TW430827B - Resistors with low temperature coefficient of resistance and methods of making - Google Patents

Resistors with low temperature coefficient of resistance and methods of making

Info

Publication number
TW430827B
TW430827B TW88107567A TW88107567A TW430827B TW 430827 B TW430827 B TW 430827B TW 88107567 A TW88107567 A TW 88107567A TW 88107567 A TW88107567 A TW 88107567A TW 430827 B TW430827 B TW 430827B
Authority
TW
Taiwan
Prior art keywords
resistance
low temperature
temperature coefficient
making
resistors
Prior art date
Application number
TW88107567A
Other languages
English (en)
Inventor
Chandra Venkatraman
Original Assignee
Advanced Refractory Tech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Refractory Tech filed Critical Advanced Refractory Tech
Application granted granted Critical
Publication of TW430827B publication Critical patent/TW430827B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/06—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material including means to minimise changes in resistance with changes in temperature

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Vapour Deposition (AREA)
  • Thermistors And Varistors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Non-Adjustable Resistors (AREA)
TW88107567A 1998-05-22 1999-05-11 Resistors with low temperature coefficient of resistance and methods of making TW430827B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8354898A 1998-05-22 1998-05-22

Publications (1)

Publication Number Publication Date
TW430827B true TW430827B (en) 2001-04-21

Family

ID=22179048

Family Applications (1)

Application Number Title Priority Date Filing Date
TW88107567A TW430827B (en) 1998-05-22 1999-05-11 Resistors with low temperature coefficient of resistance and methods of making

Country Status (5)

Country Link
EP (1) EP1084500A4 (zh)
JP (1) JP2002517084A (zh)
AU (1) AU4084999A (zh)
TW (1) TW430827B (zh)
WO (1) WO1999062077A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9113546B2 (en) 2012-09-10 2015-08-18 Kabushiki Kaisha Nihon Micronics Method for manufacturing electric film body
TWI612538B (zh) * 2016-08-03 2018-01-21 國立屏東科技大學 薄膜電阻合金

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3555844B2 (ja) 1999-04-09 2004-08-18 三宅 正二郎 摺動部材およびその製造方法
AU2001253575A1 (en) * 2000-04-18 2001-10-30 E-Ink Corporation Process for fabricating thin film transistors
DE10058581C1 (de) * 2000-11-18 2002-03-14 Fraunhofer Ges Forschung Elektromechanisch regelbares elektrisches Widerstandselement
US6969198B2 (en) 2002-11-06 2005-11-29 Nissan Motor Co., Ltd. Low-friction sliding mechanism
JP4863152B2 (ja) 2003-07-31 2012-01-25 日産自動車株式会社 歯車
US7771821B2 (en) 2003-08-21 2010-08-10 Nissan Motor Co., Ltd. Low-friction sliding member and low-friction sliding mechanism using same
US7165830B2 (en) 2004-05-14 2007-01-23 Lexmark International, Inc. Resistor protective layer for micro-fluid ejection devices
CN115632048B (zh) * 2022-09-23 2023-08-01 北京科技大学 一种具有纳米金刚石钝化层的TaN薄膜电阻器及其制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5352493A (en) * 1991-05-03 1994-10-04 Veniamin Dorfman Method for forming diamond-like nanocomposite or doped-diamond-like nanocomposite films
US5786068A (en) * 1991-05-03 1998-07-28 Advanced Refractory Technologies, Inc. Electrically tunable coatings
ES2130212T3 (es) * 1992-06-16 1999-07-01 Koninkl Philips Electronics Nv Capa de resistencia electrica.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9113546B2 (en) 2012-09-10 2015-08-18 Kabushiki Kaisha Nihon Micronics Method for manufacturing electric film body
TWI612538B (zh) * 2016-08-03 2018-01-21 國立屏東科技大學 薄膜電阻合金

Also Published As

Publication number Publication date
EP1084500A1 (en) 2001-03-21
JP2002517084A (ja) 2002-06-11
EP1084500A4 (en) 2005-08-17
WO1999062077A1 (en) 1999-12-02
AU4084999A (en) 1999-12-13

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Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees