. The transmission amount signal (ι 射) is defined by the edge of the pattern ( The boundary between the light-shielding part and the transmission part) ~ produced by '= edge line signal (pattern shape signal), if it is a white defect signal ⑴' occurring in the light-shielding part)), and a black defect occurring in Ϊ ^ (2) Signal (12,). The transmission signal (l3 f
C:\2D-CODE\90-12\90124053.ptd 508668 五、發明說明(3) 圖9 ( 4 )為各鏡頭所得到之读身| Ε(14) 〇 (13)減去圖9(3)之透射量信號(1γ ()之透射量信唬 差分信號U4)中,係、由各鏡頭)而旦^付之差分信號。 線信號’僅抽出缺陷信號⑴,)和(二,里)二5虎除去圖案邊緣 ^ 9(5)係在僅抽出缺陷信號之差分 出遮光部(1 )及透射部(2 )所需要夕#田 1:古々#要臨界值,而顯示分別在 品界值(15a)檢測到白缺陷,在負方臨界值(〗5b)檢 測到黑缺陷之狀態。臨界值若嗖宏 诗加、/々w Γ 值右叹疋侍低,可提升檢測敏感 度,但必須設定在不拾取疑似缺陷之水準。 若欲鑑定哪一方之鏡頭發生哪一種缺陷,例如,在上鏡 頭之電路與下鏡頭之信號作比較,(從上鏡頭信號減去下 鏡頭信號),上鏡頭之遮光部(1)發生白缺陷時在正方出現 缺陷信號,上鏡頭之透射部(2)發生黑缺陷時在負方出現 缺陷信號’藉此檢測上鏡頭之白缺陷及黑缺陷(上述圖 9 ( 2 )〜(5 ))。同樣地,例如,在下鏡頭之電路上盥上鏡頭 之信號作比較(從下鏡頭之信號減去上鏡頭之信號),不鏡 頭之遮光部(1 )發生白缺陷時在正方出現缺陷信號,下鏡 頭之透射部(2 )發生黑缺陷時在負方出現缺陷信號,藉此 檢測下鏡頭之白缺陷及黑缺陷。 ° ~ 9 [本發明欲解決之課題] 上述習知之比較檢查裝置,由於其係用以檢查 部及透射部所組成習知罩幕之裝置,故不適於檢1具有灰C: \ 2D-CODE \ 90-12 \ 90124053.ptd 508668 V. Description of the invention (3) Figure 9 (4) is the reading body obtained by each lens | Ε (14) 〇 (13) minus Figure 9 (3 The transmission signal (1γ ()) is the differential signal transmitted by each lens). The line signal 'extracts only the defect signal ⑴,' and (二, 里), 2 and 5 tigers remove the pattern edge ^ 9 (5) is required for the difference between the light-shielding part (1) and the transmissive part (2) where only the defect signal is extracted # 田 1 : 古 々 # requires a critical value, and shows that the state of white defects is detected at the threshold value (15a), and the state of black defects is detected at the negative threshold value (〖5b). If the critical value is 嗖 Hong, Shijia, and / 々w Γ, the value of the right sigh is low, which can improve the detection sensitivity, but it must be set at a level that does not pick up suspected defects. If you want to identify which kind of defect occurs in which lens, for example, the circuit of the upper lens is compared with the signal of the lower lens, (the signal of the lower lens is subtracted from the signal of the upper lens), and the light-shielding part (1) of the upper lens has a white defect. When a defect signal appears on the positive side, and a black defect occurs on the transmission part (2) of the upper lens, a defect signal appears on the negative side, thereby detecting the white and black defects of the upper lens (Figure 9 (2) to (5) above). Similarly, for example, on the circuit of the lower lens, the signal of the upper lens is compared (the signal of the upper lens is subtracted from the signal of the lower lens). When a white defect occurs in the light-shielding part (1) of the lens, a defect signal appears in the square. When a black defect occurs in the transmission part (2) of the lens, a defect signal appears on the negative side, thereby detecting the white and black defects of the lens. ° ~ 9 [Problems to be solved by the present invention] The above-mentioned conventional comparative inspection device is not suitable for inspection because it is a device used for a conventional mask composed of an inspection section and a transmission section.
C:\2D-CODE\90-12\90124053.ptd 、發明說明(4) 階部之灰階罩幕。 詳細說起來,習知 面,有如下之問題。 置’在檢查灰階罩幕方 即’灰階部之缺陷信 使用習知之比較檢杳壯罢 =本身谜小而臧弱,若 部檢查所用之臨界;衣:=:臨界值低於普通遮光 所形成之領域時:J2光機解像界限以下之微細圖案 ,灰階部特有之*門=相應於邊微細圖案,如圖5所示 中,係以各鏡準(雜訊帶)(16)。比較檢查 號,只抽出缺陷作?卢去^ ^相減(差分)而求得差分信 發生,若干圖案之若灰階部中之微細遮光圖案之間 倍),本來不库成為缺守,其基本信號水準將被放大(最大2 陷)以致無法也編 問題。 界值’造成無法進行高敏感度檢查之 而 Η , 由方^羽4 者,*易保證罩係用以檢查白缺陷或黑缺陷 如在整個罩幕領2幕!敢重要之因素-透射率。即’例 設計尺寸\2 ,若灰階部之遮光圖案之線寬相對於 值時,或Ϊ過才^赤寬七大^或過高(線寬小)而超過透射率容許 於比較产;Jr成Λ階部半透射臈之透射率容許值時,由 俨#,2糸由各鏡頭所得透射量信號相減而求出差分 1 口派》,故不合屮!目$ p ^ (pa θ 見差別,以致產生不能檢測此類透射率缺 韻。、此事在灰階部沒有形狀缺陷時,尤其成為問 通而且,就灰階部而言,只要它的透射率在容許範圍C: \ 2D-CODE \ 90-12 \ 90124053.ptd, Invention Description (4) The gray scale cover of the step. In detail, there are the following problems. Set 'inspecting the gray-scale mask', ie 'the gray-scale department's defect letter. The comparison of the use of the conventional inspection is strong and strong = the mystery is small and weak, the critical point used by the Ministry of Inspection; clothing: =: critical value is lower than ordinary shading When the field is formed: a fine pattern below the J2 optical-mechanical resolution limit, unique to the grayscale part * gate = corresponding to the fine pattern of the side, as shown in Figure 5, with each mirror (noise band) (16 ). Compare the inspection numbers and extract only the defects? Lu Qu ^ ^ Subtraction (difference) to find the difference signal occurs, if the number of patterns in the gray scale part is between multiple times of the fine shading pattern), the original signal will be absent, and its basic signal level will be amplified (maximum 2 Trouble) so that it is impossible to edit the problem. Boundary value ’makes it impossible to perform a high-sensitivity inspection. However, it is up to 4 people to easily guarantee that the mask is used to check white or black defects. Dare to be important factor-transmittance. That is, 'example design size \ 2, if the line width of the light-shielding pattern in the gray scale part is relative to the value, it may be too long to be ^ red wide and seven large ^ or too high (the line width is small) and the transmittance exceeding the allowance is allowed for comparative production; When Jr is the allowable value of the transmissivity of the semi-transmission 臈 in the Λ step, the difference between the transmission signals obtained from the lenses is subtracted from 俨 #, 2 糸, and the difference is obtained. The head $ p ^ (pa θ sees a difference, which makes it impossible to detect such a transmission lack of rhyme. This is especially a problem when there is no shape defect in the gray scale part, and as far as the gray scale part is concerned, as long as its transmission The rate is within the allowable range
508668 五 -發明說明(5) --- 内,就不必檢測為缺陷,但習知之比較檢查卻總是把它者 作缺陷來檢測,所以習知之檢查所檢測到的,其透射: 有在容許範圍内的。結果,本來不必檢測的也被當 檢測,產生檢查準確性(能力)的問題。 作缺^ 又’同樣的問題,也發生在例如頻道形成用光罩 ^有,細圖案之光罩±。例如,在m頻道中,隨著加 =之j細化,圖案也有急劇微細化之趨勢。針對此類圖、 :下知之方法進行檢查,將因檢查機台之振:或 =頭衫像之玦差而發生疑似缺陷、或其他微細圖 :之疑似缺陷’若將敏感度降低到不檢測疑似缺: 本==有無法取得保證缺陷檢測水準之敏感度之問題。 考X月之目的在解決上述之問、 法及缺陷檢杳梦罢 ^ . 仏徑缺卩曰檢查方 感度之缺陷檢查,而不致檢 :敏 許範圍之形狀缺陷者。 研次具透射率在容 [解決課題之手段] 本.發明具有下列結構: (結構1) 一種具有灰階部 徵:於:調整遮光部、透射部;量方:,其特 Γ該領域之光㈣射量,㈣擇性地m目之^咸 使用掃描罩幕内圖案所得之透射率信 針對該透射率信號,設定灰階;二’, 若超過該臨界值時,即二,透射率缺陷臨界值’ 仏疋其為在灰階部發生透射率缺陷508668 Five-invention description (5) ---, it is not necessary to detect as a defect, but the conventional comparative inspection always detects the other as a defect, so the transmission of the conventional inspection: Within range. As a result, what was originally unnecessary to be tested is also considered as a test, which causes a problem of the accuracy (ability) of checking. The same problem also occurs in, for example, a mask for channel formation, and a mask with a fine pattern. For example, in the m channel, as the j of the plus is refined, the pattern also tends to be sharply refined. For such maps, the following methods will be used for inspection, which will cause suspected defects due to the vibration of the inspection machine: or = the difference in the shirt image, or other micro-maps: suspected defects' If the sensitivity is reduced to not detected Suspected deficiency: This == There is a problem that the sensitivity of the level of defect detection cannot be obtained. The purpose of the X-month test is to solve the above-mentioned problems, methods, and defect inspections. ^. The lack of path inspection means the inspection of the sensitivity of the inspection party, but not inspection: those who have defects in the sensitive range. This research has the following transmittance [means to solve the problem] The invention has the following structure: (Structure 1) A kind of gray-scale features: Yu: adjust the light-shielding part, the transmission part; The amount of light emitted is selectively transmitted through the pattern of the pattern in the mask. The gray scale is set for the transmittance signal; two ', if the threshold is exceeded, the transmittance defect is two. 'Critical value': it is a transmission defect occurring in the gray scale
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五、發明說明(6) 4/ 有 〇 (結構2 )如結構1之缺陷檢查方、本 透射部之透射率缺陷之各臨界值:係、增設遮光部及 鑑定其為在遮光部及透射部發各^界值時,即 (結構υ如結構⑷之缺陷檢杳生方\射率=陷者° ::於使用灰階罩幕之曝光機解像界限以下之 ^ :匕領t其係超過該灰階部特有之基本信號水準?斤 =射率缺陷之臨界值作為超過該灰階 里之水準者。 〜%V. Description of the invention (6) 4 / Yes 〇 (Structure 2) If the defect checker of Structure 1 and the critical values of the transmission defect of this transmission part: Department, adding a shading part and identifying it as being in the shading part and transmission part When each threshold value is issued, that is, (the structure υ is the defect detection structure of the structure 射 \ emissivity = trapper °: :: below the resolution limit of the exposure machine using a gray scale mask: Exceeds the basic signal level peculiar to the gray-scale part? Pound = the critical value of the emissivity defect is the one exceeding the level in the gray-scale. ~%
(:。、構4)如、结構!或2之缺陷檢查方法,其中,冑述灰階部 形成=透射膜之領域,藉以控制光線透射層之透射量;而 设定前述透射率缺陷之臨界值作為超過該灰階部容許 量之水準者。 〜 (結構5) —種具有灰階部之灰階罩幕之缺陷檢查裝置,苴 特徵在於: 、调整遮光部、透射部及透射量之領域,以減少透射該領 域之光線透射量而選擇性地變更光阻之膜厚為目的者·並 具有: ’ 檢測手段’係以平行光源及受光鏡頭掃描形成於罩幕内 之圖案,並檢測其透射率信號者; 設定臨界值之手段,係針對前述透射率信號,至少設定 灰階部之透射率缺陷臨界值者; 鑑定手段’係於超過前述臨界值時,即判斷其為灰階部 發生透射率缺陷者。(:. 、 建 4) Such as, structure! Or the defect inspection method of 2, wherein the area where the gray scale portion is formed = a transmission film is used to control the transmission amount of the light transmission layer; and the threshold value of the aforementioned transmittance defect is set as a level exceeding the allowable amount of the gray scale portion By. ~ (Structure 5) —A defect inspection device with a gray-scale cover with a gray-scale part, which is characterized by: Adjusting the area of the light-shielding part, the transmission part, and the transmission amount to reduce the amount of light transmitted through the field and selectivity For the purpose of changing the film thickness of the photoresist for the purpose of having the following: 'Detection method' is a pattern formed by scanning a pattern formed in the mask with a parallel light source and a light receiving lens, and detecting its transmittance signal; means for setting a threshold value is for the aforementioned The transmittance signal at least sets the threshold value of the transmittance defect of the grayscale portion; when the identification means' is beyond the aforementioned threshold value, it is judged that the transmittance defect occurs in the grayscale portion.
\\312\2d-code\90-12\90l24053.ptd 第9頁 五、發明說明(7) (結構6 )如結構1〜4辦七此 階罩幕係屬於LCD f任一缺陷檢查方法’其中,灰 者。 衣乂用罩幕或顯示裝置製造用之罩幕 (結構7 ) —種光罩缺 案之缺陷檢查方法、,=查方法’其特徵在於’其光罩圖 信號中透射率之里堂=艮據掃描罩幕内之圖案所得透射率 (結構8)如結構藉以檢測缺陷者。 射率異常變動所作缺p々、陷檢查方法’其中’前述根據透 案領域而設定之透斜:之檢測,係根據相應於檢查對象圖 (結雜結: 罩係包含有微細圖荦之t罩:陷檢:mj中,前述光 之顯示裝置製造用製造用光罩或包含有微細圖案 (π構1 G )種光罩缺陷檢查裝置,其特徵在於,· :測手&,係以平行光源及 鏡頭· 圖案,並檢測其透射率信號者· 旱秦内形成之 臨ί值之手段,係針對前述透射率信號,設定相鹿 於核一對不圖案領域之透射率缺陷臨界值者; & 鑑定手段,係於超過前述臨界值時,即_ 域發生透射率缺陷者。 /、馬Θ案頃 ❿ [本發明之作用] 根據結構1及5,係使用㈣苗i幕内之圖案所得透射 號,針對該透射率信號,設定灰階部之透射率缺陷臨界" 值,故可直接進行透射率本身之檢查,因此,可保證灰階 部之透射率。\ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ 'S \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \' ll \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ ll \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ ll ^ l2 2 2 2 2 _ 312 \ 2 d-code \ 90-12 \ 90 l 24053.ptd Page 9 V. Description of the invention (7) (Structure 6) Such as Structures 1 ~ 4. 7. This stage curtain system belongs to any defect inspection method of LCD f ' Among them, ashes. Mask for clothing or mask for manufacturing display device (Structure 7) —A defect inspection method for the absence of a mask, an inspection method ', which is characterized by its transmission rate in the mask signal According to the transmission (structure 8) obtained by scanning the pattern in the mask, such as the structure used to detect defects. The method of inspection of abnormality and abnormality of the emissivity is inspected according to the above-mentioned method. The detection of the oblique slope according to the area of the case is based on the inspection object map (complexity: the cover contains the fine map). Mask: Trap inspection: In mj, the aforementioned photomask for manufacturing a display device for light or a mask defect inspection device containing a fine pattern (π-structure 1 G) is characterized by:: measuring hand & Those who collimate the light source and lens · pattern and detect its transmittance signal · Means of forming a value in the dry Qin, based on the aforementioned transmittance signal, set the threshold value of the transmittance defect in the pair of non-pattern areas &Amp; Appraisal means is when the above-mentioned critical value is exceeded, that is, the transmittance defect occurs in the _ domain. / 、 马 ΘΘ 目 ❿ [Effect of the present invention] According to the structures 1 and 5, the pattern in the screen of ㈣ 苗 i is used For the obtained transmission number, for the transmittance signal, the critical value of the transmittance defect of the gray-scale portion is set, so the transmittance itself can be directly checked, and therefore, the transmission of the gray-scale portion can be ensured.
C:\2D-OODE\90-〗2\9O】24O53.pidC: \ 2D-OODE \ 90- 〖2 \ 9O】 24O53.pid
五、發明說明(8) 又因為本發明係不作圖案識別之檢查方法, 於 微細圖案時特有之起因於圖案形狀 I才双一 (不能降低臨界值之問題),因:狀=疑似缺陷之問題 〜从 口此,可降低臨界值,並可隹 仔滿足灰階罩幕精準度(規袼)之敏感度。 1 ® 1叮、 又,因本發明係使用透射率信 :: 中取得差分信號而迴避灰階部特有^之美:二t =較榀查 問題(不能降低臨界值之問題),/ l唬水準之放大 可獲得滿足灰階罩幕精準度之敏感度。’可降低臨界值,並 而且,由於不需要比較對象物:;作單眼檢查。 而且,可藉由變更灰階部用之透射率缺陷抽: 可配合使用者所使用之灰階罩幕 u 透射率。 κ曝尤條件而得以保證其 根據結構2 ’可同時檢測遮光部 部之透射性低落之缺陷等半透二^ 、,4 V, ⑥光邛有白缺陷或透射部有里缺p日本, ;非表示透射率有問題’故判斷為有正常之㈣=光 又’結構2中’藉由使用灰階部用之透射率 界值和通常之遮光部及透射部之透射率缺陷屮彳出 形成之透射率缺陷領域,可檢測透射^缺陷U界值所 檢查領域。即,若在該透射率缺:而不必依賴 查領域即可判斷為有透射率缺陷。5 & 必根據檢 根據結構3 姑你 上述灰階部若屬於使用灰階罩幕之暖本祕 解像界限以下遮光圖幸所 奉之曝先機 口木所形成之領域時,則如V. Description of the invention (8) Also because the present invention is not a pattern recognition inspection method, it is unique for fine patterns due to the shape I of the pattern (the problem of not being able to lower the critical value), because: shape = suspected defect ~ From this point of view, the critical value can be reduced, and Taipa can meet the sensitivity of the accuracy (regulation) of the gray scale mask. 1 ® 1 Ding, because the present invention uses the transmittance signal :: to obtain a differential signal to avoid the unique beauty of the gray scale: two t = more investigation problems (can not lower the threshold value), / l level Zoom in to obtain sensitivity that meets the accuracy of the gray scale mask. 'Can reduce the threshold, and, since there is no need to compare the object: for a monocular examination. In addition, it is possible to extract the transmissivity defect by changing the gray scale part: It can match the transmittance of the gray scale mask used by the user. κ exposure conditions to ensure that according to the structure 2 'can simultaneously detect the transmissive defects such as low transmittance of the light-shielding part ^ ,, 4 V, ⑥ light defects have white defects or transmission parts are lacking p Japan ,; It does not indicate that there is a problem with the transmittance. Therefore, it is judged that there is a normal ㈣ = light. In the structure 2, it is formed by using the transmittance boundary value for the gray-scale portion and the transmittance defect of the ordinary light-shielding portion and the transmission portion. The transmission defect area can detect the area inspected by the transmission ^ defect U boundary value. That is, if the transmittance is lacking, it can be judged that there is a transmittance defect without depending on the search area. 5 & Must pass inspection According to structure 3 If the above-mentioned gray-scale part belongs to the warmth of using a gray-scale hood, the shading picture below the resolution limit is fortunate to be exposed in the area formed by Mouthwood.
508668 五、發明‘說明(9) 設定超過灰階部特有之基本作^ 、 抽出臨界值。由此,可排 ^欠準(1 6 )作為透射率缺陷 影響。此時,透射率缺陷抽2 σ卩特有之基本信號水準之 準(16)之中心值作為基準。又^ f值最好設定基本信號水 率之上限及下限設定透射率二f由在灰階部之容許透射 部之透射率。 、曰出臨界值,可保證灰階 在結構4中,若上述灰_ ^ 控制光㈣㈣層之透透/f之領域而可 率之上限及下限設定透射率缺:陷部之容許透鲁508668 V. Invention ‘Explanation (9) Set a basic value that exceeds the basic work peculiar to the gray scale part ^ and extract the critical value. As a result, the influence of under-alignment (16) as a transmittance defect can be eliminated. At this time, the transmittance defect draws the center value of the basic signal level (16) unique to 2 σ 卩 as a reference. It is better to set the upper limit and lower limit of the basic signal water ratio. The transmittance is set by the transmittance of the allowable transmission section in the gray scale section. The critical value can guarantee the gray level. In the structure 4, if the above gray _ ^ controls the light transmission layer's permeation / f field and the upper and lower limits of the transmittance are set, the transmittance is lacking: the allowable transparency of the depression
部之透射率。 #出L界值,可保證灰阳 根.據釔構6 ’由於通常之半導體用灰階罩幕尺寸小,盥 願花-點時間措由與顯微鏡等一體化之透射率檢查機等丁進 行灰階部等之透射率檢查,但檢查LCD製造用灰階罩幕 時,尺寸大而且其透射率缺陷部位也多,此類檢查方法之 製程負擔甚鉅,實際上也有困難,因此,本發明之缺陷檢 查方法對LCD用灰階罩幕之實用化而言是必要而不可或缺 的0 此類情況,不限於LCD(液晶顯示器)製造用罩幕,在其 他顯示裝置也相同。再者,LCD製造用罩幕中,係包含所 有L C D製造上必須之罩幕,例如,包含有T F T (薄膜電晶 體)、低溫多晶矽TFT、彩色過濾片等之形成所需之一切罩 幕。.其他顯示裝置製造用罩幕、有機EL(電發光)顯示器、 電漿顯示器等製造時所需之全部的罩幕也包含在内。 根據結構7〜1 0,由於本發明係根據掃描罩幕内之圖案所Transmissivity. # 出 L the boundary value, can guarantee the gray sun root. According to the structure of yttrium 6 'because the size of the gray scale cover for general semiconductors is small, the time spent by the point is measured by a transmission tester integrated with a microscope, etc. Inspection of the transmittance of gray-scale parts, etc. However, when inspecting gray-scale masks for LCD manufacturing, the size is large and there are many transmittance defects. The inspection process of this type of inspection method has a large burden and is actually difficult. The defect inspection method is necessary and indispensable for the practical use of gray-scale masks for LCDs. Such cases are not limited to masks for LCD (liquid crystal display) manufacturing, and are the same for other display devices. In addition, the masks for LCD manufacturing include all the masks necessary for the manufacture of LCD, for example, all the masks required for the formation of T F T (thin-film transistor), low-temperature polycrystalline silicon TFT, and color filters. All screens required for manufacturing other display device manufacturing screens, organic EL (electroluminescence) displays, and plasma displays are also included. According to the structure 7 to 10, since the present invention is based on the pattern in the scanning mask
\\312\2d-code\90-12\90124053.ptd 第12頁 五、發明說明(10) 得透射率h唬中透射率之異常變動而檢測缺陷,即係不識 別圖案之檢查方法,尤其可迴避,例如,檢查微細圖案如 光罩之線寬為3 # m以下之線形條紋時,發生特有之圖案形 狀所引起之疑似缺陷之問題(不能降低臨界值之問題)。因 此,可降低臨界值,並可獲得滿足圖案精準度(規格)之敏 感度。 又由方;本發明係使用透射率信號,故可迴避比較檢查 中取得差分信號時所遭遇之微細圖案特有之基本信號水^ 之放大問題(不能降低臨界值之問題)。因此,可降低臨界 值,並可獲得滿足圖案精準度之敏感度。 又由於不需要比較對象物,可作單眼檢查。 含有此類微細圖案之罩幕,可列舉· LCD製造用光罩或有 機EL顯示器、、電漿顯示器等之顯示裝置製造用光罩、具有 形成TFT頻道部或接觸孔部等之微細圖案之光。 [本發明之最佳實施形態] · 以下將針對具有灰階部之灰階罩幕缺陷檢查方法及缺陷 檢查裝置作具體之說明。 圖1(1)顯示遮光部(1)、透射部(2)、灰階部(3)、(5)中 之任一種均未發生缺陷之狀態,箭頭顯示檢查裝置之鏡頭 掃描方向(檢查方向)。 圖1 (2)顯示沿著上述掃描方向所得之透射率信號(7)。 透射率信號,在遮光部(1)為透射率〇%,在透射部(2)為透 射率100%,在灰階部(3)、(5)為透射率5〇%。 本發明之特徵在於,在上述透射率信號中設定一定之臨\\ 312 \ 2d-code \ 90-12 \ 90124053.ptd Page 12 V. Description of the invention (10) Detecting defects by abnormal changes in transmittance in the transmittance hbl, that is, an inspection method that does not recognize patterns, especially It can be avoided, for example, when inspecting a fine pattern such as a linear stripe with a line width of 3 # m or less, the problem of suspected defects caused by the unique pattern shape (a problem that the threshold cannot be lowered) occurs. Therefore, the critical value can be reduced, and sensitivity that satisfies the accuracy (specification) of the pattern can be obtained. The method is based on the invention. The present invention uses a transmittance signal, so it can avoid the amplification problem of the basic signal characteristic peculiar to the fine pattern that is encountered when obtaining the differential signal in the comparison check (the problem that the critical value cannot be lowered). Therefore, the critical value can be lowered, and a sensitivity satisfying the pattern accuracy can be obtained. And because it is not necessary to compare objects, it can be used for monocular examination. Examples of masks containing such fine patterns include photomasks for LCD manufacturing, organic EL displays, plasma display displays, and other masks for display device manufacturing. Lights with fine patterns forming TFT channel sections or contact hole sections . [Best Mode for Carrying Out the Invention] The following will specifically describe a gray scale mask defect inspection method and a defect inspection device having a gray scale portion. Fig. 1 (1) shows a state where no defect occurs in any of the light-shielding portion (1), the transmission portion (2), the gray-scale portion (3), and (5), and the arrow indicates the lens scanning direction of the inspection device (inspection direction) ). Figure 1 (2) shows the transmittance signal (7) obtained along the scanning direction. The transmittance signal has a transmittance of 0% in the light-shielding portion (1), a transmittance of 100% in the transmittance portion (2), and a transmittance of 50% in the gray-scale portions (3) and (5). The present invention is characterized in that a certain threshold is set in the transmittance signal.
界值,藉以檢測透射率缺陷。 p具體上,如圖1 ( 2 )所示,係於灰階部設定透射率缺陷之 L界值(上限端為(8a),下限端為(⑽)若超 值時’即判斷為灰階部發生了透射率缺陷。Threshold to detect transmission defects. Specifically, as shown in FIG. 1 (2), the L limit value of the transmittance defect is set at the gray level portion (the upper limit end is (8a), and the lower limit end is (⑽). If the value is exceeded, it is judged as a gray level. Transmittance defects occurred at the part.
此時,如圖1 (2)所示,再設定普通遮光部及透射部之透 射率缺陷之臨界值(透射部端為(9a),遮光部端為(9㈧), 若超過該等臨界值時,即判斷為遮光部或透射部發生了透 :率缺陷,其優點在於藉此可同時檢測遮光部之遮光度低 洛之缺陷、或透射部之透射度低落之缺陷等半透射性之透 此%,更可藉由使用灰階部用之透射率缺陷抽出臨界值 8:) ( 8b)和音通遮光部及透射部之透射率缺陷抽出臨界 值(9a)、(9b)所形成之透射率缺陷領域(1〇a)、(1〇b),可 檢測透射率缺陷而不必依賴檢查領域。即,若在這透射率 $ 領域(10a)、(i〇b),不必根據檢查領域即可判斷為有 f此針對透射率缺陷之形態加以說明。 第1點’如圖2 (2 )所示,即使灰階部(3 )、( 5 )沒有形狀 缺fe (白缺陷或黑缺陷)時,如圖2 ( 2 )所示,有時灰階部全 項域之透射率水準會大致同樣地超過灰階部之透射率缺陷 L界值(、上限ir而為(8a),下限端為⑽))。本發明中,即使 灰j 1有此類形狀缺陷,仍能檢測透射率缺陷。再者, 此種場a若以比較檢查法來進行透射率缺陷之檢測,是 困難的。At this time, as shown in Figure 1 (2), set the critical value of the transmittance defect of the ordinary light-shielding part and the transmission part (the end of the transmission part is (9a) and the end of the light-shielding part is (9㈧). If these thresholds are exceeded At this time, it is judged that the light-shielding part or the transmission part has a transmissivity defect, which has the advantage that it can simultaneously detect semi-transmissive transmissions such as defects in the light-shielding part with low shading or defects in the transmission part with low transmittance. This% can be transmitted by using the transmission rate defect extraction critical value 8 :) (8b) of the gray-scale portion and the transmission rate extraction extraction threshold value (9a), (9b) of the tone blocking portion and the transmission portion. Rate defect areas (10a) and (10b), which can detect transmittance defects without having to rely on inspection areas. That is, if the transmittance $ areas (10a) and (iob) do not need to be determined according to the inspection area, it can be judged that there is f. This will explain the form of the transmittance defect. Point 1 'as shown in Fig. 2 (2), even if the gray-scale parts (3) and (5) have no shape defect (white defect or black defect), as shown in Fig. 2 (2), sometimes the gray-scale The transmittance level of the full field of this part will approximately exceed the limit value of the transmittance defect L of the grayscale part (the upper limit ir is (8a), and the lower limit end is ⑽)). In the present invention, even if the gray j 1 has such a shape defect, a transmittance defect can be detected. Furthermore, it is difficult to detect a transmittance defect in such a field a by a comparative inspection method.
