TW440890B - Production facility for integrated circuits - Google Patents

Production facility for integrated circuits Download PDF

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Publication number
TW440890B
TW440890B TW088108651A TW88108651A TW440890B TW 440890 B TW440890 B TW 440890B TW 088108651 A TW088108651 A TW 088108651A TW 88108651 A TW88108651 A TW 88108651A TW 440890 B TW440890 B TW 440890B
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Taiwan
Prior art keywords
processing
production equipment
clean room
processing unit
patent application
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TW088108651A
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Chinese (zh)
Inventor
Robert Theodorus Louis Jansen
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Lend Lease Cell Fab Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67727Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using a general scheme of a conveying path within a factory

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Factory Administration (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The invention relates to a production facility for integrated circuits, comprising: at least one clean-room, in which processing means for processing raw materials like wafers into integrated circuits have been located; and associated equipment for said cleanroom and the processing means located therein, characterized in that: the production facility is divided into mutually separated process cells, separated by walls; each process cell comprises a cleanroom; each cleanroom is equipped with processing means for executing processes requiring substantially similar conditions; each process cell comprises associated equipment for said cleanroom in the same process cell; and the associated equipment in said process cell is dedicated for maintaining the conditions required for the process equipment in said cleanroom. The features of the invention lead to a facility, in which the local processing and environmental conditions are optimised to local needs. In addition the realisation period of the production facility is significantly reduced.

Description

經濟部智慧財產局具工消费合作社印製 A7 .__B7_______ 五、發明說明(I ) 本發明關於一種用於積體電路之生產設備,包含至少 一個無塵室,其中係設有用以將類似晶圓之原料處理成爲 積體電路之處理機構,以及用於該無塵室與位於其內之處 理機構的相關裝置。 此種生產設備係槪括爲習知。 前技之生產設備槪括包含一整合結構殼,其中係設有 諸如處理機構與公用設施系統。在處理機構之下以及其他 的裝置係可理解的。 此種前技設備之設定通常採用一般化之結構選擇、一 單一個無塵室與一集中化空氣供給。 此種前技生產設備之配置係複雜的,導致高成本、誤 差之實質可能性、以及構成與實施之長期間。 本發明之目的係提供一種生產設備,其可避免前述之 缺失。此目的係達成在於:該種生產設備係分隔成互相分 離之處理單元(cell),其由壁所分隔;各個處理單元均包 含一無麈室;各個無麈室係配有處理機構,用以執行需爲 實質上類似之條件的處理;各個處理單元包含用於該處理 單元中之無塵室的有關裝置;且該處理單元中之有關裝置 係專用以維持該無塵室中之處理裝置所需的條件。 本發明之特徵可導致一種設備,其中區域性處理與環 、境條件係對於區域需求而作最佳化。此外,該種生產設備. 之實行周期係大爲降低。 本發明之目亦可由一種用於積體電路之生產設備所達 成,其包含:至少一個無塵室,其中係已設有用以處理諸 4 -------------裝--------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) B7 五、發明說明(>) 經濟部智慧財產局員工消費合作社印衆 如晶圓之原料爲積體電路的處理機構:及用於該無塵室之 相關裝置,其特徵在於:該種生產設備係分成相互分離之 處理單元,由壁所分離;各個處理單元包含一個無塵室; 各個無塵室係裝有處理機構,用以處理實質上類似之產品 型式;各個處理單元包含相關裝置’可於同一處理單元中 之無塵室;及,於該處理單元中之支援裝置係專用以維持 該無塵室中之處理裝置所需的條件。 此實施例係尤其適用於其中係生產特製產品之狀況。 此舉導致該種生產設備之設計的實質簡化,且因此導致供 應物 '材料與人員之較簡單的路線指定,以及較短的建造 周期。 雖然於前述二種情形下之本發明優趣用於任何尺;¢.興 容*之笔鏖g輝,本發明之優點係特別顯現於大型生產設 備。 根據第一實施例,各處理單元係實質上僅裝有對於該 單元中之處理機構所需的公用設施(utility)供應系統之接 線。 此等特徵導致對於公用設施供應系統之簡單邏輯架構 〇 根據第二較佳實施例,各處理單元包含實質上僅用以 執行類似型式之處理的處理裝置。 此特徵導致設計之更爲簡化,俾使各種單元係配置以 迎合用於需有類似設定與類似型式及數量之公用設施(水 電)及空氣補給的處理機構。此舉係導致公用設施分配之 5 -------------裝--------訂---------線 <請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 44〇89〇 _B7_ ______—--—---- ---—---— 五、發明說明(4 ) 更爲縮小與簡化。 (請先閱讀背面之注意事項再填寫本頁) 根據第三較佳實施例’該等單元配置繞於一中央單元 ,該中央單元係配置用以提供人員與材料到至少一個無塵 室之進出,並用於換穿長袍(g〇wning)及淸除污染。 此種設計導致優越且控制完善之進出至所有無塵室, 僅透過於中央單元所單一提烘之用於換穿長袍及淸除污染 。其下之材料及其他的處理裝置、安裝工具、與原料均係 可理解。對於並非無塵室之處理單元的其他部分之進一步 中央進出係可得到。 根據第四較佳實施例,中央單元包含一無塵隔室與一 非無麈隔室,該二隔室係由供換穿長袍及淸除污染之至少 一個站所分隔,處理單元之無塵室係僅能透過中央單元之 無麈隔室而進出。 此實施例進一步加強先前實施例之優點。 根據第五實施例,中央單元係配置供介於不同處理單 元之無塵室之間的材料及人員之輸送。 此特徵具有較短及較簡單路徑之邏輯上的優點’而無 須通過換穿長袍或淸除污染之站。 經濟部智慧財產局員工消費合作社印製 根據第六實施例,中央單元之無麈隔室係鄰近於屬於 不同的處理單元之無塵室。 此舉進一步加強先前實施例之優點。 根據第七實施例,中間倉庫係設於包括處理單元與中 央單元之某些單元中供晶圓之中間儲存,且輸送機構係配 置以供執行輸送單元間之晶圓,透過該等中間倉庫。 6 __ 本紙張尺度適用中國國家標準(CNS)A4規格X 297公釐) 4 9〇 經濟部智慧財產局貝工消费合作社印製 A7 B7 五、發明說明(<) 此舉導致材料管理系統設計簡化之一改良,由於處理 單元間與中央單元中之晶圓輸送係分離。將係明白的是’ 此舉簡化控制系統之設定,並因於有效率之輸送路崎指定 而導致成$5低。 根據另一實施例,分離機構係設於處理單元與中央單 元,供自動輸送介於處理機構之間的晶圓。 連同先前實施例之特徵,該種分離導致自動輸送控制 之實質簡化。 根據又一實施例,中央單元係配置用以供應有用物至 處理單元,且用以自處理單元抽取排出物。 此舉導致該等系統之明確且簡單的架構,並導致該等 有用物與排出物須作輸送的距離之大爲縮短,且因而導致 較少之材料消耗及較短之建造周期。 根據再一實施例,處理單元具有矩形之輪廓。 此特徵導致一導單的構造,預先建造的建築物與無塵 室材料以及已證明的建造方法均可使用。再者,此舉導致 各個單元之樓層平面之最佳利用。 根據另一較佳實施例,處理單元具有六邊形之輪廓。 此特徵導致可利用表面之非常好的使用,但可能並非 爲可利用結構無塵室構件(諸如天花板格子、壁牆與升高 樓板構件)之最佳使用’其大部分通常採用矩形之底座形 狀。 原則上,處理單元可具有任何隨意之形狀或者其組合 ,即使相互爲不同之形狀者。 7 本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公爱) -------------裝--------訂---------線 (請先閱讀背面之注意事項再填寫本頁) A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(ς) 在根據先前所述之生產設備的容量係不足夠之丨β況下 ,係可能使用一群至少二個根據先前界定者之生產設備。 然而,此特徵可亦運用於其中不同型式積體電路係需 有不同製程或不同順序之製程的情況時° 如同前技所習知,生產設備具有從初始前進至試驗運 轉啓始之一實質上的時間落後。鑒於積體電路具有相當短 的生命周期之事實,最重要者係使得生產設備可在當存有 對於該設備之產品的實質需求時備妥。因此,適時(tirmng )係最爲重要。將係明確的是’準備時間之縮短將可允許 投資之較佳時機。 是以,本發明亦針對於較短之準備時間3 此目標係達成在於,各個處理單元係配置以作拚裝及 安裝作爲一單獨之個體。 因此,關於建造建築物構造、無塵室有物與其他技術 提供之安裝、以及處理設備最後接線之單元實行所需的工 作、可對於各個單元而平行施行,或者可配置使得類似之 實行級係於短次序中施加至個別的單元,以提供設備之整 體實行周期的有效縮短。 根據又一實施例,連接至一處理單元之有有物的型式 、數量與品質係因單元而異^ 故僅有對於有關處理單元爲必需之連接係須作成,以 導致供應系統拓撲(topology)之簡化。 根據再一實施例,對於建築物硬度、對於振動、EMC 與危險之保護的提供係因單元而異。 8 ---------------------訂--------- (請先閱讀背面之注急事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公芨) 經濟部%慧財產局員工消費合作社印製 A7 B7 五、發明說明(t ) 正如此種單元之建造設計係調整以滿足所需之處理環 境,將可避免不必要提供物之提供。 根據再一實施例,在一處理單元之主要生產樓層之上 與之下的建造層之數目與構造性質係針對該單元中之處理 機構而調適。 此舉允許樓層係針對特定單元而配置,諸如不同數目 與型式之遠端處理裝置之分配或者有效物安裝之供給。 本發明亦關於用以建造前述型式之生產設備的一種方 法,其中該等個別之處理單元係獨立地裝配。 此種方法導致較快速建構之優點。 當一單元之後來實行級係至少部分平行於另一單元而 ‘執行時,此等優點係可加強。 隨後,本發明將藉助附圖而作闡釋,該等圖式藉由實 例描繪出本發明之實施例,其中: 第一圖係根據本發明之一種生產設備的平面圖; 第二圖係根據本發明之另一種生產設備的平面圖; 第三圖係第一圖所示之生產設備的平面圖’其中係_ 示晶圓之路徑; 第四圖係第一圖所示之生產設備的分解圖’其中係-顯 示電源、其他有用物與排出物之路徑; 第五圖係類似於第四圖之一視圖,其中係顯示用於人 員與材料之典型路徑; 第六圖係穿過根據本發明之一種生產設備的垂直截面 圖;及 ^紙張尺度適用中國國家標準(CNS)A^現格(21〇 X 297公爱 -------------^--------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 44089 0 A7 B7 經濟部智慧財產局員工消t合作社印製 五、發明說明(1 ) 第七A至E圖顯示根據本發明之生產設備的不同架構 群之平面圖。 於第一圖中,其整體以圖號1表示之一生產設備係以 平面圖顯示。如圖所示1.該生產設備分別包含一個中央單 元2以及六個處理單元3、4、5、6、7與8。 於本例中所探討者爲:一處理單元3,係配備用於支 援功能:一處理單元4,係配置用於CMP/植入功能;一 處理單元5,係配備用於薄膜處理;一處理單元6 ’係配備 用於平版刻處理;一處理單元7,係配備用於蝕刻處理; 以及一處理單元8,係配備用於擴散處理。 如第六圖所繪製,處理單元3、4與5彼此包含地上之 三個樓層100、200與300。 供處理晶圓之主要處理裝置係位於樓層200上之無塵 室中。 空調裝置係位於上層100,而遠端裝置係位於下層300 ,遠端裝置係與樓層200上之處理裝置爲連接。再者,供 分配用於處理裝置所需的有用物(如超純水或化學物)之 管線係位於下層300。 於中央單元2中,設備係配置供人員至處理單元3-8 之進出。正如處理單元3 — 8之第二樓層200之大部分者將 具有無麈室之狀態,控制至該等處理單元之人員與材料的 進出係重要的。因此,中央單元2於其第二樓層係包含一 個走廊50,其係鄰近於具有無塵室狀態之所有的處理單元 樓層。走廊50係連接至一換穿長袍及消除污染之站51, ------------I --------訂-------- (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中囷國家標準(CNS)A4規格(210 X 297公釐) 經濟部智慧財產局負工消費合作社印製 440090 A7 B7 五、發明說明(只) 其係接著連接至不具有無塵室狀態之中央部分52,於中央 部分中係位有階梯、人員與物品之電梯、以及個人設施等 〇 當位於下層300之裝置亦須進出通過一換穿長袍之站 時,一類似之設定係擬出。 第一圖顯示一個探討六個處理單元之實施例;誠然, 亦係可能運用其他數目之處理單元,例如爲八個處理單元 。再者,於此圖中所探討之處理單元均具有同爲矩形之形 狀,且尤其爲方形;誠然’係可能運用其他之形狀,甚至 是相互不同之形狀者。 第二圖顯示一個類似之實施例,其中之中央單元與處 理單元均具有六邊形之形狀,然而其他形狀係可能的。 第三圖顯示類似於第一圖之一個視圖,其中顯示用於 輸送處理中之晶圓的路徑。由此圖係淸楚看出,於中央單 元2之中係有一圓形路徑9,且於各處理單元之中係已建 立一單獨路徑10。 各個路徑10係藉著路徑11而由中央路徑9所連接。 路徑9、10係由圖中未畫出之倉庫(store)所分開。此等· 倉庫可係位於中央單元以及處理單元之中。藉著將介於單 元間以及於一單元內之輸送係隨著簡單之圖形路線且係相 互去耦合,此處理方式大爲簡化其邏輯槪念與控制。 第四圖顯示第一圖所畫實施例之一立體等角圖,其中 係顯示電源12與諸如純水之其他有用物13的路徑。此等 有用物藉由一組導管12、13而進入生產設備,於此實施例 11 ---------------------訂------t — (請先閱讀背面之注意事項再填寫未頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) A7 B7 經濟部智慧財產局貝工消费合作杜印製 五、發明說明(f) 中,導管12、13延伸通過處理單元4之下層300,並進入 中央單元2。於下層300,有用物導管係分支至所有處理單 元之下層’以供應該等有用物給位在該處之裝置。再者’ 該等導管向上延伸於中央單元2之中’且於生產設備之樓 層200,其係分支且連接至需有連接至其之處理卓兀。— 類似配置係存在於上層1〇〇’供通常位在該處之空調裝置 〇 一類似導管配置14係存在用於排出物。於最下樓層之 處理單元中的裝置將產生煙氣與排出物’在經適當處理之 後,其係分送至環境。輸送係透過一導管系統14而進行’ 導管系統14向上延伸於中央單元且係分支於適當之樓層上 〇 雖然僅畫出一個導管,正如係有數種不同型式之排出 物類別(其需有單獨之處理)’誠然,使用數個導管係爲 可能的。同樣之考量係適用於有用物導管12、13。 將係明確的是,類似之功能與導管系統係存在用於其 他有用物,諸如排水管。 中央單元之功能亦包含分配諸如原料、生產所需的少 量材料之材料、裝置與工具至處理單元’以及移除裝置與 完成產品,如第五圖中之路徑16所示°再者’如前所述’ 人員可透過中央單元而到達處理單元,如路徑15所示。 第六圖顯示第一圖所示生產設備之垂直截面圖。再次 顯示,三個樓層1〇〇、200與300共同構成處理單元。於此 例中’無塵室係位於樓層200。中央單元2、以及處理單元 12 (請先閱讀背面之注意事項再填寫本頁) ί Γ 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 經濟部智慧財產局負Η消費合作社印製 A7 B7___ 五、發明說明(\Ό) 3與5之位置係亦顯示。處理單元5係設有較密集之打樁 (pilmg) 18,相較於處理單元3之打樁19以及中央單元2 之打樁17。因此,處理單元5之處理樓層係較處理單元3 之加工樓層爲更堅固。因此,位於處理樓層5之裝置係較 不易於機械振動,使得較佳適於諸如平版印裝置之對於振 動靈敏的裝置。再者,相對於單元2與3 (其採用實心板 20與22),處理單元5之實際樓層構造包含所謂之穿孔的 板22,導致堅固構造而能允許用於延伸通過該樓板的導管 、纜線等之實質自由度,並誠然用於自該樓板移除空氣。 須注意的是,該實際層構造之上層係所謂“提高的樓層” ,提供空間供安裝纜線與導管,以及垂直輸送空氣至下方 之充滿物質的空間。 若需要時,根據本發明之數個生產設備係可群組。此 一群組之配置可視需求而變化。該等組合之數種係顯示於 第七A至七E圖中。 然而,此等組合並非視爲限制;其他可能性係可思及 -------------裝-------—訂---------線 (請先閱讀背面之注意事項再填寫本頁) 13 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)Printed by A7 .__ B7_______ of the Intellectual Property Cooperative of the Bureau of Intellectual Property of the Ministry of Economic Affairs. 5. Description of the Invention (I) The present invention relates to a production device for integrated circuits, which includes at least one clean room, which is provided with a similar wafer The raw material processing becomes the processing mechanism of the integrated circuit, and the related devices for the clean room and the processing mechanism located therein. Such production equipment is conventional. The production equipment of the prior art includes an integrated structural shell in which systems such as a processing mechanism and a utility system are provided. Under the processing mechanism and other devices are understandable. The setting of this kind of front-end equipment usually adopts the general structure choice, a single clean room and a centralized air supply. The configuration of such prior art production equipment is complicated, leading to high costs, substantial possibility of errors, and long periods of composition and implementation. It is an object of the present invention to provide a production equipment which can avoid the aforementioned defects. This purpose is achieved: the production equipment is divided into separate processing cells (cells), which are separated by walls; each processing unit includes a chamber, and each chamber is equipped with a processing mechanism for The processing needs to be performed under substantially similar conditions; each processing unit includes a related device for a clean room in the processing unit; and the related device in the processing unit is dedicated to maintain a processing device in the clean room Required conditions. The features of the present invention can lead to a device in which regional processing and environmental conditions are optimized for regional demand. In addition, the production cycle of this kind of production equipment is greatly reduced. The object of the present invention can also be achieved by a production device for integrated circuits, which includes: at least one clean room, which has been provided for processing 4 ------------- equipment -------- Order --------- Line (Please read the notes on the back before filling this page) This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) ) B7 V. Description of the invention (>) Employees of the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Cooperatives, printed materials such as wafers are integrated circuit processing institutions: and related devices used in the clean room, which are characterized by: The production equipment is divided into separate processing units separated by walls; each processing unit includes a clean room; each clean room is equipped with a processing mechanism for processing substantially similar product types; each processing unit includes related devices 'Can be in a clean room in the same processing unit; and, the supporting device in the processing unit is dedicated to maintain the conditions required for the processing device in the clean room. This embodiment is particularly applicable to a situation in which a special product is produced. This led to a substantial simplification of the design of such production equipment, and therefore a simpler route designation of supplies' materials and personnel, and a shorter construction cycle. Although the present invention in the two cases mentioned above is applicable to any ruler; ¢. The pen of the capacity * is bright, the advantages of the present invention are particularly apparent in large-scale production equipment. According to the first embodiment, each processing unit is substantially equipped with only a connection to a utility supply system required for the processing mechanism in the unit. These features result in a simple logical architecture for the utility supply system. According to a second preferred embodiment, each processing unit includes a processing device that is essentially used only to perform similar types of processing. This feature leads to a more simplified design, and various units are configured to cater for processing facilities that require similar settings and similar types and quantities of utilities (hydropower) and air replenishment. This is the 5th cause of public utility allocation ------------- install -------- order --------- line < please read the note on the back first Please fill in this page again for the matters) This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 44〇89〇_B7_ ______ — ------- --------- Description of the invention (4) is further reduced and simplified. (Please read the notes on the back before filling this page) According to the third preferred embodiment, the units are configured around a central unit, which is configured to provide personnel and materials to at least one clean room. And used to change gowning and decontamination. This design results in superior and well-controlled access to all clean rooms, which are used only for changing robes and removing pollution through a single lift in the central unit. The following materials and other processing devices, installation tools, and raw materials are understandable. Further central access is available for other parts of the processing unit that are not clean rooms. According to a fourth preferred embodiment, the central unit includes a clean room and a non-clean room, the two rooms are separated by at least one station for changing robes and removing pollution, and the clean room of the processing unit The rooms are only accessible through the ballastless compartments of the central unit. This embodiment further enhances the advantages of the previous embodiment. According to a fifth embodiment, the central unit is configured for the transportation of materials and personnel between clean rooms of different processing units. This feature has the logical advantage of a shorter and simpler path 'without the need to change robes or decontaminate stations. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs According to the sixth embodiment, the clean room of the central unit is adjacent to the clean room belonging to a different processing unit. This further enhances the advantages of the previous embodiments. According to a seventh embodiment, intermediate warehouses are provided in intermediate units for processing wafers in some units including the processing unit and the central unit, and the transport mechanism is configured to execute wafers between the transport units through these intermediate warehouses. 6 __ This paper size applies the Chinese National Standard (CNS) A4 size X 297 mm) 4 90. Printed by the Shelley Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Invention Description (<) This led to the design of the material management system An improvement on simplification due to the separation of the wafer transport system between the processing units and the central unit. It will be understood that 'this simplifies the setting of the control system and results in a low $ 5 due to the efficient delivery of Luzaki. According to another embodiment, the separation mechanism is provided in the processing unit and the central unit for automatically transferring wafers between the processing mechanisms. Together with the features of the previous embodiment, this separation leads to a substantial simplification of the automatic conveyance control. According to yet another embodiment, the central unit is configured to supply a useful substance to the processing unit, and to extract the effluent from the processing unit. This resulted in a clear and simple architecture of these systems, and resulted in a much shorter distance for the transport of useful and effluent materials, which in turn led to less material consumption and shorter construction cycles. According to a further embodiment, the processing unit has a rectangular outline. This feature results in a one-lead construction that can be used with pre-built buildings and clean room materials, as well as proven construction methods. Furthermore, this leads to the best use of the floor plan of each unit. According to another preferred embodiment, the processing unit has a hexagonal outline. This feature results in a very good use of the available surface, but may not be the best use of available structural clean room components such as ceiling lattices, wall walls and raised floor members. Most of them usually have rectangular base shapes . In principle, the processing units may have any arbitrary shape or combination thereof, even if they are different shapes from each other. 7 This paper size applies to China National Standard (CNS) A4 specification (210 x 297 public love) ------------- Installation -------- Order --------- -Line (Please read the notes on the back before filling this page) A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs V. Invention Description (ς) The capacity of the production equipment according to the previous description is insufficient 丨In the case of β, it is possible to use a group of at least two production equipment according to the previously defined ones. However, this feature can also be applied to the case where different types of integrated circuits need different processes or different processes. As is known in the art, production equipment has one of the essence from the initial advance to the start of test operation. Time lags behind. In view of the fact that the integrated circuit has a relatively short life cycle, the most important thing is to make the production equipment ready when there is a substantial demand for the product of the equipment. Therefore, tirmng is the most important. It will be clear that a reduction in 'prep time will allow for better timing of investments. Therefore, the present invention also aims at a shorter preparation time. 3 This goal is achieved in that each processing unit is configured for assembly and installation as a separate entity. Therefore, the work required for the construction of the building structure, the installation of clean room materials and other technologies, and the final wiring of the processing equipment can be performed in parallel for each unit, or it can be configured to implement a similar system Applied to individual units in a short sequence to provide effective shortening of the overall implementation cycle of the equipment. According to yet another embodiment, the type, quantity, and quality of the thing that is connected to a processing unit varies from unit to unit ^ Therefore, only the connection systems necessary for the relevant processing unit must be made to result in a topology of the supply system Simplification. According to yet another embodiment, the provision of building hardness, protection against vibration, EMC, and hazards varies from unit to unit. 8 --------------------- Order --------- (Please read the urgent notes on the back before filling this page) This paper size applies China National Standard (CNS) A4 Specification (210 X 297 Gong) Printed by the Consumer Cooperatives of the Ministry of Economic Affairs% Hui Property Bureau A7 B7 V. Invention Description (t) Just as the construction design of such a unit is adjusted to meet the required processing The environment will prevent unnecessary provision. According to yet another embodiment, the number and construction properties of the building floors above and below the main production floor of a processing unit are adapted for the processing facility in that unit. This allows floors to be configured for specific units, such as the distribution of different numbers and types of remote processing units or the provision of supplies. The invention also relates to a method for constructing the aforementioned type of production equipment, wherein the individual processing units are assembled independently. This approach leads to the advantage of faster construction. These advantages can be strengthened when the hierarchy is implemented at least partially parallel to another unit and then 'implemented'. Subsequently, the present invention will be explained with reference to the drawings, which illustrate an embodiment of the present invention by way of example, wherein: the first drawing is a plan view of a production equipment according to the present invention; the second drawing is according to the present invention The third diagram is a plan view of the production equipment shown in the first diagram 'where _ shows the path of the wafer; the fourth diagram is an exploded view of the production equipment shown in the first diagram' where the system -Shows the path of the power supply, other useful objects and discharges; the fifth diagram is a view similar to the one in the fourth diagram, which shows a typical path for people and materials; the sixth diagram is through a production according to the invention Vertical sectional view of the equipment; and ^ Paper dimensions are applicable to China National Standard (CNS) A ^ Xuange (21〇X 297 public love ------------- ^ -------- Order --------- line (please read the precautions on the back before filling out this page) 44089 0 A7 B7 Printed by the staff of the Intellectual Property Bureau of the Ministry of Economic Affairs, printed by the cooperative V. Invention description (1) Seventh A to Figure E shows a plan view of different architecture groups of the production equipment according to the invention. In the first figure, One of the production equipment is shown in plan view in Figure 1. As shown in the figure 1. The production equipment includes a central unit 2 and six processing units 3, 4, 5, 6, 7, and 8. In this example, The persons discussed in the discussion are: a processing unit 3 equipped for supporting functions: a processing unit 4 configured for CMP / implantation functions; a processing unit 5 equipped for thin-film processing; a processing unit 6 ′ A processing unit 7 is equipped for etching processing, and a processing unit 8 is used for diffusion processing. As shown in the sixth figure, the processing units 3, 4 and 5 include each other on the ground. The three floors are 100, 200, and 300. The main processing equipment for processing wafers is located in the clean room on floor 200. The air-conditioning equipment is located on the upper floor 100, and the remote equipment is located on the lower floor 300. The remote equipment is connected with The processing device on the floor 200 is connected. Furthermore, the pipeline for distributing useful materials (such as ultrapure water or chemicals) used for the processing device is located on the lower level 300. In the central unit 2, the equipment is configured for personnel To processing unit 3-8 In and out. Just as most of the second floor 200 of the processing units 3-8 will have a chamberless state, it is important to control the access of personnel and materials to these processing units. Therefore, the central unit 2 The second floor includes a corridor 50, which is adjacent to all processing unit floors in a clean room state. The corridor 50 is connected to a robe changing and decontamination station 51, ---------- --I -------- Order -------- (Please read the precautions on the back before filling in this page) This paper size is applicable to China National Standard (CNS) A4 (210 X 297) (Mm) Printed by the Consumer Goods Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 440090 A7 B7 V. Description of the invention (only) It is then connected to the central part 52 without a clean room, and there are stairs and personnel in the central part Elevators and personal facilities, etc. When a device located on the lower level 300 must also enter and exit a station wearing a robe, a similar setting is proposed. The first figure shows an embodiment that discusses six processing units; admittedly, it is also possible to use other numbers of processing units, such as eight processing units. Moreover, the processing units discussed in this figure all have the same rectangular shape, and especially a square shape; it is true that it is possible to use other shapes, or even shapes that are different from each other. The second figure shows a similar embodiment in which both the central unit and the processing unit have a hexagonal shape, but other shapes are possible. The third figure shows a view similar to the first figure, showing the path used to transport the wafer in process. This figure shows clearly that there is a circular path 9 in the central unit 2 and a separate path 10 has been established in each processing unit. Each path 10 is connected by a central path 9 via a path 11. Paths 9 and 10 are separated by a store (not shown). These · Warehouses can be located in central and processing units. By decoupling the transport system between units and within a unit with a simple graphical route and mutual decoupling, this processing method greatly simplifies its logical thinking and control. The fourth figure shows a three-dimensional isometric view of one of the embodiments drawn in the first figure, in which the path of the power source 12 and other useful objects 13 such as pure water is shown. These useful things enter the production equipment through a set of conduits 12,13. In this embodiment 11 --------------------- Order ------ t — (Please read the precautions on the back before filling in the unpaged pages) This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) A7 B7 Printed by Shellfisher Consumers Cooperation, Intellectual Property Bureau, Ministry of Economic Affairs In the description of the invention (f), the ducts 12, 13 extend through the lower layer 300 of the processing unit 4 and enter the central unit 2. At the lower level 300, the utility conduit is branched to the lower level of all the processing units' to supply the utility to the device located there. Furthermore, 'the ducts extend upward in the central unit 2' and on the floor 200 of the production equipment, they are branched and connected to a processing tower which needs to be connected to it. — A similar arrangement exists in the upper level 100 ′ for the air-conditioning unit normally located there. A similar duct arrangement 14 exists in the discharge. The devices in the processing unit on the bottom floor will produce smoke and effluents' which, after proper treatment, are distributed to the environment. Conveying is performed through a conduit system 14 'The conduit system 14 extends upwards from the central unit and branches on the appropriate floor. Although only one conduit is drawn, just as there are several different types of effluent categories (which require separate Treatment) 'Of course, it is possible to use several catheter systems. The same considerations apply to the utility conduits 12,13. It will be clear that similar functions and duct systems exist for other useful purposes, such as drains. The function of the central unit also includes the distribution of materials such as raw materials, small quantities of materials required for production, devices and tools to the processing unit, and removal of devices and finished products, as shown by path 16 in the fifth figure. The person can reach the processing unit through the central unit, as shown in path 15. The sixth figure shows a vertical sectional view of the production equipment shown in the first figure. It is shown again that the three floors 100, 200 and 300 together constitute a processing unit. In this example, the 'clean room' is located on the 200th floor. Central unit 2, and processing unit 12 (Please read the notes on the back before filling out this page) Γ Γ This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) The Intellectual Property Bureau of the Ministry of Economic Affairs is responsible for consumption Co-operative printed A7 B7___ V. Invention description (\ Ό) The positions of 3 and 5 are also displayed. The processing unit 5 is provided with relatively dense piles 18 (pilmg), compared to the piles 19 of the processing unit 3 and the piles 17 of the central unit 2. Therefore, the processing floor of processing unit 5 is stronger than the processing floor of processing unit 3. Therefore, the device located on the processing floor 5 is less susceptible to mechanical vibration, making it suitable for a vibration-sensitive device such as a lithographic printing device. Furthermore, relative to units 2 and 3 (which uses solid plates 20 and 22), the actual floor structure of processing unit 5 contains so-called perforated plates 22, resulting in a sturdy structure that permits the use of ducts, cables that extend through the floor The substantial degree of freedom of lines, etc., is used to remove air from the floor. It should be noted that the upper layer of the actual layer structure is the so-called "elevated floor", which provides space for installing cables and ducts, and vertically conveys air to the material-filled space below. If necessary, several production facilities according to the invention can be grouped. The configuration of this group can be changed as required. Several species of these combinations are shown in Figures 7A to 7E. However, these combinations are not considered limiting; other possibilities are conceivable ------------- installation ----------- order --------- line (Please read the notes on the back before filling out this page) 13 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

Claims (1)

B8年;曰脩正/ f不/補見 C8 / D8 、申請專利範圍 1 ·〜種用於積體電路之生產設備,包含: 至少〜個無塵室,其中係設有用以處理諸如晶圓之原 料成爲積體電路的處理機構;及 丰目關裝置,用於該無塵室與位在其中之處理機構; 其特徵在於: 胃生產設備係分隔爲相互分離之處理單元,係由壁所 分離; '各個處理單元均包含一個無塵室; 各個無塵室係備有處理機構,用以執行需有實質類似 條件之處理; 名·個1處理單元均包含相關裝置,用於在同一處理單元 中之該無麈室;及 於該處理單元中之相關裝置係專用以維持該無塵室中 之處理裝置所需的條件。 2 · —種用於積體電路之生產設備,包含: 少一個無塵室,其中係設有用以處理諸如晶圓之原 料成爲積體電路的處理機構;及 丰目IS裝置’用於該無塵室與位在其中之處理機構; 其特徵在於: 言亥&產設備係分隔爲相互分離之處理單元,係由壁所 分離; 各個處理單元均含一個無塵室; 各個無麈室係備有處理機構,用以處理實質類似之產 品型式; (請先閲讀背面之注意事項再填寫本頁) -3 經濟部智慧財產局員工消費合作社印製 本紙張尺度逍用中圉國家揉準(CNS } A4規格(210X297公釐) 8 8 8 8 ABCD 440890 六、申請專利範圍 各個處理單元均包含相關裝置,用於在同一處理單元 中之該無塵室;及 於該處理單元中之相關裝置係專用以維持該無塵室中 之處理裝置所需的條件。 3 ·如申請專利範圍第1項或第2項之生產設備,其 中各個處理單元係實質上僅備有至該單元中之處理機構所 需的有用物供應系統之連接 4 ·如申請專利範圍第1項或第2項之生產設備’其 中各個處理單元均僅包含供執行實質上爲類似型式之處理 的蹲理裝置。 5·如申請專利範圍第1項或第2項之生產設備’其 中該等單元係配置繞於一個中央單元,該中央單元係配置 以提供人員與材料到至少該無塵室之進出,且供換穿長袍 及淸除污染。 6 ·如申請專利範圍第5項之生產設備,其中該中央 單元包含一個無塵隔室與一個非無麈隔室,該等隔室係由 供換裝長袍及淸除污染之設施所分離,該等無塵室係僅能 透過中央單元之無塵隔室而進出》 7 ·如申請專利範圍第5項之生產設備,其中該中央 單元係配置供在污染控制條件下之不同處理單元的無塵室 之間輸送材料與人員。 8 ·如申請專利範圍第6項之生產設備,其中該中央 單元之無塵隔室係鄰近於屬於不同處理單元之無塵室。 9·如申請專利範圍第7項或第8項之生產設備,其 2 本紙張尺度適用中國國家揉舉(CNS > A4规格(210XW7公釐) (請先閲讀背面之注意事項再填寫本頁) r T 經濟部智慧財產局員工消費合作社印製B8 years; said amended / f not / see C8 / D8, patent application scope 1 ~ ~ production equipment for integrated circuits, including: at least ~ clean room, which is used to handle such as wafers The raw materials become the processing mechanism of the integrated circuit; and the Fengmuguan device for the clean room and the processing mechanism located therein; characterized in that the stomach production equipment is separated into processing units separated from each other, Separate; 'Each processing unit includes a clean room; each clean room is equipped with a processing mechanism to perform processing that requires substantially similar conditions; each processing unit contains related devices for the same processing The clean room in the unit; and related devices in the processing unit are dedicated to maintain the conditions required for the processing device in the clean room. 2 · A kind of production equipment for integrated circuits, including: at least one clean room, which is provided with a processing mechanism for processing raw materials such as wafers to become integrated circuits; and Fengme IS device 'for the The dust chamber and the processing mechanism located therein are characterized by: Yanhai & production equipment is separated into separate processing units separated by walls; each processing unit includes a clean room; each clean room system There are processing agencies for processing similar product types. (Please read the precautions on the back before filling out this page.) -3 This paper is printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. CNS} A4 specification (210X297 mm) 8 8 8 8 ABCD 440890 VI. Patent application scope Each processing unit includes related devices for the clean room in the same processing unit; and related devices in the processing unit It is dedicated to maintain the conditions required for the processing device in the clean room. 3 · If the production equipment in the scope of patent application item 1 or item 2, each processing unit is real Only the useful material supply system connection required to the processing organization in the unit is provided on the unit. Type of squatting device for processing. 5. If the production equipment in the scope of patent application item 1 or item 2 'where these units are configured around a central unit, the central unit is configured to provide personnel and material to In and out of the clean room, and for changing robes and decontamination. 6 · If the production equipment in the scope of patent application No. 5, where the central unit contains a clean room and a non-clean room, the partition The rooms are separated by facilities for changing robes and removing pollution. These clean rooms can only enter and exit through the clean room of the central unit. "7 · If the production equipment in the scope of the patent application No. 5, where The central unit is configured to transfer materials and personnel between the clean rooms of different processing units under pollution control conditions. 8 · If the production equipment of the scope of patent application No. 6, where the central unit has no The compartment is adjacent to the clean room belonging to different processing units. 9 · If the production equipment in the scope of patent application No. 7 or No. 8 is used, the 2 paper sizes are applicable to the Chinese national standard (CNS > A4 specifications (210XW7) (%) (Please read the notes on the back before filling out this page) r T Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 六、申請專利範圍 (請先閣讀背面之注意事項存填寫本貰) 中包括處理單元與中央單元之至少一些單元中係配置供晶 圓之中間儲存的中間倉庫,且輸送機構係配置用以執行透 過中間倉庫之介於單元間的晶圓輸送。 .1 0 ·如申請專利範圍第8項之生產設備,其中於中 央單元與分離的處理單元之中係設有機構,供介於處理機 構間之可能自動輸送。 1 1 ·如申請專利範圍第5項之生產設備,其中該中 央單元係配置供有用物至處理單元之中央供應,並且供自 處理單元之排出物之中央抽取。 1 2 ·如申請專利範圍第χ項或第2項之生產設備’ 其中該等處理單元具有矩形之平面。 ,1 3 ·如申請專利範圍第1項或第2項之生產設備’ 其中該等處理單元具有六邊形之平面。 1 4 ‘如申請專利範圍第1項或第2項之生產設備’ 其中各個處理單元係配置以拼裝及安裝爲一單獨個體。 經濟部智慧財產局員工消費合作社印製 1 5 _如申請專利範圍第1項或第2項之生產設備, 其中連接至一個處理單元之有用物的型式、品質與數量係 因處理單元而異。 16·如申請專利範圍第1項或第2項之生產設備, 其中供建造堅固性以及供防護振動、EMC與危險之提供物 係因處理單元而異。 17·如申請專利範圍第1項或第2項之生產設備, 其中在一個處理單元之主要生產樓層下方與上方之建造層 的數目與構造性質係針對該單元中之處理機構而調適。 3 本紙張逋用中國®家棣卒(CNS)从胁(21())<297公潼)Sixth, the scope of patent application (please read the notes on the back of the document first and fill out this note). At least some of the processing unit and the central unit are intermediate warehouses configured for intermediate storage of wafers, and the transport mechanism is configured to Perform wafer transfer between cells through an intermediate warehouse. .1 0 · If the production equipment in the scope of patent application No. 8 has a mechanism between the central unit and the separate processing unit, it may be automatically transported between the processing units. 1 1 · If the production equipment in the scope of the patent application No. 5, wherein the central unit is configured for the central supply of useful materials to the processing unit, and for the central extraction of the effluent from the processing unit. 1 2 · If the production equipment in the scope of application for item χ or 2 of the patent application ’, where the processing units have a rectangular plane. 1 3 · If the production equipment in the scope of patent application item 1 or item 2 ', where the processing units have a hexagonal plane. 1 4 'Production equipment such as item 1 or 2 of the scope of patent application' wherein each processing unit is configured to be assembled and installed as a single entity. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 1 5 _If the production equipment in the scope of the patent application is the first or second item, the type, quality and quantity of useful objects connected to a processing unit vary depending on the processing unit. 16. If the production equipment in the scope of patent application item 1 or item 2, where the ruggedness and protection against vibration, EMC, and hazards are provided depending on the processing unit. 17. If the production equipment of item 1 or 2 of the scope of patent application is applied, the number and construction properties of the construction floors below and above the main production floor of a processing unit are adapted for the processing institution in the unit. 3 This paper uses China® Housekeeping (CNS) Congxue (21 ()) < 297 Gong
TW088108651A 1998-03-11 1999-05-26 Production facility for integrated circuits TW440890B (en)

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JPH03291436A (en) * 1990-04-05 1991-12-20 N M B Semiconductor:Kk Clean room of semiconductor manufacturing factory
US5344365A (en) * 1993-09-14 1994-09-06 Sematech, Inc. Integrated building and conveying structure for manufacturing under ultraclean conditions
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