A7 4 6 9 713 _____Β7 五、發明說明（1 ) 技術領域 -本發明有關於使用帶電粒子束，來進行試料的觀察和 加工等處理之帶電粒子束裝置。 背景技術 自以往即使用來自電子源和離子源的帶電粒子束，來 進行試料的觀察、微細加工等處埋之帶電粒子束裝置，是 被應用在半導體不良的解析處理、製造製程的監視處理、 加工處理等。 第2圖係帶電粒子束裝置之一種聚焦離子束裝置之一 般的槪略構成圖。於第2圖中，聚焦離子束裝置係利用離 子源20 1 '電容透鏡202 '射束熄滅電極203、可 動光圈204、散光校正電極205、對物透鏡206、 掃描電極207、2次電子檢測器208、氣鎗209、 試料載置台2 1 0所構成的。 將來自離.子源2 0〜1的離子加以聚焦的離子束，對載 置在試料載置台2 1 0的試料2 1 1做，掃描，將藉此所產 生的2次電子，以2次電子檢測器2 0 8做檢測。藉此， 收集處理試料2 1 1的影像（S I Μ像）數據，來觀察試 料2 1 1，進行試料2 1 1的不良解析處理等。此外，將 所聚焦的離子束，照射到試料2 1 1，藉此可進行試料 2 1 1的蝕刻加工處理，或者可利用來自氣鎗2 0 9的氣 體，進行沉積處理。 第3圖係習知聚焦離子束裝置的方塊圖。第3圖中， ‘紙張尺度適用中國國家標準（CNS)A4規格（2】0 X 297公龙) I ---ΙΊι''ι-ρ^------ -- 訂 ------線 (請先Μ讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 A7 469 71 3 __B7 _ 五、發明說明（2 ) 聚焦離子束裝置係具備有進行試料觀察或加工等處理之際 的-指示之输入或所收集的數據之解析處理，或是進行試料 的圖像顯示等之主電腦3 0 1 ’或是作爲處理要素，來控 制第2圖的電容透鏡202、射束熄滅電極203、可動 光圈204 '散光校正電極205、對物透鏡206、掃 描電極2 0 7，藉此’具備有可利用電界來控制離子束， 並控制聚焦和位之光學系控制部3 0 2、利用操作機構或 壓電元件進行配設在離子源載置台（圖未表示）的離子源 2 1 0的定軸和可動光圈2 0 4的定位之光軸控制部 3 0 3、將配設有試料的試料室成爲真空環境之真空排氣 部3 0 4、載置試料並移動到電子束的照射位置之試料載 置台3 0 5、將試料2 1 1搬運到試料載置台3 0 5之試 料搬送裝置3 0 6。前述各處理要素具備有中央處理裝置 (CPU)。 針對如以上所述的構成之聚焦電子束裝置，舉一案例 ’來說明將試.料搬入試.料室’並設定在預定位置時的動作 ’首先，操作者’將設定試料的主要指示，輸入主電腦 3 0 1。 主電腦3 0 1則回應前述指示輸入，將指示信號輸出 至真空排氣部3 0 4。真空排氣部3 〇 4則回應來自主電 腦3 0 1的指示信號1將預備試料室成爲大氣環境，打開 預備試料室的門。 其次’主電腦3 0 1完成真空排氣部3 〇 4的前述處 理時’即將指示.信號輸出至試料搬送裝置3 〇 6，試料搬 II ^-----—^nl> ---1--I ^-»1----- 1線 I. <靖先閱讀背面之注意事項再填寫本頁} 經濟部智慧財產局員工消費合作社印製 -5- 經濟部智慧財產局員工消費合作社印製 4 6 9 7 1 3 A7 B7 五、發明說明（3 ) 送裝置3 0 6則回應前述指示信號，將試料搬入預備試料 室-主電腦3 0 1完成試料搬送裝置3 0 6的前述處理時 ’即將指示信號輸出至真空排氣部3 0 4，真空排氣部 3 0 4則回應前述指示信號，將預備試料室做真空排氣。 其次，主電腦3 0 1完成前述真空排氣部3 0 4的處 理時，即將指示信號輸出至光學系控制部3 〇 2，光學系 控制部3 0 2則回應前述指示信號，而爲防止隨著試料室 內的光學系控制用高電壓真空劣化放電的緣故，因此將前 述高電壓控制在0 F F狀態。 其次，主電腦3 0 1完成光學系控制部3 〇 2的前述 處理時，即將指示信號輸出至真空排氣部3 〇 4 ,真空排 氣部3 0 4則回應前述指不信號，打開試料室與預備試料 室間的閥門，藉此即可讓試料室與預備試料室連接。 其次，主電腦3 0 1完成真空排氣部3 〇 4的前述處 理時’即狀指.示.信號輸‘出至試料載置台3 〇 5，試料載g 台3 0 5則回應前述指示信號，而移動到試料的交付位置 〇 其次，主電腦3 0 1完成試料載置台3 〇 5的前述處 理時’即將指示信輸出至試料搬送裝置3 〇 6，試@ 裝置3 〇 6則回應前述指示信號，使試料從預備試料室移 動到試料至的試料載置台3 0 5。 其次，主電腦3 0 1完成試枓搬送裝置3 〇 處理時’即將指示信號輸出至試料載置台3 〇 5，試w^ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）-6 - — — — —ΙΊΙΊ—^iI — — - ---I--- I I —--I-- (請先H讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 A7 _____B7__ 五、發明說明（4 ) 置台3 Ο 5則回應前述指示信號來移動’藉此讓試料移動 到-離子束的照射位置。 - 其次，主電腦3 Ο 1完成試料載置台3 0 5的前述處 理時，即將指示信號輸出至真空排氣部3 0 4，真空排氣 部3 0 4則回應前述指示信號’來關閉試料至與預備試料 室的閥門，藉此讓試料室與預備試料室分開。^ 最後，主電腦3 Ο 1完成真空排氣部3 0 4的前述處 理時，即將指示信號輸出至光學系控制部3 0 2，光學系 控制部3 0 2則回應前述指示信號，恢復試料室內的光學 系控制用高電壓，結束前述一連的試料設定處理。 由於前述各處理要素的動作’是以主電腦3 Ο 1做集 中控制，因此，在主電腦3 Ο 1進行處理試料的圖像數據 的場合等之負載大的處理情形下1無法進行各處理要素的 控制，會有所謂令處理觀察和加工等能力劣化的問題。 此外，不光是聚焦離子束裝置，就連使用電子顯微鏡 等之帶電粒子.束·的帶電*粒子束裝置也有前述同樣的帛題。 本發明之課題在於提供一藉由輕主電腦負荷而能圓滑 進行處理之帶電粒子束裝置》 發明之揭示 本發明之帶電粒子束裝置，其特徵爲具備有：回應指 不號’而輸出處理開始fg號之主電腦、產生作爲照射試 料的帶電粒子束之帶電粒子束源、針對前述試料來回應前 述處理開始信號，進行處理之複數個處理要素，前述主電 本紙張尺度適用中国國家標準（CNS)A4規格（210 X 297公釐） ·!—.— .！-(1 I ! I — 誦 I I — f 訂.— --- ί靖先閱讀背面之注意事項再填寫本頁) 4 69 71 3 A7 B7 五、發明說明（5 ) 腦及前述各處理要素可做L AN連接。主電腦及各處理要 素-可LAN連接，進行針對試料的分散處理。 一 <請先閱讀背面之注意事項再填寫本頁) 作爲前述處理要素，能以具備有進行前述帶電粒子束 的調整聚焦之光學系控制部、和將試料室控制在真空環境 之真空排氣部所構成，甚至，也能以具備有進行可動光圈 定位的光軸控制部、和載置著前述試料之試料載置台、和 將前述試料搬送到前述試料載置台之試料搬送裝置所構成 此外，也能以傳送接收在前述主電腦及前述各構成要 素間被密碼化的信號，同時連接到其他的L A N所構成。 進而，前述帶電粒子束裝置可作爲聚焦離子束裝置和 掃描電子顯微鏡。 用以實施本發明之最佳形態 第1圖係有關本發明之實施形態的帶電粒子束裝置之 方塊圖，表示.聚.焦離子.束裝置的例子。一 經濟部智慧財產局員工消費合作社印製 於第1圖中，作爲帶電粒子束裝置的聚焦離子束裝置 (F I B ) 1 〇 1係配設在離開工廠的測定室，利用 TCP/IP ( Transmission Control Protocol / Internet Protocol )而被LAN連接在作爲另一 LAN的工廠之 LAN ( Local Area Network ) 10 9。 聚焦離子束裝置101係具備有進行試料観察或加工 等處理之際的指示之輸入或所收集的數據之解析處理，或 是進行試料的圖像顯示等之主電腦1 0 2，或是作爲處理 本紙張尺度適用中國國家標準（CNS)A4規格<210 X 297公釐）-8 - A7 B7 9 71 3 469 71 3 五、發明說明（6 ) 要素’來控制第2圖的電容透鏡2 0 2、射束熄滅電極 2-0 3、可動光圈204 '散光校正電極205、對物透 鏡206、掃描電極207，藉此，具備有可利用電界來 控制離子束，並控制聚焦和定位之光學系控制部1 〇 3 ' 利用操作機構等進行可動光圈2 0 4的定位之光軸控制部 1 0 4、將配設有試料的試料室成爲真空環境之真空排氣 部1 0 5、載置試料並移動到電子束的照射位置之試料載 置台106、將試料搬運到試料載置台〇6之試料搬送 裝置1 0 7。而作爲前述處理要素必須具有將配設有光學 系控制部1 0 3及試料的試料室，成爲真空環境之真空排 氣部1 0 5的構成要素，但其他的處理要素，可隨時對應 需要來應用。又，光軸控制部1〇 4對應需求，而利用操 作機構和壓電元件，也能進行配設在離子源載置台（圖未 表不）的離子源2 0 1的定軸。 各處理要素係具有CPU，同時被連接在母線1〇8 ，使用 TCP./. IP，·並依據 IEEE802 . 3 的 C S M A / C D ( Carrier Sense Multiple Access with Collision Detection )方式來做L A N連接。對於在主電 腦1 0 2及前述各處理要素1 〇 3至1 0 7間所傳送接收 的信號’以包括I D碼的方式構成的，藉由判別包括母線 1 ◦ 8上的信號之前述I D碼，來判別是否爲自行分配的 信號。此外，如後所述，通過母線1 〇 8所傳送接收的信 號，則是以只能在主電腦1 0 2及前述各處理要表1 0 3 至1 0 7間判讀的方式被密碼化。 本紙張尺度適用中國國家標準<CNS>A4規格（210x 297公釐〉 -9 - ----!--Ί Mi I I I I ---II--I III — — ! <請先閲躓背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 4 6 9 71 3 A7 B7 五、發明說明（7 ) (請先閱讀背面之注意事項再填寫本頁) 如以上所構成的聚焦離子束裝置的其中一例，來說明 將-試料搬入試料室並設定在預定位置的場合之動作時t首 先’操作者要將設定試料的主要指示信號，輸入到主電腦 1 0 2 ^主電腦3 0 1則回應前述指示輸入，將包括真空 排氣部1 0 5的I D碼之指示信號，輸出至母線1 〇 8。 真空排氣部1 0 5接收到來自於傳送到母線1 〇 8的 主電腦3 0 1的指示信號，來判別包括該信號的I d碼， 辨識自行分配的指示信號，對此做一回應，將預備試料室 成爲大氣環境，而打開預備試料室的門。 真空排氣部1 〇 5完成前述處理時，爲了將處理移行至擔 任下一處理步驟之試料搬送裝置1 〇 7，而將包括試料搬 送裝置107的ID碼之信號，輸出至母線1〇8。 試料搬送裝置1 0 7則接收來自於傳送到母線1 〇 8 的真空排氣部1 0 5的指示信號，來判別包括該信號的 I D碼，辨識自行分配的指示信號，對此做一回應，將試 料搬入預備試料室。 經濟部智慧財產局員工消費合作社印製 試料搬送裝置1 0 7完成前述處理時，即將包括擔任 下一處理步驟的真空排氣部1 〇 5的I D碼之信號，輸出 至母線1 0 8。 以後，各構成要素則與上述同樣的，利用1 D碼來判 別是否母線1 0 8的信號爲自行分配的信號，若爲自行分 配的信號，即進行處理，處理完時，即將包括擔任下一步 驟的構成要素的I D碼之信號，輸出至母線1 0 8。 亦即，試料搬送裝置1 0 7處理完，並將包括真空排 本紙張尺度適用中國國家標準（CNS)A4規格（210 * 297公釐） -10- 4 69 713 A7 ______B7___ 五、發明說明（8 ) (請先閲讀背面之注f項再填寫本頁) 氣部1 0 5的I D碼之信號，輸出至母線1 0 8時，真空 排-氣部1 0 5即回應前述信號，於預備試料室做真空排氣 ，前述處理完成時，即將包括光學系控制部1 0 3的I D 碼之信號，輸出至母線1 0 8。 光學系控制部1 0 3接收到來自真空排氣部1 〇 5的 信號，並爲了防止試料室內的光學控制用高電壓隨著真空 劣化而放電，故將前述高電壓控制處理在0 F F狀態，且 前述處理完成時，即將包括真空排氣部5的I D碼之 信號，輸出至母線108。 接收到來自光學系控制部1 0 3的信號，真空排氣部 1 0 5則打開試料室與預備試料室的閥門，讓試料室與預 備試料室做連接，前述處理完成時，即將包括試料載置台 106的ID碼之信號，輸出至母線1〇8。 接收到來自真空排氣部1 〇 5的信號，試料載置台 1 0 6就會移動到試料的交付位置，前述處理完成時，即 將包括試料搬.送·裝置1 ·0 7的I D碼之信號，輸出至母線 10 8° 經濟部智慧財產局員工消費合作社印製 接收到來自試料載置台1 〇 6的信號，試料搬送裝置 1 0 7會將試料從預備試料室移動到試料室的試料載置台 106 ’前述處理完成時，即將包括試料載置台1〇6的 I D碼之信號，輸出至母線1 〇 8。 接收到來自試料搬送裝置1 〇 7的信號，試料載置台 1 ◦ 6就會移動’讓試料移動到離子束的照射位置。試料 載置台1 0 6完成前述移動處理時，即將包括真空排氣部 11 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 4 6 9 7 1 3 a7 __B7______ 五、發明說明（9 ) 105的ID碼之信號，輸出至母線1〇8。 {請先W讀背面之注意事項再填寫本S) -+其次’於真空排氣部1 〇 5接收到來自試料載置台 1 0 6的信號’就會令試料室與預備試料室的閥門關上， 藉此，試料室與預備試料室就會被分開。完成關上前述閥 門處理時，真空排氣部1 〇 5即將包括光學系控制部 1 0 3的I D碼之信號，輸出至母線1 〇 8。 最後’於光學系控制部1 〇 3接收到來自真空排氣部 1 0 5的信號，而恢復試料室內的光學控制用高電壓，即 將抱括主電腦1 0 2的I D碼之信號，輸出至母線1 〇 8 ，藉此完成一連的試料搬入處理。 如以上之因前述各處理要素1 〇 3至1 0 7可分散處 理，故主電腦1 0 2不必集中控制前述各處理要素。因而 ，能減輕其負擔，利用主電腦1 〇 2來進行圖像數據處理 等負荷大的處理，還可在其他的處理要素1 0 3至1 ◦ 7 進行前述試料搬送處理和加工處理等之其他處理。" 經濟部智慧財產局員工消費合作社印製 另外，主電、腦1 0·2及各處理要素1 0 3至1 07通 過母線1 0 8所傳送接收的信號，是以只能在主電腦 1 0 2及各處理要素1 0 3至1 0 7所擁有的軟體之可編 .碼及譯碼的密碼化之信號所構成的。由於L A Ν 1 〇 9內 的裝置沒有可解析前述密碼化的信號功能，因此就算接收 到前述信號還是無法解讀，就該裝置而言是單純無意的資 訊。 反之，由於在工廠的LAN 1 0 9內所使用的信號不 是被密碼化的特有信號，因此聚焦離子束裝置1 0 1的主 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -12- 4 6 9 7^3 A7 B7 五、發明說明（ίο ) 電腦1 0 2及各處理要素1 0 3至1 〇 7則以不受理 L A N 1 〇 9所使用的信號方式加以動作。 — C諳先閲讀背面之注$項再填寫本頁> 藉此，由於LAN 1 〇 9的各裝置及聚焦離子束裝置 1 0 1所相互使用的信號並不同，因此不會相互地影響。 因而，即使將指示信號等各種信號輸出至母線1 〇 8，工 廠這邊的LAN 1 0 9也不會錯誤的動作。 反之，即使工廠這邊的LAN 1 〇 9所使用的指令等 信號被傳達到聚焦離子束裝置1 0 1這逄的場合，還是能 防止聚焦離子束裝置1 0 1做錯誤的動作。而由於能從 L AN 1 〇 9限制在聚焦離子束裝置1 〇 1做解讀，因此 ，能夠保持被保留於配設在主電腦1 0 2內的硬碟等記億 裝置（圖未表示）的圖像數據等各種數據的機密性。& 又，具有特定權限者即可藉由使用包括可在工廠 LAN 1 〇 9及聚焦離子束裝置1 0 1兩邊受理的特定 I D碼之信號，從工廠LAN 1 〇 9對聚焦離子束裝置 1 0 1，或者枏反的從·聚焦離子束裝置1 0 1的主電腦 1 0 2對工廠LAN 1 0 9完成解讀。 經濟部智慧財產局員工消費合作社印製 如上所述，於本實施形態中，因將聚焦離子束裝置 1 0 1的主電腦1 02及各處理要素1 03至107做 L A N連接，所以主電腦1 0 2不必集中控制各處理要素 1 0 3至1 0 7，其負荷就會減輕。因而，可利用主電腦 1 0 2來進行圖像數據處理等負荷大的處理’也能在其他 的處理要素1 0 3至1 0 7進行前述試料搬入處理、觀察 處理或是加工處理等之其他處理。 本紙張又度適用中國國家標準（CNS)A4規格（210x 297公釐） -13- 4 6 9 71 3 A7 ------- B7 五、發明說明01 ) 而主電腦1 0 2及各處理要素1 〇 3至1 0 7通過母 線-1 0 8所傳送接收的信號，藉由以只能解讀這些的方式 加以密碼化，同時以不受理LAN 1 0 9所使用的信號之 方式，讓聚焦離子束裝置1 〇 1與工廠這邊的LAN 1 0 9的各處理要素能不受到相互的影響，防止錯誤的動 作。 更由於能從工廠的LAN 10 9來限制對聚焦離子束 裝置1 0 1做解讀，故能保持被保留於配設在主電腦 1 ◦ 2內的硬碟等記憶裝置（圖未表示）的圖像數據等各 種數據的機密性。 又，本實施形態是以聚焦離子束裝置的例子所做的說 明，但也適用於作爲帶電粒子束所使用電子束之電子顯微 鏡等之帶電粒子束裝置。 此外，作爲處理之案例，是以設定試料之例所做的說 明，但也包括收集試料的圖像數據之處理，解析前述圖像 數據之處理，.將.試料做:加工之處理等，對應構成帶電粒子 束裝置的處理要素的組合所進行之各種處理》 進而，在LAN構成的場合，可用電纜加以構成，但 可藉由使用光纖來構成A L N，可回避因包含在帶電粒子 束裝置內的高電壓電源放電所產生的雜音影響。而由於在 電子束控制等採用高精度的模擬電路和微少信號放大電路 ，故必需以極端不受雜音影響方式的電路構成，但藉由使 用光纖可抑制因主回路引起的雜音影響。 本紙張尺度適用中國國家標準（CNS)A4規格（210^297公釐） -14 - -----ΙΊ — ΊΊ----^-1 — (諳先閲讀背面之注意事項再填窝本頁) » . --線. 經濟部智慧財產局員工消費合作社印製 經濟部智慧財產局員工消費合作社印制衣 4 69 7^3 713 at _B7_' _ 五、發明說明（12 ) 圖面之簡單說明 第1圖係本發明實施形態之方塊圖。 第2圖係一般的聚焦離子束裝置之槪略構成圖。 第3圖係習知聚焦離子束裝置之方塊圖。 —---I ,--ΊΜί- 名 - ---！| 訂·！--線'-J? {請先閲讀背面之注意事項再填寫本頁) 主要元件對照 101 聚 焦 離 子 束 裝置 102 主 電 腦 103 光 學 系 控 制 部 1 04 光 軸 控 制 部 105 真 空 排 氣 部 1 06 試料 載 置 台 107 試 料 搬 送 裝 置 108 母 線 109 LAN 20 1 離 子 源 " 202 電 容 透 鏡 203 射 束 熄 滅 電 極 204 可 動 光 圈 205 散 光校 正 電 極 206 對物 透 鏡 207 掃 描 電 極 301 主 電 腦 本紙張尺度適用中國國家標準（CNS)A4規格（210 x297公釐） -15-A7 4 6 9 713 _____ Β7 V. Description of the Invention (1) Technical Field-The present invention relates to a charged particle beam device that uses a charged particle beam to perform observation and processing of samples. BACKGROUND Conventionally, a charged particle beam device that uses a charged particle beam from an electron source and an ion source for observation of samples, microfabrication, and the like is applied to analysis processing of semiconductor defects, monitoring processing of manufacturing processes, Processing. Fig. 2 is a schematic configuration diagram of a focused ion beam device, which is a charged particle beam device. In FIG. 2, the focused ion beam device uses an ion source 20 1 'capacitive lens 202', a beam extinguishing electrode 203, a movable aperture 204, an astigmatism correction electrode 205, an objective lens 206, a scanning electrode 207, and a secondary electron detector. 208, an air gun 209, and a sample mounting table 2 10. An ion beam focused by ions from the ion source 2 0 to 1 is made on the sample 2 1 1 placed on the sample stage 2 1 0, and the secondary electrons generated therefrom are scanned twice. The electronic detector 2 0 8 performs the test. In this way, the image (SIM image) data of the processing sample 2 1 1 is collected, the sample 2 1 1 is observed, and the failure analysis processing of the sample 2 1 1 is performed. In addition, the focused ion beam is irradiated to the sample 2 1 1, whereby the sample 2 1 1 can be etched, or a deposition process can be performed using a gas from the air gun 209. Fig. 3 is a block diagram of a conventional focused ion beam device. In the third figure, 'The paper size applies to the Chinese National Standard (CNS) A4 specification (2) 0 X 297 male dragon) I --- ΙΊι''ι-ρ ^ -------order ---- --- line (please read the notes on the back before filling this page) printed by the Consumers' Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs A7 469 71 3 __B7 _ V. Description of the invention (2) Focused ion beam device is equipped for sample observation In the case of processing or processing-the input of instructions or the analysis of the collected data, or the host computer 3 0 1 'for displaying the image of the sample, etc., or as a processing element to control the capacitive lens of Fig. 2 202, beam extinguishing electrode 203, movable aperture 204 'astigmatism correction electrode 205, objective lens 206, scanning electrode 2 07, thereby' equipped with an optical system control that can control the ion beam using electrical fields, and control focus and position Unit 3 0 2. Optical axis control unit for positioning the fixed axis and movable aperture 2 0 4 of the ion source 2 1 0 arranged on the ion source mounting table (not shown) using an operating mechanism or a piezoelectric element 3 0 3 2. Make the sample chamber equipped with the sample into a vacuum exhaust part of the vacuum environment. And move to the electron beam irradiation position of the sample stage 305, the sample 211 is transported to the sample mounting table 305 of the sample transport apparatus 306. Each of the processing elements includes a central processing unit (CPU). Regarding the focused electron beam device configured as described above, a case will be used to explain the operation when the test sample is moved into the test chamber and set at a predetermined position. First, the operator will set the main instructions of the sample. Enter the host computer 3 0 1. The host computer 3 01 responds to the aforementioned instruction input and outputs the instruction signal to the vacuum exhaust unit 3 0 4. The vacuum exhaust unit 3 04 responds to the instruction signal 1 from the main computer 3 01 to turn the preparatory sample chamber into an atmospheric environment, and opens the door of the preparatory sample chamber. Next, 'When the host computer 3 0 1 completes the aforementioned processing of the vacuum exhaust section 3 04', an instruction is about to be issued. The signal is output to the sample transfer device 3 0, and the sample transfer II ^ ------- ^ nl > --- 1 --I ^-»1 ----- 1-line I. < Jing first read the precautions on the back before filling out this page} Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs -5- Employee Consumption of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the cooperative 4 6 9 7 1 3 A7 B7 V. Description of the invention (3) The sending device 3 0 6 responds to the aforementioned instruction signal and moves the sample into the preparatory sample room-the main computer 3 0 1 completes the foregoing of the sample transfer device 3 0 6 During processing, the instruction signal is output to the vacuum exhaust unit 304, and the vacuum exhaust unit 304 responds to the foregoing instruction signal, and evacuates the preparatory sample chamber. Secondly, when the host computer 3 0 1 completes the processing of the vacuum exhaust unit 3 0 4, the instruction signal is output to the optical system control unit 3 0 2, and the optical system control unit 3 2 2 responds to the instruction signal in order to prevent Because of the high voltage vacuum degradation discharge for optical system control in the sample room, the high voltage was controlled to 0 FF. Next, when the host computer 3 0 1 finishes the aforementioned processing of the optical system control section 3 02, the instruction signal is output to the vacuum exhaust section 3 04, and the vacuum exhaust section 3 04 responds to the aforementioned no-signal signal and opens the sample chamber. The valve is connected to the preparation sample chamber, so that the sample chamber can be connected to the preparation sample chamber. Secondly, when the host computer 3 0 1 finishes the aforementioned processing of the vacuum exhaust section 3 0 4, the “signal indication. Signal. Signal output” is output to the sample mounting table 3 0 5, and the sample loader 3 0 5 responds to the aforementioned instruction signal. , And moved to the sample delivery position. 0 Second, when the host computer 3 0 1 finishes the aforementioned processing of the sample mounting table 3 0 5, the instruction letter will be output to the sample transfer device 3 0 6, and the test @ 装置 3 〇 6 responds to the foregoing instruction. The signal moves the sample from the preparatory sample chamber to the sample mounting table to which the sample is placed. Secondly, the host computer 3 0 1 completed the test and transfer device 3 0 when processing, 'the instruction signal will be output to the sample mounting table 3 05, and the test w ^ This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ) -6-— — — — ΙΊΙΊ— ^ iI — —---- I --- II —-- I-- (Please read the notes on the back before filling out this page) Employees ’Intellectual Property Bureau of the Ministry of Economic Affairs Consumption The cooperative prints A7 _____B7__ 5. Description of the invention (4) Setting the stage 3 〇 5 moves in response to the aforementioned instruction signal to move the sample to the irradiation position of the ion beam. -Secondly, when the host computer 3 0 1 finishes the aforementioned processing of the sample mounting table 3 0 5, the instruction signal is output to the vacuum exhaust section 3 0 4, and the vacuum exhaust section 3 4 responds to the aforementioned instruction signal 'to close the sample to The valve is separated from the preparation sample chamber by a valve for the preparation sample chamber. ^ Finally, when the host computer 3 0 1 completes the aforementioned processing of the vacuum exhaust unit 3 0 4, the instruction signal is output to the optical system control unit 3 2, and the optical system control unit 3 2 responds to the foregoing instruction signal and resumes the sample room. The high-voltage control of the optical system is completed, and the foregoing series of sample setting processing is terminated. Since the operations of the aforementioned processing elements are collectively controlled by the host computer 3 0 1, the processing elements 1 cannot perform the processing elements 1 when the host computer 3 0 1 processes the image data of the sample under heavy processing. Control, there is a problem that the ability to process and observe is deteriorated. In addition to the focused ion beam device, even the charged particle beam device using an electron microscope or the like has a similar problem as described above. The object of the present invention is to provide a charged particle beam device capable of performing smooth processing by lightly loading a host computer. The invention discloses that the charged particle beam device of the present invention is characterized by having: responding to a “No sign” and output processing is started. The host computer fg, a charged particle beam source that generates a charged particle beam that irradiates the sample, responds to the processing start signal for the sample, and processes a plurality of processing elements. The paper size of the main computer applies the Chinese national standard (CNS ) A4 size (210 X 297 mm) ·! —.—.! -(1 I! I — chant II — f order. — --- ί Jing first read the notes on the back before filling out this page) 4 69 71 3 A7 B7 V. Description of the invention (5) The brain and the aforementioned processing elements can be Make the LAN connection. The host computer and each processing element are LAN-connectable to perform distributed processing for samples. (<Please read the precautions on the back before filling in this page) As the aforementioned processing elements, an optical system control unit capable of adjusting and focusing the aforementioned charged particle beam and a vacuum exhaust for controlling the sample chamber in a vacuum environment can be provided. It can also be composed of an optical axis control section for positioning the movable diaphragm, a sample mounting table on which the sample is placed, and a sample transfer device for transferring the sample to the sample mounting table. It is also possible to transmit and receive signals encrypted between the host computer and each of the constituent elements, and connect to another LAN at the same time. Furthermore, the aforementioned charged particle beam device can be used as a focused ion beam device and a scanning electron microscope. BEST MODE FOR IMPLEMENTING THE INVENTION FIG. 1 is a block diagram of a charged particle beam device according to an embodiment of the present invention, showing an example of a focusing, focusing ion, and beam device. A consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs is printed in Figure 1. The Focused Ion Beam Device (FIB) 1 〇1, which is a charged particle beam device, is located in the measurement room away from the factory. It uses TCP / IP (Transmission Control Protocol / Internet Protocol) and the LAN is connected to a LAN (Local Area Network) 10 9 which is a factory that is another LAN. The focused ion beam device 101 is provided with a host computer 102 for inputting instructions or analyzing data collected during processing of sample inspection or processing, or display of image of the sample, or the like. This paper size applies the Chinese National Standard (CNS) A4 specifications < 210 X 297 mm) -8-A7 B7 9 71 3 469 71 3 V. Description of the invention (6) Elements' to control the capacitive lens in Figure 2 2 0 2. Beam extinguishing electrode 2-0 3. Movable aperture 204 'Astigmatism correction electrode 205, objective lens 206, and scanning electrode 207, thereby having an optical system that can control the ion beam using the electrical field and control the focus and positioning Control section 1 〇 3 ′ Optical axis control section 104 for positioning the movable aperture 2 0 4 by using an operating mechanism, etc. 4 A vacuum exhaust section 1 for turning a sample chamber provided with a sample into a vacuum environment, and placing a sample The sample carrier 106 is moved to the irradiation position of the electron beam, and the sample is transferred to the sample carrier 106 of the sample carrier 106. As the aforementioned processing elements, it is necessary to have a sample chamber in which an optical system control unit 103 and a sample are provided, and a vacuum exhaust unit 105 in a vacuum environment. However, other processing elements can be provided at any time according to needs. application. In addition, the optical axis control unit 104 responds to the needs, and can also use an operating mechanism and a piezoelectric element to perform a fixed axis of the ion source 201 that is arranged on an ion source mounting table (not shown). Each processing element has a CPU and is connected to the bus 108 at the same time. TCP / IP is used, and L A N connections are made according to the IEEE 802.3 C S M A / CD (Carrier Sense Multiple Access with Collision Detection) method. For the signals transmitted and received between the host computer 102 and each of the processing elements 1 0 3 to 107, the ID code is configured to include the ID code, and the ID code including the signal on the bus 1 ◦ 8 is determined. To determine whether it is a self-assigned signal. In addition, as will be described later, the signals transmitted and received through the bus 108 are encrypted in such a manner that they can be read only between the host computer 102 and the above-mentioned processing instructions tables 103 to 107. This paper size applies the Chinese national standard < CNS > A4 size (210x 297 mm) -9-----!-Ί Mi IIII --- II--I III — —! ≪ Please read the back first Please note this page before filling in this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 4 6 9 71 3 A7 B7 V. Description of Invention (7) (Please read the notes on the back before filling this page) An example of a focused ion beam device is used to describe the operation when a sample is moved into a sample chamber and set at a predetermined position. T First, the operator inputs the main instruction signal for setting the sample to the host computer 1 0 2 ^ host computer 3 0 1 responds to the aforementioned instruction input, and outputs the instruction signal including the ID code of the vacuum exhaust unit 105 to the bus 1 08. The vacuum exhaust unit 105 receives the instruction signal from the host computer 3 0 1 transmitted to the bus 1 08 to determine the I d code including the signal, recognizes the self-assigned instruction signal, and responds to this. The preparation sample chamber is set to the atmospheric environment, and the door of the preparation sample chamber is opened. When the vacuum exhaust unit 105 completes the aforementioned processing, the signal including the ID code of the sample transporting device 107 is output to the bus 108 in order to transfer the processing to the sample transporting device 107 for the next processing step. The sample transfer device 1 07 receives the instruction signal from the vacuum exhaust part 105 transmitted to the bus 1 08 to determine the ID code including the signal, recognizes the self-assigned instruction signal, and responds to this. Move the sample into the prepared sample chamber. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. When the sample transfer device 10 has completed the aforementioned processing, the signal including the ID code of the vacuum exhaust unit 105 for the next processing step is output to the bus 108. In the future, the constituent elements are the same as above, and the 1 D code is used to determine whether the signal of the bus 108 is a self-assigned signal. If it is a self-assigned signal, it is processed. When it is processed, it will be included as the next one. The signals of the ID codes of the constituent elements of the steps are output to the bus 108. That is, the sample transfer device 10 7 is processed, and the paper size including the vacuum paper is applied to the Chinese National Standard (CNS) A4 specification (210 * 297 mm) -10- 4 69 713 A7 ______B7___ V. Description of the invention (8 ) (Please read the note f on the back before filling in this page) When the signal of the ID code of the gas part 105 is output to the bus 108, the vacuum exhaust-gas part 105 responds to the aforementioned signal and prepares the sample. The chamber is evacuated. When the foregoing processing is completed, the signal including the ID code of the optical control unit 103 is output to the bus 108. The optical system control unit 103 receives the signal from the vacuum exhaust unit 105, and in order to prevent the high voltage for optical control in the sample chamber from discharging as the vacuum deteriorates, the high voltage control process is performed at 0 FF. When the aforementioned processing is completed, a signal including the ID code of the vacuum exhaust unit 5 is output to the bus 108. When the signal from the optical system control unit 103 is received, the vacuum exhaust unit 105 opens the valve of the sample chamber and the pre-sample chamber, and connects the sample chamber with the pre-sample chamber. When the foregoing processing is completed, the sample load is about to be included. The signal of the ID code of the station 106 is output to the bus 108. When the signal from the vacuum exhaust unit 105 is received, the sample mounting table 10 6 will move to the sample delivery position. When the aforementioned processing is completed, the signal of the ID code of the sample transfer, delivery 1 and 0 7 will be included. , Output to the busbar 10 8 ° The consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs prints and receives the signal from the sample loading platform 10, and the sample transfer device 107 will move the sample from the preparatory sample room to the sample loading platform of the sample room. 106 'When the aforementioned processing is completed, the signal including the ID code of the sample mounting table 106 will be output to the bus 108. When the signal from the sample transfer device 107 is received, the sample mounting table 1 ◦ 6 moves' to move the sample to the irradiation position of the ion beam. When the sample stage 1 0 6 completes the aforementioned mobile processing, it will soon include the vacuum exhaust section. 11 The paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 4 6 9 7 1 3 a7 __B7______ 5. Description of the invention (9) The signal of the ID code 105 is output to the bus 108. (Please read the precautions on the back before filling in this S)-+ Secondly, when the signal from the sample mounting table 1 06 is received at the vacuum exhaust section 105, the valves of the sample chamber and the pre-sample chamber will be closed. With this, the sample room and the preliminary sample room will be separated. When the valve closing process is completed, the signal of the vacuum exhaust section 105 including the ID code of the optical control section 103 is output to the bus 108. Finally, the optical system control unit 10 received the signal from the vacuum exhaust unit 105, and restored the high voltage for optical control in the sample room. The signal of the ID code of the host computer 102 was to be output to Bus 108 is used to complete a series of sample loading operations. As described above, since the aforementioned processing elements 103 to 107 can be processed in a decentralized manner, the host computer 102 need not control the aforementioned processing elements collectively. Therefore, the burden can be reduced, and the host computer 102 can be used to perform heavy processing such as image data processing. The other processing elements 103 to 1 can also be used to perform the above-mentioned sample transfer processing and processing processing. deal with. " Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 1 0 2 and each processing element 10 3 to 107 are software-encoded and decoded cryptographic signals. Since the device in L A N 109 does not have the function to analyze the aforementioned encrypted signal, even if the aforementioned signal is received, it cannot be interpreted, which is purely unintentional information for the device. Conversely, since the signals used in the factory's LAN 1 0 9 are not unique signals that are encrypted, the main paper size of the focused ion beam device 1 0 1 is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) (Centi) -12- 4 6 9 7 ^ 3 A7 B7 V. Description of the Invention (ίο) Computer 1 0 2 and processing elements 1 0 3 to 1 〇7 operate in a way that does not accept the signal used by LAN 1 〇9 . — C 谙 First read the note on the back and then fill out this page. This way, because the signals used by each device of LAN 109 and the focused ion beam device 101 are different, they will not affect each other. Therefore, even if various signals such as an instruction signal are output to the bus 108, the LAN 1109 on the factory side does not operate erroneously. On the other hand, even if a signal such as a command used by the LAN 101 on the factory side is transmitted to the focused ion beam device 101, it is possible to prevent the focused ion beam device 101 from operating incorrectly. And because it can be interpreted from L AN 1 〇9 to the focused ion beam device 1 〇1, it is possible to keep the hundreds of millions of devices (not shown in the figure) that are reserved in the hard disks arranged in the host computer 102. Confidentiality of various data such as image data. & A person with specific authority can use a signal including a specific ID code that can be accepted on both sides of the factory LAN 1 0 9 and the focused ion beam device 1 0 1 to pair the focused ion beam device 1 from the factory LAN 1 0 9 0, 1 or the host computer 1 0 of the slave focused ion beam device 1 0 1 completed the interpretation of the factory LAN 1 0 9. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs as described above. In this embodiment, the host computer 1 02 and the processing elements 1 03 to 107 of the focused ion beam device 1 0 1 are connected to the LAN, so the host computer 1 It is not necessary to centrally control each processing element 103 to 107, and the load will be reduced. Therefore, it is possible to use the host computer 102 to perform heavy processing such as image data processing. It is also possible to perform the aforementioned sample carry-in processing, observation processing, or processing processing on other processing elements 103 to 107. deal with. This paper is again applicable to China National Standard (CNS) A4 specifications (210x 297 mm) -13- 4 6 9 71 3 A7 ------- B7 V. Invention Description 01) and the host computer 102 and each The processing elements 1 〇3 to 107 are transmitted and received through the bus -1 08. The signals are encrypted in a way that can only be interpreted, and the signals used in the LAN 1 0 9 are not accepted. The processing elements of the focused ion beam device 1 〇 1 and the factory's LAN 1 0 9 can be prevented from being affected by each other, preventing erroneous operations. Since the interpretation of the focused ion beam device 1 0 1 can be restricted from the factory's LAN 10 9, it is possible to keep a picture of a memory device (not shown) such as a hard disk provided in the host computer 1 ◦ 2 Confidentiality of various data like data. Although the present embodiment has been described using an example of a focused ion beam device, it is also applicable to a charged particle beam device such as an electron microscope used as an electron beam for the charged particle beam. In addition, as a case of processing, the description is based on the example of setting the sample, but it also includes the processing of collecting the image data of the sample, the analysis of the aforementioned image data, and the processing of the sample: processing, etc., corresponding Various processes performed by a combination of processing elements constituting a charged particle beam device. Furthermore, in the case of a LAN configuration, a cable can be used to construct the ALN by using an optical fiber. Noise effects from high voltage power supply discharge. Because of the use of high-precision analog circuits and small signal amplifier circuits in electron beam control, it is necessary to construct a circuit that is extremely unaffected by noise, but the use of optical fiber can suppress the effects of noise caused by the main circuit. This paper size is in accordance with China National Standard (CNS) A4 (210 ^ 297mm) -14------ ΙΊ — ΊΊ ---- ^-1 — (谙 Please read the notes on the back before filling in the book (Page) ».-Line. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs and printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The first illustration is a block diagram of an embodiment of the present invention. FIG. 2 is a schematic configuration diagram of a general focused ion beam apparatus. Fig. 3 is a block diagram of a conventional focused ion beam device. —--- I,-ΊΜί- First name----! | Order ·! --Line'-J? (Please read the precautions on the back before filling out this page) Main component comparison 101 Focusing ion beam device 102 Host computer 103 Optical system control unit 1 04 Optical axis control unit 105 Vacuum exhaust unit 1 06 Sample Mounting table 107 Sample transfer device 108 Bus bar 109 LAN 20 1 Ion source " 202 Capacitive lens 203 Beam extinguishing electrode 204 Movable aperture 205 Astigmatism correction electrode 206 Object lens 207 Scanning electrode 301 Main computer This paper size applies Chinese national standard (CNS ) A4 size (210 x 297 mm) -15-