TW348264B - Apparatus and method for washing substrates - Google Patents

Apparatus and method for washing substrates

Info

Publication number
TW348264B
TW348264B TW085100348A TW85100348A TW348264B TW 348264 B TW348264 B TW 348264B TW 085100348 A TW085100348 A TW 085100348A TW 85100348 A TW85100348 A TW 85100348A TW 348264 B TW348264 B TW 348264B
Authority
TW
Taiwan
Prior art keywords
path
bath
washing
rinse solution
valve
Prior art date
Application number
TW085100348A
Other languages
Chinese (zh)
Inventor
Naoki Shindo
Takako Tojima
Shigenori Kitahara
Kenji Yokomizo
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1982095A external-priority patent/JPH08195431A/en
Priority claimed from JP7019823A external-priority patent/JPH08195372A/en
Priority claimed from JP7019821A external-priority patent/JPH08195371A/en
Priority claimed from JP1982295A external-priority patent/JPH08195368A/en
Priority claimed from JP7019824A external-priority patent/JPH08195373A/en
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of TW348264B publication Critical patent/TW348264B/en

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

A substrate washing apparatus including a bath, a washing solution supply source, a first path for allowing the washing solution overflowing from the bath, a rinse solution supply source, a second path for passing the rinse solution, a common path communicating with the first and second paths and also with a bottom of the bath, a first valve, a second valve, a discharge path branched from the first path, and a control section, in which the first valve includes a first body for opening/closing the first path, a third path arranged parallel to the first path and having a diameter smaller than a diameter of the first path, and a second body for opening/closing the third path, so that the first body is opened and the second body is closed, to allow the washing solution to flow into the bath, and on the other hand, the first body is closed, the second body is opened, to allow the rinse solution to flow into the bath, and the washing solution remaining in the first and third paths is discharged together with the rinse solution through the discharge path.
TW085100348A 1995-01-12 1996-01-12 Apparatus and method for washing substrates TW348264B (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP1982095A JPH08195431A (en) 1995-01-12 1995-01-12 Substrate holding implement and cleaning apparatus
JP7019823A JPH08195372A (en) 1995-01-12 1995-01-12 Cleaning device and its method
JP7019821A JPH08195371A (en) 1995-01-12 1995-01-12 Cleaning device and method
JP1982295A JPH08195368A (en) 1995-01-12 1995-01-12 Cleaning method and device, and transfer device
JP7019824A JPH08195373A (en) 1995-01-12 1995-01-12 Cleaning device and its method

Publications (1)

Publication Number Publication Date
TW348264B true TW348264B (en) 1998-12-21

Family

ID=57939821

Family Applications (4)

Application Number Title Priority Date Filing Date
TW085114510A TW349231B (en) 1995-01-12 1996-01-12 Substrate cleaning device and substrate cleaning method
TW085114509A TW348265B (en) 1995-01-12 1996-01-12 Apparatus and method for washing substrates
TW085100348A TW348264B (en) 1995-01-12 1996-01-12 Apparatus and method for washing substrates
TW085114511A TW349232B (en) 1995-01-12 1996-01-12 Substrate cleaning device and substrate cleaning method

Family Applications Before (2)

Application Number Title Priority Date Filing Date
TW085114510A TW349231B (en) 1995-01-12 1996-01-12 Substrate cleaning device and substrate cleaning method
TW085114509A TW348265B (en) 1995-01-12 1996-01-12 Apparatus and method for washing substrates

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW085114511A TW349232B (en) 1995-01-12 1996-01-12 Substrate cleaning device and substrate cleaning method

Country Status (1)

Country Link
TW (4) TW349231B (en)

Also Published As

Publication number Publication date
TW348265B (en) 1998-12-21
TW349232B (en) 1999-01-01
TW349231B (en) 1999-01-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees