TW279244B - - Google Patents
Info
- Publication number
- TW279244B TW279244B TW083106588A TW83106588A TW279244B TW 279244 B TW279244 B TW 279244B TW 083106588 A TW083106588 A TW 083106588A TW 83106588 A TW83106588 A TW 83106588A TW 279244 B TW279244 B TW 279244B
- Authority
- TW
- Taiwan
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
-
- H10P76/00—
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10846493A | 1993-08-18 | 1993-08-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW279244B true TW279244B (en:Method) | 1996-06-21 |
Family
ID=22322383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW083106588A TW279244B (en:Method) | 1993-08-18 | 1994-07-19 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0640880A1 (en:Method) |
| JP (1) | JPH07169682A (en:Method) |
| KR (1) | KR950006958A (en:Method) |
| TW (1) | TW279244B (en:Method) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6062119A (ja) * | 1983-09-14 | 1985-04-10 | Nippon Gakki Seizo Kk | 半導体ウエハ |
| JPS60138926A (ja) * | 1983-12-26 | 1985-07-23 | Toshiba Corp | パタ−ン転写装置 |
| US4679942A (en) * | 1984-02-24 | 1987-07-14 | Nippon Kogaku K. K. | Method of aligning a semiconductor substrate and a photomask |
| JPS60178629A (ja) * | 1984-02-24 | 1985-09-12 | Nippon Kogaku Kk <Nikon> | アライメント方法 |
| JPH0629964B2 (ja) * | 1984-09-11 | 1994-04-20 | 株式会社ニコン | マーク検出方法 |
| DE3534609A1 (de) * | 1985-09-27 | 1987-04-02 | Siemens Ag | Verfahren zur automatisierten, unter verwendung von justiermarken erfolgender justierung mehrerer masken bei einem projektions-belichtungsverfahren |
| JPH01272117A (ja) * | 1988-04-23 | 1989-10-31 | Sony Corp | 半導体装置 |
| US5155370A (en) * | 1988-09-09 | 1992-10-13 | Canon Kabushiki Kaisha | Device for detecting the relative position of first and second objects |
-
1994
- 1994-07-19 TW TW083106588A patent/TW279244B/zh active
- 1994-08-10 EP EP94305903A patent/EP0640880A1/en not_active Withdrawn
- 1994-08-11 KR KR1019940019766A patent/KR950006958A/ko not_active Ceased
- 1994-08-15 JP JP21170094A patent/JPH07169682A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP0640880A1 (en) | 1995-03-01 |
| KR950006958A (ko) | 1995-03-21 |
| JPH07169682A (ja) | 1995-07-04 |