TW508668B - Method and device for inspecting defect of gray tone mask and those for inspecting defect of photomask - Google Patents

Abstract

The present invention provides a defect inspecting method and device capable of securing the transmittance in a gray tone part in a gray tone mask. The solution of the present invention is to provide a defect inspecting method for the gray tone mask having a gray tone part, which is to adjust the transmittance through the area of light shielding part, a light transmitting part, whose purpose is to reduce the amount of light transmitted through the area for selectively changing the film thickness of the photoresist; using a transmittance signal obtained by scanning a pattern inside the mask, threshold values 8a and 8b of a transmittance defect in the gray tone part are set on the transmittance signal 7, and when the transmittance exceeds the threshold values 8a and 8b, the occurrence of a transmittance defect is determined in the gray tone part.

Description

508668 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a defect inspection method and a defect inspection device for a mask including a gray scale mask or a fine pattern. — [Knowledgeable Technology] In recent years, in the field of large LCD screens, some people have tried to reduce the number of screens by using gray-scale screens (monthly FPD Intel ligence, May 1999). Here, the gray scale cover is attached to a transparent substrate, as shown in FIG. 6 (1), and includes a light shielding portion (1), a transmission portion (2), and a gray scale portion (3). The gray scale section (3), for example, belongs to the field of forming a light-shielding pattern (3a) below the resolution limit for a large LCD exposure machine using a gray scale mask. The purpose of its formation is to reduce light transmission in this area. And reduce the amount of irradiation in the field to selectively change the thickness of the photoresist. (3b) is a fine transmission section below the resolution limit of the exposure device of the gray scale section (3). The light-shielding portion (1) and the light-shielding pattern (3a) are usually formed of a film made of the same material and the same thickness as a chromium compound or a chromium compound. The transmissive portion σ (2) and the minute transmissive portion (3b) belong to a portion of the transparent substrate where the transparent substrate is not covered with heat. Yuan M Temple The resolution limit of a large LCD exposure machine using a gray scale mask is about 3 // m in the + and + modes and about V $ // m in the mirror projection mode. Therefore, for example, suppose the transmission of the gray-scale part (3) in Fig. 6 (1): ... the space width is less than 3 // m, the line below the resolution limit of the exposure machine, ^ FU b) (3 a) The width is less than 3 // m. When using the large-scale LCD field mentioned above, the exposure light passing through the gray-scale portion (3) will be exposed as a whole, so the thickness of the positive-type photoresist film exposed through the gray-scale portion (3) is only m. On the substrate. That is, because the photoresist is based on the difference in exposure,

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508668 V. Description of the invention (2) 2 The part corresponding to the light-shielding part (1) and the part corresponding to the gray-scale part (3) differ in the solubility of the developing solution, so the photoresistance after development: phase 6 ( As shown in 2), the part corresponding to the light-shielding part (1) / °, and the part (3,) corresponding to the gray-scale part (3), for example, is about m and corresponds to the part of the transmitting part (2). (2,) is the part without photoresistance (2, · / / The photoresistance of the processed substrate in the part (2 ') without photoresistance, but the photoresistance pair in the grayscale part (3,) :: The mask is engraved to reduce the number of masks by one single screen and two traditional masks. Tian Yu < 1 == Conventional mask inspection consisting of? Method r]) The state of the defect (12) (black dot) produced by the producer, and the scan of the lens (hereinafter referred to as the upper lens) of the arrow & (Fig. 9 (2) shows the scanning along the above lens (13W emissivity signal (13) is detected by, for example, a CCD line sensor. Transmittance signal (light section within the level of ⑻) Is B, the transmission part (2) is [set the light-shielding part (1Uf rate is 0%, the transmission rate of the transmission part (2) is 100%. The transmission amount signal (ι 射) is defined by the edge of the pattern ( The boundary between the light-shielding part and the transmission part) ~ produced by '= edge line signal (pattern shape signal), if it is a white defect signal ⑴' occurring in the light-shielding part）), and a black defect occurring in Ϊ ^ (2) Signal (12,). The transmission signal (l3 f

C: \ 2D-CODE \ 90-12 \ 90124053.ptd 508668 V. Description of the invention (3) Figure 9 (4) is the reading body obtained by each lens | Ε (14) 〇 (13) minus Figure 9 (3 The transmission signal (1γ ()) is the differential signal transmitted by each lens). The line signal 'extracts only the defect signal ⑴,' and (二, 里), 2 and 5 tigers remove the pattern edge ^ 9 (5) is required for the difference between the light-shielding part (1) and the transmissive part (2) where only the defect signal is extracted # 田 1 ： 古 々 # requires a critical value, and shows that the state of white defects is detected at the threshold value (15a), and the state of black defects is detected at the negative threshold value (〖5b). If the critical value is 嗖 Hong, Shijia, and / 々w Γ, the value of the right sigh is low, which can improve the detection sensitivity, but it must be set at a level that does not pick up suspected defects. If you want to identify which kind of defect occurs in which lens, for example, the circuit of the upper lens is compared with the signal of the lower lens, (the signal of the lower lens is subtracted from the signal of the upper lens), and the light-shielding part (1) of the upper lens has a white defect. When a defect signal appears on the positive side, and a black defect occurs on the transmission part (2) of the upper lens, a defect signal appears on the negative side, thereby detecting the white and black defects of the upper lens (Figure 9 (2) to (5) above). Similarly, for example, on the circuit of the lower lens, the signal of the upper lens is compared (the signal of the upper lens is subtracted from the signal of the lower lens). When a white defect occurs in the light-shielding part (1) of the lens, a defect signal appears in the square. When a black defect occurs in the transmission part (2) of the lens, a defect signal appears on the negative side, thereby detecting the white and black defects of the lens. ° ~ 9 [Problems to be solved by the present invention] The above-mentioned conventional comparative inspection device is not suitable for inspection because it is a device used for a conventional mask composed of an inspection section and a transmission section.

C: \ 2D-CODE \ 90-12 \ 90124053.ptd, Invention Description (4) The gray scale cover of the step. In detail, there are the following problems. Set 'inspecting the gray-scale mask', ie 'the gray-scale department's defect letter. The comparison of the use of the conventional inspection is strong and strong = the mystery is small and weak, the critical point used by the Ministry of Inspection; clothing: =: critical value is lower than ordinary shading When the field is formed: a fine pattern below the J2 optical-mechanical resolution limit, unique to the grayscale part * gate = corresponding to the fine pattern of the side, as shown in Figure 5, with each mirror (noise band) (16 ). Compare the inspection numbers and extract only the defects? Lu Qu ^ ^ Subtraction (difference) to find the difference signal occurs, if the number of patterns in the gray scale part is between multiple times of the fine shading pattern), the original signal will be absent, and its basic signal level will be amplified (maximum 2 Trouble) so that it is impossible to edit the problem. Boundary value ’makes it impossible to perform a high-sensitivity inspection. However, it is up to 4 people to easily guarantee that the mask is used to check white or black defects. Dare to be important factor-transmittance. That is, 'example design size \ 2, if the line width of the light-shielding pattern in the gray scale part is relative to the value, it may be too long to be ^ red wide and seven large ^ or too high (the line width is small) and the transmittance exceeding the allowance is allowed for comparative production; When Jr is the allowable value of the transmissivity of the semi-transmission 臈 in the Λ step, the difference between the transmission signals obtained from the lenses is subtracted from 俨 #, 2 糸, and the difference is obtained. The head $ p ^ (pa θ sees a difference, which makes it impossible to detect such a transmission lack of rhyme. This is especially a problem when there is no shape defect in the gray scale part, and as far as the gray scale part is concerned, as long as its transmission The rate is within the allowable range

508668 Five-invention description (5) ---, it is not necessary to detect as a defect, but the conventional comparative inspection always detects the other as a defect, so the transmission of the conventional inspection: Within range. As a result, what was originally unnecessary to be tested is also considered as a test, which causes a problem of the accuracy (ability) of checking. The same problem also occurs in, for example, a mask for channel formation, and a mask with a fine pattern. For example, in the m channel, as the j of the plus is refined, the pattern also tends to be sharply refined. For such maps, the following methods will be used for inspection, which will cause suspected defects due to the vibration of the inspection machine: or = the difference in the shirt image, or other micro-maps: suspected defects' If the sensitivity is reduced to not detected Suspected deficiency: This == There is a problem that the sensitivity of the level of defect detection cannot be obtained. The purpose of the X-month test is to solve the above-mentioned problems, methods, and defect inspections. ^. The lack of path inspection means the inspection of the sensitivity of the inspection party, but not inspection: those who have defects in the sensitive range. This research has the following transmittance [means to solve the problem] The invention has the following structure: (Structure 1) A kind of gray-scale features: Yu: adjust the light-shielding part, the transmission part; The amount of light emitted is selectively transmitted through the pattern of the pattern in the mask. The gray scale is set for the transmittance signal; two ', if the threshold is exceeded, the transmittance defect is two. 'Critical value': it is a transmission defect occurring in the gray scale

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V. Description of the invention (6) 4 / Yes 〇 (Structure 2) If the defect checker of Structure 1 and the critical values of the transmission defect of this transmission part: Department, adding a shading part and identifying it as being in the shading part and transmission part When each threshold value is issued, that is, (the structure υ is the defect detection structure of the structure 射 \ emissivity = trapper °: :: below the resolution limit of the exposure machine using a gray scale mask: Exceeds the basic signal level peculiar to the gray-scale part? Pound = the critical value of the emissivity defect is the one exceeding the level in the gray-scale. ~%

(:. 、 建 4) Such as, structure! Or the defect inspection method of 2, wherein the area where the gray scale portion is formed = a transmission film is used to control the transmission amount of the light transmission layer; and the threshold value of the aforementioned transmittance defect is set as a level exceeding the allowable amount of the gray scale portion By. ~ (Structure 5) —A defect inspection device with a gray-scale cover with a gray-scale part, which is characterized by: Adjusting the area of the light-shielding part, the transmission part, and the transmission amount to reduce the amount of light transmitted through the field and selectivity For the purpose of changing the film thickness of the photoresist for the purpose of having the following: 'Detection method' is a pattern formed by scanning a pattern formed in the mask with a parallel light source and a light receiving lens, and detecting its transmittance signal; means for setting a threshold value is for the aforementioned The transmittance signal at least sets the threshold value of the transmittance defect of the grayscale portion; when the identification means' is beyond the aforementioned threshold value, it is judged that the transmittance defect occurs in the grayscale portion.

\ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ 'S \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \' ll \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ ll \ \ \ \ \ \ \ \ \ \ \ \ \ \ \ ll ^ l2 2 2 2 2 _ 312 \ 2 d-code \ 90-12 \ 90 l 24053.ptd Page 9 V. Description of the invention (7) (Structure 6) Such as Structures 1 ~ 4. 7. This stage curtain system belongs to any defect inspection method of LCD f ' Among them, ashes. Mask for clothing or mask for manufacturing display device (Structure 7) —A defect inspection method for the absence of a mask, an inspection method ', which is characterized by its transmission rate in the mask signal According to the transmission (structure 8) obtained by scanning the pattern in the mask, such as the structure used to detect defects. The method of inspection of abnormality and abnormality of the emissivity is inspected according to the above-mentioned method. The detection of the oblique slope according to the area of the case is based on the inspection object map (complexity: the cover contains the fine map). Mask: Trap inspection: In mj, the aforementioned photomask for manufacturing a display device for light or a mask defect inspection device containing a fine pattern (π-structure 1 G) is characterized by:: measuring hand & Those who collimate the light source and lens · pattern and detect its transmittance signal · Means of forming a value in the dry Qin, based on the aforementioned transmittance signal, set the threshold value of the transmittance defect in the pair of non-pattern areas &Amp; Appraisal means is when the above-mentioned critical value is exceeded, that is, the transmittance defect occurs in the _ domain. / 、 马 ΘΘ 目 ❿ [Effect of the present invention] According to the structures 1 and 5, the pattern in the screen of ㈣ 苗 i is used For the obtained transmission number, for the transmittance signal, the critical value of the transmittance defect of the gray-scale portion is set, so the transmittance itself can be directly checked, and therefore, the transmission of the gray-scale portion can be ensured.

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V. Description of the invention (8) Also because the present invention is not a pattern recognition inspection method, it is unique for fine patterns due to the shape I of the pattern (the problem of not being able to lower the critical value), because: shape = suspected defect ~ From this point of view, the critical value can be reduced, and Taipa can meet the sensitivity of the accuracy (regulation) of the gray scale mask. 1 ® 1 Ding, because the present invention uses the transmittance signal :: to obtain a differential signal to avoid the unique beauty of the gray scale: two t = more investigation problems (can not lower the threshold value), / l level Zoom in to obtain sensitivity that meets the accuracy of the gray scale mask. 'Can reduce the threshold, and, since there is no need to compare the object: for a monocular examination. In addition, it is possible to extract the transmissivity defect by changing the gray scale part: It can match the transmittance of the gray scale mask used by the user. κ exposure conditions to ensure that according to the structure 2 'can simultaneously detect the transmissive defects such as low transmittance of the light-shielding part ^ ,, 4 V, ⑥ light defects have white defects or transmission parts are lacking p Japan ,; It does not indicate that there is a problem with the transmittance. Therefore, it is judged that there is a normal ㈣ = light. In the structure 2, it is formed by using the transmittance boundary value for the gray-scale portion and the transmittance defect of the ordinary light-shielding portion and the transmission portion. The transmission defect area can detect the area inspected by the transmission ^ defect U boundary value. That is, if the transmittance is lacking, it can be judged that there is a transmittance defect without depending on the search area. 5 & Must pass inspection According to structure 3 If the above-mentioned gray-scale part belongs to the warmth of using a gray-scale hood, the shading picture below the resolution limit is fortunate to be exposed in the area formed by Mouthwood.

508668 V. Invention ‘Explanation (9) Set a basic value that exceeds the basic work peculiar to the gray scale part ^ and extract the critical value. As a result, the influence of under-alignment (16) as a transmittance defect can be eliminated. At this time, the transmittance defect draws the center value of the basic signal level (16) unique to 2 σ 卩 as a reference. It is better to set the upper limit and lower limit of the basic signal water ratio. The transmittance is set by the transmittance of the allowable transmission section in the gray scale section. The critical value can guarantee the gray level. In the structure 4, if the above gray _ ^ controls the light transmission layer's permeation / f field and the upper and lower limits of the transmittance are set, the transmittance is lacking: the allowable transparency of the depression

Transmissivity. # 出 L the boundary value, can guarantee the gray sun root. According to the structure of yttrium 6 'because the size of the gray scale cover for general semiconductors is small, the time spent by the point is measured by a transmission tester integrated with a microscope, etc. Inspection of the transmittance of gray-scale parts, etc. However, when inspecting gray-scale masks for LCD manufacturing, the size is large and there are many transmittance defects. The inspection process of this type of inspection method has a large burden and is actually difficult. The defect inspection method is necessary and indispensable for the practical use of gray-scale masks for LCDs. Such cases are not limited to masks for LCD (liquid crystal display) manufacturing, and are the same for other display devices. In addition, the masks for LCD manufacturing include all the masks necessary for the manufacture of LCD, for example, all the masks required for the formation of T F T (thin-film transistor), low-temperature polycrystalline silicon TFT, and color filters. All screens required for manufacturing other display device manufacturing screens, organic EL (electroluminescence) displays, and plasma displays are also included. According to the structure 7 to 10, since the present invention is based on the pattern in the scanning mask

\\ 312 \ 2d-code \ 90-12 \ 90124053.ptd Page 12 V. Description of the invention (10) Detecting defects by abnormal changes in transmittance in the transmittance hbl, that is, an inspection method that does not recognize patterns, especially It can be avoided, for example, when inspecting a fine pattern such as a linear stripe with a line width of 3 # m or less, the problem of suspected defects caused by the unique pattern shape (a problem that the threshold cannot be lowered) occurs. Therefore, the critical value can be reduced, and sensitivity that satisfies the accuracy (specification) of the pattern can be obtained. The method is based on the invention. The present invention uses a transmittance signal, so it can avoid the amplification problem of the basic signal characteristic peculiar to the fine pattern that is encountered when obtaining the differential signal in the comparison check (the problem that the critical value cannot be lowered). Therefore, the critical value can be lowered, and a sensitivity satisfying the pattern accuracy can be obtained. And because it is not necessary to compare objects, it can be used for monocular examination. Examples of masks containing such fine patterns include photomasks for LCD manufacturing, organic EL displays, plasma display displays, and other masks for display device manufacturing. Lights with fine patterns forming TFT channel sections or contact hole sections . [Best Mode for Carrying Out the Invention] The following will specifically describe a gray scale mask defect inspection method and a defect inspection device having a gray scale portion. Fig. 1 (1) shows a state where no defect occurs in any of the light-shielding portion (1), the transmission portion (2), the gray-scale portion (3), and (5), and the arrow indicates the lens scanning direction of the inspection device (inspection direction) ). Figure 1 (2) shows the transmittance signal (7) obtained along the scanning direction. The transmittance signal has a transmittance of 0% in the light-shielding portion (1), a transmittance of 100% in the transmittance portion (2), and a transmittance of 50% in the gray-scale portions (3) and (5). The present invention is characterized in that a certain threshold is set in the transmittance signal.

Threshold to detect transmission defects. Specifically, as shown in FIG. 1 (2), the L limit value of the transmittance defect is set at the gray level portion (the upper limit end is (8a), and the lower limit end is (⑽). If the value is exceeded, it is judged as a gray level. Transmittance defects occurred at the part.

At this time, as shown in Figure 1 (2), set the critical value of the transmittance defect of the ordinary light-shielding part and the transmission part (the end of the transmission part is (9a) and the end of the light-shielding part is (9㈧). If these thresholds are exceeded At this time, it is judged that the light-shielding part or the transmission part has a transmissivity defect, which has the advantage that it can simultaneously detect semi-transmissive transmissions such as defects in the light-shielding part with low shading or defects in the transmission part with low transmittance. This% can be transmitted by using the transmission rate defect extraction critical value 8 :) (8b) of the gray-scale portion and the transmission rate extraction extraction threshold value (9a), (9b) of the tone blocking portion and the transmission portion. Rate defect areas (10a) and (10b), which can detect transmittance defects without having to rely on inspection areas. That is, if the transmittance $ areas (10a) and (iob) do not need to be determined according to the inspection area, it can be judged that there is f. This will explain the form of the transmittance defect. Point 1 'as shown in Fig. 2 (2), even if the gray-scale parts (3) and (5) have no shape defect (white defect or black defect), as shown in Fig. 2 (2), sometimes the gray-scale The transmittance level of the full field of this part will approximately exceed the limit value of the transmittance defect L of the grayscale part (the upper limit ir is (8a), and the lower limit end is ⑽)). In the present invention, even if the gray j 1 has such a shape defect, a transmittance defect can be detected. Furthermore, it is difficult to detect a transmittance defect in such a field a by a comparative inspection method.

