TW388920B - Shutter mechanism of light irradiation apparatus - Google Patents

Shutter mechanism of light irradiation apparatus Download PDF

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Publication number
TW388920B
TW388920B TW087111148A TW87111148A TW388920B TW 388920 B TW388920 B TW 388920B TW 087111148 A TW087111148 A TW 087111148A TW 87111148 A TW87111148 A TW 87111148A TW 388920 B TW388920 B TW 388920B
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TW
Taiwan
Prior art keywords
shutter
shutter plate
light
cooling
plate
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TW087111148A
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Chinese (zh)
Inventor
Takanao Ueno
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Ushio Electric Inc
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Publication of TW388920B publication Critical patent/TW388920B/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891Temperature
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Toxicology (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)

Abstract

The present invention provides a shutter mechanism which occupies a smaller area with a shutter plate, does not require a large size shutter drive mechanism, and can effectively cool the shutter plate. The light beam emitted from a light irradiating source is shielded by a shutter plate 11a. The shutter can be opened by moving the shutter plate 11a upward with an air-cylinder 16a. In this case, a cooling nozzle 14a also moves together with the shutter plate 11a, and the center area of the shutter plate 11a is always cooled by the cooling air. The shutter can also be closed by moving a shutter plate 11b upward with an air cylinder 16b. Thereby, the light beam is shielded by the shutter plate 11b. A cooling nozzle 14b moves together with the shutter plate 11b, and the shutter plate 11b is cooled by the cooling air at all times. Next, the shutter can then be opened by moving the shutter plate 11b downward, and the shutter is closed by moving the shutter plate 11a downward.

Description

A7 A7 經濟部中央橾準局月工消費合作社印掣 五、發明説明(1 ) 發明所屬之技術領域 曝光裝置被使用於半導體裝置、印刷電路板、液晶基 板等的生專。本發明係關於在被使用於上述曝光裝置的照 光裝置,開閉從燈所射出的光線的光路之快門機構。 先行技術 第3圖係顯示被使用於曝光裝置等的照光裝置的構成 之一;例。 於該圖,從燈1所放出的包含紫外線的光線,藉由聚 光鏡2而聚光,透過凹面鏡3入射於第1平面鏡4 ·在第 1平面鏡4反射的光線,聚光於爲了使在照射區域的照度 分布均一化而設的累積(integrator )透鏡5的入射部附近 。從累積透鏡5所射出的光線,透過快門機構6·、、第2平 面鏡7而入射至準直(collimator )透鏡8,在準直透鏡8 成爲平行光而被照射至照光面。 於上述照光裝置,爲了使被載置於照射面的被處理物 (以下稱爲工作物)的曝光置保持一定,在從快門開(開 始照射)直到快門關(結束照射)爲止的期間,有必''要以 ·· 使照射面的累稹曝光置於照射區域成爲相等的方式開閉快 門機構6。 因此,於從前技術,使用如第4圖所示的旋轉式的快 門機構。 快門板6 1具有如該圖所示的光線通過部與遮光部, 藉由未圖示的馬達等驅動手段,以旋轉軸6 2爲中心向一 本紙張尺度適用中國國家標準(CNS ) Α4ΛΙ格(210X297公釐)-4 _ ---------- {坤先閱讀t-面之注^-事項再填巧本頁) 、π A7 ___B?^ 五、發明説明(2 ) 定的方向回轉。而快門板6 1在該圖(a )所示的位置時 可使光線通過,而在該圖(b )的位置時,可遮住光線。 顯示於第4匯的快門機構,因爲快門板6 1遮光部的 移動方向是一定的,所以具有照射面之累稂曝光量可以成 爲一定的特點(假設照射區&之照射強度的分布是相等的 場合)· 例如第5圖(a) 、(b)所示般的使1枚快門板往 復運動而開閉光路的場合,即使照射區域內的照度分布相 等,於照射面之累稹曝光暈也不會成爲一定。 也就是說,打開快門時,如該圖(a )所示般的首先 於B部份照光,直到快門板完全打開爲止於A部份不會被 照到光線。此外,關閉快門時,如該圖(b )所示A部份 被遮光,而B部份直到快門板完全關閉爲止不會被.遮光。 因此,B部份的照射時間總是較A部份的照射時間更長。 經濟部中央梯準局貝工消費合作社印裝 (誚先《讀背而之注意事項再填寫本頁)A7 A7 Printed by the Central Laboratories of the Ministry of Economic Affairs and the Consumers' Cooperatives of the Ministry of Economic Affairs 5. Description of the Invention (1) The technical field to which the invention belongs The exposure device is used in the field of semiconductor devices, printed circuit boards, liquid crystal substrates, etc. The present invention relates to a shutter mechanism for opening and closing an optical path of light emitted from a lamp in a lighting device used in the exposure device. Prior Art Fig. 3 shows one example of the configuration of an illumination device used in an exposure device or the like. In this figure, the light rays containing ultraviolet rays emitted from the lamp 1 are condensed by the condenser lens 2 and are incident on the first plane mirror 4 through the concave mirror 3. The light reflected by the first plane mirror 4 is condensed so that it is in the irradiation area. Near the incident portion of the integral lens 5 provided with a uniform illuminance distribution. The light emitted from the accumulation lens 5 passes through the shutter mechanism 6 and the second plane mirror 7 and enters a collimator lens 8. The collimator lens 8 becomes parallel light and is irradiated to the light-emitting surface. In the above-mentioned illumination device, in order to keep the exposure position of the processing object (hereinafter referred to as a work object) placed on the irradiation surface constant, there is a period from the shutter opening (starting irradiation) to the shutter closing (ending irradiation). It is necessary to open and close the shutter mechanism 6 in such a way that the cumulative exposure of the irradiation surface is placed on the irradiation area to be equal. Therefore, in the prior art, a rotary shutter mechanism as shown in Fig. 4 is used. The shutter plate 61 has a light-passing portion and a light-shielding portion as shown in the figure, and applies a Chinese standard (CNS) Α4ΛΙ grid to a paper standard with a rotation axis 62 as a center by a driving means such as a motor not shown. (210X297 mm) -4 _ ---------- {Kun first read t-face's note ^ -events and fill in this page), π A7 ___ B? ^ V. Description of the invention (2) Turn in the direction. The shutter plate 61 allows light to pass through at the position shown in the figure (a), and blocks the light at the position shown in the figure (b). The shutter mechanism shown on the fourth sink, because the moving direction of the shutter portion 61 of the shutter plate is constant, the cumulative exposure amount with the irradiation surface can become a certain feature (assuming that the distribution of the irradiation intensity of the irradiation area & is equal (For example) · For example, when a shutter plate is reciprocated to open and close the light path as shown in Figures 5 (a) and (b), even if the illumination distribution in the irradiation area is equal, the exposure exposure on the irradiation surface will be halo. Won't be certain. That is to say, when the shutter is opened, as shown in the figure (a), the first part of the light is illuminated, until the shutter plate is fully opened, the part A will not be illuminated. In addition, when the shutter is closed, part A is blocked from light as shown in the figure (b), and part B is not blocked until the shutter plate is completely closed. Therefore, the exposure time of Part B is always longer than that of Part A. Printed by the Central Laboratories of the Ministry of Economic Affairs, Shellfish Consumer Cooperatives

相對於此,第4圖所示的旋轉式快門機構的場合*因 爲遮光部的移動方向一定的緣故,在開閉快門時,第4圖 之照射面的A部份的曝光時間與B部份的曝光時間總是成 爲相等而照射面之累稹曝光量成爲一定* S 發明所欲解決之課題 近年來,成爲工作物的半導體晶圆或液晶基板朝向大 口徑化、大型化的方向發展,而伴隨著此發展趨勢,也有 對於可以大面稹曝光的照光裝置的要求隨之而來。 於上述照光裝置*爲了防止照射面積越大照度也降低 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐).c . A7 B? 五、發明説明(3 ) 而導致曝光時間欒長,一般使用提高了燈的發光功率的大 型燈具,而光路的直徑也變大。例如,照射面積爲6 0 0 mmx 6 Q Omm 〜7 0 Ommx 7 0 Omm而統括曝光 的裝置的場合,在快門部的光路直徑約爲2 7 Omm,快 門板的遮光部的大小必須爲爲3 0 Ommx 3 0 Omm的 程度。 於上述可大面積曝光的照光裝置,使用前述第4圖所 示的回轉式快門機構的場合,會產生如下的問題· ( a )第4圖所示的快門機構的場合,快門板6 1的 移動面稹,必須要有照射光的光路之至少4倍的面積,裝 置因而大型化》 (b )快門板的旋轉動量是與半徑的平方成比例變大 的緣故,要使快門板6 1的遮光部/光通過部在指、定的位 置以高精度使其停止,必須要有對應於旋轉動量(·角動量 )的大型馬達,此外,有必要使旋轉的快門急速停止的機 構。因此,在裝置大型化的同時裝置的成本也跟著提高· 經濟部中央樣準局貝工消费合作社印褽 ---------- (請先W讀11Γ-面之注^-事項再填寫本頁) (c )對於工作物不進行照射時,於光路插入快門板 (關閉快門),此時來自燈的光線照射於快門板而加^快 門.板。特別是隨著燈的输入變大,快門板的加熱量也變大 4 快門關閉時,被照射光的中央部份的快門溫度變得特 別高,例如燈的輸入爲8 kW、快門部的光路直徑約爲 2 7 Omm,快門板的遮光部的大小爲3 0 Ommx 300mm的場合,中央部溫度達到2 0 0 °C以上而周 本紙張尺度適用中國國家標準(CNS>A4規格(210X297公釐) A7 _ B7 五、發明説明(4 ) 邊部溫度約爲7Ό〜8 Ot,中央部與周邊部的溫度差達 到1 5 0 °C而會產生快門板變形等的問題。 因此,.一般採用對溫度最高的中央部附近吹以從冷卻 噴嘴集中吹出的冷卻風,使中央部附近的溫度降低的所謂 點冷卻方式的方法。 於回轉式快門適用上述點冷卻法的場合,以使在快門 開時冷卻噴嘴不會遮住光路的方式配置冷卻噴嘴,關閉快 門時,有必要對快門板的中央部吹以冷卻風,但是隨奢光 路直徑變大冷卻#嘴與快門板的距離也變大,冷卻噴嘴的 安裝位置有必要朝冷卻風的送風方向進行微妙的調整*因 此,調整上相當耗時,增加了製造階段的成本。 此外,燈的輸入變大的話快門板的溫度上升也變大, 於使用回轉式快門的從前的快門冷卻,上述冷卻噴..嘴的安 裝位置是固定的,只有在快門關閉時才能夠冷卻快門板, 無法進行有效率的冷卻。 本發明係有鑑於此而爲之發明,本發明之第1目的在 於提供即使光路直徑變大也可以使快門板所佔的面積較小 ,不需要大型的快門驅動機構,而且使快門板在開閉位 置以高精度停止的照光裝置的快門機構。 本發明的第2目的,在於提供不霱要微妙調整冷卻噴 嘴的安裝,此外,可以有效率地冷卻快門之照光裝置的快 門機構。 供解決課題之手段 - 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐)~~ --------— I- <諳先閱讀背面之注意事項再填寫本頁 訂 經濟部中央標準局员工消費合作社印掣 經濟部中央標準局員工消費合作衽印製 A7 _B7_ 五、發明説明(5 ) 於照光裝置之快門機構,有必要如前所述對於照射面 使累積曝光置成爲一定的風勢開閉快門板(遮光板)。 於前雄第4圖所示的回轉式快門機構的場合,因爲遮 光部的移動方向是一定的,所以照射面之累稹曝光量可以 爲一定,由於是回轉式的緣故,快門機構所佔的面稹變大 0 另一方面,爲了使快門板所佔的面稹縮小,如前述第 5圖所示使用使1枚遮光板往復運動的快門機構的場合, 照射面之累稹艰光置無法成爲一定· 在此,於本發明,使用2枚遮光板構成快門機構,藉 由使該2枚遮光板交互移動而進行光路的開閉。藉此,快 門板所佔的面積縮小,而且,可以使照射面之累稹曝光量 相等。 ,,, 第2圖係供說明本發明之快門機構的動作之圖。 快門關閉時,如該圖(a )所示,藉由快門板1 1 a ' 遮住光路。 於打開快門的場合,如該圓(b )所示,快門板 1 1 a朝上方移動,如該圖(c )所示般的對照射面^光 。此時,首先於照射面的B部份照光,在快門板1 1 a完 全打開時,成爲照光於照射面的A部份》 於關閉快門的場合,如該圖(d )所示,快門板 1 1 B朝上方移動,如該圖(e )所示般的藉由快門板 1 lb遮斷光路。此時,首先照射面的B部份被遮光,在 快門板11b完全遮住光路時成爲照射面的A部份被遮光 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X297公釐) -8 - {对先閱讀背面之注意事項再填寫本頁) 、?τ 經濟部中央標準局員工消费合作社印聚 A7 __B7_ 五、發明説明(6 )On the other hand, in the case of the rotary shutter mechanism shown in FIG. 4 * Because the moving direction of the light shielding part is constant, when the shutter is opened and closed, the exposure time of part A of the irradiation surface of FIG. 4 is different from that of part B. The exposure time is always equal, and the cumulative exposure amount of the irradiation surface becomes constant. * Such problems to be solved by the invention In recent years, semiconductor wafers or liquid crystal substrates that have become working objects have become larger and larger. With this development trend, there is also a demand for a lighting device capable of large-area exposure. For the above-mentioned lighting device * In order to prevent the larger the illuminated area, the illuminance will also decrease. The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm). C. A7 B? V. Description of the invention (3) leads to a long exposure time Generally, large-scale lamps with increased luminous power are used, and the diameter of the light path also becomes larger. For example, when the exposure area is 600 mm x 6 Q Omm to 7 0 Omm x 70 Omm and the exposure is integrated, the diameter of the light path of the shutter part is about 2 7 Omm, and the size of the light shielding part of the shutter plate must be 3 0 Ommx 3 0 Omm. In the above-mentioned large-area exposure device, when the rotary shutter mechanism shown in FIG. 4 is used, the following problems occur: (a) When the shutter mechanism shown in FIG. 4 is used, the shutter plate 61 The moving surface must have at least 4 times the area of the light path of the light to be irradiated. (B) The rotational momentum of the shutter plate becomes larger in proportion to the square of the radius. The light-shielding unit / light-passing unit is stopped at a predetermined position with high accuracy. A large motor corresponding to the rotational momentum (· angular momentum) is required, and a mechanism for rapidly stopping the rotating shutter is necessary. Therefore, the cost of the installation has also increased along with the increase in the size of the installation. · Institute of Shellfish Consumer Cooperative of the Central Sample Bureau of the Ministry of Economic Affairs. (Fill in this page again) (c) When the work is not illuminated, insert a shutter plate (close the shutter) in the optical path. At this time, the light from the lamp is irradiated on the shutter plate and the shutter plate is added. In particular, as the input of the lamp becomes larger, the amount of heating of the shutter plate also becomes larger. 4 When the shutter is closed, the shutter temperature in the central part of the illuminated light becomes extremely high. For example, the input of the lamp is 8 kW and the light path of the shutter part When the diameter is about 27 mm, and the size of the light-shielding part of the shutter is 30 mm x 300 mm, the temperature of the central part is above 200 ° C, and the paper size of this week applies to the Chinese national standard (CNS > A4 specification (210X297 mm) ) A7 _ B7 V. Description of the invention (4) The temperature of the side is about 7Ό ~ 8 Ot, and the temperature difference between the central and peripheral parts reaches 150 ° C, which will cause problems such as deformation of the shutter plate. Therefore, it is generally used The so-called spot cooling method is used to blow the cooling air concentrated from the cooling nozzles near the center portion where the temperature is highest, and to reduce the temperature near the center portion. When the spot cooling method is applied to a rotary shutter, the shutter is opened. The cooling nozzles are arranged in such a way that the cooling nozzles do not cover the light path. When the shutter is closed, it is necessary to blow cooling air to the central part of the shutter plate, but as the diameter of the extravagant light path increases, the cooling distance between the mouth and the shutter plate is also Large, the installation position of the cooling nozzle needs to be finely adjusted in the direction of the cooling air supply. * Therefore, the adjustment is time-consuming and increases the cost of the manufacturing stage. In addition, the larger the input of the lamp, the higher the temperature of the shutter plate. In the previous shutter cooling using a rotary shutter, the above-mentioned cooling nozzles are fixed in position, and the shutter plate can be cooled only when the shutter is closed, and efficient cooling cannot be performed. The present invention is based on this. For the invention, a first object of the present invention is to provide a shutter plate that can take up a small area even if the optical path diameter becomes larger, does not require a large shutter drive mechanism, and stops the shutter plate at an open and close position with high accuracy. A shutter mechanism of a lighting device. A second object of the present invention is to provide a shutter mechanism of a lighting device that does not require fine adjustment of the installation of a cooling nozzle, and that can efficiently cool the shutter. Means for solving the problem-Applicable to this paper standard China National Standard (CNS) A4 specification (210X297mm) ~~ --------— I- < 谙 Please read the notes on the back first Please fill in this page again to order the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs and the printing of the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs. Printed A7 _B7_ V. Description of the invention (5) The shutter mechanism of the lighting device, it is necessary to The irradiation surface sets the cumulative exposure to a constant wind to open and close the shutter plate (shading plate). In the case of the rotary shutter mechanism shown by Mae FIG. 4, the movement direction of the shading portion is constant, so the irradiation surface is accumulated. The exposure amount can be constant. Because it is a rotary type, the area occupied by the shutter mechanism becomes larger. On the other hand, in order to reduce the area occupied by the shutter plate, as shown in FIG. 5 above, one light block is used. In the case of a shutter mechanism with a plate reciprocating motion, the accumulation of light on the irradiation surface cannot be fixed. Here, in the present invention, two shutter plates are used to form the shutter mechanism, and the two shutter plates are moved alternately to perform the optical path. Opening and closing. Thereby, the area occupied by the shutter plate is reduced, and the cumulative exposure amount of the irradiation surface can be made equal. Figure 2 is a diagram for explaining the operation of the shutter mechanism of the present invention. When the shutter is closed, as shown in the figure (a), the light path is blocked by the shutter plate 1 1 a ′. When the shutter is opened, as shown by the circle (b), the shutter plate 1 1 a is moved upward, and the illuminated surface is exposed to light as shown in the figure (c). At this time, firstly illuminate the light on part B of the irradiated surface, and when the shutter plate 1 a is fully opened, it becomes irradiated on part A of the irradiated surface. When the shutter is closed, as shown in the figure (d), the shutter plate 1 1 B moves upward, and as shown in the figure (e), the light path is blocked by the shutter plate 1 lb. At this time, the part B of the illuminated surface is blocked first, and the part A that becomes the illuminated surface is blocked when the shutter plate 11b completely covers the light path. The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) -8 -{Please read the notes on the back before filling this page),? Τ Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs A7 __B7_ V. Description of Invention (6)

