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Application filed by Taiwan Semiconductor Mfg Co LtdfiledCriticalTaiwan Semiconductor Mfg Co Ltd
Priority to TW085113309ApriorityCriticalpatent/TW328628B/en
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Publication of TW328628BpublicationCriticalpatent/TW328628B/en
Investigating Materials By The Use Of Optical Means Adapted For Particular Applications
(AREA)
Abstract
A method for assisting inspection of defects in semiconductor substrates includes the following steps: supplying a semiconductor substrate which consists of a surface to be inspected for defects; aligning the surface of the semiconductor substrate and a template mask, where the template mask has at least one aperture for exposing a partial area of the surface of the semiconductor substrate; and optically inspecting the partial area of the surface of the semiconductor substrate through the aperture.
TW085113309A1996-11-011996-11-01Template mask for assisting inspection of semiconductor substrate defects
TW328628B
(en)