第14頁 五、發明說明(12) 第2點,如圖3 (1)所示,若灰階部(3 )、( 5 )有形狀缺陷 (黑缺陷(4)或白缺陷(6))時,有時會因該形狀缺陷,如圖 3(2)所示’而使灰階部全領域之透射率水準大致同樣地變 化三而本發明即使在此種場合,仍能檢測透射率缺陷。 、第3點,如圖4 (1)所示,若灰階部(3 )、( 5 )有形狀缺陷 黑:缺陷⑷或白缺陷⑷)時,有時會因該形狀缺陷,如圖 織所不,/、在形狀缺陷之某一部分,出現急劇之透射率 =。此種%合,可將灰階部之形狀缺陷當作透射 來檢測。 後3 =廢ί上述灰階部屬於使用灰階罩幕之曝光機解 象| 下遮光圖案所形成之領域時,如圖5所示,設定 二Ϊ火Ϊ:特本信號水準(16)之透射率缺陷抽出臨 。,此,可排除灰階部特有之基本 好將基本信號(16)之中心值設定為缺陷抽二 穴,基準。^,藉由將透射率缺陷抽出臨界值(上限/ I a下限如(8b))設定在灰階部之容 下限,可保證灰階部之透射率。 午炙上限及 本發明中,若上述灰階部形成半透射膜 光線透f膜層之透射量8夺,將缺陷抽臨值;:=制 (8b)。豬此,可保證灰階部之透射率。 f缒為 本發,中,可將各臨界值設定為任意之數值。 由變更灰階部透射率缺陷抽出臨界值 :,藉 所用灰階罩幕曝光條件之透射率。 ,、ϋ配B使用者 第15頁 \\332\2d-code\90-12\90124053.ptd 508668 五、發明說明(13) 透 部 根據本發明,針對只具有灰階部之灰階罩幕也可檢查其 射率,即使只有遮光部和透射部之普通罩幕和具有遮光 、透射部和灰階部之灰階罩幕混合存在時,也可作透射 率之檢查。 其次,將說明本發明之比較檢查裝置。 本‘明之檢查裝置具有一種檢測手段,係針對罩幕内形 成之圖案使用平行光源及受光鏡頭分別加以掃描,並分別 松/則其透射里#號者。具體上’例如具備:設於罩幕一端 之Πί源(相對於鏡頭之聚光或照射整體罩幕之光源); 設於2幕另一端之受光鏡頭;以及使罩幕和鏡頭相對性移 動罩幕作全領域掃描之掃描手段(通常為罩幕台面 丨:由亡,’沿著掃描方向以鏡頭接受透射 光。又,例如,赭由配置於夂 器,檢測透射量信號。各鏡頭組件内之CCD線形感測 二具有灰階部之透射率缺陷抽出臨 界值及通吊邓之透射率缺陷抽出臨 而鑑定其透射率缺陷。缺ρ认、、a, & m &缺陷杈測電路, 具有中間領域透射率之透“;::卢路:’ I某-定時間内 率缺陷抽出臨界值之上限咬;;j T超過灰階部用透射 射率缺陷。又,在某_定^^ ’即鑑定為灰階部之透 量信號,若高於遮光部用二:f ?透射率〇%附近之透射 定為遮光部之透射率缺陷。间率缺陷抽出臨界值時,即鑑 透射率100%附近之透射^二樣,,在某一定時間内居於 陷抽出臨界值時,即k,右低於透射部用透射率缺 疋為透射部之透射率缺陷。此等場Page 14 V. Description of the invention (12) The second point, as shown in Fig. 3 (1), if the grayscale portions (3), (5) have shape defects (black defects (4) or white defects (6)) In some cases, due to the shape defect, as shown in FIG. 3 (2), the transmittance level of the entire gray scale section is changed approximately the same. The present invention can detect the transmittance defect even in this case. . Point 3, as shown in Figure 4 (1), if the grayscale parts (3) and (5) have shape defects (black: defect ⑷ or white defect ⑷), sometimes the shape defect may occur due to the shape defect. No, /, in a part of the shape defect, a sharp transmittance = appears. In this case, the shape defect of the gray scale portion can be detected as transmission. Back 3 = Abandoned. When the above gray-scale part belongs to the area of the exposure machine using a gray-scale mask | When the lower shading pattern is formed, as shown in Figure 5, set the second fire level: the special signal level (16). Transmittance defect extraction pro. Therefore, the basic characteristic peculiar to the gray-scale part can be eliminated. It is good to set the center value of the basic signal (16) as the defect extraction two points, the reference. ^, By setting the transmittance defect extraction critical value (upper limit / I a lower limit such as (8b)) to the lower limit of the gray level portion, the transmittance of the gray level portion can be ensured. The upper limit of noon sunburn and the present invention, if the gray-scale part forms a semi-transmissive film, the transmission amount of light through the f-film layer is 8 and the defect threshold value is extracted; == (8b). Pigs can ensure the transmission of the gray scale. f 缒 is the present invention, in which each critical value can be set to any value. The critical value is extracted by changing the transmittance defect of the gray scale part: the transmittance of the exposure condition of the gray scale mask used. , User B, page 15 \\ 332 \ 2d-code \ 90-12 \ 90124053.ptd 508668 V. Description of the invention (13) Transparent part According to the present invention, a gray-scale mask with only a gray-level part The transmittance can also be checked. Even if the ordinary mask with only the light-shielding part and the transmission part and the gray-scale mask with the light-shielding, transmission part, and gray-scale part are mixed, the transmittance can be checked. Next, a comparative inspection device of the present invention will be described. This ‘Ming inspection device has a detection method, which uses a parallel light source and a light-receiving lens to scan the pattern formed inside the mask, respectively, and releases each of them. Specifically, for example, a source provided at one end of the mask (a light source relative to the lens or a light source that illuminates the entire mask); a light receiving lens provided at the other end of the two screens; and a cover that moves the mask and the lens relative Scanning method (usually mask table surface) for screen scanning in all areas (usually, "receiving transmitted light with the lens along the scanning direction. Also, for example, the signal is transmitted to the camera to detect the transmission signal. Inside each lens assembly The CCD linear sensing 2 has a transmission threshold defect extraction threshold with a gray scale and a transmission defect extraction through the Deng Deng Deng to identify the transmission