TW375768B - A nozzle combining developing and rinsing steps - Google Patents
A nozzle combining developing and rinsing stepsInfo
- Publication number
- TW375768B TW375768B TW087115309A TW87115309A TW375768B TW 375768 B TW375768 B TW 375768B TW 087115309 A TW087115309 A TW 087115309A TW 87115309 A TW87115309 A TW 87115309A TW 375768 B TW375768 B TW 375768B
- Authority
- TW
- Taiwan
- Prior art keywords
- nozzle
- inner nozzle
- outer nozzle
- connects
- developing
- Prior art date
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
A nozzle combining developing and rinsing steps applied in lithography process, comprising an inner nozzle and an outer nozzle where the inner nozzle is combined into the inside of the outer nozzle; outer nozzle connects to two dampers internally which further link with two orifice plates which separate the inner nozzle from the outer nozzle to form a water bath; a gap is present between the orifice plate and outer nozzle; the inner nozzle connects with two developer feed tubes and a cooling water recirculating tube; the outer nozzle connects to two rinsing fluid (water) feed tubes; the inner nozzle is connected with an inner nozzle driving device which drives the inner nozzle in vertical movement; when inner nozzle moves downward, it blocks the gap provided by orifice plates on its sides and keeps the rinsing fluid from flowing out; at this time, developer is sprayed from the inner nozzle onto the chips; when inner nozzle moves up, rinsing fluid passes through the gap provided by orifice plate and exits from the outer nozzle to rinse the wafers and the nozzle.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW087115309A TW375768B (en) | 1998-09-15 | 1998-09-15 | A nozzle combining developing and rinsing steps |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW087115309A TW375768B (en) | 1998-09-15 | 1998-09-15 | A nozzle combining developing and rinsing steps |
Publications (1)
Publication Number | Publication Date |
---|---|
TW375768B true TW375768B (en) | 1999-12-01 |
Family
ID=57941923
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW087115309A TW375768B (en) | 1998-09-15 | 1998-09-15 | A nozzle combining developing and rinsing steps |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW375768B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107206627A (en) * | 2015-01-15 | 2017-09-26 | 西尔特克特拉有限责任公司 | For the separation equipment for separating chip from donor substrate with no chips |
-
1998
- 1998-09-15 TW TW087115309A patent/TW375768B/en active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107206627A (en) * | 2015-01-15 | 2017-09-26 | 西尔特克特拉有限责任公司 | For the separation equipment for separating chip from donor substrate with no chips |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5850841A (en) | Cleaning apparatus of semiconductor device | |
IT1267965B1 (en) | CONSTRUCTION COMPLEX OF A WATER PURIFIER AND STERILIZER EQUIPMENT | |
GB2596215A8 (en) | Sprayer for mixed solution ad clear water | |
EP1677341A4 (en) | Exposure apparatus, exposure method, and method for manufacturing device | |
TW375768B (en) | A nozzle combining developing and rinsing steps | |
TW200833430A (en) | Methods and apparatus for cleaning chamber components | |
IL129581A0 (en) | Aqueous developing solutions for reduced developer residue | |
SE7905094L (en) | SET AND APPARATUS TO ASTAD CLEANING OF A DIVER PIPE, WHICH IS PART OF A DRAINAGE PIPE | |
TW303482B (en) | Semiconductor manufacturing apparatus and wafer treatment method using the same | |
CN103949430A (en) | Bearing cleaning machine | |
JPS5430675A (en) | Rinsing control system for washing machine | |
CN1659291A (en) | Device for cooling and/or rinsing steel wires and/or tapes | |
JPS5684452A (en) | Prevention of vibration of strip | |
ATE286436T1 (en) | BOTTLE WASHING MACHINE | |
CN213688053U (en) | Condensation spraying device of primary cooler | |
KR100439310B1 (en) | Method for cutting Si-wafer using laser beam and an apparatus therefor | |
CN208728134U (en) | A kind of water-saving type steel belt cleaning device | |
ATE445575T1 (en) | DEVICE FOR DISINFECTING WATER THAT FLOWS THROUGH A SANITARY FACILITY | |
SU1366241A1 (en) | Arrangement for cleaning hollow articles | |
JPS56130772A (en) | Cleaning method for screen photoreceptor | |
KR19990018390A (en) | Solvent Supply Line System in Apparatus for Manufacturing Semiconductor Devices | |
RU7028U1 (en) | DEVICE FOR AIR-AIR COOLING OF PRODUCTS ON THE PRESS TABLE | |
JPS592834Y2 (en) | Lamp liquid cooling device for photoreaction | |
JPH0244727A (en) | Device for cleaning of semiconductor wafer | |
KR100850073B1 (en) | Nozzle structure for a cleaning device |