TW357932U - Rohrensysteme und herstellungsverfahren hierzu - Google Patents
Rohrensysteme und herstellungsverfahren hierzuInfo
- Publication number
- TW357932U TW357932U TW086205919U TW86205919U TW357932U TW 357932 U TW357932 U TW 357932U TW 086205919 U TW086205919 U TW 086205919U TW 86205919 U TW86205919 U TW 86205919U TW 357932 U TW357932 U TW 357932U
- Authority
- TW
- Taiwan
- Prior art keywords
- rohrensysteme
- hierzu
- herstellungsverfahren
- und
- und herstellungsverfahren
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J21/00—Vacuum tubes
- H01J21/02—Tubes with a single discharge path
- H01J21/06—Tubes with a single discharge path having electrostatic control means only
- H01J21/10—Tubes with a single discharge path having electrostatic control means only with one or more immovable internal control electrodes, e.g. triode, pentode, octode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J17/00—Gas-filled discharge tubes with solid cathode
- H01J17/38—Cold-cathode tubes
- H01J17/40—Cold-cathode tubes with one cathode and one anode, e.g. glow tubes, tuning-indicator glow tubes, voltage-stabiliser tubes, voltage-indicator tubes
- H01J17/44—Cold-cathode tubes with one cathode and one anode, e.g. glow tubes, tuning-indicator glow tubes, voltage-stabiliser tubes, voltage-indicator tubes having one or more control electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J19/00—Details of vacuum tubes of the types covered by group H01J21/00
- H01J19/02—Electron-emitting electrodes; Cathodes
- H01J19/24—Cold cathodes, e.g. field-emissive cathode
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1996109234 DE19609234A1 (de) | 1996-03-09 | 1996-03-09 | Röhrensysteme und Herstellungsverfahren hierzu |
Publications (1)
Publication Number | Publication Date |
---|---|
TW357932U true TW357932U (en) | 1999-05-01 |
Family
ID=7787766
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086205919U TW357932U (en) | 1996-03-09 | 1997-04-16 | Rohrensysteme und herstellungsverfahren hierzu |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0885453A2 (zh) |
DE (1) | DE19609234A1 (zh) |
TW (1) | TW357932U (zh) |
WO (1) | WO1997033295A2 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101971285B (zh) * | 2007-12-28 | 2013-10-23 | 塞莱斯系统集成公司 | 高频三极管型场致发射器件及其制造方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6198557B1 (en) | 1997-06-25 | 2001-03-06 | Deutsche Telekom Ag | Telecommunication system having frequency-dividing optical components for the parallel processing of optical pulses |
DE10006361A1 (de) * | 1999-05-25 | 2000-11-30 | Deutsche Telekom Ag | Miniaturisierte Terahertz-Strahlungsquelle |
EP1186079B1 (de) | 1999-05-25 | 2005-02-02 | NaWoTec GmbH | Miniaturisierte terahertz-strahlungsquelle |
EP1363164B1 (en) | 2002-05-16 | 2015-04-29 | NaWoTec GmbH | Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface |
DE10302794A1 (de) * | 2003-01-24 | 2004-07-29 | Nawotec Gmbh | Verfahren und Vorrichtung zur Herstellung von Korpuskularstrahlsystemen |
US20070029046A1 (en) * | 2005-08-04 | 2007-02-08 | Applied Materials, Inc. | Methods and systems for increasing substrate temperature in plasma reactors |
EP2413343B1 (en) * | 2010-07-26 | 2015-11-04 | Hans W.P. Dr. Koops | Device for generating THz radiation with free electron beams |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4721885A (en) * | 1987-02-11 | 1988-01-26 | Sri International | Very high speed integrated microelectronic tubes |
US4855636A (en) * | 1987-10-08 | 1989-08-08 | Busta Heinz H | Micromachined cold cathode vacuum tube device and method of making |
JP2968014B2 (ja) * | 1990-01-29 | 1999-10-25 | 三菱電機株式会社 | 微小真空管及びその製造方法 |
US5192240A (en) * | 1990-02-22 | 1993-03-09 | Seiko Epson Corporation | Method of manufacturing a microelectronic vacuum device |
US5203731A (en) * | 1990-07-18 | 1993-04-20 | International Business Machines Corporation | Process and structure of an integrated vacuum microelectronic device |
DE69027611T2 (de) * | 1990-07-18 | 1997-01-23 | Ibm | Herstellungsverfahren und struktur einer integrierten vakuum-mikroelektronischen vorrichtung |
US5150019A (en) * | 1990-10-01 | 1992-09-22 | National Semiconductor Corp. | Integrated circuit electronic grid device and method |
EP0490536B1 (en) * | 1990-11-28 | 1998-01-14 | Matsushita Electric Industrial Co., Ltd. | Vacuum microelectronic field-emission device |
JP3235172B2 (ja) * | 1991-05-13 | 2001-12-04 | セイコーエプソン株式会社 | 電界電子放出装置 |
US5249340A (en) * | 1991-06-24 | 1993-10-05 | Motorola, Inc. | Field emission device employing a selective electrode deposition method |
CA2070478A1 (en) * | 1991-06-27 | 1992-12-28 | Wolfgang M. Feist | Fabrication method for field emission arrays |
EP0525763B1 (en) * | 1991-08-01 | 1995-10-25 | Texas Instruments Incorporated | A method for building a vacuum microelectronics device |
US5382867A (en) * | 1991-10-02 | 1995-01-17 | Sharp Kabushiki Kaisha | Field-emission type electronic device |
JPH05182609A (ja) * | 1991-12-27 | 1993-07-23 | Sharp Corp | 画像表示装置 |
JPH05314891A (ja) * | 1992-05-12 | 1993-11-26 | Nec Corp | 電界放出冷陰極およびその製造方法 |
GB9210419D0 (en) * | 1992-05-15 | 1992-07-01 | Marconi Gec Ltd | Cathode structures |
US5409568A (en) * | 1992-08-04 | 1995-04-25 | Vasche; Gregory S. | Method of fabricating a microelectronic vacuum triode structure |
DE19502966A1 (de) * | 1995-01-31 | 1995-06-14 | Ignaz Prof Dr Eisele | Anwendung von elektrisch leitenden Spitzen als Feldemitter in einer Gasatmosphäre zur Herstellung von flachen Bildschirmen oder Gassensoren |
-
1996
- 1996-03-09 DE DE1996109234 patent/DE19609234A1/de not_active Ceased
-
1997
- 1997-03-03 EP EP97918006A patent/EP0885453A2/de not_active Ceased
- 1997-03-03 WO PCT/DE1997/000427 patent/WO1997033295A2/de active Application Filing
- 1997-04-16 TW TW086205919U patent/TW357932U/zh unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101971285B (zh) * | 2007-12-28 | 2013-10-23 | 塞莱斯系统集成公司 | 高频三极管型场致发射器件及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
WO1997033295A2 (de) | 1997-09-12 |
WO1997033295A3 (de) | 1997-12-04 |
EP0885453A2 (de) | 1998-12-23 |
DE19609234A1 (de) | 1997-09-11 |
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