A7 A7 4057t\vf.doc/008 B7 五、發明説明（丨） 本發明是有關於一種化學機械硏磨裝置，且特別是有關 於一種具臨場混合（In-situ Mixing)功能及具攪拌功能的化 學機械硏磨(Chemical Mechanical Polishing ; CMP)硏磨液 (Slurry)供應管件。 當半導體元件的積集度（Integration)愈來愈高之後，爲 了配合金氧半（MOS)電晶體縮小後所增加的內連線需求， 兩層以上的金屬層設計，便逐漸地成爲許多積體電路所必 須採用的方式。然而，爲了使多重金屬內連線的製作較容 易進行’且經轉移的導線圖案較爲精確，因此如何使晶圓 (Wafer)高低起伏的表面加以平坦化是非常重要的。此外， 晶圓平坦化是影響對準系統對準之準確度的主要因素，假 若晶圓平坦化做不好’那麼不僅對準系統無法準確地使光 罩(Mask)對準晶圓，更會造成製程中的錯誤機會增加。 CMP可說是現在唯一能提供超大型積體電路（VLSI)， 甚至極大型積體電路（ULSI)製程，「全面性平坦化（G1〇bal Planarization)」的一種新技術。它主要就是利用類似磨刀 的機械式硏磨的原理，配合適當的化學助劑(Reagent)，來 把晶片表面局低起伏不一的輪廓，一倂加以磨平的一種平 坦化技術。 在CMP的製程上’我們通常以硏漿或硏磨液來稱呼所 使用的化學助劑。CMP所使用的硏磨液，主要是由呈膠體 狀（Colloidal)的矽土（Silica)，或呈分散狀（Dispersed)的鋁 土 (Alumina)，和鹼性的氫氧化鉀(KOH)或氫氧化銨(NH4〇h) 寺溶液所混合而成的。這些硬度極高的硏磨顆粒，在硏磨 3 g張尺度適用ϋ國家標準（CNS ) ϋ¥Τ2Ϊ〇_Χ29ϋΓί —--- ("先間讀背而之注意事項再填寫本頁) 、1Τ 經滴部中次標準局只工消费合作社印裝 4〇57twf.doc/008 137 五、發明説明（入） 液內的大小分佈’約在0.1〜2·0!1111之間。基本上，我們就 是利用硏磨液內的這.些硏磨性極高的微粒，來進行晶片的 表面硏磨。、 ' * 在CMP技術中，硏磨液的供應對於製程的穩定性有著 重要的影響。由於硏磨液逋、氣潯、濃縮配方，使用時需以水 稀釋，或者需有幾項I同硏磨液混合使用，、因此習知技藝 中，常需額外添加一預混設爾（Premixe〇 ’以供硏磨液調 配適當之比例，充分混合之後再將硏磨液導入/CMP機台 中使用。再者，當硏磨液混合時’其特性通常會隨混合時 間改變而造麻製程能力的改變’因此通常當硏磨液混合 後，均需在一定時間內用完’此時間稱爲「容器耐用期限 (Pot Life)」。因爲硏磨液混合後的木穩定性，以及需要額 外的混合設備，/於是有人提出臨場硏磨液混合（In-Situ Mixing)的觀念。但亦有人認爲臨場浪合的時間較短，因 此混合效果較差，使硏磨液之品質不易控制。 有鑑於此，本發明的一目的就是在提供一種小型管件， 透過管件的設計，可加強硏磨液的混合效果，改善臨場混 合不易均勻之缺點。 經滴部中央標"局只工消费合作社印製 (詞先閱讀背而之汶意事項再填寫本頁}A7 A7 4057t \ vf.doc / 008 B7 V. Description of the invention (丨) The present invention relates to a chemical mechanical honing device, and in particular to a device with in-situ mixing function and stirring function. Chemical mechanical honing (CMP) honing fluid (Slurry) supply pipe fittings. After the integration degree of semiconductor devices is getting higher and higher, in order to match the increased interconnection requirements after the shrinkage of metal-oxide-semiconductor (MOS) transistors, the design of two or more metal layers has gradually become a large number of products. Must be used in the body circuit. However, in order to make the fabrication of multi-metal interconnects easier and the transferred wire patterns are more accurate, how to flatten the undulating surface of the wafer is very important. In addition, wafer planarization is the main factor that affects the alignment accuracy of the alignment system. If the wafer planarization is not done well, then not only the alignment system cannot accurately align the mask to the wafer, but also Increased chance of errors in the process. CMP can be said to be the only new technology that can provide very large scale integrated circuit (VLSI), or even very large scale integrated circuit (ULSI) process, "Global Planarization". It is mainly a flattening technique that uses the principle of a mechanical honing similar to a sharpening knife and cooperates with appropriate chemical agents (Reagent) to reduce the unevenness of the surface of the wafer. In the CMP process, we usually refer to the chemical additives used as mortar or honing fluid. The honing fluid used in CMP is mainly composed of colloidal silica (Silica), or dispersed (Dispersed) alumina (Alumina), and alkaline potassium hydroxide (KOH) or hydrogen It is a mixture of ammonium oxide (NH4〇h) temple solution. These extremely hard honing particles are applicable to the national standard (CNS) at the honing 3 g scale. Ϋ ¥ Τ2Ϊ〇_Χ29ϋΓί --- (" read the precautions before filling in this page), 1T Printed by the Intermediate Standards Bureau of the Ministry of Industry, only printed by consumer cooperatives 4057twf.doc / 008 137 5. Description of the invention (into) The size distribution in the liquid is about 0.1 ~ 2 · 0! 1111. Basically, we use these highly abrasive particles in the honing liquid to perform wafer surface honing. "* In CMP technology, the supply of honing fluid has an important impact on the stability of the process. As the honing liquid 逋, air 浔, concentrated formula, it needs to be diluted with water when used, or several I must be mixed with the honing liquid. Therefore, in the conventional art, it is often necessary to add an additional premixer (Premixe 〇'The blending honing liquid is mixed in an appropriate ratio, and the honing liquid is introduced into the / CMP machine for use after mixing. Furthermore, when the honing liquid is mixed, its characteristics usually change with the mixing time and make the hemp process ability. The change 'so usually when the honing fluid is mixed, it needs to be used up within a certain time' This time is called "Pot Life". Because of the stability of the wood after the honing fluid is mixed, and the need for additional Mixing equipment, so some people put forward the concept of in-situ mixing fluid (In-Situ Mixing). However, some people think that the mixing time is short, so the mixing effect is poor, making the quality of honing fluid difficult to control. In view of this An object of the present invention is to provide a small pipe fitting. Through the design of the pipe fitting, the mixing effect of the honing liquid can be strengthened, and the disadvantage that the mixing in the field is difficult to be uniform is improved. Printed by Consumer Cooperatives (Read the back of the word before filling out this page)
、1T 本發明的另一目的是在提i共一種具臨場混合功能之流體 供應管件，提昇液體在管件中的攪拌效果。 本發明的另一目的是在提供一種具攪拌功能的CMP硏 磨液供'應管件，使CMP硏磨液充分混合，並且立即供應 至CMP機台進行硏磨，以維持CMP的硏磨速率的一致性。 根據本發明之上述目的，提出一種具臨場混合功能以及 4 本紙張尺度適用國家標準(CNS ) Λ4悅梠 Α7 137 4057tvvf.doc/008 五、發明説明（6) 具攪拌功能的CMP硏磨液供應管件。此管件特徵在於存 在有一旋轉式內管，此內管兩側的不同端部位上分別形成 有數個孔洞，而以一脈衝式幫浦推動流體或是CMP硏磨 液時，旋轉式內管即可旋轉，因此可達到攪拌及混合的目 的。 爲讓本發明之上述和其他目的、特徵、和優點能更明顯 易懂，下文特舉一較佳實施例，並配合所附圖式，作詳細 說明如下： 圖式之簡單說明： 第1圖繪示本發明一較佳實施例所提出之一種硏磨液供 應管件之上視示意圖；以及 第2圖繪示沿著第1圖之II-II線所得之剖面示意圖。 圖式之標記說明： 1〇〇 :硏磨液供應管件 102 :外管 103 :擴張段 104 :內管 106、108、1 18 :開口 110 :導出管 112 :導入管 114、116 :副導入管 120、122 :孔洞 實施例 本發明提出一種具有臨場攪拌功能的流體供應管件，特 5 本紙張尺度適用中國國家標準（CNS ) ( 210X 297公轱） (誚先閲讀背而之注意事項4填寫本页 、1Τ .疒- 經漓部中央標率局只工消費合作社印製 4057twf.doc/〇〇8 經濟部中央標隼局貝工消费合作社印製 A7 B7 五、發明説明（L ) 別適用於CMP硏磨液的供應，管件形狀如第1與2圖所 示。其中第1圖係第2圖之上視圖，而第2圖係沿著第1 圖中II-II方向所得之剖面示意圖。此具臨場混合功能的流 體供應管件100，其可達成即時攪拌混合之目的。此流體 供應管件100包括可旋轉之內管104,以及密閉式套住內 管104的外管。 外管102之形狀例如可爲中空圓型，且剖面形狀類似中 空「+」型’也就是具有一擴張部位103，此擴張部位1〇3 之口徑約大於外管102之其他部位。以剖面圖（如第2圖 所示之形狀）爲例，外管102之邊緣係封閉的，而外管102 的上下表面上分別具有開口 106與1〇8。開口 106例如可、 ’ 甩來連接至硏磨液之導出管110，使釋硏磨液可經由導出 管110而滴在晶片上，，藉以作爲化學機械硏磨之用。開口 108則例如可用來寒接挤虐:液之Ji入管π2、藉以使得硏 磨液可經由導入管112進入本發明之具有攪拌功能的流體 供應管件100。 ·1T Another object of the present invention is to provide a fluid supply pipe fitting with on-site mixing function to improve the stirring effect of the liquid in the pipe fitting. Another object of the present invention is to provide a CMP honing liquid supply pipe with stirring function, so that the CMP honing liquid is fully mixed and immediately supplied to the CMP machine for honing to maintain the CMP honing rate. consistency. According to the above-mentioned purpose of the present invention, a kind of on-site mixing function and 4 paper standards applicable to the national standard (CNS) Λ4 悦 梠 Α7 137 4057tvvf.doc / 008 V. Description of the invention (6) CMP honing liquid supply with stirring function Pipe fittings. This pipe is characterized by the existence of a rotating inner tube. Several holes are formed at different end portions on both sides of the inner tube. When a pulsed pump is used to push the fluid or the CMP honing fluid, the rotating inner tube can be used. Rotate, so you can achieve the purpose of stirring and mixing. In order to make the above and other objects, features, and advantages of the present invention more comprehensible, a preferred embodiment is given below in conjunction with the accompanying drawings for detailed description as follows: Brief description of the drawings: FIG. 1 A schematic top view of a honing fluid supply pipe according to a preferred embodiment of the present invention is shown; and FIG. 2 is a schematic cross-sectional view taken along line II-II of FIG. 1. Explanation of the marks in the drawing: 100: honing fluid supply pipe 102: outer pipe 103: expansion section 104: inner pipe 106, 108, 1 18: opening 110: lead-out pipe 112: lead-in pipe 114, 116: auxiliary lead-in pipe 120, 122: Examples of holes The present invention proposes a fluid supply pipe fitting with on-site agitation. Special 5 paper sizes are applicable to Chinese National Standards (CNS) (210X 297 cm) (Please read the back notice first and fill out this note Page, 1T. 疒-Printed by the Central Standards Bureau of the Ministry of Economic Affairs, printed by the Consumer Cooperative Cooperative 4057twf.doc / 〇〇8 Printed by the Central Standards Bureau of the Ministry of Economic Affairs, printed by the Shellfish Consumer Cooperative, A7 B7 V. Description of the invention (L) The supply of CMP honing fluid, the shape of the pipe is shown in Figures 1 and 2. Figure 1 is a top view of Figure 2, and Figure 2 is a schematic cross-sectional view taken along the direction II-II in Figure 1. The fluid supply pipe fitting 100 with on-site mixing function can achieve the purpose of instant mixing and mixing. The fluid supply pipe fitting 100 includes a rotatable inner pipe 104 and an outer pipe which encloses the inner pipe 104 in a closed manner. The shape of the outer pipe 102 For example, it can be a hollow circle with a similar cross-sectional shape. The empty "+" type has an expanded portion 103, and the diameter of this expanded portion 103 is larger than that of the other portions of the outer tube 102. Taking the cross-sectional view (the shape shown in Fig. 2) as an example, the outer tube 102 The edges of the outer tube 102 are closed, and the upper and lower surfaces of the outer tube 102 have openings 106 and 108 respectively. The openings 106 can be, for example, connected to the discharge tube 110 of the honing fluid, so that the honing fluid can pass through the outlet tube. 110 is dropped on the wafer for chemical mechanical honing. The opening 108 can be used for example to cold-squeeze: the Ji's pipe of the liquid π2, so that the honing fluid can enter the present invention through the introduction pipe 112 with stirring. Functional fluid supply fitting 100. ·
I 此導入管II2之形狀’例如可以爲第2圖所示之中空 •「Y」型’然本發明中導入管112之形狀，並不限定於「γ」 型。以第2圖所示之導入管112爲例，其具有兩個互相交 會在一起的副導入管114與116。副導入管114之目的在 於使得不同種類的硏磨液可經由副導入管U4與116而臨 場混合在一起。依據本發明之裝置，導入管n2也可以是 具有其它的形狀，例如具有兩個以上之副導入管，然此導 入管12之形狀因爲非關本發明之特徵，故此處不再贅述。 __^_ 6 _本紙張尺度適用"^??¥?7^ ---------------------- (誚先閱讀背而之注意事項再填寫本頁)I The shape of the introduction tube II2 may be, for example, the hollow shape shown in FIG. 2 • "Y" shape. However, the shape of the introduction tube 112 in the present invention is not limited to the "γ" shape. Taking the introduction pipe 112 shown in Fig. 2 as an example, it has two auxiliary introduction pipes 114 and 116 which meet each other. The purpose of the auxiliary introduction pipe 114 is to enable different types of honing fluids to be mixed together on the spot via the auxiliary introduction pipes U4 and 116. According to the device of the present invention, the introduction tube n2 may also have other shapes, such as having two or more secondary introduction tubes. However, the shape of the introduction tube 12 is not related to the features of the present invention, so it will not be repeated here. __ ^ _ 6 _This paper size is applicable " ^ ?? ¥? 7 ^ ---------------------- (诮 Read the precautions before reading (Fill in this page)
A7 B7 經濟部中央標準局货工消费合作社印t g 9 6 4 5 4057twf.doc/008 五、發明説明（< ) 請參照第2圖，內管1〇4之上視形狀可以是中空矩形， 內管104之口徑約小於外管102，且內管104之剖面形狀 類似於中空「T」型。此外’內管104可在外管102內部 呈順時鐘或逆時鐘方向旋轉。.以剖面圖（如第2圖所示之 形狀)爲例，內管1〇4之兩側端係封閉’且內管104的下 方具有開口 118。其中，內管1〇4之開口 II8的方向與外 管1〇2之開口 108方向相同。內管1〇4其中一側的一端形' 成有數個小孔洞120，而另一側的另一端則形成有數個小 孔洞122。又，在本發明中小孔洞120與122之口徑大小 並不受限制，某直徑只須約大於硏磨液中固態物質之尺寸 大小即可。 而値得注薏的一點fe小孔洞12〇與I22的位置並不互相 對應(請參照第1圖），也就是當內管1〇4中的硏_濟分別 由小孔洞12〇與〗22噴出時’所產生釣力矩不會相互抵涫。 .所以內管104可以順時鐘或逆诗鐘方向·旋轉，此旋轉方向 - ， * ' . - ..可根據小孔洞120與.ί2^4布的位置而定。·因爲內管Γ&4· -I · · 可以旋轉，故，可以將啦於內管104與外管_ 1()2內的複合 硏磨液混合均勻，而達到進一步臨場混合的效果、。而經由 , · 小孔洞120與120噴出之硏jg液將流至外管‘102中，補使 .得硏磨液可'經由導出管Π0而滴在晶片上，藉以作爲化學、 機械硏磨之用。 . 因爲外管102是密閉式的套住內管104，所以當硏磨液〜 經過外管102而流通至內管104時，可防止硏磨液滲漏出 來。 7 本紙張尺度適用中國國家標隼（CNS ) Λ4規指(210X297^^ j '… (邻先閲讀背面之注意事項再填寫本頁)A7 B7 Printed by the Consumer Goods Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs tg 9 6 4 5 4057twf.doc / 008 V. Description of the invention () Please refer to Figure 2. The shape of the inner tube 104 as viewed from above can be a hollow rectangle. The diameter of the inner tube 104 is smaller than that of the outer tube 102, and the cross-sectional shape of the inner tube 104 is similar to the hollow "T" shape. In addition, the 'inner tube 104 can rotate clockwise or counterclockwise inside the outer tube 102. Taking a cross-sectional view (the shape shown in FIG. 2) as an example, both ends of the inner tube 104 are closed 'and an opening 118 is provided below the inner tube 104. The direction of the opening II8 of the inner tube 104 is the same as the direction of the opening 108 of the outer tube 102. One end of one side of the inner tube 104 is formed with a plurality of small holes 120, and the other end of the other side is formed with a plurality of small holes 122. In addition, in the present invention, the diameters of the small holes 120 and 122 are not limited, and a certain diameter only needs to be larger than the size of the solid substance in the honing liquid. The position of the small hole 12o and I22, which is worth noting, does not correspond to each other (please refer to Figure 1), that is, the small holes in the inner tube 104 are divided by the small holes 120 and 22 At the time of spurting, the fishing moments generated will not offset each other. Therefore, the inner tube 104 can be rotated clockwise or counterclockwise, and the direction of rotation-, * '.--... Can be determined according to the positions of the small holes 120 and ί 2 ^ 4 cloth. · Because the inner tube Γ & 4 · -I ·· can be rotated, the compound honing fluid in the inner tube 104 and the outer tube _ 1 () 2 can be mixed uniformly to achieve the effect of further on-site mixing. And through, · The 硏 jg liquid sprayed from the small holes 120 and 120 will flow into the outer tube '102 to make up. The honing liquid can be dripped on the wafer through the outlet tube Π0, which is used as a chemical and mechanical honing use. Since the outer tube 102 is a closed type surrounding the inner tube 104, the honing fluid can be prevented from leaking out when the honing fluid passes through the outer tube 102 to the inner tube 104. 7 This paper size applies Chinese National Standards (CNS) Λ4 regulations (210X297 ^^ j '... (Please read the precautions on the back before filling in this page)
經¾-部中央標準局貝工消费合作社印敢 396445 4057twf.doc/008 ΑΊ ____ ___ B7 g · 一.·- - . . , ι,ι , , 麵----------—，. . · 五'發明説明（έ) • 再者，因爲CMP硏磨液通常具有腐蝕性，所以內管1〇4 與外管102的材質可爲鐵氟龍(Tefl〇n)等耐腐蝕材質。 一般帶動硏磨液的幫浦爲脈衝式幫浦，因此硏磨液的輸 送動作可因脈衝尖峰期間與脈衝離峰時間而有所不同。當 硏磨液在脈衝尖峰擠進內管104並由小孔洞120與122噴 出時’便會使內管104轉動’同時攪拌內管1〇4與外管1〇2 內部之硏磨液，達到混合均勻之目的。然，本發明並不限 用於此種脈衝式幫浦，本發明同樣適用於其他非脈衝式的 幫浦。 因此’此流體供應管件100被使用來供應CMP硏磨液 時，可以於流體供應管件1 〇〇內攪拌CMP硏磨液u另外， 此流體供應管件100特別適用於臨場硏磨液混合，如此， ，可使CMP製程硏磨速率趨於穩定。 由上述本發明較佳實施例可知，本發明所提出之具攪拌 功能的管件，可以混合攪捽液體。因此，若通入管件中的 液體爲複合液體時，經由本發明所提出之管件，可以即時 攪拌液體’均勻混合管件中的複合液體。另外，上述本發 明所提出之管件不僅可用來供應液體，更可以被用來供應 氣體等’所以其亦可稱爲具臨場混合功能的流體供應管 件。 雖然本發明已以較佳實施例揭露如上，然其並非用以限 定本發明，任何熟習此技藝者，在不脫離本發明之精神和 範圍內，當可作各種之更動與潤飾，因此本發明之保護範 圍當視後附之申請專利範圍所界定者爲準。 8 本紙浪尺度適用中國國家標準（CNS ) Λ4说梠（210X297公~势） "' * (請先閱讀t·面之注意事項再填离本页)The Ministry of Central Standards Bureau, Shellfish Consumer Cooperatives, Yin Gan 396445 4057twf.doc / 008 ΑΊ ____ ___ B7 g · I ..--.., Ι, ι,, noodles ------------ ··· 5 'Description of the Invention (έ) • Furthermore, because the CMP honing fluid is usually corrosive, the material of the inner tube 104 and the outer tube 102 may be corrosion resistant such as Teflon. Material. Generally, the pump that drives the honing fluid is a pulsed pump. Therefore, the honing fluid's delivery behavior may be different due to the pulse peak period and the pulse off-peak time. When the honing fluid is squeezed into the inner tube 104 at the pulse spike and sprayed out from the small holes 120 and 122, it will cause the inner tube 104 to rotate and simultaneously stir the honing fluid inside the inner tube 104 and the outer tube 102 to reach The purpose of mixing evenly. However, the present invention is not limited to such pulsed pumps, and the present invention is also applicable to other non-pulsed pumps. Therefore, when the fluid supply pipe 100 is used to supply the CMP honing fluid, the CMP honing fluid can be stirred in the fluid supply pipe 1000. In addition, the fluid supply pipe 100 is particularly suitable for mixing honing fluid on the spot. , Which can stabilize the CMP process honing rate. It can be known from the above-mentioned preferred embodiments of the present invention that the pipe fittings with stirring function proposed by the present invention can mix and stir the liquid. Therefore, if the liquid to be passed into the pipe is a composite liquid, the liquid in the pipe can be immediately stirred through the pipe proposed by the present invention to uniformly mix the composite liquid in the pipe. In addition, the pipe fittings proposed by the present invention can be used not only for supplying liquids, but also for supplying gas, etc., so they can also be referred to as fluid supply fittings with on-site mixing functions. Although the present invention has been disclosed as above with a preferred embodiment, it is not intended to limit the present invention. Any person skilled in the art can make various modifications and retouches without departing from the spirit and scope of the present invention. Therefore, the present invention The scope of protection shall be determined by the scope of the attached patent application. 8 This paper scale applies the Chinese National Standard (CNS) Λ4 said 梠 (210X297 male ~ potential) " '* (Please read the precautions for t · face before filling out this page)