TW504684B - Method for producing optical information-recording medium and optical information-recording medium - Google Patents

Method for producing optical information-recording medium and optical information-recording medium Download PDF

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Publication number
TW504684B
TW504684B TW89100050A TW89100050A TW504684B TW 504684 B TW504684 B TW 504684B TW 89100050 A TW89100050 A TW 89100050A TW 89100050 A TW89100050 A TW 89100050A TW 504684 B TW504684 B TW 504684B
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Taiwan
Prior art keywords
substrate
solution
application
optical information
recording medium
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TW89100050A
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Chinese (zh)
Inventor
Yoshihisa Usami
Tomoyoshi Itaya
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Fuji Photo Film Co Ltd
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Priority claimed from JP01828799A external-priority patent/JP3987651B2/en
Priority claimed from JP17475799A external-priority patent/JP3698919B2/en
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of TW504684B publication Critical patent/TW504684B/en

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Abstract

Disclosed is a method for producing a heat mode type optical information-recording medium (D) having, on a substrate (202), a dye recording layer (204) capable of recording information by being irradiated with a laser beam, the method comprising the step of applying a dye solution for forming the dye recording layer (204) onto the substrate (202) while rotating the substrate (202), wherein a period of time, which ranges from a point of time at which application of the dye solution is started to a point of time at which a valve is fully open, is not less than 0.1 second. In order to satisfy this condition, the opening degree of a first speed controller (462) is not less than 5% and not more than 50%. Accordingly, the opening speed of the valve of a valve apparatus (408) is not less than 5% and not more than 50% with respect to the maximum speed.

Description

504684 A7 ____B7_ 五、發明說明(1 ) 發明背景 發明領域: (請先閱讀背面之注咅?事項再填寫本頁) 本發明係關於一種經由使用雷射束及光學資訊記錄介 質製造可記錄及再生資訊之熱模類型光學資訊記錄媒體之 方法。 相關技術之說明: 一般而言,使用雷射束僅可記錄資訊一次的光學資訊 記錄媒體(光碟)包括例如一次寫入型CD(所謂的CD-R)及 DVD-R。此種光學資訊記錄媒體之一優點為小量CE)可以 比較習知CD(光碟)製造以廉價的成本快速上市。此種光 學資訊記錄媒體需求隨著晚近個人電腦的普及而增加。 CD-R類型光學資訊記錄媒體之代表性構造包含一有 機染料組成的記錄層,一金屬如金組成的光反射層,及一 層樹脂製成的保護層,其以此種順序堆疊於厚度約1 ·2毫 米之透明碟形基材上(例如參考日本專利公開案第6_ 150371 號)。 經濟部智慧財產局員工消費合作社印製 DVD-R型光學資訊記錄媒體之構造包含二碟形基材( 厚度約0·6毫米)彼此層疊而各別資訊記錄面係以相對方式 向内設置。此型光學資訊記錄媒體之特色為可記錄大量資 訊。 資訊係藉照射近紅外光雷射束(雷射通常具有波長於 CD-R之例為780毫微米或DVD-R之例為635毫微米)寫入( έ己錄)於光學資訊記錄媒體。部份照射雷射束的染料記錄 層及收光線,局部溫度升南。結果,進行物理或化學變化 本紙張尺度適用中國國家標準(CNS)A4規格(2]0 X 297公釐) 4 504684 五、發明說明(2) (例如產生凹坑),及光學特性改變。如此,記錄資訊。 他方面,資訊也藉照射雷射束讀取(再生),雷射束之 波長通常係等於記錄雷射束波長。經由偵測染料記錄層之 光學特性已經改變部份(基於產生凹坑之被記錄部份)與未 改變部份(無記錄部份)間之反射比差異再生資訊。 例如,批號、製造商及光碟類型指示,指示光碟的製 造史印製於透明部份於某些案例設置於基材之内周側。2 然此種印刷形式不影響光碟本身的記錄作業,但外觀品質 相當重要。 如圖27所#,當基於有機染料之記錄層形成於前述資 訊記錄媒體之基材1000上時,旋轉基材1〇〇〇之同時,染料 溶液1002被透過喷嘴1004被施用於基材1〇〇〇上。因此,落 至基材1000之染料溶液1〇02偶爾於各方向濺散。可能於設 置於内周側的透明部份1006造成瑕疵外觀之虞。 M-濟部智慧財產局員工消費合作社印制衣 有鑑於此,如圖27之雙點鏈線顯示採用一種方法,其 中阻罩1008安裝於不欲有任何小滴黏著的表面部份。但, 每次進行施用處理時,阻罩1008表面受染料溶液1〇〇2小滴 玷污。虽污 >貝乾燥時變成灰塵錢散。因此理由故,可能造 成此種製程引發缺陷的新問題。 於前述熱模類型光學資訊記錄媒體案例,雷射束之執 跡伺服器係基於推拉信號進行。 推拉信號經處理因此當凹槽偏差〇1微米時所得信號 強度係以,例如CD-R案例之反射比信號強度規度化。此 項程序進行如後。換言之,當執跡偏差時獲得的推拉信號 本紙張尺度適用中國國家標準(CNS)A4規格(2】0 X 297公爱)504684 A7 ____B7_ V. Description of the invention (1) Background of the invention Field of the invention: (Please read the note on the back? Matters before filling out this page) The present invention relates to a recordable and reproducible product made by using a laser beam and an optical information recording medium Information of the thermal mode type Optical information recording media method. Description of related technology: Generally, optical information recording media (optical discs) that can record information only once using a laser beam include write-once CDs (so-called CD-Rs) and DVD-Rs. One of the advantages of such an optical information recording medium is that a small amount of CE) can be compared to the conventional CD (Compact Disc) manufacturing and quickly come to market at low cost. The demand for such optical information recording media has increased with the recent spread of personal computers. The representative structure of a CD-R type optical information recording medium includes a recording layer composed of an organic dye, a light reflection layer composed of a metal such as gold, and a protective layer made of resin, which are stacked in this order at a thickness of about 1 · 2 mm on a transparent dish-shaped substrate (for example, refer to Japanese Patent Publication No. 6-150371). The structure of the DVD-R optical information recording medium printed by the Employees' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs includes two disc-shaped substrates (about 0.6 mm thick) stacked on top of each other and the respective information recording surfaces are set inwardly in a relative manner. This type of optical information recording medium is characterized by being capable of recording a large amount of information. Information is written (recorded) on an optical information recording medium by irradiating a near-infrared laser beam (a laser usually has a wavelength of 780 nm in the case of CD-R or 635 nm in the case of DVD-R). Partially irradiated with the laser recording layer and received light, the local temperature rose to the south. As a result, physical or chemical changes are made. The paper size applies the Chinese National Standard (CNS) A4 specification (2) 0 X 297 mm. 4 504684 V. Description of the invention (2) (such as the generation of pits) and changes in optical characteristics. So, record the information. In other respects, information is also read (reproduced) by illuminating the laser beam, which is usually equal to the wavelength of the recorded laser beam. The information is reproduced by detecting the difference in reflectance between the optical characteristics of the dye recording layer that have changed (based on the recorded portion where the pits are generated) and the unchanged portion (non-recorded portion). For example, the batch number, manufacturer, and disc type indication indicate that the manufacturing history of the disc is printed on the transparent part and is placed on the inner peripheral side of the substrate in some cases. 2 Although this printing form does not affect the recording operation of the disc itself, the appearance quality is very important. As shown in FIG. 27, when a recording layer based on an organic dye is formed on the substrate 1000 of the aforementioned information recording medium, the substrate 100 is rotated while the dye solution 1002 is applied to the substrate 1 through the nozzle 1004. 〇〇 上. Therefore, the dye solution 1002 falling on the substrate 1000 is occasionally scattered in all directions. The transparent portion 1006 provided on the inner peripheral side may cause a flawed appearance. In view of this, M-JB ’s Intellectual Property Bureau employee clothing prints clothing. In view of this, as shown in the two-dot chain line in Figure 27, a method is adopted in which the mask 1008 is installed on the surface portion where no droplets are expected to adhere. However, each time the application treatment is performed, the surface of the mask 1008 is contaminated with droplets of the dye solution 1002. Although dirty > Shell becomes dusty when it dries. For this reason, it may cause new problems caused by such processes. In the aforementioned thermal mode type optical information recording media case, the tracking server of the laser beam is based on a push-pull signal. The push-pull signal is processed so that the signal intensity obtained when the groove is deviated by 0.1 micron is normalized, for example, the reflectance signal intensity of the CD-R case. This procedure is carried out as follows. In other words, the push-pull signal obtained when the track deviation is inaccurate. The paper size applies the Chinese National Standard (CNS) A4 specification (2) 0 X 297 public love.

五、發明說明(3 振幅經測量獲得計算值。 推拉信號用於軌跡伺服器,.於使用雷射束沿以凹槽規 則性執行掃描時約於零準位。當雷射束由一凹槽朝向外周 侧或内周側偏轉時,推拉信號係於對應偏差量的準位。雷 射束係朝向外周側或内周側偏轉可由信號極性得知。 因此’當監視推拉信號準位變化時,可使用雷射束對 凹槽執行軌跡伺服器,也可接達預定執跡位置。 習知光學資訊記錄媒體製造如後。換言之,當於基材 上形成基於有機染料之記錄層時,於旋轉基材的同時染料 容易施用於基材上。特別,染料溶液係於基材以恆定轉數 旋轉之同時施用,而於該施用係對基材之外周側或内周侧 執行無關。 因此理由故,施用染料之薄膜厚度變成於基材之内周 側較厚。因此,例如於某些案例軌跡伺服器之推拉信號之 ^號強度減低,有關基材徑向方向至推拉信號準位分散性 也增高。此種情況下,高度可能出現雷射束之軌跡偏轉。 膜厚度、推拉信號及反射比無需經常為恆定。但,通 ¥維持下列折衷關係。換言之,當推拉信號由於膜厚度變 化而增兩時,反射比降低。 他方面,推拉信號之信號強度增高係基於反射比的過 度降低。此種情況下出現不變,在於由於再生信號振幅過 度下降而可能出現讀取錯誤。 染料溶液成本占光碟材料總成本之約3〇%。因此,為 了降低光碟製造成本,需要儘可能減低染料溶液施用於基 本紙張尺度適用中國國家標準(CNS)A4規格(2】0 X 297公釐) --------—----- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印制衣 6 ^04684 A7 B7 經濟部智慧財產局員工消費合作社印制衣 五、發明說明(4 ) 材之施用量。 若染料溶液之施用量減低,則出現下列問題。換言之 ,内周邊施用部形狀受妨礙,染料膜厚度分布(於周邊方 向)低劣,且出現未施用部份。 可利用下列技術俾降低染料溶液施用量。但各技術皆 有問題。 (1) 洩放壓力降低。此種技術涉及下述問題。換言之 ’即使染料溶液施用於基材上,染料液係以所謂的球形流 動’染料液球滾動於基材上且由基材落下。結果,無法將 染料液均勻施用於基材全體表面上。此種情況下,出現問 題為出現非施用部份,亦即薄膜厚度不均勻。 (2) 於一段縮短的時間内進行施用。此種技術涉及下 列問越。換g之’染料以未分布於全體基材上,出現的問 題包括發生未施用部份以及薄膜厚度不均勻。 (3) 於基材之内圓周噴嘴停止一段短時間。此項技術 涉及下列問題。換言之,施用部於最内周邊形狀受干擾, 被形成完美的圓。又於此例中,膜厚度不均勻。 (4) 喷嘴以快速移動。此項技術涉及下列問題。換言 之,即使染料液施用於基材上,染料液隨後係以所謂的球 形移動,滾動於基材上且由基材落下。結果,無法均勻施 用染料液於全體基材表面上。此例出現之問題為發生未施 用部份以及薄膜厚度不均勻。 發明概述 本發明將前述問題列入考慮,本發明之目的係提供一 本紙張尺度適用中國國豕標準(CNS)A4規格(21〇 X 297公爱) ---- ----^------I--^ (請先閱讀背面之注意事項再填寫本頁)V. Description of the invention (3 The amplitude is calculated by measurement. The push-pull signal is used for the trajectory server. It is approximately zero when the laser beam is used to perform scanning with the groove regularity. When the laser beam consists of a groove When deflected toward the outer or inner peripheral side, the push-pull signal is at the level corresponding to the amount of deviation. The laser beam is deflected toward the outer or inner peripheral side by the signal polarity. Therefore, 'When monitoring the push-pull signal level change, The laser beam can be used to perform a trajectory server on the groove, and it can also reach the predetermined track position. The conventional optical information recording medium is manufactured as follows. In other words, when a recording layer based on an organic dye is formed on the substrate, it is rotated. The dye is easily applied to the substrate at the same time. In particular, the dye solution is applied while the substrate rotates at a constant number of revolutions, and the application is performed regardless of the outer or inner peripheral side of the substrate. The thickness of the film to which the dye is applied becomes thicker on the inner peripheral side of the substrate. Therefore, for example, in some cases, the intensity of the ^ signal of the push-pull signal of the track server is reduced, and the radial direction of the relevant substrate to the push-pull signal The level dispersion is also increased. In this case, the trajectory of the laser beam may be deflected. The film thickness, the push-pull signal, and the reflection ratio need not always be constant. However, the following compromise relationship is maintained through ¥. In other words, when the push-pull signal is due to When the film thickness changes and increases by two, the reflectance decreases. On the other hand, the increase in the signal strength of the push-pull signal is based on the excessive decrease in the reflectance. In this case, the same change occurs because the read signal may have read errors due to excessive reduction in the amplitude of the reproduced signal. The cost of the dye solution accounts for about 30% of the total cost of the disc material. Therefore, in order to reduce the manufacturing cost of the disc, it is necessary to reduce the dye solution as much as possible. The basic paper size is applicable to the Chinese National Standard (CNS) A4 specification (2) 0 X 297 (Li) --------—----- (Please read the notes on the back before filling out this page) Printed clothing for the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 6 ^ 04684 A7 B7 Intellectual Property Bureau of the Ministry of Economic Affairs Printing of clothing by employee consumer cooperatives V. Description of invention (4) Application amount of materials. If the application amount of the dye solution is reduced, the following problems arise. In other words, internal The shape of the side application part is obstructed, the dye film thickness distribution (in the peripheral direction) is poor, and unapplied parts appear. The following techniques can be used to reduce the amount of dye solution application. However, each technique has problems. (1) Relief pressure is reduced This technique involves the following problems. In other words, even if the dye solution is applied to a substrate, the dye solution rolls on the substrate in a so-called spherical flow and the dye solution drops from the substrate. As a result, the dye solution cannot be uniformed. Apply to the entire surface of the substrate. In this case, the problem is the occurrence of non-applied parts, that is, the thickness of the film is uneven. (2) Apply within a shortened period of time. This technique involves the following problems. G's dye is not distributed on the entire substrate, and problems include the occurrence of unapplied parts and uneven thickness of the film. (3) The nozzles on the inner circumference of the substrate stop for a short time. This technique involves the following issues. In other words, the shape of the application portion is disturbed at the innermost periphery and is formed into a perfect circle. Also in this example, the film thickness is not uniform. (4) The nozzle moves quickly. This technique involves the following issues. In other words, even if the dye liquid is applied to the substrate, the dye liquid subsequently moves in a so-called spherical shape, rolls on the substrate, and falls from the substrate. As a result, the dye solution cannot be uniformly applied to the entire substrate surface. The problems in this example are the occurrence of unapplied parts and uneven film thickness. SUMMARY OF THE INVENTION The present invention takes the aforementioned issues into consideration. The object of the present invention is to provide a paper size that is applicable to the Chinese National Standard (CNS) A4 specification (21 × X 297). ---- -------- ---- I-^ (Please read the notes on the back before filling this page)

、發明說明( 經 濟 部 智 慧 財 產 局 員 工 消 費 合 作 社 印 製 換 言之 種製造光學資訊記錄媒體之方法,其中藉由防止染料液的 濺散可避免瑕疵外觀的出現,且·可改良光學資訊記錄媒體 產率。 本發明將刖述問題列入考慮,另一目的係提供一種製 造光學資訊記錄媒體之方法,其中推拉信號準位於徑向方 向之分布降低,推拉信號之信號強度係於規定範圍内,可 生產具有高品質之光學資訊記錄媒體。 本發明之又另一目的係提供一種製造光學資訊記錄媒 體之方法,其中即使使用小量溶液仍可獲得絕佳最内施用 部份形狀,可於基材全體表面上形成均勻施用的染料膜, 以及可生產高品質光學資訊記錄媒體。 本發明之又另一目的係提供一種高品質光學資訊記錄 媒體,其中即使使用小量溶液仍可於最内施用部份形成絕 佳形狀’及於基材全體表面上形成均勻施用的染料膜。 本發明係關於一種製造熱模類型光學資訊記錄媒體之 方法,媒體於一基材上有一記錄層其可藉照射雷射束記錄 資訊,該方法包含於旋轉基材之同時施用形成記錄層之溶 液於基材上的步驟,其中由施用溶液開始的時間點至溶液 施用速度為恆定之時間點之一段時間,較佳不少於〇·丨秒 而不多於1秒。本發明中,開始施用溶液之時間點表示溶 液開始由喷嘴前方洩放之時間點。 通常’溶液之洩放量由開始施用溶液之時間點隨經過 的時間有過渡性改變,最終固定(穩定)於恆定沒放量 始於溶液開始施用之時間點至於施用速度為恆定 -----------------1 ^--------- (請先閱讀背面之注意事項再填寫本頁)、 Explanation of the invention (Printed in other words, a method for manufacturing optical information recording media by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economics, in which the appearance of flaws can be avoided by preventing the splash of the dye solution, and the yield of optical information recording media can be improved The present invention takes the description into consideration, and another object is to provide a method for manufacturing an optical information recording medium, in which the distribution of the push-pull signal quasi-radial direction is reduced, and the signal strength of the push-pull signal is within a specified range, and can be produced. High-quality optical information recording medium. Yet another object of the present invention is to provide a method for manufacturing an optical information recording medium, in which the shape of the innermost application part can be obtained even with a small amount of solution, which can be applied to the entire substrate. A uniformly applied dye film is formed on the surface, and a high-quality optical information recording medium can be produced. Another object of the present invention is to provide a high-quality optical information recording medium in which the innermost application portion can be applied even with a small amount of solution. 'Form a perfect shape' and shape on the entire surface of the substrate The invention relates to a method for uniformly applying a dye film. The present invention relates to a method for manufacturing a thermal mode type optical information recording medium. The medium has a recording layer on a substrate and can record information by irradiating a laser beam. The method includes rotating the substrate while The step of applying the recording layer-forming solution on the substrate, wherein a period of time from the time point when the solution application is started to the time point when the solution application rate is constant, is preferably not less than 0.1 seconds and not more than 1 second. In the present invention, the time point at which the solution is started to be applied means the time point at which the solution starts to be discharged from the front of the nozzle. Generally, the amount of solution released changes from the time point at which the solution is started to application to the time elapsed. Constant no-load starts at the time point when the solution starts to be applied. As for the application rate is constant ------------------ 1 ^ --------- (Please read the (Please fill in this page again)

504684 A7 B7 經濟部智慧財產局員工消費合作社印制衣 五、發明說明(6 ) 之一段時間」表示由開始施用溶液至溶液之洩放量固定( 穩定)為常數之一段時間。 當該段時間不少於0J秒而不大於1秒時,於溶液落至 基材上的時間點可避免溶液於各方向濺散,可防止發生任 何瑕疵外觀。如此導致光學記錄媒體之產率改良。 當前述製法係使用闊裝置,依據閥的開閉執行及停止 溶液浅放至基材上進行時,該方法的達成閥開啟速度相對 於最大速度不小於5%而不大於50%。換言之,洩放溶液 之閥裝置之閥開之速度較佳調整為低。 當控制供給閥裝置之流體流速的速度控制器利用流體 壓力來開閉閥時,決定流體流速之速度控制其開啟程度較 佳不小於5%而不大於50%。 溶液可為含染料之有機溶劑。開始施用位置較佳於基 材上。較佳開始施用位置與位在基材内周側的非施用部份 隔開不少於5亳米。換言之,較佳開始施用位置係位在距 離意圖形成為記錄層該區之内周側末端朝向外圓周偏轉不 少於5毫米的位置。 當開始施用位置與位在基材内周側之非施用部份充份 隔開時,即使溶液被濺散也不會出現問題,理由如下。換 言之,濺散小滴於隨後執行的施用過程流走。 恰於施用開始後,溶液洩放量根據經過的時間過渡性 改變而不穩定。因此,較佳施用係始於略為與最内圓周隔 開的位置。若施用係始於最内圓周,則造成施用不均勻問 題。結果,記錄層之内周端無法形成為完美的圓。 ----—— — — — —--1 --------訂·!----I (請先閱讀背面之注意事項再填寫本頁)504684 A7 B7 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. The period of time for the invention description (6) "means the period from when the solution is applied until the release of the solution is fixed (stable) to be constant. When the period of time is not less than 0J seconds but not more than 1 second, the time when the solution falls on the substrate can prevent the solution from being scattered in all directions, and can prevent any defective appearance. This leads to an improvement in the yield of the optical recording medium. When the aforementioned manufacturing method uses a wide device, the valve is opened and closed according to the opening and closing of the valve and the solution is shallowly placed on the substrate. The valve opening speed of the method is not less than 5% and not more than 50% of the maximum speed. In other words, the valve opening speed of the valve device for releasing the solution is preferably adjusted to be low. When the speed controller that controls the fluid flow rate of the supply valve device uses the fluid pressure to open and close the valve, the speed of the fluid flow rate control is preferably not less than 5% and not more than 50%. The solution may be a dye-containing organic solvent. The application start position is preferably on the substrate. It is preferable that the application start position is separated from the non-application part on the inner peripheral side of the substrate by not less than 5 mm. In other words, it is preferable that the application start position is a position deflected by not less than 5 mm from the end of the inner peripheral side of the area intended to form the recording layer toward the outer periphery. When the application start position is sufficiently separated from the non-application part located on the inner peripheral side of the substrate, there is no problem even if the solution is scattered, for the following reasons. In other words, the scattered droplets flow away during the subsequent application process. Just after the start of the application, the amount of solution bleed was transiently unstable depending on the elapsed time. Therefore, the preferred application starts at a position slightly spaced from the innermost circumference. If the application system starts from the innermost circumference, it causes a problem of uneven application. As a result, the inner peripheral end of the recording layer cannot be formed into a perfect circle. ----—— — — — —-- 1 -------- Order ·! ---- I (Please read the notes on the back before filling this page)

9 A7 B7 五、發明說明(7 从一旦施用開始時,隨後至少—次喷嘴朝向内周側移動 。藉此,記錄層之内周端形成為完美的圓。 但若施用係始於位在基材外部位置,當喷嘴献鄰基材 之外周端時,洛液於各方向濺散。結果,出現施用部鄰近 被玷染問題,溶液黏著於基材背面。 因此,施用開始位置較佳位於基材上,更佳位於由基 材外周邊朝向内圓周偏轉不少於5毫米也置。進一步,施 用開始位置由位在基材内周侧之非施甩部份朝向外圓周偏 轉不少於5毫米,較佳不少於1〇毫米及更佳不少於15毫米 較佳施加於溶液之壓力不大於丨千克力/平方厘米。通 常,當溶液施用於基材時,若突然開始洩放溶液,則溶液 於各方向濺散。但,當施加於溶液之壓力小時,溶液較不 會如此嚴重減少。因此,不會發生例如外觀瑕疵等問題。 線 但,若壓力過低,則每單位施加之洩放量下降,施用 速度緩慢。因此,施用規定量溶液須耗費長時間。結果, 可能造成產出量的減低及生產效率下降等問題。 因此,如前述,施加於溶液之壓力之較佳範圍上限不 超過1千克力/平方厘米,較佳不超過0·8千克力/平方厘米 ,及最佳不超過0.6千克力/平方厘米。下限不少於〇〇2千 克力/平方厘米,較佳不少於〇.〇5千克力/平方厘米及最佳 不少於0.1千克力/平方厘米。 刖述方法中’也較佳施用溶液於基材的喷嘴係朝向美 材之内圓周移動,基材轉數增高。 本纸張尺度適用中國國家標準(CNS)A4規格(2]〇χ297公釐) 經濟部智慧財產局員工消費合作社印i衣 504684 ’ Α7 ----Β7 五、發明說明(8 ) 如此’於内圓周施用部份形狀即使於溶液用量小時仍 可為絕佳。進一步,可於基材全體表面上形成均勻一致施 用薄膜。如此,可製造高品質光學資訊記錄媒體。 此種方法中,較佳溶液的施用係始於基材外圓周。特 別’溶液之施用係始於位在距離基材中心之半徑3/4位置 向外部份,較佳始於位在5/6位置向外部份,及最佳始於 位在9/10位置向外部份,理由如後。換言之,若溶液僅施 用於内周邊部,溶液無法分布於基材全體表面上。結果, 外圓周之薄膜厚度分布低劣。 當溶液施用於基材外圓周時,基材轉數不超過3〇〇 rpm ’較佳不超過250 rpm及最佳不超過200 rpm,理由如後。 換言之,當溶液施用於外圓周時若轉數大,則溶液的表現 如同球體傾向於滾動及落下。結果,溶液施用於基材不完 ° 前述方法中,溶液係經由使用噴嘴不大於1 .〇大氣壓 | ’較佳不大於.0.7大氣壓及最佳不大於〇·5大氣壓之壓力下 施用’理由如後。換言之,若壓力高,則溶液流速增高, 溶液用量增加,結果製造成本昂貴。當噴嘴直徑加大兩倍 時’壓力為前述數值之1/4。當噴嘴直徑為1/2時,壓力較 佳為前述數值的4倍。 前述方法中,溶液係經由使用噴嘴以不大於〇.5 cc/ 秒’較佳不大於0.3 cc/秒及最佳不大於〇·2 cc/秒之流速 施用,理由如後。換言之,若溶液係於大流速施用,則染 料液用量增加,生產成本昂貴。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ΙΙΙΙΙΙΙΙΙΙΙΙ — -HI — — —— ^ ·11111111 (請先閱讀背面之注意事項再填寫本頁) 11 Α7 Β7 經濟部智慧財產局員工消費合作社印製 五、發明說明(9 ) 刖述方法中,當溶液施用於基材之内圓周時,基材轉 數不小於每分鐘300轉,較佳不小於每分鐘35〇轉及最佳不 小於每分鐘400轉,理由如後。換言之,若轉數少,則内 圓周之施用部份形狀實質上非為完美圓形,記錄層厚度不 均勻。噴嘴須於内圓周至少停止對應於一轉的一段時間。 此種情況下,若轉數小,則喷嘴的停止時間延長。結果, 出現溶液洩放量增加問題。因此,轉數較佳設定於前述轉 數範圍。 月'J述方法中,當溶液施用於基材之内圓周時使用的基 材轉數調整為比溶液施用於基材外圓周時施用的轉數大, 不少於50轉。前者較佳大於後者不少於100轉及最佳不少 於200轉。 此種方法中,基材轉數增高時間設定為恰在喷嘴到達 最内圓周之前。特別,基材轉數增高階段位在喷嘴到達距 基材之内圓周小於2〇毫米距離位置階段,較佳於喷嘴到達 與基材内圓周隔開距離小於丨〇毫米位置階段,及最佳於喷 嘴到達與基材内圓周隔開小於5毫米距離位置階段。 前述方法中’較佳空調空氣相對於基材施用面速度設 定為不大於約〇·4米/秒。 也較佳組合下列程序,一種程序其中當施用溶液於基 材之喷嘴有基材内圓周朝向外圓周移動時,基材轉數增高 及另種程序其中當施用溶液於基材之噴嘴朝向基材内 圓周移動時,基材轉速增高。 另特徵方面’本發明在於一種熱模類型光學資訊記 本紙張尺度適用中國國家標⑵〇 χ 297公爱) -—1 -12 - -l· —----------------—訂---------線 ί請先閱讀背面之注意事項再填寫本頁} 經濟部智慧財產局員工消費合作社印製 504684 ’ ' Α7 ______ Β7 五、發明說明(1〇) 錄媒體,包含於一基材上有一記錄層可藉照射雷射束記錄 資訊,其中記錄層係經由施用形成記錄層之溶液於基材上 同時旋轉基材形成,以及記錄層之形成方式係施用溶液, 故當溶液施用於基材之内周側時基材轉數增高。 如此,可獲得高品質光學資訊記錄媒體,其中即使使 用小量溶液,内圓周形狀絕佳,於基材全體表面上可形成 均勻施用的染料膜。 前述及其它本發明之目的、特色及優點當連同附圖研 項後文說明時將更為彰顯,附圖中舉例說明本發明之較佳 具體實施例。 圖式之簡單說明 第1圖顯示根據本發明之具體實施例之製造系統配置 例; 第2圖顯示安裝於施用設備之旋圖裝置配置; 第3圖顯示透視圖舉例說明安裝於施用設備之旋圖裝 丨置; 第4圖顯示組構旋圖裝置之溶液供應裝置之配置; 第5圖顯示特徵曲線舉例說明由閥裝置洩放之溶液量( 洩放量)隨時間之經過之變化; 第ό圖為平面圖舉例說明閥裝置之喷嘴; 第7圖為側視圖舉例說明閥裝置之噴嘴例; 第8圖為部份刪除之放大剖面圖,舉例說明閥裝置之 另一噴嘴例; 第9圖為平面圖舉例說明空調系統; 本紙張尺度適用中國國雜準(CNS)A4規格(21GX 297公f ) I-----» - — — — — III ^ ---I----線 (請先閱讀背面之注意事項再填寫本頁) 13 經濟部智慧財產局員工消費合作社印製 )〇4684 A7 —--- B7 ____ 五、發明說明(11 ) 第10圖為前視圖舉例說明空調系統; 第11圖為側視圖舉例說明空調系統; 第12圖顯示空調系統之排氣裝置連同重疊座標排氣管 線之配置; ‘ 第13圖為剖面圖舉例說明安裝於排氣裝置之緩衝箱之 配置; 第14圖為方塊圖舉例說明空調機之配置; 第15 A圖為生產步驟舉例說明一凹槽形成於基材之狀 態; 第15B圖為生產步驟舉例說明一染料記錄層形成於基 材之狀態; 第15C圖為生產步驟舉例說明一反光層形成於基材之 狀態; 第16A圖為生產步驟舉例說明基材緣部被洗滌狀態; 第16B圖為生產步驟舉例說明保護層形成的基材之狀 態; 第17圖為方塊圖舉例說明根據本發明之具體實施例經 由使用生產系統將染料液施用於基材時進行的第一製程步 驟; 第18圖為方塊圖舉例說明根據本發明之具體實施例經 由使用生產系統將染料液施用於基材時進行的第二製程步 驟; 第19圖舉例说明於弟二方法提兩基材轉數之時序圖· 第20圖舉例說明基材之開始施用位置; l·-------------------訂--------- (請先閱讀背面之注意事項再填寫本頁)9 A7 B7 V. Description of the invention (7 From once the application is started, the nozzle is then moved at least once toward the inner peripheral side. This way, the inner peripheral end of the recording layer is formed into a perfect circle. But if the application system starts at the base Outside the substrate, when the nozzle is adjacent to the outer periphery of the substrate, the liquid splashes in all directions. As a result, the problem of the adjacent application part being stained and the solution sticking to the back of the substrate. Therefore, the application start position is preferably located on the substrate. On the material, it is better to deflection by not less than 5 mm from the outer periphery of the substrate toward the inner circumference. Further, the application start position is deflected by not less than 5 toward the outer periphery from the non-casting portion located on the inner periphery of the substrate. Mm, preferably not less than 10 mm and more preferably not less than 15 mm, preferably the pressure applied to the solution is not more than 丨 kgf / cm². Generally, when the solution is applied to a substrate, the solution suddenly starts to release. , The solution splashes in all directions. However, when the pressure applied to the solution is small, the solution is less severely reduced. Therefore, problems such as appearance defects do not occur. Line However, if the pressure is too low, it is applied per unit Of The amount of solution decreases and the application rate is slow. Therefore, it takes a long time to apply the prescribed amount of solution. As a result, problems such as reduction of output and production efficiency may be caused. Therefore, as mentioned above, the upper limit of the preferred range of pressure applied to the solution is not More than 1 kgf / cm2, preferably not more than 0.8 kgf / cm2, and most preferably not more than 0.6 kgf / cm2. The lower limit is not less than 0.02 kgf / cm2, preferably a lot At 0.05 kgf / cm2 and preferably not less than 0.1 kgf / cm2. In the method described above, it is also preferred that the nozzle for applying the solution to the substrate moves toward the inner circumference of the material, and the substrate rotates. The paper size is in accordance with the Chinese National Standard (CNS) A4 specification (2) 0297 mm. The Intellectual Property Bureau of the Ministry of Economic Affairs ’s Consumer Cooperatives printed 504684 'Α7 ---- B7 V. Description of the invention (8) In this way, the shape of the part applied on the inner circumference can be excellent even when the amount of solution is small. Furthermore, a uniform application film can be formed on the entire surface of the substrate. In this way, a high-quality optical information recording medium can be manufactured In this method, the application of the preferred solution starts at the outer circumference of the substrate. In particular, the application of the solution begins at an outward portion located at a radius of 3/4 from the center of the substrate, and preferably begins at The 5/6 position is the outward part, and the best start is at the 9/10 position, the reason is as follows. In other words, if the solution is only applied to the inner peripheral part, the solution cannot be distributed on the entire surface of the substrate. As a result, the thickness distribution of the film on the outer circumference is poor. When the solution is applied to the outer circumference of the substrate, the substrate rotation number does not exceed 300 rpm, preferably does not exceed 250 rpm, and most preferably does not exceed 200 rpm, for reasons as described below. When the solution is applied to the outer circumference, if the number of revolutions is large, the solution behaves like a sphere tends to roll and fall. As a result, the solution is not applied to the substrate. ° In the foregoing method, the solution is not more than 1.0 atmosphere by using a nozzle. | The reason for 'preferably no greater than .0.7 atmospheres and most preferably no greater than 0.5 atmospheres' is as follows. In other words, if the pressure is high, the solution flow rate increases, and the amount of solution increases, resulting in expensive manufacturing costs. When the nozzle diameter is doubled, the pressure is 1/4 of the aforementioned value. When the nozzle diameter is 1/2, the pressure is preferably 4 times the aforementioned value. In the foregoing method, the solution is applied through the use of a nozzle at a flow rate of not more than 0.5 cc / second ', preferably not more than 0.3 cc / second, and most preferably not more than 0.2 cc / second, for reasons described below. In other words, if the solution is applied at a large flow rate, the amount of the dye solution is increased, and the production cost is expensive. This paper size applies to Chinese National Standard (CNS) A4 (210 X 297 mm) ΙΙΙΙΙΙΙΙΙΙΙΙΙ — -HI — — — ^ 11111111 (Please read the notes on the back before filling this page) 11 Α7 Β7 Intellectual Property of the Ministry of Economic Affairs Printed by the Bureau ’s Consumer Cooperatives V. Description of Invention (9) In the stated method, when the solution is applied to the inner circumference of the substrate, the substrate rotation speed is not less than 300 revolutions per minute, preferably not less than 35 revolutions per minute and The best is not less than 400 revolutions per minute, the reason is as follows. In other words, if the number of revolutions is small, the shape of the applied portion on the inner circumference is not substantially perfect, and the thickness of the recording layer is not uniform. The nozzle must stop on the inner circumference for at least a period of time corresponding to one revolution. In this case, if the number of revolutions is small, the stop time of the nozzle is extended. As a result, a problem arises in that the amount of solution leakage increases. Therefore, the number of revolutions is preferably set in the aforementioned range of revolutions. In the method described above, the number of revolutions of the substrate when the solution is applied to the inner periphery of the substrate is adjusted to be greater than the number of revolutions applied when the solution is applied to the outer periphery of the substrate, and is not less than 50 revolutions. The former is preferably greater than the latter by not less than 100 revolutions and the best by not less than 200 revolutions. In this method, the time for increasing the number of revolutions of the substrate is set just before the nozzle reaches the innermost circumference. In particular, the increase in the number of rotations of the substrate is at the stage where the nozzle reaches a distance of less than 20 mm from the inner circumference of the substrate, which is preferably the stage when the nozzle reaches a distance less than 10 mm from the inner circumference of the substrate, and is most preferably The nozzle reaches the stage where the distance from the inner circumference of the substrate is less than 5 mm. In the aforementioned method, 'the preferred air-conditioned air speed relative to the substrate application surface speed is set to not more than about 0.4 m / sec. It is also preferable to combine the following procedures. One of the procedures is to increase the number of rotations of the substrate when the nozzle applying the solution to the substrate has the inner circumference of the substrate moving toward the outer circumference. When the inner circumference moves, the rotation speed of the substrate increases. Another characteristic aspect of the present invention is that the paper size of a thermal mode type optical information notebook paper is applicable to the Chinese national standard ⑵〇χ 297 public love)-1 -12--l · -------------- ----— Order --------- Line ί Please read the notes on the back before filling out this page} Printed by the Intellectual Property Bureau Employee Consumer Cooperative of the Ministry of Economic Affairs 504684 '' Α7 ______ Β7 V. Description of the invention ( 1) A recording medium includes a recording layer on a substrate for recording information by irradiating a laser beam, wherein the recording layer is formed by applying a solution for forming a recording layer on the substrate while rotating the substrate, and forming the recording layer. Since the solution is applied, the number of revolutions of the substrate increases when the solution is applied to the inner peripheral side of the substrate. In this way, a high-quality optical information recording medium can be obtained in which even if a small amount of solution is used, the inner circumferential shape is excellent, and a uniformly applied dye film can be formed on the entire surface of the substrate. The foregoing, and other objects, features, and advantages of the present invention will become more apparent when described later in conjunction with the drawings, which illustrate the preferred embodiments of the present invention by way of example. Brief Description of the Drawings Figure 1 shows a configuration example of a manufacturing system according to a specific embodiment of the present invention; Figure 2 shows a configuration of a rotary device installed on an application device; Figure 3 shows a perspective view illustrating a rotary device installed on an application device Figure installation; Figure 4 shows the configuration of the solution supply device of the group rotary device; Figure 5 shows the characteristic curve to illustrate the change in the amount of solution (bleeding amount) released by the valve device over time; The figure is a plan view illustrating the nozzle of the valve device; FIG. 7 is a side view illustrating the example of the nozzle of the valve device; FIG. 8 is a partially deleted enlarged sectional view illustrating another example of the nozzle of the valve device; and FIG. 9 is The floor plan illustrates the air-conditioning system as an example; this paper size is applicable to China National Standard (CNS) A4 (21GX 297 male f) I ----- »--— — — III ^ --- I ---- line (please Read the notes on the back before filling this page) 13 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 〇 4684 A7 ----- B7 ____ V. Description of the invention (11) Figure 10 shows the air-conditioning system as an example from the front view; Figure 11 is a side view Exemplify the air-conditioning system; Figure 12 shows the configuration of the exhaust system of the air-conditioning system with overlapping coordinate exhaust lines; 'Figure 13 is a cross-sectional view illustrating the configuration of the buffer box installed in the exhaust device; Figure 14 is a block diagram Illustrate the configuration of the air conditioner as an example; Figure 15A is a production step illustrating the state where a groove is formed on the substrate; Figure 15B is a production step illustrating the state where a dye recording layer is formed on the substrate; Figure 15C is production The steps illustrate a state in which a reflective layer is formed on the substrate; FIG. 16A is a production step illustrating the state of the substrate edge being washed; FIG. 16B is a production step illustrating the state of the substrate formed by the protective layer; FIG. 17 is The block diagram illustrates a first process step when a dye solution is applied to a substrate by using a production system according to a specific embodiment of the present invention. FIG. 18 is a block diagram illustrating a process of applying a dye solution to a substrate according to a specific embodiment of the present invention by using a production system. The second process step when the dye solution is applied to the substrate; Figure 19 illustrates the timing diagram of how to increase the number of revolutions of the two substrates in the second method. Figure 2 Figure 0 illustrates the starting application position of the substrate; l · ------------------- Order --------- (Please read the precautions on the back first (Fill in this page again)

14 Α7 Β7 經濟部智慧財產局員工消費合作社印制衣14 Α7 Β7 Printing of clothing by employees' cooperatives in the Intellectual Property Bureau of the Ministry of Economic Affairs

五、發明說明(12) 第21圖舉例說明進行第二方法時位在最内圓周之施用 部形狀; 第22圖為配置圖舉例說明根據本發明之另一具體實施 例之另一生產系統例; 第23圖為表舉例說明第一實驗結果; 第24圖為表舉例說明第二實驗結果; 第25圖為表舉例說明第三實驗結果; 第26圖舉例說明於比較例14及15所得位於内圓周之施 用部份形狀;以及 第27圖舉例說明當染料液被施用時引起染料液賤散。 較佳具體實施例之說明 將參照第1至27圖對具體實施例做說明,其中製造光 學資訊記錄媒體之方法,對基於染料之光碟施用染料之方 法,及根據本發明之光學資訊記錄媒體,例如應用至一種 製造光碟如CD-R系統(後文簡稱為「根據本發明之製造系 統」)。 如第1圖所示,根據本發明之具體實施例之製造系統1〇 包含二模製設備(第一及第二模製設備1·2Α,12B)用以例 如藉注塑、壓塑或射出壓塑製造基材,形成染料記錄層於 基材之施用設備14係經由施用染料施用液於基材的第一主 面上接著乾燥,及後處理設備16係利用例如濺鍍形成一反 光層於基材之染料記錄層上,及然後施用可紫外光固化溶 液於反光層上,接著照射紫外光形成保護層於反光層上。 第一及第二模製設備12Α及12Β各自包括一模製機20 本紙張尺度適用中國國家標準(CNS)A4規格(2】〇x297公釐) -------------^---------^ <請先閱讀背面之注意事項再填寫本頁) 15 五 經 濟 部 智 慧 財 產 局 員 工 消 費 合 作 社 印 製 、發明說明(13) 用以進行樹脂材料,如聚碳酸酯之注塑、壓塑或射出壓塑 而生產基材,於基材之第—主面上形成有執跡槽或不規則 (凹槽)來指示資訊如位址信號,·一冷卻區段22用以冷卻由 核製機20取出的基材;及一堆疊區段26(堆疊柱轉臺)安裝 夕根堆疊柱24用以堆疊及存放冷卻後的基材。 施用設備14包含三個處理單元3〇,32,34 ^第一處理 單几30包括一堆疊柱容納區段4〇用以容納由第一及第二模 製设備12A,12B轉運來的堆疊柱24; —第一轉運機構42 用以由容納於堆疊柱容納區段40之堆疊柱24逐一提取基材 而轉運基材至次一步驟;及靜電吹送機構44用以由藉第一 轉運機構42轉運的基材去除靜電。 線 第二處理單元32包括第二轉運機構46用以循序轉運已 經於第一處理單元30完成靜電吹送步驟的基材至次一步驟 •,以染料施用機構48用以施用染料施用液至分別藉第二轉 運機構46轉運的複數基材;以及一第三轉運機構50用以將 已經完成染料施用處理基材逐一轉運至次一步驟。染料施 用機構48包含六具旋塗裝置52。 第三處理單元34包含一背面洗滌機構54用以洗滌由第 三轉運機構50轉運的基材背面;一第四轉運機構56用以轉 運完成背面洗務的基材至次一步驟;一編號機構5 8用以戮 印批號等於藉第四轉運機構56轉運而來的基材;一第五轉 運機構60用以轉運已經完成戮印批號等的基材至次一步驟 :一查驗機構62用以檢查由第五轉運機構60轉運來的基材 至染料記錄層上是否存在有缺陷及薄膜厚度;以及一分類 16 - 本紙張尺度適用中國國家標準(CNS)A4規格(2】0 X 297公釐) 經濟部智慧財產局員工消費合作社印剎衣 A7 B7 五、發明說明(Μ) 機構68用以依據藉查驗機構62進行查驗所得結果將基材分 類成堆疊於一正常產品堆疊柱64之基材及堆疊一不良品堆 登柱66之基材。 一第一分隔板70安裝於第一處理單元3〇與第二處理單 疋32間。第二分隔板72也以前述相同方式安裝於第二處理 單元32與第三處理單元34間。一開口(圖中未顯示),其大 小為不會封閉由第二轉運機構46轉運基材的轉運通路之大 小,該開口形成於第一分隔板7〇下部。一開口(圖中未顯 示),形成於第二分隔板72下部,開口大小為不會封閉由 第二轉運機構5〇轉運而來的基材之轉運通路之大小。 後處理設備16包括一堆疊柱容納區段8〇用以容納由施 用叹備16轉運來的正常品之堆疊柱64 ; 一第六轉運機構 用以由谷納於堆疊柱容納區段之堆疊柱料逐一提取臬材 且轉運基材至次一步驟;一第一靜電吹送機構84用以由藉 第六轉運機構82轉運而來的基材去除靜電;一第七轉運機 構86用以循序轉運已經完成靜電吹送處理基材至次一步驟 ,一錢錢機構88用以利用濺鍍形成一反光層於藉第七轉運 機構86轉運來的基材至第一主面上;一第八轉運機構卯用 以循序轉運已經完成濺鍍反光層之基材至次一步驟;以及 一邊緣洗滌機構92用以洗滌由第八轉運機構9〇轉運來的基 材之周緣(緣部)。 後處理設備16進一步包括一第二靜電吹送機構舛用以 由已經完成邊緣洗滌的基材去除靜電;一可紫外光固化容 液施用機構96用以施用可紫外光固化液至已經完成靜 本紙張尺度適用中國國家標準(CNS)A4規格(2〗0 X 297公釐) ^--------^0--------^ (請先閱讀背面之注意事項再填寫本頁) 17 504684 經濟部智慧財產局員工消費合作社印?农 A7 B7 五、發明說明(15) 送處理之基材至第一主面;一離心機構98用以以高速旋轉 已經完成施用可紫外光固化液的基材而獲得均勻厚度之可 紫外光固化溶液施用膜於基材上;一紫外光照射機構100 用以照射紫外光至已經完成施用可紫外光固化溶液及旋轉 處理的基材上,因此可紫外光固化溶液固化形成第一保護 層於基材之第一主面上;一第九轉運機構丨〇2用以轉運基 材至第二靜電吹送機構94、可紫外光固化溶液施用機構96 、離心機構98、及可紫外光照射機構1〇〇 ; 一第十轉運機 構104用以轉運已經照射紫外光於基材之次一步驟;一瑕 疵檢驗機構106用以檢查藉第十轉運機構104轉運來的基材 至施用面及保護層表面之瑕疵;一特徵檢驗機構1〇8用以 基於形成於基材的凹槽檢查信號特徵;以及一分類機構114 用以依據藉瑕疵檢驗機構106及特徵檢驗機構ι〇8進行檢驗 結果,將基材分類成為堆疊於正常品之堆疊柱11〇之基材 以及堆疊於不良品之堆疊柱112之基材。 現在參照第2至3圖說明旋塗裝置52之一之配置。 如第2及3圖所示,旋塗裝置52包含一溶液供應裝置4〇〇 、一離心機頭裝置402、及一濺散防止壁4〇4。 如第4圖所示,溶液供應裝置4〇〇包括一加壓槽452含 有染料液進給於其中且藉調節器450調節加至染料液的壓 力,閥裝置408用以根據閥開啟控制染料液相對於基材2〇2 的洩放及停止;及一導管454設置成由加壓槽452延伸至閥 裝置408用以供應進給於加壓槽452的染料液至閥裝置408 。預定量之染料液通過閥裝置408喷嘴406滴落於基材202 本纸張尺度適用中國國家標準(CNS)A4規格(2】〇χ297公釐) H »1 n n n ϋ ϋ ϋ n ϋ · n ϋ 1 I ϋ n n n ϋ a— ·1 —i n I B (請先閱讀背面之注意事項再填寫本頁) 18 504684 A7 B7 五、發明說明(I6) 表面上。加諸加壓槽452之染料液之壓力設定為不大於1千 克力/平方厘米。 • I 丨 — — — — — — — — — — — · I I (請先閱讀背面之注意事項再填寫本頁) 如第2及3圖所示,溶液供應裝置4〇〇係配置成可借助 於一操縱機構414將溶液由等待位置擺動至基材202上位置 ’操縱機構414包含一支承板410用以支承喷嘴406直接向 下及一馬達412用以於水平方向擺動支承板41〇。 如第4圖所示,閥裝置408設置有快速洩放閥456,故 内閥係利用流體壓力啟閉。速度控制器(第一及第二速度 控制器462,464)用於調節流體流速係分別連結至流體供 應管線458及流體洩放管線460。 快速洩放閥456具有一輸入埠口 466其連結流體供應管 線458,一輸出埠口 470其連結一閥裝置主體468,及一洩 放埠口 472其連結至流體洩放管線460。 由流體供應管線458導入的流體,經由快速洩放閥456 的輸入槔口 466及輸出埠口 47〇供給閥裝置主體468。内閥 f 係隨著閥裝置主體468之壓力對照於流體的供給因而壓力 經濟部智慧財產局員工消費合作社印製 增高,於開啟方向作動。因此,閥開啟速度(每單位時間 闕開啟程度變化)係與每單位時間之流體供應量成比例。 供應$係依據第一速度控制器462之開啟程度調整。 當閥係於開啟方向作動時,由加壓槽452供應的染料 液經由閥裝置408之喷嘴洩放,如此染料已施用於基材2〇2 上。於此種處理期間,如第5圖所示,洩放量實質上根據 通過的時間對應於閥開啟程度的加大成比例的增高。洩放 夏於已經經過某一段時間階段,亦即闊全開階段變成恆定 x 297公釐) 本紙張尺S過用中國國豕標準(CNS)A4規格(2】〇 19 504684 A7 B7 經濟部智慧財產局員工消費合作社印制衣 i、發明說明(17) 換言之,施用速度於過渡階段其中漸進開啟階段係約 略成比例地增高。施用速度於閥全開階段為恆定。 洩放量的變化幅度(特徵曲線斜率)依據洩放量成比例 增南之過渡階段的閥開啟速度而定。浪放量的變化幅度隨 著開啟速度的下降而減低。換言之,第一速度控制器462 之開啟速度愈小,則洩放量的變化幅度(特徵曲線斜率)愈 小,以及由開始施用染料液之時間點to至閥全開之時間點 tl(染料液輸入速度達恆定之施用時間點)之時間τδ愈長。 相反地,第一速度控制器462開啟速度愈大,則洩放量之 變化幅度愈大,以及由染料液開始施用時間點t〇至罰全開 時間tl之時間τδ愈短。本具體實施例中,「染料液開始施 用之時間點t0」一詞表示染料液開始由喷嘴406前端线放 的時間點。 本發明之具體實施例中,由染料液開始施用之時間⑴ 至閥全開之時間點tl之時間不少於〇· 1秒而不多於1秒。 為了滿足此項條件,本發明之具體實施例設計成第一速度 控制器462之開啟速度不低於5%而不大於5〇%。如此,闕 之開啟速度相對於最大速度不低於5〇/0而不多於50〇/〇。 如此’於染料液落至基材202上之時間點可防止染料 液於各方向濺散。如此,可避免出現缺陷外觀。 他方面,於閥裝置主體牝8的流體經由輸出埠口 47〇及 洩放埠口 472被導入流體洩放管線460内部。内閥根據閥裝 置主體468之壓力對照於流體洩放量減少而於關閉方向作 I-----------^--------- (請先閱讀背面之注意事項再填寫本頁)V. Description of the invention (12) FIG. 21 illustrates the shape of the application part located at the innermost circumference when performing the second method; FIG. 22 is a configuration diagram illustrating another example of a production system according to another specific embodiment of the present invention Figure 23 is a table illustrating the first experimental result; Figure 24 is a table illustrating the second experimental result; Figure 25 is a table illustrating the third experimental result; Figure 26 is an example obtained in Comparative Examples 14 and 15; The shape of the inner part of the application circle; and Figure 27 illustrates the discoloration of the dye solution when it is applied. The description of the preferred embodiment will be described with reference to FIGS. 1 to 27, in which a method for manufacturing an optical information recording medium, a method for applying a dye to a dye-based optical disc, and an optical information recording medium according to the present invention, For example, it is applied to a manufacturing optical disc such as a CD-R system (hereinafter simply referred to as a "manufacturing system according to the present invention"). As shown in FIG. 1, a manufacturing system 10 according to a specific embodiment of the present invention includes two molding equipment (first and second molding equipment 1.2A, 12B), for example, by injection molding, compression molding, or injection molding. The substrate application device 14 is used to form a dye recording layer on the substrate. The application device 14 is applied to the first main surface of the substrate and then dried, and the post-treatment device 16 is used to form a reflective layer on the substrate by, for example, sputtering. Then, a UV-curable solution is applied to the reflective layer, and then a UV-curable solution is applied to form a protective layer on the reflective layer. The first and second molding equipment 12A and 12B each include a molding machine. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (2) 0x297 mm. ------------ -^ --------- ^ < Please read the notes on the back before filling out this page) 15 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, Invention Description (13) Used for resin materials, Such as polycarbonate injection molding, compression molding or injection compression molding to produce a substrate, the first-main surface of the substrate is formed with tracking grooves or irregular (grooves) to indicate information such as address signals, a cooling The section 22 is used to cool the substrate taken out by the nuclear machine 20; and a stacking section 26 (stacking column turntable) is installed with the yike stacking column 24 for stacking and storing the cooled substrate. The application device 14 includes three processing units 30, 32, and 34. The first processing table 30 includes a stacking column accommodating section 40 for accommodating the stack transferred by the first and second molding devices 12A, 12B. Column 24; a first transfer mechanism 42 for transferring substrates one by one from the stacking columns 24 accommodated in the stacking column accommodating section 40 to transfer the substrates to the next step; and an electrostatic blowing mechanism 44 for borrowing the first transfer mechanism The 42 transported substrate removes static electricity. The line second processing unit 32 includes a second transfer mechanism 46 to sequentially transfer the substrates that have completed the electrostatic blowing step to the next step in the first processing unit 30, and a dye application mechanism 48 to apply the dye application liquid to the respective borrowers. The second transfer mechanism 46 transfers a plurality of substrates; and a third transfer mechanism 50 is used to transfer the completed dye application processing substrates one by one to the next step. The dye application mechanism 48 includes six spin coating devices 52. The third processing unit 34 includes a back surface washing mechanism 54 for washing the back surface of the substrate transferred by the third transfer mechanism 50; a fourth transfer mechanism 56 for transferring the substrate that has completed the back washing to the next step; a numbering mechanism 5 8 is used to print the batch number equal to the substrate transferred from the fourth transfer mechanism 56; a fifth transfer mechanism 60 is used to transfer the substrate that has completed the batch number printing to the next step: an inspection mechanism 62 is used to Inspect whether there are defects and film thickness on the substrate transferred from the fifth transfer mechanism 60 to the dye recording layer; and a classification 16-This paper size applies to China National Standard (CNS) A4 specification (2) 0 X 297 mm ) The Intellectual Property Bureau Employees' Cooperative Printing Coat A7 B7 of the Ministry of Economic Affairs 5. The description of the invention (M) The mechanism 68 is used to classify the substrate into substrates stacked on a normal product stacking column 64 based on the results of the inspection by the inspection agency 62 And stacking a substrate of the defective product post 66. A first partition plate 70 is installed between the first processing unit 30 and the second processing unit 32. The second partition plate 72 is also mounted between the second processing unit 32 and the third processing unit 34 in the same manner as described above. An opening (not shown) has a size that does not close the transfer path for transferring the substrate by the second transfer mechanism 46, and the opening is formed in the lower part of the first partition plate 70. An opening (not shown in the figure) is formed at the lower part of the second partition plate 72, and the opening has a size not to close the transfer path of the substrate transferred from the second transfer mechanism 50. The post-processing equipment 16 includes a stacking column accommodating section 80 for accommodating the normal product stacking column 64 transferred by the application device 16; a sixth transfer mechanism for the stacking column of the stacking column accommodating section by Gouna Materials are extracted one by one and the substrate is transferred to the next step; a first electrostatic blowing mechanism 84 is used to remove static electricity from the substrate transferred by the sixth transfer mechanism 82; a seventh transfer mechanism 86 is used to sequentially transfer the After completing the electrostatic blowing process of the substrate to the next step, a money mechanism 88 is used to form a reflective layer by sputtering to the substrate transferred by the seventh transfer mechanism 86 to the first main surface; an eighth transfer mechanism 卯It is used to sequentially transfer the substrate that has completed the sputtering reflective layer to the next step; and an edge washing mechanism 92 is used to wash the periphery (edge portion) of the substrate transferred by the eighth transfer mechanism 90. The post-processing equipment 16 further includes a second electrostatic blowing mechanism to remove static electricity from the substrate that has been subjected to edge washing; a UV-curable liquid storage application mechanism 96 for applying a UV-curable liquid to the finished static paper Dimensions are applicable to China National Standard (CNS) A4 specifications (2〗 0 X 297 mm) ^ -------- ^ 0 -------- ^ (Please read the notes on the back before filling in this Page) 17 504684 Employees 'Cooperatives' Seal of Intellectual Property Bureau, Ministry of Economic Affairs? Agriculture A7 B7 V. Description of the invention (15) Send the treated substrate to the first main surface; a centrifugal mechanism 98 is used to rotate the substrate which has completed the application of the UV-curable liquid at high speed to obtain a uniform thickness of UV-curable The solution application film is on the substrate; an ultraviolet light irradiating mechanism 100 is used to irradiate the ultraviolet light onto the substrate that has completed the application of the ultraviolet curable solution and the rotation treatment, so the ultraviolet curable solution can be cured to form a first protective layer on the substrate. The first main surface of the material; a ninth transfer mechanism, which is used to transfer the substrate to the second electrostatic blowing mechanism 94, the ultraviolet light curing solution application mechanism 96, the centrifuge mechanism 98, and the ultraviolet light irradiation mechanism 10. 〇; A tenth transfer mechanism 104 is used to transfer the second step of the substrate that has been irradiated with ultraviolet light; a defect inspection mechanism 106 is used to check the substrate transferred by the tenth transfer mechanism 104 to the application surface and the surface of the protective layer Defects; a feature inspection mechanism 108 for inspecting signal characteristics based on grooves formed in the substrate; and a classification mechanism 114 for borrowing defect inspection mechanisms 106 and feature inspection mechanisms ι〇8 Line test results, the substrate will be classified and stacked on the base material of the normal base stacking column 11〇 goods stacked on the stacking column 112. The defective. The configuration of one of the spin coating devices 52 will now be described with reference to FIGS. 2 to 3. As shown in FIGS. 2 and 3, the spin coating device 52 includes a solution supply device 400, a centrifuge head device 402, and a splash prevention wall 400. As shown in FIG. 4, the solution supply device 400 includes a pressurizing tank 452 containing a dye liquid fed therein and the pressure applied to the dye liquid is adjusted by a regulator 450. A valve device 408 is used to control the dye liquid according to the valve opening. Releasing and stopping with respect to the substrate 200; and a duct 454 is provided to extend from the pressure tank 452 to the valve device 408 for supplying the dye liquid fed to the pressure tank 452 to the valve device 408. A predetermined amount of the dye solution is dripped on the substrate 202 through the nozzle 406 of the valve device 408. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (2) 0 × 297 mm. H »1 nnn ϋ ϋ ϋ n ϋ · n ϋ 1 I ϋ nnn ϋ a— · 1 —in IB (Please read the notes on the back before filling this page) 18 504684 A7 B7 V. Description of the invention (I6) on the surface. The pressure of the dye solution added to the pressure tank 452 is set to not more than 1 kg / cm2. • I 丨 — — — — — — — — — — — II (Please read the notes on the back before filling out this page) As shown in Figures 2 and 3, the solution supply device 400 is configured so that A manipulation mechanism 414 swings the solution from the waiting position to the position on the substrate 202. The manipulation mechanism 414 includes a support plate 410 for supporting the nozzle 406 directly downward and a motor 412 for swinging the support plate 41 in a horizontal direction. As shown in Fig. 4, since the valve device 408 is provided with a quick-release valve 456, the internal valve system is opened and closed by fluid pressure. Speed controllers (first and second speed controllers 462, 464) are used to regulate the fluid flow rate and are connected to the fluid supply line 458 and the fluid discharge line 460, respectively. The quick release valve 456 has an input port 466 connected to a fluid supply line 458, an output port 470 connected to a valve device main body 468, and a drain port 472 connected to a fluid release line 460. The fluid introduced from the fluid supply line 458 is supplied to the valve device main body 468 through the input port 466 and the output port 470 of the quick-release valve 456. The internal valve f is printed with the pressure of the main body of the valve device 468 compared to the fluid supply and therefore the pressure is printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, and operates in the opening direction. Therefore, the valve opening speed (variation of opening degree per unit time) is proportional to the fluid supply amount per unit time. Supply $ is adjusted according to the opening degree of the first speed controller 462. When the valve is operated in the opening direction, the dye liquid supplied from the pressure tank 452 is discharged through the nozzle of the valve device 408, so that the dye has been applied to the substrate 200. During such processing, as shown in Fig. 5, the discharge amount substantially increases in proportion to the increase in the valve opening degree according to the passage time. The release of Xia Yu has passed a certain period of time, that is, the wide open phase has become constant x 297 mm.) The paper ruler S has been used in China National Standard (CNS) A4 specifications (2). 〇19 504684 A7 B7 Intellectual property of the Ministry of Economic Affairs Bureau ’s consumer cooperative prints clothing, invention description (17) In other words, the application speed is increased approximately proportionally during the transitional phase, where the progressive opening phase is approximately constant. The application speed is constant during the full opening phase of the valve. The magnitude of the change in the amount of discharge (the slope of the characteristic curve ) It depends on the opening speed of the valve during the transition period when the release rate increases south. The change of the wave release rate decreases as the opening speed decreases. In other words, the smaller the opening speed of the first speed controller 462, the lower the release rate. The smaller the range of change (the slope of the characteristic curve), and the longer the time τδ from the time point to when the dye solution is started to the time point t1 (the time point at which the dye liquid input speed reaches a constant level). Conversely, the first The greater the opening speed of the speed controller 462, the greater the change in the amount of release, and the time from the start of the application of the dye liquid to the time of full penalty The shorter the time τδ of tl. In this embodiment, the term "time point t0 at which the dye liquid starts to be applied" means the time point at which the dye liquid starts to be discharged from the front line of the nozzle 406. In the specific embodiment of the present invention, The time from the start of application to the time point t1 when the valve is fully open is not less than 0.1 second and not more than 1 second. In order to meet this condition, the specific embodiment of the present invention is designed to turn on the first speed controller 462 The speed is not less than 5% but not more than 50%. In this way, the opening speed of the puppet is not less than 50/0 and not more than 50/0 relative to the maximum speed. In this way, the dye liquid falls on the substrate 202 At that time, the dye liquid can be prevented from splashing in all directions. In this way, the appearance of defects can be avoided. On the other hand, the fluid in the valve device body 牝 8 is introduced into the fluid discharge line through the output port 47o and the discharge port 472. Inside 460. The internal valve is made I in the closing direction according to the pressure of the valve device main body 468 against the decrease of the fluid discharge amount .----------- ^ --------- (Please read the back first (Notes for filling in this page)

-20 - 504684 經濟部智慧財產局員工消費合作社印制取 A7 ___ B7 _ 五、發明說明(18) 動。因此,闊的關閉速度係於每單位時間流體洩放量成比 例。洩放量可依據第二速度控制器464的開啟速度調整。 當閥係於關閉方向作動時,染料液通過喷嘴4〇6之洩 放停止,基材202之染料施用處理完成。 於此種處理過程中,如第5圖所示,洩放量實質上係 根據通過的時間對應於閥開啟程度的減少而下降。於閥全 開階段,染料液之'/¾放量為零,換言之,染料液之泡放停 丨止。 又於本例’洩放量的變化幅度(特徵曲線斜率)係依據 洩放量成比例減少階段之閥關閉速度決定。洩放量變化幅 度隨者關閉速度的降低而減小。換言之,第二速度控制零 464之開啟程度愈小,則洩放量之變化幅度愈小,且由停 止%用染料液開始時間點t2至閥全關時間點t3 (染料液浪放 量為零之時間點)之時間π愈長。相反地,第二速度控制 器464之開啟程度愈大’則浪放量之變化幅度愈大,以及 > 由染料液施用停止開始時間點t2至閥全關時間點t3之時間 ts愈短。 本發明之具體實施例中,第二速度控制器464之開啟 速度設定為100%,俾由染料液停止施用開始時間點t2至 閥全關時間點t3經歷的時間π儘可能縮短。 他方面,如第2及3圖所示,離心機頭裝置4〇2係設置 於溶液供應裝置400下方。基材202借助於可洩式固定具420 維持水平,且借助於驅動馬達(圖中未顯示)而以軸為軸迴 轉0 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) — — — — — — — — — — — ί i I I I I I I t 111!1! ^, (請先閱讀背面之注意事項再填寫本頁) 21-20-504684 A7 ___ B7 _ Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs V. Description of Invention (18). Therefore, the wide closing speed is proportional to the fluid release amount per unit time. The bleeding amount can be adjusted according to the opening speed of the second speed controller 464. When the valve is operated in the closing direction, the discharge of the dye liquid through the nozzle 406 stops, and the dye application treatment of the substrate 202 is completed. During this process, as shown in Fig. 5, the amount of bleed substantially decreases according to the passage time corresponding to the decrease in the valve opening degree. When the valve is fully opened, the amount of the dye solution is zero, in other words, the bubble of the dye solution is stopped. Also in this example, the variation range of the relief amount (the slope of the characteristic curve) is determined based on the valve closing speed at the stage where the relief amount is proportionally reduced. The magnitude of the change in the release amount decreases as the closing speed decreases. In other words, the smaller the opening degree of the second speed control zero 464 is, the smaller the variation of the discharge amount is, and from the stop point of the dye liquid start time point t2 to the valve fully closed time point t3 (the time when the wave volume of the dye liquid is zero) Point) the longer π. Conversely, the greater the degree of opening of the second speed controller 464 is, the greater the change in the amount of wave discharge is, and the shorter the time ts from the time point t2 at which the dye liquid application is stopped to the time point t3 at which the valve is fully closed is shorter. In a specific embodiment of the present invention, the opening speed of the second speed controller 464 is set to 100%, and the time π elapsed from the time point t2 when the dye liquid stops application to the time point t3 when the valve is fully closed is shortened as much as possible. On the other hand, as shown in Figs. 2 and 3, the centrifugal head device 402 is disposed below the solution supply device 400. The base material 202 is maintained horizontally by means of a removable fixing device 420, and is rotated by an axis by means of a drive motor (not shown in the figure). 0 This paper size is in accordance with China National Standard (CNS) A4 (210 X 297 mm). ) — — — — — — — — — — — Ί i IIIIII t 111! 1! ^, (Please read the notes on the back before filling out this page) 21

經濟部智慧財產局員工消費合作社印制农Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs

染料液由溶液供應裝置400之喷嘴406滴至基材202上 ’基材係於由離心機頭裝置402水平夾持狀態旋轉。染料 液係朝向基材202表面外周侧澆鑄。過量染料液由基材202 外周緣分離,藉朝向外側洩放。結果,施用薄膜乾燥。如 此,施用膜(染料記錄層204)形成於基材202上。 濺散防止壁404之裝設係為避免由基材202之外周緣朝 向外側浪放的過量染料液濺散至周圍。濺散防止壁4〇4係 環繞離心機頭裝置402設置,因此一開口 422形成於上部。 過量染料亦借助於濺散防止壁404收集,經由汲取口 424回 收。 對第二處理單元32之各旋塗裝置52執行局部通風如後 (參考第1圖)。換言之,經由形成於濺散防止壁4〇4上部開 口 422導入的孔隙允許背向基材2〇2表面流動。隨後空氣通 過排氣管426排氣,排氣管426係附接於各離心機頭裝置4〇2 下部。 如第6及7圖所示,溶液供應裝置4〇〇之喷嘴4〇6包括一 細長筒形喷嘴主體432有一貫穿孔430形成貫穿於軸向,及 一附接區段434用以固定喷嘴主體432與支承板41〇(參考第 3圖)。喷嘴主體432具有下述表面。換言之,前端面及外 或内壁面或外及内壁面二者距離前端面不小於〗亳米,此 等表面係由氟化合物製成。有用的氟化合物包括例如聚四 氟乙烯及含聚四氟乙烯之物質。 用於本具體實施例之喷嘴4〇6之較佳例包括,例如 喷嘴406其中包括噴嘴主體432之前端面且具前端面不少於The dye solution is dropped onto the substrate 202 from the nozzle 406 of the solution supply device 400. The substrate is rotated in a state of being horizontally held by the centrifuge head device 402. The dye solution is cast toward the outer peripheral side of the surface of the substrate 202. The excess dye liquid is separated from the outer periphery of the substrate 202 and is discharged to the outside. As a result, the application film is dried. As such, an application film (dye recording layer 204) is formed on the substrate 202. The splash prevention wall 404 is installed to prevent the excessive dye liquid sprayed from the outer periphery of the substrate 202 toward the outside from being scattered to the surroundings. The splash prevention wall 400 is provided around the centrifuge head device 402, so an opening 422 is formed in the upper portion. Excess dye is also collected by means of the splash prevention wall 404 and recovered through the extraction port 424. Local ventilation of each spin coating device 52 of the second processing unit 32 is performed as follows (refer to FIG. 1). In other words, the pores introduced through the upper opening 422 formed in the splash-prevention wall 404 allow flowing back to the surface of the substrate 202. The air is then exhausted through an exhaust pipe 426, which is attached to the lower part of each centrifugal head unit 402. As shown in FIGS. 6 and 7, the nozzle 406 of the solution supply device 400 includes an elongated cylindrical nozzle body 432 having a through hole 430 formed to penetrate in the axial direction, and an attachment section 434 for fixing the nozzle body. 432 and support plate 41 (refer to FIG. 3). The nozzle body 432 has the following surface. In other words, the front end surface and the outer or inner wall surface or both the outer and inner wall surfaces are not less than 1 mm from the front end surface, and these surfaces are made of a fluorine compound. Useful fluorine compounds include, for example, polytetrafluoroethylene and polytetrafluoroethylene-containing materials. Preferred examples of the nozzle 406 used in this embodiment include, for example, the nozzle 406 includes a front end surface of the nozzle body 432 and a front end surface of not less than

本紙張尺度適用中國國家標準(CNS)A4規格(2】〇χ297公爱_)" --------1--------- (請先閱讀背面之注意事項再填寫本頁) 22 504684 ., Α7This paper size applies to China National Standard (CNS) A4 specifications (2) 〇297297 love_) " -------- 1 --------- (Please read the precautions on the back before (Fill in this page) 22 504684., Α7

經濟部智慧財產局員工消費合作社印制衣Printing of clothing by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs

五、發明說明(2〇) 1毫米距離範圍部份係使用氟化合物形成,如第7圖所示· 及一種喷嘴406其中涵括噴嘴主體432之前端面44〇部份, 該部份包括外及内壁面442,444距離前端面440不小於!毫 米距離的外或内壁面或二者塗布以氟化合物,如第8圖所 示。 當包括喷嘴主體432之前端面及其距前端面不少於1毫 米距離之部份係由氟化合物形成時,由使用觀點看來,以 下列配置為佳。換言之,例如噴嘴主體432由不鏽鋼製成 。進一步,前端面及最大距離5亳米範圍部份係由氟化合 物製成。 當涵括噴嘴主體432前端面446及涵括外及内壁面442 ,444之外或内壁面或二者距前端面44〇不少於1亳米範圍 部份係由氟化合物製成,如第8圖所示,較佳距噴嘴主體432 之前端面440不小於10毫米距離面積塗布以氟化合物。更 佳T嘴主體432的面積塗布以氟化合物。當前述面積被塗 層時’厚度並無特殊限制。但,厚度約略於5至500微米範 圍。嘴主體43 2之材料如前述較佳為不鏽鋼。貫穿噴嘴 主體432形成之貫穿孔430直徑通常係於〇·5至1·〇毫米之範 圍。 如第1圖所示,製造系統10進一步安裝空調系統300並 聯施用設備14之第二處理單元32。如第9及10圖所示,空 調機704透過高效填塞床過濾器(ΗΕΡΑ過濾器)700安裝於 第一處理單元30天花板。ΗΕΡΑ過濾器702係安裝於第三處 理單元34之天花板。 本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公爱) I ^------11 --------^ (請先閱讀背面之注意事項再填寫本頁) 23 ⑽4 ⑽4 經濟部智慧財產局員工消費合作社印制衣 A7 ------- —_B7_____ 五、發明說明(21) 空調機704進給乾淨空氣給第一處理單元30,故第一 處理單疋30的溫度受控制。乾淨空氣經由hepa過濾器702 被導入第三處理單元34。 他方面,如第9及14圖所示,空調系統300包含空調機 302用以進給乾淨空氣「ca」給施用設備14; 一除濕機304 用以將外部空氣rea」導入進行除濕,故空氣被輸出做為 一次空氣al ;及一排氣裝置3〇6(參考第12圖)用以接受來 自施用設備14部份洩放空氣(局部洩放空氣)「da」以及進 給重疊座標排氣管線。局部洩放空氣「da」包括例如由施 用设備14之染料施用機構48之第六旋塗裝置52洩放的洩放 空氣。 他方面,如第9及1〇圖所示,空調系統3〇〇裝設一導管 3 10用以進給由除濕機304輸出的一次空氣ai至空調機302 ,導官310係設置於除濕機3〇4與空調機3〇2間。如第12圖 所不’前述排氣管426係設置於排氣裝置3〇6與施用設備14 之染料機構48之第六旋塗裝置52之各排氣側間。 介於空調機302與施用設備14間安裝複數(於附圖之說 明例為4)空氣供應導管32〇&至32〇(1用以進給由空調機302 輸出的乾淨空氣「ca」至使用設備14,以及複數(於附圖 之說明例為8)返回導管322用以將局部洩放空氣「如」以 外的 >髮放空氣「ra」由施用設備14送返空調機3〇2。 空調機302安裝有一進氣口 71〇用以導入外部空氣「⑽ 」。一刖置過濾器712附接於進氣口 71 〇。於尋常空調控制 下(當未進行低濕控制時),由進氣口 7丨〇導入的空氣供給 本紙張尺度適用中國國家標準(CNS)A4規格(2〗0 X 297公爱) —--------^—------ (請先閱讀背面之注意事項再填寫本頁) 24 504684 經 濟 部 智 慧 財 產 局 員 X 消 費 合 作 社 印 製 A7 B7 五、發明說明(22) 空調機302做為一次空氣。 當進行低濕控制時使用除濕·機304。如第9及10圖所示 ,除濕機304安裝有一進氣口 324用以導入外部空氣「ea」 。一前置過濾器326附接於進氣口 324。故,經由進氣口 324 導入外部空氣「ea」已經利用前置過濾器326去除塵土, 灰塵等。外部空氣「ea」被導入除濕機3〇4内側而於除濕 機304内部進行除濕處理。除濕後的外部空氣供應設置於 > 下游階段的空調機302做為一次空氣。 第14圖所示,空調機302包含一混合器330用以混合來 自除濕機304或進氣口 710之一次空氣a 1與來自施用設備 之洩放空氣(局部洩放空氣以外的洩放空氣)r ra」獲得混 合空氣「ha」用於輸出;二部濕化器332a,3321}用以進行 由混合為330輸出的混合空氣「ha」的濕化處理而獲得二 次空氣a2供輸出;以及四部鼓風機334a至334d用以將來自 二部濕化器332a,332b之二次空氣a2進給施用設備14。 各濕化器332a,332b於其内侧包括一加熱板336用以 添加氣化水至一次空氣al。純水展布於加熱板336上。本 具體實施例使用之純水為具有比電阻不低於〇15百萬歐姆 (室溫)之近似純水。較佳使用比電阻不低於15百萬歐姆( 室溫)及更佳比電阻不低於15百萬歐姆(室溫)之純水。本 具體實施例中使用具有比電阻為2百萬歐姆(室溫)之純水 純水之獲得方法包括,例如,基於使用蒸餾及離子交 換樹脂之方法。但,較佳例如鍵於雜質去除效率,較佳使 — — IIIIIII — — — — · 1 — I I I 1 1 — — — — — — — — — (請先閱讀背面之注意事項再填寫本頁) 25 Α75. Description of the invention (20) The part of the 1 mm distance range is formed using a fluorine compound, as shown in FIG. 7; and a nozzle 406 includes a portion 44 of the front end face of the nozzle body 432, which includes the outer and The inner wall surface 442,444 is not less than the front surface 440! The outer or inner wall surface, or both, with a distance of millimeters is coated with a fluorine compound, as shown in Figure 8. When the portion including the front end surface of the nozzle body 432 and a distance of not less than 1 mm from the front end surface is formed of a fluorine compound, from the viewpoint of use, the following configuration is preferable. In other words, for example, the nozzle body 432 is made of stainless steel. Further, the front end surface and a portion with a maximum distance of 5 mm are made of a fluoride compound. When the front end surface 446 of the covering nozzle body 432 and the outer and inner wall surfaces 442, 444 are included, or the inner wall surface or both are not less than 1 mm from the front end surface, the part is made of fluorine compounds, as described in As shown in FIG. 8, it is preferable that the area from the front end surface 440 of the nozzle body 432 to a distance of not less than 10 mm is coated with a fluorine compound. More preferably, the area of the T-nozzle body 432 is coated with a fluorine compound. When the aforementioned area is coated, the thickness is not particularly limited. However, the thickness is approximately in the range of 5 to 500 microns. The material of the mouth main body 43 2 is preferably stainless steel as described above. The diameter of the through-hole 430 formed through the nozzle body 432 is usually in the range of 0.5 to 1.0 mm. As shown in FIG. 1, the manufacturing system 10 is further equipped with an air conditioning system 300 and a second processing unit 32 of the application device 14. As shown in Figs. 9 and 10, the air conditioner 704 is installed on the ceiling of the first processing unit 30 through a high-efficiency packed bed filter (ZEPA filter) 700. The HPA filter 702 is mounted on the ceiling of the third processing unit 34. This paper size applies to China National Standard (CNS) A4 specification (210 x 297 public love) I ^ ------ 11 -------- ^ (Please read the precautions on the back before filling this page) 23 ⑽4 ⑽4 Printed clothing A7 of the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs ------- --_ B7_____ V. Description of the invention (21) The air conditioner 704 feeds clean air to the first processing unit 30, so the first processing order The temperature of 疋 30 is controlled. The clean air is introduced into the third processing unit 34 through a hepa filter 702. In other aspects, as shown in Figures 9 and 14, the air conditioning system 300 includes an air conditioner 302 to feed clean air "ca" to the application device 14; a dehumidifier 304 to introduce external air rea "to dehumidify, so the air It is output as primary air al; and an exhaust device 3006 (refer to FIG. 12) is used for receiving partial bleed air (partial bleed air) "da" from the application device 14 and exhaust with overlapping coordinates of feed Pipeline. The local bleed air "da" includes, for example, bleed air bleed by the sixth spin coating device 52 of the dye application mechanism 48 of the application device 14. In other aspects, as shown in Figures 9 and 10, the air-conditioning system 300 is provided with a duct 3 10 to feed the primary air ai output by the dehumidifier 304 to the air-conditioning unit 302, and the guide 310 is installed in the dehumidifier. 300 and 300 air conditioners. As shown in FIG. 12, the exhaust pipe 426 is provided between each exhaust side of the exhaust device 306 and the sixth spin coating device 52 of the dye mechanism 48 of the application device 14. A plurality of air supply ducts 32 ° & 32 ° (1) are installed between the air conditioner 302 and the application equipment 14 (1 in the illustrated example of the drawing) to feed clean air "ca" to The use device 14 and a plurality of (the illustrated example in the drawing is 8) return ducts 322 are used to return the locally released air "such as" > the release air "ra" from the application device 14 to the air conditioner 3202. The air conditioner 302 is provided with an air inlet 71 for introducing external air "⑽". A filter 712 is attached to the air inlet 71. Under normal air-conditioning control (when low-humidity control is not performed), Air inlet 7 丨 〇 The air supply introduced by this paper is in accordance with China National Standard (CNS) A4 specification (2〗 0 X 297 public love) —-------- ^ —------ (Please Read the precautions on the back before filling this page) 24 504684 Member of the Intellectual Property Bureau of the Ministry of Economic Affairs X Printed by the Consumer Cooperative A7 B7 V. Description of the invention (22) The air conditioner 302 is used as primary air. Use dehumidifiers when controlling low humidity. 304. As shown in Figures 9 and 10, the dehumidifier 304 is provided with an air inlet 324 for The external air "ea" is attached. A pre-filter 326 is attached to the air inlet 324. Therefore, the introduction of the external air "ea" through the air inlet 324 has used the front filter 326 to remove dust, dust, etc. The external air " "ea" is introduced into the inside of the dehumidifier 300 and is dehumidified inside the dehumidifier 304. The external air supply after the dehumidification is set in the > downstream air conditioner 302 as the primary air. As shown in FIG. 14, the air conditioner 302 Contains a mixer 330 for mixing the primary air a 1 from the dehumidifier 304 or the air inlet 710 with the bleed air (bleed air other than local bleed air) r ra "from the application equipment to obtain the mixed air" ha " For output; two humidifiers 332a, 3321} for humidifying the mixed air "ha" mixed to 330 output to obtain secondary air a2 for output; and four blowers 334a to 334d for The secondary air a2 of the two humidifiers 332a, 332b feeds the application device 14. Each of the humidifiers 332a, 332b includes a heating plate 336 inside to add vaporized water to the primary air al. Pure water is distributed in On hot plate 336 The pure water used in this embodiment is approximately pure water with a specific resistance of not less than 0.15 million ohms (room temperature). It is preferable to use a specific resistance of not less than 15 million ohms (room temperature) and a better specific resistance Pure water of not less than 15 million ohms (room temperature). The method for obtaining pure water with specific resistance of 2 million ohms (room temperature) in this embodiment includes, for example, the use of distillation and ion The method of exchanging resin. However, it is better to bond the impurity removal efficiency, for example, IIIIIII — — — — 1 — III 1 1 — — — — — — — — — (Please read the precautions on the back before (Fill in this page) 25 Α7

經濟部智慧財產局員工消費合作社印製 五、發明說明(25 ) 側及下游側’因此可調整排放至戶外的排氣量。 其次’將參照第15A至18圖說明使用製造系統10生產 光碟的製程。 首先’樹脂材料例如聚碳酸酯接受注塑、壓塑或射出 壓塑’使用第一及第二磨製設備12A,12B之模製機20來 製造包括指示資訊例如位址信號之執跡槽或不規則部(凹 槽)200形成於第一主面上,如第15A圖所示。 基材202之材料包括,例如聚碳酸酯,丙烯酸系樹脂 如聚甲基丙烯酸甲酯,基於乙烯基氣之樹脂如聚乙烯基氣 及乙烯基氣共聚物,環氧樹脂,非晶形聚矽及聚酯。若有 所需’此等材料可組合使用。前述材料中,鑑於例如防水 性、形穩性及價格等較佳使用聚碳酸酯。凹槽2〇〇之深度 較佳係於0·01至〇·3微米之範圍。半寬度值較佳於〇.2至0.9 微米之範圍。 基材202由模製機20取出,於設置於下游階段的冷卻 區段22冷卻,及然後堆疊於堆疊柱24上,以其第一主面面 向下。於預定數目的基材202堆疊於堆疊柱24之階段,由 模製設備12A,12B取出堆疊柱24。堆疊柱24轉運至隨後 施用設備14,容納於施用設備14之堆疊柱容納區段4〇。轉 運係使用車具進行,或可使用自行推進的自動轉運設備進 行。 於堆疊柱24容納於堆疊柱容納區段4〇之階段,作動第 一轉運機構42。基材202逐一由堆疊柱24取出,及被轉運 至設置於下游階段的靜電吹送機構44。藉靜電吹送機 本纸張尺度適用中國國家標準(CNS)A4規格(2】〇x297公爱) l·----------------I I I I I-----a (請先閱讀背面之注意事項再填寫本頁) 28 川4684Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of invention (25) side and downstream side 'Therefore, the amount of exhaust gas discharged to the outdoors can be adjusted. Next, a process for producing an optical disc using the manufacturing system 10 will be described with reference to FIGS. 15A to 18. First, a 'resin material such as polycarbonate is injection molded, compression molded or injection molded' using a molding machine 20 of the first and second grinding equipment 12A, 12B to manufacture a track groove or a guide including indication information such as an address signal. A regular portion (groove) 200 is formed on the first main surface, as shown in FIG. 15A. The material of the substrate 202 includes, for example, polycarbonate, acrylic resins such as polymethyl methacrylate, vinyl gas-based resins such as polyethylene-based gas and vinyl gas copolymers, epoxy resins, amorphous polysilicon, and Polyester. These materials can be used in combination if desired. Among the foregoing materials, polycarbonate is preferably used in view of, for example, water resistance, dimensional stability, and price. The depth of the groove 200 is preferably in the range of 0.01 to 0.3 micron. The half-width value is preferably in the range of 0.2 to 0.9 microns. The substrate 202 is taken out by the molding machine 20, cooled in a cooling section 22 provided at a downstream stage, and then stacked on a stacking column 24 with its first main surface facing downward. At the stage where a predetermined number of substrates 202 are stacked on the stacking column 24, the stacking column 24 is taken out by the molding equipment 12A, 12B. The stacking column 24 is transferred to the subsequent application device 14 and is accommodated in the stacking column receiving section 40 of the application device 14. The transfer is carried out using a vehicle, or it can be carried out using self-propelled automatic transfer equipment. When the stacking column 24 is accommodated in the stacking column accommodating section 40, the first transfer mechanism 42 is actuated. The substrates 202 are taken out one by one from the stacking column 24 and transferred to the electrostatic blowing mechanism 44 provided at the downstream stage. By electrostatic blower, the paper size is applicable to China National Standard (CNS) A4 specifications (2) 0x297 public love) l ---------------- IIII I ----- a (Please read the precautions on the back before filling out this page)

五、 發明說明(26) 由轉運至靜電吹送機構44的基材202去除靜電。隨後基材 202藉第二轉運機構46轉運至隨後的染料使用機構48。基 材202被導入六部旋塗裝置52之任一旋塗裝置52内部。染 料液施用於被導入旋塗裝置52内部之基材202之第一主面 上。隨後基材202以南速旋轉獲得染料液均勻厚度,接著 施加乾燥處理。如此,如第15B圖所示,染料記錄層204 形成於基材202之第一主面上。 換言之,被導入旋塗裝置52内部之基材202安裝於離 心機頭裝置402 ’如第2圖所示,借助於夾具420維持於水 平。隨後,染料液由加壓槽供應,預定量染料液係利用闊 裝置408調整。染料液經由喷嘴4〇6低於基材2〇2之内周側 上。 如刖述,喷嘴406具有下列表面。亦即,涵括前端面 及外或内壁面或外與内壁面二者距前端面不少於1毫米距 離部份係由氟化合物組成。因此,罕見出現染料液的黏著 ,且罕見形成染料的沉積及沉積物,否則當染料液乾燥時 可能引起沉積。因此,可順利形成施用薄膜而未造成施用 薄膜瑕疵等任何困擾。 經由溶解染料於適當溶劑所得染料液用做染料液。染 料於染料液之濃度通常係於0.01至15%重量比,較佳〇 1至 10%重量比,特佳0.5至5%重量比,及最佳〇5至3%重量比 之範圍。 離心機頭裝置402可借助於驅動馬達以高速旋轉。滴 於基材202之染料液係根據離心機頭裝置4〇2旋轉於基材 II — —— — — — — — — — — - — — — III— ^ ·11111111 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印制农V. Description of the invention (26) The static electricity is removed by the substrate 202 transferred to the electrostatic blowing mechanism 44. The substrate 202 is then transferred by a second transfer mechanism 46 to a subsequent dye application mechanism 48. The substrate 202 is introduced into any one of the six spin-coating devices 52. The dye solution is applied to the first main surface of the substrate 202 which is introduced into the interior of the spin coating device 52. The substrate 202 is then rotated at a south speed to obtain a uniform thickness of the dye solution, followed by applying a drying treatment. As such, as shown in FIG. 15B, the dye recording layer 204 is formed on the first main surface of the substrate 202. In other words, the base material 202 introduced into the spin coating device 52 is mounted on the centrifugal head device 402 'as shown in FIG. Subsequently, the dye solution is supplied from a pressurized tank, and a predetermined amount of the dye solution is adjusted by a wide device 408. The dye liquid passes through the nozzle 406 on the inner peripheral side which is lower than the substrate 202. As described, the nozzle 406 has the following surfaces. That is, the portion including the front end surface and the outer or inner wall surface or both the outer and inner wall surfaces at a distance of not less than 1 mm from the front end surface is composed of a fluorine compound. Therefore, adhesion of the dye solution is rare, and deposits and deposits of the dye are rarely formed, otherwise deposition may be caused when the dye solution is dried. Therefore, the application film can be smoothly formed without causing any trouble such as defects in the application film. The dye solution obtained by dissolving the dye in an appropriate solvent is used as the dye solution. The concentration of the dye in the dye solution is usually in the range of 0.01 to 15% by weight, preferably 0.01 to 10% by weight, particularly preferably 0.5 to 5% by weight, and most preferably 0.05 to 3% by weight. The centrifuge head device 402 can be rotated at a high speed by a drive motor. The dye solution dripped on the substrate 202 is rotated on the substrate II according to the centrifugal head device 402 — — — — — — — — — — — — — III — ^ · 11111111 (Please read the precautions on the back first (Fill in this page again.)

29 50468429 504684

&;£部智#一財產局員工消費合作社印製&; £ 部 智 # Printed by a Consumer Cooperative of the Property Bureau

首先說明第一處理程序。於第17圖所示步驟S1,基 材202的轉數增高至約每分鐘27()轉,同時溶液供應裝置_ 之支承板410(參見第3圖)係於水平方向旋轉來移動喷嘴 406,例如,至基材202半徑46亳米位置。 隨後,於步驟S2,基材202轉數維持於每分鐘27〇轉 ,且開始施用染料液。此種狀態下,支承板41〇於水平方 向旋轉而於约2秒内移動噴嘴406至基材2〇2之預定位置ps( 參見第4及20圖)。 如第4及20圖所示,預定位置Ps為下列位置。換言之 ,該位置由基材202之外周端?1朝向内圓周偏轉不小於5 毫米。該位置距離基材202之内周侧上未施用如染料液部 份,換言之,距離於形成做為染料記錄層2〇4該區内周側 末端P0朝向外圓周偏轉不小於5毫米,較佳不小於1〇毫米 ,及更佳不小於15毫米。本具體實施例中,該位置係位於 半徑23毫米處。 Ik後,於步驟S3,開始施用染料液。噴嘴4丨〇朝向内 周側移動一次。隨後,於施用染料液後,當支承板41〇於 水平方向旋轉時以約3秒移動喷嘴4〇6至半徑4〇毫米位置。 同時’基材202的轉速升高至每分鐘550轉。 本紙張尺度適用中國國家標準(CNS)A4規格(2】〇χ297公釐)First, the first processing program will be described. At step S1 shown in FIG. 17, the number of revolutions of the substrate 202 is increased to about 27 () revolutions per minute, and at the same time, the support plate 410 (see FIG. 3) of the solution supply device is rotated horizontally to move the nozzle 406, For example, to the position of the substrate 202 with a radius of 46 mm. Subsequently, in step S2, the number of revolutions of the substrate 202 is maintained at 27 rpm, and the application of the dye solution is started. In this state, the support plate 41 rotates in the horizontal direction and moves the nozzle 406 to a predetermined position ps of the substrate 202 in about 2 seconds (see Figs. 4 and 20). As shown in FIGS. 4 and 20, the predetermined position Ps is the following position. In other words, the position is defined by the outer periphery of the substrate 202? 1 The deflection towards the inner circumference is not less than 5 mm. This position is not applied on the inner peripheral side of the substrate 202, such as a dye solution portion, in other words, the distance from the peripheral end P0 in the region formed as the dye recording layer 204 is not less than 5 mm toward the outer circumference, preferably Not less than 10 mm, and more preferably not less than 15 mm. In this specific embodiment, the position is located at a radius of 23 mm. After Ik, the application of the dye solution is started in step S3. The nozzle 4 moves once toward the inner peripheral side. Subsequently, after the application of the dye solution, when the support plate 41 was rotated in the horizontal direction, the nozzle 406 was moved to a position of 40 mm in radius by about 3 seconds. At the same time, the rotation speed of the 'substrate 202 is increased to 550 revolutions per minute. This paper size applies to China National Standard (CNS) A4 specifications (2) 0 × 297 mm

-----------♦ (請先閱讀背面之注意事項再填寫本頁) 訂---------線· 30 經濟部智慧財產局員工消費合作社印制衣 504684 A7 B7 五、發明說明(28) 隨後,於步驟S4,停止施用染料液。臂410於水平方 向旋轉而將喷嘴406復原至原先位置(初始態)。 隨後,於步驟S5,基材202之轉數以6秒時間提高至 每分鐘630轉。 隨後,於步驟S6,基材202之轉數以6·3秒時間提高至 每分鐘1400轉。 最後,於步驟S7,基材202之轉數以1.7秒時間提高至 每分鐘2200轉,及然後維持基材202轉數(= 2200 rpm)經 歷5秒。 當於步驟S5至步驟S7轉數增高時,到達基材202外周 緣之過量施用溶液借助於離心力分隔。過量施用溶液濺散 至基材202邊緣周圍。如第2及3圖所示,錢散的過量施用 溶液碰撞濺散防止壁404,收集於設置於其下方的淺碟。 隨後,過量施用液經由汲取口 424回收。施用膜於形成過 程以及施用膜的形成後乾燥。施用膜(染料記錄層)厚度通 t 常係於20至500毫微米及較佳50至300毫微米之範圍。 於前述步驟S1至S7之染料施用步驟,進給施用設備14 之乾燥空氣速度使用空調系統300設定為不大於約0.4米/ 秒。換言之,相對於基材202之染料施用面之空調空氣速 度設定於不大於0.4米/秒。 於步驟S7之處理階段完成時,基材202旋轉停止而完 成染料液施用於基材202之施用處理。 其次,進行第二處理程序如後。首先,於第18圖所示 步驟S101,基材202係以不超過每分鐘300轉之轉數旋轉 本紙張尺度適用中國國家標準(CNS)A4規格(2]0 X 297公釐) ------I I I I I I 1 · I I I I I I I ^ > — — — — — — — (請先閱讀背面之注意事項再填寫本頁) 31 504684 A7----------- ♦ (Please read the precautions on the back before filling out this page) Order --------- line · 30 Printed clothing by the Intellectual Property Bureau of the Ministry of Economic Affairs Employee Consumption Cooperative 504684 A7 B7 V. Description of the invention (28) Subsequently, in step S4, the application of the dye solution is stopped. The arm 410 is rotated in the horizontal direction to return the nozzle 406 to its original position (initial state). Subsequently, in step S5, the number of revolutions of the substrate 202 is increased to 630 revolutions per minute in 6 seconds. Subsequently, in step S6, the number of revolutions of the substrate 202 is increased to 1400 revolutions per minute in 6.3 seconds. Finally, at step S7, the number of revolutions of the substrate 202 is increased to 2200 revolutions per minute in 1.7 seconds, and then the number of revolutions of the substrate 202 (= 2200 rpm) is maintained for 5 seconds. When the number of revolutions increases from step S5 to step S7, the excessive application solution reaching the outer periphery of the substrate 202 is separated by centrifugal force. The excess application solution is scattered around the edges of the substrate 202. As shown in Figs. 2 and 3, the excessive application solution of money scattered hits the splash prevention wall 404, and was collected in a shallow dish provided below it. Subsequently, excess application liquid is recovered via the suction port 424. The application film is dried during the formation process and after the application film is formed. The thickness of the application film (dye recording layer) is usually in the range of 20 to 500 nm and preferably 50 to 300 nm. In the dye application steps of the foregoing steps S1 to S7, the dry air speed of the feed application device 14 is set to not more than about 0.4 m / s using the air conditioning system 300. In other words, the air-conditioning air speed relative to the dye application surface of the substrate 202 is set to not more than 0.4 m / s. At the completion of the processing stage of step S7, the rotation of the substrate 202 is stopped to complete the application process of applying the dye liquid to the substrate 202. Secondly, the second processing procedure is performed as follows. First, at step S101 shown in FIG. 18, the substrate 202 is rotated at a number of revolutions not exceeding 300 revolutions per minute. The size of the paper is applicable to the Chinese National Standard (CNS) A4 specification (2) 0 X 297 mm) --- --- IIIIII 1 · IIIIIII ^ > — — — — — — — (Please read the notes on the back before filling this page) 31 504684 A7

經濟部智慧財產局員工消費合作社印制衣 五、發明說明(29) ’同時溶液施用設備400之臂410(參見第3圖)係於水平方 向旋轉而轉運喷嘴406至距離基材202中心3/4半徑位置向 外偏轉的位置。於噴嘴406到達預定位置ps之時間點,開 始施用染料液。此種程序中,基材202之轉數不超過每分 鐘300轉,較佳不超過每分鐘25〇轉,及最佳不超過每分鐘 200轉。噴嘴4〇6位置係位在距基材2〇2中心3/4半徑,較佳 5/6及更佳9/10位置外側。 本具體實施例中,使用喷嘴406施用染料液之壓力不 超過1.0大氣壓,較佳不大於〇·7大氣壓及最佳不大於〇·5大 氣壓。當噴嘴406直徑增加二倍時,壓力較佳為前述數值 的1/4。當喷嘴直徑縮小至1/2時,壓力較佳為前述數值的 四倍。 使用噴嘴406施用染料液之流速不超過每秒〇.5 cc, 較佳不大於每秒〇.3 cc及最佳不大於每秒〇.2 cc。 隨後,於步驟S102,臂410係以預定移動速度,例如 每秒30毫米速度朝向基材202之内周側移動,同時施用染 料液。 隨後,於步驟S103,恰於噴嘴406到達内圓周前,基 材202之轉數升高至高於前述基材202之轉數(施用開始時 間點之轉數)。 此種程序中,提高基材202轉數之時序設定如下,如 第19圖直線A顯示。換言之,恰於喷嘴406到達内圓周之 前轉數增大,於喷嘴406到達距基材202之最内圓周少於20 宅米間隔距離位置階段,較佳為喷嘴406到達距離短於1 〇 本紙張尺度適用中國國家標準(CNS)A4規格(2】0 x 297公釐) ----------------------^--------- (請先閱讀背面之注意事項再填寫本頁) 32 504684 A7 B7 經濟部智慧財產局員工消費合作社印製Printed clothing by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (29) 'At the same time, the arm 410 (see Figure 3) of the solution application device 400 is rotated in the horizontal direction and transfers the nozzle 406 to the center of the substrate 3 / 4 Radius position for outward deflection. At the time point when the nozzle 406 reaches the predetermined position ps, the application of the dye liquid is started. In this procedure, the number of revolutions of the substrate 202 does not exceed 300 revolutions per minute, preferably not more than 250 revolutions per minute, and most preferably not more than 200 revolutions per minute. The position of the nozzle 406 is 3/4 of the radius from the center of the substrate 202, preferably 5/6 and more preferably 9/10. In this specific embodiment, the pressure at which the dye solution is applied using the nozzle 406 is not more than 1.0 atmosphere, preferably not more than 0.7 atmosphere, and most preferably not more than 0.5 atmosphere. When the diameter of the nozzle 406 is doubled, the pressure is preferably 1/4 of the aforementioned value. When the nozzle diameter is reduced to 1/2, the pressure is preferably four times the aforementioned value. The flow rate of applying the dye liquid using the nozzle 406 is not more than 0.5 cc per second, preferably not more than 0.3 cc per second and most preferably not more than 0.2 cc per second. Subsequently, in step S102, the arm 410 moves toward the inner peripheral side of the substrate 202 at a predetermined moving speed, for example, a speed of 30 mm per second, while applying the dye liquid. Then, in step S103, just before the nozzle 406 reaches the inner circumference, the number of revolutions of the base material 202 is increased to be higher than the number of revolutions of the aforementioned base material 202 (the number of revolutions at the application start time point). In this procedure, the timing setting for increasing the number of revolutions of the substrate 202 is as follows, as shown by the straight line A in FIG. 19. In other words, the number of revolutions increases just before the nozzle 406 reaches the inner circumference, and when the nozzle 406 reaches the position less than 20 m away from the innermost circumference of the substrate 202, it is preferable that the distance reached by the nozzle 406 is shorter than 10 sheets. Standards apply to China National Standard (CNS) A4 specifications (2) 0 x 297 mm) ---------------------- ^ -------- -(Please read the notes on the back before filling out this page) 32 504684 A7 B7 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs

五、發明說明(3〇) 毫米位置階段,及最佳喷嘴406到達距離短於5毫米位置階 段。 另外,提高基材202轉數時序可選定如後。換言之, 轉數可根據喷嘴406朝向基材202内圓周移動成比例增高, 如第19圖之虛線B顯示,或轉數可如第19圖之虛線c顯示 成指數增高。 基材202之轉數大於開始施用之時間點之轉數不少於 50轉。前者大於後者較佳不少於1〇〇轉及最佳不少於2〇〇轉 隨後,於步驟S104,於噴嘴406到達内圓周(例如於半 徑22毫米位置)階段,臂410停止0.2秒。 隨後,於步驟S105,臂410以預定移動速度,例如, 60毫米/秒速度朝向基材202之外周側移動。 隨後,於步驟S106,染料液之施用於噴嘴406距内圓 周於徑向方向間隔預定距離階段停止。臂410於水平方向 旋轉而復原噴嘴406之原先位置(初始狀態)。此種程序中 ’停止施用之時序係在喷嘴406到達距離内圓周小於20毫 米距離位置階段,較佳於噴嘴406到達距離少於10毫米位 置階段,及最佳於喷嘴406到達距離少於5毫米位置階段。 隨後’於步驟S107,基材202之轉數以6秒時間提高 至每分鐘630轉。 隨後,於步驟S108,基材202之轉數以6.3秒時間提高 至每分鐘1400轉。 最後,於步驟S109,基材202之轉數以1.7秒時間提高 本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公釐) I — — — — —--· illlm ^illll —--^ (請先閱讀背面之注意事項再填寫本頁) 504684 經濟部智慧財產局員工消費合作社印製V. Description of the invention (30) mm position stage, and the optimal nozzle 406 reach distance is shorter than 5 mm position stage. In addition, the timing of increasing the number of revolutions of the substrate 202 can be selected as follows. In other words, the number of revolutions can be increased proportionally according to the movement of the nozzle 406 toward the inner circumference of the substrate 202, as shown by the dotted line B in FIG. 19, or the number of revolutions can be exponentially increased as shown by the dotted line c in FIG. The number of revolutions of the substrate 202 is greater than the number of revolutions at the time point when the application is started, not less than 50 revolutions. The former is greater than the latter, preferably no less than 100 revolutions and best no less than 200 revolutions. Subsequently, at step S104, when the nozzle 406 reaches the inner circumference (for example, at a position of 22 mm in diameter), the arm 410 stops for 0.2 seconds. Subsequently, in step S105, the arm 410 moves toward the outer peripheral side of the substrate 202 at a predetermined moving speed, for example, a speed of 60 mm / sec. Subsequently, in step S106, the application of the dye liquid to the nozzle 406 is stopped at a predetermined distance from the inner periphery in the radial direction. The arm 410 is rotated in the horizontal direction to restore the original position (initial state) of the nozzle 406. The timing of 'stop application' in this procedure is at the stage where the nozzle 406 reaches a distance of less than 20 mm from the inner circumference, preferably at the stage where the nozzle 406 reaches a distance of less than 10 mm, and most preferably when the nozzle 406 reaches a distance of less than 5 mm. Position stage. Then, at step S107, the number of revolutions of the substrate 202 is increased to 630 revolutions per minute in 6 seconds. Subsequently, in step S108, the number of revolutions of the substrate 202 is increased to 1400 revolutions per minute in 6.3 seconds. Finally, in step S109, the number of revolutions of the substrate 202 is increased by 1.7 seconds. The paper size is adapted to the Chinese National Standard (CNS) A4 specification (210 x 297 mm). I — — — — — — illlm ^ illll —- -^ (Please read the notes on the back before filling this page) 504684 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs

I --------------11 ^ (請先閱讀背面之注意事項再填寫本頁) A7 _____B7 _ ~ 1 ---------- 五、發明說明(31) 至每分鐘2200轉。隨後,基材2〇2轉數(=22〇〇 rpm)維持5 秒。 當轉數於步驟S107升高至步驟S109時,到達基材2〇2 之外周緣的過量施用溶液介助於離心力分離去除。過量施 用溶液濺散至基材202邊緣周圍。如第2及3圖所示,濺散 的過量施用溶液撞擊濺散防止壁4〇4,收集設於其下方的 淺碟。隨後,過量施用溶液經由汲取口 424回收。 又於第二處理中,饋至施用設備14之乾淨空氣速度使 用空調系統300設定為不超過約〇·4米/秒。換言之,相對 於基材之染料施用面之空調空氣速度設定為不超過約〇4 米/秒。 於步驟S109之處理完成階段,基材2〇2之旋轉停止而 完成染料液於基材202之施用處理。 注意,第17圖所示第一處理可組合第18圖所示第二處 理。 本發明中,用於染料記錄層204之染料並無特殊限制 。有用的染料包括,例如,花青染料,酜花青染料,咪唑 并喹哼啉染料’哼英噚(pyrylium)染料,硫哼英噚染料, 甘菊環哼(azulenium)染料,角鯊^(SqUaUdum)染料,基 於鎳或鉻之金屬錯合物染料,萘颯染料,蒽颯染料,,盼 (indophenol)染料,吲笨胺(ind〇aniHne)染料,三苯基甲烷 染料’部花青染料’氧哼醇(〇χ〇η〇ι)染料,鋁染料,二亞 銨染料,及亞硝基染料。此等染料中,較佳使用花青染料 ,酞花青染料,甘菊環哼染料,角鯊哼染料,氧哼醇染料 本紙張尺度適用中國國家標準(CNS)A4規格(2】〇 X 297公爱) 34 A7I -------------- 11 ^ (Please read the notes on the back before filling this page) A7 _____B7 _ ~ 1 ---------- V. Description of the invention ( 31) to 2200 rpm. Subsequently, the number of revolutions of the substrate (2200 rpm) was maintained for 5 seconds. When the number of revolutions is increased from step S107 to step S109, the excessive application solution reaching the outer periphery of the substrate 202 is assisted by centrifugal separation and removal. The excess application solution is scattered around the edges of the substrate 202. As shown in Figs. 2 and 3, the excessive application solution splashed hits the splash prevention wall 404, and a shallow dish placed below it is collected. Subsequently, the excess application solution is recovered via the suction port 424. Also in the second process, the clean air speed fed to the application device 14 using the air-conditioning system 300 is set to not more than about 0.4 m / sec. In other words, the air-conditioning air speed relative to the dye application surface of the substrate is set to not more than about 0.4 m / s. At the processing completion stage of step S109, the rotation of the substrate 202 is stopped and the application treatment of the dye liquid on the substrate 202 is completed. Note that the first process shown in Fig. 17 can be combined with the second process shown in Fig. 18. In the present invention, the dye used for the dye recording layer 204 is not particularly limited. Useful dyes include, for example, cyanine dyes, cyanine dyes, imidazoquinoline dyes' pyrylium dyes, thiohumine dyes, chamomile azulenium dyes, horny sharks (SqUaUdum) Dyes, metal complexes based on nickel or chromium, naphthalene dyes, anthracene dyes, indophenol dyes, indoaniline dyes, triphenylmethane dyes Hexanol (〇χ〇η〇ι) dyes, aluminum dyes, diimmonium dyes, and nitroso dyes. Among these dyes, cyanine dyes, phthalocyanine dyes, camomile ring dyes, shark hum dyes, and oxol dyes are preferably used. The paper size is applicable to China National Standard (CNS) A4 specifications (2) 0X 297. ) 34 A7

五、發明說明(32) 經濟部智慧財產局員工消費合作社印制π 及咪唑并喳哼啉染料。 形成染料記錄層204之施用劑的溶劑包括,例如,酯 如乙酸丁酯及乙酸溶纖素;酮如甲基乙基甲酮,環己酮及 甲基異丁基甲酮;氣化烴如二氣甲烷,丨,2·二氣乙烷及氯 仿;醯胺如二甲基甲醯胺;烴如環己烷;醚如四氫咬喃, 乙喊及一 σ弓院·,醇如乙醇’正丙醇,異丙醇,正丁醇及二 丙酮醇;氟溶劑如2,2,3,3-四氟-1-丙醇;及二醇醚如乙二 醇一甲謎’乙二醇一乙鍵,丙二醇一甲_。 溶劑可單獨使用或考慮欲溶解的染料性質以適當方式 組合二或多種溶劑使用。較佳,使用之氟溶劑之2,2,3 3· 四氟· 1 -丙醇。若有所需可添加防褪色劑及黏結劑。進一 步’依據使用目的而定,可添加多種添加劑如抗氧化劑、 紫外光吸收劑、增塑劑及潤滑劑至使用溶液。 防褪色劑之代表例包括亞硝基化合物,金屬錯合物, 二亞銨鹽及胺$鹽。此等範例,例如述於專利文件如曰本 專利公開案第 2-300288,3-224793及4_ 146189號。 黏結劑包括,例如,自然有機高分子化合物如明膠, 纖維素衍生物,葡萄聚糖,松香,及橡膠;以及合成有機 高分子化合物包括,例如,烴樹脂如聚乙烯,聚丙烯,聚 笨乙烯及聚異丁烯;乙烯基樹脂如聚乙烯基氣,聚乙烯基 亞乙烯基,及聚乙烯基氣-聚乙酸乙烯酯共聚物,丙烯酸 系樹脂如聚丙烯酸曱酯及聚甲基丙烯酸甲酯,聚乙烯醇, 氣化聚乙烯,環氧樹脂,丁醛樹脂,橡膠衍生物及熱固樹 脂如酚-甲醛樹脂之初步縮合物。 本纸張尺度適用中國國家標準(CNS)A4規格(210x297公釐) I n ϋ ϋ n n n n l n n I n n n n n n n 一eJ· n I— n n I— i I (請先閱讀背面之注意事項再填寫本頁) 35 504684 A7V. Description of the invention (32) π and imidazopyreline dyes are printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. Solvents for the application agent forming the dye recording layer 204 include, for example, esters such as butyl acetate and cellosolve acetate; ketones such as methyl ethyl ketone, cyclohexanone, and methyl isobutyl ketone; gasified hydrocarbons such as digas Methane, 丨, digas ethane and chloroform; ammonium amines such as dimethylformamide; hydrocarbons such as cyclohexane; ethers such as tetrahydrofuran, acetone and a sigma bowel, alcohols such as ethanol 'n Propanol, isopropanol, n-butanol, and diacetone alcohol; fluorinated solvents such as 2,2,3,3-tetrafluoro-1-propanol; and glycol ethers such as ethylene glycol-methyl ether-ethylene glycol- B bond, propylene glycol monomethyl. The solvent may be used alone or in a suitable manner in combination of two or more solvents in consideration of the properties of the dye to be dissolved. Preferably, 2,2,3 3 · tetrafluoro · 1-propanol is used as the fluorine solvent. If necessary, anti-fading agent and adhesive can be added. Further 'depending on the purpose of use, various additives such as antioxidants, ultraviolet light absorbers, plasticizers and lubricants may be added to the use solution. Representative examples of anti-fading agents include nitroso compounds, metal complexes, diimmonium salts, and amine salts. Such examples are described in patent documents such as Japanese Patent Publication Nos. 2-300288, 3-224793, and 4_146189. Binders include, for example, natural organic polymer compounds such as gelatin, cellulose derivatives, glucosan, rosin, and rubber; and synthetic organic polymer compounds include, for example, hydrocarbon resins such as polyethylene, polypropylene, and polyethylene. And polyisobutylene; vinyl resins such as polyethylene-based gas, polyethylene vinylidene, and polyethylene-based gas-polyvinyl acetate copolymers, acrylic resins such as polymethyl acrylate and polymethyl methacrylate, poly Primary condensation products of vinyl alcohol, gasified polyethylene, epoxy resin, butyraldehyde resin, rubber derivatives and thermosetting resins such as phenol-formaldehyde resin. This paper size applies to China National Standard (CNS) A4 (210x297 mm) I n ϋ ϋ nnnnlnn I nnnnnnn eJ · n I— nn I— i I (Please read the precautions on the back before filling this page) 35 504684 A7

經濟部智慧財產局員工消費合作社印製 五、發明說明(33 ) 使用黏結劑時’黏結劑通常之用量相對於1 〇〇份重量 比染料不超過20份重量比,較佳不超過1〇份重量比,及更 佳不超過5份重量比。 底塗層可提供於基材202之形成染料記錄層204該側表 面上俾改進平坦度’改善黏著力及防止染料記錄層2〇4的 品質低劣。 底塗層材料包括例如高分子量化合物如聚甲基丙烯酸 甲酯,丙烯酸-甲基丙烯酸共聚物,笨乙烯-馬來酐共聚物 ’聚乙烯醇,N-羥甲基丙烯醯胺,苯乙烯-乙烯基甲苯共 聚物’氣續化聚乙烯,硝基纖維素,聚乙烯基氣,氯化聚 乙稀,聚醋,聚醯亞胺,乙酸乙烯酯-乙烯基氣共聚物, 乙烯-乙酸乙烯酯共聚物,聚乙烯,聚丙烯及聚碳酸酯; 以及表面改性劑如石夕烧偶合劑。 底塗層之形成方式為前述物質溶解或分散於適當溶劑 製備施用液,然後施用液利用施用方法例如旋塗、浸塗及 擠塑塗布施用於基材表面上。底塗層之層厚度通常需於 0·005至20微米’及較佳〇·〇ι至1〇微米之範圍。 其上形成染料記錄層204之基材202藉第三轉運機構50 轉運至隨後之背面洗滌機構54洗滌與基材202之第一主面 相反側表面(背面)。隨後,基材202藉第四轉運機構56送 至隨後的編號機構58。如第20圖所示,戳記476例如批號 利用噴墨機形成於基材202第一主面或背面之内周邊的透 明部份474。 隨後,基材202藉第五轉運機構60轉運至隨後之查驗 本纸張尺度適用中國國家標準(CNS)A4規格(210x297公釐) ! ,%------- 丨訂i n n n n flu —Bi I (請先閱讀背面之注意事項再填寫本頁) 36 504684 A7 B7 Φ 經濟部智慧財產局員工消費合作社印制衣 五、發明說明(34 ) 機構62來檢查是否存在有任何基材202瑕疵之染料記錄層 204的薄膜厚度。檢查可藉照光於基材202背面進行,以及 使用例如CCD攝影機進行光透射狀態的影像處理。藉查驗 機構62檢查結果送到隨後的分類機構68。 已經完成前述檢查處理的基材202被分類機構68分類 及基於檢驗結果轉運至正常品之堆疊柱64或不良品之堆疊 柱66。 於預定數目的基材202堆疊於正常品堆疊柱64之階段 ,由施用設備14取出正常品堆疊柱64且轉運至隨後的後處 理設備16。堆疊柱64其容納於後處理設備16之堆疊柱容納 區段80。轉運可使用車具進行或可使用自行推進自動轉運 裝置進行。 於正常品堆疊柱64容納於堆疊柱容納區段80階段,作 動第六轉運機構82。基材202逐一由堆疊柱64取出且被轉 運至設置於下游階段的靜電吹送機構84。藉第一靜電吹送 機構84由被轉運至靜電吹送機構84的基材202去除靜電。 隨後,基材202藉第七轉運機構86被轉運至隨後濺鍍機構88 如第15C圖所示,反光層208係經由於全表面濺鍍形 成,但被導入濺鍍機構88之基材202第一主面之周緣部(邊 緣部)除外。 反光物質為反光層208材料,是一種相對於雷射束具 有高反射比的物質。反光物質包括,例如不鏽鋼,類金屬 ,及金屬例如 Mg,Se,Y,Ti,Zr,Hf,V,Nb,Ta,Cr 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ——---------^----------I ——---線 (請先閱讀背面之注意事項再填寫本頁) 37 504684 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(35) ,Mo,W,Mn,Re,Fe,c〇,Ni,Ru,Rh,Pd,Ir,pt ,Cu,Ag,An,Zn,Cd,A1,Ga,In,Si,Ge,Te,Pb ,Po,Sn及Bi。 其中,較佳使用Cr,Ni,Pt,Cu,Ag,An,A1及不 鏽鋼。物質可單獨或組合二種或多種使用。另外,物質可 呈合金使用。特佳使用銀或其合金。 反光層208可,例如,經由對前述反光物質進行蒸氣 沉積、濺鍍或離子鍍敷形成於記錄層上。反光層厚度通常 係於10至800毫微米,較佳20至5〇〇毫微米及更佳5〇至3〇〇 亳微米之範圍。 其上形成反光層208之基材202藉第八轉運機構90轉運 至隨後之邊緣洗滌機構92。如第16A圖所示,於基材2〇2 之第一主面緣部206經洗滌而去除形成於緣部2〇6上的染料 記錄層204。隨後,基材2〇2藉第九轉運機構1〇2轉運至隨 後第二靜電吹送機構94去除靜電。 隨後,基材202亦藉第九轉運機構1〇2轉運至可紫外光 固化液施用機構96。可紫外光固化液滴至基材2〇2之第一 主面部份上。隨後,基材2〇2亦藉第九轉運機構1〇2轉運至 隨後的離心機構98。基材202以高速旋轉。如此,滴於基 材202之可紫外光固化液之施用膜厚度於基材2〇2全表面上 均勻。 本具體實施例中,時程規劃的管理為於反光層2〇8形 成厚至可务、外光固化溶液施用前之時間不少於2秒而於5分 鐘以内。 ---------------------訂---------線 (請先閱讀背面之注意事項再填寫本頁)Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (33) When using a binder, the usual amount of the binder is not more than 20 parts by weight relative to 100 parts by weight, and preferably not more than 10 parts by weight. Weight ratio, and more preferably not more than 5 parts by weight. The undercoat layer can be provided on the side surface of the substrate 202 forming the dye recording layer 204 to improve flatness' to improve adhesion and prevent the quality of the dye recording layer 204 from being inferior. The undercoat material includes, for example, a high molecular weight compound such as polymethyl methacrylate, acrylic acid-methacrylic acid copolymer, styrene-maleic anhydride copolymer, 'polyvinyl alcohol, N-hydroxymethacrylamide, styrene- Vinyl toluene copolymer 'gas-extended polyethylene, nitrocellulose, polyethylene-based gas, chlorinated polyethylene, polyacetate, polyimide, vinyl acetate-vinyl gas copolymer, ethylene-vinyl acetate Ester copolymers, polyethylene, polypropylene and polycarbonate; and surface modifiers such as Shiyaki coupling. The undercoat layer is formed by dissolving or dispersing the aforementioned substances in an appropriate solvent to prepare an application liquid, and then the application liquid is applied to the surface of the substrate by application methods such as spin coating, dip coating, and extrusion coating. The thickness of the undercoat layer is usually in the range of 0.005 to 20 microns' and preferably 0.00 to 10 microns. The substrate 202 on which the dye recording layer 204 is formed is transferred by the third transfer mechanism 50 to the subsequent back surface washing mechanism 54 to wash the surface (back surface) opposite to the first main surface of the substrate 202. Subsequently, the substrate 202 is sent to the subsequent numbering mechanism 58 by the fourth transfer mechanism 56. As shown in Fig. 20, a stamp 476, such as a lot number, is formed on a transparent portion 474 on the inner periphery of the first main surface or the back surface of the substrate 202 by an inkjet machine. Subsequently, the substrate 202 is transferred to the subsequent inspection by the fifth transfer mechanism 60. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210x297 mm)!,% ------- 丨 order innnn flu —Bi I (Please read the precautions on the back before filling this page) 36 504684 A7 B7 Φ Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs V. Invention Description (34) Institution 62 to check whether there are any defects in the substrate 202 The film thickness of the dye recording layer 204. The inspection can be performed by irradiating light on the back surface of the substrate 202, and image processing in a light transmission state using, for example, a CCD camera. The results of the inspection by the inspection agency 62 are sent to the subsequent classification agency 68. The substrate 202 that has completed the aforementioned inspection process is classified by the classification mechanism 68 and transferred to a normal product stack column 64 or a defective product stack column 66 based on the inspection results. At the stage where a predetermined number of substrates 202 are stacked on the normal product stacking column 64, the normal product stacking column 64 is taken out by the application device 14 and transferred to the subsequent post-processing device 16. The stacking column 64 is accommodated in the stacking column receiving section 80 of the post-processing apparatus 16. Transfers can be made with a vehicle or with a self-propelled automatic transfer device. When the normal product stacking column 64 is accommodated in the stacking column accommodating section 80, the sixth transfer mechanism 82 is operated. The substrates 202 are taken out one by one from the stacking column 64 and transferred to the electrostatic blowing mechanism 84 provided at the downstream stage. The static electricity is removed from the substrate 202 transferred to the electrostatic blowing mechanism 84 by the first electrostatic blowing mechanism 84. Subsequently, the substrate 202 is transferred to the subsequent sputtering mechanism 88 by the seventh transfer mechanism 86. As shown in FIG. 15C, the reflective layer 208 is formed by full-surface sputtering, but is introduced into the substrate 202 of the sputtering mechanism 88. Except the peripheral part (edge part) of one main surface. The reflective material is a material of the reflective layer 208 and is a material having a high reflectance with respect to the laser beam. Reflective materials include, for example, stainless steel, metalloids, and metals such as Mg, Se, Y, Ti, Zr, Hf, V, Nb, Ta, Cr. The paper dimensions are applicable to China National Standard (CNS) A4 (210 X 297 mm). ) ——--------- ^ ---------- I ——--- line (Please read the precautions on the back before filling out this page) 37 504684 Bureau of Intellectual Property, Ministry of Economic Affairs Printed by employee consumer cooperative A7 B7 V. Description of the invention (35), Mo, W, Mn, Re, Fe, co, Ni, Ru, Rh, Pd, Ir, pt, Cu, Ag, An, Zn, Cd, A1, Ga, In, Si, Ge, Te, Pb, Po, Sn, and Bi. Among them, Cr, Ni, Pt, Cu, Ag, An, A1 and stainless steel are preferably used. The substances may be used singly or in combination of two or more kinds. Alternatively, the substance may be used as an alloy. Particularly preferred is silver or an alloy thereof. The light reflecting layer 208 may be formed on the recording layer, for example, by vapor-depositing, sputtering, or ion plating the aforementioned light-reflecting substance. The thickness of the reflective layer is usually in the range of 10 to 800 nm, preferably 20 to 5000 nm and more preferably 50 to 300 μm. The substrate 202 on which the reflective layer 208 is formed is transferred by the eighth transfer mechanism 90 to the subsequent edge washing mechanism 92. As shown in FIG. 16A, the edge portion 206 of the first main surface of the substrate 200 is washed to remove the dye recording layer 204 formed on the edge portion 206. Subsequently, the substrate 200 is transferred by the ninth transfer mechanism 102 to the subsequent electrostatic blowing mechanism 94 to remove static electricity. Subsequently, the substrate 202 is also transferred to the ultraviolet-curable liquid application mechanism 96 by the ninth transfer mechanism 102. The UV-curable liquid droplet is dropped on the first main surface portion of the substrate 202. Subsequently, the substrate 202 is also transferred to the subsequent centrifuge mechanism 98 by the ninth transfer mechanism 102. The substrate 202 rotates at a high speed. In this way, the thickness of the application film of the ultraviolet curable liquid dropped on the substrate 202 is uniform on the entire surface of the substrate 202. In this specific embodiment, the management of the time schedule is that the reflective layer 208 is formed to be thick, and the time before the external light curing solution is applied is not less than 2 seconds and less than 5 minutes. --------------------- Order --------- line (Please read the precautions on the back before filling this page)

38 504684 經濟部智慧財產局員工消費合作社印製 A7 _____B7___ 五、發明說明(36 ) 隨後,基材202亦藉第九轉運機構102轉運至隨後之紫 外光照射機構100。紫外光照射至基材202上的紫外光可固 化溶液。如此,如第16B圖所示,由可紫外光固化樹脂組 成的保護層210形成’故形成於基材202第一主面之反光層 208及染料記錄層204以保護層覆蓋。如此,構成光碟D。 保護層210設於反光層208上俾染料記錄層204等可受 物理及化學保護。保護層210亦設於基材之未提供染料記 錄層204該邊上俾提升耐刮性及防水性。可用做保護層21 〇 之材料包括,例如,無機物質如SiO,Si02,MgF2,Sn02 ’及Si"4 ;及有機物質如熱塑性樹脂、熱固性樹脂及可 紫外光固化樹脂。 保護層210,例如,可經由層疊借助於黏著劑經由擠 塑塑膠於反光層208上及/或基材202上所得薄膜層合形成 。另外’保護層210可利用另一種方法,例如澂鍍及施用 提供。當使用熱塑性樹脂或熱固性樹脂時,保護層2丨〇也 丨可經由溶解樹脂於適當溶劑而施用施用液,然後施用施用 液接著乾燥形成。 於可紫外光可固化樹脂之例,保護層21〇可就此使用 樹脂或溶解樹脂於適當溶劑製備施用液,然後施用施用液 接著照射紫外光固化樹脂形成。依據使用目的而定,可添 加多種添加劑如抗靜電劑、抗氧化劑及紫外光吸收劑至施 用液。保護層210之層厚度通常係於〇1至1〇〇微米之範圍 〇 隨後,光碟D藉第十轉運機構1〇4轉運至隨後瑕疵檢 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) — III —--I---I 1 - — — — III — — —--1 I I (請先閱讀背面之注意事項再填寫本頁) 39 經濟部智慧財產局員工消費合作社印製 504684 A7 _____B7 ___ 五、發明說明(37 ) 驗機構106及特徵檢驗機構108來檢驗染料記錄層204表面 及保護層210表面以及基於信號特徵形成於光碟Β之基材 202上的凹槽200是否存在有瑕疲。此等檢驗係藉照光於光 碟D二面且使用,例如,CCD攝影機執行反光的影像處理 達成。藉瑕疵檢驗機構106及特徵檢驗機構108所得檢驗結 果送至隨後分類機構114。38 504684 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 _____B7___ V. Description of the Invention (36) Subsequently, the substrate 202 is also transferred to the subsequent ultraviolet irradiation mechanism 100 by the ninth transfer mechanism 102. The ultraviolet light irradiates the ultraviolet light onto the substrate 202 to cure the solution. In this way, as shown in FIG. 16B, the protective layer 210 composed of the ultraviolet-curable resin is formed ', so that the light reflecting layer 208 and the dye recording layer 204 formed on the first main surface of the substrate 202 are covered with the protective layer. In this way, the optical disc D is constructed. The protective layer 210 is provided on the light-reflecting layer 208, and the rhenium dye recording layer 204 and the like can be protected physically and chemically. The protective layer 210 is also provided on the side of the substrate without the dye recording layer 204 provided to improve scratch resistance and water resistance. Materials that can be used as the protective layer 21 0 include, for example, inorganic substances such as SiO, Si02, MgF2, Sn02 'and Si "; and organic substances such as thermoplastic resins, thermosetting resins, and ultraviolet-curable resins. The protective layer 210 may be formed by laminating a thin film obtained by laminating an extruded plastic on the light-reflecting layer 208 and / or the substrate 202 by means of an adhesive, for example. Alternatively, the 'protective layer 210 may be provided by another method, such as, for example, hafnium plating and application. When a thermoplastic resin or a thermosetting resin is used, the protective layer 2 can also be formed by applying an application solution by dissolving the resin in an appropriate solvent, and then applying the application solution followed by drying. In the case of a UV-curable resin, the protective layer 21 can be prepared by using a resin or dissolving the resin in an appropriate solvent, and then applying the application liquid and then irradiating the UV-curable resin. Depending on the purpose of use, various additives such as antistatic agents, antioxidants and ultraviolet light absorbers can be added to the application liquid. The layer thickness of the protective layer 210 is usually in the range of 0.001 to 100 microns. Subsequently, the optical disc D is transferred by the tenth transfer mechanism 104 to the subsequent defect inspection. The paper dimensions apply the Chinese National Standard (CNS) A4 specification (210 X 297 Public Love) — III —-- I --- I 1-— — — III — — —-- 1 II (Please read the notes on the back before filling out this page) 39 Employees' Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs Print 504684 A7 _____B7 ___ V. Description of the invention (37) The inspection mechanism 106 and the characteristic inspection mechanism 108 inspect the surface of the dye recording layer 204 and the surface of the protective layer 210 and the groove 200 formed on the substrate 202 of the optical disc B based on signal characteristics Whether there are flaws. These inspections are achieved by using light on both sides of the disc D, for example, a CCD camera performs reflective image processing. The inspection results obtained by the defect inspection agency 106 and the characteristic inspection agency 108 are sent to the subsequent classification agency 114.

• 已經完成刖述瑕疲檢驗過程及特徵檢驗過程的光碟D 基於檢驗結果藉分類機構114分類並轉運至正常品堆疊柱 110 ’或不良品堆疊柱112。 於預定數目光碟D堆疊於正常品之堆疊柱11〇階段, 堆疊柱110由後處理設備16取出且引進標籤印刷步驟(文中 未舉例說明)。 如刖述,於根據本發明之具體實施例之製造系統10中 ,當旋轉基材202之同時施用形成染料記錄層2〇4之染料液 於基材202時,由開始施用染料液時間點t〇至閥全開之時 間點tl經歷的時間τδ不小於〇1秒而不大於丨秒,故洩放染 料液之閥裝置408之閥開啟速度緩慢。因此,於施用開始 時間點to禁止染料液由噴嘴406突然洩放。於染料液落至 基材202上的時間點可避免染料液於各方向濺散。結果, 可防止出現任何瑕疵外觀,且可改良光碟〇產率。 特別,本發明之具體實施例中,染料液施用起點Ps( >考第4及20圖)係位於基材202内周邊距未施用p〇不小於5 亳米位置,亦即,距欲形成為染料記錄層204該區内周側 末端P0朝向外周側偏轉不少於5毫米位 L------------·!1! til------ (請先閱讀背面之注意事項再填寫本頁)• The disc D that has completed the description of the defect inspection process and the characteristic inspection process is classified by the classification mechanism 114 and transferred to the normal product stacking column 110 ′ or the defective product stacking column 112 based on the inspection results. At a predetermined number of stages of the stacking column 110 in a normal number of optical discs D, the stacking column 110 is taken out by the post-processing device 16 and a label printing step is introduced (not illustrated in the text). As described, in the manufacturing system 10 according to a specific embodiment of the present invention, when the dye liquid forming the dye recording layer 204 is applied to the base material 202 while the base material 202 is rotated, the time point t at which the dye liquid application is started is started. The time τδ elapsed from the time point t1 when the valve is fully opened is not less than 0 seconds and not more than 1 second, so the valve opening speed of the valve device 408 for discharging the dye liquid is slow. Therefore, the dye liquid is prevented from being suddenly discharged from the nozzle 406 at the application start time point to. The time when the dye liquid falls on the substrate 202 can prevent the dye liquid from being scattered in all directions. As a result, any defective appearance can be prevented, and the optical disc yield can be improved. In particular, in a specific embodiment of the present invention, the starting point Ps (> Figs. 4 and 20) of the application of the dye solution is located at a position of not less than 5 mm from the inner periphery of the substrate 202 without applying p0, that is, the distance from the formation For the dye recording layer 204, the peripheral end P0 in this region is deflected not less than 5 mm toward the outer peripheral side L ------------! 1! Til ------ (Please read first (Notes on the back then fill out this page)

40 504684 經濟部智慧財產局員工消費合作社印制衣 A7 B7 五、發明說明(38) ' 當施用開始位置Ps於基材202内側之未施用部P0充份 隔開時,即使溶液濺散也不會發生問題,原因如後。換言 之,於隨後進行施用處理期間濺散的小滴流走。 恰於·開始施用後,染料液的洩放量隨時間的經過暫時 改變,故不穩定。因此,較佳於與内圓周略為隔開位置開 始施用,理由如後。換言之,若施用始於内圓周,則引起 非均勻施用,可能染料記錄層204之内圓周末端無法形成 完美的圓。 本發明之具體實施例中,喷嘴406—次由開始施用染 料液之時間點P0朝向内周側移動。因此,如第21圖所示 ,染料記錄層204之内周邊形成完美圓。 若施用始於基材202之外侧,當染料液毗鄰基材202之 外圓周末端P1時,染料液於各方向濺散。結果,例如, 出現施用部附近被染色問題,溶液黏著於基材202背面。 因此,如本發明之具體例,施用開始位置ps較佳位置 > 在基材202,更佳位於由基材202之外圓周末端P1朝向内 圓周偏轉不小於5毫米位置。進一步,施用開始位置ps係 位於由基材202之内周側之未施用位置P0朝向外圓周偏轉 不少於5毫米,較佳不少於10毫米,及更佳不少於15毫米 位置。 他方面’於本發明之具體實施例中,施加於染料液之 壓力’亦即,加壓槽452之壓力不高於1千克力/平方厘米 。通常’當染料液施用基材202時,突然開始洩放染料液 時染料液於各方向濺散。相反地,當施加於染料液之壓力 本纸張尺度適用中國國家標準(CNS)A4規格(210 x 297公釐) II---- - -------. I I I I I I I 訂· —------ (請先閱讀背面之注意事項再填寫本頁) 41 經濟部智慧財產局員工消費合作社印製40 504684 Printed clothing A7 B7 of the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (38) 'When the application start position Ps is sufficiently separated from the non-application part P0 inside the substrate 202, even if the solution splashes Problems will occur for the following reasons. In other words, the droplets scattered during the subsequent application treatment flowed away. Immediately after the application is started, the discharge amount of the dye solution temporarily changes with the passage of time, and is therefore unstable. Therefore, it is preferable to start the application at a position slightly spaced from the inner circumference for the following reasons. In other words, if the application starts from the inner circumference, it causes non-uniform application, and it is possible that the end of the inner circumference of the dye recording layer 204 cannot form a perfect circle. In a specific embodiment of the present invention, the nozzle 406 is moved toward the inner peripheral side from the time point P0 at which the application of the dye liquid is started. Therefore, as shown in FIG. 21, the inner periphery of the dye recording layer 204 forms a perfect circle. If the application starts on the outer side of the substrate 202, when the dye liquid is adjacent to the outer peripheral end P1 of the substrate 202, the dye liquid is scattered in all directions. As a result, for example, there is a problem that the vicinity of the application portion is stained, and the solution adheres to the back surface of the substrate 202. Therefore, as in the specific example of the present invention, the application start position ps is a preferred position > On the substrate 202, it is more preferably located at a position deflected from the outer peripheral end P1 of the substrate 202 toward the inner circumference by not less than 5 mm. Further, the application start position ps is a position deflected from the non-application position P0 on the inner peripheral side of the substrate 202 toward the outer circumference by not less than 5 mm, preferably not less than 10 mm, and more preferably not less than 15 mm. On the other hand, in a specific embodiment of the present invention, the pressure applied to the dye solution is, that is, the pressure of the pressure tank 452 is not higher than 1 kgf / cm2. Normally, when the dye liquid is applied to the substrate 202, the dye liquid splashes in all directions when the dye liquid suddenly starts to be discharged. Conversely, when the pressure applied to the dye solution is in accordance with the Chinese National Standard (CNS) A4 specification (210 x 297 mm) II ------------. IIIIIII Order · --- ---- (Please read the notes on the back before filling out this page) 41 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs

--------------- (請先閱讀背面之注意事項再填寫本頁) A7 ^〜-----B7_ 五、發明說明(39 ) 小時,由於染料液未濺散至極大程度故不會發生瑕疵外觀 專問題。 但若壓力過低,則每單位時間的洩放量減少,且施用 速度緩慢。因此,需要長時間才能施用規定量的染料液。 結果,可能發生產出量減少及生產效率降低問題。 因此,施加於染料液之壓力之較佳範圍如後述。換言 之’上限不高於1千克力/平方厘米,較佳不高於〇 8千克 力/平方厘米,及最佳不高於〇·6千克力/平方厘米。下限不 低於0.02千克力/平方厘米,較佳不低於〇〇5千克力/平方 厘米,及最佳不低於〇·1千克力/平方厘米。 根據本發明之具體實施例使用製造系統1〇製造的光碟 D之製造方式為,當施用染料液之施用處理時染料液施用 於基材202之内周側時,於施用開始時間點之基材2〇2轉數 增高。 考慮此點,於第17圖所示第一方法案例,當喷嘴4〇6 由基材202之内圓周朝向外圓周移動時,基材2〇2轉數增高 。因此,施用基材202之染料液之膜厚度於基材202之全表 面上實質上均勻。如此,可減少推拉信號於徑向方向的分 散程度。進一步,允許推拉信號之信號強度於規定範圍以 内。結果為面品質光碟D。 於第18圖所示第二方法例,當噴嘴4〇6朝向基材202之 内圓周移動時基材202轉數增高。因此,如第21圖所示, 即使染料液施用量減少,仍可於内圓周獲得施用部份80之 良好形狀(實質上完美圓)。進一步,可於基材202全表面 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)--------------- (Please read the precautions on the back before filling this page) A7 ^ ~ ----- B7_ 5. Explanation of the invention (39) hours, Spatters are scattered to the greatest extent so that no defects in appearance can occur. However, if the pressure is too low, the release amount per unit time is reduced, and the application rate is slow. Therefore, it takes a long time to apply a prescribed amount of the dye liquid. As a result, problems such as a decrease in output and a decrease in production efficiency may occur. Therefore, a preferable range of the pressure applied to the dye liquid is described later. In other words, the upper limit is not more than 1 kgf / cm2, preferably not more than 0.8 kgf / cm2, and most preferably not more than 0.6 kgf / cm2. The lower limit is not less than 0.02 kgf / cm2, preferably not less than 0.05 kgf / cm2, and most preferably not less than 0.1 kgf / cm2. According to a specific embodiment of the present invention, the manufacturing method of the optical disc D using the manufacturing system 10 is such that when the dye solution is applied to the inner peripheral side of the substrate 202 during the application treatment of the dye solution, the substrate at the application start time point The number of revolutions increased by 200. Considering this, in the first method case shown in FIG. 17, when the nozzle 406 is moved from the inner circumference of the substrate 202 toward the outer circumference, the number of revolutions of the substrate 202 increases. Therefore, the film thickness of the dye solution to which the substrate 202 is applied is substantially uniform over the entire surface of the substrate 202. In this way, the degree of dispersion of the push-pull signals in the radial direction can be reduced. Furthermore, the signal strength of the push-pull signal is allowed to be within the specified range. The result is a face-quality disc D. In the second method example shown in FIG. 18, when the nozzle 406 is moved toward the inner circumference of the substrate 202, the number of revolutions of the substrate 202 increases. Therefore, as shown in FIG. 21, a good shape (substantially perfect circle) of the application portion 80 can be obtained on the inner circumference even if the application amount of the dye solution is reduced. Further, it can be applied on the entire surface of the substrate 202. The paper size is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm).

42 經濟部智慧財產局員工消費合作社印製 504684 A7 B7 五、發明說明(4〇)42 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 504684 A7 B7 V. Description of Invention (4)

上形成均勻染料記錄層204。如此,可製造高品質光碟D 〇 根據本發明之具體實施例光碟D除了第1圖所示製造 系統外,也可使用第22圖所示製造系統600生產。 第22圖所示製造系統600包含二模製設備(第一及第二 模製設備602A,602B)用於利用,例如,鑄塑、壓塑、或 射出壓塑生產基材202;而施用設備(第一及第二施用設備 604A,604B)藉由施加染料施用液於基材202之第一主面 上繼以乾燥而形成染料記錄層204於基材202上;一檢驗設 備606用以查驗箱施用設備604A ’ 604B形成的染料記錄層 204 ’以及一後處理设備608用以利用例如賤錄而於基材202 之染料記錄層204上形成反光層,及然後施用可紫外光固 化〉谷液於反光層上’接者照射紫外光形成保護層於反光層 上。 第一及第二模製設備602A,602B各自包括模製機器 610用以進行樹脂材料如聚碳酸醋之鑄塑、壓塑或射出壓 塑而生產基材202於其第一主面上形成軌跡槽或不規則度( 凹槽200)來指示’例如位址信號;以及冷卻輸送器612用 以冷卻基材202同時由模製機器610中轉運出基材202。冷 卻處理後用以堆疊及存放基材202的堆疊柱614係安裝於冷 卻輸送器612終端。 第一及第一施用設備604A,604B各自包含三部旋塗 裝置616用以%用染料及洗務邊緣,以及多關節機器人618 用以對第一及第二模製設備6〇2A,602B逐一提取堆疊於 本紙張尺度顧巾關家鮮(CNUA4規格(21〇 X 297公爱) — — — — — IIIIIII — —— — — — — I— ^ ' — — III — — — (請先閱讀背面之注意事項再填寫本頁) 43 504684 經濟部智慧財產局員工消費合作社印製 A7 ___ B7_ 五、發明說明(41 ) 堆疊柱614之基材202且將基材202轉運至旋塗裝置616。 檢驗設備606包含一第一轉運輸送器620用以轉運於第 一施用設備604A完成處理的基材202至次一步驟;一第二 轉運輸送器622用以轉運於第二施用設備604B完成處理的 基材202至次一步驟;一編號機構624用以戳印批號等於藉 第一及第二轉運輸送器620,622轉運來的基材202上;一 第一轉運機構626用以轉運已經完成戳印批號等的基材202 至次一步驟;及一檢驗機構628用以檢驗由第一轉運機構 626轉運的基材202之染料記錄層204是否存在有瑕疵及薄 膜厚度。 後處理設備608包含基材輸入機構630用以接納藉檢驗 機構628已經完成檢驗處理的基材202 ; —濺鍍機構632用 以利用濺鍍形成一反光層於藉基材輸入機構630輸入的基 材202之第一主面上;一第二轉運機構634用以循序轉運已 經完成反光層濺鍍的基材202至次一步驟;二施用離心機 構(第一及第二施用離心機構636A,636B)用以施用可紫 外光固化溶液至藉第二轉運機構634轉運而來的基材202及 然後以高速迴轉基材202獲得均勻厚度之可紫外光固化溶 液施用膜於基材202上;一第三轉運機構638用以轉運已經 於第一及第二施用離心機構636A,636B之任一者完成處 理的基材202至次一步驟;一紫外光照射機構640用以照射 紫外光於藉第三轉運機構638轉運來的基材202,故可紫外 光固化溶液固化而形成保護層於基材202之第一主面上; 一第四轉運機構642用以轉運經過紫外光照射的基材202至 本紙張尺度適用中國國家標準(CNS)A4規格(210x 297公釐) > -44 - -----II---IMW'---丨 i 訂---------線· (請先閱讀背面之注意事項再填寫本頁) 504684 A7 B7 經濟部智慧財產局員工消費合作社印制衣 五、發明說明(42 次一步驟;一瑕疵檢驗機構644用以檢驗藉第四轉運機構 642轉運來之基材202之施用面及保護層表面的瑕疵;以及 一分類機構650用以依據藉瑕疵檢驗機構644進行檢驗所得 檢驗結果,將基材202分類成堆疊於正常品之堆疊柱646及 堆疊於不良品之堆疊柱648。 又於製造系統600案例,當於施用染料液至基材202之 施用處理中,染料液施用於基材202之内周側時進行第17 圖所示第一處理。如此,施用於基材202之染料液之施用 膜厚度於基材202之全表面上實質上均勻。可降低推拉信 號於徑向方向的分布程度。如此,可實現高品質光碟D。 第18圖所示第二方法也可於染料液施用於基材202之 時進行。如此,即使染料液數量減少,最内圓周的施用部 份800之形狀絕佳(實質完美圓形)。此外,可形成均勻染 料記錄層204於基材202全體表面上。如此,可生產高品質 光碟D。 前述製造系統10、600中,於反光層208薄膜形成後基 材202被連續轉運,形成保護層之可紫外光固化溶液滴落 於反光層208上。另外,可一次收集已經進行反光層之薄 膜形成於基材202才將可紫外光固化溶液滴於基材202上, 例如採用薄片進給程序進行。此種程序中,帶有形成的反 光層208薄膜之基材202可堆疊於堆疊柱上,例如轉運至隨 後可紫外光固化溶液施用步驟。但,較佳使用管線,其中 反光層208之形成步驟係連續至可紫外光固化溶液施用步 驟。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ---------------------^-------- (請先閱讀背面之注意事項再填寫本頁) 45 A7 _______— B7 __ 五、發明說明(43 ) 一其次,說明三個舉例說明之實驗(簡稱為「第一至第 三實驗例」)。首先,第一實驗例係有關使用第斶所示製 造系統10生產光碟D時的樣本(實例丨至4及比較例丨至3), 該例係針對濺散機率,至施用速度穩定的時間而定及變更 第一速度控制器462開啟程度時的施用比。 多…、第20圖,濺散機率係基於小滴黏著於基材内 周側透明部474(小滴意圖黏著部份)之分布測定。當絲毫 也無小滴黏著時,錢散機率為0%。 如第5圖所示,至施用速度穩定時間表示染料液施用 開始時間點to至染料液施用速度穩定時間點(閥全開時間 點)tl之時間τδ。施用比係表示檢驗染料記錄層2〇4由膜厚 度決定至染料液於基材202之施用狀態。當施用完全正常 時,施用比為100%。 染料記錄層204之形成如後。亦即,2.65克如下通式(1) 表示之花青染料化合物合併及攙混0 265克如下通式(2)表 示之防褪色劑,溶解於100 cc如下表示式(3)表示之2,2,3,3-四氟-1-丙醇製備形成記錄層用之染料液。 ^ I --------^--------- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印制取 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 46 504684 經濟部智慧財產局員工消費合作社印製 A7 ___Β7 五、發明說明(44)A uniform dye recording layer 204 is formed thereon. In this way, a high-quality optical disc D can be manufactured. According to a specific embodiment of the present invention, the optical disc D can be produced using the manufacturing system 600 shown in FIG. 22 in addition to the manufacturing system shown in FIG. The manufacturing system 600 shown in FIG. 22 includes two molding equipment (first and second molding equipment 602A, 602B) for using, for example, casting, compression molding, or injection molding to produce the substrate 202; and application equipment (First and second application equipment 604A, 604B) A dye recording layer 204 is formed on the substrate 202 by applying a dye application liquid on the first main surface of the substrate 202 and then dried; an inspection device 606 is used to inspect A box application device 604A '604B forms a dye recording layer 204' and a post-processing device 608 for forming a reflective layer on the dye recording layer 204 of the substrate 202 using, for example, a low-quality recording, and then applying a UV-curable> valley The liquid on the reflective layer is exposed to ultraviolet light to form a protective layer on the reflective layer. The first and second molding equipment 602A and 602B each include a molding machine 610 for casting, compression molding, or injection molding of a resin material such as polycarbonate to produce a substrate 202 on a first main surface thereof to form a track. Grooves or irregularities (notches 200) to indicate 'for example an address signal; and a cooling conveyor 612 to cool the substrate 202 while being transferred out of the substrate 202 from the molding machine 610. The stacking column 614 for stacking and storing the substrate 202 after the cooling process is installed at the terminal of the cooling conveyor 612. The first and first application equipment 604A, 604B each include three spin-coating devices 616 for dyeing and washing edges, and a multi-joint robot 618 for first and second molding equipment 602A, 602B. Pick one by one and stack it on this paper scale Gu Jiaguan (CNUA4 specification (21〇X 297 public love) — — — — — IIIIIII — — — — — — I — ^ '— — III — — — (Please read first Note on the back, please fill in this page again) 43 504684 Printed by A7 ___ B7_, Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (41) The substrate 202 of the stacking column 614 and the substrate 202 is transferred to the spin coating device 616 The inspection equipment 606 includes a first transfer conveyor 620 for transferring the substrate 202 to the next step to be processed in the first application equipment 604A; a second transfer conveyor 622 for transferring to the second application equipment 604B to complete the processing The substrate 202 to the next step; a numbering mechanism 624 for stamping a batch number equal to the substrate 202 transferred by the first and second transfer conveyors 620, 622; a first transfer mechanism 626 for transferring the completed Base material stamped with lot number 2 02 to the next step; and an inspection mechanism 628 for inspecting the dye recording layer 204 of the substrate 202 transferred by the first transfer mechanism 626 for defects and film thickness. The post-processing equipment 608 includes a substrate input mechanism 630 for Accepts the substrate 202 that has completed the inspection process by the inspection mechanism 628; the sputtering mechanism 632 is used to form a reflective layer on the first main surface of the substrate 202 input by the substrate input mechanism 630 by sputtering; a second The transfer mechanism 634 is used to sequentially transfer the substrate 202 that has completed the reflective layer sputtering to the next step; the two application centrifuge mechanisms (the first and second application centrifuge mechanisms 636A, 636B) are used to apply the UV-curable solution to the first The second transfer mechanism 634 transfers the substrate 202 and then rotates the substrate 202 at a high speed to obtain a uniform UV-curable solution application film on the substrate 202; a third transfer mechanism 638 is used to transfer the Any one of the second application centrifugation mechanism 636A, 636B completes the processing of the substrate 202 to the next step; an ultraviolet light irradiation mechanism 640 is used to irradiate ultraviolet light on the substrate transferred by the third transfer mechanism 638 202, so the UV curing solution can be cured to form a protective layer on the first main surface of the substrate 202; a fourth transfer mechanism 642 is used to transfer the substrate 202 exposed to ultraviolet light to the standard of this paper (Chinese national standards ( CNS) A4 specification (210x 297 mm) > -44------ II --- IMW '--- 丨 i Order --------- line · (Please read the note on the back first Please fill in this page again for matters) 504684 A7 B7 Printed clothing for employees' cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (42 times one step; a defect inspection agency 644 for inspecting the substrate 202 transferred by the fourth transfer agency 642 Defects on the application surface and the surface of the protective layer; and a classification mechanism 650 for classifying the substrate 202 into stack columns 646 stacked on normal products and stacks stacked on defective products according to the inspection results obtained by the defect inspection mechanism 644 Column 648. In the case of the manufacturing system 600, when the dye solution is applied to the inner peripheral side of the substrate 202 in the application process of applying the dye solution to the substrate 202, the first treatment shown in FIG. 17 is performed. As such, the application film thickness of the dye solution applied to the substrate 202 is substantially uniform over the entire surface of the substrate 202. Can reduce the distribution of push-pull signals in the radial direction. In this way, a high-quality disc D can be realized. The second method shown in Fig. 18 can also be performed when the dye liquid is applied to the substrate 202. Thus, even if the amount of the dye solution is reduced, the shape of the innermost application part 800 is excellent (substantially perfectly circular). In addition, a uniform dye recording layer 204 can be formed on the entire surface of the substrate 202. In this way, a high-quality disc D can be produced. In the aforementioned manufacturing systems 10 and 600, the substrate 202 is continuously transported after the thin film of the reflective layer 208 is formed, and the UV-curable solution forming the protective layer is dropped on the reflective layer 208. In addition, the thin film having the reflective layer formed on the substrate 202 can be collected at one time, and then the ultraviolet-curable solution can be dropped on the substrate 202, for example, using a sheet feeding procedure. In this procedure, the substrate 202 with the formed reflective layer 208 film can be stacked on a stacking column, for example, transferred to a subsequent UV-curable solution application step. However, it is preferable to use a pipeline, wherein the step of forming the reflective layer 208 is continuous to the step of applying the ultraviolet-curable solution. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) --------------------- ^ -------- ( Please read the notes on the back before filling out this page) 45 A7 _______— B7 __ V. Description of Invention (43) Next, explain three examples of experiments (referred to as "first to third experimental examples"). First, the first experimental example relates to a sample (Examples 丨 to 4 and Comparative Examples 丨 to 3) when the optical disc D was produced using the manufacturing system 10 shown in (ii). This example is for the time from the splash probability to the time when the application speed is stable. The application ratio when the first speed controller 462 is turned on is determined and changed. Many ..., Figure 20. The probability of splashing is based on the distribution of droplets sticking to the transparent part 474 on the inner peripheral side of the substrate (the droplets are intended to stick). When there is no droplet adhesion, the chance of loose money is 0%. As shown in Fig. 5, the time to application rate stabilization time represents the time τδ from the time when the application of the dye solution is started to the time point when the application of the dye solution is stabilized (the valve fully open time point) t1. The application ratio indicates that the inspection dye recording layer 204 is determined from the film thickness to the application state of the dye liquid on the substrate 202. When the application is completely normal, the application ratio is 100%. The dye recording layer 204 is formed as follows. That is, 2.65 g of the cyanine dye compound represented by the following general formula (1) is combined and mixed. 0 265 g of the anti-fading agent represented by the following general formula (2) is dissolved in 100 cc as shown in the following formula (3). 2,3,3-tetrafluoro-1-propanol was used to prepare a dye solution for forming a recording layer. ^ I -------- ^ --------- (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper is applicable to China Standard (CNS) A4 specification (210 X 297 mm) 46 504684 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 ___ Β7 V. Description of the invention (44)

F F Η I I IF F Η I I I

H—G一 C一C—OH I I I F F H 隨後’製備聚碳酸酯基材(直徑:120毫米,厚1 2毫 米),其中螺紋形凹槽(軌線間距:1·6微米,凹槽寬度:〇·4 微米,凹槽深度:0.16微米)利用鑄塑形成於表面上。染 料液利用旋塗施用於聚碳酸酯基材凹槽側表面上同時變更 轉數由每分鐘270轉至每分鐘2000轉內形成染料記錄層 204(凹槽厚度約200亳微米)。染料液之施用過程係根據第 17圖所示步驟進行。加壓槽壓力為〇·3千克力/平方厘米。 貫驗所得結果示於第23圖。根據實驗結果,了解濺散 機率為0%,實例1至4及比較例丨其中時間至穩定時間巧比 〇· 1秒更長時為出現瑕疵外觀。 但,對比較例1而言,第一速度控制器462之開啟程度 為2%,該程度係低於5%。因此,由於染料液釋放量的減 少而出現未施用部份。施用比為20%。 因此’根據實驗結果了解第一速度控制器462之開啟 本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公釐) I---I----ill — — — — ^* — — — 11 —--線 (請先閱讀背面之注意事項再填寫本頁) 47 A7H—G—C—C—OH IIIFFH Then 'prepared a polycarbonate substrate (diameter: 120 mm, thickness 12 mm) with threaded grooves (track pitch: 1.6 microns, groove width: 〇 4 micron, groove depth: 0.16 micron) is formed on the surface by casting. The dye solution was applied to the grooved side surface of the polycarbonate substrate by spin coating while changing the number of revolutions from 270 to 2000 revolutions per minute to form a dye recording layer 204 (the groove thickness was about 200 μm). The application of the dye solution is performed according to the steps shown in FIG. The pressure of the pressure tank was 0.3 kgf / cm2. The results of the inspection are shown in Figure 23. According to the experimental results, it is understood that the probability of splashing is 0%. In Examples 1 to 4 and Comparative Examples, where the time to settling time is longer than 0.1 seconds, the appearance of flaws appears. However, for Comparative Example 1, the opening degree of the first speed controller 462 is 2%, which is less than 5%. Therefore, an unapplied portion appears due to a decrease in the amount of the dye solution released. The application ratio was 20%. Therefore, according to the experimental results, it is understood that the opening of the first speed controller 462 is based on the Chinese national standard (CNS) A4 specification (210 x 297 mm) I --- I ---- ill — — — — ^ * — — — 11 —-- Line (Please read the notes on the back before filling out this page) 47 A7

504684 五、發明說明(45) 程度較佳係於不低於5%而不大於50%,更佳於不低於2〇% 及不大於50%之範圍。 其次,第二實驗例係有關實例5至7及比較例4及5,光 碟D使用第1圖所示製造系統1〇生產,該實驗例係針對於 施用染料液至基材202之過程中空氣速度相對於施用面積 施用樣式變更時,於光碟D預定位置之推拉信號程度及光 反射比。 光反射比(%)指示當凹槽未形成凹坑,亦即未記錄狀 態之光反射比。規定再生期間實際光碟D之光反射比不低 於65%。因此,未記錄態之光反射比不低於67%即足。 推拉信號測定如後。有關實例5至7及比較例4及5,雷 射束照射於完成的光碟D上觀查當執跡於三點(半徑23毫 米、45亳米及58亳米點)偏轉時的推拉信號振幅(信號強度) 。振幅單位為任一單位。 若推拉信號之信號強度低於0.09,則傾向於出現軌跡 偏轉。相反地,若推拉信號之信號強度不低於〇14,則表 示光反射比過低。 空氣速度於實例5為〇·1米/秒,實例6為0.2米/秒,實 •例7為〇·4米/秒,比較例4為〇6米/秒及比較例5為01米/秒 〇 染料液係根據下述施用方式施用。換言之,施用係根 據第17圖對實例5至7及比較例4所示第一方法進行(簡稱為 「樣式Α」)。實例5為第17圖所示步驟S3中基材2〇2轉數 每分鐘270轉之案例,換言之,未變更基材2〇2轉數進行施 本紙張尺度適財關家標準(CNS)A4 x 297 — I ---------------- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 48 經濟部智慧財產局員工消費合作社印製504684 V. Description of the invention (45) The degree is preferably in the range of not less than 5% but not more than 50%, more preferably not less than 20% and not more than 50%. Next, the second experimental example is related to Examples 5 to 7 and Comparative Examples 4 and 5, and the optical disc D is produced using the manufacturing system 10 shown in FIG. 1. This experimental example is directed to the air during the application of the dye solution to the substrate 202. When the speed is changed relative to the application area, the push-pull signal degree and light reflection ratio at the predetermined position of the disc D when the application pattern is changed. The light reflectance (%) indicates the light reflectance when the groove is not formed, that is, in a state of no recording. The light reflection ratio of the actual disc D during the prescribed reproduction is not less than 65%. Therefore, it is sufficient that the light reflectance of the unrecorded state is not less than 67%. The push-pull signal is determined as follows. For Examples 5 to 7 and Comparative Examples 4 and 5, the laser beam was irradiated on the completed disc D to observe the amplitude of the push-pull signal when the track was deflected at three points (radius 23 mm, 45 mm, and 58 mm). (Signal strength). The amplitude unit is any unit. If the signal strength of the push-pull signal is lower than 0.09, the track deflection tends to occur. Conversely, if the signal strength of the push-pull signal is not less than 014, it means that the light reflection ratio is too low. The air velocity was 0.1 m / s in Example 5, 0.2 m / s in Example 6, and 0.4 m / s in Example 7; 0.6 m / s in Comparative Example 4; and 01 m / s in Comparative Example 5. The dye solution is applied according to the following application method. In other words, the application system was carried out according to the first method shown in Examples 5 to 7 and Comparative Example 4 according to Fig. 17 (referred to as "pattern A"). Example 5 is a case of 270 revolutions per minute of the substrate in the step S3 shown in FIG. 17. In other words, the substrate revolution of the paper is not changed at the 202 revolutions of the substrate. CNS A4 x 297 — I ---------------- (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 48 Employees of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by Consumer Cooperatives

A7 " --*-------— 五、發明說明(46 ) 用(簡稱為「樣式B」)。 所得實驗結果顯示於第24圖1根據實驗結果,於實例 5至7中,施用樣式為樣式A,空氣速度不高於〇 4米/秒, 推拉信號於三點之信號強度係於〇〇9至〇12之範圍,信號 強度於全部三點約略恒定。進一步,於非記錄態之光反射 比不低於68%。 他方面’於比較例4 ’光反射比足夠。但推拉信號於 二點之光強度不高於〇·〇9。了解於軌跡伺服器發生問題。 比較例5中,推拉信號於半徑23毫米位置之信號強度 為0.15 ’表示光反射比不足。光反射比測量值為,未 滿足規定的67%。 如前述,須了解於實例5至7比較比較例4及5對光反射 比及推拉信號之信號強度可得良好結果。 其次’第三實驗例係有關實例11及比較例1丨至丨6,此 處光碟D(半徑·· 60毫米)係使用第1圖所示製造系統1〇製造 來觀察當相對於第18圖所示施用面之施用樣式變更時所得 特徵。獲得之實驗結果示於第25圖。 實例11中,首先基材202以每分鐘200轉之轉數旋轉, 同時於溶液供應裝置400之臂410(參考第3圖)到達距離基 材202中心55毫米位置時開始施用染料液(參考第18圖步驟 S101)。隨後,臂410以每秒30毫米速度朝向基材202之内 周側(參考步驟S102)移動同時施用染料液。 此種過程中,使用喷嘴406施用染料液之壓力不高於 〇·5大氣壓,使用喷嘴施用染料液之流速為每秒〇.2 cc。 本纸張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)A7 "-* --------- V. Use for invention description (46) (referred to as "style B"). The obtained experimental results are shown in FIG. 24. According to the experimental results, in Examples 5 to 7, the application pattern is pattern A, the air velocity is not higher than 0.4 m / s, and the signal strength of the push-pull signal at three points is 0.99. In the range of 012, the signal intensity is approximately constant at all three points. Further, the light reflectance in the non-recorded state is not less than 68%. In other respects, the light reflectance is sufficient in Comparative Example 4 '. However, the light intensity of the push-pull signal at two points is not higher than 0.09. Understand that there is a problem with the track server. In Comparative Example 5, the signal intensity of the push-pull signal at a radius of 23 mm was 0.15 ', indicating that the light reflectance was insufficient. The measured value of light reflectance did not meet the specified 67%. As mentioned above, it should be understood that good results can be obtained in the comparison of the light reflection ratio and the signal strength of the push-pull signal in Examples 5 to 7 and Comparative Examples 4 and 5. Secondly, the third experimental example is related to Example 11 and Comparative Examples 1 丨 to 丨 6. Here, the optical disc D (radius · 60 mm) is manufactured using the manufacturing system 10 shown in Fig. 1 to observe when compared with Fig. 18 Features obtained when application style of application surface shown is changed. The experimental results obtained are shown in Figure 25. In Example 11, first, the substrate 202 was rotated at 200 revolutions per minute, and at the same time, the application of the dye solution was started when the arm 410 (refer to FIG. 3) of the solution supply device 400 reached a position 55 mm from the center of the substrate 202 (refer to FIG. 18 (step S101). Subsequently, the arm 410 moves toward the inner peripheral side (refer to step S102) of the substrate 202 at a speed of 30 mm per second while applying the dye solution. In this process, the pressure of applying the dye solution using the nozzle 406 is not higher than 0.5 atmosphere, and the flow rate of applying the dye solution using the nozzle is 0.2 cc per second. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

— — — III — — — — — — · I I (請先閱讀背面之注意事項再填寫本頁) --線· 49 >04684— — — III — — — — — — · I I (Please read the notes on the back before filling out this page) --Line · 49 > 04684

經濟部智慧財產局員工消費合作社印製 於喷嘴到達距基材202中心30毫米位置階段,基材202 轉數升尚至母分鐘4〇〇轉(參見步驟Si〇3)。於喷嘴4〇6到達 距基材202中心(最内圓周)最内2〇毫米位置階段,臂41〇停 止0.2秒(參見步驟si〇4)。 隨後,臂410以每秒60毫米速度朝向基材2〇2之外周側 移動(參見步驟S105)。於喷嘴406到達距基材202中心30毫 米位置階段,染料液停止施用(參見步驟sl〇6)。臂41〇於 水平方向旋轉而將喷嘴406復原至原先位置(初始態)。 隨後,基材202轉數以6秒時間提高至每分鐘63〇轉(參 見步驟S107),及基材202轉數以6·3秒時間升高至每分鐘 1400轉(參見步驟Si〇8)。隨後,基材2〇2轉數以! 7秒時間 提高至每分鐘2200轉。隨後,基材202轉數(= 2200 rpm) 維持5秒(參見步驟S109)。隨後,停止旋轉基材2〇2完成施 用染料液至基材202的處理。該系列施用樣式定義為樣式 C 〇 他方面,以實例11之相同方式進行比較例丨i但染料液 之施用係始於步驟S101距基材202中心40毫米位置。此種 施用樣式稱做樣式D。比較例12係以實例11相同方式進行 ’但開始施用染料液之轉數為每分鐘3 5 0轉。此種施用樣 式稱做樣式E。 比較例13係以實例11之相同方式進行,但臂41〇係以 每秒60毫米速度朝向基材202之内周側移動同時進行染料 液的施用。此種施用樣式稱做樣式F。比較例14係以實例 11之相同方式進行,但即使於喷嘴406到達距基材2〇2中心 本紙張尺度適用中國國家標準(CNS)A4規格(2〗0 X 297公釐) —-----1--------- (請先閱讀背面之注意事項再填寫本頁) -50 hi "---—-___B7_____ 五、發明說明(48) 3〇毫米位置階段,基材202仍屬仍為每分鐘200轉。此種施 用樣式稱做樣式G。 (請先閱讀背面之注音?事項再填寫本頁) 比較例15係以實例11之相同方式進行,但即使於噴嘴 4〇6到達最内圓周階段,臂410也未停止。此種施用樣式標 示為樣式Η。比較例16係以實例11之相同方式進行,但染 料液之施用流速為每秒1 cc。此種施用樣式標示為樣式i 〇 實驗結果顯示,顯示有關實例11,於距基材202中心25 毛米點之抖動為31宅微秒,染料記錄層204之膜厚度罕見 起伏波動,亦即染料液均勻施用於基材2〇2之全體表面上 。於比較例11,未施用部出現於外圓周部份。於比較例12 及13 ’當染料液施用於基材202之外圓周時,染料液如球 般滾動及落下而出現未施用部份。 比較例14及15中,如第26圖所示,最内圓周之施用部 800形狀受干擾而無法形成完美的圓。特別,圓周之膜厚 ► 度起伏波動於距基材202中心25毫米點(特別第26圖以影線 經濟部智慧財產局員工消費合作社印制衣 指示區802)。抖動提高至41亳微秒。比較例16中,施用速 率增南而造成成本昂貴問題。 如前述,實例11中,染料液可均勻施用於基材202全 體表面上,有助於抖動的減小。 當然,根據本發明之光學資訊記錄媒體之製法及光學 資訊記錄媒體非僅限於前述具體實施例,可未偏離本發明 之主旨或主要特徵而以其它多種形式具體表 本紙張尺度綱㈣目家鮮(CNS)A4規格(210x 297公f) 51 504684 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(51) 500…緩衝箱 502…排氣鼓風機 504…蝶形閥 506…開閉器 508…排氣量控制閥機構 510…排氣量感測器 520…重疊座標排氣管線 522…戶外鼓風機 524…排氣管 526-30···蝶形閥 600…製造系統 602A-B···模製設備 604A-B···施用設備 606…檢驗設備 608…後處理設備 610…模製機器 612…冷卻輸送器 614…堆叠柱 616…旋塗裝置 618…多關節機器人 620-2···轉運輸送器 624…編號機構 626…轉運機構 628···檢驗機構 630…基材輸入機構 632…濺鍍機構 634…轉運機構 636A-B…施用離心機構 638···轉運機構 640···紫外光照射機構 642…轉運機構 644…瑕症檢驗機構 646-8···堆疊柱 650···分類機構 700-2系統 704···空調機 710···進氣口 712···前置過濾器 800···施用部 802···影線區 l·---------------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(2]0 X 297公釐) 54Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs At the stage when the nozzle reaches 30 mm from the center of the substrate 202, the number of revolutions of the substrate 202 is still 400 revolutions per minute (see step Si03). At the stage when the nozzle 4 06 reaches the innermost 20 mm position from the center (the innermost circumference) of the substrate 202, the arm 410 stops for 0.2 seconds (see step s04). Subsequently, the arm 410 moves toward the outer peripheral side of the substrate 202 at a speed of 60 mm per second (see step S105). When the nozzle 406 reaches a position 30 mm from the center of the substrate 202, the application of the dye solution is stopped (see step sl106). The arm 41o is rotated in the horizontal direction to return the nozzle 406 to its original position (initial state). Subsequently, the number of revolutions of the substrate 202 was increased to 630 revolutions per minute in 6 seconds (see step S107), and the number of revolutions of the substrate 202 was increased to 1400 revolutions per minute in 6.3 seconds (see step Si0). . Subsequently, the substrate was rotated at 202 revolutions! 7 seconds to 2200 rpm. Subsequently, the number of revolutions of the substrate 202 (= 2200 rpm) is maintained for 5 seconds (see step S109). Subsequently, the rotation of the substrate 202 is stopped to complete the process of applying the dye liquid to the substrate 202. This series of application patterns is defined as pattern C. In other respects, Comparative Example 1 was performed in the same manner as in Example 11 except that the application of the dye solution was started at step S101 at a position 40 mm from the center of the substrate 202. This type of application pattern is called pattern D. Comparative Example 12 was performed in the same manner as in Example 11 except that the number of revolutions at which the application of the dye liquid was started was 350 revolutions per minute. This application pattern is called pattern E. Comparative Example 13 was performed in the same manner as in Example 11, except that the arm 410 moved toward the inner peripheral side of the substrate 202 at a speed of 60 mm per second while applying the dye solution. This type of application pattern is called pattern F. Comparative Example 14 was performed in the same manner as in Example 11, but even if the nozzle 406 reached the center of the substrate 2002, the paper size was subject to the Chinese National Standard (CNS) A4 specification (2) 0 X 297 mm. ----- --1 --------- (Please read the notes on the back before filling this page) -50 hi " ----___ B7_____ V. Description of the invention (48) 30 mm position stage, basic The material 202 is still 200 revolutions per minute. This type of application pattern is called pattern G. (Please read the note on the back? Matters before filling out this page.) Comparative Example 15 was performed in the same manner as in Example 11, but the arm 410 did not stop even when the nozzle 4 06 reached the innermost circumferential stage. This application style is marked as Style Η. Comparative Example 16 was performed in the same manner as in Example 11, except that the application flow rate of the dye solution was 1 cc per second. This application pattern is marked as pattern i. The experimental results show that in Example 11, the jitter at a point of 25 gross meters from the center of the substrate 202 is 31 μs, and the film thickness of the dye recording layer 204 rarely fluctuates, that is, the dye. The liquid was uniformly applied to the entire surface of the substrate 202. In Comparative Example 11, the unapplied portion appeared on the outer peripheral portion. In Comparative Examples 12 and 13 ', when the dye solution was applied to the outer periphery of the substrate 202, the dye solution rolled and dropped like a ball and an unapplied portion appeared. In Comparative Examples 14 and 15, as shown in Fig. 26, the shape of the innermost application portion 800 was disturbed and a perfect circle could not be formed. In particular, the film thickness on the circle ► fluctuates from a point of 25 mm from the center of the substrate 202 (especially in Figure 26, it is hatched by the Intellectual Property Bureau of the Ministry of Economic Affairs, printed by the Consumer Cooperatives Instruction Area 802). Jitter is increased to 41 亳 microseconds. In Comparative Example 16, the application rate was increased in the south, which caused a problem of high cost. As mentioned above, in Example 11, the dye solution can be uniformly applied to the entire surface of the substrate 202, which contributes to the reduction of jitter. Of course, the method for manufacturing the optical information recording medium and the optical information recording medium according to the present invention are not limited to the foregoing specific embodiments, but may deviate from the gist or main features of the present invention in other various forms to express the paper standard outline. (CNS) A4 size (210x 297 male f) 51 504684 A7 B7 Printed by the Consumers ’Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (51) 500… buffer box 502… exhaust blower 504… butterfly valve 506… shutter 508 ... Exhaust volume control valve mechanism 510 ... Exhaust volume sensor 520 ... Overlapping coordinate exhaust line 522 ... Outdoor blower 524 ... Exhaust pipe 526-30 ... Butterfly valve 600 ... Manufacturing system 602A-B ... Molding equipment 604A-B ... Application equipment 606 ... Inspection equipment 608 ... Post-processing equipment 610 ... Molding machine 612 ... Cooling conveyor 614 ... Stacking column 616 ... Spin coating device 618 ... Multi-joint robot 620-2 ... · Transfer conveyor 624 ... Numbering mechanism 626 ... Transfer mechanism 628 ... Inspection mechanism 630 ... Substrate input mechanism 632 ... Sputtering mechanism 634 ... Transfer mechanism 636A-B ... Application centrifuge mechanism 638 ... Transfer mechanism 640 ... UV Light irradiation mechanism 642 ... Transfer mechanism 644 ... Symptom inspection mechanism 646-8 ... Stacking column 650 ... Classification mechanism 700-2 System 704 ... Air conditioner 710 ... Air inlet 712 ... Front Filter 800 ... Application section 802 ... Shaded area l ---------------------- Order --------- line ( Please read the notes on the back before filling in this page) This paper size is applicable to China National Standard (CNS) A4 (2) 0 X 297 mm) 54

Claims (1)

504684504684 A8B8'C8])8 第089100050號專利申請案申請專利範圍修正本 修正日期·· 90年11月 1· 一種製造一熱模類型光學資訊記錄媒體(D)之方法,該 媒體與-基材(202)上具有-記錄層(2〇4)可藉照射雷射 束記錄資訊,該方法包含下列步驟·· 施用形成記錄層(204)之溶液於基材(2〇2)上同時旋 轉基材(202),其中: 由施用溶液開始之時間點至溶液施用速度恆定之 時間點範圍之一段時間係不少於〇1秒而不多於丨秒。 2·如申明專利範圍第1項之製造一熱模類型光學資訊記錄 媒體之方法,其中·· 一閥裝置(408)用以依據閥之開啟與閉合對基材 (202)執行及停止溶液的洩放;以及 闊開啟速度相對於最大速度不低於5%而不高於 50%。 ' 3·如申請專利範圍第2項之製造一熱模類型光學資訊記錄 媒體之方法,其中: 該閥係利用流體壓力開閉; 一速度控制器(462)用以控制供給閥裝置(408)之流 體流速;以及 速度控制器(462)之決定流體流速之開啟程度係不 低於5%而不高於5〇%。 4·如申請專利範圍第1項之製造一熱模類型光學資訊記錄 媒體之方法,其中該溶液為含染料之有機溶劑。 55 j I 1 本紙張尺度適财_家_ (_ A4_ D8 六、申請專利範圍 • 5·如申請專利範圍第1項之製造一熱模類型光學資訊記錄 * 媒體之方法,其中開始施用位置(Ps)係位於基材(202) 上。 6·如申請專利範圍第5項之製造一熱模類型光學資訊記錄 媒體之方法’其中該開始施用位置(Ps)係與位在基材 (202)之内周側之非施用部分隔不小於5毫米。 7·如申請專利範圍第·丨項之製造一熱模類型光學資訊記錄 媒體之方法,其中施加於溶液之壓力不大於1千克力/ 平方厘米。 8·如申請專利範圍第丨項之製造一熱模類型光學資訊記錄 媒體之方法’其中用以施用溶液至基材(202)上之喷嘴 (406)係朝向基材(202)的最内圓周移動,基材(2〇2)之轉 速增高。 9·如申請專利範圍第8項之製造一熱模類型光學資訊記錄 媒體之方法,其中該溶液之施用係屬於基材(202)之外 圓周。 10·如申凊專利範圍第9項之製造一熱模類型光學資訊記錄 媒體之方法’其中溶液之施用係始於距基材(2〇2)中心 3/4半徑位置之向外方向部份。 11 ·如申明專利範圍第9項之製造一熱模類型光學資訊記錄 媒體之方法,其中當溶液施用於基材(202)之外圓周時 ,基材(202)之轉數高於每分諸3〇〇轉。 12·如申明專利範圍第8項之製造一熱模類型光學資訊記錄 媒體之^法’其巾溶液係使用喷嘴(406)於不高於1.〇大 家標準--77-- 504684 A8 B8 C8 D8 L, 申譜專利範圍 氣壓之壓力施用。 .13.如申請專利範圍第8項之製造一熱模類型光學資訊記錄 媒體之方法,其中該溶液係輿f喷嘴(406)於不高於每 秒0.5 cc之流速施用。 14.如申請專利範圍第8項之製造一熱模類型光學資訊記錄 媒體之方法,其中當溶液施用於基材(202)之表内圓周 時,基材(202)之轉數不低於每分鐘300轉。 15·如申請專利範圍第8項之製造一熱模類型光學資訊記錄 媒體之方法,其中當溶液施用於基材(202)之最内圓周 時,使用的基材(202)轉數係比當溶液施用於基材(202) 之外圓周時使用的基材(202)轉數大,不少於50轉。 16·如申請專利範圍第15項之製造一熱模類型光學資訊記 錄媒體之方法,其中於喷嘴(406)到達與基材(202)之最 内圓周分隔距離少於20毫米位置階段,基材(202)轉數 增高。 _ 17·如申請專利範圍第8項之製造一熱模類型光學資訊記錄 媒體之方法,其中空調之空氣速度相對於基材(202)施 用面設定為不大於每秒約0.4米。 18·—種熱模類型光學資訊記錄媒體,包含於一基材(202) 上,有一記錄層(204)可藉使用雷射束照射而記錄資訊 ,其中: 記錄層(204)係經由於基材(202)旋轉之同時施用形 成記錄層(204)之溶液至基材(202)上形成;以及 記錄層(204)藉施用溶液形成之方式為,當溶液施 用於基材(202)之内周側時基材(202)之轉數增高。 57 (請先閱讀背面之注意事項再填窝本頁) :線丨 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐)A8B8'C8]) 8 Patent Application No. 089100050 Patent Application Amendment Scope Amendment Date · November 1990 1 · A method for manufacturing a thermal mold type optical information recording medium (D), the medium and-substrate ( 202) has a-recording layer (204) which can record information by irradiating a laser beam. The method includes the following steps: applying a solution forming the recording layer (204) on the substrate (202) while rotating the substrate (202), wherein: a period of time from a point in time when the solution application is started to a point in time when the solution application rate is constant is not less than 0.01 second and not more than 1 second. 2. A method for manufacturing a thermal mold type optical information recording medium as stated in item 1 of the patent scope, wherein a valve device (408) is used to execute and stop the solution of the substrate (202) according to the opening and closing of the valve. Bleed; and the wide opening speed is not less than 5% and not more than 50% relative to the maximum speed. '3. The method for manufacturing a thermal mode type optical information recording medium as described in the second item of the patent application scope, wherein: the valve is opened and closed by fluid pressure; a speed controller (462) is used to control the supply valve device (408). Fluid flow rate; and the speed controller (462) determines the opening degree of the fluid flow rate to be not less than 5% and not more than 50%. 4. The method for manufacturing a thermal mode type optical information recording medium as described in the first item of the patent application, wherein the solution is an organic solvent containing a dye. 55 j I 1 The size of this paper is suitable _ 家 _ (_ A4_ D8 VI. Patent Application Scope • 5. · The method of manufacturing a thermal mold type optical information record * media such as the scope of patent application No.1, where the application location ( Ps) is located on the substrate (202). 6. The method of manufacturing a thermal mold type optical information recording medium according to item 5 of the patent application 'wherein the application start position (Ps) is located on the substrate (202) The non-application part of the inner peripheral side is not less than 5 mm. 7. The method of manufacturing a thermal mold type optical information recording medium as described in the scope of the patent application, wherein the pressure applied to the solution is not more than 1 kgf / square Cm. 8. The method for manufacturing a thermal mold type optical information recording medium according to item 丨 of the patent application, wherein the nozzle (406) for applying the solution to the substrate (202) is the most toward the substrate (202). The inner circumference moves, and the rotation speed of the substrate (202) increases. 9. For example, the method of manufacturing a thermal mold type optical information recording medium according to item 8 of the patent application scope, wherein the application of the solution belongs to the substrate (202). The outer circumference. The method of manufacturing a thermal mold type optical information recording medium according to item 9 of the patent application 'wherein the application of the solution starts from the outward direction portion 3/4 radius from the center of the substrate (202). For example, a method for manufacturing a thermal mold type optical information recording medium according to claim 9 of the patent scope, wherein when the solution is applied to the periphery of the substrate (202), the number of revolutions of the substrate (202) is higher than 3 per minute. 〇rpm. 12. As stated in the patent claim No. 8 manufacturing method of a thermal mold type optical information recording medium 'its towel solution uses a nozzle (406) at a level not higher than 1.0. Everyone's standard-77-504684 A8 B8 C8 D8 L, pressure application of air pressure in the scope of the patent application patent. .13. The method of manufacturing a thermal mold type optical information recording medium as described in the patent application No.8, wherein the solution is a nozzle (406) at Application at a flow rate higher than 0.5 cc per second. 14. The method of manufacturing a thermal mold type optical information recording medium according to item 8 of the patent application scope, wherein when the solution is applied to the inner circumference of the surface of the substrate (202), the substrate (202) The number of revolutions is not less than 300 revolutions per minute. 15 · A method for manufacturing a thermal mold type optical information recording medium according to item 8 of the patent application, wherein when the solution is applied to the innermost circumference of the substrate (202), the number of revolutions of the substrate (202) used is greater than when the solution is applied to The number of revolutions of the substrate (202) used at the outer circumference of the substrate (202) is large, not less than 50. 16. The method for manufacturing a thermal mode type optical information recording medium, such as in the patent application No. 15, wherein When the nozzle (406) reaches a position where the separation distance from the innermost circumference of the substrate (202) is less than 20 mm, the rotation speed of the substrate (202) increases. _ 17. If the method of manufacturing a thermal mode type optical information recording medium according to item 8 of the scope of patent application, the air velocity of the air conditioner is set to not more than about 0.4 meters per second relative to the application surface of the substrate (202). 18 · —A thermal mode type optical information recording medium is included on a substrate (202). A recording layer (204) can record information by using laser beam irradiation, wherein: the recording layer (204) is The material (202) is rotated while applying the solution forming the recording layer (204) onto the substrate (202); and the recording layer (204) is formed by applying the solution in such a manner that when the solution is applied to the substrate (202) The number of revolutions of the substrate (202) increases at the peripheral side. 57 (Please read the precautions on the back before filling in this page): Line 丨 This paper size applies to China National Standard (CNS) Α4 specification (210X297 mm)
TW89100050A 1998-09-18 2000-01-04 Method for producing optical information-recording medium and optical information-recording medium TW504684B (en)

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JP26465198 1998-09-18
JP01828799A JP3987651B2 (en) 1999-01-27 1999-01-27 Manufacturing method of optical information recording medium
JP17475799A JP3698919B2 (en) 1998-09-18 1999-06-21 Manufacturing method of optical information recording medium and dye coating method of dye-based optical disk

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