W Ο 其次,開閉快門時,依照該圖(e)-(d)-(c )—(b ) — ( a )的順序使其動作。 也就是說,如第2圖般的藉由使2枚快門板1 1 a、 1 1 b動作,於快門閉-快門開—快門閉的期間照射面的 A部份與照射面的B部份的累稹曝光置爲相等的,可以使 照射面全體的累積曝光置相等*又,在第2圖雖係採用在 快門板1 1 a、1 1 b之一方的動作結束之後,使另一方 的快門板動怍的方式,但在快門打開時間很短的場合,使 快門板1 1 a、1 1 b的動作一部份重叠亦可》 此外,於本發明上述快門板1 1 a、1 lb的冷卻係 依下述方式進行的。於上述2枚快門板,如第2圖(a ) 所示般地安裝冷卻手段6 a、6 b,以使上述冷卻,手段隨 著上述2枚快門板1 1 a、1 1 b同時移動的方式構成· 而2,藉由冷卻手段6a、6b送風冷卻快門板1 la、 1 1 b。藉此,不需要在安裝冷卻嗅嘴時進行微妙的調整 ,此外,在打開快門時也可以冷卻遮光板,可以有效率地 進行冷卻。 發明之實施形態 第1圖顯示本發明之實施例的快門機構的構成之圖· 於該圖,11a、lib係快門板,快門板11a、 1 1 b,分別被安裝於快門板安裝構件1 2 a、1 2 b。 快門板安裝構件1 2 a、1 2 b係由滑軌與滾珠軸承等所 本紙張尺度適用中國國家標準(CNS > A4規格(210X297公釐).9 . I ---------- {請t閲讀1Ϊ·-面之注t事項再填寫本頁) 訂 經濟部中央標準局貝工消費合作社印策 A 7 _____B?_ 五、發明説明(7 ) 構成透過移動導軌(未圖示)可對基座構件1 3移動地被 安裝著,快門板1 1 a、1 1 b以及快門板安裝構件 1 2 a、1 2 b係可以在該圖箭頭L所示的範圍內移動。 於快門板安裝構件1 2 a、1 2 b,分別被安裝有冷 卻噴嘴14a、14b,冷卻噴嘴14a、14b係與快 門板安裝構件1 2 a、1 2b共同移動。 冷卻噴嘴14a、14b係如該圖所示被彎曲成L字 形,冷卻噴嘴14a、14b的冷卻用空氣吹出口,係與 快門板1 1 a、1 1 b的照光區域Μ的中心部相對方向, 冷卻用空氣吹出口與快門板1 1 a、1 1 b面僅離開少許 的間隔。 此外,於冷卻噴嘴14a、14b,被連接著鐵氟龍 管等具可撓性的配管15a、15b,配管15 a' 1 5 b的另一端被連接著未圖示的冷卻用空氣供給源,從 冷卻用空氣供給源供給著約4.5MPa的冷卻用空氣。 因此,冷卻用空氣向快門板1 la、1 1 b的照光區域Μ 的中心部吹出,冷卻快門板1 1 a、1 1 b。 上述配管15a、15b的長度,在考慮快門板N 1 1 a、1 1 b的移動距離之後尙使其具有餘裕,即使快 門板1 1 a、1 1 b移動,由於移動所導致的外置變化也 可以藉由配管1 5a、1 5b的撓曲而吸收。 16a、16b係空氣汽缸,空氣汽缸16a、 16b的活塞軸17a、17b係被安裝於快門板11a 、1 lb,藉由驅動空氣汽缸16a、16b,快門板 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐)-1〇- ---------- (請1閲讀t-面之注*'事項再填巧本頁) 訂 經濟部中央橾準局貝工消费合作社印製 A7 _B7_ 五、發明説明(8 ) 1 1 a、1 1 b朝向該圖的箭頭方向移動。 其次,參照第2圖同時說明本實施例的快門機構的動 作。 第1圖顯示關閉快門的狀態,從未圖示的光線照射源 所射出的光線L被藉由快門板1 1 a遮光(第2圖(a ) )° 此外,從配管15a、15b對冷卻噴嘴14a、 14b供給冷卻用空氣,藉由從冷卻噴嘴14a、14b 所吹出的冷卻用空氣,冷卻快門板1 1 a、1 lb的照光 區域的中心部。 在打開快門時,對空氣汽缸1 6 a供給曲動用空氣。 藉此被接續於活塞棒1 7 a的快門板1 1 a沿著移動導軌 向上方移動(第2圖(b))。快門板11a的停、止位置 ,係由空氣汽缸1 6 a的衝程終端來決定的,快門板 1 1 a移動至該圖虛線所示的位置而停止。 藉此,快門成爲開的狀態,光線L通過快門機構(第 2 圖(c ))。 快門板1 1 a移動的話,冷卻噴嘴1 4 a也與快%門板 1 1 a共同移動,快門板1 1 a的光線照射區域Μ的中心 部總是藉由冷卻用空氣來冷卻。 接著,於關閉快門時,與上述相同,對空氣汽缸 1 6 b供給曲動用空氣,藉由空氣汽缸1 6 b而使快門板 1 1 b向上方移動直到快門板1 1 a的位置(第2圖(d 本紙張尺度適用中國國家標牟(CNS ) “規格(210X297公釐)_ 11 · --------/1¾.------訂 I * (锖尤閱讀背面之注意事項再填艿本页) 經濟部中央標準局員工消费合作社印製 A7 _B7 五、發明説明(9 ) 藉此,快門成爲關閉狀態,光線L被藉由快門板 lib遮住(第2圖(e))。 快門每1 1 b移動的話,如前述般的冷卻噴嘴1 4 b 也與快門板11 b共同移動,快門板1 1 b的光線照射區 域的中心部總是藉由冷卻用空氣來冷卻。 其次,於開閉快門時,如前述第2圖所說明般的,以 與上述相反的順序使快門板1 1 a、1 1 b移動(於第2 圖,以(e)-* (d)-*(c) — (b) — (a)的順序 )。 於本Ιί施例,因爲是使2枚快門板1 1 a、1 1 b交 互移動而進行快門的開閉,所以快門機構所佔的面積與從 前的回轉式快門相比可以減少面稹,此外,如前述第2圖 所說明的,可以使照射面全體的累積曝光量相等。\ 進而,冷卻噴嘴14a、14b與快門板11a、 1 lb共同移動,可以對快門板1 1 a、1 lb的光線照 射區域Μ的中心部持績吹出冷卻用空氣的緣故,所以可以 總是對快門板1 la、1 lb進行冷卻。因此,即使打開 快門時也可以冷卻快門板1 1 a、1 1 b,可以抑制'快門 板11a、lib的溫度上升。 又,在上述實施例,雖然快門板1 1 a、1 lb的移 動方向是上下移動,但是快門板的移動方向可以是上下、 也可以是左右,可以依照裝置的高度方向、横向方向的限 制條件,而適當選定安裝方向。 本紙張尺度適用中國國家標準(CNS ) A4优格(210X297公釐)-12 - — 111 — I I 1- - Lr— -- - - I - - - - I、?τ t· <婧先閲讀背面之注意事項再填{η本頁) 經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(1〇 ) 發明之效果 ” 如以上所說明的,本發明可以獲得以下的效果。 (1 )„因爲是使2枚快門板進行往復運動的緣故,即 使考慮快門板的移動,快門板所佔的面稹也只要光路的約 3倍即可,與從前的回轉式比較起來可以謀求小型化•此 外,快門板的移動方向爲直線方向,可以因應裝置的限制 條件而將移動方向選定爲上下、或是左右之任一方向,所 以可以容易組入照光裝置。 (2 )因爲快門板是直線方向移動的緣故,作爲快門 板的驅動手段可以使用空氣汽缸等直線驅動手段。而只要 將快門板的停止位置選定爲成爲空氣汽缸的衝程終端的話 ,可以使快門板停止於指定的停止位置。 (3 )因爲使供冷卻快門板的冷卻噴嘴與快門..板共同 移動,所以不會妨礙光路可以在快門的附近配置冷卻噴嘴 的冷卻用空氣吹出口 •因此,於冷卻噴嘴不須進行微妙的 位置調整、角度調整,可以容易點狀冷卻快門板的中央部 〇 (4 )即使快門打開時,也可以吹出冷卻用空氣',可 以有效率地冷卻快門板。因此,於快門板所產生的溫度分 布可以縮小,可以減少快門板的熱變形· 結果,不需要爲了防止由於熱而導致快門板變形*而 採用堅固的快門板構造,可以謀求快門機構的輕置化。 圖面之簡單說明 , 本紙張尺度適用中國國家標率(CNS ) A4規格(210X297公釐) --------/1¾. - HI— - —訂 (請先閱讀背面之注意事項再填艿本頁) A7 B-7 五、發明説明(11 ) 第1臛係顯示本發明的快'門機構的構成之圖。 第2圖說明本發明的快門機構的動作之圖》 第3圖係顯示照光裝匱的構成之一例。 第4圖係顯示從前所使用的回轉式快門。 第5圖係供說明由1枚快門板所構成的快門機構的動 作之圖。 符號說明 1 燈,2 聚光鏡,3 凹透鏡, 4 第1平面鏡,5 累積(integrator)透鏡, 6 快門機構,6a、6b 冷卻手段, 7 第2平面鏡,8 準直(collimator)透鏡* 1 1 a、1 1 b 快門板, 、 12a ' 12b 快門板安裝構件, 13 基座構件,14a、14b 冷卻噴嘴, 15a、15b 配管,16a、16b 空氣汽缸, 1 7 a、1 7 b 活塞棒 (請先閱诔背面之注意事項再填Tt?本頁)W Ο Next, when the shutter is opened and closed, it operates in the order of (e)-(d)-(c)-(b)-(a) in this figure. That is, as shown in FIG. 2, by operating the two shutter plates 1 1 a and 1 1 b, the portion A of the irradiation surface and the portion B of the irradiation surface are in the period from shutter closing to shutter opening to shutter closing. Set the cumulative exposures to be the same, so that the cumulative exposures of the entire irradiation surface can be set to be equal. Also, in Figure 2, although the action of one of the shutter plates 1 1 a and 1 1 b is ended, the other The shutter plate moves in a flexible manner, but when the shutter opening time is very short, it is possible to partially overlap the actions of the shutter plates 1 1 a and 1 1 b. In addition, in the above-mentioned shutter plates 1 1 a, 1 lb The cooling is performed as follows. Cooling means 6 a and 6 b are installed on the two shutter plates as shown in FIG. 2 (a), so that the above cooling means can be moved simultaneously with the two shutter plates 1 1 a and 1 1 b. System configuration · And 2, the shutter plates 11a and 1b are cooled by the cooling means 6a and 6b. This eliminates the need to make subtle adjustments when installing the cooling nozzle, and also allows the shutter to be cooled when the shutter is opened, enabling efficient cooling. Embodiment of the Invention FIG. 1 is a diagram showing the structure of a shutter mechanism according to an embodiment of the present invention. In this figure, 11a, lib-type shutter plates, shutter plates 11a, 1 1 b are respectively mounted on shutter plate mounting members 1 2 a, 1 2 b. The shutter plate mounting members 1 2 a, 1 2 b are made of slide rails and ball bearings, etc. The paper size is applicable to Chinese national standards (CNS > A4 specifications (210X297 mm). 9.. -------- -{Please read 1Ϊ · -Note above and fill in this page again.) Order the policy of the Central Bureau of Standards of the Ministry of Economic Affairs, Shellfish Consumer Cooperatives, A 7 _____ B? _ 5. Description of the invention (7) (Shown) The base member 13 is movably mounted, and the shutter plates 1 a, 1 1 b, and the shutter plate mounting members 1 2 a, 1 2 b are movable within a range shown by an arrow L in the figure. Cooling nozzles 14a and 14b are mounted on the shutter plate mounting members 1 2 a and 1 2 b, respectively. The cooling nozzles 14 a and 14 b are moved together with the shutter plate mounting members 12 a and 12 b. The cooling nozzles 14a and 14b are bent into an L shape as shown in the figure, and the cooling air outlets of the cooling nozzles 14a and 14b are opposite to the center of the illumination area M of the shutter plates 1a and 1b, The cooling air blow-off port is only slightly spaced from the shutter plate 1 1 a and 1 1 b surfaces. In addition, to the cooling nozzles 14a and 14b, flexible pipes 15a and 15b such as Teflon pipes are connected, and the other end of the pipes 15a '1 5b is connected to a cooling air supply source (not shown). About 4.5 MPa of cooling air was supplied from the cooling air supply source. Therefore, the cooling air is blown out toward the center of the irradiation area M of the shutter plates 11a, 11b, and the shutter plates 1a, 11b are cooled. The length of the above pipes 15a and 15b has a margin after considering the moving distances of the shutter plates N 1 1 a and 1 1 b. Even if the shutter plates 1 1 a and 1 1 b move, the external changes caused by the movement It can also be absorbed by bending of the pipes 15a and 15b. The air cylinders 16a and 16b are air cylinders, and the piston shafts 17a and 17b of the air cylinders 16a and 16b are installed on the shutter plates 11a and 1 lb. By driving the air cylinders 16a and 16b, the shutter plate is in accordance with the Chinese National Standard (CNS) A4 specifications (210X297 mm)-10----------- (Please read t-face's note * 'matter and fill out this page) Order the Central Laboratories Bureau of the Ministry of Economic Affairs Print A7 _B7_ 5. Description of the invention (8) 1 1 a, 1 1 b move in the direction of the arrow in the figure. Next, the operation of the shutter mechanism of this embodiment will be described with reference to FIG. Figure 1 shows the shutter closed. The light L emitted from a light source not shown is blocked by the shutter plate 1 1 a (Figure 2 (a)). In addition, the cooling nozzles are directed from the pipes 15a and 15b. 14a and 14b supply cooling air, and the central part of the irradiation area of the shutter plates 1a and 1lb is cooled by the cooling air blown from the cooling nozzles 14a and 14b. When the shutter is opened, the air cylinder 16a is supplied with crank air. Thereby, the shutter plate 1 1 a connected to the piston rod 17 a is moved upward along the moving guide (Fig. 2 (b)). The stop and stop positions of the shutter plate 11a are determined by the stroke end of the air cylinder 16a, and the shutter plate 1a moves to the position shown by the dotted line in the figure and stops. Thereby, the shutter is opened, and the light L passes through the shutter mechanism (Fig. 2 (c)). When the shutter plate 1 1 a moves, the cooling nozzle 14 a also moves together with the fast door plate 1 1 a, and the central portion of the light irradiation region M of the shutter plate 1 1 a is always cooled by cooling air. Next, when the shutter is closed, as described above, the air cylinder 16b is supplied with crank air, and the air cylinder 16b is used to move the shutter plate 1b upward to the position of the shutter plate 1a (second Figure (d) This paper size applies to the Chinese National Standards (CNS) "Specifications (210X297 mm) _ 11 · -------- / 1¾ .-------- Order I * (Chiyou read the Note for refilling this page) A7 _B7 printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 5. Description of the invention (9) The shutter is closed and the light L is blocked by the shutter plate lib (Figure 2 ( e)). When the shutter moves every 1 1 b, the cooling nozzle 1 4 b as described above also moves with the shutter plate 11 b. The central part of the light irradiation area of the shutter plate 1 1 b is always cooled by cooling air. Cool. Second, when opening and closing the shutter, move the shutter plates 1 1 a, 1 1 b in the reverse order as described in Figure 2 (in Figure 2, use (e)-* (d )-* (c) — (b) — (a)) In this embodiment, the shutters are opened by moving the two shutter plates 1 1 a and 1 1 b alternately. Therefore, the area occupied by the shutter mechanism can reduce the surface area compared with the previous rotary shutter. In addition, as described in FIG. 2 above, the cumulative exposure amount of the entire irradiation surface can be made equal. \ Furthermore, the cooling nozzles 14a, 14b moves with the shutter plates 11a and 1 lb, and can keep cooling air in the center of the light irradiation area M of the shutter plates 1 1 a, 1 lb. Therefore, the shutter plates 1 a, 1 lb can always be blown. Cooling is performed. Therefore, the shutter plates 1 1 a and 1 1 b can be cooled even when the shutter is opened, and the temperature rise of the shutter plates 11 a and 1 1 can be suppressed. Also, in the above embodiment, although the shutter plates 1 1 a and 1 lb The moving direction of the shutter is up and down, but the moving direction of the shutter plate can be up and down, or left and right, and the installation direction can be appropriately selected according to the restrictions of the height direction and the lateral direction of the device. The paper size applies to the Chinese national standard (CNS ) A4 Youge (210X297mm) -12-— 111 — II 1--Lr—---I----I,? Τ t · < Jing first read the notes on the back and fill in {η 本Page) Ministry of Economy Central Printed by the Consumer Bureau of Standards Bureau A7 B7 V. Description of the invention (10) Effects of the invention "As explained above, the present invention can achieve the following effects. (1)" Because the two shutter plates are reciprocated For this reason, even if the movement of the shutter plate is taken into consideration, the area occupied by the shutter plate only needs to be about 3 times the light path. Compared with the previous rotary type, it can be miniaturized. • In addition, the shutter plate can be moved in a linear direction. The moving direction is selected to be either the up-down direction or the left-right direction according to the device's restrictions, so it can be easily incorporated into the lighting device. (2) Since the shutter plate is moved in a linear direction, a linear driving means such as an air cylinder can be used as a driving means for the shutter plate. As long as the stop position of the shutter plate is selected as the stroke end of the air cylinder, the shutter plate can be stopped at the specified stop position. (3) The cooling nozzle for cooling the shutter plate is moved together with the shutter, so it does not interfere with the light path. The cooling air outlet of the cooling nozzle can be arranged near the shutter. Therefore, no delicate Position adjustment and angle adjustment make it easy to cool the central part of the shutter plate. (4) Even when the shutter is open, cooling air can be blown out, and the shutter plate can be efficiently cooled. Therefore, the temperature distribution generated by the shutter plate can be reduced, and the thermal deformation of the shutter plate can be reduced. As a result, it is not necessary to adopt a sturdy shutter plate structure in order to prevent the shutter plate from being deformed due to heat. Into. Brief description of the drawing, this paper size applies to China National Standard (CNS) A4 specification (210X297 mm) -------- / 1¾.-HI —-— Order (Please read the precautions on the back before (Fill on this page) A7 B-7 5. Description of the invention (11) The first one is a diagram showing the configuration of the shutter mechanism of the present invention. Fig. 2 is a diagram for explaining the operation of the shutter mechanism of the present invention. Fig. 3 is a diagram showing an example of the configuration of a lighting device. Figure 4 shows the rotary shutter used in the past. Fig. 5 is a diagram for explaining the operation of a shutter mechanism composed of a single shutter plate. DESCRIPTION OF SYMBOLS 1 lamp, 2 condenser lens, 3 concave lens, 4 first plane mirror, 5 integral lens, 6 shutter mechanism, 6a, 6b cooling means, 7 second plane mirror, 8 collimator lens * 1 1 a, 1 1 b shutter plate, 12a '12b shutter plate mounting member, 13 base member, 14a, 14b cooling nozzle, 15a, 15b piping, 16a, 16b air cylinder, 1 7 a, 1 7 b piston rod (please read first (填 Notes on the back, fill in Tt? This page)

*1T Μ 經濟部中央標準局貝工消费合作社印製 本紙張尺度適用中國國家標準(CNS ) ( 2丨0><297公釐)_ 14* 1T Μ Printed by the Shellfish Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs This paper is sized to the Chinese National Standard (CNS) (2 丨 0 > < 297mm) _ 14

Claims (1)

B8 CS D8 六、申請專利範困 1 . 一種照光裝置的快門機構,其特徴爲具有: .短路電弧型放電燈,及 投影來自該放電燈的光線的光學機構,及 被配置於該光學機構的內部,將來自上述放電燈的光 線遮光的快門機構.; 上述快門機構,係由往復移動的2枚遮光板所構成, 該2枚遮光板交互遮光》 2 .如申請專利範圍第1項之照光裝置的快門機構, 其中於上述2枚遮光板,設有供送風冷卻該2枚遮光板之 用的冷卻手段, 上述冷卻手段係與上述2枚遮光板同時移動。 ----·------参1 (锖先閏讀背面之注意事項再填寫本霣 订 經濟部中央標準局真工消费合作社印装 本紙張尺度逋用中國國家標率(CNS ) A4规格(210X297公釐)B8 CS D8 VI. Patent application 1. A shutter mechanism of an illuminating device, which has: a short-circuit arc type discharge lamp, an optical mechanism that projects light from the discharge lamp, and an optical mechanism configured in the optical mechanism. Inside, a shutter mechanism that shields light from the discharge lamp. The above shutter mechanism is composed of two reciprocating light-shielding plates that interact to block light. The shutter mechanism of the device is provided with a cooling means for cooling the two light-shielding plates by the supply air on the two light-shielding plates, and the cooling means moves simultaneously with the two light-shielding plates. ---- · ------ Refer to 1 (锖 Please read the precautions on the back before filling in this. Set the paper size of the printed paper of the Real Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs. Use China National Standards (CNS). A4 specifications (210X297 mm)
TW087111148A 1997-08-26 1998-07-09 Shutter mechanism of light irradiation apparatus TW388920B (en)

Applications Claiming Priority (1)

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JP22944997A JP3379399B2 (en) 1997-08-26 1997-08-26 Shutter mechanism of light irradiation device

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TW388920B true TW388920B (en) 2000-05-01

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EP1482363A1 (en) 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographic apparatus
US7185990B2 (en) 2003-09-10 2007-03-06 Matsushita Electric Industrial Co., Ltd. Projection display apparatus
JP2005221596A (en) * 2004-02-04 2005-08-18 Dainippon Screen Mfg Co Ltd Pattern drawing system
JP5352433B2 (en) * 2009-11-19 2013-11-27 株式会社日立ハイテクノロジーズ Exposure equipment
JP5836693B2 (en) * 2011-08-11 2015-12-24 株式会社太陽機械製作所 SHUTTER DEVICE AND EXPOSURE DEVICE INCLUDING THE SAME

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JPS59117121A (en) * 1982-12-24 1984-07-06 Hitachi Ltd Projection type mask aligner

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JPH1167656A (en) 1999-03-09
KR19990023892A (en) 1999-03-25
JP3379399B2 (en) 2003-02-24

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