TW482832B - Single crystal pulling-up - Google Patents

Single crystal pulling-up Download PDF

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TW482832B
TW482832B TW87118049A TW87118049A TW482832B TW 482832 B TW482832 B TW 482832B TW 87118049 A TW87118049 A TW 87118049A TW 87118049 A TW87118049 A TW 87118049A TW 482832 B TW482832 B TW 482832B
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crystal
single crystal
resonance frequency
frequency
seed
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TW87118049A
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Chinese (zh)
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Shuji Onoe
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Komatsu Denshi Kinzoku Kk
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Abstract

To provide a method by which the resonance frequency of a pendulum consisting of a pulling-up wire and a growing single crystal can be changed correspondingly to length of the growing single crystal, in single crystal pulling-up by a CZ (Czochralski) method. This method comprises growing a single crystal while changing a seed shaft resonance frequency in such a way that a plot of the seed shaft resonance frequency crosses a plot of single crystal rotation rate. More concretely, at the time of growing a part in the vicinity of the top of the single crystal, the crystal rotation rate S/R is maintained at a high level to reduce the oxygen concentration and, on the other hand, at the time of growing a part in the vicinity of the bottom of the single crystal, the crystal rotation rate is maintained at a low level to prevent the single crystal from being deformed. In the method, initially, the seed shaft resonance frequency is set to a value on a straight line segment drawn from a point of frequency (a) to a point of frequency (b), that is lower than the S/R value and, thereafter, the length of a pendulum consisting of a pulling-up wire and the growing single crystal is shorten to switch the seed shaft resonance frequency to a value on a straight line segment drawn from a point of frequency c to a point of frequency (d), that is higher than the S/R value.

Description

五、發明說明(1) 【發明之技術領域】 ΐίΓΐ關Γ吏用cz法之單結晶之拉引方法。 L ‘知技術】 早結晶矽一般是使用cz法來 晶石夕充填於單結晶製造裝置Jcz=中’將多 編。然後(炼解Λ述…,使形 晶浸泡在熔液中,一邊 去^(Seed holder)中的種 方向或反方向旋轉,_邊拉以=英掛鋼彼此以同 成長到既定之直徑及長度。 aa支持具,使得單結晶矽 單結晶育成時,如第丨〇圖 -— 1而垂下的拉引線1 G和設置在此猎著由拉引線捲曲鼓 η及種晶15,或藉著拉引線此和線端的種晶支持具 擺。藉由在拉引線捲曲m 月成十之單結晶而形成鐘 和種晶15是以旋轉速度S/R而轉,拉引線10 出沿著垂直軸γ之周圍的半徑為 匕日守’種晶15描綠 出沿著上述垂直軸Y之冃二、員 拉引線1 0則以描繪 動。上述鐘擺之每分鐘°之丘的1式而作圓錐鐘擺運 f = 60X1…x(g/I:;二頻率f(/分)可以下式表示 其中g表自由落體之加速度,L (式1) 為了使結晶旋轉數和曰丘 線1 0之有效長度。 63-303888中所揭示之單曰曰点、振頻率不一致,在特開昭 (Μ—,以使拉引室=中’設有風箱 線捲曲部可以自ώ曰政 上方之線捲曲部之間的 幵降’對應於結晶旋轉速度而使線捲曲 482832V. Description of the Invention (1) [Technical Field of the Invention] The method of drawing single crystals using the cz method. L 『Knowledge technology』 Early crystal silicon is generally filled with single crystal manufacturing equipment Jcz = using the cz method. Then (resolve Λ ...), soak the shaped crystals in the melt, while rotating in the seed direction or in the opposite direction, _ side pull with = British hanging steel to grow to the predetermined diameter and The length of the aa support, so that when the single crystal silicon single crystal is grown, as shown in Figure 1-1, the pull-out lead 1 G is set and hunted by the pull-up lead curling drum η and the seed crystal 15, or by The seed crystal support pendulum of the lead wire and the wire end is formed by curling a single crystal of m to ten in the lead wire to form a clock and the seed crystal 15 rotates at a rotation speed of S / R, and the lead wire 10 comes out along a vertical axis. The radius around γ is the dagger's seed 15, and the green is drawn along the vertical axis Y, and the member pulls the lead 10 to move. The pendulum has a cone of 1 ° per minute. The pendulum f = 60X1 ... x (g / I :; the two frequencies f (/ min) can be expressed by the following formula where g is the acceleration of the free-falling body. L (Eq. 1) In order to make the crystal rotation number and the Yau line 1 0 effective Length. The single-point and vibration frequencies disclosed in 63-303888 are inconsistent, and a bellows coil is provided in JP-A Zhao (Μ— Ώ from said unit may drop between the upper line Jian Governing crimped portion 'corresponds to the line speed crystal rotation crimped 482832

