TW414728B - Device for flushing nozzle - Google Patents

Device for flushing nozzle Download PDF

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Publication number
TW414728B
TW414728B TW89101247A TW89101247A TW414728B TW 414728 B TW414728 B TW 414728B TW 89101247 A TW89101247 A TW 89101247A TW 89101247 A TW89101247 A TW 89101247A TW 414728 B TW414728 B TW 414728B
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Taiwan
Prior art keywords
nozzle
flushing
spin
glass
spray
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TW89101247A
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Chinese (zh)
Inventor
Guei-Shi Lai
Guo-Feng Huang
Shing-Li Liou
Shr-Shiun Chiou
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United Microelectronics Corp
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Priority to TW89101247A priority Critical patent/TW414728B/en
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Publication of TW414728B publication Critical patent/TW414728B/en

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Abstract

The present invention relates to a device for flushing nozzle in which the nozzle is wrapped to be flushed by isopropanol. After cleaning with isopronanol, a flushing device is used to spray nitrogen gas (N2) for cleaning. The nozzle is connected to the bottom of a substantially vertical pipe. The device for flushing nozzle comprises a spray pipeline wrapping the pipe in a substantially coaxial way while maintaining a constant clearance with the pipe, in which the spray pipeline has a near end substantially closer to the nozzle, and a far end substantially away from the nozzle. Furthermore, the device further comprises a spray head connected to the near end of the spray pipeline, in which the spray head covers the pipe in a substantially coaxial way while maintaining a constant clearance with the pipe. The device further comprises a fluid supply assembly for providing a flushing fluid to the spray pipeline and the spray head.

Description

414728 五、發明說明(1) 5 - 1發明領域 本發明係有關於一種沖洗設備’且特別是有關於一種 用於沖洗半導體製程裝置的沖洗設備。 5-2發明背景 旋塗式玻璃(Spin-On-Glass ; SOG)乃是半導體製程中 處理平坦化的一個重要製程,其方式乃是裝OCD這種化學 液塗佈在晶片上,但因為0CD這種化學液很容易結晶,所 以常凝結在喷嘴上(與空氣接觸所致)。一旦結晶成粒子 (particles) ’若不加以理會,會造成產品報廢。因此, 目前各廠均有諸法以期壓抑此一問題。 在DNS ( SCREEN)廠所使用之方法,乃是採用如第一圖 中所示的罐子(POT) 100 ^第一圖之剖面示意圖則分別繪示 在第二圖和第三圖。請參照第一圓、第二圖和第三圖,這 個罐子100的用意乃是在於提供一喷射沖洗機構,其具有 一噴射管線106配備在旋塗式玻璃(s〇G)喷射器(jet)1〇4的 旁邊,能定時喷出異丙醇之有機溶劑以清洗s〇(J喷嘴1〇2。 照道理來說,似乎可以解決此一問題點,但長久運作證明 ’它並不能十分有效地壓抑粒子的產[導致粒子失誤(414728 V. Description of the invention (1) 5-1 FIELD OF THE INVENTION The present invention relates to a flushing device ', and particularly to a flushing device for flushing a semiconductor process device. 5-2 Background of the Invention Spin-On-Glass (SOG) is an important process for flattening semiconductors. The method is to coat the wafer with a chemical liquid such as OCD. This chemical liquid is easy to crystallize, so it often condenses on the nozzle (caused by contact with air). Once crystallized into particles ('particles'), the product will be scrapped if left unattended. Therefore, various factories have various methods to suppress this problem. The method used in the DNS (SCREEN) plant is to use a pot (POT) 100 as shown in the first figure. ^ The schematic diagrams of the first figure are shown in the second and third figures, respectively. Please refer to the first circle, the second figure, and the third figure. The purpose of this jar 100 is to provide a jet flushing mechanism with a jet line 106 equipped on a spin-on glass (sog) jet. Next to 104, the organic solvent of isopropyl alcohol can be regularly sprayed to clean the s0 (J nozzle 102). In principle, it seems that this problem can be solved, but long-term operation proves that it is not very effective Depressed particle production [resulting in particle error (

第4頁 414728 五、發明說明(2) ----Page 4 414728 V. Description of the invention (2) ----

No Good ;NG),常為該旋塗式玻璃機台揮之不去的夢魘, 長年榮登當機榜首。所以職特在此提出一解決方案。 5-3發明目的及概述 本發明的目的之一,在於提供一種沖洗設備,用以抑 制吾人在發明背景中所述及之粒子問題。 根據上 的設備,其 。此用於沖 實質上以同 隔距離,其 實質上遠離 nozzle), 同軸的方式 此設備更具 ,用以對噴 設備至少可 述或其 中上述 洗喷嘴 轴的方 中喷射 噴嘴的 連接喷 覆蓋喷 有一流 射管線 改善發 他目的 噴嘴係 的設備 式覆蓋 管線具 遠端。 射管線 管,但 體供給 和噴射 明背景 本發明提供一種用於沖洗喷嘴 連接在一大約 具有一 喷管, 有實質 此設備 之近端 和喷管 總成( 喷頭提 中所述 噴射管 但和嗜 上靠近 還具有 ,其中 之間有 fluid 供一沖 之先前 垂直之喷管的底部 線(j e t p i p e ), 管之間有一定之間 喷嘴的近端,以及 一喷射喷頭(j e t 喷射喷頭實質上以 一定的間隔距離。 supply assembly) 洗流體。這種沖洗 技術問題° 5-4圈式簡單說明:No Good; NG), often a lingering nightmare for this spin-on glass machine, has topped the list for many years. Therefore, Jobe proposes a solution here. 5-3 Object and Summary of the Invention One of the objects of the present invention is to provide a flushing device for suppressing the particle problem mentioned in the background of the invention. According to the device, its. This device is used for flushing at substantially the same distance, which is substantially away from nozzle). This device is more coaxial, and is used to cover the spray nozzle at least or the spray nozzle is connected to the spray nozzle shaft. There is a first-class injection line to improve the far end of the equipment-type covering line of the nozzle system. Background of the invention The present invention provides a flushing nozzle connected to a nozzle having a nozzle, substantially the proximal end of the device and a nozzle assembly (the nozzle pipe described in the nozzle tip but It also has the bottom line (jetpipe) of a previously vertical nozzle between which fluid is flushed, the proximal end of the nozzle between the tubes, and a jet nozzle (jet jet nozzle). Essentially at a certain interval distance. Supply assembly) Washing fluid. This kind of flushing technical problem ° 5-4 ring type simple explanation:

414728 五、發明說明(3) 為了讓本發明之上述和其他之目的、 更明顯易僅,下文特舉較佳實施例, A 、和優‘二 詳細說明如下。 呢合所附圖式’作 第一圖繪示習知的一種沖洗罐的 Ϊί圖緣示第-圖之沖洗罐的剖面;^ . 二圖繪不第一圖之沖洗罐的另一二’ f四圖緣示另-種習知沖洗設備的^面示意圖; 第五圖緣示第四囷之沖洗#借二=^意圖; 第六圖繪示第四圖之沖洗^借的^面示意圖; 其中的液柱無法沖洗s〇G嗔 μ 、 個剖面示意圖, 第七圖繪示沖裔上的粒子,· # ί无bUG噴射器上粒 第八A圓繪示根據本發凊况的上視圖; 洗设備*意ϋ ; 較佳實把例,一種新式的清 第八B圖繪示第八a阁 ;第八C圖緣示第八A圖之沖;剖面示意圖; J乃一個剖面示意 _第九A圖和第九b圖綸 :圖’藉以解釋為何由第二2,之沖洗設備的剖 第成之問題可以獲得 示意圖,藉St第十B圖繪示第八氕圖之、、Φρ/ 圖繪示第八A圖+丄 圖之沖洗設備的剖面示意圖 決;^解釋為何由第二起因造成^洗:;傷的刮 第+ &造成之問題可以獲得414728 V. Description of the invention (3) In order to make the above and other objects of the present invention more obvious and easy, only the preferred embodiments are enumerated below. The figure attached here is 'the first figure shows a conventional flushing tank, the figure shows the cross section of the flushing tank-the first figure shows the cross section of the flushing tank; the second figure shows the other two of the first flushing tank' Figure 4 shows a schematic diagram of another conventional flushing device; Figure 5 shows a schematic diagram of a fourth flushing # borrow two = ^ intent; Figure 6 shows a schematic diagram of a flushing ^ borrowing of the fourth figure The liquid column cannot be washed, so the schematic diagram of the cross section is shown in the seventh figure, and the seventh figure shows the particles on the red line. View; Washing equipment * Intentions; A better example, a new style of the eighth Qing Dynasty Figure B shows the eighth a Pavilion; the eighth figure C edge shows the impact of the eighth Figure A; schematic diagram; J is a section Schematic _ Figures 9A and 9B: Figures' are used to explain why the problem of section 2 of the flushing equipment can be obtained, and the tenth B of St. , Φρ / The drawing shows the cross-sectional schematic diagram of the flushing equipment of the eighth A ++ 丄; ^ explain why the second cause is caused by ^ washing :; the problem of the scratch + & Get

kJJafU|ft||«j· l(tB M klCMLili· r^lM UUkjl - - HHuPi HiMiKMVMkHitku»·_____ 414728 五、發明說明(4) 以解釋為何由第三起因造成之問題可以獲得解決; 第十二圖和第十三A至第十三C圖係用以解釋何以沖洗 流體可自然而然地加速;以及 第十四A圖和第十四B圖繪示根據本發明較佳實施例, 具有兩個沖洗設備的示意圖。 主要部分之標記說明: 100 罐子 102、402、802 SOG 喷嘴 104 SOG噴射器 106 喷射管線 406 ' 80 6 喷射管線 408、804 SOG 喷管 410 SOG喷射器 410a 受液面 410b 較遠離之非受液面 412、840 沖洗液柱 80 6a 近端 806b 遠端 808 喷射喷頭 810 SOG噴射器 820 喷射總成 830 流體供應總成 832a 第一活門kJJafU | ft || «j · l (tB M klCMLili · r ^ lM UUkjl--HHuPi HiMiKMVMkHitku» · _____ 414728 5. Invention Description (4) To explain why the problem caused by the third cause can be solved; twelfth Figures and Thirteenth A through Thirteenth C are used to explain how the flushing fluid can be naturally accelerated; and Figures 14A and 14B show two flushings according to a preferred embodiment of the present invention. Schematic diagram of the equipment. Marking description of main parts: 100 tanks 102, 402, 802 SOG nozzles 104 SOG injectors 106 injection lines 406 '80 6 injection lines 408, 804 SOG nozzles 410 SOG injectors 410a receiving surface 410b is far away Non-receiving surface 412, 840 Flushing liquid column 80 6a Proximal end 806b Distal end 808 Jet nozzle 810 SOG injector 820 Jet assembly 830 Fluid supply assembly 832a First valve

414728 五、發明說明(5) 832b 第二活門 5-4較佳實施例 吾人發現先前技術問題的起因(cause),而這樣的發 現當屬本發明課題(subject matter)的一部份,且應是在 考量本發明專利性時所當重視的部份《甚者,先前技術中 亦沒有教示或建議使用吾人所發明的新式沖洗設備。 請參照第四圖,我們將仔細確認先前技術問題的第一 個起因。用以清洗在旋塗式玻璃喷嘴(SOG nozzle)402附 近之粒子(particles)的異丙醇沖洗液,或者其他種類的 沖洗液,係透過配備在SOG喷管(SOG pipe)408附近的喷射 管(jet pipe)406來提供。這些沖洗液是從SOG喷管408旁 邊喷向SOG噴管408的,用以沖洗位在SOG喷射器(SOG jet) 410,包括SOG喷嘴402附近的粒子。然而’由於SOG噴射器 41 0不是每次都能百分之百座落在相同的地方’一有誤差 則會變成第五圖之情形’異丙醇喷不到’或喷到一點其量 不足以沖洗粒子。 曾有以下案例’壓力不穩時’喷出之沖洗液無法包裹 清洗S0G喷嘴402,造成清洗不良’粒子未加以去除的情形 ,如第六圖所示。這也就是先前技術問題的第二個起因。414728 V. Description of the invention (5) 832b Preferred embodiment of the second valve 5-4 We discovered the cause of the previous technical problem, and such a discovery should be part of the subject matter of the present invention, and should be It is the part that should be taken seriously when considering the patentability of the present invention. Moreover, there is no teaching or suggestion in the prior art to use the new type of flushing equipment invented by us. Please refer to the fourth figure, we will carefully confirm the first cause of the previous technical problems. Isopropyl alcohol rinse solution for cleaning particles near the spin-on glass nozzle (SOG nozzle) 402, or other types of rinse solution, through a spray pipe equipped near the SOG pipe 408 (Jet pipe) 406 to provide. These rinsing liquids are sprayed from the side of the SOG nozzle 408 to the SOG nozzle 408 to wash particles located near the SOG jet 410, including the SOG nozzle 402. However, 'because the SOG injector 4 0 is not 100% located in the same place every time', if there is an error, it will become the fifth picture. 'Isopropyl alcohol cannot be sprayed' or a small amount is not enough to flush the particles. . In the following case, when the pressure of the pressure was unstable, the sprayed flushing liquid could not be wrapped to clean the SOG nozzle 402, resulting in poor cleaning. The particles were not removed, as shown in the sixth figure. This is the second cause of previous technical problems.

414728 五、發明說明(6) -- 第七圖繪示習知SOG喷射器41 0附近粒子的清洗情況上 視示意圖。由此上視圖觀之,此S0G噴射器41〇實際上具有 兩個面,其中一個面是受液面(液柱直接喷到的面\41 , 另一個則是離液柱較遠的面4丨0b。長期喷洗經驗得知,受 液面410a較乾淨’另一面4i〇b則否。 因此’吾人有必要設計一新款式的沖洗設備,可以同 時消弭上述二種狀況者,而得如第八A圖和第八^圖所示之 新式發明物件。請參照第八A圖和第八b圖,這種用來沖洗 大約垂直之喷射器81 〇的沖洗設備至少包含一喷射總成( jet assembly) 820 和一流體供應總成(fluid supply assembly ) 830,其中該流體供應總成830係用來對上述噴 射總成8 2 0提供一沖洗流體(Γ丨ns i ng f丨u i d)。上述喷射總 成820實質上以同軸的方式覆蓋喷射器(jet)810,但和該 嗔射器81 0之間有—定的間隔距離。這裡由流體供應總成 830所提供的沖洗流體,舉例來說,可以是異丙醇(IpA)、 ^氣、或者兩者都有。吾人可先藉由此流體供應總成830 提供異丙醇來清洗噴射器810,再藉此流體供應總成830提 供氮氣來嗔洗此噴射器810,以去除噴射器810外表面上的 粒子’如第八C圖中所示。 請參照第八A圓和第八b圖,上述喷射總成820在靠近 喷射器810底部之裁面積,實質上小於喷射總成820較遠離414728 V. Description of the invention (6)-The seventh figure shows a schematic diagram of the cleaning of particles near the conventional SOG injector 41 0. From the above view, the S0G injector 41 has two surfaces, one of which is the liquid receiving surface (the surface directly sprayed by the liquid column \ 41), and the other is the surface farther from the liquid column 4丨 0b. It is learned from long-term spray cleaning experience that the liquid receiving surface 410a is relatively clean 'and the other side 4i〇b is not. Therefore,' I need to design a new type of flushing equipment that can eliminate the above two conditions at the same time. Figures 8A and 8 ^ show the new invention object. Please refer to Figures 8A and 8b. This flushing device for flushing the approximately vertical sprayer 81 ° includes at least a spray assembly ( jet assembly) 820 and a fluid supply assembly 830, wherein the fluid supply assembly 830 is used to provide a flushing fluid (Γ 丨 ns ng fuiuid) to the above-mentioned jet assembly 8 2 0. The above-mentioned spray assembly 820 substantially covers the jet 810 in a coaxial manner, but there is a certain distance from the ejector 810. Here, the flushing fluid provided by the fluid supply assembly 830 is an example. For example, it can be isopropyl alcohol (IpA), argon, or both. Yes, I can first clean the ejector 810 by supplying isopropanol from this fluid supply assembly 830, and then purge this ejector 810 with nitrogen provided by the fluid supply assembly 830 to remove the outer surface of the ejector 810. The particles are shown in the eighth C. Please refer to the eighth circle A and the eighth b. The cutting area of the above-mentioned spray assembly 820 near the bottom of the ejector 810 is substantially smaller than that of the spray assembly 820.

