TW375768B - A nozzle combining developing and rinsing steps - Google Patents

A nozzle combining developing and rinsing steps

Info

Publication number
TW375768B
TW375768B TW087115309A TW87115309A TW375768B TW 375768 B TW375768 B TW 375768B TW 087115309 A TW087115309 A TW 087115309A TW 87115309 A TW87115309 A TW 87115309A TW 375768 B TW375768 B TW 375768B
Authority
TW
Taiwan
Prior art keywords
nozzle
inner nozzle
outer nozzle
connects
developing
Prior art date
Application number
TW087115309A
Other languages
Chinese (zh)
Inventor
Jen-Hung Yu
ming-de Zhou
jin-cai Luo
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW087115309A priority Critical patent/TW375768B/en
Application granted granted Critical
Publication of TW375768B publication Critical patent/TW375768B/en

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

A nozzle combining developing and rinsing steps applied in lithography process, comprising an inner nozzle and an outer nozzle where the inner nozzle is combined into the inside of the outer nozzle; outer nozzle connects to two dampers internally which further link with two orifice plates which separate the inner nozzle from the outer nozzle to form a water bath; a gap is present between the orifice plate and outer nozzle; the inner nozzle connects with two developer feed tubes and a cooling water recirculating tube; the outer nozzle connects to two rinsing fluid (water) feed tubes; the inner nozzle is connected with an inner nozzle driving device which drives the inner nozzle in vertical movement; when inner nozzle moves downward, it blocks the gap provided by orifice plates on its sides and keeps the rinsing fluid from flowing out; at this time, developer is sprayed from the inner nozzle onto the chips; when inner nozzle moves up, rinsing fluid passes through the gap provided by orifice plate and exits from the outer nozzle to rinse the wafers and the nozzle.
TW087115309A 1998-09-15 1998-09-15 A nozzle combining developing and rinsing steps TW375768B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW087115309A TW375768B (en) 1998-09-15 1998-09-15 A nozzle combining developing and rinsing steps

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW087115309A TW375768B (en) 1998-09-15 1998-09-15 A nozzle combining developing and rinsing steps

Publications (1)

Publication Number Publication Date
TW375768B true TW375768B (en) 1999-12-01

Family

ID=57941923

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087115309A TW375768B (en) 1998-09-15 1998-09-15 A nozzle combining developing and rinsing steps

Country Status (1)

Country Link
TW (1) TW375768B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107206627A (en) * 2015-01-15 2017-09-26 西尔特克特拉有限责任公司 For the separation equipment for separating chip from donor substrate with no chips

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107206627A (en) * 2015-01-15 2017-09-26 西尔特克特拉有限责任公司 For the separation equipment for separating chip from donor substrate with no chips

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