TW333663B - The method for uniformly coating photoresist - Google Patents
The method for uniformly coating photoresistInfo
- Publication number
- TW333663B TW333663B TW086114326A TW86114326A TW333663B TW 333663 B TW333663 B TW 333663B TW 086114326 A TW086114326 A TW 086114326A TW 86114326 A TW86114326 A TW 86114326A TW 333663 B TW333663 B TW 333663B
- Authority
- TW
- Taiwan
- Prior art keywords
- rotating speed
- semiconductor wafer
- enable
- uniformly coating
- photoresist
- Prior art date
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
A method for uniformly coating photoresist on semiconductor wafer, it includes following steps: Use 1st rotating speed to rotate semiconductor wafer on central axis of semiconductor wafer, and simultaneously spray photoresist on top surface of semiconductor wafer. Stop spray photoresist, and keep the semiconductor wafer at 1st rotating speed. Accelerate semiconductor wafer to enable the rotating speed accelerating from 1st rotating speed to 2nd rotating speed. Accelerate semiconductor wafer to enable the rotating speed accelerating from 2nd rotating speed to 3rd rotating speed, for determining the thickness of PR layer coated on semiconductor wafer. Reduce semiconductor wafer speed to enable the rotating speed reducing from 3rd rotating speed to 4th rotating speed, and clean the backside of semiconductor wafer. Keep the semiconductor wafer at 4th rotating speed. Stop to rotate semiconductor substrate before moving out the semiconductor wafer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW086114326A TW333663B (en) | 1997-10-01 | 1997-10-01 | The method for uniformly coating photoresist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW086114326A TW333663B (en) | 1997-10-01 | 1997-10-01 | The method for uniformly coating photoresist |
Publications (1)
Publication Number | Publication Date |
---|---|
TW333663B true TW333663B (en) | 1998-06-11 |
Family
ID=58262906
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086114326A TW333663B (en) | 1997-10-01 | 1997-10-01 | The method for uniformly coating photoresist |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW333663B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI785626B (en) * | 2020-05-29 | 2022-12-01 | 日商斯庫林集團股份有限公司 | Peripheral portion coating apparatus and peripheral portion coating method |
-
1997
- 1997-10-01 TW TW086114326A patent/TW333663B/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI785626B (en) * | 2020-05-29 | 2022-12-01 | 日商斯庫林集團股份有限公司 | Peripheral portion coating apparatus and peripheral portion coating method |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |