500630 A7 B7 五、發明說明（） (發明所屬之技術領域） <請先閱讀背面之注意事項再填寫本頁) 本發明係關於使用於對半導體，玻璃，金屬或高分子 化合物等之基板表面執行洗淨改質之介電體激發燈等 之紫外線照射裝置，特別是關於適用於對液晶顯示 器，PDP(Plasma Display Panel:電漿顯示盤）或 FED(Field Emission Display:場射顯示器）等使用之矩 形基板表面執行洗淨或改質之紫外線照射裝置。 (以往之技術） 近來，使用介電體激發燈等之紫外線照射裝置以執行 對顯示器用之基板和矽表面之洗淨或改質受到注目。 介電體激發燈係在放電容器內充滿形成激發分子之氙 和溴化氪等之放電氣體，藉無聲被電使形成激發分子， 然後取出該激發分子放射之光。介電體係使用合成石 英玻璃等。介電體激發燈放射175nm以下之短波長之 紫外線，且選擇性高效率地產生接近光譜之單一波長之 光，因此具有以往之低壓水銀燈和高壓電弧放電燈沒有 之種種特徵。 經濟部智慧財產局員工消費合作社印製 例如，介電體激發燈使用具有氙之氣體時氙原子被激 勵而成激發狀態，自此激發狀態再還原成氙原子時即產 生波長約172nm之光。此172nm之波長光照射至大氣 中後大氣中之氧而被此光吸收，而自氧產生臭氧。產生 之臭氧分解後產生活性氧種而氧化有機物。再者， 1 72 nm光之光子之能量係高達7.2 e，大於大多之有機 化合物之結合能量，因此能切斷其等之結合。藉此作 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 500630 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（2 ) 用能獲得洗淨或改質之效果。有關介電體激發燈，係揭 示於，例如，日本國專利公報特開平2-73 5 3號，美國專利 公報第4,8 3 7,484號等上。 第9圖示出介電體激發燈之槪略構成。介電體激發 燈9 0之構成係在雙重管9 1，由石英玻璃作成之內部封 入1氣壓以下之氙等之激發氣體92。於雙重管91之 外周及內周上分別設置外部電極93及內部電極94 ° 外部電極93爲了使介電體激發燈射出之光通過而採用 網狀電極。氮氣和氬氣等之惰性氣體95係流入雙重管 9 1之內部電極94之內側，藉此抑制該介電體激發燈之 發熱。 第10(A)圖係爲含有前述介電體激發燈90而構成之 燈裝置之槪略構成圖。燈裝置1 〇〇之框體係爲密閉容 器，其內部充塡不易吸收光之氮和氬等之惰性氣體。藉 此，抑制介電體激發燈90放射之紫外線在燈裝置1 00 內衰減之程度。於燈裝置1 〇〇之下面設有由合成石英 玻璃等作成之透光構件101以作爲取光窗，介電體激發 燈90發射之紫外線透過該透光構件1 0 1而照射至被力口 工物。燈裝置100另外於其內部設有反射鏡102,此反 射鏡係覆蓋在介電體激發燈90之上部及側部，將照射 到上方及側邊之光朝下方，亦即被加工物W，集光。第 10(B)圖係示出前述燈裝置100在其發射之寬度上之光 量分佈。自此曲線可瞭解光量在介電體激發燈之正下 方係最大，而朝周邊部衰減。 -4- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ---!---------f 裝--------訂-----^--- _# (請先閱讀背面之注咅？事項再填寫本頁) 500630 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（3 ) 以往，使用前述之介電體激發燈以行液晶和PDP等 之大型玻璃基板之洗淨或改質之情形係採用倂列設置 之多根介電體激發燈而對被加工面W統括照射之所謂 多燈統括面照射方式。第1 1圖係示出多燈統括面照射 方式之槪略構成圖。燈裝置1 1 〇之內部倂列裝置多根 之介電體激發燈1 1 1，各介電體激發燈11 1間之節矩係 約爲介電體激發燈η 1之直徑之2〜3倍俾使介電體激 發燈發射之紫外線經各個反射鏡1 1 2反射後之發光光 量盡可能均一。爲了使前述介電體激發燈π1發射之 光通過而照射至被加工物，在燈裝置1 1 0之下面整面設 有由合成石英等作成之透光構件1 13。 但是，藉前述以往之多燈統括面照射方式執行洗淨或 改質之情形，具有下述一些問題。 (1) 如第10(B)圖所示，各介電體激發燈在其寬度方向 之發光光量係不均一，縱使最佳化相鄰介電體激發燈之 配置，各介電體激發燈間之發光光量依然係比介電體激 發燈正下方之光量小。結果，藉此方式對被加工物照射 一定時間之紫外線時其累積光量差異大，從而對被加工 物之洗淨或改質之效果產生參差不齊。 (2) 需要對大型之玻璃基板等照射紫外線之裝置，因 執行上述統括面照射之故，必須設置相當數量之介電體 激發燈（及各個燈之驅動電路）。例如，玻璃基板之尺寸 係爲6 8 0腿X 8 8 0腿之情形時多燈總括面照射方式通常 必須設置1 3根之介電體激發燈。另外，必須作成大型 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ---mt------ ---裝---------訂-----丨— _#· (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 500630 A7 B7 五、發明說明（4 ) 較昂貴之合成石英玻璃。結果，導致裝置之製造成本， 運轉成本花費多，且裝置大型化等之問題。更甚者，因 介電體激發燈之數量多，故故障之可能高，從而降低裝 置之可靠性。 (發明之槪述） 因此，本發明之目的係提供能解決以往之問題，對大 型之被加工物之整體範圍照射均一之紫外線之紫外線 照射裝置及方法。 另外，本發明之別的目的係提供能盡量使用少量之介 電體激發燈對大型之被加工物執行洗淨或改質之紫外 線照射裝置及方法。 更甚者，本發明之別的目的係提供能對大型被加工物 執行洗淨或改質之使用面積小之紫外線照射裝置及方 法。 本發明係關於對被加工物之被加工面照射紫外線以 執行其之洗淨或改質用之紫外線照射裝置。本發明之 裝置包含紫外線照射光源，使前述被加工物對前述紫外 線照射光源在其寬度方向上直線地相對移動橫過對述 紫外線之照射範圍之移動裝置，及控制前述移動裝置使 紫外線之照射範圍內之被加工物之相對移動速度在a P/J (a係紫外線照射光源之寬，P係其每單位面積之平 均光量，J係被加工物之洗淨或改質所需之每單位面積 之累計光量）以下對前述被加工物對前述紫外線照射江 於單向上進行相對移動之控制裝置。 -6- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ---^-----------··裝--------訂------^--- -# (請先閱讀背面之注意事項再填寫本頁) 500630 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（5 ) 這種情形，前述控制裝置能作成爲控制前述移動裝置 使紫外線照射範圍內之被加工物之相對移動速度在 2aP /j以下，前述被加工物對前述紫外線照射光源於往 復方向上進行相對移動之控制裝置之構成。 另外，本發明之紫外線照射裝置能作成爲具備倂行地 近接配置之N個紫外線照射光源，直線地相對移動前述 被加工物使其對前述紫外線照射光源於其之倂排方向 上橫過前述紫外線之照射範圍之移動裝置，及控制前述 移動裝置使紫外線照射範圍內之被加工物之相對移動 速度在aP /〗（a係紫外線照射光源之寬，p係其每單位面 積之平均光量，J係被加工物之洗淨或改質所需之每單 位面積之累計光量）以下，前述被加工物對前述紫外線 照射光源於單向上進行相對移動之控制裝置之構成。 這種情形，前述控制能作成爲控制前述移動裝置使紫 外線照射範圍內之被加工物之相對移動速度在2aP/J 以下，前述被加工物對前述紫外線照射光源於往復方向 上進行相對移動之控制裝置之構成。 更甚者，本發明之紫外線照射裝置能作成爲具備倂行 地配置之N個紫外線照射光源，該各個紫外線照射光源 間之節矩係爲（L + a)/N(L係被加工物之長度，a係紫外線 照射光源之寬）之裝置；直線地相對移動前述被加工物 使其自其長度方向對前述紫外線照射光源於倂排方向 上橫過前述紫外線之照射範圍之移動裝置；及控制前述 移動裝置使在前述紫外線照射範圍內之前述被加工物 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -I n n n n _^i n ϋ t· n n n n ϋ I I 一 ϋ I ϋ I n I I · (請先閱讀背面之注音？事項再填寫本頁) 500630 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（6 ) 之相對移動距離成爲（L + a)/N。 這種情形，前述控制裝置能作成爲控制前述移動裝置 使紫外線照射範圍內之被加工物之相對移動速度在 aP/J(a係紫外線照射光源之寬，p係其每單位面積之平 均光量，J係被加工物之洗淨或改質所需之每單位面積 之累計光量）以下，前述被加工物對前述紫外線照射光 源於單向上進行相對移動之構成。 另外，前述控制裝置能作成爲控制前述移動裝置使紫 外線照射範圍內之被加工物之相對移動速度在2aP/J(P 係其每單位面積之平均光量，j係被加工物之洗淨或改 質所需之每單位面積之累計光量）以下，前述被加工物 對前述紫外線照射光源於往復方向上進行相對移動之 構成。 前述本發明有關之紫外線照射裝置上，前述紫外線照 射光源良好地係爲介電體激發燈。 本發明另外係關於對被加工物之被加工面照射紫外 線以執行其之洗淨或改質用之紫外線照射方法。本發 明之紫外線照射方法係作成爲包括使紫外線照射光源 開始紫外線照射之製程，直線地相對移動前述被加工物 使其對前述紫外線照射光源在寬度方向上橫過前述紫 外線之照射範圍之製程，及使紫外線之照射範圍內之被 加工物之相對移動速度在aP/J(a係紫外線照射光源之 寬，P係其每單位面積之平均光量，J係被加工物之洗淨 或改質所需之每單位面積之累計光量）以下，前述被加 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ---：--I--·---ft-------I 訂·--I I . (請先閱讀背面之注意事項再填寫本頁) 500630 A7 B7 五、發明說明（7 ) 工物對前述紫外線照射光源於單向上進行相對移動之 控制之構成。 另外，本發明之紫外線照射方法係能作成爲包括使紫 外線照射光源開始紫外線之照射之製程，直線地相對移 動前述被加工物使前述紫外線照射光源在寬度方向上 橫過前述紫外線之照射範圍之製程，及使紫外線之照射 範圍內之被加工物之相對移動速度在2aP/J(a係紫外 線照射光源之寬，P係其每單位面積之平均光量，J係被 加工物之洗淨或改質所需之每單位面積之累計光量）以 下，前述被加工物前述紫外線照射光源於往復方向上進 行相對移動控制之構成。 更甚者，本發明之紫外線照射方法能作成爲使倂行地 近接配置之N個紫外線照射光源開始紫外線之照射之 製程，直線地相對移動前述被加工物使前述紫外線照射 光源在其倂排方向橫過前述紫外線之照射範圍之製程， 及使紫外線照射範圍內之被加工物之相對移動速度於 aP/J (a係紫外線照射光源之寬，p係其每單位面積之平 均光量，J係被加工物之洗淨或改質所需之每單位面積 之累計光量）以下，前述被加工物對前述紫外線照射光 源於單向上進行相對移動控制之構成。 另外，本發明之紫外線照射方法能作成爲使倂行地近 接配置之N個紫外線照射光源開始紫外線之照射之製 程，直線地相對移動前述被加工物使對前述紫外線照射 光源在其倂排方向上橫過前述紫外線之照射範圍之製 -9- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） ——.----------裝 (請先閱讀背面之注音？事項再填寫本頁) ---訂-----.---· 經濟部智慧財產局員工消費合作社印製 500630 Α7 Β7 五、發明說明（8 ) (請先閱讀背面之注意事項再填寫本頁) 程，及使在紫外線照射範圍內之被加工物之相對移動速 度於2aP/J(a係紫外線照射光源之寬，p係其每單位面 積之2P均光量，J係被加工物之洗淨或改質所需之每單 位面積之累計光量）以下，前述被加工物對前述紫外線 ,¾¾射光源於往復之方向上進行相對移動之控制製程之 構成。 另外，本發明之紫外線照射方法能作成爲設置係爲倂 行地配置之N個紫外線照射光源，該各個紫外線照射光 源間之節矩係爲（L + a)/N(L係被加工物之長度，a係紫外 線照射光源之寬）之裝置，配置前述被加工物在該紫外 線照射光源下，使其之長度與前述紫外線照射光源之倂 行方向一致之製程，使前述N個紫外線照射光源開始紫 外線之照射之製程，直線地相對移動前述被加工物使前 述紫外線照射光源於其之倂行方向上橫過前述紫外線 之照射範圍之製程，及使在前述紫外線之照射範圍內之 前述被加工物之相對移動距離成爲（L + a)/N之控制之構 成。 經濟部智慧財產局員工消費合作社印製 這種情形，配置前述被加工物之製程最好係使前述被 加工物之移動方向之前端位在處於該移動方向上之最 裡面之前述紫外線照射光源之前方。500630 A7 B7 V. Description of the invention () (Technical field to which the invention belongs) < Please read the notes on the back before filling out this page) This invention relates to the surface of substrates used for semiconductors, glass, metals or polymer compounds Ultraviolet irradiation devices such as dielectric excitation lamps that perform cleaning and modification, especially for use with liquid crystal displays, PDP (Plasma Display Panel: Plasma Display Panel), or FED (Field Emission Display). The rectangular substrate surface is cleaned or modified by an ultraviolet irradiation device. (Conventional technology) Recently, attention has been paid to cleaning or modification of a substrate for a display and a silicon surface using an ultraviolet irradiation device such as a dielectric excitation lamp. The dielectric excitation lamp is filled with a discharge gas such as xenon and krypton bromide that form excited molecules in the discharge vessel, and is excited to form excited molecules by being silently charged, and then the light emitted by the excited molecules is taken out. The dielectric system uses synthetic quartz glass and the like. The dielectric excitation lamp emits short-wavelength ultraviolet rays below 175 nm and selectively and efficiently generates light of a single wavelength close to the spectrum. Therefore, it has various characteristics not available in conventional low-pressure mercury lamps and high-pressure arc discharge lamps. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. For example, when a dielectric excitation lamp uses a gas containing xenon, xenon atoms are excited to generate an excited state. When the excited state is reduced to xenon atoms, light with a wavelength of about 172 nm is generated. After the 172 nm wavelength light is irradiated to the atmosphere, the oxygen in the atmosphere is absorbed by the light, and ozone is generated from the oxygen. The generated ozone decomposes to produce active oxygen species and oxidizes organic matter. In addition, the energy of photons at 1 72 nm is as high as 7.2 e, which is greater than the binding energy of most organic compounds, so they can cut off their binding. Use this paper as the standard for the Chinese Standard (CNS) A4 (210 X 297 mm). 500630 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. A7 B7 V. Description of the invention (2) Use to obtain cleansing or modification The effect. Dielectric excitation lamps are disclosed in, for example, Japanese Patent Laid-Open No. 2-73 53, U.S. Patent Publication No. 4,8 3, 7,484 and the like. Fig. 9 shows a schematic configuration of a dielectric excitation lamp. The dielectric excitation lamp 90 is composed of a double tube 91 and an excitation gas 92 such as xenon or the like, which is made of quartz glass, and sealed therein. An external electrode 93 and an internal electrode 94 are provided on the outer periphery and the inner periphery of the double tube 91, respectively. The external electrode 93 uses a mesh electrode in order to pass the light emitted from the dielectric excitation lamp. An inert gas 95 such as nitrogen and argon flows into the inner electrode 94 of the double tube 91, thereby suppressing the heat generation of the dielectric excitation lamp. Fig. 10 (A) is a schematic structural diagram of a lamp device including the dielectric excitation lamp 90 described above. The frame system of the lamp device 100 is a closed container, and the interior is filled with an inert gas such as nitrogen and argon, which do not easily absorb light. This suppresses the extent to which the ultraviolet rays radiated from the dielectric excitation lamp 90 are attenuated in the lamp device 100. A light-transmitting member 101 made of synthetic quartz glass or the like is provided below the lamp device 100 as a light extraction window. Ultraviolet rays emitted from the dielectric excitation lamp 90 pass through the light-transmitting member 101 and irradiate to the force port. Works. The lamp device 100 is further provided with a reflector 102 inside the reflector device. The reflector covers the upper part and the side part of the dielectric excitation lamp 90, and the light irradiated to the upper and the side faces downward, that is, the workpiece W, Light collection. Fig. 10 (B) shows the light amount distribution of the lamp device 100 over the width of its emission. From this curve, it can be understood that the amount of light is greatest under the dielectric excitation lamp, and it decays toward the periphery. -4- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) ---! --------- f Packing -------- Order ---- -^ --- _ # (Please read the note on the back? Matters before filling out this page) 500630 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of Invention (3) In the past, the aforementioned dielectrics were used In the case of cleaning or modifying large glass substrates such as liquid crystals, PDPs, etc., the excitation lamp is a so-called multi-lamp integrated surface irradiation method in which a plurality of dielectric excitation lamps arranged in a line are used to irradiate the processed surface W collectively. FIG. 11 is a schematic configuration diagram showing a multi-lamp integrated surface irradiation method. The internal enqueuing device of the lamp device 1 1 0 has a plurality of dielectric excitation lamps 1 1 1. The pitch moment between the dielectric excitation lamps 11 1 is approximately 2 to 3 of the diameter of the dielectric excitation lamp η 1. Brilliance makes the amount of luminous light emitted by the dielectric excitation lamp reflected by each of the reflectors 1 12 as uniform as possible. In order to pass the light emitted from the dielectric excitation lamp π1 and irradiate the workpiece, a light transmitting member 13 made of synthetic quartz or the like is provided on the entire lower surface of the lamp device 110. However, in the case of performing cleaning or upgrading by the conventional multi-lamp integrated surface irradiation method, there are some problems described below. (1) As shown in Figure 10 (B), the amount of light emitted by each dielectric excitation lamp in its width direction is not uniform. Even if the arrangement of adjacent dielectric excitation lamps is optimized, each dielectric excitation lamp The amount of light emitted from time to time is still smaller than the amount of light directly below the dielectric excitation lamp. As a result, when the object to be processed is irradiated with ultraviolet rays for a certain period of time, the cumulative light amount of the object varies greatly, and the effect of cleaning or modifying the object is uneven. (2) It is necessary to irradiate large-scale glass substrates and other devices with ultraviolet rays. Because of the above-mentioned integrated surface irradiation, a considerable number of dielectric excitation lamps (and drive circuits for each lamp) must be provided. For example, when the size of the glass substrate is 680 legs X 880 legs, the multi-lamp integrated surface irradiation method usually requires 13 dielectric excitation lamps. In addition, it is necessary to make a large-scale paper size that applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) --- mt ------ --- installed --------- order- --- 丨 — _ # · (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 500630 A7 B7 V. Description of the invention (4) The more expensive synthetic quartz glass. As a result, there are problems in that the manufacturing cost, the running cost of the device are large, and the device is enlarged. What's more, due to the large number of dielectric excitation lamps, the possibility of failure is high, thereby reducing the reliability of the device. (Description of the Invention) Accordingly, an object of the present invention is to provide an ultraviolet irradiation device and method capable of solving the conventional problems and irradiating uniform ultraviolet rays to the entire range of a large-sized workpiece. In addition, another object of the present invention is to provide an ultraviolet ray irradiation apparatus and method capable of performing cleaning or modification on a large-sized workpiece by using a small amount of a dielectric excitation lamp as much as possible. Furthermore, another object of the present invention is to provide an ultraviolet irradiation device and method with a small use area capable of performing cleaning or modification on a large-sized workpiece. The present invention relates to an ultraviolet irradiation device for irradiating a processed surface of a workpiece with ultraviolet rays to perform cleaning or modification. The device of the present invention includes an ultraviolet irradiation light source, a moving device that linearly moves the object to be processed to the ultraviolet irradiation light source in a width direction across the irradiation range of the ultraviolet light, and controls the moving device to make the ultraviolet irradiation range The relative moving speed of the workpiece is within a P / J (a is the width of the ultraviolet light source, P is the average amount of light per unit area, and J is the unit area required to clean or modify the workpiece Cumulative amount of light) A control device for relative movement of the object to be processed to the aforementioned ultraviolet radiation in a single direction. -6- This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) --- ^ ----------- ·· -------- Order- ----- ^ ----# (Please read the notes on the back before filling this page) 500630 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (5) In this case, the aforementioned control The device can be configured as a control device that controls the moving device so that the relative moving speed of the workpiece within the ultraviolet irradiation range is 2aP / j or less, and the workpiece moves relative to the ultraviolet irradiation light source in a reciprocating direction. In addition, the ultraviolet irradiation device of the present invention can be used as N ultraviolet irradiation light sources which are arranged in close proximity, and relatively linearly move the object to be processed so that the ultraviolet irradiation light source crosses the ultraviolet rays in a row direction. The moving device of the irradiation range, and controlling the aforementioned moving device so that the relative moving speed of the processed object in the ultraviolet irradiation range is aP / ((a is the width of the ultraviolet light source, p is the average light amount per unit area, and J is the The cumulative amount of light per unit area required for cleaning or upgrading of the processed object) is less than or equal to that of the aforementioned processed object, which is a control device for relatively moving the ultraviolet light source in one direction. In this case, the foregoing control can be used to control the mobile device to make the relative moving speed of the workpiece within the ultraviolet irradiation range below 2aP / J, and the workpiece can control the relative movement of the ultraviolet irradiation light source in the reciprocating direction. The structure of the device. Furthermore, the ultraviolet irradiation device of the present invention can be used to have N ultraviolet irradiation light sources arranged in a random manner, and the joint moment between each of the ultraviolet irradiation light sources is (L + a) / N (L is the processing object). Length, a is the width of the ultraviolet light source); a moving device that linearly moves the object to be processed from its length direction to the ultraviolet light source across the irradiation range of the ultraviolet light in a row direction; and control The mobile device applies the Chinese paper standard (CNS) A4 (210 X 297 mm) to the paper size of the processed object in the ultraviolet irradiation range. -I nnnn _ ^ in ϋ t · nnnn nn II 1ϋ I ϋ I n II · (Please read the note on the back? Matters before filling out this page) 500630 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 5. The relative moving distance of the invention description (6) becomes (L + a) / N . In this case, the aforementioned control device can be used to control the aforementioned moving device such that the relative moving speed of the workpiece within the ultraviolet irradiation range is aP / J (a is the width of the ultraviolet irradiation light source, and p is the average amount of light per unit area, J is the total amount of light per unit area required for cleaning or upgrading of the object to be processed). The object to be processed is configured to relatively move the ultraviolet light source in one direction. In addition, the aforementioned control device can be used to control the aforementioned moving device so that the relative moving speed of the workpiece within the ultraviolet irradiation range is 2aP / J (P is the average light amount per unit area, and j is the washing or modification of the workpiece The cumulative amount of light per unit area required by the quality) is less than or equal to that in which the object to be processed relatively moves the ultraviolet light source in the reciprocating direction. In the ultraviolet irradiation device according to the present invention, the ultraviolet irradiation light source is preferably a dielectric excitation lamp. The present invention also relates to an ultraviolet irradiation method for irradiating a processed surface of a workpiece with ultraviolet rays to perform cleaning or modification thereof. The ultraviolet irradiation method of the present invention is a process including a process of causing an ultraviolet irradiation light source to start ultraviolet irradiation, and relatively linearly moving the object to be processed so that the ultraviolet irradiation light source crosses the ultraviolet irradiation range in the width direction, and Make the relative moving speed of the workpiece within the ultraviolet irradiation range aP / J (a is the width of the ultraviolet light source, P is the average amount of light per unit area, and J is the washing or upgrading of the workpiece (Accumulated light quantity per unit area), the size of the paper to be added applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ---: --I-- · --- ft ---- --- I Order --- II. (Please read the precautions on the back before filling this page) 500630 A7 B7 V. Description of the invention (7) The composition of the work piece to control the relative movement of the aforementioned ultraviolet light source in one direction . In addition, the ultraviolet irradiation method of the present invention can be a process including a process of starting an ultraviolet irradiation source of ultraviolet rays, and linearly moving the object to be processed so that the ultraviolet irradiation source crosses the ultraviolet irradiation range in a width direction. And make the relative moving speed of the processed object within the ultraviolet irradiation range be 2aP / J (a is the width of the ultraviolet light source, P is the average amount of light per unit area, and J is the washing or modification of the processed object The total amount of light required per unit area) is less than or equal to the structure in which the ultraviolet light source for the workpiece to be processed and the relative movement control are performed in the reciprocating direction. Furthermore, the ultraviolet irradiation method of the present invention can be used as a process for starting the ultraviolet irradiation of N ultraviolet irradiation light sources arranged close to each other, and relatively moving the object to be processed in a straight line so that the ultraviolet light source is in a row direction. The process of crossing the aforementioned ultraviolet irradiation range, and making the relative moving speed of the processed object in the ultraviolet irradiation range to aP / J (a is the width of the ultraviolet light source, p is the average amount of light per unit area, and J is The cumulative amount of light per unit area required for washing or upgrading of the processed object) is less than or equal to that in which the object to be processed performs relative movement control of the ultraviolet light source in one direction. In addition, the ultraviolet irradiation method of the present invention can be used as a process for starting ultraviolet irradiation by N ultraviolet irradiation light sources arranged close to each other, and linearly moving the object to be processed so that the ultraviolet light source is aligned in a row direction. The system that crosses the aforementioned ultraviolet irradiation range-9- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 public love) ——.---------- installation (please read the back first) Phonetic notation? Please fill in this page for matters) --- Order -----.--- · Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 500630 Α7 Β7 V. Description of Invention (8) (Please read the note on the back first Please fill in this page again), and make the relative moving speed of the workpiece within the ultraviolet irradiation range 2aP / J (a is the width of the ultraviolet light source, p is the 2P average light amount per unit area, and J is the The cumulative amount of light per unit area required for cleaning or upgrading of the processed object) is less than or equal to that of the above-mentioned processed object, which controls the relative movement of the ultraviolet light and the light source in a reciprocating direction. In addition, the ultraviolet irradiation method of the present invention can be used as a set of N ultraviolet irradiation light sources arranged in a limpid manner, and the joint moment between each of the ultraviolet irradiation light sources is (L + a) / N (L is the processing object). Length, a is the width of the ultraviolet irradiation light source), a process for disposing the processed object under the ultraviolet irradiation light source so that its length is consistent with the direction in which the ultraviolet irradiation light source travels, and starting the N ultraviolet irradiation light sources In the process of ultraviolet irradiation, a process in which the object to be processed is relatively linearly moved so that the ultraviolet light source traverses the ultraviolet irradiation range in the direction in which it travels, and the process of the object in the ultraviolet irradiation range is performed. The relative movement distance is controlled by (L + a) / N. This situation is printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The process of disposing the processed object is preferably such that the front end of the processed object moves in front of the ultraviolet light source located in the innermost part of the moving direction. square.
另外，使前述被加工物相對移動之製程係能控制使前 述紫外線之照射範圍內之前述被加工物之相對移動速 度於aP/J(P係其每單位面積之平均平量，j係被加工物 之洗淨或改質所需之每單位面積之累計光量）以T -10- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 500630 A7 B7 五、發明說明（9 ) 述被加工物對紫外線照射光源於單向上進行相對移 動。 更甚者，使前述被加工物相對移動之製程係能控制使 前述紫外線之照射範圍內之被加工物之相對移動速度 於2 a P / J (J係其每單位面積之平均光量，j係被加工物之 洗淨或改質所需之每單位面積之累計光量）以下，前述 被加工物對紫外線照射光源於往復方向上進行相對移 動。 前述本發明有關之紫外線照射方法上，前述紫外線照 射光源良好地係爲介電體激發燈。 (圖式之簡單說明） 第1圖係爲本發明之一實施形態有關之紫外線照射 裝置之構成方塊圖。 第2圖係爲弟1圖之燈裝置使用之水冷式介電體激 發燈之正面反側面之斷面圖。 第3圖係爲第1圖之電源控制部之具體之構成方塊 圖。 第4圖係示出使被加工物在紫外線照射範圍內於單 向上移動之情形之實施形態之槪念圖。 第5圖係示出使被加工物在紫外線照射範圍內於往 復方向上移動之情形之實施形態之槪念圖。 第6圖係示出將燈裝置分割配置之本發明之另外實 施形態有關之紫外線之照射方法之槪念圖。 第7圖係示出第6圖之實施形態之被加工物之累計 -11- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） ----------^ (請先閱讀背面之注意事項再填寫本頁) i_* _ - 1 —mmm I ·! ^ I I In mmmmmmm I n I emme I · 經濟部智慧財產局員工消費合作社印製 經濟部智慧財產局員工消費合作社印製 500630 A7 B7 五、發明說明（1()) 光量分佈對時間之變化圖。 第8圖係作成與第6圖之實施形態者相同之燈裝置 之配置示出使被加工物往復移動之情形之實施形態之 槪念圖。 第9圖係爲空冷式之介電體激發燈之正面及側面之 斷面圖。 第10(A)圖係含有介電體激發燈而構成之燈裝置之 槪略構成圖，第10(B)圖係示出在其寬度方向上之發光 光量之分佈圖。 第1 1圖係爲以往之多燈統括面照射方式之槪略構成 圖。 (發明之實施形態） 下面將根據一實施形態詳細說明本發明。第1圖係 本發明之一實施形態有關之紫外線照射裝置之構成方 塊圖。如圖示，紫外線照射裝置1 0具備內設介電體激 發燈之燈裝置1 1，燈裝置1 1之電源控制部1 2及冷卻部 13,運送被加工物W之運送部14,及運送部14之運送 控制部1 5。 燈裝置1 1良好地係由多根之介電體激發燈所構成。 各個介電體激發燈係倂列近接地配置對位在其等之正 下方之被加工物W執行紫外線之面照射。本發明之燈 裝置1 1能倂列配置多數具備單一之介電體激發燈之燈 裝置，另外，也可使用在單一之燈裝置內具備多根之介 電體激發燈。不過，也可將燈裝置1 1構成僅含有單一 -12- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） n n 1 n I n ΛΜΜβ n n n 1 1_1 ϋ I i I— 1 iai n ϋ n I · (請先閱讀背面之注音？事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 500630 A7 _______B7___ 五、發明說明（11 ) 之介電體激發燈。於後示之實施形態上係藉倂列配置 三座具備單一之介電體激發燈之燈裝置以構成燈裝置 1 1。含於燈裝置1 1之介電體激發燈良好地係爲水冷 式。水冷式介電體激發燈相較於第9圖所示之空冷式 者能以高效率照射紫外線。有關空冷式之介電體激發 燈將於後文敘述。 電源控制部1 2係控制前述介電體激發燈之on-off 。 電源 控制部 1 2 能構 成爲藉 控制加 於介電 體激發 燈之電力使其降低到20%以下俾實質地切斷（OFF)其之 洗淨或改質之功能。有關電源控制部1 2之電路構成將 於後文敘述。冷卻部1 3係提供冷卻前述水冷式之各介 電體激發燈俾提高照射光量用之構造。亦即，在各個介 電體激發燈之管內循環流通導電率爲2 # siemens/meter以下之純度之冷卻水。 運送部1 4係爲在水平方向運送玻璃基板等之矩形狀 之被加工物W使通過前述燈裝置1 1發射之紫外線照 射範圍之機構。運送部1 4具備安定地裝載被加工物並 與其一起移動之未圖示之裝載台。裝載台之高度位置 係使裝載於其上之被加工物之上面，亦即被加工面和燈 裝置1 1之底部之距離，在1 〇腿以下，良好地係設定於 5〜2 mm之範圍。本業者當瞭解縮短燈裝置和被加工面 之距離能提高洗淨或改質之效率。 運送控制部1 5係控制前述運送部1 4運送被加工物 之速度，運送距離（亦即運送起點及終點），運送動作（亦 -13- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） n n H· >ϋ 1· >|_|1 n -1 in 1 ·ϋ —ϋ i·— I 1111— n 1 I (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 500630 A7 B7 五、發明說明（12 ) 即是否爲單向移動或往復移動）。使用者對有關這些値， 能將所要之設定値輸入該運送控制部1 5，運送控制部 1 5則依輸入之設定値控制運送部1 4。 設置前述各構成之紫外線照射裝置1 0具備保持安定 之環境之密閉框體當被加工物W在其內部移動之際藉 前述燈裝置1 1進行紫外線之照射。 第2圖係示出使用前述燈裝置之介電體激發體。本 實施形態使用之介電體激發燈係爲使用冷卻水進行冷 卻之水冷式者。水冷式介電體激發燈20具備於雙重管 21，亦即由合成石央玻璃作成之放電容器，之內部充滿 氙氣等之放電用氣體22之裝置。雙重管21之外周及 內周分別配置網狀之外部電極2 3及捲線狀之內部電極 24。藉前述冷卻部1 3操控之循環機構使具有導電率爲 2#siemens/meter以下之純度之冷卻水25流通於雙重 管2 1之內側。該冷卻水係吸收介電體激發燈2 0所產 生之熱。 第9圖所示之空冷式介電體激發燈，當被加上每單位 長度之電力爲2W/C以上時即變成難於吸收其發熱量， 降低激發氣體之發光效率，無法獲得充份光量之真空紫 外線。但是，第2圖所示之水冷式介電體激發燈，因雙 重管內部有流通前述冷卻水2 5，即使投入大的驅動電力 也能防止超過既定之發熱量，從而提局發光光量。於一 實施例上，介電體激發燈之每單位長度能投入之電力係 爲15W/Cm，獲得前述空冷式之5倍強之發射光量。 -14- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ϋ n n n n ϋ~ «ϋ ί ml I ί ϋ ϋ ϋ ϋ n 一-0, · I n n I I I I _ (請先閱讀背面之注音？事項再填寫本頁) 500630 A7 B7 五、發明說明（13 ) 第3圖係爲第1圖之電源控制部1 2之具體構成方塊 圖。圖上，振盪器31產生200〜300KHZ之驅動頻率之電 壓，經前置放大器3 2放大增益。混波器3 3係輸入前述 被放大之驅動頻率電壓和外部矩形信號3 4予以混波。 混合後之信號通過至放大器3 5以獲得大的增益，接著， 藉高頻高壓變壓器36放大電力，最後施加於介電體激 發燈37。外部矩形信號34係爲1〜數ΙΟΚΗζ之數位信 號於混波器3 3上被執行F Μ調變。介電體激發燈3 7 之輸出可藉將前述外部矩形信號之脈衝寬作成可變（改 變脈衝之責任比（duration ratio)而變化。藉使用前述 高輸出之水冷式介電體激發燈，容易執行這樣子之輸出 變化。 第4圖係示出前述紫外線照射裝置1 〇執行之被加工 物之具體的洗淨或改質方法之槪念圖。於本實施形態 上，藉將三座具備單一介電體激發燈之燈裝置40 A〜40C 作成近接配置，呈現構成第1圖所示之燈裝置1 1之 例。前述運送部1 4及運送控制部1 5，在本實施形態上， 係使矩形狀之被加工物W於單向上移動（圖上係從左 朝右）通過燈裝置11發射之紫外線照射範圍。 藉未圖示之操縱（handling)裝置將被加工物W放置 於運送部之裝載台上。在移送被加工物W之前，各燈 裝置40 A〜40C之介電體激發燈先點燈。依運送控制部 1 5之控制信號驅動運送部1 4，從而移動被加物使其之 被加工面橫過橫過紫外線之照射範圍。當被加工面全 -15- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 丨丨---·---Γφ· ^ (請先閱讀背面之注咅2事項再填寫本頁) n emmmm 1 J 一 e I a···· ima· I I I · 言 經濟部智慧財產局員工消費合作社印製 500630 A7 B7_____ 五、發明說明（14 ) (請先閱讀背面之注音？事項再填寫本頁) 部通過紫外線照射領域後即停止運送部1 4所執行之移 送動作，燈裝置40 A〜40C也消燈。經過該項製程後才算 結束被加工物W之洗淨或改質。再者，偵測前述被加 工物W對紫外線之照射範圍之位置，能採用眾所知悉 之方法，如微動開關（micro-switch)，光偵測器（photosensor) 等 〇 這裡，紫外線照射領域內之被加工物w之移動速度 係被運送控制部1 5控制。運送控制部1 5係以被加工 物W次通過而能完成洗淨或改質所需之最佳速度執行 移動動作。本實施形態上，紫外線照射領域內之被加工 物W之移動速度V係根據下式算出。 V = aPN/J...(l) 這裡，a係爲各個燈裝置40A〜40C之寬，Ρ係爲其之每 單位面積之平均光量，Ν係爲介電體激發燈之根數，J係 爲被加工物之洗淨或改質所需之每單位面積之累計光 量。 經濟部智慧財產局員工消費合作社印製In addition, the process of relatively moving the object to be processed can control the relative moving speed of the object to be processed in the ultraviolet irradiation range to aP / J (P is the average level per unit area, and j is the part being processed. The cumulative amount of light per unit area required for the cleaning or upgrading of objects) is T -10-. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 500630 A7 B7 V. Description of the invention (9 The object to be processed moves relative to the ultraviolet light source in a single direction. What's more, the process of relatively moving the workpiece can control the relative moving speed of the workpiece within the ultraviolet irradiation range to 2 a P / J (J is the average amount of light per unit area, and j is the The cumulative amount of light per unit area required for washing or upgrading of the object to be processed is less than or equal to the above, the object to be processed relatively moves the ultraviolet light source in a reciprocating direction. In the aforementioned ultraviolet irradiation method according to the present invention, the aforementioned ultraviolet irradiation light source is preferably a dielectric excitation lamp. (Brief description of the drawings) Fig. 1 is a block diagram showing a configuration of an ultraviolet irradiation device according to an embodiment of the present invention. Fig. 2 is a cross-sectional view of the front and reverse side of the water-cooled dielectric excitation lamp used in the lamp device of Fig. 1. Fig. 3 is a block diagram showing a specific configuration of the power control section in Fig. 1; Fig. 4 is a conceptual diagram showing an embodiment of a case where a workpiece is moved in a single direction within an ultraviolet irradiation range. Fig. 5 is a conceptual diagram showing an embodiment of a case in which a workpiece is moved in the reciprocating direction within the ultraviolet irradiation range. Fig. 6 is a schematic view showing a method for irradiating ultraviolet rays according to another embodiment of the present invention in which the lamp devices are dividedly arranged. Figure 7 shows the cumulative total of the processed objects in the implementation form of Figure 6. -11- This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 public love) ---------- ^ (Please read the precautions on the back before filling out this page) i_ * _-1 —mmm I ·! ^ II In mmmmmmm I n I emme I Printed by the consumer cooperative 500630 A7 B7 V. Description of the invention (1 ()) The graph of the change in light distribution over time. Fig. 8 is a conceptual diagram showing an embodiment in which the arrangement of a lamp device similar to that of the embodiment shown in Fig. 6 is made to move a workpiece to and fro. Fig. 9 is a sectional view of the front and sides of an air-cooled dielectric excitation lamp. Fig. 10 (A) is a schematic configuration diagram of a lamp device including a dielectric excitation lamp, and Fig. 10 (B) is a distribution diagram showing the amount of light emitted in the width direction. Fig. 11 is a schematic diagram of a conventional multi-lamp integrated surface irradiation method. (Embodiment of Invention) The present invention will be described in detail based on an embodiment. Fig. 1 is a block diagram showing a configuration of an ultraviolet irradiation device according to an embodiment of the present invention. As shown in the figure, the ultraviolet irradiation device 10 includes a lamp device 11 having a dielectric excitation lamp built therein, a power source control unit 12 and a cooling unit 13 of the lamp device 11, a transport unit 14 that transports a workpiece W, and transport The transport control unit 15 of the unit 14 The lamp device 11 is preferably composed of a plurality of dielectric excitation lamps. Each of the dielectric excitation lamps is arranged in a line near the ground, and is irradiated with ultraviolet rays on a workpiece W positioned directly below them. The lamp device 11 of the present invention can be arranged in a line with many lamp devices having a single dielectric excitation lamp, and it is also possible to use a plurality of dielectric excitation lamps in a single lamp device. However, the lamp device 1 1 can also be composed of only a single -12- This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) nn 1 n I n ΛΜΜβ nnn 1 1_1 ϋ I i I— 1 iai n ϋ n I · (Please read the note on the back? Matters before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 500630 A7 _______B7___ V. Dielectric Excitation Lamp of the Invention Description (11). In the embodiment shown below, three lamp devices with a single dielectric excitation lamp are arranged by a queue to form a lamp device 1 1. The dielectric-excitation lamp included in the lamp device 1 1 is preferably a water-cooled type. The water-cooled dielectric excitation lamp can irradiate ultraviolet rays with higher efficiency than the air-cooled type shown in FIG. The air-cooled dielectric excitation lamp will be described later. The power source control section 12 controls the on-off of the dielectric excitation lamp. The power supply control unit 1 2 can be constructed to control the power to the dielectric excitation lamp to reduce it to less than 20%, and substantially cut off (OFF) its cleaning or modification functions. The circuit configuration of the power supply control section 12 will be described later. The cooling section 1 3 is a structure for cooling the aforementioned water-cooled dielectric excitation lamps 俾 to increase the amount of irradiated light. That is, cooling water having a conductivity of 2 # siemens / meter or less is circulated in the tubes of each dielectric excitation lamp. The transport unit 14 is a mechanism that transports a rectangular workpiece W such as a glass substrate in a horizontal direction so that the ultraviolet irradiation range emitted by the lamp device 11 can be emitted. The transport section 14 includes a loading table (not shown) for stably loading and moving the workpiece. The height position of the loading platform is such that the distance between the processed surface and the bottom of the lamp device 11 above the processed object loaded on it is less than 10 legs, which is well set in the range of 5 to 2 mm. . The practitioner should understand that shortening the distance between the lamp device and the machined surface can improve the efficiency of cleaning or upgrading. The transport control unit 15 controls the speed, transport distance (that is, the starting point and the end point of the transport), and the transport action (also -13- This paper size applies the Chinese National Standard (CNS) A4 specification ( 210 X 297 mm) nn H · > ϋ 1 · > | _ | 1 n -1 in 1 · ϋ —ϋ i · — I 1111— n 1 I (Please read the precautions on the back before filling this page ) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, 500630 A7 B7 V. Invention Description (12) Whether it is one-way movement or reciprocating movement). The user can input the desired setting 値 into the transport control unit 15 regarding these 値, and the transport control unit 15 controls the transport unit 14 according to the input setting 値. The ultraviolet irradiation device 10 having the above-mentioned respective structures is provided with a hermetically sealed housing which maintains a stable environment. The workpiece W is irradiated with the ultraviolet light by the lamp device 11 while the workpiece W moves inside. Fig. 2 shows a dielectric exciter using the lamp device. The dielectric excitation lamp used in this embodiment is a water-cooled type that uses cooling water for cooling. The water-cooled dielectric excitation lamp 20 is provided with a double tube 21, that is, a discharge vessel made of synthetic stone central glass, and the inside thereof is filled with a discharge gas 22 such as xenon gas. The outer periphery and the inner periphery of the double tube 21 are provided with a meshed external electrode 23 and a coiled internal electrode 24, respectively. By the circulation mechanism controlled by the aforementioned cooling unit 13, the cooling water 25 having a conductivity of 2 # siemens / meter or less purity is circulated inside the double pipe 21. This cooling water system absorbs heat generated by the dielectric excitation lamp 20. The air-cooled dielectric excitation lamp shown in Figure 9 becomes difficult to absorb the heat generated when the electric power per unit length is more than 2W / C, which reduces the luminous efficiency of the excitation gas and cannot obtain sufficient light quantity. Vacuum UV. However, the water-cooled dielectric excitation lamp shown in FIG. 2 has the aforementioned cooling water 25 flowing inside the double tube, and even if a large driving power is input, it can prevent exceeding a predetermined amount of heat generation, thereby increasing the amount of luminous light. In one embodiment, the electric power per unit length of the dielectric excitation lamp is 15 W / Cm, and the amount of emitted light that is 5 times stronger than the aforementioned air-cooled type is obtained. -14- This paper size is in accordance with China National Standard (CNS) A4 (210 X 297 mm) ϋ nnnn ϋ ~ «ϋ ί ml I ί ϋ ϋ ϋ n a-0, · I nn IIII _ (Please read first Note on the back? Please fill out this page again.) 500630 A7 B7 V. Description of the invention (13) Figure 3 is a block diagram of the specific structure of the power control section 12 of Figure 1. In the figure, the oscillator 31 generates a voltage of a driving frequency of 200 to 300 kHz, and the gain is amplified by the preamplifier 32. The mixer 3 3 inputs the amplified driving frequency voltage and the external rectangular signal 34 to mix the signals. The mixed signal is passed to the amplifier 35 to obtain a large gain, then the power is amplified by the high-frequency high-voltage transformer 36, and finally applied to the dielectric excitation lamp 37. The external rectangular signal 34 is a digital signal with a number of 1 to 10KΗζ, and is subjected to F M modulation on the mixer 33. The output of the dielectric excitation lamp 37 can be changed by changing the pulse width of the aforementioned external rectangular signal (change the duty ratio of the pulse. By using the aforementioned high-output water-cooled dielectric excitation lamp, it is easy The output change performed in this way is shown in Fig. 4. Fig. 4 is a conceptual diagram showing a specific method of cleaning or modifying a processed object performed by the aforementioned ultraviolet irradiation device 10. In this embodiment, the three seats are provided with a single unit. The lamp devices 40 A to 40C of the dielectric excitation lamp are arranged in close proximity to each other, and an example of the lamp device 11 shown in Fig. 1 is shown. In the present embodiment, the transport unit 14 and the transport control unit 15 are connected. The rectangular workpiece W is moved in a single direction (from the left to the right in the figure) through the ultraviolet irradiation range emitted by the lamp device 11. The workpiece W is placed in the conveying section by a handling device (not shown). On the loading table. Before the workpiece W is transferred, the dielectric excitation lamps of each of the lamp devices 40 A to 40C are turned on. The conveyor 14 is driven according to the control signal of the conveyor control unit 15 to move the workpiece. Make it the processed surface Transcend the irradiation range of ultraviolet rays. When the processed surface is full -15- This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 丨 丨 ------ Γφ · ^ (please first Read Note 2 on the back and fill in this page again) n emmmm 1 J a e I a ·············· Imprinted by the Intellectual Property Bureau Employee Consumer Cooperatives of the Ministry of Economic Affairs 500630 A7 B7_____ V. Description of the Invention (14) ( Please read the phonetic on the back? Matters and then fill out this page) After passing through the UV irradiation field, the transfer operation performed by the transport unit 14 will be stopped, and the lamp devices 40 A ~ 40C will also be turned off. Wash or modify the processed object W. In addition, the position of the irradiation range of the processed object W to the ultraviolet rays can be detected by known methods such as a micro-switch and a light detector ( photosensor) etc. Here, the moving speed of the workpiece w in the ultraviolet irradiation area is controlled by the transport control unit 15. The transport control unit 15 is required to pass through the processed object W times to complete washing or upgrading. Move at the best speed. This embodiment In the above, the moving speed V of the workpiece W in the ultraviolet irradiation field is calculated according to the following formula: V = aPN / J ... (l) Here, a is the width of each lamp device 40A to 40C, and P is its width. The average light amount per unit area, N is the number of dielectric excitation lamps, and J is the cumulative light amount per unit area required for washing or upgrading of the processed object. Consumer Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs Print
現設被加工物W之移送方向之長度爲L，寬爲b時處 理被加工物之被加工面全面所需之累計光量係爲J(Lx b)，另外N根燈裝置之光量係爲PN(axb)。因此，處理 被加工物W之全面所需之時間t係爲 t = J(Lxb)/PN(axb) = JL/aPN 藉上式，處理長度L之被加工物W所需之移動速度V 能自下式求出。The length of the moving direction of the processed object W is L and the width of b when processing the processed surface of the processed object is J (Lx b). In addition, the light quantity of N lamp devices is PN. (axb). Therefore, the time t required to process the whole object W is t = J (Lxb) / PN (axb) = JL / aPN. Using the above formula, the moving speed V energy required to process the object W of length L can be Find it from the following formula.
V = L/t = aPN/J -16- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）' 500630 A7 B7 15 五、發明說明（） .!:---------裝 (請先閱讀背面之注意事項再填寫本頁) 例如，於近接配置二根寬a == 7 5 mm，平均單位面積照射光 量P = 20mW/cm 2之燈裝置之紫外線照射裝置上，設處理 上所需之每單位面積之累計光量j爲l00mJ/cm 2,處理 =8 8 0 mni之被加工物時，移動速度v則由下式求出。V = L / t = aPN / J -16- This paper size applies to Chinese National Standard (CNS) A4 (210 X 297 mm) '500630 A7 B7 15 V. Description of the invention ().!: ----- ---- Equipment (please read the precautions on the back before filling this page) For example, two lamps with a width of a == 7 5 mm and an average unit area irradiation light amount P = 20mW / cm 2 are arranged in close proximity. On the device, if the accumulated light quantity j per unit area required for processing is 100 mJ / cm 2, and the processing object is 880 mni, the moving speed v is obtained by the following formula.
V = 7 5 · 20· 3/100 = 45 mm/S 被加工物W通過紫外線照射領域時保持速度在此定速 度以下，藉此被加工面全面均一地施予必要2充份之處 理。再者，被加工物W之初期位置考慮被加工物w之 移動速度加速到則述定速度止之加速距離，實際上其先 頭位置（圖中A)係在較燈裝置40A若干前方之位置。 第5圖係示出使被加工物w在紫外線照射範圍上往 復移動之情形之實施形態。於本實施形態上，被加工物 W爲了其之洗淨或改質而往復移動橫過紫外線照射範 圍。亦即，設在燈裝置1 1前方（圖上左側）之被加工物 W係朝燈裝置1 1發射之紫外線照射範圍被移送，在該 被加工面之全面完全通過該照射範圍之時即暫時停 止。其次，朝逆向被移送，再度通過紫外線照射範圍回 到初期位置後即停止。 經濟部智慧財產局員工消費合作社印製 於本實施形態上，被加工物W在燈裝置1 1之底下通 過兩次。因此，爲了供給被加工物與第4圖之情形者相 同累計光量，只要以前述速度之兩倍速度移動被加工物 即可。亦即，本實施形態之情形，紫外線照射範圍內之 被加工物W之移動速度能定在V = 2aPN/J以下。 第6圖係示出本發明之另外實施形態有關之紫外線 -17- 本紙張尺度適用中國國家標準（CNS)A4規格（210 x 297公釐） 經濟部智慧財產局員工消費合作社印製 500630 A7 __ B7___ 五、發明說明（16 ) 之照射方法之槪念圖。本實施形態之照射方法對縮小 裝置佔用之地板面積比處理速度重要之環境係爲有效 。實現本實施形態有關之照射方法之際，前述實施形態 上之三個燈裝置40 A〜4 0C係分成等間隔配置。設被加 工物W之移動方向上之長度爲L時則燈裝置40 A〜40 C 間之節距係以（L + a)/N爲基準而決定。這裡，a係各個 燈裝置之寬，N係燈裝置之數量。於本實施形態上係使 用三根之燈裝置，故其節矩爲（L + a)/3。 在燈裝置係爲此種配置之關係上，被加工物W係配 合其前端A位在移動方向上之最裡面之燈裝置（圖上係 爲燈裝置40C)之前方而被放置。三根之燈裝置 40A〜40C係配合被力口工物W之移動之開始而點燈。隨 著被加工物W之移動，各個燈裝置40 A〜4 0C分別照射 並處理被加工面之前領域，中領域；後領域。被加工物 W之後端B超過最前方之燈裝置（圖上係燈裝置40A) 之照射範圍時即完成紫外線對被加工面全面之照射。 再者，被加工物W之移動距離係與前述燈之節距相同 爲（L + a)/N。 與前述實施形態相同，自對被加工面之各領域給與充 份處理所需之累計光量，決定被加工物W之移動速 度。紫外線對各領域之照射因係藉一根之介電體激發 燈執行，故依前述（1)式，移動速度V係爲V = aP/3以 下。例如，使用寬a = 7 5 mm，平均單位面積之照射光量 P = 20mW/cm 2之燈裝置之紫外線照射裝置，設處理所需 -18- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注咅3事項再填寫本頁) 裝 Γ - - mmat I ϋ J ^ I mmmmmm 1 ·__··1 n 1- I 言 500630 A7 ____B7___ 五、發明說明（17 ) (請先閱讀背面之注意事項再填寫本頁) 之每單位面積之累計光量J爲100mJ/cm 2,處理L = 88〇 mm之被加工物時移動速度v係爲v==75· 20/100 = 15醒 /S，另外，前述燈裝置間之節矩及被加工物W之移動距 離，自（L + a)/N = (880 + 75)/3，戎出約爲 318.3 mm。自上述 數據，求出被加工物W之處理時間（移動之開始到結束 止之時間），t = 3 1 8 · 3 /1 5，約爲21 . 2秒。 第7圖係示出前述實施形態上，被加工物W之累計 光量之分佈對時間之變化。這裡，爲了簡化起見，將一 個燈裝置所產生之照度分佈設爲正三角形。於每個燈 裝置寬a之1 / 4距離上示出累計光量之分佈狀態。從 此圖理解到隨著被加工物W之移動，累計給與被加工 面之各領域之光量之情形。依各個燈裝置40 A〜40 C形 成之三角狀之照度分佈，最初，給與被加工面之累計光 量之分佈隨地點而異，但當被加工物W之後端B超過 最初之燈裝置40A時，亦即其之移動距離達到（L + a)/3 時整個領域之照射光量即成均一。 第8圖係示出藉與前述實施形態相同之燈裝置之配 置構成，使被加工物W往復移動之情形之實施形態。 經濟部智慧財產局員工消費合作社印製V = 7 5 · 20 · 3/100 = 45 mm / S When the workpiece W passes through the ultraviolet irradiation area, it keeps the speed below this fixed speed, so that the processed surface can be uniformly treated with 2 necessary treatments. In addition, the initial position of the workpiece W considers the acceleration distance at which the moving speed of the workpiece w accelerates to a predetermined speed. In fact, its leading position (A in the figure) is located in front of the lamp device 40A. Fig. 5 shows an embodiment in which the workpiece w is moved back and forth in the ultraviolet irradiation range. In this embodiment, the workpiece W is moved back and forth across the ultraviolet irradiation range for cleaning or modification. That is, the processed object W provided in front of the lamp device 11 (on the left in the figure) is transferred to the ultraviolet irradiation range emitted by the lamp device 11 and temporarily when the processed surface completely passes the irradiation range. stop. Secondly, it is transferred in the reverse direction, and stops again after returning to the initial position through the ultraviolet irradiation range. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs In this embodiment, the processed object W passes twice under the lamp device 11. Therefore, in order to supply the processed object with the same cumulative light amount as in the case shown in Fig. 4, it is sufficient to move the processed object at a speed twice the speed described above. That is, in the case of this embodiment, the moving speed of the workpiece W in the ultraviolet irradiation range can be set to V = 2aPN / J or less. Figure 6 shows the UV-17 related to another embodiment of the present invention.-This paper size applies the Chinese National Standard (CNS) A4 specification (210 x 297 mm). Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economy 500630 A7 __ B7___ V. An illustration of the irradiation method of the invention description (16). The irradiation method of this embodiment is effective for reducing the environment where the floor area occupied by the device is more important than the processing speed. When the irradiation method according to this embodiment is implemented, the three lamp devices 40 A to 40 C in the foregoing embodiment are arranged at equal intervals. When the length in the moving direction of the processed object W is L, the pitch between the lamp devices 40 A to 40 C is determined based on (L + a) / N. Here, a is the width of each lamp device, and N is the number of lamp devices. In this embodiment, a three-lamp device is used, so its pitch moment is (L + a) / 3. In relation to the arrangement of the lamp device, the workpiece W is placed in front of the innermost lamp device (the lamp device 40C in the figure) located at the front end A in the moving direction. The three lamp devices 40A to 40C are turned on in accordance with the start of the movement of the forced work W. As the workpiece W moves, each of the lamp devices 40 A to 4 0C irradiates and processes the processed area before, middle, and rear areas. When the rear end B of the workpiece W exceeds the irradiation range of the foremost lamp device (the lamp device 40A in the figure), the entire irradiation of the processed surface by ultraviolet rays is completed. The moving distance of the workpiece W is the same as the pitch of the lamp described above (L + a) / N. As in the previous embodiment, the accumulated light amount required for sufficient processing of each area of the processed surface determines the moving speed of the processed object W. The irradiation of ultraviolet rays in various fields is performed by a dielectric excitation lamp, so according to the above formula (1), the moving speed V is below V = aP / 3. For example, an ultraviolet irradiation device using a lamp device with a width a = 75 mm and an average unit area of irradiated light amount P = 20mW / cm 2 is set to be required for processing -18- This paper size applies to China National Standard (CNS) A4 specifications ( 210 X 297 mm) (Please read Note 3 on the back before filling out this page) Install Γ--mmat I ϋ J ^ I mmmmmm 1 · __ ·· 1 n 1- I 500 500630 A7 ____B7___ 5. Description of the invention (17) (Please read the precautions on the back before filling in this page) The cumulative light amount per unit area J is 100mJ / cm 2, and the processing speed v is v == 75 when processing the workpiece with L = 88〇mm · 20/100 = 15 wakes / S, in addition, the pitch moment between the aforementioned lamp devices and the moving distance of the workpiece W, from (L + a) / N = (880 + 75) / 3, the output is about 318.3 mm. From the above data, the processing time of the processed object W (the time from the start to the end of the movement) is calculated, t = 3 1 8 · 3/15, which is about 21.2 seconds. Fig. 7 is a graph showing the change of the distribution of the cumulative light amount of the workpiece W with respect to time in the aforementioned embodiment. Here, for the sake of simplicity, the illuminance distribution generated by a lamp device is set to a regular triangle. The distribution state of the cumulative light amount is shown at a distance of 1/4 of the width a of each lamp device. From this figure, it is understood that as the workpiece W moves, the amount of light accumulated in each area of the processed surface is accumulated. According to the triangular illuminance distribution formed by each of the lamp devices 40 A to 40 C, initially, the distribution of the cumulative light amount to the processed surface varies depending on the location, but when the rear end B of the workpiece W exceeds the original lamp device 40A That is, when the moving distance reaches (L + a) / 3, the amount of irradiation light in the entire field becomes uniform. Fig. 8 shows an embodiment in which the workpiece W is reciprocated by the same configuration of the lamp device as the previous embodiment. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs
於本實施形態上，與先前之單向移動之情形相同地，被 加工物W係設在最裡側之燈裝置4 0 C之前方。燈裝置 40A〜40C點燈後被力口工物W即被朝|1上之右向移動以 行處理。當被加工物W之後端B超過前方之燈裝置 40A時，亦即其之移動距離成爲（L + a)/3之時，則暫時停 止移動，接著朝向相反方向移動。這時，當被加工物W -19- ^紙張尺度適用中國國家標準(CNS)A4規格（21心297公釐) 一 經濟部智慧財產局員工消費合作社印製 500630 A7 _________B7___— 18 五、發明說明（） 返回到初期位置時即停止移動，而結束處理。這種情形 被加工面之各個領域係通過相同之燈裝置之照射範圍 兩次，因此每單位時間之照射光量只要前述實施形態之 情形之一半即可。亦即，本實施形態被加工物W之移 動速度V能定爲V = 2aP/J以下。 於前述第6圖及第8圖所示之實施形態上，能將被加 工物W之移動範圍作成極小。因此，實施該照射方法 之裝置相較於被加工物之尺寸能作成極小型。 以上，已參照圖面說明本發明之一貧施形態。但是， 請瞭解者本發明不限定於前述實施形態所示之諸事項， 而能根據專利申請範圍之記載作變更，改良等。本發明 作爲封入介電體激發燈之放電容器之放電用氣體，能採 用具有氙之氣體，具有溴化氪（KrBr)之氣體，具有氟化氬 之氣體，具有氯化氬之氣體，具有溴化氬（ArBr)之氣體， 具有氟之氣體，具有氪之氣體，及具有氬之氣體等。 另外，本發明使用之紫外線照射光源不限定於前述介 電體激發燈，也能採用藉微波激勵之種激發氣體所產生 之紫外線發光，或藉電子激勵之各種激發氣體所產生之 紫外線發光。 更甚者，於前述之實施形態上，係示出使用含有三根 介電體激發燈之燈裝置之例，但是，介電體激發燈之根 數不限定於此，其根數也可爲1根。另外，藉本發明被 洗淨或改質之被加工物不必限定爲矩形，也可採爲半導 體晶圓那樣之圓形物。 -20- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注咅？事項再填寫本頁)In this embodiment, as in the case of the previous unidirectional movement, the workpiece W is located in front of the lamp device 4 0 C on the innermost side. After the lamp device 40A ~ 40C is turned on, the work piece W is moved to the right of | 1 for processing. When the rear end B of the workpiece W exceeds the forward lamp device 40A, that is, when the moving distance becomes (L + a) / 3, the movement is temporarily stopped, and then the movement is performed in the opposite direction. At this time, when the processed product W -19- ^ paper size applies the Chinese National Standard (CNS) A4 specification (21 heart 297 mm). Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economy 500630 A7 _________ B7 ___— 18 V. Description of the invention ( ) When returning to the initial position, the movement is stopped and the processing is ended. In this case, each area of the processed surface is irradiated twice by the same lamp device, so the amount of irradiated light per unit time may be only one and a half of that in the foregoing embodiment. That is, the moving speed V of the workpiece W in this embodiment can be set to V = 2aP / J or less. In the embodiment shown in Fig. 6 and Fig. 8, the moving range of the workpiece W can be made extremely small. Therefore, the apparatus for implementing this irradiation method can be made extremely small compared with the size of the object to be processed. In the above, a lean application form of the present invention has been described with reference to the drawings. However, please understand that the present invention is not limited to the matters described in the foregoing embodiments, but can be changed, improved, etc. according to the description of the scope of patent applications. As the discharge gas of the discharge vessel enclosed in the dielectric excitation lamp, the present invention can use a gas with xenon, a gas with krypton bromide (KrBr), a gas with argon fluoride, a gas with argon chloride, and bromine ArBr gas, fluorine-containing gas, krypton-containing gas, and argon-containing gas. In addition, the ultraviolet irradiation light source used in the present invention is not limited to the aforementioned dielectric excitation lamp, and can also use ultraviolet light generated by an excitation gas excited by microwaves or ultraviolet light generated by various excitation gases excited by electrons. Furthermore, in the foregoing embodiment, an example is shown in which a lamp device including three dielectric excitation lamps is used. However, the number of dielectric excitation lamps is not limited to this, and the number may be one. root. In addition, the object to be cleaned or modified by the present invention need not be limited to a rectangular shape, and may be a circular object such as a semiconductor wafer. -20- This paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the note on the back? Matters before filling out this page)
500630 A7 B7_ __ 19 五、發明說明（） 如上述，依本發明，能對大型之被加工物之整個領域 均一地照射紫外線，從而改善洗淨或改質之品質。 (請先閱讀背面之注意事項再填寫本頁) 另外，能降低大型被加工物之洗淨或改質所需之紫外 線照射光源之數量至極少，從而能降低裝置之製造成本， 運轉成本，另外能縮小裝置。尤有進者，藉減少光源之 數量，降低故障之可能性，從而提高裝置之可靠性。 更甚者，於將多數之紫外線照射光源分割配置之本發 明上，被加工物之移動距離因能作得極小，故能構成更 小型之裝置。 符號說明 1 1 ...燈裝置 12.. .電源控制部 13…冷卻部 14.. .運送部 15.. .運送控制部 20.. .介電體激發燈 21 ...雙重管 22.. .放電用氣體 23.. .網狀外部電極 經濟部智慧財產局員工消費合作社印製 24.. .捲線狀內部電極 32.. .前置放大器 3 3 ...混波器 35.. .主放大器 36.. .高頻高壓變壓器 101…透光構件 102…反射鏡 -21- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）500630 A7 B7_ __ 19 5. Description of the invention () As mentioned above, according to the present invention, the entire field of large-scale processed objects can be uniformly irradiated with ultraviolet rays, thereby improving the quality of washing or upgrading. (Please read the precautions on the back before filling in this page) In addition, the number of ultraviolet light sources required to clean or modify large objects can be reduced to a minimum, which can reduce the manufacturing cost and operating cost of the device. We can reduce device. In particular, by reducing the number of light sources, the possibility of failure is reduced, thereby improving the reliability of the device. Furthermore, in the present invention in which most of the ultraviolet irradiation light sources are divided and arranged, the moving distance of the workpiece can be made extremely small, so that a smaller device can be constructed. DESCRIPTION OF SYMBOLS 1 1 ... lamp device 12... Power supply control unit 13. Cooling unit 14.. Transport unit 15... Transport control unit 20... Dielectric excitation lamp 21 ... double tube 22. .. Discharge gas 23 .. Mesh external electrode Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 24.... Wire-shaped internal electrode 32... Preamplifier 3 3 ... Mixer 35... Main amplifier 36 .. High-frequency high-voltage transformer 101 ... light-transmitting member 102 ... mirror-21- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)