上^或下降,而改變拉引線之有效長度,將共振頻率數 权疋為比結晶旋轉速度S/R大,或者將共振頻率數f設定 為比結晶旋轉速度S/R小,而避免拉引線之共振。 【發明欲解決的問題】 日f年來’為了使半導體裝置生產有效率及使良品率向 上,昇,單結晶朝向直徑增大或長度增大而進展,為了配 合這種傾向,單結晶製造裝置的高度也隨之變高。上述習 知特開昭63- 303 88 8中所揭示之單結晶成長裝置中,當此 衣置之總南度變而時,共振頻率數會下降,於是結晶旋轉 速度也不得不下降,致使單結晶之面内電阻或氧濃度的惡 化。再者,當結晶旋轉速度急劇變化時,會引起結晶品質 的劣化,更會有差排現象。當結晶在共振頻率數之附近繼 續旋轉時,由於共振現象而使振幅增大,且有許多缺點發 生。由於共振頻率是由設定之拉引線捲曲鼓1之位置和結 晶長度所決定的,其會漸漸增加,因此不可能設定任意的 結晶旋轉速度而跨越共振頻率數。 針對於上述習知問題,本發明著眼於上述習知的問題 點,其目的為提供一種單結晶拉引方法,依結晶育成長户 而可變化由拉引線和育成早結晶所構成之鐘擺之共振頻$ 〇 【解決問題所用之方法】 為達成上述目的’依據本發明單結晶拉引方法之第1 特徵為,在使用CZ法之單結晶拉引過程中,一邊依單紝 T、、、〇 晶 之成長程度而變化種晶軸共振頻率以跨越結晶旋轉數,Up or down, and change the effective length of the lead wire, set the weight of the resonance frequency to be larger than the crystal rotation speed S / R, or set the resonance frequency number f to be smaller than the crystal rotation speed S / R, and avoid pulling the lead Of resonance. [Problems to be Solved by the Invention] In the past f years, in order to increase the efficiency of semiconductor device production and increase the yield, single crystals have progressed toward an increase in diameter or length. To cope with this tendency, The height also increases. In the single crystal growth device disclosed in the above-mentioned conventional Japanese Patent Application Laid-Open No. 63-303 88 8, when the total south degree of the clothes is changed, the number of resonance frequencies will decrease, so the crystal rotation speed will also have to decrease, causing the single crystal Deterioration of the in-plane resistance or oxygen concentration of the crystal. In addition, when the crystal rotation speed changes abruptly, the quality of the crystal is deteriorated, and furthermore, a differential discharge phenomenon is caused. When the crystal continues to rotate around the resonance frequency, the amplitude increases due to the resonance phenomenon, and many disadvantages occur. Since the resonance frequency is determined by the position and crystal length of the lead wire curling drum 1 set, it will gradually increase, so it is impossible to set an arbitrary crystal rotation speed across the number of resonance frequencies. Aiming at the above-mentioned conventional problems, the present invention focuses on the above-mentioned conventional problems. The purpose of the present invention is to provide a single crystal pulling method, which can change the resonance of the pendulum composed of the lead wire and the early crystal according to the growth of the crystal. Frequency 〇 [Method used to solve the problem] In order to achieve the above-mentioned purpose, the first feature of the single crystal pulling method according to the present invention is that in the single crystal pulling process using the CZ method, one side of the single crystal T ,,, 〇 The degree of crystal growth changes the resonance frequency of the seed axis to cross the number of crystal rotations.

藉由上述構成,可依單結晶 由拉引線捲曲裝置之鼓中心 ,長程度而任意地變化 度所決定的種晶軸共振頻率,二妗:結晶之重心位置之長 一邊可將種晶軸共振頻率設定7 ^結晶旋轉數。藉此, 低許多的值,一邊可拉弓丨單於s〜晶旋轉速度高許多或 ;晶之成長程度而避免種晶二挣2 ’由於-邊可依單 接近,一邊又可以高速之;:=頻率和結晶旋轉速度之 單結晶之面内電阻率或氧 j迷度來進行拉引,所以 再者,依據本;降低。 結晶拉引方法為,在育成=曰引方法之第2特徵,該單 轉速度維持在高速,以降低^ P ^頂部附近時,將結晶旋 將結晶旋轉速度維持在低速,礙X,在育成底部附近時, 方法中,在育成頂部附近時,止單結晶之變形,在此 結晶旋轉速度低,在育成底、種晶轴共振頻率設定成比 設定成比結晶旋轉速度高。-寸近時’將種晶軸共振頻率 藉由上述之構成,^於古 口口 期階段中,種晶軸共振頻率^二,早結晶之頂部附近之初 以很容易使結晶旋轉速度言^疋得比·結晶旋轉速度低,所 晶之底部附近之後期階^ ^^。再者,由於在育成單結 晶旋轉速度高,所以很宏总你種晶軸共振頻率設定得比結 ,單結晶之面内電阻率或 2晶旋轉速度低速化。藉此 再者’依據本發明3:;:得以降低。 述單結晶拉引方法之第J或引方法之第3特徵,在上 A弟2特徵中,係藉由S區間和T區 482832 五、發明說明(4) ' ------ 間而月成忒單結晶,S區間為將種晶軸共振頻與 結晶旋轉速度相差2rnm η卜,τ區a + τ 士又仰左upm以上,1吐間為在不阻礙單結晶之 育成的打間内使種晶軸共振頻率和結晶旋轉速度數交叉。 此單結晶拉引方法是由3區間、τ區間、和其後之s區間所 構ns區間是,為了達到結晶品質,而將種晶軸共振 頻率。没定曰與結晶旋轉速度相差2 rpm以上,以育成單結晶 ,T區間是,雖然種晶軸共振頻率和結晶旋轉速度是交叉 1,但共振現象激化的程度是,在*阻礙單結日日日之育成的 日守間内,使種晶軸共振頻率和結晶旋轉速度交叉,而使種 晶轴共振頻率大幅變化。在τ區間中,由於一旦I劇地變 化結晶旋轉速度,就會弓丨起單結晶之差排化,―因〜此,結晶 旋轉速度之變更應缓慢’而種晶軸共振頻率之切換應快速 〇 【發明之實施形態及實施例】 接著,參照圖式以說明本發明單結晶拉引方法之實施 例。 第1圖顯示使用本發明單結晶拉引方法之單結晶製造 裝置。在此單結晶製造裝置之上端設有真空容器3,此真 空容器3包括設置在藉由螺栓1 3之旋轉而昇降的台架 (carriage)14上之下部固定容器3b,以及在下部固定容器 3b之水平面上旋轉自如地支持的上部旋轉容器3 a。此上部 旋轉容器3a是藉由設置在台架14上之馬達2而在水平面上 旋轉驅動,且上部旋轉容器3 a内容納有拉引線捲曲鼓1。 再者,在下部固定容器3 b的下方,順序連接有伸縮自在的With the above configuration, the seed crystal axis resonance frequency determined by the length of the center of the drum of the lead wire curling device according to the single crystal can be arbitrarily changed. Second: the long side of the center of gravity position of the crystal can resonate the seed axis. The frequency is set to 7 ^ number of crystal rotations. With this, a much lower value, one side can pull bow 丨 single s ~ crystal rotation speed is much higher or; the degree of growth of the crystal to avoid seed crystal two earning 2 'Because-the side can be approached by one side, while one side can be high speed; : = Frequency and crystal rotation speed of the single crystal in-plane resistivity or oxygen j to pull, so again, according to this; reduce. The crystal pulling method is: when the breeding = the second feature of the primer method, the single rotation speed is maintained at a high speed to reduce the ^ P ^ near the top, the crystallization spin is maintained at a low speed, hindering X, during the breeding In the vicinity of the bottom, in the method, near the top, the deformation of the single crystal is stopped. Here, the rotation speed of the crystal is low. When the bottom is grown, the resonance frequency of the seed crystal axis is set to be higher than the rotation speed of the crystal. -Inch is near time 'The seed crystal axis resonance frequency is composed of the above. ^ In the Gukou mouth stage, the seed crystal axis resonance frequency is ^ 2. Near the top of the early crystal, it is easy to make the crystal rotate at the beginning. The rotation speed is lower than that of the crystal, and the later stage is near the bottom of the crystal ^ ^^. In addition, because the single crystal grows at a high rotational speed, the seed crystal axis resonance frequency is set to be lower than that of the crystal, the in-plane resistivity of the single crystal, or the rotational speed of the two crystals is reduced. Hereby, further according to the invention 3:;: is reduced. The third feature of the single crystal pulling method or the third feature of the single pulling method is described in the second feature of the above A by the S section and the T section 482832. 5. Description of the invention (4) '------ and The moon is a single crystal. The S interval is the difference between the seed crystal axis resonance frequency and the crystal rotation speed by 2rnm η, the τ region a + τ is raised above the left by upm, and the 1 tween is in the stall that does not hinder the growth of the single crystal. The resonance frequency of the seed crystal axis and the number of crystal rotation speeds are crossed. This single crystal pulling method is composed of 3 intervals, τ intervals, and the following s intervals. In order to achieve the crystal quality, the seed crystal axis is resonance frequency. It may be said that the difference between the rotation speed of the crystal and the rotation speed of the crystal is more than 2 rpm to produce a single crystal. The T interval is that although the resonance frequency of the seed axis and the rotation speed of the crystal are crossed by 1, the degree of resonance phenomenon is intensified. Within the cultivating sun of the sun, the resonance frequency of the seed axis and the rotation speed of the crystal are crossed, and the resonance frequency of the seed axis is greatly changed. In the τ interval, once the crystal rotation speed is drastically changed, the difference between single crystals will be transformed. “Because of this, the change of the crystal rotation speed should be slow” and the switching of the resonance frequency of the seed crystal axis should be fast. [Embodiments and Examples of the Invention] Next, an embodiment of the single crystal pulling method of the present invention will be described with reference to the drawings. Fig. 1 shows a single crystal manufacturing apparatus using the single crystal pulling method of the present invention. A vacuum container 3 is provided at the upper end of the single crystal manufacturing apparatus. The vacuum container 3 includes a fixed container 3b provided above and below a carriage 14 that is raised and lowered by rotation of a bolt 13 and a fixed container 3b at a lower portion. The upper rotating container 3 a which is rotatably supported on the horizontal plane. The upper rotary container 3a is driven to rotate on a horizontal plane by a motor 2 provided on a stand 14. The upper rotary container 3a contains a lead wire curling drum 1. Furthermore, under the lower fixed container 3 b, telescopically flexible ones are connected in order.

482832 五、發明說明(5) 風箱4和拉引宮5b 4 8。將裝填於坩鍋内之原至』:f 内設有坩鍋7和加熱器 9,將藉著種晶支持且n、’、夕日日ϋ…器8中加熱而得熔液 曰、-治—, 克持具11而設置在拉引線之下端處的插 日日次泡在上述熔液9中卜細處的種 結晶12。再者,_由^精由捲曲拉引線10而育成單 直空容哭Γφ品/螺栓13之旋轉而昇降之台架14設置於 自由昇降。 〜工谷器3可在風箱4之伸縮限度内 在此’結晶成長速度V 可以V -V丄ν * -拉引線10之捲曲速度,ν表\苹SL之二t ’其中^表 德办^ Γ 拉引線捲曲鼓1之移動前位置DP1、移動 以卜(Λ,%上ΐ捲曲鼓1之移動所需時m之間的關係可 程式中丨用作i:軸= 悝日日釉共振頻率變更時之控制程式。 苐2至第5圖表示⑸圖所示單結晶製造裝置之 別的變化。第2圖顯示風箱4伸長到最大限度,種 H泡在^液中的狀態。此時鐘擺的長度u是從拉引線捲 2政1之中心到溶液9之表面的距離,具體例為3〇5〇_。再 :,風箱4之伸縮範圍為1 00 0mm。纟此狀態下拉引線1〇之 共振頻率f( /分)可以下式表示 f = 60 XI /2 7Γ X (9. 8/3. 05)1/2 = 17. i (式2) 第3圖為風箱伸長至最大限度之狀態下,拉引 >直筒部 長度1 0 00mm之單結晶12時的示意圖。單結晶12之重心位置 G在直筒部上端之下500mm的位置上,鐘擺長度L2、亦即從 拉引線捲曲鼓1之中心到上述重心位置6的長度為22 5〇mm,482832 V. Description of the invention (5) Bellows 4 and pull-in palace 5b 48. The original to be filled in the crucible ": f is provided with a crucible 7 and a heater 9, which will be heated by the seed crystal support n, ', evening sun and the like ... to obtain a melt, -The seed crystal 12 that holds the holder 11 and is set at the lower end of the pull wire and soaks in the molten metal 9 at a time. In addition, the frame 14 raised by the pull-up of the lead wire 10 is formed by a straight space, and the stand 14 that is lifted and lowered by the rotation of the φφ / bolt 13 is provided for free lift. ~ The industrial valley device 3 can be within the expansion and contraction limit of the bellows 4 'Crystal growth speed V can V -V 丄 ν *-Pulling speed of the lead 10, ν table \ Apple SL bis t' Among them ^ 表 德 办 ^ Γ Pull the lead position of the curling drum 1 before the movement DP1, the movement of the coil (Λ,%). The relationship between m and the time required for the movement of the curling drum 1 can be used in the formula. 丨 Used as i: axis = the next day glaze resonance frequency Control program at the time of change. Figures 2 to 5 show the other changes of the single crystal manufacturing equipment shown in Figure 2. Figure 2 shows the state where the bellows 4 is extended to the maximum, and the state of H is soaked in the liquid. At this time The length u of the pendulum is the distance from the center of the lead wire 2 and the surface of the solution 9 to the surface of the solution 9, a specific example is 3005_. Furthermore: the telescopic range of the bellows 4 is 1 00 mm. In this state, the lead wire is pulled down The resonance frequency f (/ min) of 10 can be expressed by the following formula: f = 60 XI / 2 7Γ X (9. 8/3. 05) 1/2 = 17. i (equation 2) Figure 3 shows the bellows extension to In the maximum state, a schematic diagram of pulling a single crystal 12 with a length of 10,000 mm in the straight section. The center of gravity position G of the single crystal 12 is 500 mm below the upper end of the straight section, and the length of the pendulum L2, that is, The pull wire crimped center drum 1 to the length of the gravity center position is 22 5〇mm 6,

482832482832

五、發明說明(6) 在此狀態下之拉引線1 0之共振頻率數f (/分)可以下式表示 f = 6 0 X 1 /2 7Γ X (9. 8/2. 25)1/2 = 19. 9 ,二、不 (式3) 總之,從種晶浸泡在熔液中的時間開始,到留处a食> μ Ν早結晶育成終 了時這段時間,種晶軸共振頻率數f是在17· i至19 9之間 變化的。 再者’第4圖顯示風箱之長度壓縮到最小時的狀態下 ’種晶浸泡在熔液中的狀態。此時鐘擺的長度L 3是從拉引 線捲曲鼓1之中心到熔液9之表面的距離,由於風箱之伸縮 範圍為1 0 00mm,所以拉引線10之共振頻率f( /分)可以下犬 表示 刀β 式 (式4)V. Description of the invention (6) In this state, the resonance frequency number f (/ min) of the lead wire 10 can be expressed by the following formula: f = 6 0 X 1/2 7Γ X (9. 8/2. 25) 1 / 2 = 19.9, two, no (Equation 3) In short, from the time when the seed crystals are immersed in the melt to the food at the place where the seed crystals are μ μN, the resonance frequency of the seed crystal axis The number f varies between 17 · i and 19 9. Furthermore, FIG. 4 shows a state where the length of the bellows is compressed to a minimum, and the state where the seed crystals are immersed in the melt. The length L 3 of this pendulum is the distance from the center of the lead wire curling drum 1 to the surface of the melt 9. Since the bellows has a telescopic range of 100 mm, the resonance frequency f (/ min) of the lead wire 10 can be lowered. Dog expression knife β form (form 4)

f = 60 xl/2 7Γ Χ(9· 8/2· 0 5 )1/2 = 2 0· 9 苐5圖為風相之長度壓縮到最小的狀態下,拉引直汽 部長度1 0 0 0mm之單結晶1 2時的示意圖。單結晶丨2之重心位 置G在直筒部上端之下50 0mm的位置上,鐘擺長度L4、亦即 從拉引線捲曲鼓1之中心到上述重心位置G的長度為125〇_ ’比第3圖所示之L 2短1 0 0 0mm。因此,拉引線1〇之共振頻 率數f( /分)可以下式表示 ' f-60 xl/2 π x(9. 8/1. 25)1/2 = 26. 7 (式5) 總之’從種晶浸泡在熔液中的時間開始,到單結晶育成終f = 60 xl / 2 7Γ χ (9 · 8/2 · 0 5) 1/2 = 2 0 · 9 苐 5 The figure shows the length of the wind phase compressed to the minimum, and the length of the straightened steam section is 1 0 0 A schematic diagram of a single crystal of 0 mm at 12 hours. The center of gravity position G of the single crystal 2 is 50 mm below the upper end of the straight portion, and the length of the pendulum L4, that is, the length from the center of the lead wire curling drum 1 to the center of gravity position G is 125 °. The L 2 shown is 100 mm shorter. Therefore, the resonance frequency f (/ min) of the lead wire 10 can be expressed by the following formula: 'f-60 xl / 2 π x (9. 8/1. 25) 1/2 = 26.7 (Eq. 5) In short' From the time when the seed crystals are immersed in the melt to the end of the single crystal incubation

了時這段時間,種晶軸共振頻率數f是在2〇· 9至26· 7之 變化的。 ,著,對於使用具有上述共振頻率數之單結晶拉引裝 置之單結晶拉引方法的實施例加以說明。 & 第6圖顯示第1實施例之單結晶拉引方法,其主要目的At this time, the frequency f of the seed axis resonance frequency changes between 20.9 and 26.7. Now, an embodiment of a single crystal pulling method using a single crystal pulling device having the above-mentioned resonance frequency number will be described. & Figure 6 shows the single crystal pulling method of the first embodiment, the main purpose of which

第9頁 482832 五、發明說明(7) 為減低晶圓面内電阻率之變化。曰 以點線表示,風箱伸長時,在式2種/轴共振頻率數(/分) 示之頻率數,之間變化/亦上式匕斤;^頻率數a到式3所 镫π 在式4所不之頻率數c到式5所示之頻iΗ„ 變化,亦即20. 9至26. 7之間變化。斤/曰之女頻率數d之間 大限声夕处的π μ 4 社風相4伸長到最 之育!晶浸泡在熔液9中,開始單結晶12Page 9 482832 V. Description of the invention (7) In order to reduce the change of resistivity in the wafer surface. It is indicated by dotted lines. When the bellows is extended, the frequency number shown in the formula 2 types / shaft resonance frequency (/ min) varies between the above formulas. ^ The frequency number a to the formula 3 镫 π in The frequency number c from Equation 4 to the frequency iΗ „shown in Equation 5 varies, that is, between 29.9 and 26.7. Π μ 4 at the limit of the sound frequency between the female frequency number d and the female frequency number d. Shefeng phase 4 is extended to the most fertile! Crystals are immersed in melt 9 and begin to crystallize 12

-直唯持S、 /成開始到終了,結晶旋轉速度S/R ^ T t ;P;# ; a! :b ^3〇% , msi 數a變化到頻率教h &種日曰軸共振頻率數維持從頻率 區間’使風箱之長度壓;到:,Γ;ΐ=Λ*進入τ 釗怂相漆奴你儿, 裡日日轴共振頻率數切換 i二:數C,到頻率數d之直線。此時,台架之移動速 ΐν「-(ν ^Λ’/U拉引線之捲曲速度控制在5分鐘内 間)種阳軸共振頻率數上昇至由20· 9變化至”,7 。雖然S/R時常維持在2〇rpm,但除了丁區間之外, 镅-Straight from the beginning to the end, the crystal rotation speed S / R ^ T t; P; #; a!: B ^ 30%, msi number a changes to the frequency h & The frequency number is maintained from the frequency interval 'to make the length of the bellows; to :, Γ; ΐ = Λ * enter τ Zhao advises the painter, you switch the resonance frequency of the Japanese-Japanese axis i: number C, to the frequency number The straight line of d. At this time, the moving speed of the gantry 「ν"-(ν ^ Λ '/ U lead wire's curling speed is controlled within 5 minutes) The number of positive resonance frequencies of the species rises from 20.9 to "7". Although S / R is often maintained at 20 rpm, except for the D interval, 镅

率數總是與種晶軸共振頻率相隔2 rp m以上。再,铯# 轉速度C/R,在固化率5〇%以内為8rpm,之^ 和C/R的比值維持在2.〇倍以上。 S/R 直同部長度為l〇〇〇mm之單結晶的育成終了後驅 =1 3,以巧台架1 4再度上昇,將風箱4伸長到最大限度。’、 藉此,將單結晶1 2容納於拉引室5内,從拉引室5 i 侧部分後,移出單結晶1 2。 八i 五、發明說明(8) ____ 第7圖顯示比較依第1實施例之拉引方法 及:習知技術所得之單結晶,兩者電阻率之面::、:二曰以 =之位置上使單結晶育成,由於頂部 幸^振頻率數為171,底部育成時之晶種軸共 S曰種 .,所以結晶旋轉速度S/R成為15rpm。再者,Χ ’门數為 〜9 0 %是舍社ρ 〇口 者’固化率〇 圍限〜+括 日日之肩部到尾部,而晶圓之評價針象狄 H疋在固化率10~80%的範圍内。 $對象祀 較小的電阻率面内偏差。 孜忻所侍者有 第8圖顯示第2實施例之單結晶拉引方 減低頂部附近的惫嘈谇 a猫4主要目的為 例一揭Γ 度。晶種軸共振頻率(/分)和第1每# 例樣,在風箱伸長時,從式2戶斤*之頻率二弟1广 不之頻率b,在風箱壓縮時, 'j式3所 所示之頻率d。在單紝曰女成4工 不之頻率C變化到式5 1 〇 , ri , 早日日月成時’驅動如第1圖所干之碳士入 13,以使台架“上昇,在風 广所不之螺栓 ,將種晶浸泡在溶液9中,開始單的狀態下 晶之育成開始到固化率35%之門早二阳12之月成。從單結 在23咖,之後慢慢下降到18re ’,''m速度S/R是維持 持找,。再者,在固 '、%=2終了都維 區間)下,當風箱#真斤 逐4(U為止之弟1S區間(S1 數a變化到頻率數b的/程。之^共振頻率數維持從頻率 度壓縮到最小,種晶轴共振H區間’使風箱4之長 到頻率數d之直線。此捭,A加數切換到從頻率數c變化 ' 〇木之移動速度Vc = -20〇mm/分 482832 發明說明(9) — ’=晶拉引線之捲曲速度控制在5分鐘内為Vw,=(Vw+2〇〇_ )/分。上述切換後變為第2之S區間(S2區間),種晶轴共振 頻率數。上昇至由20· 9變化至26· 7的直線。在本實施例中, ,、了 T區間之外,結晶旋轉速度g / R也是和共振頻率相隔2 rpm以上。再者,坩鍋旋轉速度C/R在固化率^⑽之 ,之後為8rpm。 疋5 第9圖顯示比較依第2實施例之拉引方法所得單处曰 及依習知技術所得之單結m z、、、。曰曰以 置上使U =,在和第2圖相當之拉引線捲曲鼓1之位 使早、、、口日日月成,由於頂部育成時 為17 · 1,底部吉#吐今曰從* 日日裡神兴振頻率數 晶旋轉速度s/κΛ% 振頻帛數為19.9 ’所以結 率10〜8n的範圍;如同;對象範圍限定在固化 拉引方法所得之單結晶比匕去實施,之 ,特別是在固化率i 〜2 〇 % n n于有較低的氧濃度 更多。 2〇/°之頂部附近,氧濃度低於習知者 【發明之效果】 如上所述,藉由本發明, 昇降,藉此,在單έ士曰食☆、士 依而要而使拉引線捲曲鼓 成單結晶之重心更”述鼓之中心到育 此很容易將單結晶育成時之二ς 共振頻率,因 共振頻率偏離至少2rpm以上二擇為比種晶轴 望品質長片的單結晶。 而很奋易得到具有所希 482832 五 置 長 長 縮 縮 率 圖 率 發明說明(ίο) 【圖式之簡單說明】 第1圖為使用本發明單結晶拉引方法之單結晶製造裝 的縱剖面示意圖。 第2圖表示第1圖所示之單結晶製造裝置之風箱最大伸 時之工程進行中所伴隨之鐘擺長度的變化。 第3圖表示第1圖所示之單結晶製造裝置之風箱最大伸 時之工程進行中所伴隨之鐘擺長度的變化。 第4圖表示第1圖所示之單結晶製造裝置之風箱最小壓 時之工程進行中所伴隨之鐘擺長度的變化。 第5圖表示第1圖所示之單結晶製造裝置之風箱最小壓 時之工程進行中所伴隨之鐘擺長度的變化。 第6圖顯示第1實施例之單結晶拉引中,種晶軸共振頻 、結晶旋轉速度、坩鍋旋轉速度之變化。 第7圖為第1實施例和習知例之電阻率面内偏差的比較 〇 第8圖顯示第2實施例之單結晶拉引中,種晶軸共振頻 、結晶旋轉速度、掛锅旋轉速度之變化。 第9圖為第2實施例和習知例的單結晶之氧濃度的比較 圖 第1 0圖為結晶拉引線和種晶中所構成之鐘擺運動的說 明 圖 符號之說明】 1 拉引線捲曲鼓 3 真空容器The rate is always separated by more than 2 rp m from the resonance frequency of the seed axis. In addition, the cesium # rotation speed C / R is 8 rpm within a curing rate of 50%, and the ratio of ^ and C / R is maintained at more than 2.0 times. The single crystal with a length of 1000mm in the S / R straight part was rear-wheeled at the end of the growth = 13 and raised again with the smart table 14 to extend the bellows 4 to the maximum. Then, the single crystal 12 is accommodated in the drawing chamber 5 and the single crystal 12 is removed from the side portion of the drawing chamber 5 i. VIII. V. Description of the invention (8) ____ Figure 7 shows the comparison of the pulling method according to the first embodiment and: the single crystal obtained by the conventional technology, the resistivity of the two ::,: the position of the two = The single crystal is grown on the top. Since the top frequency is 171 and the seed axis at the bottom is altogether S, the crystal rotation speed S / R becomes 15 rpm. In addition, the number of X 'doors is ~ 90% is the curing rate of the house ρ 〇 mouth' curing rate 0 margin ~ + the shoulder to the end of the day, and the evaluation needle image of the wafer is at a curing rate of 10 In the range of ~ 80%. $ Object Reduction Small in-plane resistivity deviation. Figure 8 shows the single crystal pulling method of the second embodiment to reduce fatigue and noise near the top. The main purpose of the cat 4 is to expose the degree. The seed axis resonance frequency (/ min) and the first ## example, when the bellows is extended, the frequency from the formula 2 family kg * the frequency of the second brother 1 wide frequency b, when the bellows is compressed, the 'j formula 3 The frequency d is shown. In the case of Dan Cheng, the frequency C of the female laborer changed to the formula 5 1 〇, ri. As soon as the sun and the moon were formed, the carbon driver 13 as shown in Fig. 1 was driven, so that the platform would "rise up, For all the bolts, immerse the seed crystals in solution 9 and start the growth of the crystals in the single state. The solidification rate will be 35%. The early two suns will be 12 months old. From the single knot in 23 coffee, then slowly drop to 18re ',' 'm speed S / R is maintained and maintained. Furthermore, under the solid',% = 2 end Duwei interval), when the wind box # 真 caten 4 (brothers up to U 1S interval (S1 The number a changes to the frequency of the number b. The resonance frequency number is reduced from the frequency to the minimum. The seed crystal resonance H interval 'makes the length of the bellows 4 to the straight line of the frequency number d. Here, A adds Switch to the change from the frequency c. 〇 Wood's moving speed Vc = -20〇mm / min 482832 Invention description (9) — '= The curl speed of the crystal pull wire is controlled to Vw within 5 minutes, = (Vw + 2〇 〇_) / min. After the above switching, it becomes the second S section (S2 section), the number of seed axis resonance frequencies. It rises to a straight line that changes from 20 · 9 to 26 · 7. In this embodiment, ,,, Out of T interval The crystal rotation speed g / R is also separated from the resonance frequency by more than 2 rpm. Furthermore, the crucible rotation speed C / R is at the curing rate ^ ⑽, and then 8 rpm. 疋 5 Figure 9 shows a comparison according to the second embodiment. The single point obtained by the drawing method and the single knot mz ,,, etc. obtained according to the conventional technology are set to U =, and the lead wire curling drum 1 corresponding to FIG. Sun, moon and moon, since the top is 17 · 1, the bottom is ## 吐 今 从 from * Riri, the frequency of singular crystal rotation speed s / κΛ%, the frequency of vibration is 19.9 ', so the knot rate is 10 ~ 8n The range of the object is the same as that of the object. The range of the object is limited to the implementation of the single crystal obtained by the solidification and drawing method, and more specifically, the curing rate i ~ 20% nn is more in the presence of a lower oxygen concentration. Near the top, the oxygen concentration is lower than that of a conventional person. [Effect of the invention] As mentioned above, with the present invention, ascending and descending, by this way, the lead wire can be curled into a single crystal when it is required to be eaten ☆ The center of gravity is more "The center of this drum is very easy to grow single crystals. The resonance frequency, because of the resonance frequency Above at least 2 rpm, the second choice is a single crystal with a longer quality than the seed crystal axis. And it is very easy to get the 482832 five-set long shrinkage rate. Fig. 1 is a schematic longitudinal sectional view of a single crystal manufacturing equipment using the single crystal pulling method of the present invention. Fig. 2 shows the length of the pendulum accompanying the progress of the project when the bellows of the single crystal manufacturing apparatus shown in Fig. 1 is extended at the maximum. Fig. 3 shows the change in the length of the pendulum accompanying the progress of the project when the bellows of the single crystal manufacturing apparatus shown in Fig. 1 is at its maximum extension. Fig. 4 shows the change in the length of the pendulum accompanying the progress of the process at the minimum pressure of the bellows of the single crystal manufacturing apparatus shown in Fig. 1. Fig. 5 shows the change in the length of the pendulum accompanying the progress of the process at the minimum pressure of the bellows of the single crystal manufacturing apparatus shown in Fig. 1. FIG. 6 shows changes in the resonance frequency of the seed crystal axis, the rotation speed of the crystal, and the rotation speed of the crucible in the single crystal pulling in the first embodiment. Fig. 7 is a comparison of the in-plane resistivity deviation between the first embodiment and the conventional example. Fig. 8 shows the seed crystal resonance frequency, crystal rotation speed, and pan rotation speed in the single crystal pull of the second embodiment. The change. Fig. 9 is a comparison diagram of the oxygen concentration of single crystals in the second embodiment and the conventional example. Fig. 10 is an explanation of the pendulum movement of the crystal pulling lead and the seed crystal. 3 Vacuum container

第13頁 482832 五、發明說明(π) 4風箱 5拉引室 6 主室 9 熔液 10 拉引線 12 13 14 15 單結晶 螺栓 台架 種晶 <1Page 13 482832 V. Description of the invention (π) 4 Bellows 5 Pull-out chamber 6 Main chamber 9 Melt 10 Pull-lead 12 13 14 15 Single crystal Bolt Bench Seed crystal < 1

第14頁Page 14

Claims (1)

482832482832 、申請專利範圍 1 · 一種單結晶拉引方法,包括在使用cz法 引過程中,一邊依單結晶之成長程度而變化種晶:、、、吉晶杈 率以跨越結晶旋轉數,一邊育成單結晶(丨2)。9共振頰 2 ·如申請專利範圍第1項所述之單結晶拉弓丨 中該單結晶拉引方法為,在育成單結晶(1 2 )之頂部’其 ’將結晶旋轉速度維持在高速,以降低氧濃度,^近時 部附近時,將結晶旋轉速度維持在低速,以防止抑二f底 12)之變形’其特徵在於在此方法中,在育成頂部^附^曰曰日^ ’將種晶軸共振頻率設定成比結晶旋轉速度低,在女$ 部附近時,將種晶轴共振頻率設定成比結晶旋轉速度高。一 3·如申請專利範圍第1或第2項所述之單結晶拉引=法 ,其中係藉由S區間和T區間而育成該單結晶(丨2 ),s區間 為將種晶軸共振頻率設定成與結晶旋轉速度相差2rpm以上 ’ T區間為在不阻礙單結晶(1 2)之育成的時間内使種晶軸 共振頻率和結晶旋轉速度數交叉。Scope of patent application1. A single crystal pulling method, including the use of the cz method, while changing the seed crystal according to the degree of growth of the single crystal: ,,, and the rate of crystal branches to cross the number of crystal rotations, while growing a single crystal Crystal (丨 2). 9 Resonant cheek 2 · According to the single crystal pulling bow described in item 1 of the scope of the patent application, the single crystal pulling method is to maintain the crystal rotation speed at a high speed on the top of the grown single crystal (1 2), In order to reduce the oxygen concentration, the crystal rotation speed is maintained at a low speed in the vicinity of the near-time portion to prevent the deformation of the second base 12). It is characterized in that in this method, the top of the breeding is ^ attached ^^^^ The seed crystal axis resonance frequency is set to be lower than the crystal rotation speed, and in the vicinity of the female part, the seed crystal axis resonance frequency is set to be higher than the crystal rotation speed. 1 · The single crystal pulling method as described in item 1 or 2 of the scope of the patent application, wherein the single crystal is bred by the S interval and the T interval (丨 2), and the s interval is the resonance of the seed crystal axis The frequency is set to differ from the crystal rotation speed by more than 2 rpm. The T interval is to cross the resonance frequency of the seed crystal axis and the number of crystal rotation speeds within a time that does not hinder the growth of the single crystal (12).
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