Page 14 V. Description of the invention (12) The second point, as shown in Fig. 3 (1), if the grayscale portions (3), (5) have shape defects (black defects (4) or white defects (6)) In some cases, due to the shape defect, as shown in FIG. 3 (2), the transmittance level of the entire gray scale section is changed approximately the same. The present invention can detect the transmittance defect even in this case. . Point 3, as shown in Figure 4 (1), if the grayscale parts (3) and (5) have shape defects (black: defect ⑷ or white defect ⑷), sometimes the shape defect may occur due to the shape defect. No, /, in a part of the shape defect, a sharp transmittance = appears. In this case, the shape defect of the gray scale portion can be detected as transmission. Back 3 = Abandoned. When the above gray-scale part belongs to the area of the exposure machine using a gray-scale mask | When the lower shading pattern is formed, as shown in Figure 5, set the second fire level: the special signal level (16). Transmittance defect extraction pro. Therefore, the basic characteristic peculiar to the gray-scale part can be eliminated. It is good to set the center value of the basic signal (16) as the defect extraction two points, the reference. ^, By setting the transmittance defect extraction critical value (upper limit / I a lower limit such as (8b)) to the lower limit of the gray level portion, the transmittance of the gray level portion can be ensured. The upper limit of noon sunburn and the present invention, if the gray-scale part forms a semi-transmissive film, the transmission amount of light through the f-film layer is 8 and the defect threshold value is extracted; == (8b). Pigs can ensure the transmission of the gray scale. f 缒 is the present invention, in which each critical value can be set to any value. The critical value is extracted by changing the transmittance defect of the gray scale part: the transmittance of the exposure condition of the gray scale mask used. , User B, page 15 \\ 332 \ 2d-code \ 90-12 \ 90124053.ptd 508668 V. Description of the invention (13) Transparent part According to the present invention, a gray-scale mask with only a gray-level part The transmittance can also be checked. Even if the ordinary mask with only the light-shielding part and the transmission part and the gray-scale mask with the light-shielding, transmission part, and gray-scale part are mixed, the transmittance can be checked. Next, a comparative inspection device of the present invention will be described. This ‘Ming inspection device has a detection method, which uses a parallel light source and a light-receiving lens to scan the pattern formed inside the mask, respectively, and releases each of them. Specifically, for example, a source provided at one end of the mask (a light source relative to the lens or a light source that illuminates the entire mask); a light receiving lens provided at the other end of the two screens; and a cover that moves the mask and the lens relative Scanning method (usually mask table surface) for screen scanning in all areas (usually, "receiving transmitted light with the lens along the scanning direction. Also, for example, the signal is transmitted to the camera to detect the transmission signal. Inside each lens assembly The CCD linear sensing 2 has a transmission threshold defect extraction threshold with a gray scale and a transmission defect extraction through the Deng Deng Deng to identify the transmission defect. The lack of, a, & m & defect branch test circuit , With the transmittance in the middle field "; :: Lu Lu: 'I-the upper limit bite of the rate defect extraction threshold in a fixed time; j T exceeds the transmission emissivity defect in the gray scale. Also, in a certain ^^ 'It is identified as the transmission signal of the gray-scale part. If it is higher than the light-shielding part, use two: f? Transmission around 0% is determined as the transmittance defect of the light-shielding part. Transmittance near 100% of transmittance ^ When living in the trap room withdrawn threshold, i.e. k, the right portion lower than the transmission rate by a transmission shortage of piece goods transmittance of the transmission portion of the defect. These field

508668, etc. It is identified as the transmittance. It is judged that it occurred in the transmission. A type of identification can be set in the transmission part and the gray level part. Transmission in a field is limited to the above implementation. The gray level part (3) is obscured even if the gray level part (3) is clear. Inspection methods and defects Use. In this case, the transmission inspection method of the present invention can be used for a high inspection specification.

V. Description of the invention (14) The combination of 'the boundary value of the edge signal will not be detected, and again, in the present invention, the inspector is a light-shielding part, and it is simple and sure to distinguish the difference.' For example, when the type shown in FIG. 7 or the time shown in FIG. 8 is used, the present invention can still be applied, and the defect inspection method and device of the present invention can be used for the shape defect and the transmission defect. In addition, in the above-mentioned embodiments, the present invention is not limited to the formation of photomasks and the like, and a suspected defect can be performed. [Effects of the present invention] As described above, the root defect < inspection device can ensure that, particularly, the inspection of the present invention is necessary and indispensable, and the photomask of the present invention is defective. It ’s based on which field. Means to identify the area in which it is located, so that defects can be identified. Shape and others. The light pattern (3a) belongs to the imaginary and line by the semi-transmissive film (3c). The inspection device can be compared with the car to check the inspection rate. It can also check the gray scale of the gray scale cover just described. The Ministry of Inspection is here, for example, it can also be applied to a mask with the same fine pattern as the gray scale section of the 71 ° channel section.咼 Accuracy inspection of defects, but not inspection of the gray scale mask defect inspection method invented and the transmission of the gray scale mask in the gray scale. And the method for the practical use of gray-scale masks for LCDs 508668 V. Description of the invention (15) Fine patterns are inspected with high accuracy (high sensitivity). [Explanation of component number]

