TW349258B - Process for producing 3-D uneven capacitance of DRAM - Google Patents

Process for producing 3-D uneven capacitance of DRAM

Info

Publication number
TW349258B
TW349258B TW086105080A TW86105080A TW349258B TW 349258 B TW349258 B TW 349258B TW 086105080 A TW086105080 A TW 086105080A TW 86105080 A TW86105080 A TW 86105080A TW 349258 B TW349258 B TW 349258B
Authority
TW
Taiwan
Prior art keywords
layer
silicon dioxide
dram
forming
silicon
Prior art date
Application number
TW086105080A
Other languages
English (en)
Inventor
Wen-Duo Su
Guang-Jau Chen
Yu-Tarng Tu
Original Assignee
Mosel Vitelic Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mosel Vitelic Inc filed Critical Mosel Vitelic Inc
Priority to TW086105080A priority Critical patent/TW349258B/zh
Application granted granted Critical
Publication of TW349258B publication Critical patent/TW349258B/zh

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  • Semiconductor Memories (AREA)
TW086105080A 1997-04-18 1997-04-18 Process for producing 3-D uneven capacitance of DRAM TW349258B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW086105080A TW349258B (en) 1997-04-18 1997-04-18 Process for producing 3-D uneven capacitance of DRAM

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW086105080A TW349258B (en) 1997-04-18 1997-04-18 Process for producing 3-D uneven capacitance of DRAM

Publications (1)

Publication Number Publication Date
TW349258B true TW349258B (en) 1999-01-01

Family

ID=57939827

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086105080A TW349258B (en) 1997-04-18 1997-04-18 Process for producing 3-D uneven capacitance of DRAM

Country Status (1)

Country Link
TW (1) TW349258B (zh)

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees