4 41 8 ’ ’ ' '' ，上修正 五、發明說明（） A7 B7 發明領域： 本發明係有關於-半導體彩色遽光膜之製程，特别是 指一種以調整製程改善彩色濾光膜色彩均衡的方法 發明背景： 在即將邁入千捲年的今日’以數位相機的光電感光元 件及記憶體取代傳統相機之底片，以及以液晶顯示器（lcd) 代替傳統映像管的監示器已成一種趨勢，原因不外乎以上 的兩種新產品具有便利性或者具有輕薄短小的可搞性。一 般而言’光電感光元件有電荷耦合裝置（charge C0UpMng device, CCD)或者互補式金乳半電晶體（cmos)兩種，而爲 了使電子影像信號所能展現之影像展現色彩，紅、藍、綠 三原色之彩色濾光膜（color filter)已是必備的裝置，除了色 彩之外，另一關鍵著L C D與數位相機商品之價格的好球的 重要因素之一的便是產品的解析度、明亮度以及色彩均勻 度了 。高的解析度代表影像愈細緻，當然愈能激起顧客的 購買慾。而較高的解析度代表著在相同的表面積下光電感 測元件的數量愈高，因此，爲補救感測面積的縮小造成影 像信號的減弱，通常彩色濾光膜上還會再加上微透鏡以加 強其聚光效果。另一重要且關鍵著商品之等級的因素要屬 彩色濾光膜之明亮度以及色彩均勻度了，遑兩者深深影響 著影像捕捉系统（jmage pick-up)之品質的高低。因其也影 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閲讀背面之注意事項再填寫本買) 1^)-¾ i ------訂 ---- 經濟部智慧財產曷員工消費合咋Fi,中裂 --- 441118 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明（） 響著解析度的表現。因此爲求達到最高之明亮度，彩色遽 光膜之各染色薄膜之相對厚度的控制，材質都需要加以注 意。 以下將以彩色CM 0S的製程爲例，介紹傳統之製程技 術。如圖一所示爲舍光電感測元件（photo d i〇de)的底材1 〇 經金屬導線1 2連接後以護層保護例如氮化物彳5 ,再予以 一平坦化材料20形成於其上最後再形成一彩色濾光膜 30，接著塗佈以間隙膜40(spacer)，用以調整景深（fie|d depth)以使最後成形之微透鏡的焦距可以正好落在光電感 測元件上。最後，再塗佈以正光阻5 0並經微影及熱處理以 形成微透鏡5 0。 其中傳統方法之彩色濾光膜3 0的製程，請參考圖 二，先以旋塗法塗佈具綠色顏料之感光膜層3 0a (通常係負 光阻材料），再以深紫外光曝光並予以顯影及水洗以去除未 曝光的綠色感光膜層30a，以形成第一凹陷區域32之馬赛 克圖案（mosaic)。第一凹陷區32與留下來之綠色感光膜層 30a面積比約爲1:1，且第一四陷區與每一綠色感光膜層 30a相替變換《之後，經由约220。〇溫度烘烤定型約30-60分鐘以形成綠色濾光膜層30a。 接著，再以紅色顏料之感光膜層30b以旋塗式形成於 綠色濾光膜層30a上，並塡滿第一凹陷區32，再經由微影 -3- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公楚） <請先閲讀背面之注意事項再填寫本頁) 裝 ----訂---------線J. 經濟部智慧財產局員工消費合作社印製 441118 A7 — ' ---------- - 五、發明說明（） 曝光、顯影及水洗以去除未曝光的紅色感光膜層32fc)以形 成第—凹陷區35，留下之紅色感光膜層3肋、第二凹陷區 35及綠色據光膜層3〇a面積比爲且分佈如圖三a 所示。再經由約220溫度烘烤定型go-go分鐘以形成紅 色?慮光膜層30 b。圖三b示製程至此步驟後依據原子力顯 微鏡所得（照片’可看出紅色感光膜層3Q_b厚度大於綠色 濾光膜層30a。 最後，再以旋塗珐沉積藍色感光膜層30c於所有區 域’並填滿第二凹陷區3 5，再經由曝光、顯影及水洗以留 下第二凹陷區35範圍之藍色感光膜層，最後，再經由约 220°C溫度烘烤定型3〇_6〇分鐘以形成藍色濾光膜層 3〇c ’因此，最後之藍色濾光膜層3〇c、紅色濾光膜層3〇b 及綠色濾光膜層30a的面積比爲1:1:2。如圖四所示。 上述的製程順序，以一實施例而言，由於製程特性順 序之關係（旋塗珐），綠色濾光膜層30a的厚度约爲 1.3μηη’而紅色濾光膜層3〇b厚度約爲ΐ.5-1.8μηι，藍色遽 光膜層30c约爲2.0-2_5μΓΠ。因此，藍色濾光膜層3〇c最 厚，這將使得藍光的穿透率最差，而使得像素的色彩失眞。 因此，爲使色彩均衡，傳統方法多以尋求適當之彩色 滤光膜材料，或者調整光軍的設計來改變，然而’純以改 -4- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ----一—^—ot--------訂---------線. (請先閱讀背面之注意事項再填寫本頁) 441 1 1 8 A7 B7 五、發明說明（ 變彩色濾光膜材料，在材料製作上並不容& % ’ 且増；ito # + 另外，調整光軍設計，將使得電路設計變得 成本’ 因此，本發明將提供一簡化的製程步魏， 有更大容忍度之方法以解決上述之問題。 以使得製程 經濟部智慧財產局員工消費合作社印製 發明目的及概述： 本發明目的係提供一種改善彩色濾光腺洛〜 疋膘色彩平衡度 之製造方法，不但可以不必改變既有的材料，π π ' 且不必改變 光罩設計即可達成色彩均衡度之目標。 本發明係一種改善彩色濾光片製程以平德^洛& & & 1啊&杉均衡 度之方法，至少包含以下之步骤，提供一基板，且已形成 複數個光電感測元件，並且已形成導線連接、護層及平骑 化感光光阻，之後，在第一較佳的實施例中，係先形成— 具有藍色顏料之第一感光性材質於該平坦化感光光阻 上，再經微影曝光、顯影及水洗以形成複數個藍色遽光膜 層及複數個第一凹陷區，再施以烘焙處理；接著，形成具 有綠色顏料之第二感光性材質於所有區域；然後，再次微 影曝光、顯影及水洗以形成複數個綠色濾光膜層及複數個 第二凹陷區，其中綠色濾光膜層位於原第一凹陷區，且每 一藍色濾光膜層和四個綠色濾光膜層及四偭第二凹陷區 構成一九宮格圖形，每一九宮格圖形中心爲藍色濾光膜 -5- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -------- — ο裝 (請先閲讀背面之注意事項再填寫本頁) --訂---------線.0 441113 A7 B7 五、發明說明（ 層’且四個綠色遽光膜層係位於藍色遽光膜廣之最鄰近的 四格，四個第二凹陷區位於藍色濾光膜層之四個次鄰近四 格，相鄰之九宮格圖形係有三格（―行或一列）相共用，以 使得每兩個藍色濾光膜層之間相鄰僅一綠色濾光膜層；之 後再施以第二次烘焙處理；再形成一具有紅色顏料之第三 感光性材質於所有區域並填滿第二凹陷區；最後，對第三 感光性材質施以微影曝光、顯影及水洗製程以形成複數個 紅色濾光膜層於第二凹陷區與施以第三次烘焙處理。由於 本發明各顏色光阻膜層之烘焙比傳統方法之烘培時間相 對減少，因此可以改善傳統方法製程步驟若交換會有藍色 滤光膜層熱穩定不佳的問題。本發明之第二實施例係將上 述之綠色之第二感光性與紅色顏料之第二感光性形成順 序對調以藍紅綠形態出現，但兩相鄰之九宮格仍然三格共 用，並且最後各顏色濾光膜層之相對位置同第一實施例。 圖式簡單説明： 本發明的較佳實施例將於往後之説明文字中輔以下 列圖形做更詳細的閣述： 圖一顯示依序爲光電感測元件、保護層、平坦化材 料、彩色濾光膜及間隙膜上的橫截面示意圖； 圖二顯示依據傳統方法形成綠色濾光膜層及第一凹 陷區的示意圖； 圖三A顯示依據傳統方法及紅色濾光膜層及第二凹 -6- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閲讀背面之注項再填寫本頁)4 41 8 '' '”, the above amendment 5. Description of the invention () A7 B7 Field of the invention: The present invention relates to the process of-semiconductor color calender film, especially refers to a method to improve the color balance of the color filter film by adjusting the process Background of the invention of the method: As the millennium is about to enter the millennium, it has become a trend to replace the negative film of the traditional camera with the photoelectric sensor and memory of the digital camera, and the LCD monitor to replace the traditional video tube monitor. , The reason is that the above two new products are convenient or have light, short and easy to implement. Generally speaking, the photoelectric sensor has two types: charge-coupled device (charge C0UpMng device, CCD) or complementary golden semiconductor semi-transistor (cmos). In order to make the image displayed by the electronic image signal show color, red, blue, The color filter of the three primary colors is a necessary device. In addition to the color, one of the important factors that is important for the price of LCD and digital camera products is the resolution and brightness of the product. And color uniformity. A high resolution means that the more detailed the image, the more it can arouse customers' purchase desire. A higher resolution means that the number of photo-sensing elements is higher under the same surface area. Therefore, to remedy the reduction of the sensing area caused by the weakening of the image signal, usually a micro-lens is added to the color filter film. To enhance its light-gathering effect. Another important and key factor in the grade of the product is the brightness of the color filter and the uniformity of the color, which deeply affects the quality of the jmage pick-up. Because it also copies the paper size to Chinese National Standard (CNS) A4 specifications (210 X 297 mm) (please read the precautions on the back before filling in this purchase) 1 ^)-¾ i ------ order- -Intellectual Property of the Ministry of Economic Affairs, Employee Consumption, Fi, Medium Split --- 441118 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. Therefore, in order to achieve the highest brightness, the relative thickness of each dyed film of the color phosphor film needs to be paid attention to. In the following, the traditional CM 0S process is introduced as an example to introduce the traditional process technology. As shown in FIG. 1, the substrate 10 of the photodiode is connected with a metal wire 12 and protected with a protective layer such as nitride 彳 5, and then a planarizing material 20 is formed thereon. Finally, a color filter film 30 is formed, and then a spacer film 40 is applied to adjust the depth of field (fie | d depth) so that the focal length of the finally formed micro-lens can fall exactly on the photo-sensing element. Finally, it is coated with a positive photoresist 50 and subjected to lithography and heat treatment to form a microlens 50. Among them, the traditional color filter film 30 manufacturing process, please refer to Figure 2. First, spin-coat the photosensitive film layer 3 0a with green pigment (usually a negative photoresist material), and then expose it with deep ultraviolet light and apply it. Develop and wash to remove the unexposed green photosensitive film layer 30a to form a mosaic pattern of the first recessed area 32. The area ratio of the first recessed area 32 to the remaining green photosensitive film layer 30a is about 1: 1, and the first four recessed areas are alternately transformed with each of the green photosensitive film layers 30a, and then pass through about 220. 〇Temperature baking and setting for about 30-60 minutes to form a green filter film layer 30a. Then, a photosensitive film layer 30b of red pigment is formed on the green filter film layer 30a by spin coating, and the first recessed area 32 is filled, and then lithography is performed. -3- This paper size applies the Chinese National Standard (CNS ) A4 size (210 X 297 Gongchu) < Please read the precautions on the back before filling out this page) Binding ---- Order --------- line J. Employee Consumer Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs Printed 441118 A7 — '-----------5. Description of the invention () Exposure, development and water washing to remove the unexposed red photosensitive film layer 32fc) to form the first recessed area 35, leaving it The area ratio of the red photosensitive film layer 3 ribs, the second recessed area 35, and the green light-sensitive film layer 30a is as shown in Figure 3a. Then bake and set the go-go minute at about 220 ° C to form a red-colored light-reflective film layer 30b. Figure 3b shows the result obtained by the atomic force microscope after the process (photograph 'It can be seen that the thickness of the red photosensitive film layer 3Q_b is greater than that of the green filter film layer 30a. Finally, the blue photosensitive film layer 30c is deposited on all regions by spin coating enamel' And filled the second recessed area 35, and then exposed, developed and washed to leave a blue photosensitive film layer in the range of the second recessed area 35, and finally baked and shaped at a temperature of about 220 ° C 3-60. Minutes to form the blue filter film layer 30c '. Therefore, the area ratio of the final blue filter film layer 30c, the red filter film layer 30b, and the green filter film layer 30a is 1: 1: 2. As shown in Figure 4. In the above-mentioned process sequence, according to an embodiment, the thickness of the green filter film layer 30a is about 1.3 μηη ′ and the red filter film due to the relationship of the process characteristic sequence (spin coating enamel). The thickness of the layer 30b is about ΐ.5-1.8μηι, and the blue phosphorescent film layer 30c is about 2.0-2_5μΓΠ. Therefore, the blue filter film layer 30c is the thickest, which will make the blue light transmittance the most Poor, and the color of the pixel is lost. Therefore, in order to balance the color, the traditional methods are mostly to find the appropriate color Light film material, or adjust the design of the light army to change, but 'Pure to change -4- This paper size applies to China National Standard (CNS) A4 specifications (210 X 297 mm) ---- 一 — ^ — ot- ------- Order --------- line. (Please read the precautions on the back before filling this page) 441 1 1 8 A7 B7 V. Description of the invention (Variable color filter film material, Material manufacturing is not tolerated. &増; ito # + In addition, adjusting the light army design will make the circuit design cost. Therefore, the present invention will provide a simplified process step with greater tolerance. The method aims to solve the above problems, so that the employees of the Intellectual Property Bureau of the Ministry of Process Economy can print the invention. Purpose and summary: The purpose of the present invention is to provide a manufacturing method for improving the color balance of color filters. Change the existing materials, π π 'and achieve the goal of color balance without changing the mask design. The present invention is an improved color filter process to improve the color filter process. Pingde ^ Luo & & & 1 Ah & fir The method of equilibrium includes at least the following steps, providing A substrate and a plurality of photo-sensing elements have been formed, and a wire connection, a protective layer and a flat photo-sensitive photoresist have been formed. Then, in the first preferred embodiment, it is formed first—with blue pigment. A first photosensitive material is formed on the flattened photoresist, and then subjected to lithography exposure, development, and water washing to form a plurality of blue phosphorescent film layers and a plurality of first recessed areas, and then applying a baking treatment; then, forming The second photosensitive material with green pigment is in all areas; then, lithography exposure, development and water washing are performed again to form a plurality of green filter layers and a plurality of second recessed areas, wherein the green filter layer is located at the original first Recessed area, and each blue filter layer, four green filter layers, and four second recessed areas form a nineteen grid pattern, and the center of each nine grid pattern is a blue filter film-5- This paper applies China National Standard (CNS) A4 Specification (210 X 297 mm) -------- — ο Installation (Please read the precautions on the back before filling this page) --Order -------- -Line .0 441113 A7 B7 V. Description of the invention (layer 'and four green The light film layer is located in the four nearest grids of the blue phosphor film, the four second recessed areas are located in the four adjacent four grids of the blue filter film layer, and the adjacent nine grid pattern has three grids (―row Or one column), so that only one green filter layer is adjacent to each other between the two blue filter layers; then a second baking treatment is applied; and a third photosensitivity with red pigment is formed The material is in all areas and fills the second recessed area. Finally, the third photosensitive material is subjected to lithographic exposure, development and water washing processes to form a plurality of red filter film layers in the second recessed area and applied a third time. Baking process. Since the baking of each color photoresist film layer of the present invention is relatively shorter than the baking method of the traditional method, the problem of poor thermal stability of the blue filter film layer if the process steps of the traditional method are exchanged can be improved. In the second embodiment of the present invention, the second photosensitivity of the green and the second photosensitivity of the red pigment are sequentially reversed in the form of blue, red, and green, but two adjacent nine cells are still shared by three cells, and each color is finally The relative position of the filter film layer is the same as that of the first embodiment. Brief description of the drawings: The preferred embodiment of the present invention will be described in more detail in the following explanatory text with the following graphics: Figure 1 shows the photo-sensor element, the protective layer, the flattening material, and the color in order. Schematic cross-sections of the filter film and the gap film; Figure 2 shows a schematic diagram of forming a green filter film layer and a first recessed area according to a conventional method; Figure 3A shows a conventional filter method and a red filter film layer and a second recess- 6- This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the note on the back before filling this page)
yM —"訂-----1 —線^y· 經濟部智慧財產局員工消費合作社印製 441118 A7 五、發明說明（ 陷區的示意圖，圖三B顯示以原子力顯微鏡所得之照片· 圖圖四顯示依據傳统方珐以形成彩色濾光膜的‘、示意 圖五至圖七顯示以本發明第一實施例之方珐，形成依 次形成藍色濾光膜層、％色濾光膜層、及紅色濾光膜 示意圖； 圖八顯示各彩色濾光膜和厚度對穿透率影響的示意 圖； 圖九至圖十一顯示以本發明第二實施例之方法，形成 依次形成藍色遽光膜層、紅色遽光膜層、及綠色遽光膜層 的示意圖； 圖十二顯示波長和穿透率之關係（在藍、紅、綠三色 遽光膜在相同厚度條件下（彳3 μ m) >。 發明詳細説明： (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製yM — " Order ----- 1 —line ^ y · Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 441118 A7 V. Description of the invention (Schematic diagram of the subsidence area, Figure 3B shows a photo taken with an atomic force microscope. Figure FIG. 4 shows a schematic diagram of forming a color filter film according to a conventional square enamel. FIG. 5 to FIG. 7 show the square enamel formed by the first embodiment of the present invention to form a blue filter film layer, a% color filter film layer, And red filter film; Figure 8 shows the effect of each color filter and thickness on transmittance; Figures 9 to 11 show the method of the second embodiment of the present invention, forming a blue calender film in order Schematic diagram of layers, red phosphor film, and green phosphor film; Figure 12 shows the relationship between wavelength and transmittance (in the three thicknesses of blue, red, and green phosphor films at the same thickness (彳 3 μ m ) >. Detailed description of the invention: (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs
〉裝 — ！----訂 — ！----線 Ϊ'Λ 441 1 18 Α7 Β7 五、發明説明（〉 Install —! ---- Order —! ---- Line Λ'Λ 441 1 18 Α7 Β7 V. Description of the invention (
(請先閱讀背面之注意事項再填寫本頁J 後才是紅色’本發明之第二較佳的實施例而言，則係調整 光阻塗佈順序爲藍、紅，最後才是綠色，這樣將可使藍色 it光膜屬厚度爲最薄，但由於彩色濾光膜被調整順序後會 有熱穩定度的問題，因此，本發明同時調整顯影及烘焙條 件’以避開了傳統方法的彩色濾光膜穩定度的問題。 首先説明本發明之第一較佳的實施例，一如發明背景 圖一所示的示意圖，在CMOS或CCD之光感測元件、金屬 標板、導線、護層及平坦層完成後，請參考圖五所示的俯 視圖，以旋塗法塗佈具藍色感光性光阻膜層1 2 0，例如一 般盼酿（novlac)樹脂如 Fuji-〇|jm CB-7001.SBV-S612 或類 似之同級材料等負光阻材料，再以深紫外光曝光，曝光量 約爲1000-1400 mJ/cm2再予以顯影及水洗以形成馬赛克 圖案（mosaic) 130。未曝光部分的光阻形成凹陷區域130, 每一凹陷區130之大小约爲5-1 4μΓΠ。留下來之藍色感光性 光阻膜層與凹陷區比约爲1:8。其中藍色感光性光阻膜層 120爲中心，凹陷區130圍繞藍色感光性光阻膜層120， 之後，緝由約220-260。0溫度烘焙约20-30分鐘以定型。 圖中虛線132代表虚擬格子。 經濟部中央標準局員工消費合作社印裝 請參考圖六所示的示意圖，接著，再以綠色感光性光 阻膜層140以旋塗法形成於藍色濾光膜層120上，並填滿 凹陷區1 3 0，綠色感光性光阻膜層1 4 0可以選用酚醛樹脂 (novlac)如、Fuji-Ο丨im CG-7001 或 SG-71 00L 或類似之同級 -8- 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X297公漦） 441113 A? B7 - 11 ―― _ _ 五、發明説明（） 品其中之一，再經由微影製程曝光，曝光量约爲6 0 0-彳〇〇〇 mJ/cm2、之後以顯影及水洗以去除未曝光的綠色感光性光 J1 且膜層形成第二凹陷區150 ’留下之綠色光阻膜層140、第 二凹陷區150及藍色濾光膜層120的關係如圖中虛線 所示的九宮格。以藍色渡光膜層120爲中心，藍色漉光膜 層120之最鄰近四個空格則是綠色光阻膜層140，次鄰近 四個空格則是第二凹陷區150，但請注意兩個相都之九宮 格係有三個格子相共用的，例如圖中九宮格145A及 145B’以使兩個藍色之間僅有一綠色。再經由约220°C溫 度烘烤定型綠色光阻膜層140 20-30分鐘以形成綠色據光 膜層6 經濟部中央標準局負工消費合作社印製 (請先閱讀背面之注意事項再填寫本頁} 最後，請參考圖七的示意圖，再以旋塗法沉積紅色光 阻膜層160於所有區域並填滿第二凹陷區150，再經由曝 光、顯影及水洗過程以留下第二凹陷區150之紅色光阻膜 層160。紅色感光性光阻膜層16〇可以選用酚醛（n0V|ac) 樹脂如Fuj卜Olim CR-7001或SR-7100L或類似之同級品其 中之一：最後，再施以约220°C溫度烘烤20-30分鐘定型 以形成紅色濾光膜層。因此最後各色所佔的面積比約爲藍 色濾光膜層120:綠色濾光膜層140:紅色濾光膜層 160=1 :2:1 〇 由，於上述的製程順序，以第一實施例而言，藍色濾光 膜層120的厚度約爲1〇_12μηπ，而綠色濾光膜層14〇厚 -9- 本紙張尺度適用中國國^^TcNiTA^. ( 210X297i¥7 441 1 18 經濟部中央標準局員工消費合#:社印製 A7 B7 五、發明説明（） f約爲Hi.—，紅色遽光膜層16〇約爲2 〇2。因 ^藍色遽光㈣12〇最薄’依據於彩色像素和遽光膜層 厚度依附的關係’請參考圖八’將使得藍光的穿遠率提升， 紅色遽光M 16G雖然最厚。但由於紅色^膜層之穿透 率和厚度關係不大，因纟，像素的色彩失眞的問題將大爲 改善，此外，由於烘焙時間的調整，將不會有色彩穩定度 的問題。 本發明經由上述製程順序的改變後藍色/紅色（B/G) 信號比値也有比顯的改善，例如，將白光入射於傳統方法 之影像感測器後經由信號接收器接收程（B/G)信號比値時 經統計多個樣本之平均値約爲0 8 5，但以本發明之第一實 施例方珐所製作之影像擴取元件發現可以提高革〇 . g 8 本發明之第二實施例係將上述第一實施例中之綠色 濾膜和紅色濾膜之形成順序對調，即藍、紅最後才是綠》 但微影曝光、顯影及水洗，烘焙條件各顏色之相對位置與 第一實施例相同，面積比也相同。將不#贅述，圖九至圖 十一則分别示藍色濾膜1 7 0、紅色濾膜1 8 0及最後綠色濾 光膜層190形成之示意圖。以第二實施例而言，藍色濾光 膜層170的厚度約爲1.0-1 _2 μηι，而紅色濾光膜層Ί80 厚度約爲1.5-1 .8μην綠色濾光膜層160约爲2·〇_2.5μπΐ。 這一製程順序係囡應客户希望降低綠色濾光膜的选光率 考量而設計，以改善呈現出來畫面偏綠之問題。此外’由 本紙張尺度適用中國國家襟準（CNS ) Α4規格（210X297公釐） (请先聞讀背面之注意事項再填寫本頁)(Please read the precautions on the back before filling in J on this page to be red. In the second preferred embodiment of the present invention, the photoresist coating order is adjusted to blue and red, and finally green. The blue it light film can be made the thinnest, but since the color filter film is adjusted in order, there will be a problem of thermal stability. Therefore, the present invention adjusts the development and baking conditions at the same time to avoid the traditional method. The problem of the stability of the color filter film. First, the first preferred embodiment of the present invention will be described, as shown in the schematic diagram of the background of the invention, in the CMOS or CCD light sensing element, metal target plate, wire, protective After the layer and the flat layer are completed, please refer to the top view shown in FIG. 5, and apply a blue photosensitive photoresist film layer 1 2 0 by a spin coating method, for example, a general novlac resin such as Fuji-〇 | jm CB -7001.SBV-S612 or similar equivalent materials such as negative photoresist materials, and then exposed to deep ultraviolet light, the exposure is about 1000-1400 mJ / cm2 and then developed and washed to form a mosaic pattern (mosaic) 130. Unexposed parts Photoresist forms recessed areas 130, each recessed The size of the area 130 is about 5 to 14 μΓΠ. The ratio of the left blue photosensitive photoresist film layer to the recessed area is about 1: 8. The blue photosensitive photoresist film layer 120 is the center, and the recessed area 130 surrounds the blue The color photoresist film layer 120 is then baked at about 220-260. 0 temperature for about 20-30 minutes to finalize. The dashed line 132 in the figure represents the virtual grid. Please refer to the figure for the printing of the consumer cooperative of the Central Standards Bureau of the Ministry of Economic Affairs. The schematic diagram shown in FIG. 6 is followed by forming a green photosensitive photoresist film layer 140 on the blue filter film layer 120 by spin coating, and filling the recessed area 1 3 0, and the green photosensitive photoresist film layer 1 4 0 You can choose phenol resin (novlac) such as, Fuji-〇 丨 im CG-7001 or SG-71 00L or similar -8- This paper size applies to China National Standard (CNS) Α4 size (210X297 mm) 441113 A ? B7-11 —— _ _ V. One of the invention () products, and then exposed through the lithography process, the exposure is about 600- 彳 〇〇〇〇〇〇〇mJ / cm2, and then developed and washed to remove The exposed green photosensitive light J1 and the film layer forms a second recessed region 150 'which is a green photoresist film layer The relationship between 140, the second recessed area 150, and the blue filter film layer 120 is shown in the nine-square grid shown by the dashed line in the figure. With the blue light-transmitting film layer 120 as the center, the nearest four spaces of the blue calender film layer 120 are It is the green photoresist film layer 140, and the next adjacent four spaces are the second recessed areas 150. However, please note that the nine grids of the two phases are shared by three grids. For example, the nine grids 145A and 145B 'in the figure make the two There is only one green between the blues. Then the green photoresist film is baked and shaped at a temperature of about 220 ° C for 140 to 20-30 minutes to form a green photo film. 6 Printed by the Consumers ’Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs Read the precautions on the back before filling this page} Finally, please refer to the schematic diagram in Figure 7, and then deposit the red photoresist film layer 160 in all areas by spin coating and fill the second recessed area 150, and then expose, develop and The water washing process leaves the red photoresist film layer 160 in the second recessed area 150. Red photoresist film layer 16 can be made of phenol (n0V | ac) resin such as Fuj Bu Olim CR-7001 or SR-7100L or one of its equivalents: Finally, it is baked at about 220 ° C. Set in 20-30 minutes to form a red filter film layer. Therefore, the area ratio occupied by the last colors is about blue filter layer 120: green filter layer 140: red filter layer 160 = 1: 2: 1. In the above process sequence, the first implementation For example, the thickness of the blue filter film layer 120 is about 10-12 μηπ, and the thickness of the green filter film layer 14-14 is -9- This paper size is applicable to China ^^ TcNiTA ^. (210X297i ¥ 7 441 1 18 Staff Consumption of Central Standards Bureau of the Ministry of Economic Affairs #: agency printed A7 B7 V. Description of the invention () f is about Hi.—, the red phosphor film layer 16 is about 2 002. Because blue light is 12 ° The thin 'depending on the color pixel and the thickness of the phosphor film layer', please refer to Figure 8 'will increase the penetration of blue light, although the red calender M 16G is the thickest. The thickness relationship is not big, and the problem of color loss of pixels will be greatly improved due to the increase in color. In addition, due to the adjustment of the baking time, there will be no problem of color stability. According to the present invention, the blue / The red (B / G) signal ratio is also significantly improved, for example, the image of white light incident on the traditional method After receiving the signal, the signal ratio of the signal received by the receiver (B / G) is calculated. The average value of multiple samples is about 0 8 5. However, the image expansion device made by the first embodiment of the present invention It was found that the leather can be improved. The second embodiment of the present invention is to reverse the formation order of the green filter and the red filter in the first embodiment, that is, blue and red are finally green. The relative positions of the colors in the development and washing, and baking conditions are the same as in the first embodiment, and the area ratio is also the same. I will not repeat them here. Figures 9 to 11 show the blue filter 1 70 and the red filter 1 8 respectively. 0 and the last green filter layer 190 is formed. In the second embodiment, the thickness of the blue filter layer 170 is about 1.0-1 _2 μηι, and the thickness of the red filter layer Ί80 is about 1.5- 1. 8μην green filter film layer 160 is about 2.0 · 2.5μπΐ. This process sequence is designed according to the customer's desire to reduce the light selectivity of the green filter film to improve the problem of greenish screens. In addition, the Chinese National Standard (CNS) Α4 specification applies to this paper standard 210X297 mm) (Please read smell precautions to fill out the back of this page)
441 441 A7 B7 、發明説明（ 於石夕晶片在4〇〇nm至5〇〇 斛 , ^ ^ υϋηΠΊ附近會有一足程度的吸收作 使藍色信號度相對下降，太总βη 5+ 二 平奉發明可改善此一問題， 而使B/G信號比提升。喑卷去 號 從幵叫參考第十二圖，同時由於綠色信 使、綠色遽光膜層19〇和藍色遽光膜層17〇將相交 -二低之位置’有利於提昇元件對於光電信號的感度而 主現較佳之顏色。 本發明具有以下之優點： ⑴本發明所提供之方&，只需調整各顏色之製程順序， 因此製程較簡單且成本不增加即可達成各顏色色 衡度之關係。 / ' (2)本發明之各顏色膜層之烘焙時間較傳統方珐少，因此 可進一步增加產能。 以上所述僅爲本發明之較佳實施例而已，並非用〆 定本發明之申請專利範園；凡其它未脱離本發明所揭^之 精神下所完成之等效改變或修飾，均應包含在 ^ 專利範園内。 了迷（申請 ^ J———η装—— {請先間讀背面之注意事項再填寫本頁)441 441 A7 B7, description of the invention (Yu Xixi wafer will have a sufficient degree of absorption near 400nm to 500nm, ^ ^ υϋηΠΊ to make the blue signal relatively lower, too total βη 5+ Diping Feng The invention can improve this problem and increase the B / G signal ratio. Refer to the twelfth figure from the tweet, and meanwhile, because of the green messenger, the green phosphorescent film layer 19 and the blue phosphorescent film layer 17 The position of the intersection-the two lows' is conducive to improving the sensitivity of the component to the photoelectric signal and presenting a better color. The present invention has the following advantages: 之 The formula & provided by the present invention, only need to adjust the process order of each color, Therefore, the process is simple and the cost balance can be achieved without increasing the cost. / '(2) The baking time of each color film layer of the present invention is less than that of traditional square enamel, so the production capacity can be further increased. This is only a preferred embodiment of the present invention, and is not intended to define the patent application scope of the present invention; all other equivalent changes or modifications made without departing from the spirit disclosed by the present invention should be included in the patent scope In the park. Please ^ J --- η loaded - please read between {Note to fill out the back of this page)
Fi -訂 經濟部中央標準局負工消費合#:社印製 -11- 本紙張尺度逋用中國國家標隼（CNS ) A4^格（210Χ2π公釐〉Fi -Subscribe to the work and consumption of the Central Standards Bureau of the Ministry of Economic Affairs #: 社 印 -11-11- This paper uses China National Standards (CNS) A4 ^ grid (210 × 2π mm)