414728 五、發明說明(7) 喷射器8 1 0底部之截面積,用以使沖洗液速度加快。上述 噴射器810可以是一種旋塗式玻璃(SOG)喷射器810,其係 用以對一半導體晶片提供例如像0CD化學液等旋塗式玻璃 材料。此SOG喷射器810具有一 SOG喷管804和一個連接在 SOG噴管8〇4底部的SOG喷嘴802。由於暴露在空氣中的緣故 ’上述OCD等化學液容易結晶凝結在SOG喷射器810的外表 面’特別是SOG喷嘴802的外表面上。 仍參照第八A圖和第八B圖,上述喷射總成820可以是 部份覆蓋SOG喷射器810,也可以是全面覆蓋該SOG喷射器 810的,端視使用者之需要而定,並不會脫離本發明的精 神。上述噴射總成820更至少包含一個喷射管線806,其中 該喷射管線8 06具有一近端80 6a實質上較靠近SOG喷嘴8 02 ,更具有一遠端806b實質上較遠離SOG喷嘴802。此外,若 上述喷射總成820並未全面覆蓋SOG喷嘴802的話,上述喷 射總成8 2 0則可至少包含一喷射喷頭8 0 8連接在喷射管線 806的近端8〇6a。上述喷射管線8 06實質上以同軸的方式覆 蓋SOG喷管804,但和該SOG喷管804之間有一定的間隔距離 。上述噴射喷頭808亦實質上以同軸的方式覆蓋s〇G喷管 804,但與該SOG噴管804之間有一定的間隔距離。上述噴 射喷頭808最好以朝向SOG喷嘴802的方向配置,但不要覆 蓋該SOG喷嘴802,藉以對該SOG喷嘴802的外表面進行全面 沖洗》414728 V. Description of the invention (7) The cross-sectional area at the bottom of the injector 8 10 is used to speed up the flushing liquid. The above-mentioned ejector 810 may be a spin-on-glass (SOG) ejector 810, which is used to provide a semiconductor wafer with a spin-on glass material such as a 0CD chemical liquid. The SOG injector 810 has a SOG nozzle 804 and a SOG nozzle 802 connected to the bottom of the SOG nozzle 804. Because of being exposed to the air, 'the above-mentioned chemical liquid such as OCD easily crystallizes and condenses on the outer surface of the SOG ejector 810', especially on the outer surface of the SOG nozzle 802. Still referring to FIGS. 8A and 8B, the above-mentioned injection assembly 820 may partially cover the SOG injector 810, or it may fully cover the SOG injector 810, depending on the needs of the user, and does not depend on It will deviate from the spirit of the present invention. The above-mentioned injection assembly 820 further includes at least one injection line 806, wherein the injection line 806 has a proximal end 80 6a substantially closer to the SOG nozzle 80 2, and a distal end 806 b substantially further away from the SOG nozzle 802. In addition, if the above-mentioned injection assembly 820 does not completely cover the SOG nozzle 802, the above-mentioned injection assembly 820 may include at least one injection nozzle 808 connected to the proximal end 806a of the injection line 806. The above-mentioned injection line 806 covers the SOG nozzle 804 substantially coaxially, but there is a certain distance from the SOG nozzle 804. The above-mentioned spray nozzle 808 also covers the SOG nozzle 804 substantially coaxially, but there is a certain distance from the SOG nozzle 804. The above-mentioned spray nozzle 808 is preferably arranged in the direction of the SOG nozzle 802, but do not cover the SOG nozzle 802, so as to completely flush the outer surface of the SOG nozzle 802.

第10頁 414728 五、發明說明(8) 甚者’上述喷射總成820最好和SOG喷射器810之間要 有連接。例如,將喷射管線806的遠端806b固定在SOG喷射 器8 1 0上。請參照第九A圖和第九B圖,上述沖洗流體會透 過連接在SOG噴射器上之喷射總成。第九a圓繪示s〇G喷射 器810係配置在正確的位置’而第九b圖係繪示s〇G喷射器 810被配置在不正確的位置。然而,即使定位並不正確, 但其喷射總成820係和SOG喷射器810係同在相同構件上, 所以定位不佳不會是問題。因此,這種設計為習知由第一 起因所造成的先前技術問題提供了解決辦法。 本發明喷射總成的設計亦為由第二起因所造成的先前 技術問題提供解決辦法《請參照第十A圖和第+B圖,其中 第十A圖顯示該沖洗流體的液壓較高,而第十B圖顯示該沖 洗流,的液壓較低。由於上述噴射總成820係以同軸的方 式覆蓋SOG喷射器8丨〇,因此上述沖洗流體即使有液壓不穩 的情形’仍可保證會有流體流經s〇G喷嘴8〇2 ^ .生除此之外’因為本發明之喷射總成820係以包裹的方 式清洗或嘴洗S0G喷射器810,所以SOG噴射器810四周各方 '^句勻地受液清洗,不會有—邊乾淨,另一邊不乾淨的 f = ’如第十-圖所示。因此,上述喷射總成82G亦可以 解決因第三起因造成 除了可改善原先缺失之外,本發明上有其他特點。舉Page 10 414728 V. Description of the invention (8) Even the above-mentioned injection assembly 820 is preferably connected to the SOG injector 810. For example, the distal end 806b of the injection line 806 is fixed to the SOG injector 810. Refer to Figures 9A and 9B. The flushing fluid will pass through the spray assembly connected to the SOG injector. The ninth circle a shows that the sog injector 810 is disposed at the correct position ', and the ninth b circle shows that the sog injector 810 is disposed at an incorrect position. However, even if the positioning is not correct, its injection assembly 820 series and SOG injector 810 series are on the same component, so poor positioning will not be a problem. Therefore, this design provides a solution to the prior art problems caused by the first cause. The design of the injection assembly of the present invention also provides a solution to the previous technical problems caused by the second cause "please refer to Figures 10A and + B, where Figure 10A shows that the hydraulic pressure of the flushing fluid is high, and Figure 10B shows that the flushing flow has a lower hydraulic pressure. Since the above-mentioned injection assembly 820 covers the SOG injector 8 in a coaxial manner, even if the above-mentioned flushing fluid is hydraulically unstable, it can be guaranteed that a fluid will flow through the soG nozzle 802 ^. In addition, 'because the spray assembly 820 of the present invention is packaged or mouthwashed by the SOG sprayer 810, the parties around the SOG sprayer 810 are cleaned with liquid evenly. The dirty f = 'on the other side is shown in the tenth figure. Therefore, the above-mentioned injection assembly 82G can also be solved due to the third cause. In addition to improving the original defect, the present invention has other features. Give

第11頁 414728 五、發明說明(9) 例來說’流經噴射總成820的沖洗流體會自然而然地加速 ,如第十三C圖所示。我們知道在流速一定的時候,如果 出口面積變小,則截面流速變大(試想澆水的水管,用手 遮住水口 一半時,則噴出之流速加倍)β本發明亦是利用 此物理法則’如第十二圖、第十三Α圖和第十三Β圖所示 ,其中第十三A圖和第十三B圖分別是根據第十二圖中 1 3A-1 3A和1 3B-1 3B剖面線所繪示出來的剖面示意圖β由該 些圖中可知,喷射總成820在靠近SOG噴射器810底部的截 面積’小於該噴射總成820在遠離SOG喷射器810底部的截 面積。 請回到第八Α圖和第八Β圖’ SOG喷射器810最好是大約 垂直的’藉以利用重力沖洗SOG喷射器810 ^不過,除了重 力之外’吾人尚可利用其他來自流體供應總成830的動力 來沖洗SOG喷射器810 ^這樣的流體供應總成830更可至少 包含並聯的第一活門(valve)832a和第二活門832b,其中 第一活門832a係被控制,以提供喷射總成82〇異丙醇之用 ’而第—活門8 3 2 b係被控制’以提供噴射總成8 2 〇氮氣之 用》當欲進行沖洗時’可關閉第二活門832b但打開第一活 門832a,而提供異丙醇以沖洗S0G喷射器81〇。在以異丙醇 清洗SOG喷射器81〇之後,可以關閉第一活門⑽“並打開第 二活門832b,以提供氮氣喷洗SOG噴射器81〇,以達清潔之 效。Page 11 414728 V. Description of the invention (9) For example, the flushing fluid flowing through the jet assembly 820 will naturally accelerate, as shown in Figure 13C. We know that when the flow rate is constant, if the area of the outlet becomes smaller, the cross-sectional flow rate will increase (think of a watering pipe, when the hand covers half of the water outlet, the flow rate will be doubled). Β This invention also uses this physical rule. As shown in Figures 12, 13A and 13B, Figures 13A and 13B are based on Figures 1 3A-1 3A and 1 3B-1, respectively. The sectional schematic diagram β shown by the 3B section line shows that the cross-sectional area of the injection assembly 820 near the bottom of the SOG injector 810 is smaller than the cross-sectional area of the injection assembly 820 near the bottom of the SOG injector 810. Please go back to Figures 8A and 8B. 'The SOG injector 810 is preferably about vertical' so as to flush the SOG injector 810 with gravity. ^ However, in addition to gravity, I can use other fluid supply assemblies 830 power to flush the SOG injector 810. Such a fluid supply assembly 830 may further include at least a first valve 832a and a second valve 832b connected in parallel, wherein the first valve 832a is controlled to provide the injection assembly 82〇 The use of isopropanol 'and the first valve 8 3 2 b is controlled' to provide the injection assembly 8 2 0 nitrogen. "When flushing is required ', the second valve 832b can be closed but the first valve 832a is opened And isopropanol was provided to flush the SOG injector 81. After the SOG ejector 81o is cleaned with isopropanol, the first shutter ⑽ may be closed and the second shutter 832b may be opened to provide a nitrogen spray to clean the SOG ejector 81o for cleaning.

第12頁 414728Page 12 414728

五、發明說明(10) 特別注意的是,本發明 洗SOG喷射器810 »任何其他 物件亦可應用本發明進行沖 量也不限定只能是一個,其 離本發明之精神範圍,如第 之喷射總成8 2 0並非限定在沖 亦有粒子結晶或聚集在上面的 洗。此外,喷射總成820的數 他諸如兩個以上的設計亦不脫 十四A圖和第十四b圖所示。 —雖然本發明已以較佳實施例揭露如上,然其並非用以 限^本發明,任何熟習此技藝者,在未脫離本發明之精神 和範圍内’當可作等效改變或修飾。因此本發明之保護範 圍,當視後附之申請專利範圍所界定者為準。V. Explanation of the invention (10) It is particularly noted that the SOG sprayer 810 of the present invention can be applied to any other object, and the impulse is not limited to one, which is beyond the spirit of the present invention, as described in the The spray assembly 8 2 0 is not limited to washing and there are particles that crystallize or collect on it. In addition, the number of injection assemblies 820 such as two or more designs can not be separated from Figure 14A and Figure 14b. -Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Anyone skilled in the art can make equivalent changes or modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be determined by the scope of the attached patent application.

第13頁Page 13

Claims (1)

414728 六、申請專利範圍 1 之: = 中洗喷嘴的設備,其中該喷嘴係連接在-垂直 喷官的底邛,该用於沖洗噴嘴的設備至少包含: 典始管線’卩同軸的方式包覆該噴管,其中該喷射 吕有罪近該噴嘴的一近端,以及遠離該噴嘴的—遠端 f :喷射喷頭,連接該嗔射管線之該近端,其中該喷射 喷頭係以同軸的方式包覆該噴管;以及 :流體供給總成,用以對該喷射管線和該噴射噴頭提 供一沖洗流體。 2.如申凊專利範圍第1項所述之用於沖洗喷嘴的設備, 中該喷射管線之遠端係與該喷管連接。 、 3 _如申μ專利範圍第1項所述之用於沖洗喷嘴的設備,其 中該喷管和該噴嘴可以對—晶片提供一旋塗式玻璃材料。、 4 如申请專利範圍第1項所述之用於沖洗喷嘴的設備,其 中該沖洗流體係選自於由異丙醇、氮氣、及其組合所組成 的族群之一。 5. —種用來沖洗大約垂直之旋塗式玻璃(s〇G)喷射器的設 備,至少包含: —喷射總成’實質上以同軸的方式覆蓋該旋塗式玻璃 噴射器,但和該旋塗式玻璃噴射器之間有一定之間隔距離414728 Sixth, the scope of application for patent 1: Equipment for intermediate washing nozzles, where the nozzles are connected to the bottom of the vertical spraying officer. The equipment for flushing the nozzles at least includes: Coated in a coaxial manner. The nozzle, wherein the jet is guilty near a proximal end of the nozzle, and the distal end far from the nozzle f: a jet nozzle connected to the proximal end of the jet line, wherein the jet nozzle is coaxial Covering the nozzle; and a fluid supply assembly for supplying a flushing fluid to the spray line and the spray nozzle. 2. The device for flushing a nozzle as described in item 1 of the scope of the patent application, wherein the distal end of the spray line is connected to the nozzle. 3 _ The equipment for flushing nozzles as described in the first item of the patent application, wherein the nozzle and the nozzle can provide a spin-on glass material to the wafer. 4, The device for flushing nozzles according to item 1 of the scope of patent application, wherein the flushing flow system is selected from one of the groups consisting of isopropyl alcohol, nitrogen, and combinations thereof. 5. — A device for flushing a spin coating glass (sog) sprayer approximately vertical, comprising at least: — a spray assembly 'coaxially covers the spin coating glass sprayer, but with the There is a certain distance between the spin-on glass sprayers 414728414728 六、申請專利範圍 ;以及 流體供應總成,用以對該喷射總成提供一沖洗流體 6.如申請專利範圍第5項所述之用來沖洗大約垂直之旋塗 式玻璃噴射器的設備,其中該噴射總成至少包含一喷射管 線和一喷射噴頭連接在該喷射管線的底部。 7:如申請專利範圍第5項戶斤述之用來沖洗大約垂直之旋塗 式玻璃嗔射器的設備,其Φ辞祐& 幻乂 卉肀。亥紅塗式玻璃噴射器至少包含 '^疋塗式玻璃喷管和一旋塗武祐链喊办、金 @ 々疋:式玻璃喷嘴連接至該旋塗式玻 利範圍第5項所述之用來沖洗大約垂直之旋塗 mr設備中該沖洗流體係選自於由異丙醇 、氮耽、及其組合所組成的族群之_ c 至少包含: 該物件,但與 供一沖洗流體 9. 一種用來沖洗一大約垂直之物件的設備, 一噴射總成,實質上以同軸的方^覆蓋 該物件有一定的間隔距離;以及 一流體供應總成,用以對該噴射總成提 10.如申請專利範圍第9項所述之用來沖洗—大約垂直之物6. The scope of patent application; and the fluid supply assembly for providing a flushing fluid to the spray assembly 6. The equipment for flushing the approximately vertical spin-on glass sprayer as described in item 5 of the scope of patent application, The spray assembly includes at least a spray line and a spray head connected to the bottom of the spray line. 7: As described in item 5 of the scope of the patent application, the equipment used to flush the approximately vertical spin-on glass ejector is φ 辞 & & 乂 乂 肀 肀. The Haihong coated glass sprayer contains at least '^ 疋 coated glass nozzle and a spin coating Wuyou chain shouting, gold @ 金: a glass nozzle is connected to the spin coating type Boli range for the purpose described in item 5 A flushing approximately vertical spin-coating mr device in which the flushing flow system is selected from the group consisting of isopropanol, nitrogen, and combinations thereof _ c contains at least: the object, but with a flushing fluid 9. One use Equipment for washing an approximately vertical object, a spray assembly, substantially covering the object with a coaxial square ^ at a certain separation distance; and a fluid supply assembly to raise the spray assembly 10. If applied For flushing as described in item 9 of the patent-approximately vertical 第15頁 414728Page 15 414728 六、申請專利範固 件的設備’其中該喷射總成在靠近該物件底部的截面積 小於在遠離物件底部的截面積。 11.如申請專利範圍第9項所述之用來沖洗一大約垂直之物 件的設備,其中該物件是一個可以對一晶片提供旋塗式玻 璃材料的旋塗式玻璃(SOG)喷射器。 12.如申請專利範圍第11項所述之用來沖洗一大約垂直之 物件的設備’其中該旋塗式玻璃噴射器至少包含一旋塗式 玻璃喷管和一旋塗式玻璃喷嘴連接在該旋塗式玻璃噴管。 13·如申請專利範圍第9項所述之用來沖洗一大約垂直之物 件的設備’其中該沖洗流體係選自於由異丙醇、氮 其組合埘組成之族群之—^ '6. Equipment for applying for a patent-provided firmware, wherein the cross-sectional area of the jet assembly near the bottom of the object is smaller than the cross-sectional area of the jet assembly far from the bottom of the object. 11. An apparatus for processing an approximately vertical object as described in claim 9 of the scope of the patent application, wherein the object is a spin-on-glass (SOG) sprayer that can provide spin-on-glass material to a wafer. 12. The device for washing an approximately vertical object as described in item 11 of the scope of the patent application, wherein the spin-on glass sprayer includes at least a spin-on glass nozzle and a spin-on glass nozzle connected to the Spin-coated glass nozzle. 13. The equipment for flushing an approximately vertical object as described in item 9 of the scope of the patent application, wherein the flushing flow system is selected from the group consisting of isopropyl alcohol, nitrogen and a combination of them— ^ ' 第16頁Page 16
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202014105600U1 (en) 2014-08-13 2015-01-09 Chin-Lin Tsai Gas burner with a removable burner

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202014105600U1 (en) 2014-08-13 2015-01-09 Chin-Lin Tsai Gas burner with a removable burner

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