TW419710B - Electrification neutralizing device for floating conveyance apparatus and floating conveyance system - Google Patents
Electrification neutralizing device for floating conveyance apparatus and floating conveyance system Download PDFInfo
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- TW419710B TW419710B TW88113943A TW88113943A TW419710B TW 419710 B TW419710 B TW 419710B TW 88113943 A TW88113943 A TW 88113943A TW 88113943 A TW88113943 A TW 88113943A TW 419710 B TW419710 B TW 419710B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/063—Transporting devices for sheet glass
- B65G49/064—Transporting devices for sheet glass in a horizontal position
- B65G49/065—Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G51/00—Conveying articles through pipes or tubes by fluid flow or pressure; Conveying articles over a flat surface, e.g. the base of a trough, by jets located in the surface
- B65G51/02—Directly conveying the articles, e.g. slips, sheets, stockings, containers or workpieces, by flowing gases
- B65G51/03—Directly conveying the articles, e.g. slips, sheets, stockings, containers or workpieces, by flowing gases over a flat surface or in troughs
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/02—Controlled or contamination-free environments or clean space conditions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/04—Arrangements of vacuum systems or suction cups
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/04—Arrangements of vacuum systems or suction cups
- B65G2249/045—Details of suction cups suction cups
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
ι〇 丨· 五、發明說明α) 發明所屬技術領域 本發明係有關於浮起搬運 起搬運系，統’藉著對板狀基體 浮起之狀態後，在該狀態令板 轉換方向之情況，利用碰撞板 帶電時可將該板狀基體之帶電 於氣流搬運形成在液晶顯示器 裝置之晶片等之浮起搬運系 裝置用之帶電中和裝置及浮 嘴出斌》體而將板狀基體設為 狀基體移動 '停止、靜止及 狀基體之氣體，在板狀基體 完全中和。本發明很適合用 等使用之之玻璃板或半導體 習知技術 在7板狀基體浮起之搬運系統上例如有搬運^^了型液 晶顯不器用之玻璃板的。該搬運系統如圖丨2所示。該搬運 系統係由移送單元1 〇 〇和控制單元2 〇 〇組合而成的。移送單 元100令四角形之玻璃板30〇浮起後向移動方向31〇方向移 動。控制單元200在令玻璃板3〇〇浮起之狀態令停止、靜止 而且令向轉換方向311轉換方向。此外，搬運系統具有對 於玻璃板300進行各種處理之處理單元，但是省略圖示。 移送單元100為了令玻璃板300直線移動，一般連結使 用。該移送單元100之一例如圖13所示。移送單元1〇〇具有 基座110和包圍用構件120。在基座11〇進行供給用以令玻 璃被30 0浮起之氣體例如不影響玻璃板300之氮氣、氬氣或 其他氣體之供給系111之配管。包圍用構件120覆蓋之基座 110之面112係搬運路之搬運面，在搬運面112鑽複數噴出 孔113。ι〇 丨 · V. Description of the Invention α) Field of the Invention The present invention relates to a floating conveying system, and a system for changing the direction of a plate in the state after the plate-like substrate is floated. When the collision plate is charged, the plate-like substrate can be charged and air-flowed to form a plate-like substrate. The plate-like substrate can be set as a charging neutralization device and a floating nozzle for a floating conveyance system such as a wafer of a liquid crystal display device. The substrate-like substrate moves' stopped, stopped, and the substrate-like gas is completely neutralized in the plate-like substrate. The present invention is very suitable for use with glass plates or semiconductors, and other conventional techniques. For example, there are glass plates used for transporting liquid crystal display devices on a 7-plate-like substrate lifting system. The handling system is shown in Figure 丨 2. The handling system is a combination of a transfer unit 100 and a control unit 2000. The transfer unit 100 causes the quadrangular glass plate 30 to float, and then moves to the moving direction 31. The control unit 200 stops and stops the glass plate 300 in a floating state, and switches the direction to the switching direction 311. The conveyance system includes processing units for performing various processes on the glass plate 300, but the illustration is omitted. In order to move the glass plate 300 linearly, the transfer unit 100 is generally connected and used. One example of the transfer unit 100 is shown in FIG. 13. The transfer unit 100 includes a base 110 and a surrounding member 120. The piping of the supply system 111 for supplying a gas for causing the glass to be floated to 300, for example, nitrogen, argon, or other gas that does not affect the glass plate 300 is supplied to the base 110. The surface 112 of the base 110 covered by the surrounding member 120 is a conveyance surface of a conveyance path, and a plurality of ejection holes 113 are drilled in the conveyance surface 112.
419710 五、發明說明（2) 喷出孔1 1 3如圖1 4所示，相對於搬運面1 1 2傾斜設置， 噴出孔113之傾斜方向朝向玻璃板300之移動方向310之中 心1 1 2A傾斜。又，除了喷出孔1 1 3以外，如圖25所示，推 進用喷出孔115和玻璃板300之移動方向310平行排列，而 且鑽成相對於搬運面112傾斜。在自搬運面112至氣體室 114、116之間鑽噴出孔113、115。氣體室114、116各自和 供給系11 1相通。 利用各噴出孔11 3、1 1 5供給供給系111之氣體經由氣 體室114、116由喷出孔113、115噴出。來自噴出孔113、 115之氣體之噴出方向相對於搬運面11 2向斜上方傾斜，而 且相對於移動方向310，喷出孔113成直角，噴出孔115成 平行。利用圖16之噴出方向11 3A、11 5A在平面上表示這種 氣體之噴出。 照這樣’玻璃板300利用自各喷出孔11 3 ' 1 1 5向喷出 方向11 3A、Η 5A喷出之氣體浮起而向移動方向31〇移動， 同時因玻璃板3 0 0之中心沿著搬運面11 2之中心1 1 2 Α移動， 玻璃板3 0 0之側面不會接觸包圍用構件丨2 〇之側壁。即，玻 璃板3 0 0以相對於搬運面丨丨2或包圍用構件丨2 〇非接觸之狀 態移動。 控制單元200收取自移送單元1〇〇送來之破璃板3Q0， 進行邊玻璃板3〇〇之停止、靜止及移動方向之變更或玻璃 板300本身之轉動等。控制單元2〇〇如圖17所示，具有基座 210和包圍用構件2 20。在包圍用構件22 0和基座11〇 —樣地 進行供給闬以令玻璃板3 〇〇浮起之氣體之供給系211之配419710 V. Description of the invention (2) The ejection hole 1 1 3 is inclined with respect to the conveying surface 1 12 as shown in FIG. 1. The oblique direction of the ejection hole 113 faces the center of the moving direction 310 of the glass plate 1 1 2A. tilt. In addition to the ejection holes 1 1 3, as shown in FIG. 25, the ejection holes 115 for pushing and the moving direction 310 of the glass plate 300 are arranged in parallel and drilled so as to be inclined with respect to the conveying surface 112. Ejection holes 113 and 115 are drilled from the conveying surface 112 to the gas chambers 114 and 116. Each of the gas chambers 114 and 116 communicates with the supply system 111. The gas supplied to the supply system 111 through the respective ejection holes 11 3, 1 1 5 is ejected from the ejection holes 113, 115 through the gas chambers 114, 116. The ejection direction of the gas from the ejection holes 113 and 115 is inclined obliquely upward with respect to the conveying surface 112, and the ejection hole 113 is at a right angle with respect to the moving direction 310, and the ejection holes 115 are parallel. The ejection directions 11 3A and 11 5A of FIG. 16 are used to show the ejection of this gas on a plane. In this way, the glass plate 300 moves toward the moving direction 31 ° by using the gas ejected from the respective discharge holes 11 3 ′ 1 1 5 in the discharge direction 11 3A, Η 5A, and at the same time the center of the glass plate 300 0 It moves toward the center 1 1 2 A of the conveying surface 11 2 so that the side surface of the glass plate 3 0 0 does not contact the side wall of the enclosing member 2 2 0. That is, the glass plate 300 is moved in a non-contact state with respect to the conveying surface 丨 2 or the surrounding member ② 2. The control unit 200 receives the broken glass plate 3Q0 sent from the transfer unit 100, and stops, stops, changes the moving direction of the side glass plate 300, or rotates the glass plate 300 itself. As shown in FIG. 17, the control unit 200 includes a base 210 and a surrounding member 2 20. The supply system 211 is configured to supply the enclosing member 22 0 and the base 11 10 in a similar manner, so that the glass plate 3 00 floats.
4Ϊ97Ι0 _ 五、發明說明（3) 管。包圍用構件220覆蓋之基座210之面212係搬運路之搬 運面’在搬運面2 1 2鑽吸引孔和複數噴出孔。 在搬運面21 2之中心鑽吸引孔2 1 3，如圖1 8所示。吸引 孔213吸入中心附近之氣體，在令玻璃板3〇〇浮起下令靜 止。在吸引孔2 1 3之周圍自内側依次設定設定線2 21〜2 2 4。 又，在設定線222鑽喷出孔216。喷出孔216和喷出孔 113 —樣地鑽成相對於搬運面212斜上方，但是氣體之喷出 方向係反時鐘方向之喷出方向21 6A。玻璃板3 00利用來自 嘴出孔216之氣體朝時鐘方向轉動。 在設定線221、223、224鑽喷出孔214、217、218。噴 出孔214、217、218和喷出孔113 —樣地鑽成相對於搬運面 212斜上方。來自喷出孔214、217、218之氣體往朝向吸引 口 213之喷出方向214A、217A、218A喷出。利用來自喷出 方向21 4A、217A、218A之氣體，玻璃板3 0 0之中心位於吸 引口 21 3。 此外’在控制單元2 00，在各2列之設定線2 25、226鑽 玻璃板300之推進及捕捉用之噴出孔251〜253。噴出孔251 朝方向係和玻璃板300之移動方向310反向180度之喷出方 向251A噴出氣體，喷出孔252朝方向係和移動方向310相同 之喷出方向252A喷出氣體。 喷出孔253朝方向係和玻璃板300之轉換方向311相同 之喷出方向253A喷出氣體。 玻璃板300自移動方向310進入控制單元2〇〇時，喷出 孔215朝和移動方向310相反之方向噴出氣體。藉此，玻璃4Ϊ97Ι0 _ 5. Description of the invention (3) Tube. The surface 212 of the base 210 covered by the enclosing member 220 is a conveyance surface of the conveyance path, and a suction hole and a plurality of ejection holes are drilled in the conveyance surface 2 1 2. Drill a suction hole 2 1 3 in the center of the conveying surface 21 2, as shown in FIG. 18. The suction hole 213 sucks in the gas near the center, and makes the glass plate 300 float to stop. The setting lines 2 21 to 2 2 4 are sequentially set from the inside around the suction holes 2 1 3. In addition, an ejection hole 216 is drilled in the setting line 222. Ejection hole 216 and ejection hole 113—The sample is drilled obliquely upward with respect to the conveying surface 212, but the ejection direction of the gas is the ejection direction 21 6A in the counterclockwise direction. The glass plate 300 is rotated in the clock direction by the gas from the mouth outlet 216. The ejection holes 214, 217, and 218 are drilled at the setting lines 221, 223, and 224. The ejection holes 214, 217, 218 and the ejection hole 113 are drilled obliquely above the conveying surface 212. The gases from the ejection holes 214, 217, and 218 are ejected in the ejection directions 214A, 217A, and 218A toward the suction port 213. With the gas from the ejection directions 21 4A, 217A, and 218A, the center of the glass plate 300 is located at the suction inlet 21 3. In addition, in the control unit 2000, the setting lines 2 25 and 226 in each two rows are drilled with ejection holes 251 to 253 for advancing and capturing the glass plate 300. The ejection hole 251 ejects gas in an ejection direction 251A which is 180 degrees in the direction opposite to the moving direction 310 of the glass plate 300, and the ejection hole 252 ejects gas in an ejection direction 252A in the same direction as the moving direction 310. The ejection hole 253 ejects the gas in the ejection direction 253A, which is the same direction as the transition direction 311 of the glass plate 300. When the glass plate 300 enters the control unit 200 from the moving direction 310, the ejection hole 215 ejects gas in a direction opposite to the moving direction 310. With this, glass
4】97t〇 五、發明說明（4) ， 板3 0 0利用所喷出之氣體之減速作用捕捉，圚滑地停在搬. 運面212之中心。因而，玻璃板3〇〇之靜止、轉動動作圓 滑。例如’在玻璃板300朝轉換方向311轉換方向之情況， 喷出孔2 53噴出氣體。藉此，玻璃板3〇〇朝轉換方向311推 利用這樣的動作轉換玻璃板300之方向。此外，在朝 和移動方向310相同之方向送出玻璃板3 〇〇之情況，噴出孔 252喷出氣體。 藉著組合由這種移送單元1 〇〇和控制單元2〇〇構成之搬 運系統與各種處理單元建立玻璃板3 〇 〇之處理系統。 可是’搬運系統之移送單元1〇〇和控制單元2〇〇為了搬 運玻璃板300，向玻璃板300喷出氣體，該氣體碰撞玻璃板 3〇〇時’玻璃板300因摩擦產生靜電而帶電。由於該帶電之 影響’處理單元之處理就受到帶電影響。又，在玻璃板 300形成電路圖形等時，由於來自3〇〇之放電’電路圖形受 到破壞。 為了消除這種帶電所引起之電荷，有在國際專利申請 號碼PCT/JP9 1 /0 1 469所示之技術。若依據該技術，在移送 單元1〇〇之包圍用構件120之頂部設置圖19所示之帶電中和 器2 30。帶電中和器230產生正離子或負離子，並將這些離 =碰撞玻璃板30 0。因而，中和帶電之玻璃板3〇〇 ^在控制 單兀200也和移送單元1〇〇 一樣的可設置帶電中和器23〇。 可是，該帶電消除技術有如下之問題。即，移送單元 100令玻璃板300自搬運面Π2浮起，但是此時玻璃板3〇〇利 4197 10___ 五、發明說明（5) ' 用噴出氣體只浮起約0. 2〜〇. 5mm。因而’利用帶電中和器. 230含有正離子或負離子之氣體充分供應玻璃板300之上面 ' 301 °可是’因和搬運面112相向之面’即玻璃板300之下 -面302和搬運面112之間隔窄’在下面302側含有正離子或 負離子之氣體難繞入，在玻璃板300之下面302側’未充分 供應含有正離子或負離子之氣體。因此’無法完全中和滯 留於玻璃板300之下面302之電荷。 在控制單元20 0設置了帶電中和器230之情況也一樣的 無法完全中和滞留於玻璃板300之背面之電荷。 - 如上述所示，若利用習知之帶電中和技-術，有如下之 問題點。即，藉著板狀基體之浮起搬運該板狀基體之情 況，板狀基體只浮起約0 . 2〜0. 5mm。因而，因無法充分供 應板狀基體之背面含有正離子或負離子之氣體，有無法完 全中和板狀基體之背面之帶電。 發明所欲解決之課題 本發明之目的在於提供一種浮起搬運裝置用之帶電中 和裝置及浮起搬運系統’藉著對板狀基體喷出氣體而將板 狀基^設為浮起之狀態後，在該狀態令板狀基體移動、停 止、靜止及轉換方向之情況’利用碰撞板狀基體之氣體’ 在板狀基體帶電時可將該板狀基體之帶電完全中和。 用以解決課題之手段 本發明之洋起搬運裝置用之帶電中和裝置，係關於在4] 97t〇 V. Description of the invention (4), the board 3 0 0 is captured by the deceleration effect of the ejected gas, and stops smoothly at the center of the moving surface 212. Therefore, the glass plate 300 has a stationary and smooth turning operation. For example, when the glass plate 300 is switched in the switching direction 311, the spray holes 2 53 spray gas. Thereby, the glass plate 300 is pushed in the switching direction 311, and the direction of the glass plate 300 is switched by such an operation. When the glass plate 300 is sent out in the same direction as the moving direction 310, the gas is ejected from the ejection hole 252. By combining a transport system consisting of such a transfer unit 1000 and a control unit 200 with various processing units, a processing system of glass plate 300 is established. However, in order to transport the glass plate 300, the transfer unit 100 and the control unit 200 of the 'handling system eject gas toward the glass plate 300. When the gas collides with the glass plate 300, the glass plate 300 is charged by static electricity generated by friction. Due to the influence of the charging, the processing of the processing unit is affected by the charging. When a circuit pattern or the like is formed on the glass plate 300, the circuit pattern is damaged due to a discharge from 300. In order to eliminate the charge caused by such charging, there is a technique shown in International Patent Application No. PCT / JP9 1/0 1 469. According to this technique, a charging neutralizer 2 30 shown in Fig. 19 is provided on the top of the surrounding member 120 of the transfer unit 100. The charged neutralizer 230 generates positive ions or negative ions and strikes these glass plates 300. Therefore, the neutralized and charged glass plate 300 can be provided with the charged neutralizer 23 in the same way as the transfer unit 100. However, this charging elimination technique has the following problems. That is, the transfer unit 100 floats the glass plate 300 from the carrying surface Π2, but at this time, the glass plate 300 〇 利 4197 10___ V. Description of the invention (5) ′ Only about 0.2 to 0.5 mm with the ejected gas. Therefore, 'using a neutralizer. 230 gas containing positive or negative ions is sufficient to supply the upper surface of the glass plate 300' 301 °, but 'the surface opposite the conveying surface 112', that is, the surface below the glass plate 300-the surface 302 and the conveying surface 112 A narrow interval is difficult to get into the gas containing positive ions or negative ions on the lower surface 302 side, and the gas containing positive ions or negative ions is not sufficiently supplied on the lower 302 side of the glass plate 300. Therefore, 'the charge remaining on the lower surface 302 of the glass plate 300 cannot be completely neutralized. The same applies to the case where the control unit 200 is provided with the charging neutralizer 230, which cannot completely neutralize the charge remaining on the back surface of the glass plate 300. -As shown above, if the conventional neutralization technique is used, there are the following problems. 5mm。 That is, in the case of carrying the plate-like substrate by floating the plate-like substrate, the plate-like substrate only floats about 0.2 to 0.5 mm. Therefore, since the gas containing positive ions or negative ions on the back surface of the plate-shaped substrate cannot be sufficiently supplied, the charge on the back surface of the plate-shaped substrate cannot be completely neutralized. Problems to be Solved by the Invention The object of the present invention is to provide a charging neutralization device and a floating conveying system for a floating conveying device. The plate-shaped substrate is brought into a floating state by ejecting gas to the plate-shaped substrate. Then, when the plate-like substrate is moved, stopped, stationary, and switched in this state, 'the gas that collides with the plate-like substrate' can be completely neutralized when the plate-like substrate is charged. Means for solving the problem The charging neutralization device used in the ocean lifting conveying device of the present invention relates to
第8頁 ^*971〇 五、發明說明（6) 利两自於搬運面之複數噴出孔喷出之氣體在令板狀基體浮 起之狀態搬運之浮起搬運裝置所設置之浮起搬運裝置用之 帶電中和裂置’其特徵在於包括：槽部，設置於該搬運 面’以及帶電中和部，設於該槽部而且自該槽部向該搬運 面上之搬運空間輪出將該氣體離子化之電磁波。 浮起搬運裝置向板狀基體喷射氣體，板狀基體自搬運 面只稍微浮起。此時’因氣體噴在板狀基體，板狀基體帶 電0 若利用該構造，因自設於搬運面之槽部輸出電磁波， 受到電磁波照射之搬運面上之搬運空間之氣體離+化。此 時’因位於搬運面和板狀基體之下面之窄空間之氣體利用 自槽部照射之電磁波確實離子化，可將和搬運面相向之板 狀基體之下面之帶電完全中和。又，因在板狀基體之上面 側存在多量利用電磁波而離子化之氣體，板狀基體之上面 之帶電也可完全中和。 一種夺起搬運裝置用之帶電中和裝置，係關於在具備 設於搬運面之複數噴出孔並利用自該噴出孔喷出之氣體在 令板狀基體洋起之狀態搬運之浮起搬運裝置所設置之浮 搬運裝置用之帶電中和裝置，其特徵在於包括：帶電中和 孔，設於該搬運面之至少1個；以及帶電中和部，娣由玆 帶電中和孔令向該搬運面上之搬運空間喷出離子以 又’本發明之浮起搬運裝置用之帶電令和裝置，係關 於在具備設於搬運面之複數噴出孔並利用自該喷出孔噴出 之氣體在令板狀基體浮起之狀態搬運之浮起搬運裝置所設Page 8 ^ * 971〇 V. Description of the invention (6) A floating handling device provided by a floating handling device that facilitates the gas discharged from a plurality of ejection holes on the carrying surface to carry the board-like substrate in a floating state. The charged neutralization splitting device is characterized by including a groove portion provided on the conveying surface and a charged neutralization portion provided on the groove portion and rotating the conveying space from the groove portion to the conveying space on the conveying surface. Electromagnetic waves of gas ionization. The floating conveying device sprays gas onto the plate-like substrate, and the plate-like substrate floats only slightly from the conveying surface. At this time, 'the gas is sprayed on the plate-shaped substrate, and the plate-shaped substrate is charged. If this structure is used, since the grooves provided on the conveying surface output electromagnetic waves, the gas in the conveying space on the conveying surface irradiated with electromagnetic waves is ionized. At this time, because the gas located in the narrow space below the conveying surface and the plate-shaped substrate is ionized by electromagnetic waves radiated from the groove portion, the charge under the plate-shaped substrate facing the conveying surface can be completely neutralized. In addition, since a large amount of gas ionized by electromagnetic waves exists on the upper surface of the plate-shaped substrate, the charge on the plate-shaped substrate can be completely neutralized. The utility model relates to a charging and neutralizing device for picking up a conveying device, and relates to a floating conveying device provided with a plurality of ejection holes provided on a conveying surface and using a gas ejected from the ejection holes to convey a plate-like substrate in a state of being raised. The charging neutralization device for the floating transportation device provided is characterized in that it includes: a charging neutralization hole provided on at least one of the transportation surface; and a charging neutralization portion, and the charging neutralization hole is provided to the transportation surface. The charging order and device for ejecting ions from the above-mentioned conveying space are used for the floating conveying device of the present invention, which are provided with a plurality of ejection holes provided on the conveying surface and use the gas ejected from the ejection holes to form a plate-like shape. Provided by a floating conveying device for carrying the substrate in a floating state
第9頁 4 19 7 1〇 五、發明說明（7) . 置之浮起搬運裝置用之帶電中和裝置，其特徵在於：設有 向該喷出孔注入離子之帶電中和部。 若利用該構造’因自搬運面之帶電中和孔或噴出孔向 板狀基體喷離子化之氣體，可中和板狀基體之下面之帶 電。又，藉著喷出離子化之氣體，在上面側存在多量之離 子化之氣體’利用該氣體也可完全中和板狀基體之上面之 帶電。 本發明之浮起搬運系統，係關於由具備設於搬運面之 複數喷出孔並利用自該喷出孔噴出之氣體在令板狀基體浮 起之狀fe直線移動之移送單元、及具備設於搬運面之複數 喷出孔並利用自該嘴出孔噴出之氣體在令板狀基體浮起之 狀態進们停止、靜止以及方向轉換之至少一種之控制單元 組合而成之浮起搬運系統，其特徵在於：在該移送單元設 置了如申请專利範圍第1項至第4項之浮起搬運裝置用之帶 電中和裝置。 本發月之浮起搬運系统，係關於由具備設於搬運面之 複數喷*孔並利用自該噴出孔喷出之氣體在令板狀基體浮 起之狀態直線移動之移送單元、及具備設於搬運面之 喷出孔並巧用自該噴出孔噴出之氣體在令板狀基體浮起之 狀態進订停止、靜止以及方向轉換之至少一種之控制 組合而成之浮起搬運系統，其特徵在於：在該控制單 置了如申請專利範圍第1項至第4項之浮起搬 ς 電中和裝置。 I用之帶 若利用該構造’在移送單元或控制單元設置了浮起搬Page 9 4 19 7 10.5. Description of the invention (7). The charged neutralization device used for the floating lifting device is characterized by being provided with a charged neutralization portion for injecting ions into the ejection hole. If this structure is used, the ionized gas is sprayed onto the plate-like substrate due to the charged neutralization holes or the ejection holes from the carrying surface, so that the charge under the plate-like substrate can be neutralized. Furthermore, by ejecting the ionized gas, a large amount of ionized gas is present on the upper surface side, and the charge on the upper surface of the plate-shaped substrate can be completely neutralized by the gas. The floating conveying system of the present invention relates to a transfer unit provided with a plurality of ejection holes provided on a conveying surface and linearly moving a plate-shaped substrate by using gas ejected from the ejection holes, and A floating conveying system composed of a plurality of control units for the ejection holes on the conveying surface and using at least one of the control units for stopping, stationary and changing the direction of the plate-like substrate using the gas ejected from the nozzle ejection holes, It is characterized in that the transfer unit is provided with a charging neutralization device for a floating handling device such as the first to fourth items in the scope of patent application. The floating conveying system of this month relates to a conveying unit provided with a plurality of ejection holes provided on the conveying surface and linearly moving the plate-shaped substrate by using gas ejected from the ejection holes, and A floating conveying system formed by combining and controlling at least one of the ejection hole on the conveying surface and the gas ejected from the ejection hole in a state where the plate-shaped substrate is floated to stop, stand still, and change direction. The reason is that the control unit is provided with a floating neutralizing device such as the first to fourth items in the scope of patent application. I use the belt. If this structure is used, a floating lift is installed in the transfer unit or control unit.
第〗0頁 五、發明說明（8) --r 運裝置用之帶電中和裝置。此時例如，在位於處理板狀基‘ 體之下—處理裝置等之前之移送單元或控制單元設置浮起 搬運裝置用之帶電中和裝置時，因在處理裝置正前中和板 狀基體之帶電，可防止在下—處理發生帶電之影響。 發明之實施例 以下參照圖面詳述本發明之實施例。 實施例1 ，實施例1，圖1 2所示浮起搬運系統中之移送單元丨〇 〇 使用圖1所示移送單元A。移送單元人具備基座】、包圍用椽 件2以及帶電中和裝置3。此外’因包圍用構件2和圖13之 包圍用構件1 20相同，省略包圍用構件2之說明。 基座1除了其搬運面1 A之中心部以外，分別具備和圖 14、15所示喷出孔ι13、115及氣體室114、116 一樣之喷出 孔11、13及氣體室12。此外’省略喷出孔13用之氣體室之 圖示。在搬運面1A之中心部設置帶電中和裝置3。在實施 例1 ’喷出孔11喷出浮起用之氣體。 帶電中和裝置3具備收藏部31、UV(Ultraviolet radiaion :紫外線）32以及控制部33。在實施例1，槽部係 收藏部31，帶電中和部由UV燈32和控制部33構成。 收藏部3 1之第1收藏部3 1 A係在搬運面1 A之中央部設置 成和移動方向310垂直之板狀之槽，如圖2所示。在第1收 藏部31A，讓光通過之石英板3iB以和第1收藏部31A密接之 &態平坦的裝在搬運面1A。在第1收藏部31A之底，第2收Page 〖0 V. Description of the invention (8) --r The neutralization device used in the transport device. At this time, for example, when a charging neutralization device for a floating conveying device is installed in a transfer unit or a control unit located below the processing plate-like substrate before the processing device, because the plate-shaped substrate is neutralized directly in front of the processing device. Charging, can prevent the influence of electrification from happening in the next process. Embodiments of the Invention Embodiments of the present invention will be described in detail below with reference to the drawings. Example 1, Example 1, and the transfer unit in the floating handling system shown in FIG. 12 The transfer unit A shown in FIG. 1 was used. The transfer unit is provided with a base], a bracket 2 and a charging neutralization device 3. In addition, since the surrounding member 2 is the same as the surrounding member 120 of FIG. 13, the description of the surrounding member 2 is omitted. The base 1 is provided with the same ejection holes 11 and 13 and the gas chambers 12 and 13 as the ejection holes 13 and 115 and the gas chambers 114 and 116 shown in Figs. In addition, the illustration of the gas chamber for the ejection hole 13 is omitted. A charging neutralization device 3 is provided at the center of the conveying surface 1A. The gas for floating is ejected from the ejection hole 11 of the embodiment 1 '. The charging neutralization device 3 includes a storage unit 31, a UV (Ultraviolet radiaion) 32, and a control unit 33. In the first embodiment, the tank portion is the storage portion 31, and the charged neutralization portion is composed of a UV lamp 32 and a control portion 33. The first storage section 3 1 A of the storage section 31 is a plate-shaped groove provided at the center of the conveying surface 1 A as a plate-shaped groove perpendicular to the moving direction 310, as shown in FIG. In the first storage section 31A, a quartz plate 3iB through which light passes is mounted flat on the transport surface 1A in an & state in close contact with the first storage section 31A. The bottom of the first storage section 31A, the second collection
第11頁 4 ⑽ 710 五、發明說明（9) 藏部31 C設置成相對於第1收藏部31A形成段差，[|V燈32收 藏於收藏部31之第2收藏部3 1C。UV.燈32靠近石英板3iB收 藏於第2收藏部3 1C。電壓作用於UV燈32時，UV燈32發出紫 外線。此時’因UV燈32靠近石英板31 B收藏於第2收藏部 31 C，紫外線之照射角度大，紫外線廣為照射搬墀空間。 利用該紫外線’在石英板31B位置所在之位於搬運面 U上之搬運空間’因氣體離子化’石英板31B之上面附近 成為包含氮氣之正離子和負離子之環境。 控制部3 3設於基座1之下側，利用電線3 3 a和uv燈3 2連 接。控制部3 3產生用以發出紫外線之電壓：經由電.線3 3 A 將該電壓作用於UV燈32。 以上係實施例1之移送單元A之構造。其次說明實施例 1之動作。 帶電中和裝置3之控制部33將電壓作用於UV燈32時， 如圖3所示’ UV燈32發出紫外線。利用該紫外線32A，位於 石英板31B上面側之氣體離子化，發生正離子4〇ι和負離子 402。結果，石英板31B上面側之搬運空間變成含有用以中 和所搬來之玻璃板300之充分之正離子4(H和負離子4〇2。 在此狀態時’如圖4所示’帶電之玻璃板3 〇 〇通過移送 單元A之搬運空間時’玻璃板3 〇 〇之下面3 〇 2側之負靜電荷 利用氣體之正離子401中和，上面3〇1側之正靜電荷利用氣 體之負離子402中和。尤其’在玻璃板3〇〇之下面302側， 位於約0. 2〜0. 5mm之浮起間隔d之氣體利用來自UV燈32之紫 外線32A確實離子化’利用在離子化所產生之正離子可將Page 11 4 ⑽ 710 V. Description of the invention (9) The storage section 31 C is arranged to form a step difference with respect to the first storage section 31A, and [| V 灯 32 is stored in the second storage section 31 1C of the storage section 31. The UV. Lamp 32 is stored near the quartz plate 3iB in the second storage section 31C. When a voltage is applied to the UV lamp 32, the UV lamp 32 emits ultraviolet rays. At this time, since the UV lamp 32 is stored near the quartz plate 31 B in the second storage section 31 C, the irradiation angle of the ultraviolet rays is large, and the ultraviolet rays are widely irradiated and carried. Using this ultraviolet ray 'near the upper surface of the quartz plate 31B where the quartz plate 31B is located is a transportation space' where the upper surface of the quartz plate 31B becomes an environment containing positive and negative ions containing nitrogen. The control unit 3 3 is provided on the lower side of the base 1 and is connected to the UV lamp 32 by a wire 3 3 a. The control unit 3 3 generates a voltage for emitting ultraviolet rays: the voltage is applied to the UV lamp 32 via the electric line 3 3 A. The above is the structure of the transfer unit A of the first embodiment. Next, the operation of the first embodiment will be described. When the control unit 33 of the charging neutralization device 3 applies a voltage to the UV lamp 32, as shown in FIG. 3, the UV lamp 32 emits ultraviolet rays. With this ultraviolet light 32A, the gas on the upper side of the quartz plate 31B is ionized, and positive ions 40m and negative ions 402 are generated. As a result, the carrying space on the upper side of the quartz plate 31B becomes sufficient to contain positive ions 4 (H and negative ions 402) to neutralize the glass plate 300 that was carried. In this state, the charged battery is 'as shown in FIG. 4'. When the glass plate 3 passes through the conveying space of the transfer unit A, the negative electrostatic charges on the lower side of the glass plate 3 on the bottom side of the glass plate are neutralized by the positive ions 401 of the gas, and the positive static charges on the upper side of the side of the glass plate 3 are used by the gas. The negative ion 402 is neutralized. In particular, 'the gas at a floating interval d of about 0.2 to 0.5 mm on the 302 side below the glass plate 〇00 is indeed ionized by the ultraviolet light 32A from the UV lamp 32' and used in the ionization The positive ions produced can
第12頁 J19 7 ί ο__ 明說明（ίο) ~~ -- 破璃板300之下面302之負電荷完全中和。又，在離子化所 產生之負離子受到玻璃板300之下面3〇2之負電荷之排斥 力’未中和而流向玻璃板30 0之上面3〇1側。結果，因在玻 螭板3 00之上面301側存在充分之正離子，可將上面3(η之 電何完全中和。 照這樣，若依據實施例1 ’因帶電中和裝置3之⑽燈3 2 配置於搬運面1Α側，可確實中和玻璃板3〇〇之上面3〇1及下 面3 02之帶電。 又’因利用石英板3 1Β密封第2收藏部3 1C，防止來自 第2收藏部31C之外氣等進入移送單元a之搬運空-間，可防 止外氣等影響石英板31B。同時，利用石英板31 b保護uv燈 32 ° 實施例2 其次說明實施例2。 在實施例2 ’在實施例1使用之帶電中和裝置3設置於 用作圖1 2所示浮起搬運系統中之控制單元2 〇〇之控制單元 B °即’如圖5所示，設於和移送單元連接侧之搬運面4A。 而且’收藏部31設置成收藏部31之縱向向移動方向 31 0垂直交差。 因而，因朝移動方向310前進而進入控制單元b之搬運 空間之破璃板30 0或朝和移動方向31 0反向前進而自控制單 元β出來之玻璃板3 00，通過設於基座4之搬運面4A之收藏 部31之UV燈32上，可完全中和玻璃板300之帶電。Page 12 J19 7 ί ο__ 明 Instructions (ίο) ~~-The negative charge of 302 under the glass breaker 300 is completely neutralized. In addition, the negative ions generated during the ionization are not neutralized by the negative charge repulsive force 302 of the lower surface of the glass plate 300 and flow toward the 301 side of the upper surface of the glass plate 300. As a result, due to the existence of sufficient positive ions on the 301 side of the glass plate 3 00, the electricity of the surface 3 (η can be completely neutralized. In this way, if the lamp of the device 3 is neutralized by the charge according to Example 1 3 2 is arranged on the conveying surface 1A side, which can neutralize the electric charge on the upper surface 301 and the lower surface 302 of the glass plate 300. Also, the second storage section 3 1C is sealed by the quartz plate 3 1B to prevent from the second The outside air and the like of the storage unit 31C enter the conveying space of the transfer unit a, and the outside air and the like can be prevented from affecting the quartz plate 31B. At the same time, the quartz plate 31 b is used to protect the UV lamp 32 ° Embodiment 2 The second embodiment will be described next. Example 2 'The charged neutralizing device 3 used in Example 1 is provided in the control unit B ° used as the control unit 200 in the floating handling system shown in FIG. 12, that is, as shown in FIG. The conveying surface 4A on the connection side of the transfer unit. Also, the 'storage section 31 is provided so that the longitudinal direction of the storage section 31 crosses the vertical direction 3 0. Therefore, the glass plate 30 which enters the conveying space of the control unit b by advancing in the moving direction 310 0 or towards the direction of movement 31 0 Reverse forward and come out of the control unit β Glass plate 300, the conveying surface provided by the base 4 of the housing portion 4A of the lamps UV 31 32, and can be fully charged in the glass sheet 300.
第13頁 1〇 五、發明說明（11) 實施例3 其次說明實施例3。 在實施例3，為7 士 即，在竇施制!產生正離子和負離子，做法如下所 示。即，在實施例1、2， 紫外線，但是在實施例3為7產生離子和負離子，使用 Xiay)替代紫外線。若心使=性小之軟x射線（_ 發生下4 Γ 可在不伴隨臭氧之 用以防止對於人體照射之遮蔽對策容易。 哀減决 利用使用了這種軟X射線之帶電中和裝置，也可完全 中和玻璃板3 00之帶電。 ’儿 實施例4 其次說明實施例4。 在實施例4 ’如圖6所示’在移送單元a之基座1之搬運 面1A設置帶電中和裝置5 ’替代帶電中和裝置3 ^帶電中和 裝置5如圖7所示，具備離子產生器51A、51B、絕緣供給管 52、絕緣氣體室53以及絕緣喷出孔54。 離子產生器51A對細金屬電極（圖上未示）施加高電 壓’產生正_子。又，離子產生器51B對金屬電極施加極 性不同之高電壓，產生負離子。離子產生器51A所產生之 正離子通過絕緣供給管5 2後’流向絕緣氣體室5 3，而離子 產生器5 1 B所產生之負離子通過絕緣供給管5 2後，流向絕 緣氣體室5 3。又，如圖8所示，在絕緣供給管5 2、絕緣氣Page 13 10 V. Description of the Invention (11) Example 3 Next, Example 3 will be described. In Example 3, it is 7 shi. That is, the sinus is produced in the sinus! Positive ions and negative ions are generated as shown below. That is, in Examples 1 and 2, ultraviolet rays were generated, but in Example 3, ions and negative ions were generated, and Xiay) was used instead of ultraviolet rays. If the heart makes soft X-rays with small sex (_ occurrence 4 Γ can be used to prevent the shielding measures against human exposure without ozone. It is necessary to use a neutralization device using such soft X-rays, It is also possible to completely neutralize the charging of the glass plate 3 00. 'Example 4' Next, Example 4 will be described. In Example 4, 'as shown in Figure 6', a charging neutralization is provided on the carrying surface 1A of the base 1 of the transfer unit a. The device 5 ′ replaces the charged neutralization device 3 ^ As shown in FIG. 7, the charged neutralization device 5 includes ion generators 51A and 51B, an insulating supply pipe 52, an insulating gas chamber 53, and an insulating ejection hole 54. The ion generator 51A pairs A thin metal electrode (not shown) applies a high voltage to generate positive ions. In addition, the ion generator 51B applies a high voltage with a different polarity to the metal electrode to generate negative ions. The positive ions generated by the ion generator 51A pass through the insulation supply tube. After 5 2 ′, it flows to the insulating gas chamber 5 3, and the negative ions generated by the ion generator 5 1 B pass through the insulating supply pipe 5 2 and then flows to the insulating gas chamber 5 3. Also, as shown in FIG. 2.Insulation gas
第14頁 I I . \/ 五、發明說明（12) 體室53以及絕緣噴出孔54之内壁52A、53A、54A設置絕緣 覆膜。絕緣噴出孔54係分別配置於在基座1之搬運面1A所 設定之設置線5A、5B上之帶電中和孔。設置線5A、5B設定 於和移動方向3 1 0交差之方向。各絕緣喷出孔5 4經由絕緣 氣體室5 3和圖1之喷出孔1 1 一樣的噴出來自絕緣氣體室5 3 之氣體。 絕緣氣體室53和圖1之氣體室12 —樣接受氣體之供 給。同時，在和設置線5 A對應之絕緣氣體室5 3經由絕緣供 給管52流入來自離子產生器51A之正離子。結果，設置線 5A上之絕緣貪出孔5 4喷出含有正離子之氣體。又，在和設 置線5B對應之絕緣氣體室53經由絕緣供給管52流入來自離 子產生器51B之負離子。結果，設置線5B上之絕緣噴出孔 54噴出含有負離子之氣體。 若依據實施例4，如圖8所示，自設置線5 A上之絕緣氣 體室53噴出正離子401，自設置線5B上之絕緣氣體室53喷 出負離子402。結果，絕緣氣體室53之周圍之搬運空間變 成含有用以中和玻璃板300之帶電之充分之正離子401和負 離子402。在此狀態時，如圖9所示，帶電之玻璃板30 0通 過移送單元A之搬運空間時，玻璃板300之上面301側之正 靜電荷利用負離子402中和，下面30 2側之負靜電荷利用正 離子401中和。尤其，因來自設置線5A上之絕緣氣體室53 之正離子401直接碰撞玻璃板300之下面302 ’可消除在習 知無法中和之下面3 0 2側之靜電荷。 又，因帶電中和裝置5只是經由絕緣供給管5 2將來自Page 14 I I. \ / V. Description of the invention (12) The inner walls 52A, 53A, and 54A of the body chamber 53 and the insulating ejection hole 54 are provided with an insulating coating. The insulation ejection holes 54 are charged neutralization holes respectively provided on the setting lines 5A and 5B set on the carrying surface 1A of the base 1. The setting lines 5A and 5B are set in a direction intersecting with the moving direction 3 1 0. Each of the insulating ejection holes 54 ejects the gas from the insulating gas chamber 5 3 through the insulating gas chamber 53 and the ejection hole 11 of Fig. 1. The insulating gas chamber 53 and the gas chamber 12 of Fig. 1 receive the supply of gas. At the same time, positive ion from the ion generator 51A flows into the insulating gas chamber 53 corresponding to the installation line 5A through the insulating supply pipe 52. As a result, the insulating tap hole 54 on the set wire 5A ejects a gas containing positive ions. In addition, the insulative gas chamber 53 corresponding to the installation line 5B flows into the negative ion from the ion generator 51B through the insulative supply pipe 52. As a result, the insulating ejection hole 54 on the set wire 5B ejects a gas containing negative ions. According to Embodiment 4, as shown in FIG. 8, positive ions 401 are ejected from the insulating gas chamber 53 on the installation line 5A, and negative ions 402 are ejected from the insulating gas chamber 53 on the installation line 5B. As a result, the transportation space around the insulating gas chamber 53 becomes filled with positive 401 and negative 402 sufficient to neutralize the charge of the glass plate 300. In this state, as shown in FIG. 9, when the charged glass plate 300 passes through the conveying space of the transfer unit A, the positive static charge on the upper side 301 of the glass plate 300 is neutralized by the negative ion 402 and the negative static electricity on the lower side 30 2 The charge is neutralized with a positive ion 401. In particular, since the positive ions 401 from the insulating gas chamber 53 on the set line 5A directly collide with the lower surface 302 'of the glass plate 300, the electrostatic charge on the 3202 side of the lower surface which cannot be neutralized conventionally can be eliminated. Since the neutralization device 5 is charged only through the insulating supply pipe 5 2
第15頁Page 15
I Q 五、發明說明（13) 一 '—- 離子產生器51之正離子401和負離子402注入絕緣氣體室53 之簡單之構造’不必大幅度變更移送單元A，就可完全中 和帶電。 實施例5 其次說明實施例5。 在實把例5 ’在控制單元B设置在實施例4所使用之帶 電中和裝置5。即’如圖1 0所示’在和移送單元連接之側 之搬運面4A設置設置線5A、5B。而且’設置線5Α、配置 成和移動方向310垂直交差。 因而’因朝移動方向310前進而進入控制單元b之搬運 空間之玻璃板300或朝和移動方向310反向前進而自控制翠 元B出來之玻璃板3 00 ’通過配置於設置線5A、5B之絕緣喷 出孔54上，可完全中和玻璃板300之帶電。 ' 實施例6 其次說明實施例6。 在實施例6，在控制單元B設置在實施例4所使用之帶 電中和裝置5。即’如圖11所示，配置於在控制單元b之搬 運面4A所設定之設定線223之絕緣喷出孔261及配置於外側 之設定線224之絕緣喷出孔2 62用作各自噴出正離子和負離 子之絕緣喷出孔54。 因而’自移動方向310移到控制單元b之玻璃板3〇〇之 中心藉著自噴出孔214和絕緣噴出孔261、2 62喷射之氣體I Q V. Description of the invention (13) A '--- Simple structure in which positive ion 401 and negative ion 402 are implanted into the insulating gas chamber 53 of the ion generator 51' can be completely neutralized and charged without substantially changing the transfer unit A. Example 5 Example 5 is described next. In practice, the control unit B is provided with the charging neutralization device 5 used in the fourth embodiment. That is, "as shown in Fig. 10", setting lines 5A and 5B are provided on the conveying surface 4A on the side connected to the transfer unit. Further, the 'setting line 5A is arranged to intersect the moving direction 310 perpendicularly. Therefore, 'the glass plate 300 entering the conveying space of the control unit b by advancing in the moving direction 310 or the glass plate 3 00 coming out of the control Cuiyuan B by advancing in the opposite direction to the moving direction 310' is disposed on the setting lines 5A, 5B The insulating spray holes 54 can completely neutralize the charging of the glass plate 300. Example 6 Next, Example 6 will be described. In the sixth embodiment, the control unit B is provided with the charging neutralization device 5 used in the fourth embodiment. That is, as shown in FIG. 11, the insulating ejection holes 261 disposed on the setting line 223 set on the conveying surface 4A of the control unit b and the insulating ejection holes 2 62 disposed on the outer setting line 224 are used as respective ejection positive Insulation ejection holes 54 for ions and negative ions. Therefore, the gas moved from the moving direction 310 to the center of the glass plate 300 of the control unit b is ejected from the ejection holes 214 and the insulating ejection holes 261-262.
第16頁 419710 五、發明說明（14) 移至中心之吸引孔2 1 3。同時，向玻璃板3 0 0之背面直接喷. 射來自絕緣喷出孔26 1之正離子和來自絕緣噴出孔2 6 2之負 離子。結果，可消除在習知無法中和之玻璃板3 0 0之背面 側之靜電荷。 實施例7 其次說明實施例7。 在實施例7，使用和供給氣體之供給系不相通之氣體 室。即，在實施例4 ~ 6，離子產生器供給和氣體之供給系 相通之氣體室離子，但是在實施例7使用具有送風功能之 離子產生器。因而，可分離離子產生器和供給系。 以上說明了實施例1〜實施例7，但是本發明未限定為 這些實施例。例如，在實施例1〜實施例7，在辅助性帶電 中和裝置上可併用習知之帶電中和器230。 又，在自喷出孔11噴出之氣體上可使用高純度乾燥空 氣、高純度氮氣、高純度氬氣、高純度二氧化碳等。在以 氣流搬運晶片之情況，在搬運用之氣體上使用雜質濃度為 數ppb以下之高純度氮氣最適合。 又，在浮起搬運系統上以氣流搬運TFT型液晶顯示器 用之玻璃板等的為例，但是本發明未限定為玻璃板，可應 用於搬運各種板狀基體。 此外，在移送單元和控制單元所設置之噴出孔之排列 方式上有各種方式的，本發明也可應用於這些各排列方 式。Page 16 419710 V. Description of the invention (14) Move the suction hole 2 1 3 to the center. At the same time, the back of the glass plate 300 is directly sprayed. Positive ions from the insulating ejection hole 26 1 and negative ions from the insulating ejection hole 2 6 2 are ejected. As a result, it is possible to eliminate the electrostatic charge on the back side of the glass plate 300 which cannot be neutralized conventionally. Example 7 Example 7 is described next. In the seventh embodiment, a gas chamber which is not connected to the gas supply system is used. That is, in Examples 4 to 6, the ion generator supply and the gas supply system communicate with each other in the gas chamber. However, in Example 7, an ion generator having a blower function is used. Thus, the ion generator and the supply system can be separated. The first to seventh embodiments have been described above, but the present invention is not limited to these embodiments. For example, in Examples 1 to 7, a conventional charging neutralizer 230 may be used in combination with the auxiliary charging neutralization device. Further, as the gas ejected from the ejection hole 11, high-purity dry air, high-purity nitrogen, high-purity argon, high-purity carbon dioxide, and the like can be used. When the wafer is transported by air current, it is most suitable to use high-purity nitrogen with an impurity concentration of several ppb or less on the transport gas. In the floating conveyance system, a glass plate for a TFT-type liquid crystal display or the like is conveyed by an air flow as an example. However, the present invention is not limited to a glass plate and can be applied to convey various plate-like substrates. In addition, there are various ways of arranging the ejection holes provided in the transfer unit and the control unit, and the present invention can also be applied to these various arrangements.
第17頁 4lS7l〇 五、發明說明（15) 發明之效果 槽部及 輸出將 波係紫 之下面 波確實 時，因 子化之 若 電中和 空間噴 入離子 板狀基 之帶電 噴出所 體之上 上述所 設於該 該氣體 外線或 之窄空 離子化 在板狀 氣體， 依據本 孔、及 出離子 之帶電 體噴離 。同時 引起之 面之帶 設置了設置於搬運面之 不，若依據本發明 槽部而且自該槽部向該搬運面上之搬運空間 離子化之電磁波之帶電中和部。又，該電磁 軟X射線。結果，因位於搬運面和板狀基體 間之氣體利用自槽部照射之紫外線等之電磁 ’可將板狀基體之下面之帶電完全中和^同 基體之上面侧存在多量利用電磁波照射而離 板狀基體之上面之帶電也可完全中和。 發明，置了 sS：於該搬運面之至少1個之帶 設於該帶電中和孔並令向該搬運面上之搬運 之帶電中和部。又，因設置了向該喷出孔注 中和部’自搬運面之帶電中和孔或噴出孔向 子化之氣體。因而，可中和板狀基體之下面 ’因在板狀基體之上面側存在離子化氣體之 多量之離子化之氣體’也可完全中和板狀美 電。 土 :右依據本發明，在移送單元設置了浮起搬運裝置用 帶it和裝置。又’在控制單元設置了浮起搬運裝置用2 狀和裝置。因而，在浮起搬運系統之任意位置中和 置帶電。例如’在位於處理板狀基體之下-處理裝 今之别之移送單元或控制單元設置浮起搬運農置用之tPage 17 4S7105. Explanation of the invention (15) Effect of the invention When the bottom part of the wave system and the output are confirmed, the factorized neutralization space is sprayed onto the charged ejection base of the ion plate-shaped base. The narrow space provided on the outer line of the gas or ionized in the plate-shaped gas is sprayed away according to the hole and the charged body that emits ions. At the same time, the belt of the surface is provided with a charging neutralization portion of the electromagnetic wave ionized by the groove portion according to the present invention and from the groove portion to the transportation space on the transportation surface according to the present invention. This electromagnetic soft X-ray. As a result, the gas located between the conveying surface and the plate-like substrate can be completely neutralized by the electromagnetic radiation of ultraviolet rays or the like radiated from the groove portion, and a large amount of electromagnetic waves can be used to separate the plate from the upper side of the substrate. The charge on the substrate can be completely neutralized. Invented, sS: at least one belt on the conveying surface is provided in the charged neutralization hole and the charged neutralization portion is conveyed to the conveying surface. In addition, since a neutralizing portion is injected into the ejection hole, a charged neutralization hole or an atomization gas from the ejection hole is provided. Therefore, it is possible to completely neutralize the lower surface of the plate-shaped substrate 'because a large amount of ionized gas is present on the upper surface of the plate-shaped substrate', and the plate-shaped beauty can be completely neutralized. To the right: According to the present invention, the transfer unit is provided with a belt carrying device it and a device. In addition, the control unit is provided with a two-piece summing device for a floating conveying device. Therefore, it is neutralized and charged at any position in the floating handling system. For example, 'the floating unit or the control unit which is located below the processing plate-like substrate-processing unit is provided for the purpose of lifting and transporting the agricultural plant.
第18頁 a 4iQ7 ί〇_ 五、發明說明（16) 電中和裝置時，因在處理裝置正前中和板狀基體之帶電，-可防止在下一處理發生帶電之影響。 圖式簡單說明 圖1係表示實施例1之移送單元之剖面之剖面圖。 圖2係表示該移送單元之搬運面之平面圖。 圖3係表示用以說明實施例1之動作之說明圖。 圖4係表示用以說明實施例1之動作之說明圖。 圖5係表示實施例2之移送單元之搬運面之平面圖。 圖6係表示實施例4之移送單元之搬運面之平面圖。 圖7係表示該移送單元之剖面之剖面圖。 圖8係表示用以說明實施例4之動作之說明圖。 圖9係表示用以說明實施例4之動作之說明圖。 圖1 0係表示實施例5之控制單元之搬運面之平面圖。 圖11係表示實施例6之控制單元之搬運面之平面圖。 圖1 2係表示習知之板狀基體搬運系統之平面圖。 圖13係表示習知之移送單元之立體圖。 圖1 4係表示圖1 3之I _ I剖面圖= 圖1 5係表示圖1 3之Π - Π剖面圖。 圖1 6係表示習知之移送單元之喷出方向之說明圖。 圖1 7係表示習知之控制單元之立體圖。 圖18係表示習知之移送單元之喷出方向之說明圖。 圖1 9係表示習知之帶電中和器之設置情況之剖面圖。Page 18 a 4iQ7 ί〇_ V. Description of the invention (16) When the device is electrically neutralized, the charging of the plate-shaped substrate is neutralized in front of the processing device, which can prevent the effect of charging in the next processing. Brief Description of the Drawings Fig. 1 is a sectional view showing a cross section of a transfer unit of the first embodiment. Fig. 2 is a plan view showing a carrying surface of the transfer unit. Fig. 3 is an explanatory diagram showing the operation of the first embodiment. Fig. 4 is an explanatory diagram showing the operation of the first embodiment. Fig. 5 is a plan view showing a conveyance surface of a transfer unit of the second embodiment. Fig. 6 is a plan view showing a conveyance surface of a transfer unit of Example 4; Fig. 7 is a sectional view showing a cross section of the transfer unit. Fig. 8 is an explanatory diagram showing the operation of the fourth embodiment. Fig. 9 is an explanatory diagram showing the operation of the fourth embodiment. FIG. 10 is a plan view showing a conveyance surface of the control unit of the fifth embodiment. Fig. 11 is a plan view showing a conveyance surface of a control unit of the sixth embodiment. Fig. 12 is a plan view showing a conventional plate-shaped substrate conveying system. Fig. 13 is a perspective view showing a conventional transfer unit. FIG. 14 is a cross-sectional view taken along the line I_I of FIG. 13 = FIG. 15 is a cross-sectional view taken along the line Π-Π of FIG. 13. FIG. 16 is an explanatory diagram showing a discharge direction of a conventional transfer unit. Fig. 17 is a perspective view showing a conventional control unit. Fig. 18 is an explanatory view showing a discharge direction of a conventional transfer unit. Fig. 19 is a cross-sectional view showing the arrangement of a conventional charged neutralizer.
第19頁 1 ^ ' 1 u4 /,9 τ 1 a γ 1〇 i^ T IQa_ 五、發明說明（lb 符號說明 A、 ~ 1 0 0移送單元 B、 〜2 0 0控制單元 1、 4、1 10、210〜基座 1八'4八、112、212〜搬運面 2、 1 2 0、2 2 0〜包圍用構件 3、 5〜帶電中和裝置 5A~設置線 11 、41A 、42A 、113 、115 、215~218 、251~253〜喷出Page 19 1 ^ '1 u4 /, 9 τ 1 a γ 1〇i T IQa_ V. Description of the invention (lb symbol description A, ~ 1 0 0 transfer unit B, ~ 2 0 0 control unit 1, 4, 1 10, 210 to the base 18, 48, 112, 212 to the conveying surface 2, 1 2 0, 2 2 0 to the surrounding member 3, 5 to the charging neutralization device 5A to the installation line 11, 41A, 42A, 113 , 115, 215 ~ 218, 251 ~ 253 ~
子L 12、114、1 16〜氣體室 3 1〜收藏部 31 A〜第1收藏部 31B〜石英板 310第2收藏部 32〜UV燈 33 控制部 3 3 A電線 41、42、221〜226設定線 45、21 3〜吸引孔 _ 51 A、51 B〜離子產生器 5 2〜絕緣供給管 52A 、 53A 、 54A〜内壁 5 3〜絕緣氣體室Sub L 12, 114, 1 16 to gas chamber 3 1 to storage 31 A to 1st storage 31B to quartz plate 310 2nd storage 32 to UV lamp 33 control 3 3 A wires 41, 42, 221 to 226 Setting lines 45, 21 3 ~ suction holes_51 A, 51 B ~ ion generator 5 2 ~ insulation supply pipes 52A, 53A, 54A ~ inner wall 5 3 ~ insulation gas chamber
第20頁 4 f 9 7 1 ο_ 五 '發明說明（18) 5 4、2 61、2 6 2〜絕緣噴出孔 11 1、2 1 1〜供給系 1 1 2 Α〜中心 113A、Π5Α、214A 〜218A、251A 〜253A 〜喷出方向 2 3 0〜帶電中和器 3 0 0〜玻璃板 30卜上面 30 2〜下面 310〜移動方向 3 1 1〜轉換方向 4 0 1 ~正離子 402〜負離子Page 20 4 f 9 7 1 ο_ Five 'Description of the invention (18) 5 4, 2 61, 2 6 2 ~ Insulation ejection hole 11 1, 2 1 1 ~ Supply system 1 1 2 A ~ Center 113A, 5A, 214A ~ 218A, 251A ~ 253A ~ discharge direction 2 3 0 ~ charged neutralizer 3 0 0 ~ glass plate 30 bu upper 30 2 ~ lower 310 ~ moving direction 3 1 1 ~ conversion direction 4 0 1 ~ positive ion 402 ~ negative ion
第21頁Page 21
Claims (1)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23094398A JP4132000B2 (en) | 1998-08-17 | 1998-08-17 | Charge neutralization device and levitation conveyance system for levitation conveyance device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW419710B true TW419710B (en) | 2001-01-21 |
Family
ID=16915748
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW88113943A TW419710B (en) | 1998-08-17 | 1999-08-16 | Electrification neutralizing device for floating conveyance apparatus and floating conveyance system |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4132000B2 (en) |
| TW (1) | TW419710B (en) |
| WO (1) | WO2000009429A1 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4543794B2 (en) * | 2004-07-09 | 2010-09-15 | 国立大学法人東北大学 | Flat member conveying device |
| JP4396847B2 (en) | 2004-12-22 | 2010-01-13 | Ｓｍｃ株式会社 | Air levitation device with static eliminator and method of static eliminator in the levitation device |
| KR101205832B1 (en) * | 2009-11-27 | 2012-11-29 | 세메스 주식회사 | Substrate transferring unit and method of transfering substrate using the same |
| JP5549885B2 (en) * | 2011-04-08 | 2014-07-16 | 株式会社ダイフク | Plate-type substrate transport device |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5733002Y2 (en) * | 1979-05-11 | 1982-07-21 | ||
| JP3162144B2 (en) * | 1990-11-16 | 2001-04-25 | 株式会社渡邊商行 | Sheet-like substrate transfer device |
| JP3414836B2 (en) * | 1994-05-23 | 2003-06-09 | 大日本スクリーン製造株式会社 | Substrate transfer device and substrate transfer method |
| JPH088319A (en) * | 1994-06-16 | 1996-01-12 | Sony Corp | Board transfer mechanism, board transfer system and semiconductor production system |
-
1998
- 1998-08-17 JP JP23094398A patent/JP4132000B2/en not_active Expired - Fee Related
-
1999
- 1999-08-16 TW TW88113943A patent/TW419710B/en not_active IP Right Cessation
- 1999-08-17 WO PCT/JP1999/004416 patent/WO2000009429A1/en active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| JP4132000B2 (en) | 2008-08-13 |
| WO2000009429A1 (en) | 2000-02-24 |
| JP2000062953A (en) | 2000-02-29 |
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