defect. The lack of, a, & m & defect branch test circuit , With the transmittance in the middle field "; :: Lu Lu: 'I-the upper limit bite of the rate defect extraction threshold in a fixed time; j T exceeds the transmission emissivity defect in the gray scale. Also, in a certain ^^ 'It is identified as the transmission signal of the gray-scale part. If it is higher than the light-shielding part, use two: f? Transmission around 0% is determined as the transmittance defect of the light-shielding part. Transmittance near 100% of transmittance ^ When living in the trap room withdrawn threshold, i.e. k, the right portion lower than the transmission rate by a transmission shortage of piece goods transmittance of the transmission portion of the defect. These field
508668 等鑑定為透射率 判斷其係發生於 可設置一種辨識 射部和灰階部中 一領域發生透射 限於上述之實施 灰階部(3 )之遮 即使灰階部(3 ) 明。 檢查方法及缺陷 使用。此時,可 由本發明之透射 檢查方法中’可針對高檢查規格之洛508668, etc. It is identified as the transmittance. It is judged that it occurred in the transmission. A type of identification can be set in the transmission part and the gray level part. Transmission in a field is limited to the above implementation. The gray level part (3) is obscured even if the gray level part (3) is clear. Inspection methods and defects Use. In this case, the transmission inspection method of the present invention can be used for a high inspection specification.
五、發明說明(14) 合’不會把邊緣信號 那一〖品界值檢測到而 再者,本發明中, 檢查者為遮光部及透 簡單且確實區別在哪 再者’本發明並扑 例如,如圖7所示 型時,或如圖8所示 成時,仍可適用本發 又’,本發明之缺陷 檢查方法及裝置配合 案之形狀缺陷,並藉 透射率缺陷。 又,上述實施例中 者’但本發明並非限 形成用光罩等含有如 此種場合,也可進行 疑似缺陷。 [本發明之效果] 如以上所說明,根 缺陷 <檢查裝置,可保 尤其,本發明之檢 係必要而不可或缺者 又,本發明之光罩 缺陷。又’可根據在 哪一領域。 手段,用以辨識其所 之哪一領域,藉此可 率缺陷。 形態等者。 光圖案(3a)屬於虛、線 由半透射膜(3c)所μ 檢查裝置,可與比車交 藉由比較檢查檢測圖 率檢查,可同時檢剛 所述係有關灰階罩幕之灰階部檢奎 於此,例如,也可適用於71?丁頻道部 上述灰階部相同微細圖案之光罩。 咼精準度之缺陷檢查,而不會檢蜊到 ΐ ί發明之灰階罩幕缺陷檢查方法及 =灰階罩幕在灰階部之透射率。及 了方法在LCD用灰階罩幕之實用化上 508668 五、發明說明(15) 細圖案進行高精準度(高敏感度)之檢查。 [元件編號之說明]V. Description of the invention (14) The combination of 'the boundary value of the edge signal will not be detected, and again, in the present invention, the inspector is a light-shielding part, and it is simple and sure to distinguish the difference.' For example, when the type shown in FIG. 7 or the time shown in FIG. 8 is used, the present invention can still be applied, and the defect inspection method and device of the present invention can be used for the shape defect and the transmission defect. In addition, in the above-mentioned embodiments, the present invention is not limited to the formation of photomasks and the like, and a suspected defect can be performed. [Effects of the present invention] As described above, the root defect < inspection device can ensure that, particularly, the inspection of the present invention is necessary and indispensable, and the photomask of the present invention is defective. It ’s based on which field. Means to identify the area in which it is located, so that defects can be identified. Shape and others. The light pattern (3a) belongs to the imaginary and line by the semi-transmissive film (3c). The inspection device can be compared with the car to check the inspection rate. It can also check the gray scale of the gray scale cover just described. The Ministry of Inspection is here, for example, it can also be applied to a mask with the same fine pattern as the gray scale section of the 71 ° channel section.咼 Accuracy inspection of defects, but not inspection of the gray scale mask defect inspection method invented and the transmission of the gray scale mask in the gray scale. And the method for the practical use of gray-scale masks for LCDs 508668 V. Description of the invention (15) Fine patterns are inspected with high accuracy (high sensitivity). [Explanation of component number]
1 遮 光 部 1, 與 遮 光 部 對應 之 部 分 2 透 射 部 2, 與 透 射 部 對應 之 部 分 3 灰 階 部 3, 與 灰 階 部 對應 之 部 分 3a 遮 光 圖 案 3b 透 射 部 3c 半 透 射 膜 4 愛 缺 陷 5 灰 階 部 6 白 缺 陷 7 透 射 率 信 號 8a 灰 階 部 用 之透 射 率 缺 陷 抽 出 臨 界 值(上 限) 8b 灰 階 部 用 之透 射 率 缺 陷 抽 出 臨 界 值(下 限) 9a 透 射 部 用 之透 射 率 缺 陷 抽 出 臨 界 值 9b 遮 光 部 用 之透 射 率 缺 陷 抽 出 臨 界 值 10a 透 射 率 缺 陷領 域 10b 透 射 率 缺 陷領 域 11 白 缺 陷(針孔) 11, 發 生 於 遮 光部 之 白 缺 陷 12 黑 缺 陷 (J 1、點) \\312\2d-code\90-12\90124053.ptd 第18頁 508668 五、發明說明 (16) 12’ 發 生 於 13 透 射 量 13, 透 射 量 14 差 分 信 15a 正 方 之 15b 負 方 之 16 基 本 信 透射部之黑缺陷 信號 信號 號 臨界值 臨界值 號水準(雜訊帶)1 light-shielding part 1, part corresponding to light-shielding part 2 transmission part 2, part corresponding to transmission part 3 gray-scale part 3, part corresponding to gray-scale part 3a light-shielding pattern 3b transmission part 3c semi-transmissive film 4 love defect 5 gray Step 6 White defect 7 Transmittance signal 8a Transmissive defect extraction threshold for gray scale (upper limit) 8b Transmissive defect extraction threshold for gray level (lower limit) 9a Transmittance defect extraction threshold for transmissive portion 9b Transmissive defect extraction threshold for light-shielding part 10a Transmittance defect area 10b Transmittance defect area 11 White defect (pinhole) 11, White defect occurring in the light-shielding part 12 Black defect (J 1, dot) \\ 312 \ 2d-code \ 90-12 \ 90124053.ptd Page 18 508668 V. Description of the invention (16) 12 'Occurs on 13 Transmittance 13, Transmittance 14 Differential Letter 15a Positive 15b Negative 16 Basic Letter Black Defect in Transmitting Signal Signal Number Threshold Threshold Number Level (Noise Band)
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(2 )為S兄明本發明之—實施形態之缺陷檢查方 圖 1(1) 法之圖。 圖 2(1) 圖 3(1) 圖 4(1) (2)為說明透射率缺陷之一形態之圖。 為,明透射率缺陷之其他形態之圖。 Ξ 5 A 1f為5兄明透射率缺陷之又一其他形態之圖。 ==階部特有之基本信號水準之圖。 分剖面圖。 圖’⑴為部分俯視圖’⑺為苟 階部其他形態之部分俯視圖。 又—其他形態之部分俯視圖。 圖9⑴〜(5)為說明習知缺陷檢查方法之圖。(2) This figure shows the method for inspecting the defect of the embodiment of the present invention. Fig. 2 (1), Fig. 3 (1), Fig. 4 (1), and (2) are diagrams illustrating one form of a transmittance defect. It is a diagram showing other forms of transmittance defects. A 5 A 1f is a diagram of yet another form of the 5 transmittance defect. == A map of the basic signal level peculiar to the step. Sectional view. Fig. '⑴ is a partial plan view'⑺ is a partial plan view of other shapes of the stepped portion. Another — part top view of other forms. 9 (5) to (5) are diagrams illustrating a conventional defect inspection method.
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JP2001244071A JP2002174604A (en) | 2000-09-29 | 2001-08-10 | Method and device for inspecting defect of gray tone mask and those for inspecting defect of photo mask |
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TW090124053A TW508668B (en) | 2000-09-29 | 2001-09-28 | Method and device for inspecting defect of gray tone mask and those for inspecting defect of photomask |
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JP (1) | JP2002174604A (en) |
KR (1) | KR100482793B1 (en) |
TW (1) | TW508668B (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4021235B2 (en) * | 2002-04-16 | 2007-12-12 | Hoya株式会社 | Gray-tone mask defect inspection method and defect inspection apparatus, and photomask defect inspection method and defect inspection apparatus |
KR100583950B1 (en) | 2003-07-08 | 2006-05-26 | 삼성전자주식회사 | Reference mask having at least a reference pattern for creating a defect recognition level, method of fabricating the same, method of creating a defect recognition level using the same and method of inspecting defects using the same |
US8137870B2 (en) | 2005-06-14 | 2012-03-20 | Samsung Electronics Co., Ltd. | Method of manufacturing photomask |
JP4822103B2 (en) * | 2005-11-09 | 2011-11-24 | レーザーテック株式会社 | Inspection apparatus, inspection method, and pattern substrate manufacturing method |
JP4591928B2 (en) * | 2006-11-24 | 2010-12-01 | Hoya株式会社 | Photomask defect inspection method and defect inspection apparatus |
JP2008216590A (en) * | 2007-03-02 | 2008-09-18 | Hoya Corp | Defect detection method and defect detection device for gray tone mask, defect detection method for photomask, method for manufacturing gray tone mask, and pattern transfer method |
TWI446105B (en) * | 2007-07-23 | 2014-07-21 | Hoya Corp | Method of manufacturing a photomask, method of transferring a pattern, photomask and database |
TWI431408B (en) * | 2007-07-23 | 2014-03-21 | Hoya Corp | Method of acquiring photomask information, method of displaying photomask quality, method of manufacturing a display device, and photomask product |
JP2008112178A (en) * | 2007-11-22 | 2008-05-15 | Advanced Mask Inspection Technology Kk | Mask inspection device |
JP5185154B2 (en) * | 2009-02-20 | 2013-04-17 | Hoya株式会社 | Multi-tone photomask inspection method |
JP5185158B2 (en) * | 2009-02-26 | 2013-04-17 | Hoya株式会社 | Multi-tone photomask evaluation method |
JP4865011B2 (en) * | 2009-06-17 | 2012-02-01 | 株式会社東芝 | Photomask inspection method |
JP4822468B2 (en) * | 2010-03-19 | 2011-11-24 | レーザーテック株式会社 | Defect inspection apparatus, defect inspection method, and pattern substrate manufacturing method |
-
2001
- 2001-08-10 JP JP2001244071A patent/JP2002174604A/en not_active Withdrawn
- 2001-09-28 TW TW090124053A patent/TW508668B/en not_active IP Right Cessation
- 2001-09-29 KR KR10-2001-0061014A patent/KR100482793B1/en active IP Right Grant
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KR20020025844A (en) | 2002-04-04 |
KR100482793B1 (en) | 2005-04-19 |
JP2002174604A (en) | 2002-06-21 |
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