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Internal Circuitry In Semiconductor Integrated Circuit Devices
(AREA)
Abstract
A method of forming conductor structures separated by gaps, including at least the following steps: provision of a substrate, with a conductor layer; forming the first reflective coating layer on the conductor layer; forming a second reflective coating layer on said first reflective coating layer; where the first and the second reflective coating layer are of different material; etching the first reflective coating layer, the second reflective coating layer and the conductor layer, for forming a conductor layer separated by gap; and deposition of a dielectric material in the gap between the conductors.
TW086116152A1997-10-301997-10-30Method of forming conductor structures separated by gaps
TW357399B
(en)