1 light-shielding part 1, part corresponding to light-shielding part 2 transmission part 2, part corresponding to transmission part 3 gray-scale part 3, part corresponding to gray-scale part 3a light-shielding pattern 3b transmission part 3c semi-transmissive film 4 love defect 5 gray Step 6 White defect 7 Transmittance signal 8a Transmissive defect extraction threshold for gray scale (upper limit) 8b Transmissive defect extraction threshold for gray level (lower limit) 9a Transmittance defect extraction threshold for transmissive portion 9b Transmissive defect extraction threshold for light-shielding part 10a Transmittance defect area 10b Transmittance defect area 11 White defect (pinhole) 11, White defect occurring in the light-shielding part 12 Black defect (J 1, dot) \\ 312 \ 2d-code \ 90-12 \ 90124053.ptd Page 18 508668 V. Description of the invention (16) 12 'Occurs on 13 Transmittance 13, Transmittance 14 Differential Letter 15a Positive 15b Negative 16 Basic Letter Black Defect in Transmitting Signal Signal Number Threshold Threshold Number Level (Noise Band)

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(2) This figure shows the method for inspecting the defect of the embodiment of the present invention. Fig. 2 (1), Fig. 3 (1), Fig. 4 (1), and (2) are diagrams illustrating one form of a transmittance defect. It is a diagram showing other forms of transmittance defects. A 5 A 1f is a diagram of yet another form of the 5 transmittance defect. == A map of the basic signal level peculiar to the step. Sectional view. Fig. '⑴ is a partial plan view'⑺ is a partial plan view of other shapes of the stepped portion. Another — part top view of other forms. 9 (5) to (5) are diagrams illustrating a conventional defect inspection method.

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Claims (1)

-— Only when applying for a patent, can I measure the abundance of the transmittance signal. ^ The person who traces the pattern formed in the mask screen is contending for the critical value of the light source and the receiving lens. 2 The transmission of the step is lacking. For the aforementioned transmittance signal, at least the threshold value of gray _ ^ ^ is set to 疋, which means that it is related to the super-sense, and the emissivity defect. ° When the threshold value is described, it is judged that the gray-scale part has penetrated. 6 · If the patent range cover is applied, it belongs to LCD Pengzao, 2 defect inspection methods, of which gray 7 · If the patent range is mq cover or display. Device manufacturing equipment. The mask is a defect inspection method for LCD system inversion ^. Among them, the gray scale 8. If the patent application is for: the mask for the manufacture of curtain or display device. The mask is a defect inspection method for LCD manufacturing. Among them, the gray scale 9. A mask defect inspection / mask & masker. The inspection method is based on the abnormal change in the defect rate of the mask pattern in the scans: // /, and ::. The transmission I 0 in the transmittance signal obtained from the pattern. As described in the scope of the patent application, the above-mentioned defect inspection method based on the transmittance A _ corresponds to the inspection of the defect made by the inspection object map 荦 s :: A, which is the basis for the inspection. The threshold value of the transport rate defect is carried out. II. For example, in the patent application scope, the front 沭 # 罝 总 4 defect inspection method of the first mask, /, 〒 Quoted that the first mask contains fine patterns and the right contains fine patterns. A photomask or package for manufacturing photomasks 1 2-A defect inspection device for photomasks, the means for detecting the transmittance signal are: \\ 312 \ 2d-code \ 90-12 \ 90l24053.ptd 508668 6. Those who apply for a patent to trace the pattern formed in the screen; The means for setting the threshold value is to set the transmission corresponding to the pattern of the object to be examined for the aforementioned transmittance signal. The critical value of the rate defect; the identification means is to judge the transmissivity defect in the pattern area when the threshold value is exceeded. ( C: \ 2D-CODE \ 90.12 \ 90124053.ptd Page 23